JPH08166478A - High charging method for hydrogen in hydrogen storage alloy - Google Patents
High charging method for hydrogen in hydrogen storage alloyInfo
- Publication number
- JPH08166478A JPH08166478A JP6312046A JP31204694A JPH08166478A JP H08166478 A JPH08166478 A JP H08166478A JP 6312046 A JP6312046 A JP 6312046A JP 31204694 A JP31204694 A JP 31204694A JP H08166478 A JPH08166478 A JP H08166478A
- Authority
- JP
- Japan
- Prior art keywords
- hydrogen
- storage alloy
- hydrogen storage
- light
- alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 title claims abstract description 113
- 229910052739 hydrogen Inorganic materials 0.000 title claims abstract description 113
- 239000001257 hydrogen Substances 0.000 title claims abstract description 113
- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 75
- 239000000956 alloy Substances 0.000 title claims abstract description 75
- 238000000034 method Methods 0.000 title claims description 13
- XLYOFNOQVPJJNP-ZSJDYOACSA-N Heavy water Chemical compound [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 claims abstract description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 13
- JEGUKCSWCFPDGT-UHFFFAOYSA-N h2o hydrate Chemical compound O.O JEGUKCSWCFPDGT-UHFFFAOYSA-N 0.000 claims abstract description 7
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 claims description 21
- 229910052805 deuterium Inorganic materials 0.000 claims description 21
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 abstract description 28
- 238000007747 plating Methods 0.000 abstract description 17
- 229910052763 palladium Inorganic materials 0.000 abstract description 14
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 abstract description 13
- 239000000243 solution Substances 0.000 abstract description 13
- 239000008151 electrolyte solution Substances 0.000 abstract description 12
- 229910052751 metal Inorganic materials 0.000 abstract description 8
- 239000002184 metal Substances 0.000 abstract description 8
- 229910052697 platinum Inorganic materials 0.000 abstract description 6
- UFHFLCQGNIYNRP-VVKOMZTBSA-N Dideuterium Chemical compound [2H][2H] UFHFLCQGNIYNRP-VVKOMZTBSA-N 0.000 abstract 3
- 239000003792 electrolyte Substances 0.000 abstract 2
- 238000005868 electrolysis reaction Methods 0.000 description 12
- 238000007796 conventional method Methods 0.000 description 6
- 239000012535 impurity Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000004927 fusion Effects 0.000 description 2
- 238000010791 quenching Methods 0.000 description 2
- 230000000171 quenching effect Effects 0.000 description 2
- WMFOQBRAJBCJND-DYCDLGHISA-M 12159-20-5 Chemical compound [Li+].[2H][O-] WMFOQBRAJBCJND-DYCDLGHISA-M 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/10—Nuclear fusion reactors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/36—Hydrogen production from non-carbon containing sources, e.g. by water electrolysis
Landscapes
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、水素吸蔵合金への軽水
素または重水素の高充填方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for highly filling a hydrogen storage alloy with light hydrogen or deuterium.
【０００２】[0002]
【従来の技術】常温核融合を用いたエネルギープラント
を実現するためには、重水素の充填率が高くて核融合現
象の再現性がよいパラジウムが必要である。従来の水素
吸蔵合金への水素充填方法を図５により説明すると、３
１が圧力計、３２がバルブ、３３が容器、３４が重水素
ボンベ、３５が水素吸蔵合金（パラジウムまたはその合
金）で、水素吸蔵合金３５を容器３３の重水素（または
軽水素）雰囲気中に置いて、水素吸蔵合金３５に重水素
（または軽水素）を充填するようにしている。2. Description of the Related Art In order to realize an energy plant using cold fusion, it is necessary to use palladium having a high deuterium filling rate and good reproducibility of fusion phenomena. A conventional method for filling hydrogen into a hydrogen storage alloy will be described with reference to FIG.
1 is a pressure gauge, 32 is a valve, 33 is a container, 34 is a deuterium cylinder, 35 is a hydrogen storage alloy (palladium or its alloy), and the hydrogen storage alloy 35 is placed in the deuterium (or light hydrogen) atmosphere of the container 33. Then, the hydrogen storage alloy 35 is filled with deuterium (or light hydrogen).
