JPH07318911A - Apparatus and method for manufacturing liquid crystal display device including photosensitive material - Google Patents

Abstract

(57) [Summary] [Objective] To provide a method for manufacturing a liquid crystal display device containing a photosensitive material, which enables highly accurate patterning of a mixture by light irradiation, and further improve the display quality. I will provide a. In the manufacturing apparatus 31, the light intensity distribution of the light beam emitted from the illumination means 2 is modulated and controlled by the photomask 1, and the modulated and controlled light beam is enlarged or reduced by the projection lens system 3 and the liquid crystal panel on the stage 4. An image is formed on the surface 10 to be exposed. The projection lens system 3 is selected to have a size capable of receiving light from the entire area of the photomask 1 and efficiently transmitting light from the illumination means 2 to the exposed surface. Further, as the projection lens system 3, a lens whose aberration is corrected is used. On the stage 4, a liquid crystal panel 10 or the like in which a mixture layer 16 containing a photosensitive material that undergoes a photopolymerization reaction by irradiation of ultraviolet rays is enclosed in a pair of glass substrates 21 and 22 is arranged. Light from the projection lens system 3 is emitted from the glass substrate 21,
The projection lens 3 is adjusted so as to form an image on the mixture layer 16 between 22.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for manufacturing a liquid crystal display element by performing pattern exposure on the inside of a substrate having at least a partially transparent property, and a manufacturing method technology thereof.
In particular, the present invention relates to a manufacturing apparatus and a manufacturing method for performing pattern exposure on a photosensitive composition sandwiched between a pair of substrates of a liquid crystal display element.

[0002]

2. Description of the Related Art Conventionally, a TN mode using a nematic liquid crystal as a display element utilizing an electro-optical effect, an STN
The one in mode has been put to practical use. A display element using a ferroelectric liquid crystal has also been proposed. These are modes that require a polarizing plate and also modes that require spouting treatment. On the other hand, there are a dynamic scattering (DS) mode and a phase transition (PC) mode as modes using the scattering of liquid crystal without requiring a polarizing plate.

Furthermore, as a mode which does not require a polarizing plate and an alignment treatment, a method has been proposed in which the birefringence of liquid crystal is utilized to electrically control a transparent or cloudy state. This method basically indicates the ordinary refractive index of the liquid crystal molecules and the refractive index of the support medium, and when a liquid crystal is aligned by applying a voltage, it becomes transparent, and when no voltage is applied, the liquid crystal molecules are aligned. The fact that the light is scattered due to the turbulence is used for display. An example of this method is
Japanese Laid-Open Patent Publication No. 61-502128 discloses a method in which a liquid crystal is mixed with a light or thermosetting resin and the resin is cured to precipitate the liquid crystal to form liquid crystal droplets in the resin.

Recently, for the purpose of improving the viewing angle characteristics of a liquid crystal display device by utilizing these techniques, a display device for controlling the scattering and the transparency described above between polarizing plates whose polarization axes are orthogonal to each other has been proposed. A method for improving the viewing angle characteristics by inserting the insertion has been proposed (JP-A-4-212928,
JP-A-4-338923). However, this method is for displaying by depolarizing polarized light due to scattering, and in principle, there is a limit to securing about 50% of incident light.

Further, the regular alignment of the liquid crystal regions existing in the display medium is disturbed by the matrix-shaped polymer wall surrounding the liquid crystal regions to randomize the alignment state of a plurality of liquid crystal domains constituting the liquid crystal regions. , A method for improving the viewing angle characteristics has also been proposed (Japanese Patent Laid-Open No. 5-2724).
2). However, in this method, basically, the position of the liquid crystal region with respect to the picture element cannot be precisely defined to form the liquid crystal area, so that even in a liquid crystal display element in which a plurality of picture elements are arranged in a matrix, The liquid crystal region could not be arranged, and the light transmittance of the liquid crystal display element could not be increased. Furthermore, when the liquid crystal domains are arranged at random, deterioration of visual characteristics such as inversion phenomenon is not seen,
When the liquid crystal display element at the time of voltage saturation is angled from the vertical direction of the substrate and the light transmittance is measured, there is a problem that a few percent of light leakage is observed.

Therefore, in order to solve these problems, a mixture of a liquid crystal material and a photo-curable resin is injected between a pair of substrates arranged opposite to each other, and thereafter, a liquid crystal region is gathered in a pixel portion, and the pixel is A method has been proposed in which pattern exposure is performed using a photomask so that the polymer material gathers in other portions (Japanese Patent Laid-Open No. 30996/1993). In this method, since a photomask is used, the liquid crystal region can be formed in the pixel portion. Further, in this liquid crystal display element, for example, when nematic liquid crystal is used and the liquid crystal domain is set in a radial or random state in the picture element, the viewing angle characteristic of the liquid crystal display element is a normal TN.
Significantly improved compared to the mode.

Further, in a commonly used liquid crystal display element, when an external force is applied, the thickness of the liquid crystal layer, that is, the so-called cell thickness changes, and display unevenness occurs. For example, in the case of a pen-input tablet-integrated liquid crystal display element, display unevenness locally occurs due to pen input. Therefore, a liquid crystal display element that is strong against external pressure is required, and as a solution to it,
A mixture of a liquid crystal and a photosensitive material is injected into a liquid crystal display device, and the mixture is subjected to pattern exposure using a light control means such as a photomask, and the liquid crystal and the polymer material are phase-separated by a photopolymerization reaction, A manufacturing method has been proposed (JP-A-5-321887). In this method, a display medium composed of a polymer wall and a liquid crystal region partially or wholly surrounded by the polymer wall is provided between a pair of substrates of the liquid crystal display element, and the polymer wall is provided as a pair. Since it is in intimate contact with both substrates, this achieves the above objectives.

In the liquid crystal display devices of these proposals, when a black matrix having a light transmitting hole in a portion corresponding to a picture element is formed on the counter substrate, a photomask used in a state of covering the picture element is set on the counter substrate. When it is covered and irradiated with light, the portion through which light passes is extremely reduced, and the photosensitive material is hard to cure. Further, when a color filter is provided on the counter substrate side of the liquid crystal display element, ultraviolet light does not pass through the color filter, so that the photosensitive material becomes harder to cure.

Therefore, it is general that a photomask is provided on the side of the active matrix substrate opposite to the counter substrate and light is irradiated from the side of the active matrix substrate through the photomask. In this case, contact exposure is performed in which a photomask is brought into close contact with the active matrix substrate side to perform light irradiation.

[0010]

However, in the above contact exposure, since the exposure is performed through the active matrix substrate, the exposure pattern is blurred on the surface of the photosensitive material depending on the parallelism of the illumination light, and the precise exposure is performed. It cannot be patterned. Therefore, contact exposure is not sufficient to form a polymer region regularly by photopolymerizing only a target region.

