JPH07151101A - Vessel having spiral diaphragm contact surface - Google Patents
Vessel having spiral diaphragm contact surfaceInfo
- Publication number
- JPH07151101A JPH07151101A JP5320919A JP32091993A JPH07151101A JP H07151101 A JPH07151101 A JP H07151101A JP 5320919 A JP5320919 A JP 5320919A JP 32091993 A JP32091993 A JP 32091993A JP H07151101 A JPH07151101 A JP H07151101A
- Authority
- JP
- Japan
- Prior art keywords
- spiral
- diaphragm
- shape
- recess
- container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 claims description 11
- 239000002994 raw material Substances 0.000 abstract 1
- 239000012530 fluid Substances 0.000 description 23
- 238000003780 insertion Methods 0.000 description 7
- 230000037431 insertion Effects 0.000 description 7
- 230000002093 peripheral effect Effects 0.000 description 6
- 239000002184 metal Substances 0.000 description 3
- 230000008602 contraction Effects 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 230000010349 pulsation Effects 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
Landscapes
- Supply Devices, Intensifiers, Converters, And Telemotors (AREA)
- Diaphragms And Bellows (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、渦巻状波紋の形状が、
ダイヤフラムに相対する容器の凹所に形成されたダイヤ
フラム接触面が渦巻状の容器に関する。BACKGROUND OF THE INVENTION The present invention has a spiral ripple shape
The present invention relates to a container in which a diaphragm contact surface formed in a recess of the container facing the diaphragm has a spiral shape.
【０００２】[0002]
【従来の技術】撓みを素材板の全域に亘って均一化する
ダイヤフラムとして、渦巻状ダイヤフラムが知られてい
る。（例えば、特開平２−５１６６４号公報参照）この
ダイヤフラムは作動時に生ずる応力に片寄りがないの
で、ダイヤフラムの疲労の発生時期を伸ばし、ダイヤフ
ラムの寿命を伸ばすことができる。また、凹所を有する
二つの容器によってダイヤフラムが挟持されたダイヤフ
ラム式のアキュムレータが知られている。2. Description of the Related Art A spiral diaphragm is known as a diaphragm for making the deflection uniform over the entire area of a material plate. (See, for example, Japanese Patent Application Laid-Open No. 2-51664.) Since this diaphragm has no bias in the stress generated during operation, it is possible to extend the fatigue occurrence time of the diaphragm and extend the life of the diaphragm. Further, a diaphragm type accumulator in which a diaphragm is sandwiched by two containers having a recess is known.
【０００３】前記の渦巻状ダイヤフラムをダイヤフラム
式のアキュムレータやダイヤフラムポンプに適用するこ
とが考えられる。しかし、渦巻状ダイヤフラムをダイヤ
フラム式のアキュムレータやダイヤフラムポンプに適用
して使用する場合、従来のように容器の凹所（本体及び
側板の凹所）の壁面が平らであると、流体の圧力で渦巻
状ダイヤフラムが平らな壁面に押し付けられたときにダ
イヤフラムの渦巻形状が平らな形状になってしまう。こ
のことは、渦巻状ダイヤフラムが従来の椀状のダイヤフ
ラムに変形してしまうことを意味している。そして、こ
のように押し付けられ、ダイヤフラムの渦巻形状部が平
らになるときに大きな変形応力を受け、そのとき撓みが
ダイヤフラムの山部及び谷部に集中する。こうした変形
応力を繰り返し受けるので、渦巻状ダイヤフラムは徐々
に変形し、渦巻状ダイヤフラムを当初の目的の通りの長
寿命ダイヤフラムとして使用することができない。It is possible to apply the above-mentioned spiral diaphragm to a diaphragm type accumulator or diaphragm pump. However, when the spiral diaphragm is used by applying it to a diaphragm type accumulator or diaphragm pump, if the wall surface of the recess of the container (the recess of the main body and the side plate) is flat as in the conventional case, it will be swirled by the fluid pressure. When the flat diaphragm is pressed against a flat wall surface, the spiral shape of the diaphragm becomes a flat shape. This means that the spiral diaphragm is transformed into a conventional bowl-shaped diaphragm. Then, when the spiral-shaped portion of the diaphragm is pressed in this way and becomes flat, a large deformation stress is exerted, and at that time, the deflection is concentrated on the peaks and valleys of the diaphragm. Since the deformable stress is repeatedly applied, the spiral diaphragm is gradually deformed, and the spiral diaphragm cannot be used as a long-life diaphragm as originally intended.