【０００３】また水素吸蔵合金を陰極電極とし、軽水ま
たは重水を電気分解して、水素吸蔵合金に重水素（また
は軽水素）を充填する水素充填方法も公知である。A hydrogen filling method is also known in which a hydrogen storage alloy is used as a cathode electrode and light water or heavy water is electrolyzed to fill the hydrogen storage alloy with deuterium (or light hydrogen).
【０００４】[0004]
【発明が解決しようとする課題】前記図５に示す従来の
水素吸蔵合金への水素充填方法では、水素吸蔵合金３５
に軽水素または重水素を充填する際、水素吸蔵合金３５
の金属表面が不純物に覆われていたり、金属組織が破壊
されたりしていると、高充填率の水素吸蔵合金が得られ
ない。また適当な条件を整えて水素吸蔵合金に高充填を
行っても、その後、金属表面から軽水素または重水素が
放出して、充填率が低下するという問題があった。According to the conventional method for filling hydrogen into the hydrogen storage alloy shown in FIG. 5, the hydrogen storage alloy 35 is used.
When hydrogen or deuterium is charged into the hydrogen storage alloy 35
If the metal surface of is covered with impurities or the metal structure is destroyed, a hydrogen storage alloy with a high filling rate cannot be obtained. Further, even if the hydrogen storage alloy is highly filled by adjusting appropriate conditions, there is a problem that after that, light hydrogen or deuterium is released from the metal surface and the filling rate is lowered.
【０００５】本発明は前記の問題点に鑑み提案するもの
であり、その目的とする処は、水素吸蔵合金への水素の
充填率を高めることができる水素吸蔵合金への水素高充
填方法を提供しようとする点にある。The present invention has been made in view of the above problems, and an object thereof is to provide a method for highly filling hydrogen into a hydrogen storage alloy, which can increase the filling rate of hydrogen into the hydrogen storage alloy. There is a point to try.
【０００６】[0006]
【課題を解決するための手段】上記の目的を達成するた
めに、本発明の水素吸蔵合金への水素高充填方法は、水
素吸蔵合金を陰極電極とし、軽水または重水を電気分解
して、同陰極電極に軽水素または重水素を充填し、次い
で陰極電極を金属メッキすることを特徴としている。In order to achieve the above object, a method for highly filling hydrogen into a hydrogen storage alloy according to the present invention is to use a hydrogen storage alloy as a cathode electrode to electrolyze light water or heavy water, It is characterized in that the cathode electrode is filled with light hydrogen or deuterium, and then the cathode electrode is metal-plated.
【０００７】[0007]
【作用】本発明のた水素吸蔵合金への水素高充填方法は
前記のように水素吸蔵合金（パラジウムまたはその合
金）を陰極電極とし、白金を陽極電極として、軽水また
は重水を電気分解し（図１参照）、水素吸蔵合金に十分
に軽水素または重水素を充填したら、メッキ溶液を電解
液中へ投入して、水素吸蔵合金の表面を金属メッキする
（図２参照）。またメッキ溶液が電解液に溶解不可能で
あれば、水素吸蔵合金を電解溶液から取り出して、それ
を別に用意したメッキ溶液中に浸漬して、水素吸蔵合金
の表面を金属メッキする（図３参照）。このように水素
吸蔵合金に軽水素または重水素を充填した後、水素吸蔵
合金の表面を金属メッキするので、軽水素または重水素
が拡散により水素吸蔵合金の内部から表面を経て外部へ
放出されなくなって、水素吸蔵合金への水素の充填率が
高められる。なお必要に応じて水素吸蔵合金に軽水素ま
たは重水素を充填する前に、水素吸蔵合金を熱処理すれ
ば、充填の妨げになる母材内の転位、及び表面にあるク
ラックや不純物がなくなって、水素吸蔵合金への水素の
充填率がさらに高められる。As described above, the method for highly filling hydrogen into a hydrogen storage alloy of the present invention uses a hydrogen storage alloy (palladium or an alloy thereof) as a cathode electrode and platinum as an anode electrode to electrolyze light water or heavy water (see FIG. 1)), when the hydrogen storage alloy is sufficiently filled with light hydrogen or deuterium, the plating solution is poured into the electrolytic solution to metal-plat the surface of the hydrogen storage alloy (see FIG. 2). If the plating solution cannot be dissolved in the electrolytic solution, the hydrogen storage alloy is taken out of the electrolytic solution and immersed in a separately prepared plating solution to perform metal plating on the surface of the hydrogen storage alloy (see FIG. 3). ). After filling the hydrogen storage alloy with light hydrogen or deuterium in this way, the surface of the hydrogen storage alloy is metal-plated, so that light hydrogen or deuterium is not released to the outside from the inside of the hydrogen storage alloy through the surface due to diffusion. As a result, the filling rate of hydrogen into the hydrogen storage alloy is increased. If necessary, before filling the hydrogen-absorbing alloy with light hydrogen or deuterium, if the hydrogen-absorbing alloy is heat-treated, dislocations in the base material that hinder filling, and cracks and impurities on the surface disappear, The filling rate of hydrogen into the hydrogen storage alloy is further increased.
