JPH07160058A - Carrier for electrostatic image development and developer - Google Patents
Carrier for electrostatic image development and developerInfo
- Publication number
- JPH07160058A JPH07160058A JP5306499A JP30649993A JPH07160058A JP H07160058 A JPH07160058 A JP H07160058A JP 5306499 A JP5306499 A JP 5306499A JP 30649993 A JP30649993 A JP 30649993A JP H07160058 A JPH07160058 A JP H07160058A
- Authority
- JP
- Japan
- Prior art keywords
- image
- carrier
- silicone
- vinyl
- core material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011248 coating agent Substances 0.000 claims abstract description 31
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 23
- 239000011162 core material Substances 0.000 claims abstract description 22
- 238000000576 coating method Methods 0.000 claims abstract description 18
- 239000000463 material Substances 0.000 claims abstract description 12
- 239000006087 Silane Coupling Agent Substances 0.000 claims abstract description 8
- 238000006243 chemical reaction Methods 0.000 claims abstract description 7
- 150000001875 compounds Chemical class 0.000 claims abstract description 6
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 3
- 229920005989 resin Polymers 0.000 claims description 23
- 239000011347 resin Substances 0.000 claims description 23
- 229920002554 vinyl polymer Polymers 0.000 claims description 13
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000011247 coating layer Substances 0.000 abstract description 4
- 230000005291 magnetic effect Effects 0.000 abstract description 3
- 238000005299 abrasion Methods 0.000 abstract description 2
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 230000007547 defect Effects 0.000 abstract description 2
- 230000000694 effects Effects 0.000 abstract description 2
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 18
- -1 3-epoxypropoxy Chemical group 0.000 description 15
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 10
- 239000003795 chemical substances by application Substances 0.000 description 10
- 239000000203 mixture Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 239000004447 silicone coating Substances 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 4
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 4
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 229920001519 homopolymer Polymers 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 3
- FUSUHKVFWTUUBE-UHFFFAOYSA-N buten-2-one Chemical compound CC(=O)C=C FUSUHKVFWTUUBE-UHFFFAOYSA-N 0.000 description 3
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000002966 varnish Substances 0.000 description 3
- 229910000859 α-Fe Inorganic materials 0.000 description 3
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- JLIDVCMBCGBIEY-UHFFFAOYSA-N 1-penten-3-one Chemical compound CCC(=O)C=C JLIDVCMBCGBIEY-UHFFFAOYSA-N 0.000 description 2
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical class C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 2
- DOYKFSOCSXVQAN-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(OCC)CCCOC(=O)C(C)=C DOYKFSOCSXVQAN-UHFFFAOYSA-N 0.000 description 2
- KFDVPJUYSDEJTH-UHFFFAOYSA-N 4-ethenylpyridine Chemical compound C=CC1=CC=NC=C1 KFDVPJUYSDEJTH-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 230000005307 ferromagnetism Effects 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- JTHNLKXLWOXOQK-UHFFFAOYSA-N hex-1-en-3-one Chemical compound CCCC(=O)C=C JTHNLKXLWOXOQK-UHFFFAOYSA-N 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- UCUUFSAXZMGPGH-UHFFFAOYSA-N penta-1,4-dien-3-one Chemical class C=CC(=O)C=C UCUUFSAXZMGPGH-UHFFFAOYSA-N 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 2
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 2
- JIRHAGAOHOYLNO-UHFFFAOYSA-N (3-cyclopentyloxy-4-methoxyphenyl)methanol Chemical compound COC1=CC=C(CO)C=C1OC1CCCC1 JIRHAGAOHOYLNO-UHFFFAOYSA-N 0.000 description 1
- SKYXLDSRLNRAPS-UHFFFAOYSA-N 1,2,4-trifluoro-5-methoxybenzene Chemical compound COC1=CC(F)=C(F)C=C1F SKYXLDSRLNRAPS-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- KTZVZZJJVJQZHV-UHFFFAOYSA-N 1-chloro-4-ethenylbenzene Chemical compound ClC1=CC=C(C=C)C=C1 KTZVZZJJVJQZHV-UHFFFAOYSA-N 0.000 description 1
- OZCMOJQQLBXBKI-UHFFFAOYSA-N 1-ethenoxy-2-methylpropane Chemical compound CC(C)COC=C OZCMOJQQLBXBKI-UHFFFAOYSA-N 0.000 description 1
- XXCVIFJHBFNFBO-UHFFFAOYSA-N 1-ethenoxyoctane Chemical compound CCCCCCCCOC=C XXCVIFJHBFNFBO-UHFFFAOYSA-N 0.000 description 1
- OVGRCEFMXPHEBL-UHFFFAOYSA-N 1-ethenoxypropane Chemical compound CCCOC=C OVGRCEFMXPHEBL-UHFFFAOYSA-N 0.000 description 1
- OYLCUJRJCUXQBQ-UHFFFAOYSA-N 1-hepten-3-one Chemical compound CCCCC(=O)C=C OYLCUJRJCUXQBQ-UHFFFAOYSA-N 0.000 description 1
- KUIZKZHDMPERHR-UHFFFAOYSA-N 1-phenylprop-2-en-1-one Chemical compound C=CC(=O)C1=CC=CC=C1 KUIZKZHDMPERHR-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- GPOGMJLHWQHEGF-UHFFFAOYSA-N 2-chloroethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCl GPOGMJLHWQHEGF-UHFFFAOYSA-N 0.000 description 1
- WHBAYNMEIXUTJV-UHFFFAOYSA-N 2-chloroethyl prop-2-enoate Chemical compound ClCCOC(=O)C=C WHBAYNMEIXUTJV-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 1
- WPSKNCNCLSXMTN-UHFFFAOYSA-N 2-fluoroethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCF WPSKNCNCLSXMTN-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical group OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- RBTBFTRPCNLSDE-UHFFFAOYSA-N 3,7-bis(dimethylamino)phenothiazin-5-ium Chemical compound C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 RBTBFTRPCNLSDE-UHFFFAOYSA-N 0.000 description 1
- REEBWSYYNPPSKV-UHFFFAOYSA-N 3-[(4-formylphenoxy)methyl]thiophene-2-carbonitrile Chemical compound C1=CC(C=O)=CC=C1OCC1=C(C#N)SC=C1 REEBWSYYNPPSKV-UHFFFAOYSA-N 0.000 description 1
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 1
- IWTYTFSSTWXZFU-UHFFFAOYSA-N 3-chloroprop-1-enylbenzene Chemical compound ClCC=CC1=CC=CC=C1 IWTYTFSSTWXZFU-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- GNSFRPWPOGYVLO-UHFFFAOYSA-N 3-hydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCO GNSFRPWPOGYVLO-UHFFFAOYSA-N 0.000 description 1
- QZPSOSOOLFHYRR-UHFFFAOYSA-N 3-hydroxypropyl prop-2-enoate Chemical compound OCCCOC(=O)C=C QZPSOSOOLFHYRR-UHFFFAOYSA-N 0.000 description 1
