JPH0717941B2 - Quenching method with electron beam - Google Patents
Quenching method with electron beamInfo
- Publication number
- JPH0717941B2 JPH0717941B2 JP62258342A JP25834287A JPH0717941B2 JP H0717941 B2 JPH0717941 B2 JP H0717941B2 JP 62258342 A JP62258342 A JP 62258342A JP 25834287 A JP25834287 A JP 25834287A JP H0717941 B2 JPH0717941 B2 JP H0717941B2
- Authority
- JP
- Japan
- Prior art keywords
- quenching
- workpiece
- deflection
- electron beam
- workpieces
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Welding Or Cutting Using Electron Beams (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、電子ビームを照射して炭素鋼などの表面に
焼入を施すための電子ビームによる焼入方法に関するも
のである。The present invention relates to an electron beam quenching method for irradiating an electron beam to quench the surface of carbon steel or the like.
第3図は、例えば特開昭54−95908号公報に示された従
来の電子ビームの点群照射による焼入方法のための装置
を示し、電子銃(1)、集束電磁レンズ(2)、偏向用
電磁コイル(3)が互いに同軸上に配設されている。被
加工物または複数個の被加工物を載せた治具(4)は、
被加工物を移動させるワークテーブル(5)上に置か
れ、ワークテーブル(5)はサーブモータ(6)で駆動
される。(7)はサーボ駆動源である。集束電磁レンズ
(2)および偏向用電磁コイル(3)にはビーム集束お
よび偏向増幅器(8)が接続されている。(9)は高圧
電源である。真空チヤンバ(10)は、ワークテーブル
(5)および被加工物を収納し、加工を行う。(11)は
その排気系である。(12)はビーム偏向プログラムのほ
か加速電圧、ビーム電流、集束電磁レンズの制御電流な
どの電子銃に関するパラメータの制御および真空チャン
バの排気系,ワークテーブル駆動系の制御指令等、電子
ビーム装置に必要な全ての制御装置で、通常、ビーム偏
向プログラム用コンピュータを含む数値制御(NC)、シ
ーケンサ等で構成されている。FIG. 3 shows an apparatus for a hardening method by irradiation with a point group of an electron beam as disclosed in, for example, Japanese Patent Laid-Open No. 54-95908, which includes an electron gun (1), a focusing electromagnetic lens (2), The deflection electromagnetic coils (3) are arranged coaxially with each other. The work piece or the jig (4) on which a plurality of work pieces are placed is
The work table is placed on a work table (5) for moving the work piece, and the work table (5) is driven by a serve motor (6). (7) is a servo drive source. A beam focusing and deflection amplifier (8) is connected to the focusing electromagnetic lens (2) and the deflection electromagnetic coil (3). (9) is a high voltage power supply. The vacuum chamber (10) accommodates the work table (5) and the workpiece, and performs processing. (11) is the exhaust system. (12) is required for electron beam equipment such as beam deflection program, control of parameters related to electron gun such as acceleration voltage, beam current, control current of focusing electromagnetic lens and control command of vacuum chamber exhaust system and work table drive system All the control devices are usually composed of a numerical control (NC) including a computer for a beam deflection program, a sequencer and the like.
以上の装置による従来の電子ビームによる焼入方法につ
いて説明する。例えば第4図,第5図に示すようなコイ
ン状の被加工物(4a)の斜線で示すドーナツ状の部分
(4b)に表面焼入れする場合は、第6図に示すように、
ビームをドーナツ状パターンに照射させる。照射の方法
としては、ビームを1ケ所に5〜50μsec滞留した後、
ビームを高速で次の点まで移動し、また滞留することに
よりドーナツ状の全面に多数のドツト状熱源(4c)を打
ち込む。もちろん、電子ビーム焼入れに必要な条件とし
て、ビームの加速電圧、ビーム電流、ビームフオーカス
ポイント、ビーム照射時間等のパラメータを制御し、被
加工物(4a)の表面が溶融しないで焼入可能な温度に昇
温する。A conventional electron beam hardening method using the above apparatus will be described. For example, when surface hardening is performed on the doughnut-shaped portion (4b) shown by hatching of the coin-shaped workpiece (4a) as shown in FIGS. 4 and 5, as shown in FIG.
