[go: up one dir, main page]

JPH0758440A - Manufacture of circuit board - Google Patents

Manufacture of circuit board

Info

Publication number
JPH0758440A
JPH0758440A JP20062993A JP20062993A JPH0758440A JP H0758440 A JPH0758440 A JP H0758440A JP 20062993 A JP20062993 A JP 20062993A JP 20062993 A JP20062993 A JP 20062993A JP H0758440 A JPH0758440 A JP H0758440A
Authority
JP
Japan
Prior art keywords
circuit board
insulating substrate
manufacturing
plating solution
circuit pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20062993A
Other languages
Japanese (ja)
Inventor
Shogo Yoshida
昭吾 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Priority to JP20062993A priority Critical patent/JPH0758440A/en
Publication of JPH0758440A publication Critical patent/JPH0758440A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method

Landscapes

  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To provide a manufacturing method of a circuit board capable of easily forming a circuit pattern with high precision and at low cost eliminating any complicated steps. CONSTITUTION:Within the manufacturing method of a circuit board comprising an insulating substrate whereon a specific circuit pattern is formed, a specific position of the insulating substrate 1 immersed in an electroless plating solution 3 is irradiated with laser beams 5 so that a specific pattern comprising the metal-plate film formed of the electroless plating solution 3 may be beam- exposed and formed on the insulating substrate 1.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、絶縁基板上に回路パタ
ーンが形成された回路基板の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a circuit board having a circuit pattern formed on an insulating board.

【0002】[0002]

【従来の技術】従来、所定の回路パターンが形成された
回路基板を得る方法としては、絶縁基板上に導電膜が形
成された基板からエッチングにより回路パターンを形成
する方法が一般的である。具体的には、図3(a)に示
すように、絶縁基板11上の全面に導電膜12が形成さ
れた基板を用意する。この導電膜12は、銅板と基板材
をホットプレスで積層する方法や無電解メッキ法等によ
り形成される。まず、図3(b)に示すように、前記導
電膜12上に、例えば、フォトリソグラフィにより所定
のパターンのレジスト膜13を形成する。次に、図3
(c)に示すように、エッチングにより、前記レジスト
膜13が形成された領域を除いて、不要な導電膜12を
溶解除去する。その後、図3(d)に示すように、レジ
スト膜13を溶液で除去して、所定の回路パターンが形
成された回路基板が得られる。
2. Description of the Related Art Conventionally, as a method of obtaining a circuit board having a predetermined circuit pattern formed thereon, a method of forming a circuit pattern by etching from a substrate having a conductive film formed on an insulating substrate is generally used. Specifically, as shown in FIG. 3A, a substrate having the conductive film 12 formed on the entire surface of the insulating substrate 11 is prepared. The conductive film 12 is formed by a method of laminating a copper plate and a substrate material by hot pressing, an electroless plating method, or the like. First, as shown in FIG. 3B, a resist film 13 having a predetermined pattern is formed on the conductive film 12 by, for example, photolithography. Next, FIG.
As shown in (c), the unnecessary conductive film 12 is dissolved and removed except for the region where the resist film 13 is formed by etching. After that, as shown in FIG. 3D, the resist film 13 is removed with a solution to obtain a circuit board on which a predetermined circuit pattern is formed.

【0003】[0003]

【発明が解決しようとする課題】ところが、上記従来例
の回路基板の製造方法においては、導電膜の形成、レジ
ストによるパターンの形成、エッチング等の多くの工程
を要し、材料コスト及び製造コストが高くついていた。
また、レジストによるパターンの精度、エッチング精度
にも限界があり、回路パターンの精度の均一性、細線化
が困難である等の問題があった。 そこで、本発明の目
的は、以上のような従来の回路基板の製造方法が持つ問
題点を解消し、複雑な工程を必要とせず、安価で、かつ
容易に、精度の高い回路パターンを形成することができ
る回路基板の製造方法を提供することにある。
However, in the above-described conventional method for manufacturing a circuit board, many steps such as forming a conductive film, forming a pattern with a resist, and etching are required, and the material cost and the manufacturing cost are low. It was expensive.
Further, there is a limit to the accuracy of the pattern by the resist and the etching accuracy, and there are problems that the accuracy of the circuit pattern is uniform, and it is difficult to form a fine line. Therefore, an object of the present invention is to solve the above problems of the conventional method for manufacturing a circuit board, to form a highly accurate circuit pattern inexpensively and easily without requiring complicated steps. It is to provide a method of manufacturing a circuit board that can be manufactured.