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- HQQWNBSBUJLMLD-UHFFFAOYSA-N C(C)O[SiH3].NCCC[Si](OC)(OC)OC Chemical compound C(C)O[SiH3].NCCC[Si](OC)(OC)OC HQQWNBSBUJLMLD-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910017767 Cu—Al Inorganic materials 0.000 description 1
- IEPRKVQEAMIZSS-UHFFFAOYSA-N Di-Et ester-Fumaric acid Natural products CCOC(=O)C=CC(=O)OCC IEPRKVQEAMIZSS-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-WAYWQWQTSA-N Diethyl maleate Chemical compound CCOC(=O)\C=C/C(=O)OCC IEPRKVQEAMIZSS-WAYWQWQTSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 150000008360 acrylonitriles Chemical class 0.000 description 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- IRERQBUNZFJFGC-UHFFFAOYSA-L azure blue Chemical compound [Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Al+3].[Al+3].[Al+3].[Al+3].[Al+3].[Al+3].[S-]S[S-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-] IRERQBUNZFJFGC-UHFFFAOYSA-L 0.000 description 1
- 150000001639 boron compounds Chemical class 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- YACLQRRMGMJLJV-UHFFFAOYSA-N chloroprene Chemical compound ClC(=C)C=C YACLQRRMGMJLJV-UHFFFAOYSA-N 0.000 description 1
- 229920006026 co-polymeric resin Polymers 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- FNMTVMWFISHPEV-WAYWQWQTSA-N dipropan-2-yl (z)-but-2-enedioate Chemical compound CC(C)OC(=O)\C=C/C(=O)OC(C)C FNMTVMWFISHPEV-WAYWQWQTSA-N 0.000 description 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- NHOGGUYTANYCGQ-UHFFFAOYSA-N ethenoxybenzene Chemical compound C=COC1=CC=CC=C1 NHOGGUYTANYCGQ-UHFFFAOYSA-N 0.000 description 1
- YCUBDDIKWLELPD-UHFFFAOYSA-N ethenyl 2,2-dimethylpropanoate Chemical compound CC(C)(C)C(=O)OC=C YCUBDDIKWLELPD-UHFFFAOYSA-N 0.000 description 1
- XJELOQYISYPGDX-UHFFFAOYSA-N ethenyl 2-chloroacetate Chemical compound ClCC(=O)OC=C XJELOQYISYPGDX-UHFFFAOYSA-N 0.000 description 1
- MEGHWIAOTJPCHQ-UHFFFAOYSA-N ethenyl butanoate Chemical compound CCCC(=O)OC=C MEGHWIAOTJPCHQ-UHFFFAOYSA-N 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- DJMOYRIAWTXGEY-UHFFFAOYSA-N ethyl 2-fluoroprop-2-enoate Chemical compound CCOC(=O)C(F)=C DJMOYRIAWTXGEY-UHFFFAOYSA-N 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 description 1
- 125000003784 fluoroethyl group Chemical group [H]C([H])(F)C([H])([H])* 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- PBZROIMXDZTJDF-UHFFFAOYSA-N hepta-1,6-dien-4-one Chemical compound C=CCC(=O)CC=C PBZROIMXDZTJDF-UHFFFAOYSA-N 0.000 description 1
- 229910001291 heusler alloy Inorganic materials 0.000 description 1
- LNCPIMCVTKXXOY-UHFFFAOYSA-N hexyl 2-methylprop-2-enoate Chemical compound CCCCCCOC(=O)C(C)=C LNCPIMCVTKXXOY-UHFFFAOYSA-N 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- MOUPNEIJQCETIW-UHFFFAOYSA-N lead chromate Chemical compound [Pb+2].[O-][Cr]([O-])(=O)=O MOUPNEIJQCETIW-UHFFFAOYSA-N 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 150000002688 maleic acid derivatives Chemical class 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- 229960000907 methylthioninium chloride Drugs 0.000 description 1
- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- NZIDBRBFGPQCRY-UHFFFAOYSA-N octyl 2-methylprop-2-enoate Chemical compound CCCCCCCCOC(=O)C(C)=C NZIDBRBFGPQCRY-UHFFFAOYSA-N 0.000 description 1
- 229940065472 octyl acrylate Drugs 0.000 description 1
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 125000005375 organosiloxane group Chemical group 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- GYDSPAVLTMAXHT-UHFFFAOYSA-N pentyl 2-methylprop-2-enoate Chemical compound CCCCCOC(=O)C(C)=C GYDSPAVLTMAXHT-UHFFFAOYSA-N 0.000 description 1
- ULDDEWDFUNBUCM-UHFFFAOYSA-N pentyl prop-2-enoate Chemical compound CCCCCOC(=O)C=C ULDDEWDFUNBUCM-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- 229930187593 rose bengal Natural products 0.000 description 1
- 229940081623 rose bengal Drugs 0.000 description 1
- STRXNPAVPKGJQR-UHFFFAOYSA-N rose bengal A Natural products O1C(=O)C(C(=CC=C2Cl)Cl)=C2C21C1=CC(I)=C(O)C(I)=C1OC1=C(I)C(O)=C(I)C=C21 STRXNPAVPKGJQR-UHFFFAOYSA-N 0.000 description 1
- VDNLFJGJEQUWRB-UHFFFAOYSA-N rose bengal free acid Chemical compound OC(=O)C1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1C1=C2C=C(I)C(=O)C(I)=C2OC2=C(I)C(O)=C(I)C=C21 VDNLFJGJEQUWRB-UHFFFAOYSA-N 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- 235000013799 ultramarine blue Nutrition 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- XOSXWYQMOYSSKB-LDKJGXKFSA-L water blue Chemical compound CC1=CC(/C(\C(C=C2)=CC=C2NC(C=C2)=CC=C2S([O-])(=O)=O)=C(\C=C2)/C=C/C\2=N\C(C=C2)=CC=C2S([O-])(=O)=O)=CC(S(O)(=O)=O)=C1N.[Na+].[Na+] XOSXWYQMOYSSKB-LDKJGXKFSA-L 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Developing Agents For Electrophotography (AREA)
Abstract
(57)【要約】
【構成】 少なくとも一般式(I)
【化1】
(式中、R1 ,R2 ,R3 およびR4 はそれぞれアルキ
ル基を表し、nは2以上の整数を表す)で表わされるア
ルコキシシロキサンとシランカップリング剤との反応に
よって得られる化合物を含有するシリコーン系被覆剤に
より、少なくとも芯材の一部を被覆して成る静電荷像現
像用キャリア。
【効果】 本発明のシリコーン系被覆剤からなるキャリ
ア被覆層は、膜強度に優れ、芯材への密着性も良好なの
で、耐久性に優れているのみならず、帯電性の立上がり
が速く且つ高い帯電性をキャリアに与える。よって、帯
電安定性が優れているため、画像濃度が高く、極めてカ
ブリが少ない鮮明な画像が得られ、画像形成時のトナー
の転写効率を高くする。そして画像硬度の小さい有機光
導電体を使用した潜像保持部材に対し、磁気ブラシの擦
過傷による画像欠陥が少なく、特にハーフトーン画像に
置いて耐久性に優れた良好な画像をあたえる。(57) [Summary] [Structure] At least general formula (I) (Wherein R 1 , R 2 , R 3 and R 4 each represent an alkyl group, and n represents an integer of 2 or more) and the compound obtained by the reaction between the alkoxysiloxane and the silane coupling agent is contained. A carrier for developing an electrostatic charge image, which is obtained by coating at least a part of a core material with a silicone-based coating agent. [Effect] The carrier coating layer made of the silicone-based coating material of the present invention has excellent film strength and good adhesion to the core material, so that not only is it excellent in durability, but also the charging property rises quickly and is high. Gives the carrier electrostatic properties. Therefore, since the charging stability is excellent, a clear image with high image density and extremely little fog can be obtained, and the transfer efficiency of toner during image formation is increased. Further, a latent image holding member using an organic photoconductor having a low image hardness has few image defects due to abrasion of a magnetic brush, and gives a good image excellent in durability especially in a halftone image.