The present invention has been made to solve the above-mentioned problems, and a photomask or the like is added to the mixture of liquid crystal display elements in which a mixture of liquid crystal and a photosensitive material is injected between substrates. When a liquid crystal and a polymer material are phase-separated by a photopolymerization reaction by irradiating light using an optical means or the like, when manufacturing a liquid crystal display device, it is possible to perform highly precise patterning of the mixture by the light irradiation. A first object is to provide a method for manufacturing a liquid crystal display device containing the photosensitive material, and a second object is to provide a liquid crystal display device having a significantly improved display quality.

[0012]

A liquid crystal display device manufacturing apparatus including a photosensitive material according to the present invention includes two substrates, at least a part of which is transparent, and a photosensitive substrate sandwiched between the two substrates. Pattern exposure is performed on a liquid crystal panel including a composition layer to selectively cure the photosensitive composition layer to form a plurality of liquid crystal regions arranged in a matrix and polymer walls between the liquid crystal regions. A manufacturing apparatus for manufacturing a liquid crystal display element by forming, comprising: a light source that generates parallel light; a photomask that is arranged at a distance from the liquid crystal panel and that modulates the parallel light from the light source; and a photomask. Optical means for irradiating the photosensitive composition of the liquid crystal panel, and the light from the optical means forms an image on the photosensitive composition after passing through one of the two substrates. So that the light source, the photomask, the liquid crystal panel and And position adjusting means for adjusting the position of at least one of the optical means, thereby achieving the above object.

In the present invention, an erecting equal-magnification image forming means may be used as the optical means.

In the present invention, a gradient index rod lens array may be used as the erecting equal-magnification image forming means.

In the present invention, the image forming area of the gradient index rod lens array is narrower than the effective area of the photomask, and the rod lens array and the light source are moved in parallel with respect to the photomask. It may be equipped with means.

In the present invention, the optical means reflects a first reflecting member having a first reflecting portion and a second reflecting portion, and reflected light from the first reflecting portion to the second reflecting portion. A second reflecting member, wherein the second reflecting member is configured such that the first reflecting portion of the first reflecting member receives the reflected light obtained by reflecting the light from the photomask and receives the reflected light from the second reflecting member. The first reflecting member is arranged at a position where the reflected light is incident on the second reflecting portion of the first reflecting member.
The second reflecting portion of the reflecting member is arranged at a position for irradiating the photosensitive composition of the liquid crystal panel with the light from the second reflecting member, and the second reflecting portion of the reflecting member is optically arranged from the photomask to the first reflecting portion. The distance and the optical distance from the second reflecting portion to the photosensitive composition may be set to be equal.

According to the method for producing a liquid crystal display element of the present invention, a liquid crystal panel including two substrates, at least a part of which is transparent, and a photosensitive composition layer sandwiched between the two substrates, is subjected to pattern exposure. By selectively curing the photosensitive composition layer, a plurality of liquid crystal regions arranged in a matrix,
A method of manufacturing a liquid crystal display device including a photosensitive material for forming a polymer wall between liquid crystal regions to manufacture a liquid crystal display device, wherein parallel light from a light source is arranged at a distance from the liquid crystal panel. At least one of the light source, the photomask, the liquid crystal panel and the optical means at a position where the light intensity-modulated by the photomask is imaged on the photosensitive composition layer of the liquid crystal panel by the optical means. The step of adjusting the position by the position adjusting means, and the parallel light from the light source for reacting the photosensitive composition layer are intensity-modulated by a photomask arranged at a distance from the liquid crystal panel, and the optical means of the liquid crystal panel And a light-sensitive material including a step of forming an image on the light-sensitive composition layer, whereby the above object can be achieved.

In the present invention, a first reflecting member having a first reflecting portion and a second reflecting portion, and a second reflecting member reflecting the reflected light from the first reflecting portion to the second reflecting portion. The second reflecting member is configured such that reflected light obtained by reflecting light from the photomask into the first reflecting portion of the first reflecting member is incident, and reflected light from the second reflecting member is the first reflecting member. The first reflection member is disposed at a position where it enters the second reflection portion of the first reflection member,
The reflecting portion uses an optical means arranged at a position for irradiating the light-sensitive composition layer of the liquid crystal panel with the light from the second reflecting member, and the position adjusting step uses the photomask to remove the first light from the photomask. It may include a step of adjusting the optical distance to the reflective portion and the optical distance from the second reflective portion to the photosensitive composition layer to be equal.

In the present invention, in the position adjusting step, parallel light that does not react with the photosensitive composition layer is generated from the light source and is incident on the liquid crystal panel via the optical means. An image formation state of the parallel light on the photosensitive composition layer is detected, and based on the detected image formation state of the parallel light, the optical means is formed on the photosensitive composition layer of the liquid crystal panel. At least one of the light source, the photomask, the liquid crystal panel, and the optical means may be adjusted to the image position by the position adjusting means.

In the present invention, the parallel light from the light source may be imaged on the photosensitive composition layer by using an erecting equal-magnification image forming lens as the optical means.

In the present invention, the erecting equal-magnification image forming lens may be a gradient index rod lens array.

In the present invention, the gradient index rod lens array having an image forming area narrower than the effective area of the photomask is used, and in the image forming step, the rod lens array and the rod lens array are provided for the photomask. In some cases, the light source is moved in parallel and the parallel light is image-wise exposed on the photosensitive composition layer.

In the present invention, the gradient index rod lens array for forming an erecting equal-magnification image is used as the optical means, and an optical path from the photomask to the incident end surface of the gradient index rod lens array is optically provided. It may include a step of adjusting the distance to be equal to the optical distance from the exit end face of the gradient index rod lens array to the photosensitive composition layer.

[0024]

The present invention is an apparatus and method for manufacturing a liquid crystal display element effective for widening the viewing angle and strengthening against external impact force. In the liquid crystal display element, a photosensitive material, which is a mixture of a liquid crystal material and a photosensitive material, is injected between two substrates to form a photosensitive composition layer, and a light control means such as a photomask is formed on the photosensitive composition layer. Is used to irradiate light, and the liquid crystal and the polymer material are phase-separated by a photopolymerization reaction.

A projection imaging optical system or an erecting equal-magnification imaging optical system is used as an optical means for forming an image of the photomask on the photosensitive composition layer, and the photomask, the optical means, and the liquid crystal panel are used. By adjusting the position of at least one of them, it is possible to accurately form an image of the photomask on the photosensitive composition layer.