【０００４】[0004]
【発明が解決しようとする課題】本発明は、渦巻形状の
渦巻状ダイヤフラムをダイヤフラム式のアキュムレー
タ、ポンプ等の容器に適用し、渦巻状ダイヤフラムが容
器の凹所の壁面に押し付けられても、渦巻状ダイヤフラ
ムに渦巻形状が維持されるようにすることを課題とす
る。SUMMARY OF THE INVENTION According to the present invention, a spiral-shaped spiral diaphragm is applied to a container such as a diaphragm type accumulator, a pump, etc., and even if the spiral diaphragm is pressed against the wall surface of the recess of the container, it is swirled. An object of the present invention is to maintain the spiral shape in the diaphragm.
【０００５】[0005]
【課題を解決するための手段】前記課題を解決するため
に、ダイヤフラム接触面が渦巻状の容器であって、素材
板中心円形部の周りに隣接して、その周方向均等分位の
少なくとも２点からスタートした同心の渦巻状波紋が形
成された渦巻状ダイヤフラムが、凹所を有する二つの容
器によって挟持され、前記渦巻状ダイヤフラムと相対す
る容器の凹所の壁面形状を、前記渦巻状ダイヤフラムが
前記壁面に接触するときの変形形状に合致した形状に形
成したことを技術的手段とする。また、ダイヤフラム接
触面が渦巻状の容器であって、渦巻状波紋が形成された
渦巻状ダイヤフラムが、凹所を有する二つの容器によっ
て挟持され、前記渦巻状ダイヤフラムと相対する容器の
凹所のうち、前記渦巻状ダイヤフラムの渦巻状波紋が接
触する側だけ、前記渦巻状ダイヤフラムが接触するとき
の変形形状に合致した形状に形成したことを技術的手段
とする。ダイヤフラム接触面が渦巻状の容器。また、ダ
イヤフラム接触面が渦巻状の容器であって、永久歪を起
こし易い素材で作製された椀状ダイヤフラムが、凹所を
有する二つの容器によって挟持され、前記椀状ダイヤフ
ラムと相対する容器の凹所の一方又は双方の壁面形状
を、中心円形部の周りに隣接して、その周方向均等分位
の少なくとも２点からスタートした同心の渦巻状波紋の
形状が投影された形状に形成したことも技術的手段とす
る。なお、投影とは、ダイヤフラム式アキュムレータに
渦巻状ダイヤフラムを装着し、流体圧によって渦巻状ダ
イヤフラムが伸長して容器の凹所及び凹所の曲面に接触
し、この接触により渦巻状ダイヤフラムの同心の渦巻状
波紋の形状が凹所及び凹所の曲面に転写されることをい
う。In order to solve the above-mentioned problems, it is a container whose diaphragm contact surface is a spiral, and is adjacent to the circumference of the central circular portion of the material plate, and at least 2 of its circumferential uniform quantiles. A spiral diaphragm having concentric spiral ripples starting from a point is sandwiched by two containers having a recess, and the wall shape of the recess of the container facing the spiral diaphragm is defined by the spiral diaphragm. The technical means is to form the shape that matches the deformed shape when the wall surface is contacted. Further, the diaphragm contact surface is a spiral container, the spiral diaphragm in which the spiral ripple is formed is sandwiched by two containers having a recess, and among the recesses of the container facing the spiral diaphragm. The technical means is that only the side of the spiral diaphragm that is in contact with the spiral ripple is formed in a shape that matches the deformed shape when the spiral diaphragm is in contact. A container with a spiral contact surface. Further, the diaphragm contact surface is a container having a spiral shape, and a bowl-shaped diaphragm made of a material that easily causes permanent strain is sandwiched by two containers having a recess, and the container-shaped diaphragm is opposed to the bowl-shaped diaphragm. It is also possible to form one or both wall shapes adjacent to the central circular portion in a shape in which a concentric spiral ripple shape starting from at least two points in the circumferential uniform quantile is projected. Technical means. The projection means that the spiral accumulator is attached to the diaphragm type accumulator, and the spiral diaphragm expands due to fluid pressure to contact the recess of the container and the curved surface of the recess, and this contact causes the concentric spiral of the spiral diaphragm. It means that the shape of the ripples is transferred to the recess and the curved surface of the recess.