Description
【0001】[0001]
【産業上の利用分野】本発明は電子写真複写機に使用す
る静電荷像現像用キャリア、およびそれを用いた現像剤
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a carrier for developing an electrostatic charge image used in an electrophotographic copying machine, and a developer using the carrier.
【0002】[0002]
【従来の技術】正帯電性トナーと負帯電性樹脂被覆キャ
リアを含む二成分現像剤において、キャリア被覆剤とし
ては、フッ化ビニリデンとテトラフルオロエチレンの共
重合体や、フルオロアルキルメタクリレート共重合体等
のフッ素系樹脂、およびシリコーン系樹脂等が従来から
提案されている。(例えば特開昭61−217068
号、特開昭62−24268号、特開平2−96770
号各公報等を参照)2. Description of the Related Art In a two-component developer containing a positively chargeable toner and a negatively chargeable resin-coated carrier, the carrier coating agent is a copolymer of vinylidene fluoride and tetrafluoroethylene, a fluoroalkyl methacrylate copolymer or the like. Fluorine-based resins, silicone-based resins, and the like have been conventionally proposed. (For example, JP-A-61-217068
JP-A-62-24268, JP-A-2-96770
(See each bulletin, etc.)
【0003】[0003]
【発明が解決しようとする課題】公知のフッ素系樹脂や
シリコーン系樹脂等のキャリア被覆剤は、芯材との接着
性が悪く、芯材から剥離し易いといった耐久性の面で欠
点を有しており、それらは白地汚れ(カブリ)等の画像
特性の悪化を引起こす。Known carrier coating agents such as fluorine-based resins and silicone-based resins have drawbacks in terms of durability such as poor adhesion to the core material and easy peeling from the core material. However, they cause deterioration of image characteristics such as white background stain (fogging).
【0004】[0004]
【課題を解決するための手段】本発明者らは、上記の如
き課題を解決すべく研究を重ねた結果、特定のオルガノ
シロキサンから得られるシリコーン系被覆剤を用いるこ
とにより、芯材との接着性が改善され、被覆キャリアの
耐久性、保存安定性が向上し、また該シリコーン系被覆
剤による被覆キャリアを用いることにより極めてカブリ
の少ない鮮明な複写画像が得られ、かつ複写時のトナー
の転写効率を極めて向上させることを見出だし、本発明
に到達した。Means for Solving the Problems As a result of repeated studies to solve the above problems, the present inventors have found that a silicone-based coating agent obtained from a specific organosiloxane is used to adhere to a core material. Properties are improved, the durability and storage stability of the coated carrier are improved, and by using the coated carrier with the silicone-based coating agent, a clear copy image with very little fog can be obtained, and the toner transfer at the time of copying The inventors have found that the efficiency is extremely improved and arrived at the present invention.
【0005】すなわち本発明の要旨は、少なくとも一般
式(I)That is, the gist of the present invention is at least the general formula (I)
【0006】[0006]
【化2】 [Chemical 2]
【0007】(式中、R1 ,R2 ,R3 およびR4 はそ
れぞれアルキル基を表し、nは2以上の整数を表す)で
表わされるアルコキシシロキサンとシランカップリング
剤との反応によって得られる化合物を含有するシリコー
ン系被覆剤により、少なくとも芯材の一部を被覆して成
る静電荷像現像用キャリアにある。(Wherein R 1 , R 2 , R 3 and R 4 each represent an alkyl group, and n represents an integer of 2 or more) and the silane coupling agent is reacted with the alkoxysiloxane. A carrier for developing an electrostatic charge image is obtained by coating at least a part of a core material with a silicone coating agent containing a compound.
【0008】以下、本発明を詳細に説明する。上記一般
式(I)で表わされるアルコキシシロキサンにおいて、
R1 ,R2 ,R3 およびR4 の具体例としては、メチル
基、エチル基、n−プロピル基、iso−プロピル基、
およびブチル基等の炭素数1〜4のものが好ましく、特
にメチル基、およびエチル基、中でもメチル基が好まし
い。The present invention will be described in detail below. In the alkoxysiloxane represented by the above general formula (I),
Specific examples of R 1 , R 2 , R 3 and R 4 include a methyl group, an ethyl group, an n-propyl group, an iso-propyl group,
And those having 1 to 4 carbon atoms such as a butyl group are preferred, and a methyl group and an ethyl group are preferred, and a methyl group is particularly preferred.
【0009】nとしては2〜100、さらには2〜30
が好ましく、中でも3〜15が特に好ましい。また本発
明に用いるアルコキシシロキサンは上記一般式(I)中
のnの異なるアルコキシシロキサンの混合物であっても
よく、この場合、該混合物の平均分子量としては特に2
50〜4000、中でも300〜3000が好ましい。N is 2 to 100, more preferably 2 to 30
Are preferred, and 3 to 15 are particularly preferred. The alkoxysiloxane used in the present invention may be a mixture of alkoxysiloxanes having different n in the general formula (I). In this case, the average molecular weight of the mixture is particularly 2
50-4000, especially 300-3000 are preferable.