Further, as the optical means, an equal-magnification imaging optical system,
For example, when using a mirror projection optical system and a gradient index rod lens array, accurate image formation is possible if the optical means, the photomask, and the photosensitive composition layer are optically equal in distance to the exposed surface. is there. For example, when there is an intervening substance such as a substrate of a liquid crystal display panel between the optical means and the photosensitive composition layer, the intervening substance is calculated by using the optical refractive index of the intervening substance and the refractive index of air. The position may be adjusted by using the converted distance in which the thickness of the is converted into the distance in the air. Furthermore, by using an erecting equal-magnification imaging optical system, for example, a gradient index rod lens array, the manufacturing apparatus can be made compact.

The gradient index rod lens is a rod-shaped lens in which the refractive index decreases from the central axis toward the periphery, and the conventional lens refracts light by the curved surface of the light incident / exiting surface. On the other hand, the rod lens continuously refracts light with the refractive index distribution formed in the rod lens to form an image. Therefore, even if both end surfaces in the longitudinal direction of the rod lens are flat, the lens function is exhibited.

Further, the light receiving angle of the rod lens is determined by the area of the end face and the like. However, if the light receiving angle is too small, the image forming range of each rod lens is narrowed, and the rod lens is narrowed. Even if they are arranged in an array, the imaging ranges of the individual lenses do not overlap, and the entire screen obtained by imaging is locally divided, so the acceptance angle satisfies the following conditions. Need to be set.

The rod lens array usually constitutes an assembly in which individual rod lenses are circumscribed with each other at six points at equal intervals on the circumference. Therefore, the conditions for the image forming ranges of the rod lenses to overlap without any gap are:
By setting the radius of the imaging range to be longer than the distance between the center of one rod lens and the center of an equilateral triangle that connects the centers of three rod lenses that include one rod lens and are adjacent to each other. is there. Therefore, regarding the array pitch P of the individual rod lenses in the rod lens array, the working distance L that is the optical distance from the light incident end surface to the image forming surface, and the light receiving angle (half angle) θ,

[0030]

[Equation 1]

The light receiving angle θ may be set so as to satisfy the condition of.

Here, the conditions to be satisfied by the light receiving angle θ of the rod lens are shown. However, as long as this condition is satisfied by the light receiving angle θ of the lens, a rod lens corresponding to the parallelism of the illumination light for exposing the liquid crystal display element is used. No alignment with photomask is required.

Further, the image forming area of the rod lens array and the illumination area of the exposure light source are formed into a linear shape or a predetermined planar shape,
The position of the photosensitive material surface such as the photomask and the liquid crystal panel is fixed after the position adjustment described above, the rod lens array and the light source for exposure are moved, and the region of the photomask necessary for patterning is scanned. Thereby, the liquid crystal display element can be exposed with the pattern provided in the photomask. Thereby, in the manufacturing apparatus including the rod lens array which is the erecting equal-magnification imaging optical system, the light source, the photomask,
A mechanism for moving the rod lens array and the liquid crystal panel in the respective three-dimensional directions is unnecessary. Therefore, the manufacturing apparatus can be made compact and the price can be reduced due to the size reduction. Further, it is not necessary to highly accurately define the parallelism of light from the exposure light source, and the exposure light source can be made compact and the cost can be reduced due to the compactness.

Further, even if an erecting equal-magnification image forming optical system having a narrow image forming area is used, precise pattern exposure can be performed on a large-area liquid crystal display element.

[0035]

EXAMPLES Examples of the present invention will be specifically described below.

Example 1 FIG. 2A is a sectional view of a liquid crystal panel 10 manufactured in Example 1 of the present invention. In the present embodiment, the liquid crystal panel 10 has an active matrix substrate 11 and a counter substrate 12 arranged to face each other with a spacer (not shown) interposed therebetween. The active matrix substrate 11 includes a glass substrate 21, and on the glass substrate 21,
A plurality of picture element electrodes 13 made of ITO (indium tin oxide) are formed in a matrix arrangement. When a liquid crystal display device is manufactured by exposing the liquid crystal panel 10 as described later, in the present invention, the exposure is performed from the active matrix substrate 11 side. The counter substrate 12 includes a glass substrate 22, on which a counter electrode 14 and a black matrix 15 made of ITO are formed. Both boards 11, 1
Between the two, a mixture layer 16 is formed by enclosing a mixture obtained by mixing a liquid crystal material and a photosensitive material which is a material that is polymerized and cured by photopolymerization. This mixture layer 16
The photosensitive material in the mixture layer 16 is selectively cured between the picture element electrodes 13 by irradiating it with ultraviolet light 20.
As a result, as shown in the cross-sectional view of FIG. 2B, the photosensitive material is photo-cured between the picture element electrodes 13 to form the polymer wall 23. By curing, the liquid crystal in the mixture 16 is phase-separated, and the liquid crystal region 24 is formed for each pixel electrode 13. This allows
The liquid crystal display element 30 is manufactured.

An example of a manufacturing apparatus for manufacturing the liquid crystal display element 30 will be described below.

FIG. 1 is a system diagram showing the basic structure of a manufacturing apparatus 31 to which the present invention is applied. Manufacturing apparatus 31 of this embodiment
Is an illuminating means 2 for illuminating the entire area of the photomask 1, a projection lens system 3 for projecting an image of the photomask 1 on the exposed surface which is the mixture layer 16 of the liquid crystal panel 10, and a liquid crystal having the exposed surface. Stage 4 where panel 10 is installed
It is configured to include and. The photomask 1 is held by a holding member 33, and an elevating mechanism 34 is connected to the holding member 33. Further, a lifting mechanism 35 is also connected to the stage 4.

The illumination means 3 is, for example, a lamp 25 such as a mercury lamp which emits ultraviolet rays, an elliptical mirror 26 which reflects and collects light from the lamp 25, and a light from the lamp 25 and the elliptic mirror 26. An integrator 27 for eliminating the unevenness of the intensity distribution therein, a total reflection mirror 28 for reflecting the light from the integrator 27, and a condenser lens 29 for emitting the light from the total reflection mirror 28 as parallel light are provided.

In the manufacturing apparatus 31 of this embodiment, the lighting means 2
The light intensity distribution of the light emitted from the photomask 1 is modulated and controlled by the photomask 1. The modulated and controlled light is enlarged or reduced by the projection lens system 3 and the liquid crystal panel 10 on the stage 4 is expanded.
An image is formed on the surface to be exposed. The projection lens system 3 is selected to have a size capable of receiving light from the entire area of the photomask 1 and efficiently transmitting light from the illumination means 2 to the exposed surface. Further, as the projection lens system 3, a lens whose aberration is corrected is used.

An example of a manufacturing method for manufacturing the liquid crystal display element 30 will be described below.

In the first step, a liquid crystal panel 10 in which a mixture layer 16 containing a photosensitive material that undergoes a photopolymerization reaction upon irradiation with ultraviolet rays is enclosed in a pair of glass substrates 21 and 22 is placed on the stage 4. To do. In the second step, the projection lens 3 is adjusted so that the light from the projection lens system 3 forms an image on the mixture layer 16 between the glass substrates 21 and 22.

