JPH0758440A - Manufacture of circuit board - Google Patents
Manufacture of circuit boardInfo
- Publication number
- JPH0758440A JPH0758440A JP20062993A JP20062993A JPH0758440A JP H0758440 A JPH0758440 A JP H0758440A JP 20062993 A JP20062993 A JP 20062993A JP 20062993 A JP20062993 A JP 20062993A JP H0758440 A JPH0758440 A JP H0758440A
- Authority
- JP
- Japan
- Prior art keywords
- circuit board
- insulating substrate
- manufacturing
- plating solution
- circuit pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 239000000758 substrate Substances 0.000 claims abstract description 24
- 238000007772 electroless plating Methods 0.000 claims abstract description 12
- 238000000034 method Methods 0.000 claims description 10
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 238000007747 plating Methods 0.000 description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 10
- 229910052802 copper Inorganic materials 0.000 description 10
- 239000010949 copper Substances 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 238000005530 etching Methods 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 238000006479 redox reaction Methods 0.000 description 2
- QXZUUHYBWMWJHK-UHFFFAOYSA-N [Co].[Ni] Chemical compound [Co].[Ni] QXZUUHYBWMWJHK-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
- H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
Landscapes
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、絶縁基板上に回路パタ
ーンが形成された回路基板の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a circuit board having a circuit pattern formed on an insulating board.
【0002】[0002]
【従来の技術】従来、所定の回路パターンが形成された
回路基板を得る方法としては、絶縁基板上に導電膜が形
成された基板からエッチングにより回路パターンを形成
する方法が一般的である。具体的には、図3(a)に示
すように、絶縁基板11上の全面に導電膜12が形成さ
れた基板を用意する。この導電膜12は、銅板と基板材
をホットプレスで積層する方法や無電解メッキ法等によ
り形成される。まず、図3(b)に示すように、前記導
電膜12上に、例えば、フォトリソグラフィにより所定
のパターンのレジスト膜13を形成する。次に、図3
(c)に示すように、エッチングにより、前記レジスト
膜13が形成された領域を除いて、不要な導電膜12を
溶解除去する。その後、図3(d)に示すように、レジ
スト膜13を溶液で除去して、所定の回路パターンが形
成された回路基板が得られる。2. Description of the Related Art Conventionally, as a method of obtaining a circuit board having a predetermined circuit pattern formed thereon, a method of forming a circuit pattern by etching from a substrate having a conductive film formed on an insulating substrate is generally used. Specifically, as shown in FIG. 3A, a substrate having the conductive film 12 formed on the entire surface of the insulating substrate 11 is prepared. The conductive film 12 is formed by a method of laminating a copper plate and a substrate material by hot pressing, an electroless plating method, or the like. First, as shown in FIG. 3B, a resist film 13 having a predetermined pattern is formed on the conductive film 12 by, for example, photolithography. Next, FIG.
As shown in (c), the unnecessary conductive film 12 is dissolved and removed except for the region where the resist film 13 is formed by etching. After that, as shown in FIG. 3D, the resist film 13 is removed with a solution to obtain a circuit board on which a predetermined circuit pattern is formed.
【0003】[0003]
【発明が解決しようとする課題】ところが、上記従来例
の回路基板の製造方法においては、導電膜の形成、レジ
ストによるパターンの形成、エッチング等の多くの工程
を要し、材料コスト及び製造コストが高くついていた。
また、レジストによるパターンの精度、エッチング精度
にも限界があり、回路パターンの精度の均一性、細線化
が困難である等の問題があった。 そこで、本発明の目
的は、以上のような従来の回路基板の製造方法が持つ問
題点を解消し、複雑な工程を必要とせず、安価で、かつ
容易に、精度の高い回路パターンを形成することができ
る回路基板の製造方法を提供することにある。However, in the above-described conventional method for manufacturing a circuit board, many steps such as forming a conductive film, forming a pattern with a resist, and etching are required, and the material cost and the manufacturing cost are low. It was expensive.
Further, there is a limit to the accuracy of the pattern by the resist and the etching accuracy, and there are problems that the accuracy of the circuit pattern is uniform, and it is difficult to form a fine line. Therefore, an object of the present invention is to solve the above problems of the conventional method for manufacturing a circuit board, to form a highly accurate circuit pattern inexpensively and easily without requiring complicated steps. It is to provide a method of manufacturing a circuit board that can be manufactured.