【0010】上記一般式(I)で表わされるアルコキシ
シロキサンは、一般には金属シリコンとアルコールを反
応させてテトラアルコキシシランを合成し、更にこれを
重合させて得ることができる。シランカップリング剤と
しては公知のものを使用することができる。シランカッ
プリング剤とは、−SiX3 または−SiX2 −(式
中、Xはアルコキシル基やハロゲン基等の加水分解性置
換基を表す)なる無機質と反応し易い官能基、並びにビ
ニル基、エポキシ基、アミノ基、(メタ)アクリロイル
基、およびメルカプト基等の有機質と反応し易い官能基
を分子内に持った有機ケイ素化合物を示し、具体例とし
ては、トリクロロビニルシラン、トリメトキシビニルシ
ラン、トリエトキシビニルシラン、トリス(2−メトキ
シエトキシ)ビニルシラン、2−(3,4−エポキシシ
クロヘキシル)エチルトリメトキシシラン、3−(2,
3−エポキシプロポキシ)プロピルトリメトキシシラ
ン、3−(2,3−エポキシプロポキシ)プロピルメチ
ルジエトキシシラン、3−(2,3−エポキシプロポキ
シ)プロピルトリエトキシシラン、3−メタクリロイロ
キシプロピルメチルジメトキシシラン、3−メタクリロ
イロキシプロピルトリメトキシシラン、3−メタクリロ
イロキシプロピルメチルジエトキシシラン、3−メタク
リロイロキシプロピルトリエトキシシラン、3−(2−
アミノエチルアミノ)プロピルメチルジメトキシシラ
ン、3−(2−アミノエチルアミノ)プロピルトリメト
キシシラン、3−(2−アミノエチルアミノ)プロピル
トリエトキシシラン、3−アミノプロピルトリメトキシ
シラン、3−アミノプロピルトリエトキシシラン、3−
アニリノプロピルトリメトキシシラン、3−クロロプロ
ピルトリメトキシシラン、および3−メルカプトプロピ
ルトリメトキシシラン等が挙げられる。The alkoxysiloxane represented by the above general formula (I) can be generally obtained by reacting metallic silicon with alcohol to synthesize tetraalkoxysilane and then polymerizing the tetraalkoxysilane. Known silane coupling agents can be used. The silane coupling agent is a functional group that easily reacts with an inorganic substance such as —SiX 3 or —SiX 2 — (wherein, X represents a hydrolyzable substituent such as an alkoxyl group or a halogen group), a vinyl group, and an epoxy group. Group, an amino group, a (meth) acryloyl group, and an organic silicon compound having a functional group such as a mercapto group which easily reacts with an organic substance are shown in the molecule. Specific examples include trichlorovinylsilane, trimethoxyvinylsilane, and triethoxyvinylsilane. , Tris (2-methoxyethoxy) vinylsilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3- (2,2
3-epoxypropoxy) propyltrimethoxysilane, 3- (2,3-epoxypropoxy) propylmethyldiethoxysilane, 3- (2,3-epoxypropoxy) propyltriethoxysilane, 3-methacryloyloxypropylmethyldimethoxysilane , 3-methacryloyloxypropyltrimethoxysilane, 3-methacryloyloxypropylmethyldiethoxysilane, 3-methacryloyloxypropyltriethoxysilane, 3- (2-
Aminoethylamino) propylmethyldimethoxysilane, 3- (2-aminoethylamino) propyltrimethoxysilane, 3- (2-aminoethylamino) propyltriethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltrimethoxysilane Ethoxysilane, 3-
Examples thereof include anilinopropyltrimethoxysilane, 3-chloropropyltrimethoxysilane, and 3-mercaptopropyltrimethoxysilane.
【0011】上記一般式(I)で表わされるアルコキシ
シロキサンとシランカップリング剤との反応は、縮合に
よりシロキサン結合が生じる反応である。一般的には、
触媒を添加した溶媒中において、20℃以上の温度で、
10分から5時間反応させる。溶媒の具体例としては、
テトラヒドロフラン、アセトン、およびメチルエチルケ
トン等が挙げられる。触媒の具体例としては、塩酸、リ
ン酸、硫酸、p−トルエンスルホン酸、およびキシレン
スルホン酸等の酸;3級アミン;および第4アンモニウ
ム塩等が挙げられる。触媒の量は全反応化合物1重量部
に対して5×10-6〜1×10-2重量部が好ましい。The reaction between the alkoxysiloxane represented by the general formula (I) and the silane coupling agent is a reaction in which a siloxane bond is generated by condensation. In general,
In a solvent containing a catalyst, at a temperature of 20 ° C. or higher,
React for 10 minutes to 5 hours. Specific examples of the solvent include
Tetrahydrofuran, acetone, methyl ethyl ketone and the like can be mentioned. Specific examples of the catalyst include acids such as hydrochloric acid, phosphoric acid, sulfuric acid, p-toluenesulfonic acid, and xylenesulfonic acid; tertiary amines; and quaternary ammonium salts. The amount of the catalyst is preferably 5 × 10 −6 to 1 × 10 −2 parts by weight based on 1 part by weight of all the reaction compounds.
【0012】上記一般式(I)で表わされるアルコキシ
シロキサンとシランカップリング剤との反応モル比は、
アルコキシシロキサン中の−Si(OR)2 −O−1モ
ルに対して、シランカップリング剤中の加水分解性置換
基が直接結合しているケイ素0.1〜20モルが好まし
く、中でも0.3〜10モルが特に好ましい。これらの
反応はゲル化しないように行われる。The reaction molar ratio between the alkoxysiloxane represented by the above general formula (I) and the silane coupling agent is
0.1 to 20 moles of silicon to which the hydrolyzable substituent in the silane coupling agent is directly bonded is preferable with respect to -Si (OR) 2 -O-1 moles in the alkoxysiloxane, and 0.3 is particularly preferable. -10 mol is especially preferred. These reactions are carried out without gelation.