Irradiate the beam in a donut pattern. As a method of irradiation, after the beam is retained in one place for 5 to 50 μsec,
A large number of doughnut-shaped heat sources (4c) are driven into the donut-shaped entire surface by moving the beam to the next point at a high speed and staying there. Of course, as conditions necessary for electron beam quenching, parameters such as beam accelerating voltage, beam current, beam focus point, and beam irradiation time are controlled so that quenching can be performed without melting the surface of the workpiece (4a). Raise to temperature.
また、1チヤンバで多数の被加工物を処理する場合に
は、第7図,第8図に示すように、ワークテーブル
(5)上にセツテイング治具(4)を載せ、定められた
ピツチでワークセツトし、NCテーブルで割出し移動させ
るながら順次加工して行く方法がとられる。Further, when processing a large number of workpieces with one chamber, as shown in FIG. 7 and FIG. One method is to set the work and then sequentially process while indexing and moving on the NC table.
このとき、電子銃(1)のビーム軸心と加工パターンの
基準点が一致する位置に被加工物(4a)が置かれ、1つ
の被加工物に対する加工が終了すると、一旦ビームはOF
Fされ、次の被加工物位置へ移動した後、再びビームON
される。At this time, the workpiece (4a) is placed at a position where the beam axis of the electron gun (1) and the reference point of the machining pattern coincide with each other.
The beam is turned on again after moving to the next workpiece position
To be done.
従来の電子ビームによる焼入方法では、1チヤンバ内で
複数個の被加工物を処理する場合、被加工物ごとの加工
パターンの基準点と電子銃のビーム軸心を合せた後、ビ
ームONして所定の偏向パターンで焼入れをし、加工が完
了すると一旦ビームOFFして、次の加工位置までワーク
テーブル(5)を機械的に移動させ、またビームONして
次の被加工物に対する加工をする必要があつた。In the conventional quenching method using an electron beam, when processing multiple workpieces in one chamber, after turning on the beam axis of the electron gun after aligning the reference point of the processing pattern for each workpiece with the beam axis of the electron gun. Then, the beam is turned off once the processing is completed, the work table (5) is mechanically moved to the next processing position, and the beam is turned on to process the next workpiece. I needed to do it.
したがつて、焼入加工時間以外に被加工物の移動時間が
必要であることと、ビームがONされて定常状態に達する
間、ビーム出力、フオーカスポイント、ビーム照射位置
が不安定となり、被加工物への入熱が不均一となる等の
問題点があつた。Therefore, in addition to the quenching processing time, it takes time to move the workpiece, and while the beam is turned on and reaches a steady state, the beam output, focus point, and beam irradiation position become unstable, There were problems such as non-uniform heat input to the workpiece.
この発明は上記のような問題点を解消するためになされ
たもので、ビームをON,OFFさせることなく、また被加工
物対応でテーブル移動させることなく、連続的に短時間
で焼入処理を行うことができる電子ビームによる焼入方
法を得ることを目的とする。The present invention has been made to solve the above-mentioned problems, and it is possible to continuously perform quenching treatment in a short time without turning the beam on and off, and without moving the table in correspondence with the workpiece. The purpose is to obtain a quenching method with an electron beam that can be performed.
この発明に係る電子ビームによる焼入方法は、被加工物
をセッィングする治具の取付座を偏向用電磁コイル偏向
角中心を半径の中心とする球内面で形成し、電子ビーム
を所定の位置にベクトル偏向させ、かつ、所定の焼入パ
ターンに相当する点群に高速偏向することにより、被加
工物を機械的に割出し移動させることなく、ビーム偏向
のみで、かつ、ビームOFFしないで順次焼入を行う。In the quenching method using an electron beam according to the present invention, a mounting seat of a jig for setting a workpiece is formed by an inner surface of a sphere having a center of a deflection angle of a deflection electromagnetic coil as a center of a radius, and an electron beam is placed at a predetermined position. By vector deflection and high-speed deflection to a point group corresponding to a predetermined hardening pattern, the workpiece can be sequentially deflected without beam turning and without beam OFF without mechanically indexing and moving the workpiece. Turn on.
