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JPH0798980B2 - Distillation purification method - Google Patents

Distillation purification method

Info

Publication number
JPH0798980B2
JPH0798980B2 JP62264013A JP26401387A JPH0798980B2 JP H0798980 B2 JPH0798980 B2 JP H0798980B2 JP 62264013 A JP62264013 A JP 62264013A JP 26401387 A JP26401387 A JP 26401387A JP H0798980 B2 JPH0798980 B2 JP H0798980B2
Authority
JP
Japan
Prior art keywords
container
carrier gas
condensation
evaporation
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62264013A
Other languages
Japanese (ja)
Other versions
JPH01108322A (en
Inventor
良一 大野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Japan Energy Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Energy Corp filed Critical Japan Energy Corp
Priority to JP62264013A priority Critical patent/JPH0798980B2/en
Publication of JPH01108322A publication Critical patent/JPH01108322A/en
Publication of JPH0798980B2 publication Critical patent/JPH0798980B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/20Recycling

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  • Manufacture And Refinement Of Metals (AREA)

Description

【発明の詳細な説明】 産業上の利用分野 本発明は比較的融点が低く且つ蒸気圧が高い金属の蒸留
精製方法に関するものであり、特にはSe、Cd、Zn、Te、
Sb、Pb等の金属を筒状の水平容器内で大気圧以上の圧力
においてキャリアガスを流通させながら蒸発及び凝縮を
行わせる蒸留精製方法に関する。本発明はAnSe、ZnTe、
CdTe等に代表されるII-VI族化合物半導体、III−V族化
合物半導体等の化合物半導体を合成するための原料とし
て供される高純度金属の製造に有用である。
TECHNICAL FIELD The present invention relates to a method for distilling and refining a metal having a relatively low melting point and a high vapor pressure, and particularly to Se, Cd, Zn, Te,
The present invention relates to a distillation and purification method in which a metal such as Sb or Pb is evaporated and condensed in a cylindrical horizontal container at a pressure of atmospheric pressure or higher while a carrier gas is circulated. The present invention is AnSe, ZnTe,
It is useful for producing a high-purity metal used as a raw material for synthesizing a compound semiconductor such as a II-VI group compound semiconductor represented by CdTe and a III-V group compound semiconductor.

従来技術とその問題点 近年、化合物半導体を合成するための原料として供され
る金属の純度に対する要求は益々高くなっている。化合
物半導体を構成する元素としては、比較的融点が低くし
かも蒸気圧の高い金属が多く、その例はSe、Cd、Zn、T
e、Sb、Pb等である。こうした金属の高純化要求を満す
ため従来から幾つかの精製方法が実施されてきたが、中
でも蒸留法はきわめて有効な手段である。
2. Description of the Related Art In recent years, there have been increasing demands for the purity of metals used as raw materials for synthesizing compound semiconductors. Many of the elements that make up compound semiconductors have relatively low melting points and high vapor pressures, such as Se, Cd, Zn, and T.
e, Sb, Pb, etc. In order to satisfy the requirement for high purity of such metals, several purification methods have been conventionally carried out, but the distillation method is a very effective means.

金属の蒸気圧は融点近傍ではさほど高くない場合が多い
ため、従来、蒸留を効率良く行わしめるために減圧下で
高温に加熱する減圧蒸留法が採用されてきた。
Since the vapor pressure of metal is often not so high in the vicinity of the melting point, a vacuum distillation method of heating to a high temperature under a reduced pressure has been conventionally used in order to perform the distillation efficiently.

第2及び3図は、こうした従来装置の例を示す。第2図
は、カドミウム、亜鉛等の減圧(真空)蒸留装置を示
す。石英るつぼ21の底端の蒸発部23に原料が装入され
る。石英るつぼ21は、石英炉芯管25に収納されている。
石英炉芯管25及びるつぼ21は、蒸発部において加熱炉27
内に配置される。石英炉芯管の上端は真空排気口29とし
て真空ポンプに接続されている。加熱炉27の上方には、
蒸発成分を凝縮せしめる為の水冷装置28が石英炉芯管を
取巻いて設けられ、凝縮部22を構成する。
2 and 3 show examples of such conventional devices. FIG. 2 shows a vacuum (vacuum) distillation apparatus for cadmium, zinc and the like. Raw materials are charged into the evaporation section 23 at the bottom end of the quartz crucible 21. The quartz crucible 21 is housed in a quartz furnace core tube 25.
The quartz furnace core tube 25 and the crucible 21 are heated by the heating furnace 27 in the evaporation section.
Placed inside. The upper end of the quartz furnace core tube is connected to a vacuum pump as a vacuum exhaust port 29. Above the heating furnace 27,
A water cooling device (28) for condensing the vaporized components is provided around the quartz furnace core tube and constitutes a condensing part (22).