When the projection lens system 3 is adjusted, the light from the projection lens system 3 passes through one glass substrate 21 and forms an image on the mixture layer 16, so that the apparent image formation distance and the optical image formation are performed. The distance is different. For this reason, the lamp 2 for generating visible light in a wavelength range in which the photosensitive material used does not react
5 is used. Further, the half mirror 37 is arranged between the projection lens system 3 and the liquid crystal panel 10, and the microscope 32 for observing the reflected light from the half mirror 37 is installed. The illumination means 2 emits light in the visible light wavelength band. This light is imaged on the surface to be exposed such as the mixture layer 16 through the photomask 1 and the projection lens system 3. At this time, a part of the light entering the half mirror 37 from the projection lens system 3 passes through the half mirror 37 and enters the mixture layer 16 of the liquid crystal panel 10. Since the reflected light from the mixture layer 16 is reflected by the half mirror 37, this reflected light is observed by the microscope 32.

This makes it possible to detect whether or not the exposure pattern of the photomask 1 with the light in the visible light wavelength band is imaged on the mixture layer 16 with high accuracy.
According to the detection result, the distance between the photomask 1 or the stage 4 and the projection lens system 3 is adjusted by using at least one of the elevating mechanisms 34, 35, and the light in the visible light wavelength band from the illuminating means 2 is mixed with the mixture layer. The position is adjusted so as to form an image on 16 with high accuracy. As a result, the photomask 1
It becomes possible to form the exposure pattern possessed by the above on the mixture layer 16 with high accuracy.

After this position adjustment, in the third step, ultraviolet rays are irradiated from the illuminating means 2 using a lamp 25 such as a mercury lamp which emits ultraviolet rays, and the shape of the exposure pattern of the photomask 1 is changed to the mixture layer 16. Can be accurately exposed.

As a structure for adjusting the position, the half mirror 37 is replaced with a through hole 36 at an arbitrary position corresponding to the lower part of the liquid crystal panel 10 of the stage 4.
Alternatively, the microscope 32 may observe the image formation state of the exposure pattern of the photomask 1 on the mixture layer 16 by the light in the visible light wavelength band through the through hole 36. Further, it goes without saying that an image pickup device may be connected to these microscopes 32 to observe the image formation state by various display devices.

When the photosensitive wavelength range of the photosensitive material is in the visible range, as the position adjusting lamp 25, a lamp that emits visible light having a wavelength other than the photosensitive wavelength range, an infrared lamp, or the like is used. In the case of visible light, a normal microscope may be used, and in the case of infrared light, the image formation state in the mixture layer 16 may be observed using an infrared camera or the like. As described above, when the photosensitive wavelength range of the photosensitive material is in the visible range, a metal halide lamp or a xenon lamp that emits light in a wavelength range corresponding to the photosensitive wavelength range is used as the exposure lamp 25. Of course, the same applies to the following examples.

As described above, in this embodiment, the mixture layer 16 can be patterned with high accuracy by the irradiation of the light from the illumination means 2. Further, as a result, the liquid crystal region 23 shown in FIG. 2 can be formed with high positional accuracy for each pixel electrode 13, the brightness is high, the viewing angle is widened, and the display quality is significantly improved. Liquid crystal display device 30
Can be provided.

Further, according to the manufacturing apparatus 31 of this embodiment,
The elevating mechanisms 34 and 35 are used for the photomask 1 and the stage 4.
Can be moved only in the direction in which the projection lens system 3 is moved toward or away from the projection lens system 3, so that the manufacturing apparatus 31 can be made compact and the cost can be reduced by making the manufacturing apparatus 31 compact.

In the present embodiment, highly accurate image formation of the exposure pattern on the mixture layer 16 can be realized by the simple position adjusting process as described above. As a result, the takt time required in the manufacturing process can be shortened.

Furthermore, the manufacturing apparatus 31 of this embodiment and the liquid crystal display element 30 manufactured by the above-described manufacturing method are
The polymer wall 23 is formed between the glass substrates 21 and 22. Therefore, the liquid crystal display element 30 of the present embodiment has high impact resistance against an external impact force, and is suitable as a display device for a portable electronic device. In addition, the liquid crystal display element 30
It can also be suitably used for a device in which a translucent input film is attached and the input film is brought into contact with or pressed with a finger or a pen-shaped member to perform input.

(Embodiment 2) Embodiment 2 of the manufacturing apparatus of the present invention using a projection projection optical system of the mirror projection type.
Is shown in the system diagram of FIG. This embodiment is similar to the first embodiment, and the corresponding parts are designated by the same reference numerals.

In the manufacturing apparatus 41 of this embodiment, the photomask 1, the illuminating means 2, and the stage 4 have the same structure as that of the first embodiment. The projection imaging optical system 42 of the present embodiment has a first reflecting surface 43 and a second reflecting surface 4 at positions opposite to each other.
A trapezoidal mirror 5 provided with 4, a convex mirror 6, and a concave mirror 7 are provided, and are configured as described below. The first reflecting surface 43 of the trapezoidal mirror 5 is located at a position where the light from the illuminating means 2 passes through the photomask 1 and enters, and the concave mirror 7 is located at a position where the light reflected by the first reflecting surface 43 enters. It The light reflected by the concave mirror 7 is reflected by the convex mirror 6 and is incident on the concave mirror 7 again, and the second reflection surface 44 of the trapezoidal mirror 5 is arranged at a position where the reflected light from the concave mirror 7 is incident. The second reflection surface 44 of the trapezoidal mirror 5 is arranged at a position where the reflected light from the second reflection surface 44 enters the liquid crystal panel 10 on the stage 4.

As an example, the first reflecting surface 43 of the trapezoidal mirror 5
Forms an angle of 45 degrees with respect to the optical axis of the light from the illumination means 2, and the second reflecting surface 44 of the trapezoidal mirror 5 has the liquid crystal panel 1
It is arranged so as to form 45 degrees with respect to the normal direction of the surface of 0. The convex mirror 6 is arranged at the focal point of the concave mirror 7.