【0004】[0004]

【課題を解決するための手段】上記目的を達成するため
に、本発明は、絶縁基板上に所定の回路パターンを形成
した回路基板の製造方法において、前記絶縁基板を無電
解メッキ液に浸漬し、所定箇所にレーザービームを照射
することにより、前記絶縁基板上に前記無電解メッキ液
の金属メッキ膜からなる所定の回路パターンを描画、形
成したことを特徴とするものである。
In order to achieve the above object, the present invention is a method for manufacturing a circuit board in which a predetermined circuit pattern is formed on an insulating board, wherein the insulating board is immersed in an electroless plating solution. By irradiating a predetermined portion with a laser beam, a predetermined circuit pattern made of a metal plating film of the electroless plating solution is drawn and formed on the insulating substrate.

【0005】[0005]

【作用】上記の方法によれば、絶縁基板上のレーザービ
ームが照射された部分のみで、レーザービームの熱及び
光によって、無電解メッキ液中の金属イオンの酸化還元
反応が起こり、この部分に金属メッキ膜が析出する。
According to the above method, the redox reaction of the metal ions in the electroless plating solution occurs due to the heat and light of the laser beam only on the part of the insulating substrate irradiated with the laser beam, and this part A metal plating film is deposited.

【0006】[0006]

【実施例】以下、本発明による回路基板の製造方法の実
施例を図面を用いて説明する。図1に示すように、アル
ミナ基板等の絶縁基板1を、石英ガラス容器2に入った
表1に示す組成の室温の無電解銅メッキ液3に浸漬す
る。そして、石英ガラス容器2の外部より数ワットの出
力でレーザ本体4から発射されたレーザービーム5を絶
縁基板1上に照射する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a method for manufacturing a circuit board according to the present invention will be described below with reference to the drawings. As shown in FIG. 1, an insulating substrate 1 such as an alumina substrate is immersed in a room temperature electroless copper plating solution 3 having a composition shown in Table 1 and placed in a quartz glass container 2. Then, the insulating substrate 1 is irradiated with a laser beam 5 emitted from the laser body 4 from the outside of the quartz glass container 2 with an output of several watts.

【0007】このとき、絶縁基板1は、その一面が石英
ガラス容器2の側面と平行になるように、かつレーザー
ビーム5と略垂直となるように設置する。また、絶縁基
板1は、無電解銅メッキ液3のレーザービーム5の吸収
を極力減らすために、石英ガラス容器2の側面より1〜
2mmの距離となるように近接して設置する。
At this time, the insulating substrate 1 is installed so that one surface thereof is parallel to the side surface of the quartz glass container 2 and substantially perpendicular to the laser beam 5. In order to reduce the absorption of the laser beam 5 of the electroless copper plating solution 3 as much as possible, the insulating substrate 1 is separated from the side surface of the quartz glass container 2 by
Install closely so that the distance is 2 mm.

【0008】レーザー本体4は、レーザービーム5を任
意の方向に走査できるものである。そして、レーザービ
ーム5を走査することにより、絶縁基板1上に所定の回
路パターンに応じて、順次レーザービーム5を照射して
いく。
The laser body 4 can scan the laser beam 5 in any direction. Then, by scanning the laser beam 5, the insulating substrate 1 is sequentially irradiated with the laser beam 5 according to a predetermined circuit pattern.