【0013】さらに本発明のシリコーン系被覆剤は、ビ
ニル系樹脂を含有することも好ましい。ビニル系樹脂を
生成するビニル系モノマーとしては、アクリロニトリル
およびメタクリロニトリル等のアクリロニトリル類;塩
化ビニル、塩化ビニリデン、フッ化ビニル、およびフッ
化ビニリデン等のハロゲン化ビニル類;スチレン、α−
メチルスチレンおよびクロロメチルスチレン等のスチレ
ン類;アクリル酸メチル、アクリル酸エチル、アクリル
酸プロピル、アクリル酸ブチル、アクリル酸アミル、ア
クリル酸ヘキシル、アクリル酸オクチル、アクリル酸−
2−ヒドロキシエチル、アクリル酸ヒドロキシプロピ
ル、アクリル酸−2−クロロエチル、アクリル酸−2−
フルオロエチル、α−フルオロアクリル酸メチル、α−
フルオロアクリル酸エチル、α−クロロアクリル酸メチ
ル、メタクリル酸メチル、メタクリル酸エチル、メタク
リル酸プロピル、メタクリル酸ブチル、メタクリル酸ア
ミル、メタクリル酸ヘキシル、メタクリル酸オクチル、
メタクリル酸−2−ヒドロキシエチル、メタクリル酸ヒ
ドロキシプロピル、メタクリル酸−2−クロロエチル、
およびメタクリル酸−2−フルオロエチル等のα置換ま
たは非置換の(メタ)アクリル酸エステル類;エチルビ
ニルエーテル、2−クロロエチルビニルエーテル、プロ
ピルビニルエーテル、ブチルビニルエーテル、オクチル
ビニルエーテル、シクロヘキシルビニルエーテル、およ
びフェニルビニルエーテル等のビニルエーテル類;ビニ
ルアセテート、ビニルクロルアセテート、ビニルブチレ
ート、ビニルピバレート、および安息香酸ビニル等のビ
ニルエステル類;メチルビニルケトン、エチルビニルケ
トン、プロピルビニルケトン、ブチルビニルケトン、お
よびフェニルビニルケトン等のビニルケトン類;エチレ
ン、プロピレン、イソブテン、ブタジエン、およびイソ
プレン等のオレフィン類;無水マレイン酸、アクリル
酸、およびメタクリル酸等の不飽和カルボン酸類;マレ
イン酸エチル、およびマレイン酸ジイソプロピル等のマ
レイン酸エステル類;N−ビニルピロリドン、N−ビニ
ルカルバゾール、および4−ビニルピリジン等の含窒素
化合物類;塩素化塩化ビニル類;塩素化パラフィン類;
並びに塩素化ポリオレフィン類等が挙げられ、中でもハ
ロゲン化ビニル類、およびα置換または非置換の(メ
タ)アクリル酸エステル類が好ましい。該ビニル系樹脂
は単独重合体でもビニル系モノマーから得られる繰返し
単位を含む共重合体であってもよい。また2種以上の重
合体の混合物であってもよい。Further, the silicone coating material of the present invention preferably contains a vinyl resin. Examples of vinyl monomers that form vinyl resins include acrylonitriles such as acrylonitrile and methacrylonitrile; vinyl halides such as vinyl chloride, vinylidene chloride, vinyl fluoride, and vinylidene fluoride; styrene, α-
Styrenes such as methylstyrene and chloromethylstyrene; methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, amyl acrylate, hexyl acrylate, octyl acrylate, acrylic acid-
2-hydroxyethyl, hydroxypropyl acrylate, 2-chloroethyl acrylate, -2-acrylic acid
Fluoroethyl, α-methyl fluoroacrylate, α-
Ethyl fluoroacrylate, α-chloromethyl acrylate, methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, amyl methacrylate, hexyl methacrylate, octyl methacrylate,
2-hydroxyethyl methacrylate, hydroxypropyl methacrylate, 2-chloroethyl methacrylate,
And α-substituted or unsubstituted (meth) acrylic acid esters such as 2-fluoroethyl methacrylate; ethyl vinyl ether, 2-chloroethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, octyl vinyl ether, cyclohexyl vinyl ether, phenyl vinyl ether, etc. Vinyl ethers; vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate, vinyl pivalate, and vinyl benzoate; vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone, butyl vinyl ketone, and phenyl vinyl ketone. Olefins such as ethylene, propylene, isobutene, butadiene, and isoprene; maleic anhydride, acrylic acid, and methacrylic acid Unsaturated carboxylic acids such as acids; maleic acid esters such as ethyl maleate and diisopropyl maleate; nitrogen-containing compounds such as N-vinylpyrrolidone, N-vinylcarbazole and 4-vinylpyridine; chlorinated vinyl chlorides Chlorinated paraffins;
In addition, chlorinated polyolefins and the like can be mentioned, and among them, vinyl halides and α-substituted or unsubstituted (meth) acrylic acid esters are preferable. The vinyl resin may be a homopolymer or a copolymer containing a repeating unit obtained from a vinyl monomer. It may also be a mixture of two or more polymers.
【0014】さらに本発明のシリコーン系被覆剤はビニ
ル系樹脂以外の他の樹脂を含んでいてもよく、他の樹脂
としては、ポリエステル樹脂、ポリカーボネート樹脂、
エポキシ樹脂、フェノキシ樹脂、ポリアミド樹脂、ポリ
イミド樹脂、尿素樹脂、アルキッド樹脂、フェノール樹
脂、ポリスルホン樹脂、ポリエーテル樹脂、およびポリ
ブタジエン樹脂等が好ましい。これらは単独重合体ある
いは共重合体であってもよく、また2種以上の重合体の
混合物であってもよい。Further, the silicone-based coating material of the present invention may contain a resin other than the vinyl-based resin, and examples of the other resin include polyester resin, polycarbonate resin,
Epoxy resin, phenoxy resin, polyamide resin, polyimide resin, urea resin, alkyd resin, phenol resin, polysulfone resin, polyether resin, and polybutadiene resin are preferable. These may be a homopolymer or a copolymer, or may be a mixture of two or more polymers.
【0015】また本発明のシリコーン系被覆剤は、無機
微粉末、電荷制御剤、界面活性剤、および潤滑剤等の添
加剤を加えることも好ましい。また−Si(OR)2 −
の硬化剤を加えることにより硬化処理を行うことも好ま
しく、硬化剤としてはアルミニウム、またはスズ等を含
む有機金属化合物;ホウ素化合物;マレイン酸、コハク
酸、酢酸、シュウ酸、およびフタル酸等の有機カルボン
酸化合物;スルホン酸トルエンスルホン酸、およびナフ
タレンスルホン酸等の有機スルホン酸化合物;並びに塩
酸、リン酸、硝酸、および硫酸等の無機酸化合物等を挙
げることができる。It is also preferable to add additives such as an inorganic fine powder, a charge control agent, a surfactant, and a lubricant to the silicone-based coating material of the present invention. Also, -Si (OR) 2-
It is also preferable to perform a curing treatment by adding a curing agent of, for example, an organic metal compound containing aluminum or tin as a curing agent; a boron compound; an organic compound such as maleic acid, succinic acid, acetic acid, oxalic acid, and phthalic acid. Examples thereof include carboxylic acid compounds; organic sulfonic acid compounds such as sulfonic acid toluenesulfonic acid and naphthalenesulfonic acid; and inorganic acid compounds such as hydrochloric acid, phosphoric acid, nitric acid, and sulfuric acid.
【0016】キャリア芯材に対する被膜形成方法は常法
とほぼ同様にして行われる。例えば本発明のシリコーン
系被覆剤を有機溶剤に溶解または分散させて、濃度0.
1〜30重量%、好ましくは1〜5重量%の被覆液を調
製し、浸漬法、ドライスプレー法、及びフローコーター
を使用する流動スプレー法等により芯材に被覆し、乾燥
させる。The method for forming a film on the carrier core material is carried out in the same manner as a conventional method. For example, the silicone coating agent of the present invention is dissolved or dispersed in an organic solvent to give a concentration of 0.
A coating liquid of 1 to 30% by weight, preferably 1 to 5% by weight is prepared, and the core material is coated by a dipping method, a dry spray method, a fluidized spray method using a flow coater, and dried.
【0017】有機溶剤としては、該シリコーン系被覆剤
を溶解するものならば使用可能であり、アセトン、メチ
ルエチルケトン、メチルn−プロピルケトン、メチルi
so−プロピルケトン、メチルブチルケトン、及びシク
ロヘキサノン等のケトン類溶剤;酢酸エチル、酢酸セロ
ソルブ、及び酢酸n−ブチル等の酢酸エステル類溶剤;
テトラヒドロフラン、及びジオキサン等の環状エーテル
類溶剤;ベンゼン、トルエン、及びキシレン等の芳香族
炭化水素類溶剤;並びにテトラクロロエチレン、トリク
ロロエチレン及びクロロメチレン等のハロゲン化炭化水
素類溶剤等が例示される。これらの有機溶剤は2種以上
を混合して使用してもよい。Any organic solvent can be used as long as it dissolves the silicone-based coating agent, such as acetone, methyl ethyl ketone, methyl n-propyl ketone, and methyl i.