この発明においては、機械的割出しによるロスタイムを
なくすることと、ビームのON,OFFによる過渡期における
焼入条件の不均一性を排除できる。さらに、ビームの偏
向角の大小による焼入条件の差が極小となる。In the present invention, it is possible to eliminate the loss time due to mechanical indexing and to eliminate the non-uniformity of the quenching conditions during the transitional period due to the ON / OFF of the beam. Further, the difference in the quenching conditions depending on the size of the beam deflection angle is minimized.
以下、この発明の一実施例を第1図,第2図を参照しな
がら説明する。図において、陰極(1a)と陽極(1b)で
電子ビーム発生部が形成されている。複数個の被加工物
(4a)が同心円上にセツトされている取付治具(4)
は、ビーム偏向角の中心(A)を中心とした半径(R)
の球内面を取付座(41)としている。取付治具(4)の
球内面には、熱容量の大きい銅ブロックなどでなるビー
ムコレクタ(13)が埋込まれている。An embodiment of the present invention will be described below with reference to FIGS. 1 and 2. In the figure, an electron beam generator is formed by a cathode (1a) and an anode (1b). Mounting jig (4) in which a plurality of workpieces (4a) are concentrically set
Is the radius (R) centered on the center (A) of the beam deflection angle
The inner surface of the ball is used as the mounting seat (41). A beam collector (13) made of a copper block or the like having a large heat capacity is embedded in the inner surface of the sphere of the mounting jig (4).
その他、第3図におけると同一符号は同一部分であり、
説明を省略する。Other than the above, the same reference numerals as in FIG.
The description is omitted.
以上の装置による焼入方法いついて説明する。いま、例
えば従来方法で説明したものと同じ第4図,第5図に示
したようなコイン状の被加工物(4a)の斜線部分(4b)
に焼入を施す場合、ワークテーブル(5)に載せた治具
(4)に複数個の被加工物(4a)をセツトし、治具
(4)の中心と電子銃の軸心が一致するようにワークテ
ーブル(5)を移動させる。The quenching method using the above apparatus will be described. Now, for example, the hatched portion (4b) of the coin-shaped workpiece (4a) as shown in FIGS. 4 and 5 which is the same as that described in the conventional method.
When quenching, the jig (4) placed on the work table (5) is set with a plurality of workpieces (4a), and the center of the jig (4) is aligned with the axis of the electron gun. Move the work table (5).
次に、電子ビームをビームコレクタ(13)の上でONし、
ビーム特性が安定になる時間(通常、1sec以内)を経過
してから被加工物(4a)上へビーム偏向し、あらかじめ
設定された加工条件でビームを点群照射する。被加工物
(4a)の大きさや焼入深さ等によつて異なるが、通常、
ビームの1ドツト当りの滞留時間は5〜50μsecでドツ
トとドットのピッチは0.2〜1mm程度であり、ビーム照射
時間は1〜5sec程度である。ビーム照射時間の間隔第6
図に示すような必要なパターンにビームエネルギーが順
次移動しながら照射し続けられるので、結果的にパター
ン全体がゾーン加熱された状態となる。Next, turn on the electron beam on the beam collector (13),
The beam is deflected onto the workpiece (4a) after a time (usually within 1 sec) when the beam characteristics become stable, and the point cloud irradiation is performed under preset processing conditions. Although it depends on the size of the work piece (4a) and the quenching depth, etc.,
The beam residence time per dot is 5 to 50 μsec, the dot-dot pitch is about 0.2 to 1 mm, and the beam irradiation time is about 1 to 5 sec. Beam irradiation time interval No. 6
Since the beam energy can be continuously irradiated while moving to the required pattern as shown in the figure, the entire pattern is consequently zone-heated.