The order of travel of the light rays emitted from the illumination means 2 will be described. The light intensity of the light from the illumination means 2 is controlled by the photomask 1, is reflected by the first reflection surface 43 of the trapezoidal mirror 5, and the concave mirror 7 is used. The convex mirror 6 and the concave mirror 7 are reflected in this order, and further reflected by the second reflecting surface 44 of the trapezoidal mirror 5, and an image is formed on the exposed surface which is the mixture layer 16 of the liquid crystal panel 10. In this projection imaging optical system 42, the first optical path from the illumination means 2 to the convex mirror 6 via the first plate slope 43 and the concave mirror 7, and the mixture layer via the convex mirror 6, the concave mirror 7 and the second reflecting surface 44. When the second optical path reaching 16 is made line-symmetrical with respect to the Z axis defined as the central axis of the trapezoidal mirror 5 in FIG. 3, the exposure pattern image formed on the mixture layer 16 is formed on the photomask 1. Of the exposure pattern, a left-right inverted optical image is formed, and the projection imaging optical system 42
Is a left-right inverted equal-magnification imaging optical system.

In this case, the image formation adjustment for adjusting the exposure pattern on the mixture layer 16 with high precision is performed by the first adjustment.
Since the optical path and the second optical path are line-symmetric with respect to the Z axis, the first distance L1 from the photomask 1 to the Z axis and the second distance L2 from the exposed surface to the Z axis can be optically equalized. Good. In the case of the present embodiment, the light from the trapezoidal mirror 5 passes through the glass substrate 21 of the liquid crystal panel 10 and forms an image on the mixture layer 16. In this case, the thickness of the glass substrate 21 through which light passes is converted into a distance in air, and either the stage 4 or the photomask 1 is adjusted so that the first distance and the second distance are equal to each other. Adjust the position.

Concretely, the procedure is as follows. Assuming that the refractive index of the glass substrate 21 is n1 and the refractive index of air is 1, the optical distance t ′ of the thickness t of the glass substrate 21 is

[0058]

## EQU2 ## t '= t / n1. On the other hand, the second distance L2 is the distance L3 from the Z axis to the surface of the glass substrate 21 of the liquid crystal panel 10 and the optical distance t ′ of the thickness t of the glass substrate 21,

[0059]

## EQU3 ## L2 = L3 + t '. Therefore, with respect to the first distance L1,

[0060]

## EQU00004 ## The position of either the photomask 1 or the stage 4 is adjusted using one of the elevating mechanisms 34 and 35 so that L1 = L2.

As a position adjusting method other than the above, the photomask 1 is arranged on the transparent substrate 45 made of the same material as the glass substrate 21 of the liquid crystal panel 10 and having the same thickness. As a result, the first optical path and the second optical path are Z
It becomes axisymmetric with respect to the axis, and the first distance L1 and the second distance L2 are equidistant and are also optically equidistant.
As a result, the exposure pattern on the photomask 1 is imaged at the same size on the mixture layer 16.

The manufacturing apparatus 41 of this embodiment can also be used when exposing the surface of a glass substrate, for example, the glass substrate 22 alone, and there is no need to separately prepare an apparatus for surface exposure, and the manufacturing apparatus 41 is manufactured. It is possible to further simplify the device and the manufacturing process.

The liquid crystal panel 1 is manufactured by the manufacturing apparatus 41 of this embodiment.
When exposing the surface of the glass substrate 22 instead of the inside of 0, by removing the translucent substrate 45 inserted immediately after the photomask 1, the optical distances become equal and a highly accurate exposure pattern is formed. it can.

In this way, in the present embodiment, the position adjustment is performed before the actual exposure of the mixture layer 16 of the liquid crystal panel 10 so that the mixture layer 16 is imaged with high precision. Is being obtained. Therefore, in the present embodiment, not only the same effects as those described in the first embodiment can be obtained, but also in the manufacturing apparatus 41 of the present embodiment, referring to FIG. Explained half mirror 3
7 or the step of detecting the imaging state using the microscope 32 or the like is unnecessary. As a result, the manufacturing apparatus 41 can further simplify its configuration, and can further simplify the manufacturing process of the liquid crystal display element 30.

(Embodiment 3) As another embodiment of the present invention,
An example of a manufacturing apparatus and a manufacturing method when a SELFOC lens manufactured by Nippon Sheet Glass Co., Ltd. is used as a gradient index rod lens of an erecting equal-magnification imaging optical system will be described below. The present embodiment is similar to the first embodiment, and corresponding parts are designated by the same reference numerals.

FIG. 4 is a system diagram showing the basic construction of the manufacturing apparatus 50 of the third embodiment of the present invention. Manufacturing apparatus 5 of this embodiment
Reference numeral 0 denotes an illuminating means 52 for illuminating the photomask 51, and a SELFOC lens 5 for forming an erecting equal-magnification image of the photomask 51 on the exposed surface which is the mixture layer 16 of the liquid crystal panel 10.
3. A stage 54 for mounting the liquid crystal panel 10 having a pair of glass substrates 21 and 22 sandwiching a surface to be exposed which is the mixture layer 16 therebetween. In the manufacturing apparatus 50 of this embodiment, the light intensity emitted from the illumination means 52 is controlled by the photomask 51, and the controlled light is directed to the mixture layer 16 of the liquid crystal panel 10 on the stage 54 by the SELFOC lens 53. Reached and photomask 51
The exposure pattern of is imaged as an erecting equal-magnification optical image.

Also in this embodiment, the above-mentioned embodiment 2 is used.
The translucent substrate 60 similar to the translucent substrate 45 in Example 2 may be used for the same purpose as the translucent substrate 45 in Example 2. Specifically, the photomask 51
Are placed on a transparent substrate 60 made of the same material and having the same thickness as the glass substrate 21 of the liquid crystal panel 10. As a result, the first optical path and the second optical path similar to those in the second embodiment are line-symmetric with respect to the Z axis, the first distance and the second distance are equidistant, and also optically. It is equidistant. As a result, the exposure pattern on the photomask 51 is imaged on the mixture layer 16 at an erecting equal magnification.

As the light source of the illumination means 52, a mercury lamp or the like that emits ultraviolet rays is used as in the first embodiment. This light source may be a point light source, a line light source, or a surface light source.
The illuminating means 52 will be described in the section of the operation, and will be described in detail below, if the illuminating light conditions of the angular distribution equal to or larger than the light receiving angle for overlapping the imaging ranges of the rod lenses without a gap are met. An optical system may be provided to effectively collect the emitted light beam on the SELFOC lens 53.

FIG. 5 and FIG. 6 are lens cross-sectional views for explaining the illumination light conditions set for the gradient index rod lens in the present invention. Hereinafter, FIG. 5 will be referred to. The gradient index rod lens (hereinafter, rod lens) 83, which is the SELFOC lens 53 as an example, is a rod-shaped lens whose refractive index decreases from the central axis toward the periphery in the radial direction. Whereas a conventional lens refracts light to form an image due to the curved shape of the light entrance / exit surface, the rod lens 83 has a refractive index distribution formed in the rod lens 83 as shown in FIG. The light is continuously refracted to form an optical image of the same size as the optical image 81 from the light source on the light receiving surface. Therefore, both end surfaces 8 of the rod lens 83 are
Even if 4, 85 are flat surfaces, they have a lens effect.