Ketone solvents such as so-propyl ketone, methyl butyl ketone, and cyclohexanone; Acetate solvents such as ethyl acetate, cellosolve acetate, and n-butyl acetate;
Examples include cyclic ether solvents such as tetrahydrofuran and dioxane; aromatic hydrocarbon solvents such as benzene, toluene, and xylene; and halogenated hydrocarbon solvents such as tetrachloroethylene, trichloroethylene, and chloromethylene. You may use these organic solvents in mixture of 2 or more types.
【0018】被膜形成後、加熱処理を行い、シリコーン
系被覆剤の硬化処理を行うことも好ましい。硬化処理に
より芯材へのシリコーン系被覆剤の密着性が良好にな
り、かつキャリア粒子へのトナー粒子の付着(スペン
ト)の少ない表面を得ることができる。硬化温度は40
〜200℃、好ましくは70〜150℃である。時間は
10分〜5時間から選ばれる。After forming the film, it is also preferable to perform heat treatment to cure the silicone-based coating agent. By the curing treatment, the adhesion of the silicone-based coating material to the core material becomes good, and a surface with less adhesion (spent) of toner particles to carrier particles can be obtained. Curing temperature is 40
-200 degreeC, Preferably it is 70-150 degreeC. The time is selected from 10 minutes to 5 hours.
【0019】以上の方法により得られる本発明のシリコ
ーン系被覆材は、一般に用いられるシリコーンワニスに
比較して、硬化密度が高く、芯材からの剥離もなく、ま
た本発明のシリコーン系被覆剤により被覆されたキャリ
アはより高い帯電性を有する。本発明で使用するキャリ
アの芯材としては、公知のものが全て使用可能であり、
特に限定されない。具体的には、フェライト、マグネタ
イトをはじめとして、鉄、コバルト、ニッケルなどの強
磁性を示す金属;これらの金属を含む合金または化合
物;強磁性金属を含まないが、熱処理により強磁性を示
すようになる合金、例えばMn−Cu−Al、Mn−C
u−Snなどのいわゆるホィスラー合金;CrO2 など
の金属酸化物などが好適なものとして例示される。この
様なキャリアの粒径は、通常20〜500μm程度、よ
り好ましくは30〜200μm程度である。The silicone-based coating material of the present invention obtained by the above method has a higher curing density than the commonly used silicone varnish, does not separate from the core material, and can be treated with the silicone-based coating material of the present invention. The coated carrier has a higher chargeability. As the core material of the carrier used in the present invention, all known core materials can be used,
There is no particular limitation. Specifically, ferrite, magnetite, and other metals exhibiting ferromagnetism such as iron, cobalt, and nickel; alloys or compounds containing these metals; not containing ferromagnetic metals, but exhibiting ferromagnetism by heat treatment. Alloys such as Mn-Cu-Al, Mn-C
Suitable examples are so-called Heusler alloys such as u-Sn; metal oxides such as CrO 2 . The particle size of such a carrier is usually about 20 to 500 μm, more preferably about 30 to 200 μm.
【0020】キャリアの被膜層の厚さは、乾燥状態で、
0.05〜5μm程度とすることが好ましく、0.3〜
3μm程度とすることがより好ましい。0.05μm未
満の場合には、耐久性が十分でなく、また帯電安定性も
悪くなるため好ましくない。被膜層の厚さが5μmを越
えても、性能的には実質上問題はないが、性能的にほぼ
最高値に達しており、該被覆剤を大量に消費するので経
済的でない。The thickness of the coating layer of the carrier is
The thickness is preferably about 0.05 to 5 μm, and 0.3 to
More preferably, it is about 3 μm. If it is less than 0.05 μm, the durability is not sufficient and the charging stability is deteriorated, which is not preferable. Even if the thickness of the coating layer exceeds 5 μm, there is practically no problem in terms of performance, but the maximum value is reached in terms of performance, and the coating agent is consumed in large amounts, which is not economical.
【0021】本発明のキャリアは、公知のトナー、特に
正帯電性トナーと組合わせて静電荷像現像剤として使用
される。この様なトナーは、バインダー樹脂中に着色剤
を分散させて得られる。バインダー樹脂としては、例え
ば、スチレン、パラクロロスチレン、およびα−メチル
スチレンなどのスチレン類;アクリル酸メチル、アクリ
ル酸エチル、アクリル酸n−プロピル、アクリル酸ブチ
ル、アクリル酸ラウリル、アクリル酸2−エチルヘキシ
ル、メタクリル酸メチル、メタクリル酸エチル、メタク
リル酸n−ブチル、メタクリル酸ラウリル、及びメタク
リル酸2−エチルヘキシルなどのα−メチレン脂肪酸モ
ノカルボン酸エステル類;アクリロニトリル、及びメタ
クリロニトリルなどのビニルニトリル類;2−ビニルピ
リジン、及び4−ビニルピリジンなどのビニルピリジン
類;ビニルメチルエーテル、及びビニルイソブチルエー
テルなどのビニルエーテル類;ビニルメチルケトン、ビ
ニルエチルメトン、及びメチルイソプロペニルケトンな
どのビニルケトン類;エチレン、プロピレン、イソプレ
ン、及びブタジエンなどの不飽和炭化水素類およびその
ハロゲン化物類;並びにクロロプレンなどのハロゲン系
不飽和炭化水素類などの単量体からなる単独重合体、こ
れらの2種以上からなる共重合体、これら単独重合体お
よび共重合体の2種以上の混合物が挙げられる。或い
は、さらにロジン変性フェノヒルホルマリン樹脂、油変
性エポキシ樹脂、ポリエステル樹脂、ポリウレタン樹
脂、ポリイミド樹脂、セルロース樹脂、ポリエーテル樹
脂などの非ビニル樹脂、これらの非ビニル樹脂と上記ビ
ニル系樹脂との混合物なども挙げられる。The carrier of the present invention is used as an electrostatic image developer in combination with a known toner, especially a positively chargeable toner. Such a toner is obtained by dispersing a colorant in a binder resin. Examples of the binder resin include styrenes such as styrene, parachlorostyrene, and α-methylstyrene; methyl acrylate, ethyl acrylate, n-propyl acrylate, butyl acrylate, lauryl acrylate, 2-ethylhexyl acrylate. , Α-methylene fatty acid monocarboxylic acid esters such as methyl methacrylate, ethyl methacrylate, n-butyl methacrylate, lauryl methacrylate, and 2-ethylhexyl methacrylate; vinyl nitriles such as acrylonitrile and methacrylonitrile; 2 Vinyl pyridines such as vinyl pyridine and 4-vinyl pyridine; vinyl ethers such as vinyl methyl ether and vinyl isobutyl ether; vinyl methyl ketone, vinyl ethyl metone, and methyl isopropene Vinyl ketones such as ruketone; unsaturated hydrocarbons such as ethylene, propylene, isoprene, and butadiene, and their halides; and homopolymers composed of monomers such as halogenated unsaturated hydrocarbons such as chloroprene, And a mixture of two or more kinds of these homopolymers and copolymers. Alternatively, a rosin-modified phenohil formalin resin, an oil-modified epoxy resin, a polyester resin, a polyurethane resin, a polyimide resin, a cellulose resin, a non-vinyl resin such as a polyether resin, a mixture of these non-vinyl resins and the vinyl resin, and the like. Can also be mentioned.