ここで複数個の被加工物は、第2図に示すように、平面
的には同心円上に配置され、断面から見ると第1図のよ
うに偏向中心点(A)を中心とし、半径(R)の球内面
(41)上に配置されている。加工プログラムは平面的な
周方向のベクトル制御(θ1,θ2)と側面的な偏向角制
御(α,β)がなされて、それぞれの被加工物(4a)の
中心にビーム軸が順次ベクトル偏向されて行くと同時
に、被加工物(4a)ごとにあらかじめ設定された加工条
件で点群にドットビーム照射される。全ての被加工物
(4a)の加工が完了するとビームはビームコレクタ(1
3)の位置に戻され、OFFされる。Here, the plurality of workpieces are arranged on concentric circles in a plane as shown in FIG. 2, and when viewed from a cross section, the deflection center point (A) is the center and the radius ( R) is arranged on the inner surface (41) of the sphere. The machining program is subjected to planar circumferential vector control (θ1, θ2) and lateral deflection angle control (α, β), and the beam axis is sequentially vector-deflected to the center of each workpiece (4a). At the same time, the point cloud is irradiated with a dot beam under the processing conditions preset for each workpiece (4a). When the processing of all the workpieces (4a) is completed, the beam will move to the beam collector (1
It is returned to the position of 3) and turned off.
以上一連の工程,すなわち全ての被加工物(4a)に対す
る焼入が完了するまで、ビームはONされたまゝであり、
かつ、その間、ワークテーブル(5)は移動されること
なく、ビームの高速偏向のみで、照射位置移動がなされ
るので、1つの被加工物から次の被加工物へ移るロスタ
イムは1μsecも要しないので実質上皆無に等しく、ワ
ークテーブル移動方法に比べてきわめて効率的である。The beam is kept ON until the above series of steps, that is, the quenching of all the workpieces (4a) is completed,
In addition, during that time, the work table (5) is not moved, and the irradiation position is moved only by the high-speed deflection of the beam, so that the loss time for moving from one workpiece to the next workpiece does not require 1 μsec. Therefore, it is practically nothing and is extremely efficient as compared with the work table moving method.
次にワークセット治具(4)が平面であれば、ビーム偏
向角(α,β)の差によつて加工距離(WD)、照射角
(r1,r2)に差を生じることとなるので、偏向中心点
(A)を中心とする半径(R)の向心球内面の接線上に
被加工物(4a)の取付座(41)を設けることにより、偏
向角のいかんにかかわらず焼入条件が同一となる。Next, if the work set jig (4) is a flat surface, differences in beam deflection angles (α, β) will cause differences in processing distance (WD) and irradiation angles (r1, r2). By installing the mounting seat (41) for the workpiece (4a) on the tangent line of the inner surface of the centripetal with the radius (R) centered on the deflection center point (A), regardless of the deflection angle, quenching conditions Are the same.
なお、上記実施例では、1種類の被加工物を複数個焼入
する場合について説明したが必ずしも11種類でなくとも
よく、また、焼入条件も被加工物ごとくそれぞれ異なつ
た条件で行うこともできる。In the above embodiment, the case of quenching a plurality of workpieces of one type has been described, but the number of workpieces is not necessarily 11 and the quenching conditions may be different for each workpiece. it can.
また、全ての被加工物の加工が完了したらビームをビー
ムコレクタの位置に戻してOFFする方法で説明したが、
ビームコレクタ位置に戻さずに最終の被加工物上でOFF
しても差しつかえない。Also, I explained the method of returning the beam to the position of the beam collector and turning it off when all the workpieces are processed,
OFF on final work piece without returning to beam collector position
But it doesn't matter.
以上のように、この発明によれば、複数個の被加工物を
1チヤンバで加工する際、ワークテブールを被加工物ご
とくに移動させることなく複数個の被加工物に焼入を行
うので、ビームをON,OFFさせることによる加工条件の不
安定さを排除し、テーブル移動によるロスタイム時間を
削除でき、高効率で高精度な焼入加工が実現できる。As described above, according to the present invention, when a plurality of workpieces are machined by one chamber, the plurality of workpieces are hardened without moving the work tebules like the workpieces. The instability of the processing conditions caused by turning ON and OFF can be eliminated, the lost time due to table movement can be eliminated, and highly efficient and highly accurate quenching processing can be realized.