【０００８】[0008]
【実施例】次に本発明の水素吸蔵合金への水素高充填方
法の実施例を図１〜図３により説明すると、図１の１が
電源、７が電気分解セル、２が電気分解セル７中の発熱
量を計測するために設置した熱電対、３が閉鎖系での発
生熱量の評価に用いるために設置した冷却管、４が電気
分解の結果発生した水素と酸素とを水に戻すために設置
した触媒、５が陽極電極、６が水素吸蔵合金（パラジウ
ムまたは合金）、８が電解溶液（軽水または重水）であ
る。EXAMPLE An example of a method for highly filling hydrogen into a hydrogen storage alloy according to the present invention will be described with reference to FIGS. 1 to 3. 1 in FIG. 1 is a power source, 7 is an electrolysis cell, and 2 is an electrolysis cell 7. A thermocouple installed to measure the amount of heat generated inside, a cooling pipe installed to use 3 for evaluating the amount of heat generated in a closed system, and 4 to return hydrogen and oxygen generated as a result of electrolysis to water The catalyst installed in the above, 5 is an anode electrode, 6 is a hydrogen storage alloy (palladium or alloy), and 8 is an electrolytic solution (light water or heavy water).
【０００９】図２、図３の９がメッキ溶液、図２の１０
がバルブである。水素吸蔵合金６に軽水素または重水素
を充填するに当たっては、先ず図１に示すように水素吸
蔵合金（パラジウムまたはその合金）６を陰極電極と
し、白金を陽極電極５とし、電解溶液（軽水または重
水）８を電気分解セル７に注入し、電解溶液８を電気分
解して、軽水素または重水素を水素吸蔵合金６に十分に
充填する。2 and 3 are plating solutions, and 10 in FIG.
Is a valve. When filling the hydrogen storage alloy 6 with light hydrogen or deuterium, first, as shown in FIG. 1, the hydrogen storage alloy (palladium or its alloy) 6 is used as the cathode electrode, platinum is used as the anode electrode 5, and the electrolytic solution (light water or (Heavy water) 8 is injected into the electrolysis cell 7, and the electrolytic solution 8 is electrolyzed to sufficiently fill the hydrogen storage alloy 6 with light hydrogen or deuterium.
【００１０】次いで図２に示すようにメッキ溶液９を電
解溶液８中へ投入して、水素吸蔵合金６の表面を金属メ
ッキする。またメッキ溶液９が電解溶液８に溶解不可能
であれば、水素吸蔵合金６を電解溶液８から取り出し
て、図３に示すように水素吸蔵合金６を別に用意したメ
ッキ溶液９中に浸漬して、水素吸蔵合金６の表面を金属
メッキする。Then, as shown in FIG. 2, the plating solution 9 is put into the electrolytic solution 8 to metal-plat the surface of the hydrogen storage alloy 6. If the plating solution 9 cannot be dissolved in the electrolytic solution 8, the hydrogen storage alloy 6 is taken out from the electrolytic solution 8 and the hydrogen storage alloy 6 is immersed in the separately prepared plating solution 9 as shown in FIG. , The surface of the hydrogen storage alloy 6 is metal-plated.