【0009】上記のように、絶縁基板1上のレーザービ
ーム5が照射された部分では、レーザービーム5の熱及
び光によって、無電解銅メッキ液3中の金属イオンの酸
化還元反応が起こり、この部分に銅メッキ膜が形成され
る。このようにして、図2に示すような、絶縁基板1上
に銅メッキ膜からなる所定の回路パターン6が形成され
た回路基板が得られる。この場合、銅メッキ膜の幅、す
なわち回路パターン6の線幅は、レーザービームの絞り
を変更することにより、任意な幅で描画することができ
る。
As described above, in the portion of the insulating substrate 1 irradiated with the laser beam 5, the heat and light of the laser beam 5 cause a redox reaction of the metal ions in the electroless copper plating solution 3, and this A copper plating film is formed on the portion. In this way, a circuit board having a predetermined circuit pattern 6 made of a copper plating film on the insulating substrate 1 as shown in FIG. 2 is obtained. In this case, the width of the copper plating film, that is, the line width of the circuit pattern 6 can be drawn with an arbitrary width by changing the aperture of the laser beam.

【0010】[0010]

【表1】 [Table 1]

【0011】なお、上記実施例では、表1に示すような
組成の無電解銅メッキ液を使用したが、この組成に限る
ことはなく、また、銅以外の他の無電解メッキ液、例え
ば、ニッケル、ニッケル−コバルト、金などでもよく、
室温よりも高い温度でないとメッキできない無電解メッ
キ液であればよい。
In the above embodiment, the electroless copper plating solution having the composition shown in Table 1 was used. However, the composition is not limited to this, and an electroless plating solution other than copper, for example, It may be nickel, nickel-cobalt, gold, etc.,
Any electroless plating solution that can be plated only at a temperature higher than room temperature may be used.

【0012】また、レーザーは、エキシマレーザーを使
用したが、これに限ることはなく、アルゴンレーザー、
YAGレーザーなどでもよい。無電解メッキ液を入れる
容器も、石英ガラス容器に限ることはなく、レーザービ
ームを透過できるものであればよい。
As the laser, an excimer laser was used, but the laser is not limited to this, and an argon laser,
A YAG laser or the like may be used. The container for containing the electroless plating solution is not limited to the quartz glass container and may be any container that can transmit a laser beam.

【0013】[0013]

【発明の効果】以上説明したように、本発明に係る回路
基板の製造方法によれば、従来例のように、絶縁基板上
にあらかじめ導電膜を形成しておく必要もなく、レジス
トによるパターンの形成、エッチング等の複雑な多くの
工程を必要としない。
As described above, according to the method of manufacturing a circuit board according to the present invention, unlike the conventional example, it is not necessary to previously form a conductive film on an insulating substrate, and a pattern of a resist is formed. It does not require many complicated steps such as formation and etching.

【0014】すなわち、絶縁基板を無電解メッキ液に浸
漬し、レーザービームを照射するという単純な工程で、
絶縁基板上に、金属メッキ膜からなる回路パターンを描
画、形成することができ、材料コスト及び製造コストを
大幅に低減できる。そして、レーザービームの絞りを制
御することにより、任意な線幅及び微細な線幅の回路パ
ターンを、高精度に形成できる。
That is, in a simple process of immersing an insulating substrate in an electroless plating solution and irradiating it with a laser beam,
A circuit pattern made of a metal plating film can be drawn and formed on the insulating substrate, and material cost and manufacturing cost can be significantly reduced. Then, by controlling the aperture of the laser beam, a circuit pattern having an arbitrary line width and a fine line width can be formed with high accuracy.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の回路基板の製造方法を示す断面模式図
である。
FIG. 1 is a schematic sectional view showing a method for manufacturing a circuit board of the present invention.

【図2】本発明の製造方法によって得られた回路基板の
断面図である。
FIG. 2 is a cross-sectional view of a circuit board obtained by the manufacturing method of the present invention.

【図3】従来の回路基板の製造方法の各工程における回
路基板の断面図である。
FIG. 3 is a cross-sectional view of a circuit board in each step of a conventional method for manufacturing a circuit board.