さらに、複数個の被加工物を、取付治具の球内面に取付
けるようにしたので、ビーム偏向角の相違によつて焼入
条件に差が生じない効果がある。Furthermore, since a plurality of workpieces are mounted on the inner surface of the sphere of the mounting jig, there is an effect that the quenching conditions do not differ due to the difference in beam deflection angle.
第1図はこの発明の一実施例を説明するための装置の正
断面図、第2図は第1図のII−II線に沿う平面での断面
図である。 第3図〜第8図は従来の電子ビームによる焼入方法を説
明するためのもので、第3図は装置の回路図、第4図は
被加工物の焼入態様を示す平面図、第5図は第4図のV
−V線に沿う平面での断面図、第6図はドーナツ状にド
ツトを照射する場合の点群パターン、第7図は治具上に
被加工物を取付けた態様を示す平面図、第8図は第7図
のVIII−VIII線に沿う平面での断面図である。 (1)……電子銃、(2)……集束電磁レンズ、(3)
……偏向電磁コイル、(4)……取付治具、(4a)……
被加工物、(41)……球内面でなる取付座。 なお、各図中、同一符号は同一又は相当部分を示す。FIG. 1 is a front sectional view of an apparatus for explaining an embodiment of the present invention, and FIG. 2 is a sectional view taken along a line II-II in FIG. 3 to 8 are for explaining a conventional quenching method by an electron beam, FIG. 3 is a circuit diagram of the apparatus, FIG. 4 is a plan view showing a quenching mode of a workpiece, FIG. Figure 5 shows V in Figure 4
FIG. 6 is a cross-sectional view taken along a plane along the line -V, FIG. 6 is a point cloud pattern when irradiating a donut with dots, and FIG. The drawing is a sectional view taken along a line VIII-VIII in FIG. (1) ... electron gun, (2) ... focusing electromagnetic lens, (3)
…… Deflection electromagnetic coil, (4) …… Mounting jig, (4a) ……
Workpiece, (41) ... Mounting seat consisting of the inner surface of the sphere. In each figure, the same reference numerals indicate the same or corresponding parts.
Claims (1)
つ電子銃を含む電子ビーム装置を用い、複数個の被加工
物に焼入れする方法において、前記被加工物をセッティ
ングする治具の取付座を偏向用電磁コイルの偏向角中心
を半径の中心とする球内面で形成し、前記電子ビームを
所定の位置にベクトル偏向させ、かつ、所定の焼入パタ
ーンに相当する点群に高速偏向することにより、前記被
加工物を機械的に割出し移動させることなく、ビーム偏
向のみで、かつ、ビームOFFしないで順次焼入を行うこ
とを特徴とする電子ビームによる焼入方法。1. In a method of quenching a plurality of workpieces using an electron beam apparatus including an electron gun having a means for focusing and deflecting an electron beam, a mounting seat of a jig for setting the workpieces. By forming an inner surface of a sphere with the center of the deflection angle of the deflection electromagnetic coil as the center of radius, vector-deflecting the electron beam to a predetermined position, and high-speed deflection to a point group corresponding to a predetermined hardening pattern. A quenching method using an electron beam, wherein quenching is sequentially performed only by beam deflection without mechanically indexing and moving the workpiece, and without turning off the beam.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62258342A JPH0717941B2 (en) | 1987-10-15 | 1987-10-15 | Quenching method with electron beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62258342A JPH0717941B2 (en) | 1987-10-15 | 1987-10-15 | Quenching method with electron beam |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01104714A JPH01104714A (en) | 1989-04-21 |
| JPH0717941B2 true JPH0717941B2 (en) | 1995-03-01 |
Family
ID=17318910
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62258342A Expired - Lifetime JPH0717941B2 (en) | 1987-10-15 | 1987-10-15 | Quenching method with electron beam |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0717941B2 (en) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4179316A (en) * | 1977-10-17 | 1979-12-18 | Sciaky Bros., Inc. | Method and apparatus for heat treating |
| FR2479560A1 (en) * | 1980-03-31 | 1981-10-02 | Sciaky Intertechnique | MACHINE FOR WORKING METALS BY ELECTRON BEAM |
-
1987
- 1987-10-15 JP JP62258342A patent/JPH0717941B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01104714A (en) | 1989-04-21 |
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