【００１１】このように水素吸蔵合金６に軽水素または
重水素を充填した後、水素吸蔵合金６の表面を金属メッ
キするので、軽水素または重水素が拡散により水素吸蔵
合金６の内部から表面を経て外部へ放出されることがな
くて、水素吸蔵合金への水素の充填率が高められる。な
お必要に応じて水素吸蔵合金６に軽水素または重水素を
充填する前に、水素吸蔵合金６を熱処理してもよく、こ
のようにすれば、充填の妨げになる母材内の転位、及び
表面にあるクラックや不純物がなくなって、水素吸蔵合
金６への水素の充填率がさらに高められる。After filling the hydrogen storage alloy 6 with light hydrogen or deuterium in this way, the surface of the hydrogen storage alloy 6 is metal-plated, so that the light hydrogen or deuterium diffuses from the inside of the hydrogen storage alloy 6 to the surface. After that, the hydrogen is not released to the outside, and the filling rate of hydrogen in the hydrogen storage alloy is increased. If necessary, the hydrogen storage alloy 6 may be heat-treated before filling the hydrogen storage alloy 6 with light hydrogen or deuterium. In this case, dislocations in the base material that hinder filling and The cracks and impurities on the surface are eliminated, and the filling rate of hydrogen into the hydrogen storage alloy 6 is further increased.
【００１２】前記電気分解セル７の寸法は、内径φ３０
ｍｍ、深さ１００ｍｍ、厚さ１ｍｍ、材質はガラスであ
る。電解溶液８には、１規定のＬｉＯＤ重水溶液を用い
た。陰極電極６に用いたパラジウムの寸法は、φ３ｍ
ｍ、長さ２５ｍｍであり、これに白金線をまき付けて、
リード線とした。陽極５には、白金を用いた。The size of the electrolysis cell 7 is 30 mm in inner diameter.
mm, depth 100 mm, thickness 1 mm, and the material is glass. As the electrolytic solution 8, a 1N LiOD heavy aqueous solution was used. The size of palladium used for the cathode electrode 6 is φ3 m.
m, the length is 25 mm, and the platinum wire is sprinkled on it.
The lead wire. Platinum was used for the anode 5.
【００１３】パラジウムは、大気中で９００℃に加熱し
た後、純水中クエンチまたは溶融後に純水中クエンチと
いう熱処理を施した。全電解時間は、２４時間で、最初
の２３時間での電解電流値は、０．１ｍＡとし、残り１
時間での電解電流値は、５００ｍＡとした。電気分解終
了後、パラジウム陰極電極６及び白金陽極電極５を純水
（軽水）により洗浄した後、０．１ｍｏｌ／ｌの硫酸銅
水溶液に浸漬して、電解電流０．１ｍＡ、メッキ時間５
ｓｅｃでメッキを行った。Palladium was heated to 900 ° C. in the atmosphere and then subjected to a heat treatment called quenching in pure water or quenching in pure water after melting. The total electrolysis time is 24 hours, the electrolysis current value in the first 23 hours is 0.1 mA, and the remaining 1
The electrolytic current value over time was 500 mA. After completion of the electrolysis, the palladium cathode electrode 6 and the platinum anode electrode 5 were washed with pure water (light water), and then immersed in a 0.1 mol / l copper sulfate aqueous solution to give an electrolytic current of 0.1 mA and a plating time of 5
Plated in sec.
【００１４】図４は、本発明により処理したパラジウム
と、従来の方法により処理したパラジウムとの充填率を
比較した説明図である。この図から、本発明の方法で
は、従来の方法に比べて充填率が向上していることが判
る。FIG. 4 is an explanatory view comparing the filling rates of palladium treated according to the present invention and palladium treated by the conventional method. From this figure, it can be seen that the method of the present invention has an improved filling rate as compared with the conventional method.
【００１５】[0015]
【発明の効果】本発明のた水素吸蔵合金への水素高充填
方法は前記のように水素吸蔵合金（パラジウムまたはそ
の合金）を陰極電極とし、白金を陽極電極とし、軽水ま
たは重水を電気分解して、水素吸蔵合金に軽水素または
重水素を十分に充填したら、メッキ溶液を電解液中へ投
入して、水素吸蔵合金の表面を金属メッキするか、メッ
キ溶液中に水素吸蔵合金を浸漬して、水素吸蔵合金の表
面を金属メッキするので、軽水素または重水素を拡散に
より水素吸蔵合金の内部から表面を経て外部へ放出する
ことがなくて、水素吸蔵合金への水素の充填率を高める
ことができる。As described above, the method for highly filling hydrogen into a hydrogen storage alloy of the present invention uses a hydrogen storage alloy (palladium or its alloy) as a cathode electrode, platinum as an anode electrode, and electrolysis of light water or heavy water. Then, when the hydrogen storage alloy is sufficiently filled with light hydrogen or deuterium, the plating solution is put into the electrolytic solution and the surface of the hydrogen storage alloy is metal-plated, or the hydrogen storage alloy is immersed in the plating solution. Since the surface of the hydrogen storage alloy is metal-plated, light hydrogen or deuterium is not released from the inside of the hydrogen storage alloy through the surface to the outside by diffusion, and the filling rate of hydrogen into the hydrogen storage alloy is increased. You can
【図１】本発明の水素吸蔵合金への水素高充填方法の電
気分解工程を示す縦断側面図である。FIG. 1 is a vertical cross-sectional side view showing an electrolysis step of a method for highly filling hydrogen into a hydrogen storage alloy of the present invention.