Although the light receiving angle of the rod lens 83 is fixed, if the light receiving angle is too small as shown in FIG. 6 (a), the image forming range 86 of each rod lens 83 is narrowed. Become. Therefore, the rod lens 8
Even if the rod lens array 88 is configured by arranging 3 in the form of an array as shown in FIG. 6, the image forming ranges 86 of the individual rod lenses 83 do not overlap each other, and a gap 87 is formed between the image forming ranges 86. The entire screen formed by the light from the rod lens array 88 is divided into a plurality of parts. Therefore, it is necessary to set the light receiving angle (half angle) θ of the rod lens 83 shown in FIG. 6 so as to satisfy the following condition.

As shown in the cross-sectional view of the rod lens array 88 of FIG. 7, in the rod lens array 88, usually, the individual rod lenses 83 are equally spaced in the circumferential direction on the outer peripheral surface of each rod lens 83. It is an assembly that is circumscribed by 6 points. Therefore, each rod lens 83
The conditions under which the image forming ranges 86 of the two overlap with each other without a gap are such that the radius r of the image forming ranges 86 shown in FIG. 6 includes the center A of one rod lens 83 and the one rod lens 83, and This is to be longer than the distance AB from the center B of the equilateral triangle connecting the centers of the three adjacent rod lenses 83. Therefore, with respect to the array pitch P of the individual rod lenses 83 in the rod lens array 88, the working distance L which is the optical distance from the light incident end surface to the image forming surface, and the light receiving angle (half angle) θ, AB is

[0072]

[Equation 5]

Therefore,

[0074]

[Equation 6]

The light receiving angle θ may be set so as to satisfy the condition of.

Here, the conditions to be satisfied by the light receiving angle θ of the rod lens 83 are shown, but the rod lens 83 and the photomask corresponding to the parallelism of the illumination light for exposing the liquid crystal panel 10 need not be aligned.

An embodiment of the manufacturing method using the manufacturing apparatus 50 of this embodiment will be described below.

In this embodiment, since the SELFOC lens 53 is an erecting equal-magnification image forming optical system, the SELFOC lens 5 is
3, the distance between the photomask 51 and the Z axis passing through the longitudinal intermediate position in the vertical direction of FIG. 4 and the distance between the Z axis and the mixture layer 16 of the liquid crystal panel 10 are equal optical distances.
The exposure pattern of the photomask 51 is highly accurate and the mixture layer 16
Will be focused on.

FIG. 8, FIG. 9 and FIG. 10 are system diagrams for explaining the exposure step of the manufacturing method using the manufacturing apparatus 50 of this embodiment, and FIGS. 8 to 10 show (1) and (2) which will be described later. ) And (3), respectively. The manufacturing apparatus 50 of this embodiment includes a driving unit 55 that drives the illumination unit 52 in a plane parallel to the surface of the photomask 51, a Selfoc lens 53, and a stage 54.
The manufacturing apparatus 50 includes the illumination means 52 and the SELFOC lens 5
3 and 3 in a virtual plane parallel to the photomask 51 in the mutually orthogonal X-axis and Y-axis directions, respectively,
Driving units 55 and 56 for driving the illuminating unit 52 and the Selfoc lens 53 in arbitrary directions within the virtual plane are provided.

Also in the manufacturing apparatus 50, the light intensity distribution of the light beam emitted from the illumination means 52 is controlled by the photomask 51.
The controlled light beam reaches the exposed surface which is the mixture layer 16 on the stage 54 by the SELFOC lens 53,
The exposure pattern of the photomask 51 is imaged on the mixture layer 16 as an erecting equal-magnification optical image.

Referring to FIG. 6 together, the exposure process of this embodiment will be described in accordance with the size relation among the image forming area of the SELFOC lens 53, the illuminating area of the illuminating means 52, and the effective area of the photomask 51. The cases will be described separately.

(1) In the case where the illuminating means 52 can irradiate only a part of the photomask 51, and the SELFOC lens 53 can receive light from the entire area of the photomask 51.

In the manufacturing apparatus 50a in this case, as shown in FIG.
As shown in (1), the SELFOC lens 53 and the stage 54 are fixed to each other, and while the illuminating means 52 is being driven by the driving means 55, the entire area of the photomask 51 is scanned for exposure. At this time, the illuminating means 52 is driven at a speed at which each portion of the surface to be exposed, which is the mixture layer 16, can obtain a required irradiation amount, and the photomask 51 is scanned. Thereby, the exposure pattern of the photomask 51 can be imaged on the mixture layer 16 with high accuracy.

As a result, the same effects as the effects described in the second embodiment can be achieved, and further, the illumination means 52 can be made compact and the cost can be reduced by the compactness.

(2) The illuminating means 52 irradiates the entire area of the photomask 51, and the SELFOC lens 53 causes the photomask 51 to illuminate.
If you can only receive light from part of the.

In the manufacturing apparatus 50b in this case, as shown in FIG.
As shown in FIG. 3, the illumination means 52 and the stage 54 are fixed to each other, and the SELFOC lens 53 is scanned by the drive means 56 so as to cover the entire area of the photomask 51. At this time, in order to prevent the irradiation light from the illuminating means 52 from entering the mixture layer 16 from a place other than the SELFOC lens 53, a portion other than the SELFOC lens 53 between the illuminating means 52 and the liquid crystal panel 10 is prevented. The light shielding mask 57 shields light. For example, a light shielding mask 57 may be provided on the virtual plane on which the SELFOC lens 53 moves. At the time of the scanning, each part of the mixture layer 16 is exposed while being scanned by the driving means 56 at a speed that can obtain a necessary irradiation amount.

As a result, the same effects as the effects described in the second embodiment can be achieved, and further, the SELFOC lens 53 can be made compact and the cost can be reduced by the compactness.

(3) When the illumination means 52 and the SELFOC lens 53 can cover only a part of the photomask 51.

In the manufacturing apparatus 50c in this case, as shown in FIG.
As shown in 0, the drive means 58 which drives both the illumination means 52 and the SELFOC lens 53 is used.
Details of the configuration and manufacturing method of the manufacturing apparatus 50c in this case are shown in the system diagrams of FIGS. 11 and 12. 11 and 12 correspond to the items (a) and (b) described later. In the case of the manufacturing apparatus 50c, both the illumination unit 52 and the SELFOC lens 53 are interlocked with each other to scan the photomask 51. The case will be described below separately.

(A) In the case where the illuminating means 52 and the SELFOC lens 53 linearly cover a part of the mixture layer 16 along the vertical direction or the horizontal direction orthogonal to each other.

