JPH0745081Y2 - Pellicle structure - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION <Industrial field of application> The present invention relates to a pellicle structure, and in particular, a release liner attached to the lower surface of the adhesive layer for protecting the adhesive layer is small from the frame body. The present invention relates to a pellicle structure which is excellent in workability when mounted on a photomask or a reticle because it can be smoothly peeled by a peeling force.

<Prior Art> In the manufacture of integrated circuits such as IC and LSI, a photomask or reticle used for forming a circuit pattern on a semiconductor substrate has foreign matter such as dust attached to the exposed pattern, In order to prevent foreign matter from adhering to the photomask or reticle and projecting the shadow of the foreign matter onto the pattern during exposure, a pellicle is mounted and used for exposure.
Conventionally, this pellicle is composed of a pellicle film made of nitrocellulose or the like on the upper part and a frame having the pellicle film attached on the upper part. An adhesive layer is provided on the lower end surface of the frame of the pellicle, and the pellicle is mounted on the photomask or reticle by adhering the adhesive layer to the photomask or reticle. On the lower surface of this adhesive layer, a release liner is attached so that the adhesive layer can be protected during storage and storage and can be peeled off when attached to a photomask or reticle,
On its side, ears are provided for gripping at the time of peeling. If this ear is small, it becomes difficult to hold it, so that the ear must be made somewhat large.

<Problems to be solved by the device> However, if the ears are large, when peeling the release liner from the adhesive layer by grasping the ears and pulling the release liner from a large surface at a time, a large peeling force is required. The peeling may not be performed smoothly.

Therefore, the purpose of the present invention is to enable the release liner attached to the lower surface of the adhesive layer to protect the adhesive layer from the frame body to be smoothly peeled off. It is to provide a pellicle structure having excellent properties.

<Means for Solving the Problems> In order to solve the above problems, the present invention provides a frame having an opening that vertically penetrates, a pellicle film stretched at the upper end of the opening of the frame, and the frame. A release liner attached to the lower end surface of the body via an adhesive layer, and the release liner has a release ear portion protruding laterally, and a narrow portion at the base of the release ear portion. The present invention provides a pellicle structure characterized by being formed.

In addition, it is preferable that a dustproof film is stretchably attached to the lower end of the opening of the frame body via a release liner so as to be removable.

Furthermore, it is preferable to form an adhesive layer over the entire inner surface of the frame.

Hereinafter, the pellicle structure of the present invention will be described in detail based on the embodiment schematically shown in FIG.

In the pellicle structure 1 shown in FIG. 1, 2 is a frame and 3
Indicates a pellicle film, and 4 indicates a release liner.

As shown in the transverse sectional view of FIG. 2, this pellicle structure 1 has a frame body 2 having an opening penetrating up and down, and a pellicle film 3 is stretched on an opening upper end 6 of the frame body 2. The release liner 4 is attached to the lower end surface via the adhesive layer 7.

The outer shape of the frame body 2 and the shape of its opening are not particularly limited, and may be formed so as to correspond to the photomask or reticle to which the pellicle structure of the present invention is mounted.

The material of the frame body is not particularly limited and may be one normally used for this type. For example, aluminum or the like can be used.

The pellicle film 3 is usually a nitrocellulose film having a thickness of about 0.5 to 5 μm.

The release liner 4 is, as shown in FIGS. 1 and 3,
It has a peeling ear portion 9 protruding laterally. Further, a narrow portion 10 is formed at the base of the peeling ear portion 9.

The shape of the peeling ear portion is not limited to that shown in FIGS. 1 and 3.

The narrow portion formed on the base portion of the peeling ear portion is usually formed to be about 5 to 50% of the width of the frame body. For example, in the example shown in the plan view of FIG. 3, a 2 mm wide and 8 mm long incision is formed in the base of the peeling ear portion 9 having a length of 10 mm and a width of 10 mm to form a narrow portion 10 having a width of 2 mm. Has been done.

In addition, as shown in FIG. 4, the pellicle structure of the present invention has a thickness of 20 to 80 through the adhesive layer 8 at the lower end of the opening of the frame.
It is also effective when used for the method of stretching the dustproof film 5 made of a film of about 0 μm. When the pellicle structure having the pellicle film and the dustproof film shown in FIG. 4 is manufactured, for example, the pellicle film may be stretched on the frame body and then the dustproof film may be stretched on the other side. Alternatively, the dustproof film may be stretched on the frame body, and then the pellicle film may be stretched on the other side. Further, in the pellicle structure of the present invention, as shown in FIG. 5, when the pressure-sensitive adhesive layer 11 is formed over the entire inner side surface of the frame body 2, fine fine particles existing in the unevenness of the inner surface of the frame body are formed. It is preferable in that it is possible to capture foreign substances and foreign substances that have penetrated into the frame before the release liner is stretched over the frame and sealed, and to prevent these foreign substances from falling on the photomask or reticle.

To attach the pellicle structure of the present invention to a photomask or reticle, first, the release ears are grasped and pulled downward to release the release liner from the adhesive layer 7, and then predetermined portions of the photomask or reticle. And the adhesive layer 7 may be adhered.

<Effect of the Invention> Since the pellicle structure of the present invention can smoothly release the release liner attached to the lower surface of the adhesive layer to protect the adhesive layer from the frame body, a photomask or a reticle. It has excellent workability when mounted on.

[Brief description of drawings]

FIG. 1 is a perspective view illustrating one embodiment of the pellicle structure of the present invention. FIG. 2 is a sectional view thereof. FIG. 3 is a plan view showing a release liner. FIG. 4 and FIG. 5 are sectional views for explaining a preferred example of the pellicle structure of the present invention. Explanation of reference numerals 1 ... Pellicle structure, 2 ... Frame, 3 ... Pellicle film, 4 ...
Release liner, 5 ... dustproof film, 6 ... upper end of opening of frame body 2,
7, 8 ... Adhesive layer, 9 ... Peeling edge, 10 ... Narrow area, 11 ...
Adhesive layer

Claims (3)

[Scope of utility model registration request] 1. A frame having an opening penetrating vertically, a pellicle film stretched on the upper end of the opening of the frame, and a peeling layer attached to the lower end surface of the frame via an adhesive layer. A pellicle structure having a liner, wherein the release liner has a peeling ear portion protruding laterally, and a narrow portion is formed at the base of the peeling ear portion. 2. The pellicle structure according to claim 1, wherein a dust-proof film is releasably stretched on the lower end of the opening of the frame through a release liner. 3. The pellicle structure according to claim 1, wherein an adhesive layer is formed over the entire inner surface of the frame.