第3図は横型のテルル減圧(真空)精留装置を示す。容
器31の炉壁32内部が蒸発部33を構成する。グラファイト
ボート30内に原料テルルが装入される。炉壁外部に突出
する容器31の外端は真空排気口35において真空ポンプに
接続される。容器31の外端部は水冷装置36により水冷さ
れる。炉壁の外側に凝縮部34が構成され、そこには例え
ばステンレス製の凝縮用容器37が挿入されており、その
内部に凝縮テルルが付着する。
FIG. 3 shows a horizontal tellurium decompression (vacuum) rectification unit. The inside of the furnace wall 32 of the container 31 constitutes the evaporation section 33. Raw material tellurium is charged into the graphite boat 30. The outer end of the container 31 protruding outside the furnace wall is connected to a vacuum pump at a vacuum exhaust port 35. The outer end of the container 31 is water-cooled by the water cooling device 36. A condenser 34 is formed outside the furnace wall, and a condenser container 37 made of, for example, stainless is inserted therein, and condensed tellurium adheres to the inside thereof.

しかしながら、こうした減圧(真空)蒸留法には、次の
ような幾つかの重大な欠点が存在する。
However, these vacuum (vacuum) distillation methods have some serious drawbacks:

(1) 半導体等の高純度用途に供される金属において
は、微量の酸化物の含有も回避せねばならない。その
為、減圧蒸留を行う場合、高真空が得られる高価な設備
を必要とし、製造コストがきわめて高くなる。
(1) In metals used for high-purity applications such as semiconductors, it is necessary to avoid the inclusion of trace amounts of oxides. Therefore, when performing vacuum distillation, expensive equipment that can obtain a high vacuum is required, and the manufacturing cost becomes extremely high.

(2) 高温の蒸発部から発生した蒸発気体金属成分は
低温の真空排気側へ迅やかに移動するため、蒸発金属成
分を高収率で回収するには、蒸発部と真空排気口との間
に冷却トラップを設けるか或いは邪魔板を設ける等の工
夫を要する。
(2) Evaporative gas metal components generated from the high temperature evaporating part move quickly to the low temperature evacuation side. Therefore, in order to recover the evaporating metal component with high yield, the evaporating part and the evacuation port should be connected. A device such as a cooling trap or a baffle plate must be provided between them.

(3) しかも、こうした工夫を施した場合でも、蒸発
金属は真空排気口側に逃げるため、回収率が非常に悪
い。
(3) Moreover, even if such a measure is taken, the recovery rate is very poor because the evaporated metal escapes to the vacuum exhaust port side.

(4) 回収された金属の一部或いは大半は表面積が大
きな粒状或いは粉状で凝縮部に堆積するため、蒸留過程
或いは蒸留終了後大気に開放した際に酸化が生じ易い。
(4) Since a part or most of the recovered metal is deposited in the condensing part in the form of particles or powder having a large surface area, oxidation is likely to occur during the distillation process or when it is opened to the atmosphere after the distillation.

(5) 表面積の小さな一定形状のインゴット状にする
ためには、再度、凝縮物のみを加熱・融解する必要があ
る。
(5) Only the condensate needs to be heated and melted again in order to form an ingot having a small surface area and a fixed shape.

上記第3図のテルル蒸留装置を例にとると、排気口は高
価な真空設備に接続され、高温の蒸発部から蒸発した高
純度テルル気体は外部から冷却された凝縮用容器内に捕
集されそして凝縮されるが、一部は凝縮用容器外に逃げ
るので、回収率が悪い。凝縮テルルは、粒状で表面が若
干酸化される上に、蒸留終了後改めて容器のみを別の装
置内で加熱して凝縮テルルを融解しない限りインゴット
状の高純度テルルは得られない。
Taking the tellurium distillation apparatus shown in FIG. 3 as an example, the exhaust port is connected to an expensive vacuum facility, and the high-purity tellurium gas evaporated from the high-temperature evaporation section is collected in the condensing container cooled from the outside. Then, it is condensed, but part of it escapes to the outside of the condensation container, so the recovery rate is poor. Condensed tellurium is granular and its surface is slightly oxidized. In addition, ingot-shaped high-purity tellurium cannot be obtained unless the condensed tellurium is melted by heating only the container in another apparatus after the completion of distillation.