【符号の説明】[Explanation of symbols]

1 絶縁基板 2 石英ガラス容器 3 無電解銅メッキ液 4 レーザー本体 5 レーザービーム 6 回路パターン 1 Insulating substrate 2 Quartz glass container 3 Electroless copper plating solution 4 Laser body 5 Laser beam 6 Circuit pattern

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 絶縁基板上に所定の回路パターンを形成
した回路基板の製造方法において、 前記絶縁基板を無電解メッキ液に浸漬し、所定箇所にレ
ーザービームを照射することにより、前記絶縁基板上に
前記無電解メッキ液の金属メッキ膜からなる所定の回路
パターンを描画、形成したことを特徴とする回路基板の
製造方法。
1. A method for manufacturing a circuit board in which a predetermined circuit pattern is formed on an insulating substrate, by immersing the insulating substrate in an electroless plating solution and irradiating a predetermined portion with a laser beam. A method of manufacturing a circuit board, wherein a predetermined circuit pattern made of a metal-plated film of the electroless plating solution is drawn and formed on.
JP20062993A 1993-08-12 1993-08-12 Manufacture of circuit board Pending JPH0758440A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20062993A JPH0758440A (en) 1993-08-12 1993-08-12 Manufacture of circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20062993A JPH0758440A (en) 1993-08-12 1993-08-12 Manufacture of circuit board

Publications (1)

Publication Number Publication Date
JPH0758440A true JPH0758440A (en) 1995-03-03

Family

ID=16427564

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20062993A Pending JPH0758440A (en) 1993-08-12 1993-08-12 Manufacture of circuit board

Country Status (1)

Country Link
JP (1) JPH0758440A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8557017B2 (en) 2000-12-15 2013-10-15 The Arizona Board Of Regents Method for patterning metal using nanoparticle containing precursors

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8557017B2 (en) 2000-12-15 2013-10-15 The Arizona Board Of Regents Method for patterning metal using nanoparticle containing precursors
US8779030B2 (en) 2000-12-15 2014-07-15 The Arizona Board of Regents, The University of Arizone Method for patterning metal using nanoparticle containing precursors

Similar Documents

Publication Publication Date Title
TW388190B (en) Method and apparatus for forming a through hole in a ceramic green sheet
US7025865B2 (en) Method for producing metal mask and metal mask
CN105829572B (en) Manufacturing method of film-forming mask
US4239789A (en) Maskless method for electroless plating patterns
WO1994008443A1 (en) Method and apparatus for fabricating printed circuit boards
EP0520437A1 (en) Method of printing an image on a substrate particularly useful for producing printed circuit boards
EP0357124B1 (en) Method of selectively providing a metal from the liquid phase on a substrate by means of a laser
JPH0758440A (en) Manufacture of circuit board
US5338645A (en) Three dimensional printed circuits
JPH0719948B2 (en) Method of depositing patterned metal film on glass substrate
JP2001210540A (en) Electromagnetic coil manufacturing method, charged particle beam exposure apparatus and semiconductor device manufacturing method using the same
JP3458759B2 (en) Processing method of ceramic green sheet
JP3324982B2 (en) Circuit board manufacturing method
KR20100134356A (en) Manufacturing method of fine conductive pattern
JPH03203390A (en) Manufacture of printed board
JPH03269977A (en) Method for manufacturing electrical connection members
JP2008041938A (en) Metal wiring formation method
EP0385013B1 (en) Production of precision patterns on curved surfaces
JPS59147430A (en) Formation of fine pattern
CN117806128B (en) Method for determining optimal exposure energy of light source for inducing dry film forming
JPH0379100A (en) Light transmission paste and precipitating method for metal copper using the same
JP3557041B2 (en) Manufacturing method of reflector antenna
JPS6340157A (en) Exposure machine
KR100226054B1 (en) Method for forming patterns on a thin film using a shadow mask
JP2003017828A (en) Method for cutting board