【0004】[0004]
【課題を解決するための手段】上記目的を達成するため
に、本発明は、絶縁基板上に所定の回路パターンを形成
した回路基板の製造方法において、前記絶縁基板を無電
解メッキ液に浸漬し、所定箇所にレーザービームを照射
することにより、前記絶縁基板上に前記無電解メッキ液
の金属メッキ膜からなる所定の回路パターンを描画、形
成したことを特徴とするものである。In order to achieve the above object, the present invention is a method for manufacturing a circuit board in which a predetermined circuit pattern is formed on an insulating board, wherein the insulating board is immersed in an electroless plating solution. By irradiating a predetermined portion with a laser beam, a predetermined circuit pattern made of a metal plating film of the electroless plating solution is drawn and formed on the insulating substrate.
【0005】[0005]
【作用】上記の方法によれば、絶縁基板上のレーザービ
ームが照射された部分のみで、レーザービームの熱及び
光によって、無電解メッキ液中の金属イオンの酸化還元
反応が起こり、この部分に金属メッキ膜が析出する。According to the above method, the redox reaction of the metal ions in the electroless plating solution occurs due to the heat and light of the laser beam only on the part of the insulating substrate irradiated with the laser beam, and this part A metal plating film is deposited.
【0006】[0006]
【実施例】以下、本発明による回路基板の製造方法の実
施例を図面を用いて説明する。図1に示すように、アル
ミナ基板等の絶縁基板1を、石英ガラス容器2に入った
表1に示す組成の室温の無電解銅メッキ液3に浸漬す
る。そして、石英ガラス容器2の外部より数ワットの出
力でレーザ本体4から発射されたレーザービーム5を絶
縁基板1上に照射する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a method for manufacturing a circuit board according to the present invention will be described below with reference to the drawings. As shown in FIG. 1, an insulating substrate 1 such as an alumina substrate is immersed in a room temperature electroless copper plating solution 3 having a composition shown in Table 1 and placed in a quartz glass container 2. Then, the insulating substrate 1 is irradiated with a laser beam 5 emitted from the laser body 4 from the outside of the quartz glass container 2 with an output of several watts.
【0007】このとき、絶縁基板1は、その一面が石英
ガラス容器2の側面と平行になるように、かつレーザー
ビーム5と略垂直となるように設置する。また、絶縁基
板1は、無電解銅メッキ液3のレーザービーム5の吸収
を極力減らすために、石英ガラス容器2の側面より1〜
2mmの距離となるように近接して設置する。At this time, the insulating substrate 1 is installed so that one surface thereof is parallel to the side surface of the quartz glass container 2 and substantially perpendicular to the laser beam 5. In order to reduce the absorption of the laser beam 5 of the electroless copper plating solution 3 as much as possible, the insulating substrate 1 is separated from the side surface of the quartz glass container 2 by
Install closely so that the distance is 2 mm.
【0008】レーザー本体4は、レーザービーム5を任
意の方向に走査できるものである。そして、レーザービ
ーム5を走査することにより、絶縁基板1上に所定の回
路パターンに応じて、順次レーザービーム5を照射して
いく。The laser body 4 can scan the laser beam 5 in any direction. Then, by scanning the laser beam 5, the insulating substrate 1 is sequentially irradiated with the laser beam 5 according to a predetermined circuit pattern.
【0009】上記のように、絶縁基板1上のレーザービ
ーム5が照射された部分では、レーザービーム5の熱及
び光によって、無電解銅メッキ液3中の金属イオンの酸
化還元反応が起こり、この部分に銅メッキ膜が形成され
る。このようにして、図2に示すような、絶縁基板1上
に銅メッキ膜からなる所定の回路パターン6が形成され
た回路基板が得られる。この場合、銅メッキ膜の幅、す
なわち回路パターン6の線幅は、レーザービームの絞り
を変更することにより、任意な幅で描画することができ
る。As described above, in the portion of the insulating substrate 1 irradiated with the laser beam 5, the heat and light of the laser beam 5 cause a redox reaction of the metal ions in the electroless copper plating solution 3, and this A copper plating film is formed on the portion. In this way, a circuit board having a predetermined circuit pattern 6 made of a copper plating film on the insulating substrate 1 as shown in FIG. 2 is obtained. In this case, the width of the copper plating film, that is, the line width of the circuit pattern 6 can be drawn with an arbitrary width by changing the aperture of the laser beam.
【0010】[0010]
【表1】 [Table 1]
【0011】なお、上記実施例では、表1に示すような
組成の無電解銅メッキ液を使用したが、この組成に限る
ことはなく、また、銅以外の他の無電解メッキ液、例え
ば、ニッケル、ニッケル−コバルト、金などでもよく、
室温よりも高い温度でないとメッキできない無電解メッ
キ液であればよい。In the above embodiment, the electroless copper plating solution having the composition shown in Table 1 was used. However, the composition is not limited to this, and an electroless plating solution other than copper, for example, It may be nickel, nickel-cobalt, gold, etc.,
Any electroless plating solution that can be plated only at a temperature higher than room temperature may be used.