上記した如く、従来からの金属減圧蒸留方法において
は、高真空を得られる設備を必要とする上に、蒸発成分
の効率での回収が困難なこと、酸化が生じやすいこと、
インゴットを直接生成しえないこと等の問題が存在し
た。
As described above, in the conventional metal vacuum distillation method, in addition to requiring equipment capable of obtaining a high vacuum, it is difficult to efficiently recover the vaporized components, and oxidation easily occurs.
There were problems such as inability to directly generate ingots.

発明の目的 本発明は、かかる技術的問題を解決することを目的とす
るもので、特にSe、Cd、Zn、Te、Sb、Pb等の比較的融点
が低くしかも蒸気圧が高い金属を安価な設備で蒸留し、
精製された金属を酸化され難いインゴット状として高率
で回収する方法を開発せんとするものである。
OBJECT OF THE INVENTION The present invention is intended to solve such a technical problem, and particularly metal such as Se, Cd, Zn, Te, Sb and Pb having a relatively low melting point and a high vapor pressure is inexpensive. Distill in equipment,
It aims to develop a method for recovering refined metals in the form of ingots that are difficult to oxidize at a high rate.

発明の概要 上記目的の実現に向け、本発明者等は従来からの減圧蒸
留の概念を放棄し、新たな蒸留技術の確立に取組んだ結
果、キャリアガスを使用して大気圧以上の圧力下での蒸
留技術の開発に成功した。蒸発速度を高めるには、原料
の表面直上に存在して蒸発速度を律すると考えられる拡
散層の厚さを小さくすることが必要であり、このために
キャリアガスを蒸発部に吹込むと同時に、このキャリア
ガスを蒸発成分の強制移送手段として活用することを想
到した。キャリアガスにより蒸発成分をガス流下手側に
移送し、この部分に凝縮させることにより、蒸発成分が
他の部分に拡散して回収率が低下するのを防止すること
ができる。蒸留を大気圧以上の圧力で行うことによっ
て、容器内で生じた蒸発成分が再凝縮する温度を高める
ことが出来、蒸発成分を表面積の小さい液体状で凝縮さ
せ、所望の蒸留率に達した後にそのまま冷却することに
よりほとんど酸化のないインゴットの直接回収が可能と
なる。
SUMMARY OF THE INVENTION To achieve the above object, the present inventors abandoned the conventional concept of vacuum distillation and worked on the establishment of a new distillation technique, and as a result, a carrier gas was used under atmospheric pressure or higher. Succeeded in developing the distillation technology. In order to increase the evaporation rate, it is necessary to reduce the thickness of the diffusion layer which is present immediately above the surface of the raw material and which is thought to control the evaporation rate. Therefore, at the same time when the carrier gas is blown into the evaporation section, It was conceived to utilize this carrier gas as a means for forcibly transferring the vaporized components. By transporting the vaporized component to the downstream side of the gas flow by the carrier gas and condensing it in this portion, it is possible to prevent the vaporized component from diffusing to other portions and lowering the recovery rate. By performing the distillation at a pressure higher than atmospheric pressure, the temperature at which the vaporized components generated in the container are recondensed can be increased, and the vaporized components are condensed in a liquid form with a small surface area, and after reaching the desired distillation rate. By cooling as it is, it is possible to directly recover the ingot with almost no oxidation.