【０００６】[0006]
【作用】本発明において、渦巻状ダイヤフラムと相対す
る容器の凹所の壁面形状を、前記渦巻状ダイヤフラムが
前記壁面に接触するときの変形形状に合致した形状に形
成した。渦巻状ダイヤフラムが容器の凹所に向かって移
動し、容器の凹所と接触するときに、渦巻状ダイヤフラ
ムの渦巻状波紋の凹凸の全面が、容器の渦巻状波紋の凹
凸の全面と一致し、ぴったりと重なり、渦巻状ダイヤフ
ラムの渦巻状波紋は変形しない。また、永久歪を起こし
易い素材で作製された椀状ダイヤフラムと相対する容器
の凹所の壁面形状を、同心の渦巻状波紋の形状が投影さ
れた形状に形成した。この場合には、椀状ダイヤフラム
が流体圧によって容器の凹所の壁面に押し付けられる
と、椀状ダイヤフラムが同心の渦巻状波紋の形状を有す
る渦巻状ダイヤフラムに変形する。こうした押し付けが
繰り返して行われると、椀状のダイヤフラムが永久歪を
起こして渦巻状ダイヤフラムとなる。In the present invention, the shape of the wall surface of the recess of the container facing the spiral diaphragm is formed so as to match the deformed shape when the spiral diaphragm contacts the wall surface. When the spiral diaphragm moves toward the recess of the container and comes into contact with the recess of the container, the entire surface of the corrugation of the spiral ripple of the spiral diaphragm matches the entire surface of the corrugation of the spiral ripple of the container, It fits snugly and the spiral ripples of the spiral diaphragm do not deform. Further, the wall shape of the concave portion of the container facing the bowl-shaped diaphragm made of a material that easily causes permanent set was formed in a shape in which the shape of concentric spiral ripples was projected. In this case, when the bowl-shaped diaphragm is pressed against the wall surface of the recess of the container by the fluid pressure, the bowl-shaped diaphragm is transformed into a spiral diaphragm having a concentric spiral ripple shape. When such pressing is repeated, the bowl-shaped diaphragm is permanently deformed to become a spiral diaphragm.
【０００７】[0007]
【実施例】図１〜図２を用いて、本発明の第１実施例に
ついて説明する。図１は渦巻状ダイヤフラムの平面図で
あり、図２は渦巻状ダイヤフラムを適用したダイヤフラ
ム式のアキュムレータの断面図である。図１に示すよう
に、渦巻状ダイヤフラム１は全体として略円形板状であ
り、素材板の中央の中心円形部２の外周に隣接して、そ
の円周上の一点からスタートした同心の渦巻状波紋Ｐ1
を形成する。図１において、同心の渦巻状波紋Ｐ1 は谷
部の軌跡を示し（以下同様）、ここに渦巻状とは、螺
旋、渦巻線、スパイラルのように１点のまわりをぐるぐ
るまわる平面曲線を総称していう。中心円形部２の外周
に隣接して、同心の渦巻状波紋Ｐ1 と同心で、かつ周方
向３等分位の間隔をあけてスタートした、同心の渦巻状
波紋Ｐ2 を形成する。次に、同心の渦巻状波紋Ｐ1 と渦
巻状波紋Ｐ2 との間に、中心円形部２の外周に隣接し
て、周方向３等分位からスタートした同心の渦巻状波紋
Ｐ3 を形成する。同心の渦巻状波紋Ｐ1 と渦巻状波紋Ｐ
2 と渦巻状波紋Ｐ3 との終端部は相互に合流し、略円形
状となる。こうして、中心円形部２の外周から半径方向
に向かって、渦巻状波紋Ｐ1 と渦巻状波紋Ｐ2 と渦巻状
波紋Ｐ3 の谷が順次に略等間隔で並ぶこととなる。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of the present invention will be described with reference to FIGS. FIG. 1 is a plan view of a spiral diaphragm, and FIG. 2 is a sectional view of a diaphragm-type accumulator to which the spiral diaphragm is applied. As shown in FIG. 1, the spiral diaphragm 1 has a substantially circular plate shape as a whole, and is adjacent to the outer circumference of the central circular portion 2 at the center of the material plate, and is concentric spiral shape starting from a point on the circumference. Ripple P 1
To form. In FIG. 1, a concentric spiral ripple P 1 indicates a locus of a valley portion (hereinafter the same), and the spiral shape is a generic term for a plane curve that circles around one point like a spiral, a spiral, or a spiral. I say. Adjacent to the outer circumference of the central circular portion 2, a concentric spiral ripple P 2 is formed that is concentric with the concentric spiral ripple P 1 and starts at intervals of three equidistant positions in the circumferential direction. Then, between the concentric spiral ripples P 1 and spiral ripples P 2, adjacent to the outer periphery of the central circular portion 2, a concentric spiral ripples P 3 that started from the circumferential trisected position formed To do. Concentric spiral ripple P 1 and spiral ripple P
The end portions of 2 and the spiral ripple P 3 join each other to form a substantially circular shape. Thus, the valleys of the spiral ripple P 1 , the spiral ripple P 2, and the spiral ripple P 3 are sequentially arranged at substantially equal intervals from the outer circumference of the central circular portion 2 in the radial direction.