【0022】上記のトナーは、更に帯電制御剤、ワック
ス類、無機微粉末、及びステアリン酸塩などの添加剤を
含有または、混合して使用することができる。また、ト
ナーにおいて使用する着色剤としては、カーボンブラッ
ク、ニグロシン、アニリンブルー、カルコオイルブル
ー、クロームイエロー、ウルトラマリンブルー、メチレ
ンブルー、ローズベンガル、フタロシアニンブルーなど
が例示される。The above toner may further contain or be mixed with additives such as a charge control agent, waxes, inorganic fine powder, and stearate. Examples of the colorant used in the toner include carbon black, nigrosine, aniline blue, chalco oil blue, chrome yellow, ultramarine blue, methylene blue, rose bengal and phthalocyanine blue.
【0023】本発明のキャリアとこの様なトナーとは、
通常前者100重量部に対し、後者0.3〜20重量部
程度の割合で混合され、磁気ブラシ法、カスケード法な
どの静電画像の現像に使用される。The carrier of the present invention and such toner are
Usually, the latter is mixed in a proportion of about 0.3 to 20 parts by weight with respect to the former 100 parts by weight, and used for developing an electrostatic image by a magnetic brush method, a cascade method or the like.
【0024】[0024]
【発明の効果】本発明によるシリコーン系被覆剤からな
るキャリア被覆層は、膜強度に優れ、芯材への密着性も
良好なので、耐久性に優れているのみならず、帯電性の
立上がりが速く且つ高い帯電性をキャリアに与える。よ
って、帯電安定性が優れているため、画像濃度が高く、
極めてカブリが少ない鮮明な画像が得られ、画像形成時
のトナーの転写効率を高くする。そして画像硬度の小さ
い有機光導電体を使用した潜像保持部材に対し、磁気ブ
ラシの擦過傷による画像欠陥が少なく、特にハーフトー
ン画像に置いて耐久性に優れた良好な画像をあたえる。EFFECTS OF THE INVENTION The carrier coating layer comprising the silicone coating agent of the present invention has excellent film strength and good adhesion to the core material, so not only is it excellent in durability, but the charging property rises quickly. In addition, it gives the carrier high chargeability. Therefore, since the charging stability is excellent, the image density is high,
A clear image with very little fog is obtained, and the transfer efficiency of toner during image formation is increased. Further, a latent image holding member using an organic photoconductor having a low image hardness has few image defects due to abrasion of a magnetic brush, and gives a good image excellent in durability especially in a halftone image.
【0025】[0025]
【実施例】以下、実施例にて本発明を具体的に説明する
が、その要旨を越えない限り、本発明は以下の実施例に
より限定されるものではない。 (実施例1)3−(2,3−エポキシプロポキシ)プロ
ピルトリメトキシシラン236g(1モル、3当量)を
テトラヒドロフラン500gに溶解し、0.35%塩酸
水溶液54g(6当量)を添加、混合し、20℃で1時
間放置して加水分解を行った。次いで分子量500(上
記一般式(I)においてn=4)のオリゴマーを中心と
したポリメトキシシロキサン450gを添加し、2時間
還流を行った。その後150℃まで温度を上げて溶媒を
流出させ、シリコーン系被覆剤を無色透明の液体として
得た。このシリコーン系被覆剤を濃度4重量%になるよ
うにメチルエチルケトンに溶解し、硬化剤として硝酸を
少量添加して、被覆液を調製した。平均粒径100μm
の球状フェライト芯材に、流動スプレー法を用いて乾燥
膜厚が2μmになるように該被覆液を塗布し、100℃
で1時間加熱して硬化させ、被覆キャリアを得た。EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to the following examples as long as the gist thereof is not exceeded. (Example 1) 236 g (1 mol, 3 equivalents) of 3- (2,3-epoxypropoxy) propyltrimethoxysilane was dissolved in 500 g of tetrahydrofuran, and 54 g (6 equivalents) of a 0.35% hydrochloric acid aqueous solution was added and mixed. The mixture was left standing at 20 ° C. for 1 hour for hydrolysis. Next, 450 g of polymethoxysiloxane mainly composed of an oligomer having a molecular weight of 500 (n = 4 in the above general formula (I)) was added and refluxed for 2 hours. Then, the temperature was raised to 150 ° C. and the solvent was allowed to flow out to obtain a silicone-based coating agent as a colorless transparent liquid. This silicone-based coating agent was dissolved in methyl ethyl ketone to a concentration of 4% by weight, and a small amount of nitric acid was added as a curing agent to prepare a coating liquid. Average particle size 100 μm
The coating solution is applied to the spherical ferrite core material of No. 2 by a fluidized spray method so that the dry film thickness is 2 μm, and the temperature is 100 ° C.
The coated carrier was obtained by heating for 1 hour for curing.
【0026】一方、スチレンとn−ブチルアクリレート
との共重合樹脂100g、カーボンブラック75g、低
分子量ポリプロピレ2g、及び第4アンモニウム塩系帯
電制御剤(ボントロンP51、オリエント化学社製)2
gの混練粉砕物から成る平均粒径10μmのトナー10
0gと、疎水性シリカ微粉末(R−972、デグサ社
製)0.1gをヘンシェルミキサーで混合して得られた
シリカ外添トナー4gと、前記被覆キャリア100gと
を混合し、現像剤を調製した。On the other hand, 100 g of a copolymer resin of styrene and n-butyl acrylate, 75 g of carbon black, 2 g of low molecular weight polypropylene, and a quaternary ammonium salt type charge control agent (Bontron P51, manufactured by Orient Chemical Co.) 2
toner having an average particle size of 10 μm, which is composed of a kneaded and pulverized product of 10 g
0 g and hydrophobic silica fine powder (R-972, manufactured by Degussa) 0.1 g were mixed by a Henschel mixer, and 4 g of silica externally added toner obtained was mixed with 100 g of the coated carrier to prepare a developer. did.
【0027】続いて有機光導電体を搭載した市販の複写
機を用いて実写耐久試験をし、画像濃度、カブリ、及び
トナー転写率を評価した。その結果、カブリの少ない鮮
明な画像が終始安定に得られた。またトナー転写率も良
好であった。該被覆剤の芯材からの剥離もみられず、良
好な耐久性を示した。Subsequently, a commercial copying machine equipped with an organic photoconductor was used to carry out an actual copying durability test to evaluate the image density, fog, and toner transfer rate. As a result, a clear image with less fog was stably obtained from beginning to end. The toner transfer rate was also good. No peeling of the coating material from the core material was observed, indicating good durability.