こうした知見の下で、本発明は、蒸発部と凝縮部とを具
備しそして該蒸発部に金属原料を装入した。筒状容器を
該蒸発部と凝縮部とに対応する温度分布を有する加熱炉
に挿入し、大気圧以上の圧力下において、キャリアガス
を該蒸発部から凝縮部に向う方向に流通させながら該蒸
発部における金属原料を加熱し、蒸発した金属成分をキ
ャリアガスにより前記凝縮部に移送しそして該凝縮部に
おいて蒸発金属成分を凝縮せしめることを特徴とする蒸
留精製方法を提供する。容器としては、上下2分割式の
横型筒状容器であり、該容器の下側部分の内面に蒸発部
と凝縮部とを文画する少くとも一か所以上の仕切りを有
し、そして容器の蒸発部側の一端にキャリアガスの導入
口をそして他端にキャリアガス排出口を備える構造のも
のが好ましい。容器を同一材質の管材に装通し、そして
管材ごと加熱炉に挿入することも効果的である。
Based on these findings, the present invention comprises an evaporation section and a condensation section, and charged the metal raw material into the evaporation section. The tubular container is inserted into a heating furnace having a temperature distribution corresponding to the evaporating section and the condensing section, and under the pressure of atmospheric pressure or higher, the carrier gas is circulated in the direction from the evaporating section toward the condensing section. There is provided a distillation and purification method characterized in that the metal raw material in the section is heated, the vaporized metal component is transferred to the condensing section by a carrier gas, and the vaporized metal component is condensed in the condensing section. The container is a horizontal tubular container that is divided into upper and lower halves, and has at least one partition that defines an evaporation part and a condensation part on the inner surface of the lower part of the container, and A structure having an inlet for carrier gas at one end on the side of the evaporator and a carrier gas outlet at the other end is preferable. It is also effective to insert the container into a pipe material of the same material and insert the whole pipe material into a heating furnace.

発明の具体的説明 第1図を参照して、本発明について説明する。本発明が
対象とする金属は、Se、Cd、Zn、Te、Sb、Pb等の比較的
融点が低くしかも蒸気圧が高い金属であり、これらを5N
-6Nの超高純度に蒸留精製せんとするものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention will be described with reference to FIG. The metal targeted by the present invention is a metal having a relatively low melting point such as Se, Cd, Zn, Te, Sb, and Pb, and a high vapor pressure.
-6N is an ultra-high-purity distillation purification system.

原料を納める容器は、蒸発部と凝集部とを具備する筒状
容器であれば、任意の型式のものが使用できるが、上下
2分割式の横型筒状容器とし、下側部分に蒸発部と凝縮
部とを分画する仕切りを有する構造のものが好ましい。
原料を収納するトレイを単に置いて蒸発部を構成しても
よい。凝縮部を複数の区画に仕切ってもよい。容器の材
質は、対象とする金属と溶解反応せずしかも濡れ性の悪
い材料を選択することにより、精製効果が向上し、凝縮
した精製金属及び蒸留残渣の回収が容易となる。一般
に、高純度の黒鉛、石英、窒化ホウ素等のセラミクスそ
の他を用いることが出来る。
The container for storing the raw materials may be of any type as long as it is a cylindrical container having an evaporating section and an aggregating section. A structure having a partition that separates the condensation part is preferable.
The evaporation unit may be configured by simply placing a tray for storing the raw materials. The condenser section may be divided into a plurality of compartments. By selecting a material that does not undergo a dissolution reaction with the target metal and has poor wettability as the material of the container, the refining effect is improved, and the condensed refined metal and the distillation residue are easily recovered. Generally, high-purity graphite, quartz, ceramics such as boron nitride, or the like can be used.

第1図において、筒状の容器1は、仕切り3によって蒸
発部5と凝縮部7とに分画される。蒸発部5には原料R
が装入される。容器1の蒸発部側の端には、水素、不活
性ガス等のキャリアガスを容器内に導入するためのガス
導入管9を挿込む為の口11が設けられる。容器の凝縮部
側の端にはキャリアガス排出口13が設けられる。
In FIG. 1, the cylindrical container 1 is divided into an evaporator 5 and a condenser 7 by a partition 3. Raw material R in the evaporator 5
Is charged. A port 11 for inserting a gas introduction pipe 9 for introducing a carrier gas such as hydrogen or an inert gas into the container is provided at the end of the container 1 on the evaporation section side. A carrier gas discharge port 13 is provided at the end of the container on the condensation section side.

容器1は、加熱炉内に、ここでは炉芯管15内に挿入され
る。炉芯管15内の温度分布は蒸発部と凝縮部とに対応し
て適正な温度分布が設定される。温度分布は、精製され
る金属に応じて選定され、例えば蒸発部を融点+90〜11
0℃(例えば100℃)にそして凝縮部を融点+5〜15℃
(例えば+10℃)と設定するとよい。
The container 1 is inserted into a heating furnace, here a furnace core tube 15. The temperature distribution inside the furnace core tube 15 is set to an appropriate temperature distribution corresponding to the evaporation section and the condensation section. The temperature distribution is selected according to the metal to be refined. For example, the evaporation part has a melting point of +90 to 11
To 0 ℃ (eg 100 ℃) and the condensing part melting point +5 to 15 ℃
(For example, + 10 ℃) should be set.