【0012】また、レーザーは、エキシマレーザーを使
用したが、これに限ることはなく、アルゴンレーザー、
YAGレーザーなどでもよい。無電解メッキ液を入れる
容器も、石英ガラス容器に限ることはなく、レーザービ
ームを透過できるものであればよい。As the laser, an excimer laser was used, but the laser is not limited to this, and an argon laser,
A YAG laser or the like may be used. The container for containing the electroless plating solution is not limited to the quartz glass container and may be any container that can transmit a laser beam.
【0013】[0013]
【発明の効果】以上説明したように、本発明に係る回路
基板の製造方法によれば、従来例のように、絶縁基板上
にあらかじめ導電膜を形成しておく必要もなく、レジス
トによるパターンの形成、エッチング等の複雑な多くの
工程を必要としない。As described above, according to the method of manufacturing a circuit board according to the present invention, unlike the conventional example, it is not necessary to previously form a conductive film on an insulating substrate, and a pattern of a resist is formed. It does not require many complicated steps such as formation and etching.
【0014】すなわち、絶縁基板を無電解メッキ液に浸
漬し、レーザービームを照射するという単純な工程で、
絶縁基板上に、金属メッキ膜からなる回路パターンを描
画、形成することができ、材料コスト及び製造コストを
大幅に低減できる。そして、レーザービームの絞りを制
御することにより、任意な線幅及び微細な線幅の回路パ
ターンを、高精度に形成できる。That is, in a simple process of immersing an insulating substrate in an electroless plating solution and irradiating it with a laser beam,
A circuit pattern made of a metal plating film can be drawn and formed on the insulating substrate, and material cost and manufacturing cost can be significantly reduced. Then, by controlling the aperture of the laser beam, a circuit pattern having an arbitrary line width and a fine line width can be formed with high accuracy.
【図1】本発明の回路基板の製造方法を示す断面模式図
である。FIG. 1 is a schematic sectional view showing a method for manufacturing a circuit board of the present invention.
【図2】本発明の製造方法によって得られた回路基板の
断面図である。FIG. 2 is a cross-sectional view of a circuit board obtained by the manufacturing method of the present invention.
【図3】従来の回路基板の製造方法の各工程における回
路基板の断面図である。FIG. 3 is a cross-sectional view of a circuit board in each step of a conventional method for manufacturing a circuit board.
1 絶縁基板 2 石英ガラス容器 3 無電解銅メッキ液 4 レーザー本体 5 レーザービーム 6 回路パターン 1 Insulating substrate 2 Quartz glass container 3 Electroless copper plating solution 4 Laser body 5 Laser beam 6 Circuit pattern
Claims (1)
した回路基板の製造方法において、 前記絶縁基板を無電解メッキ液に浸漬し、所定箇所にレ
ーザービームを照射することにより、前記絶縁基板上に
前記無電解メッキ液の金属メッキ膜からなる所定の回路
パターンを描画、形成したことを特徴とする回路基板の
製造方法。1. A method for manufacturing a circuit board in which a predetermined circuit pattern is formed on an insulating substrate, by immersing the insulating substrate in an electroless plating solution and irradiating a predetermined portion with a laser beam. A method of manufacturing a circuit board, wherein a predetermined circuit pattern made of a metal-plated film of the electroless plating solution is drawn and formed on.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20062993A JPH0758440A (en) | 1993-08-12 | 1993-08-12 | Manufacture of circuit board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20062993A JPH0758440A (en) | 1993-08-12 | 1993-08-12 | Manufacture of circuit board |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0758440A true JPH0758440A (en) | 1995-03-03 |
Family
ID=16427564
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20062993A Pending JPH0758440A (en) | 1993-08-12 | 1993-08-12 | Manufacture of circuit board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0758440A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8557017B2 (en) | 2000-12-15 | 2013-10-15 | The Arizona Board Of Regents | Method for patterning metal using nanoparticle containing precursors |
-
1993
- 1993-08-12 JP JP20062993A patent/JPH0758440A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8557017B2 (en) | 2000-12-15 | 2013-10-15 | The Arizona Board Of Regents | Method for patterning metal using nanoparticle containing precursors |
| US8779030B2 (en) | 2000-12-15 | 2014-07-15 | The Arizona Board of Regents, The University of Arizone | Method for patterning metal using nanoparticle containing precursors |
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