【図２】同水素高充填方法のメッキ工程の一例を示す縦
断側面図である。FIG. 2 is a vertical cross-sectional side view showing an example of a plating step of the method of highly filling hydrogen.
【図３】同水素高充填方法のメッキ工程の他の例を示す
縦断側面図である。FIG. 3 is a vertical cross-sectional side view showing another example of the plating step of the method for highly filling hydrogen.
【図４】本発明により処理したパラジウムと、従来の方
法により処理したパラジウムとの充填率を比較した説明
図である。FIG. 4 is an explanatory diagram comparing the filling rates of palladium treated according to the present invention and palladium treated by a conventional method.
【図５】従来の水素吸蔵合金への水素充填方法を示す縦
断側面図である。FIG. 5 is a vertical cross-sectional view showing a conventional method for filling hydrogen into a hydrogen storage alloy.
１ 電源 ２ 熱電対 ３ 冷却管 ４ 触媒 ５ 陽極電極 ６ 水素吸蔵合金（陰極電極） ７ 電気分解セル ８ 電解溶液 ９ メッキ液 １０ バルブ 1 Power Supply 2 Thermocouple 3 Cooling Tube 4 Catalyst 5 Anode Electrode 6 Hydrogen Storage Alloy (Cathode Electrode) 7 Electrolysis Cell 8 Electrolysis Solution 9 Plating Solution 10 Valve
Claims (1)
は重水を電気分解して、同陰極電極に軽水素または重水
素を充填し、次いで陰極電極を金属メッキすることを特
徴とした水素吸蔵合金への水素高充填方法。1. A hydrogen storage alloy, characterized in that a hydrogen storage alloy is used as a cathode electrode, light water or heavy water is electrolyzed, the same cathode electrode is filled with light hydrogen or deuterium, and then the cathode electrode is metal-plated. High filling method for hydrogen.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6312046A JPH08166478A (en) | 1994-12-15 | 1994-12-15 | High charging method for hydrogen in hydrogen storage alloy |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6312046A JPH08166478A (en) | 1994-12-15 | 1994-12-15 | High charging method for hydrogen in hydrogen storage alloy |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08166478A true JPH08166478A (en) | 1996-06-25 |
Family
ID=18024572
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6312046A Withdrawn JPH08166478A (en) | 1994-12-15 | 1994-12-15 | High charging method for hydrogen in hydrogen storage alloy |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08166478A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001026117A1 (en) * | 1999-10-04 | 2001-04-12 | Daikin Plant Co., Ltd. | Thermal energy extraction apparatus, hot-water supply, and electric generator |
| JP2004527661A (en) * | 2001-05-30 | 2004-09-09 | エネルゲティックス テクノロジーズ， エル．エル．シー． | Pulse electrolytic layer |
| CN105780043A (en) * | 2016-02-04 | 2016-07-20 | 福建方明环保科技股份有限公司 | Equipment and method for extracting deuterium-gas-containing gas from water |
-
1994
- 1994-12-15 JP JP6312046A patent/JPH08166478A/en not_active Withdrawn
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001026117A1 (en) * | 1999-10-04 | 2001-04-12 | Daikin Plant Co., Ltd. | Thermal energy extraction apparatus, hot-water supply, and electric generator |
| JP2004527661A (en) * | 2001-05-30 | 2004-09-09 | エネルゲティックス テクノロジーズ， エル．エル．シー． | Pulse electrolytic layer |
| JP2010174379A (en) * | 2001-05-30 | 2010-08-12 | Energetics Technologies Llc | Pulsed electrolytic cell |
| CN105780043A (en) * | 2016-02-04 | 2016-07-20 | 福建方明环保科技股份有限公司 | Equipment and method for extracting deuterium-gas-containing gas from water |
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Legal Events
| Date | Code | Title | Description |
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| A300 | Application deemed to be withdrawn because no request for examination was validly filed |
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