In this case, the manufacturing apparatus 50 shown in FIG.
c1 is used. The illuminating means 52 and the SELFOC lens 53 are shown in FIG.
You will be guided along the arrow direction shown in. The illuminating means 52 and the SELFOC lens 53 are along the arrow direction at a speed at which each part of the mixture layer 16 can obtain a necessary irradiation amount.
The mixture layer 16 is exposed while scanning the photomask 51.

Therefore, a driving device for moving the illuminating means 52 and the SELFOC lens 53 in the respective three-dimensional directions is unnecessary, and the manufacturing apparatus 50c1 can be made compact and the cost can be reduced by the compacting.

Further, in this embodiment, a part of the mixture layer 16 in the vertical direction or the horizontal direction can be exposed linearly at one time,
The effective area of the photomask 51 can be covered by scanning exposure in only one direction. Therefore, even if the manufacturing apparatus 50c1 is made compact, it is possible to prevent the takt time, which is the time required for one exposure in the exposure step, from increasing.

(B) In the following description, FIG. 1 will also be referred to. The manufacturing apparatus 50c2 of the present embodiment is similar to the manufacturing apparatus 50c1 of the above embodiment, and corresponding parts are designated by the same reference numerals. In the manufacturing apparatus 50c2 of the present embodiment, the illuminating means 52 is the most compact size that can be easily made, for example, the arc length of a mercury lamp is 30 mm to 5 mm, preferably about 10 mm. Of the illuminating means 52 arranged at the first focus position, the photomask 51 is arranged at the exit of the illuminating means 52, and the SELFOC lens 53 is arranged at the second focus position to cover only the illumination area by the illuminating means 52 This is a case where the size SELFOC lens 53 is used.

Using the manufacturing apparatus 50c2 in this case,
At a rate that allows each part of the mixture layer 16 to obtain the required dose,
The mixture layer 16 is exposed while scanning the photomask 51 along the arrow direction shown in FIG. In particular,
The photomask 51 is scanned along the X-axis direction of the X-axis direction and the Y-axis direction which are orthogonal to each other. 1 in the X-axis direction
When the step scanning is finished, the illumination unit 52 moves in the Y-axis direction by about the width of the X-axis scan region of the photomask 51 in the Y-axis direction. After that, the photomask 51 is scanned again along the X-axis direction. By repeating this, the entire area of the photomask 51 is scanned.

Therefore, in each of the embodiments described with reference to FIGS. 4 to 12, the position adjusting step performed as the first step is the glass substrate 21 of the liquid crystal panel 10 as described in the second embodiment. The thickness t of the photomask 5 is converted to a distance in the air so that the conditions shown in the equations 2 to 4 are satisfied.
At least one of 1 and the stage 54 is moved using the elevating mechanisms 34 and 35.

In the second step, as described in the second embodiment, light in the wavelength band in which the photo-curable material in the mixture layer 16 photopolymerizes is generated from the illumination means 52, and the photomask 51 is generated.
The exposure pattern of 1 is imaged on the mixture layer 16 with high precision.
The specific scanning method of the photomask 51 at the time of this exposure is as described above.

In addition to achieving the same effects as the effects described in the second embodiment, the present embodiment has a manufacturing apparatus as compared with the projection lens of the projection imaging optical system or the mirror type projection system. The configuration of 50 can be made more compact.

In this embodiment, the SELFOC lens manufactured by Nippon Sheet Glass Co., Ltd. is used as the rod lens, but it has an erecting equal-magnification image forming function such as "SMILE lenses" manufactured by Corning. Anything will do as long as it is available.

Therefore, a driving device for moving the illuminating means 52 and the SELFOC lens 53 in the respective three-dimensional directions is unnecessary, and the manufacturing device 50c1 can be made compact and the cost can be reduced by the compacting. Further, the illuminating means 52 and the SELFOC lens 53 are made as compact as possible as described above, and in this respect, the illuminating means 52 and the SELFOC lens 53 are made compact and the price is low due to the compactness. Is possible.

When scanning the photomask 51,
If exposure is started from the center of the photomask 51 and scanning is performed in a spiral shape, the tact time can be shortened.

Further, according to the present embodiment, the rod lens array 88, which is an erecting equal-magnification imaging optical system, can be made compact and the cost can be reduced by the compactness. Further, the exposure light source can be made compact and the price can be reduced.

Further, even if an erecting equal-magnification image forming optical system having a narrow image forming area is used, precise pattern exposure can be performed on a large area liquid crystal display device.

[0104]

As described above, according to the present invention, a projection image forming optical system or an erecting equal-magnification image forming optical system is used as an optical unit for forming an image on the photomask on the photosensitive composition layer. By adjusting the position of at least one of the photomask, the optical means, the liquid crystal panel and the like, it is possible to accurately form an image of the photomask on the photosensitive composition layer.

Further, as the optical means, an equal-magnification imaging optical system,
For example, when using a mirror projection optical system and a gradient index rod lens array, accurate image formation is possible if the optical means, the photomask, and the photosensitive composition layer are optically equal in distance to the exposed surface. is there. For example, when there is an intervening substance such as a substrate of a liquid crystal display panel between the optical means and the photosensitive composition layer, the intervening substance is calculated by using the optical refractive index of the intervening substance and the refractive index of air. The position may be adjusted by using the converted distance in which the thickness of the is converted into the distance in the air. Furthermore, by using an erecting equal-magnification imaging optical system, for example, a gradient index rod lens array, the manufacturing apparatus can be made compact.

[Brief description of drawings]

FIG. 1 is a system diagram showing a basic configuration of a manufacturing apparatus 31 according to a first embodiment of the present invention.

FIG. 2 is a liquid crystal panel 10 used in Example 1 of the present invention.
FIG. 3 is a cross-sectional view of a manufactured liquid crystal display element 30.

FIG. 3 is a system diagram of a manufacturing apparatus that uses a mirror projection type projection imaging optical system according to a second embodiment of the manufacturing apparatus of the present invention.

FIG. 4 is a system diagram showing a basic configuration of a manufacturing apparatus 50 according to a third embodiment of the present invention.

FIG. 5 is a lens cross-sectional view illustrating imaging optics of a gradient index rod lens according to the present invention.

FIG. 6 is a lens array cross-sectional view illustrating an illumination light condition of a gradient index rod lens in the present invention.

7 is a cross-sectional view of the rod lens array 88 of FIG.

FIG. 8 is a system diagram illustrating an example of an exposure process of a manufacturing method using the manufacturing apparatus 50 of the present embodiment.

FIG. 9 is a system diagram explaining another example of the exposure step of the manufacturing method using the manufacturing apparatus 50 of the present embodiment.

FIG. 10 is a system diagram illustrating still another example of the exposure step of the manufacturing method using the manufacturing apparatus 50 of the present embodiment.

FIG. 11 is a system diagram showing an example of a configuration of a manufacturing apparatus according to another embodiment of the present invention.