キャリアガス導入口からキャリアガスを大気圧以上の圧
力で流通すると同時に炉芯管内の温度分布を所定に設定
することにより、蒸発部にて発生する蒸発成分は蒸発部
から凝縮部へと移送される。蒸発部を流れるキャリアガ
スは、原料溶融面直上の拡散層を払掃し、蒸発速度を高
める。こうして、次々と発生する金属成分は、凝縮部に
移送され、ここで液体状態で凝縮捕集せしめられる。雰
囲気が大気圧以上にあるため、蒸発成分は液体状で凝縮
部の底面に貯まる。
By circulating the carrier gas at a pressure higher than atmospheric pressure from the carrier gas inlet, and at the same time setting the temperature distribution in the furnace core tube to a predetermined value, the evaporation components generated in the evaporation section are transferred from the evaporation section to the condensation section. . The carrier gas flowing through the evaporation section sweeps the diffusion layer directly above the raw material melting surface to increase the evaporation rate. In this way, the metal components generated one after another are transferred to the condensing part, where they are condensed and collected in a liquid state. Since the atmosphere is at atmospheric pressure or higher, the vaporized component is stored in a liquid state at the bottom of the condenser.

所望の蒸留率、(原料挿入重量−残渣重量)/原料装入
重量×100(%)に達したとき、凝縮部はそのまま冷却
され、直接インゴット状で回収される。
When the desired distillation rate (raw material insertion weight-residue weight) / raw material charging weight x 100 (%) is reached, the condenser is cooled as it is and directly recovered in the form of an ingot.

第1図において、容器1は、それと同一の材質から成る
管材17内に装通されている。こうすることにより、蒸留
中にごく僅かながら容器外に漏出した蒸発物はすべてこ
の管材の内面に捕集されるため、精製物の回収率が更に
向上すると共に、炉芯管内面への蒸発物の付着を皆無と
することが可能である。
In FIG. 1, the container 1 is inserted into a pipe material 17 made of the same material as the container 1. By doing so, all the vaporized substances that leaked out to the outside of the container during the distillation were collected to the inner surface of this tube material, so the recovery rate of the purified product was further improved and the vaporized material to the inner surface of the furnace core tube was further improved. Can be eliminated.

キャリアガスとしては不活性ガス或いは水素ガスが用い
られるが、特に操業温度で水素化物を生成しない金属を
扱う場合には高純度水素ガスの使用が精製金属水の酸素
含有量を低減するために有効である。
Inert gas or hydrogen gas is used as the carrier gas, but the use of high-purity hydrogen gas is effective for reducing the oxygen content of purified metal water, especially when dealing with metals that do not form hydrides at operating temperatures. Is.

容器内圧力は、ガス排出口を出た後、液中バブリングせ
しめることにより大気圧〜大気圧+数10mmH2O程度に維
持される。
The pressure inside the container is maintained at about atmospheric pressure to atmospheric pressure + several tens of mmH 2 O by bubbling in the liquid after leaving the gas outlet.

こうして、凝縮部において粒状ではなくインゴット状の
高純度に蒸留された精製金属が得られる。
In this way, in the condensation part, refined metal that has been distilled to a high purity in the form of an ingot rather than a grain is obtained.

実施例1 第1図に示した装置を用いて、99.998%純度の金属Cdの
蒸留精製を行った。容器は、上下2分割式の高純度黒鉛
製容器とし、その寸法は内寸70mmφ×900mmLとした。容
器の長さのうち300mmを蒸留部としそして残り600mmを凝
縮部として仕切った。
Example 1 Using the apparatus shown in FIG. 1, 99.998% pure metal Cd was purified by distillation. The container was a high-purity graphite container that was divided into two upper and lower parts, and the dimensions were 70 mmφ × 900 mmL inside dimensions. Of the length of the vessel, 300 mm was partitioned as the distillation section and the remaining 600 mm as the condensation section.