【0028】(実施例2)3−(2,3−エポキシプロ
ポキシ)プロピルトリメトキシシラン236gの代わり
に3−メタクリロイロキシプロピルメチルジエトキシシ
ラン232g(1モル、3当量)を、メチルエチルケト
ンの代わりにテトラヒドロフランを、分子量500のオ
リゴマーを中心としたメトキシシロキサン450gの代
わりに分子量400(上記一般式(I)においてn=
3)のオリゴマーを中心としたポリメトキシシロキサン
450gを用いたこと以外は実施例1と同様に現像剤を
調製し、評価した。Example 2 232 g (1 mol, 3 equivalents) of 3-methacryloyloxypropylmethyldiethoxysilane was used instead of 236 g of 3- (2,3-epoxypropoxy) propyltrimethoxysilane, and methylethylketone was used instead of methylethylketone. Tetrahydrofuran was used in place of 450 g of methoxysiloxane centered on an oligomer having a molecular weight of 500, and having a molecular weight of 400 (in the general formula (I), n =
A developer was prepared and evaluated in the same manner as in Example 1 except that 450 g of polymethoxysiloxane mainly containing the oligomer of 3) was used.
【0029】その結果、カブリの少ない鮮明な画像が終
始安定に得られた。またトナーの転写率も良好であっ
た。該被覆剤の芯材からの剥離も見られなかった。As a result, a clear image with less fog was stably obtained from beginning to end. The toner transfer rate was also good. Neither peeling of the coating material from the core material was observed.
【0030】(実施例3)シリコーン系被覆剤を濃度4
重量%になるようにメチルエチルケトンに溶解する代わ
りに、該シリコーン系被覆剤と塩化ビニル樹脂(SG−
700、三菱化成社製)の2:1(重量比)混合物を濃
度3重量%になるようにテトラヒドロフランに溶解した
こと以外は実施例1と同様に現像剤を調製し、評価し
た。(Example 3) A silicone-based coating agent was added at a concentration of 4
Instead of being dissolved in methyl ethyl ketone so that the weight% becomes, the silicone-based coating agent and vinyl chloride resin (SG-
A developer was prepared and evaluated in the same manner as in Example 1 except that a 2: 1 (weight ratio) mixture of 700, manufactured by Mitsubishi Kasei Co., Ltd.) was dissolved in tetrahydrofuran to a concentration of 3% by weight.
【0031】その結果、良好な画像特性が終始安定に得
られた。芯材への該被覆剤の密着性も良好であった。As a result, good image characteristics were consistently obtained. The adhesion of the coating material to the core material was also good.
【0032】(実施例4)平均粒径100μmの球状フ
ェライト芯材の代わりに平均粒径70μmの鉄粉芯材を
用いたこと、乾燥膜厚2μmの代わりに4μmとしたこ
と以外は実施例1と同様に現像剤を調製し、評価した。
その結果、良好な画像特性が終始安定に得られた。芯材
への該被覆剤の密着性も良好であった。Example 4 Example 1 was repeated except that an iron powder core material having an average particle size of 70 μm was used in place of the spherical ferrite core material having an average particle size of 100 μm, and 4 μm was used instead of the dry film thickness of 2 μm. A developer was prepared and evaluated in the same manner as in.
As a result, good image characteristics were consistently obtained. The adhesion of the coating material to the core material was also good.
【0033】(比較例)シリコーン系被覆剤の代わりに
ストレートシリコーンワニス(KR255、信越シリコ
ーン社製)を用いたこと以外は実施例1と同様に現像剤
を調製し、評価した。その結果、カブリの大きい画像し
か得られなかった。また実写1万枚目からシリコーンワ
ニスの剥離が認められた。Comparative Example A developer was prepared and evaluated in the same manner as in Example 1 except that a straight silicone varnish (KR255, manufactured by Shin-Etsu Silicone Co., Ltd.) was used in place of the silicone coating agent. As a result, only images with large fog were obtained. In addition, peeling of the silicone varnish was observed from the 10,000th photo film.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 油科 平八 大阪府大阪市中央区伏見町4丁目1番地1 号 三菱化成株式会社大阪支社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor, Oil Department Heihachi 4-1-1, Fushimi-cho, Chuo-ku, Osaka-shi, Osaka Mitsubishi Kasei Corporation Osaka Branch
Claims (4)
ル基を表し、nは2以上の整数を表す)で表わされるア
ルコキシシロキサンとシランカップリング剤との反応に
よって得られる化合物を含有するシリコーン系被覆剤に
より、少なくとも芯材の一部を被覆して成る静電荷像現
像用キャリア。1. At least a compound represented by the general formula (I): (Wherein R 1 , R 2 , R 3 and R 4 each represent an alkyl group, and n represents an integer of 2 or more) and the compound obtained by the reaction between the alkoxysiloxane and the silane coupling agent is contained. A carrier for developing an electrostatic charge image, which is obtained by coating at least a part of a core material with a silicone-based coating agent.
脂を含有する請求項1に記載の静電荷像現像用キャリ
ア。2. The electrostatic charge image developing carrier according to claim 1, wherein the silicone-based coating material further contains a vinyl-based resin.
電荷像現像用キャリアと正帯電性トナーから成る静電荷
像現像剤。3. An electrostatic charge image developer comprising at least the electrostatic charge image developing carrier according to claim 1 and a positively chargeable toner.
項1または2に記載の静電荷像現像用キャリアの製造方
法。4. The method for producing a carrier for developing an electrostatic charge image according to claim 1, further comprising a curing treatment after coating the core material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5306499A JPH07160058A (en) | 1993-12-07 | 1993-12-07 | Carrier for electrostatic image development and developer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5306499A JPH07160058A (en) | 1993-12-07 | 1993-12-07 | Carrier for electrostatic image development and developer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH07160058A true JPH07160058A (en) | 1995-06-23 |
Family
ID=17957766
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5306499A Pending JPH07160058A (en) | 1993-12-07 | 1993-12-07 | Carrier for electrostatic image development and developer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07160058A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6010757A (en) * | 1997-03-31 | 2000-01-04 | Nippon Shokubai Co., Ltd. | Surface coating composition |
| US6040101A (en) * | 1996-06-10 | 2000-03-21 | Nippon Shokubai Co., Ltd. | Carrier particles for use in electrostatic image development and electrostatic image developer |
-
1993
- 1993-12-07 JP JP5306499A patent/JPH07160058A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6040101A (en) * | 1996-06-10 | 2000-03-21 | Nippon Shokubai Co., Ltd. | Carrier particles for use in electrostatic image development and electrostatic image developer |
| US6010757A (en) * | 1997-03-31 | 2000-01-04 | Nippon Shokubai Co., Ltd. | Surface coating composition |
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