FIG. 12 is a system diagram showing another example of the configuration of the manufacturing apparatus according to another embodiment of the present invention.

[Explanation of symbols]

1, 51 Photomask 2, 52 Illuminating means 3 Projection lens system 4, 54 Stage 5 Trapezoidal mirror 6 Convex mirror 7 Concave mirror 10 Liquid crystal panel 11 Active matrix substrate 12 Counter substrate 13, 14 Electrode 15 Black matrix 16 Mixture of photosensitive material and liquid crystal material Layer 20 Ultraviolet Light 21, 22 Glass Substrate 23 Polymer Wall 24 Liquid Crystal Region 25 Mercury Lamp 30 Liquid Crystal Display Device 31, 41, 50, 50a, 50b, 50c, 50c
1, 50c2 Manufacturing apparatus 32 Microscope 33 Holding member 34, 35 Lifting mechanism 37 Half mirror 53 Selfoc lens 55, 56, 58 Driving means 83 Rod lens 88 Rod lens array

Claims (12)

[Claims] 1. A liquid crystal panel comprising two substrates, at least a part of which is transparent, and a photosensitive composition layer sandwiched between the two substrates, is subjected to pattern exposure to obtain the photosensitive composition. A manufacturing apparatus for manufacturing a liquid crystal display element by selectively curing a layer to form a plurality of liquid crystal regions arranged in a matrix and polymer walls between the liquid crystal regions, and generating parallel light. A light source, a photomask which is arranged at a distance from the liquid crystal panel, and which intensity-modulates parallel light from the light source, and an optical means for irradiating the photosensitive composition of the liquid crystal panel with light from the photomask. The light source, such that light from the optical means passes through one of the two substrates and forms an image on the photosensitive composition;
An apparatus for manufacturing a liquid crystal display device including a photosensitive material, comprising: a position adjusting means for adjusting the position of at least one of the photomask, the liquid crystal panel and the optical means. 2. An apparatus for manufacturing a liquid crystal display device containing a photosensitive material according to claim 1, wherein an erecting equal-magnification image forming means is used as the optical means. 3. An apparatus for manufacturing a liquid crystal display element containing a photosensitive material according to claim 2, wherein a gradient index rod lens array is used as the erecting equal-magnification image forming means. 4. An image forming area of the gradient index rod lens array is narrower than an effective area of the photomask, and a parallel moving means for moving the rod lens array and the light source in parallel with respect to the photomask is provided. An apparatus for manufacturing a liquid crystal display element, which comprises the photosensitive material according to claim 3. 5. The first optical member includes a first reflecting member having a first reflecting portion and a second reflecting portion, and a second reflecting member reflecting the reflected light from the first reflecting portion to the second reflecting portion. And the second reflecting member has the first reflecting portion of the first reflecting member,
The reflected light that is the light reflected from the photomask is incident, and the reflected light from the second reflecting member is the second reflected light of the first reflecting member.
The second reflecting portion of the first reflecting member is arranged at a position to be incident on the reflecting portion, and the second reflecting portion of the first reflecting member is arranged at a position for irradiating the photosensitive composition of the liquid crystal panel with light from the second reflecting member. The liquid crystal display device containing the photosensitive material according to claim 1, wherein an optical distance from the photomask to the first reflecting portion and an optical distance from the second reflecting portion to the photosensitive composition are set to be equal. Manufacturing equipment. 6. A liquid crystal panel comprising two substrates, at least a part of which is transparent, and a photosensitive composition layer sandwiched between the two substrates, is subjected to pattern exposure to obtain the photosensitive composition. Method of manufacturing liquid crystal display device including photosensitive material for selectively curing layer to form a plurality of liquid crystal regions arranged in matrix and polymer walls between the liquid crystal regions to manufacture liquid crystal display device In the position where the parallel light from the light source is intensity-modulated by a photomask arranged at a distance from the liquid crystal panel, an image is formed on the photosensitive composition layer of the liquid crystal panel by optical means, The step of adjusting the position of at least one of the light source, the photomask, the liquid crystal panel and the optical means by the position adjusting means, and the parallel light from the light source which reacts the photosensitive composition layer from the liquid crystal panel. Interval Only by the intensity-modulated by arranged photomask producing method of the liquid crystal display device comprising a light-sensitive material and a step for forming a photosensitive composition layer of the liquid crystal panel by an optical means. 7. A first device having a first reflecting portion and a second reflecting portion.
A reflecting member; and a second reflecting member that reflects the reflected light from the first reflecting portion to the second reflecting portion, the second reflecting member comprising:
The light reflected from the photomask is incident on the first reflective portion of the first reflective member, and the reflected light from the second reflective member is incident on the second reflective portion of the first reflective member. Optical means disposed at a position where the second reflective portion of the first reflective member irradiates the light-sensitive composition layer of the liquid crystal panel with the light from the second reflective member. The position adjusting step includes a step of adjusting the optical distance from the photomask to the first reflecting portion and the optical distance from the second reflecting portion to the photosensitive composition layer to be equal. 7. A method for manufacturing a liquid crystal display device, which comprises the photosensitive material according to 6. 8. In the position adjusting step, the parallel light that does not react with the photosensitive composition layer is generated from the light source, and the parallel light is incident on the liquid crystal panel through the optical means. An image forming state on the photosensitive composition layer is detected, and based on the detected image forming state of the parallel light, a position is formed on the photosensitive composition layer of the liquid crystal panel by the optical means. 7. The method for manufacturing a liquid crystal display device containing a photosensitive material according to claim 6, wherein at least one of the light source, the photomask, the liquid crystal panel, and the optical means is positionally adjusted by a position adjusting means. 9. The photosensitive material according to claim 8, wherein the parallel light from the light source forms an image on the photosensitive composition layer by using a lens for forming an erecting equal-magnification image as the optical means. A method for manufacturing a liquid crystal display device including the following. 10. The method of manufacturing a liquid crystal display device containing a photosensitive material according to claim 9, wherein the lens for forming an erecting equal-magnification image is a gradient index rod lens array. 11. The gradient index rod lens array having an image forming area narrower than an effective area of the photomask is used, and the rod lens array and the light source are parallel to the photomask in the image forming step. The method for producing a liquid crystal display device containing a photosensitive material according to claim 9, wherein the parallel light is image-wise exposed on the photosensitive composition layer by moving the photosensitive composition layer. 12. An optical distance from the photomask to an incident end face of the gradient index rod lens array, wherein the gradient index rod lens array for erecting equal-magnification images is used as the optical means, 7. The method for manufacturing a liquid crystal display device containing a photosensitive material according to claim 6, including the step of adjusting the optical distance from the exit end face of the gradient index rod lens array to the photosensitive composition layer to be equal.