蒸発部に原料Cdインゴットを2kg装入した後上蓋をセッ
トし、高純度黒鉛製の管材(内寸85mmφX1,100mmL)に
装通した状態で炉芯管内に挿入した。
After loading 2 kg of the raw material Cd ingot into the evaporation part, the upper lid was set, and the tube was inserted into the furnace core tube while being inserted into a high-purity graphite tube material (internal dimensions 85 mmφ x 1,100 mmL).

炉芯管内を一旦真空引きした後、高純度水素ガスを大気
圧で2l/分流通せしめながら、蒸発部を750℃そして凝縮
部を350℃に加熱した。
After the inside of the furnace core tube was once evacuated, high-purity hydrogen gas was allowed to flow at 2 l / min at atmospheric pressure while heating the evaporation part to 750 ° C and the condensation part to 350 ° C.

その結果、蒸留率は3時間で80%に達し、そこで冷却を
行った。冷却後、原料の98%(1560g)は凝縮部から金
属光沢をしたインゴット状で回収され、残量(40g)は
管材の内面に付着したが、容易に回収された。第1表に
精製Cdの分析値を原料Cdのそれと併せて示す。また、残
留抵抗値比(273K中の電気抵抗値/4.2Kの電気抵抗値を
云い、純度の指標として用いられる)及び収率をも同表
に示した。
As a result, the distillation rate reached 80% in 3 hours, and cooling was performed there. After cooling, 98% (1560 g) of the raw material was recovered from the condensing part in the form of a metallic luster ingot, and the remaining amount (40 g) adhered to the inner surface of the pipe material, but was easily recovered. Table 1 shows the analytical values of the purified Cd together with those of the raw material Cd. The table also shows the residual resistance value ratio (electrical resistance value in 273K / electrical resistance value of 4.2K, which is used as an index of purity) and yield.

比較例 比較例として第2図に示した減圧蒸留装置を用いて実施
例1と同じ99.998%純度の金属Cdを減圧蒸留した。石英
製ルツボの寸法は内寸60mmφ×90mmLであった。2Kgの原
料Cdをルツボ底に装入し、真空排気しながらルツボ下部
を400℃に加熱し、ルツボ上部を水冷した。
Comparative Example As a comparative example, using the vacuum distillation apparatus shown in FIG. 2, metal Cd having the same 99.998% purity as in Example 1 was vacuum distilled. The size of the quartz crucible was 60 mmφ × 90 mmL. 2 kg of raw material Cd was charged in the crucible bottom, the lower part of the crucible was heated to 400 ° C. while being evacuated, and the upper part of the crucible was water-cooled.

その結果、蒸留率は2時間で80%に達したが、蒸発Cdの
うち80%(1280g)はルツボ内の低温部600mmにわたって
粒状に堆積し、残量はルツボ外の炉芯管低温部に粉状に
付着し、これらの表面は完全な金属光沢を呈さなかっ
た。また、これらの堆積物を回収するために別途、ルツ
ボを逆さにした状態で堆積物を加熱融解し鋳型に鋳造す
る必要があった。
As a result, the distillation rate reached 80% in 2 hours, but 80% (1280 g) of the evaporated Cd accumulated in a granular form over the low temperature part 600 mm inside the crucible, and the remaining amount in the low temperature part of the furnace core tube outside the crucible. Adhering in powder form, these surfaces did not have a perfect metallic luster. Further, in order to collect these deposits, it was necessary to separately heat and melt the deposits with the crucible upside down and cast into a mold.

結果を第1表に示す。The results are shown in Table 1.

本発明による方法は精製Cdの回収方法に優れる他、残留
抵抗値からみた精製効果にも優れている。
The method according to the present invention is excellent not only in the method for recovering purified Cd but also in the purification effect in terms of residual resistance.

実施例2 実施例1と同じ装置を用いて亜鉛の蒸留精製を行った。
蒸発部の温度を850℃そして凝縮部を450℃と設定した以
外は同条件を使用した。98%の収率で亜鉛が回収でき
た。原料及び精製亜鉛の純度を示す。
Example 2 Zinc was distilled and purified using the same apparatus as in Example 1.
The same conditions were used except that the temperature of the evaporation section was set to 850 ° C and the temperature of the condensation section was set to 450 ° C. Zinc could be recovered with a yield of 98%. The raw material and the purity of purified zinc are shown.

発明の効果 本発明によれば、従来一般に金属材料を精製するために
実施されている減圧蒸留法に比べ、安価な設備で高い回
収率でしかも回収が容易な形状で蒸発精製物を凝縮させ
ることができるばかりでなく、酸化物をほとんど含まな
い純金属が得られるため、特に電子材料用金属の精製手
段として極めて有効であり、経済的にも寄与する度合い
が大きい。
EFFECTS OF THE INVENTION According to the present invention, it is possible to condense an evaporatively refined product in a shape that can be easily recovered at a high recovery rate with inexpensive equipment, as compared with a vacuum distillation method that is generally carried out for refining a metal material. In addition to the above, since a pure metal containing almost no oxide can be obtained, it is extremely effective as a refining means for a metal for electronic materials, and has a large economic contribution.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明方法を実施する装置例及びその炉温分布
を示し、そして第2および3図は従来装置例を示す。 1:筒状容器 3:仕切り 5:蒸発部 7:凝縮部 9:キャリアガス導入管 11:キャリアガス導入口 13:排出口 15:炉芯管 17:管材
FIG. 1 shows an example of an apparatus for carrying out the method of the present invention and its furnace temperature distribution, and FIGS. 2 and 3 show an example of a conventional apparatus. 1: Cylindrical container 3: Partition 5: Evaporator 7: Condenser 9: Carrier gas inlet pipe 11: Carrier gas inlet 13: Outlet port 15: Furnace core 17: Tubing

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】蒸発部と凝縮部とを具備しそして該蒸発部
に金属原料を装入した筒状容器を該蒸発部と凝縮部とに
対応する温度分布を有する加熱炉に挿入し、大気圧以上
の圧力下において、キャリアガスを該蒸発部から凝縮部
に向う方向に流通させながら該蒸発部における金属原料
を加熱し、蒸発した金属成分をキャリアガスにより前記
凝縮部に移送しそして該凝縮部において蒸発金属成分を
凝縮せしめることを特徴とする蒸留精製方法。
1. A cylindrical container having an evaporation part and a condensation part, and a metal raw material charged in the evaporation part, is inserted into a heating furnace having a temperature distribution corresponding to the evaporation part and the condensation part, Under pressure equal to or higher than atmospheric pressure, the metal raw material in the evaporation part is heated while flowing the carrier gas in the direction from the evaporation part to the condensation part, and the evaporated metal component is transferred to the condensation part by the carrier gas and the condensation is performed. A distillation purification method, characterized in that vaporized metal components are condensed in the section.
【請求項2】容器が上下2分割式の模型筒状容器であ
り、該容器の下側部分の内面に蒸発部と凝縮部とを分画
する少くとも一ケ所以上の仕切りを有し、そして容器の
蒸発部側の一端にキャリアガスの導入口をそして他端に
キャリアガス排出口を備える構造のものである特許請求
の範囲第1項記載の方法。
2. The container is a model tubular container of upper and lower halves, the inner surface of the lower part of the container having at least one partition for dividing the evaporation part and the condensation part, and 2. The method according to claim 1, wherein the container has a structure in which a carrier gas inlet is provided at one end on the evaporator side and a carrier gas outlet is provided at the other end.
【請求項3】容器を同一材質の管材に装通し、そして該
管材ごと加熱炉に挿入する特許請求の範囲第1項記載の
方法。
3. The method according to claim 1, wherein the container is put through a pipe material made of the same material, and the whole pipe material is inserted into a heating furnace.
JP62264013A 1987-10-21 1987-10-21 Distillation purification method Expired - Lifetime JPH0798980B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62264013A JPH0798980B2 (en) 1987-10-21 1987-10-21 Distillation purification method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62264013A JPH0798980B2 (en) 1987-10-21 1987-10-21 Distillation purification method

Publications (2)

Publication Number Publication Date
JPH01108322A JPH01108322A (en) 1989-04-25
JPH0798980B2 true JPH0798980B2 (en) 1995-10-25

Family

ID=17397338

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62264013A Expired - Lifetime JPH0798980B2 (en) 1987-10-21 1987-10-21 Distillation purification method

Country Status (1)

Country Link
JP (1) JPH0798980B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101408661B1 (en) * 2012-08-29 2014-06-19 충남대학교산학협력단 Apparatus for Manufacturing of Tellurium Powder by Vacuum Distillation and Controlling Particle Size

Also Published As

Publication number Publication date
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