【０００８】図１に示すように、同心の渦巻状波紋Ｐ1
と渦巻状波紋Ｐ2 と渦巻状波紋Ｐ3とが、中心円形部２
の外周に隣接し周方向３等分位の間隔をあけてスタート
しているので、渦巻状ダイヤフラム１の全域に亘って均
一な変位が生ずる。なお、第１実施例では、３本の同心
の渦巻状波紋が、中心円形部２の外周に隣接し周方向３
等分位の間隔をあけてスタートしているが、中心円形部
２の外周の周方向均等分位の少なくとも２点からスター
トさせればよい。また、渦巻状波紋数は奇数が好まし
く、また渦巻状波紋の山部及び谷部は連続曲面とすると
よい。As shown in FIG. 1, concentric spiral ripples P 1
And the spiral ripple P 2 and the spiral ripple P 3 form the central circular portion 2
Since they start adjacent to the outer circumference of the spiral-shaped diaphragm 1 at regular intervals in the circumferential direction, uniform displacement occurs over the entire area of the spiral diaphragm 1. In addition, in the first embodiment, three concentric spiral ripples are adjacent to the outer circumference of the central circular portion 2 and are arranged in the circumferential direction 3.
Although they are started at equal intervals, they may be started from at least two points on the outer circumference of the central circular portion 2 in the circumferentially uniform quantiles. The number of spiral ripples is preferably an odd number, and the peaks and valleys of the spiral ripples may be continuous curved surfaces.
【０００９】図２に示すように、本発明の第１実施例の
アキュムレータには、本体６と側板７とがあり、本体６
と側板７との対向面には凹所８（本体６側）及び凹所９
（側板７側）がある。そして、凹所８及び凹所９（容
器）の壁面形状は、流体圧によって渦巻状ダイヤフラム
１がこの壁面に押し付けられて接触するときの変形形状
に合致した形状である。こうした合致がなされない場合
には、渦巻状ダイヤフラム１が凹所８及び凹所９の壁面
に押し付けられたときに、渦巻状ダイヤフラム１の渦巻
状波紋形状が損なわれるからである。凹所８及び凹所９
の外側に環状の挟持部15（本体６側）及び挟持部16（側
板７側）がそれぞれ配設される。挟持部15には第１環状
溝17が形成され、挟持部16の第１環状溝17と対向した位
置に第２環状溝18が形成され、第１環状溝17及び第２環
状溝18には第１シール11及び第２シール12がそれぞれ嵌
合される。As shown in FIG. 2, the accumulator of the first embodiment of the present invention has a main body 6 and a side plate 7, and the main body 6
And the side plate 7 facing each other, a recess 8 (main body 6 side) and a recess 9
(Side plate 7 side). The wall shape of the recess 8 and the recess 9 (container) is a shape that matches the deformed shape when the spiral diaphragm 1 is pressed against and comes into contact with this wall surface by fluid pressure. If such a match is not made, the spiral ripple shape of the spiral diaphragm 1 is impaired when the spiral diaphragm 1 is pressed against the wall surfaces of the recesses 8 and 9. Recess 8 and recess 9
An annular sandwiching portion 15 (on the side of the main body 6) and a sandwiching portion 16 (on the side plate 7 side) are respectively arranged outside of. A first annular groove 17 is formed in the sandwiching portion 15, a second annular groove 18 is formed in the sandwiching portion 16 at a position facing the first annular groove 17, and the first annular groove 17 and the second annular groove 18 are formed. The first seal 11 and the second seal 12 are fitted together.
【００１０】渦巻状ダイヤフラム１の渦巻状波紋Ｐ1 〜
Ｐ3 と凹所８及び凹所９の壁面の渦巻状波紋とが合致す
るように、これら三者の渦巻状波紋の位相を合わせて
（例えば各渦巻状波紋のスタート位置の角度を合わせ
て）、渦巻状ダイヤフラム１を本体６と側板７とに装着
する必要がある。位相合わせのために、渦巻状ダイヤフ
ラム１の外周近傍の所定位置にピン孔50を形成し、挟持
部15、16のピン孔50に対応すべき位置に開口するピン挿
入孔51、52を形成する。本体６の挟持部15上に渦巻状ダ
イヤフラム１の外周部（挟持部）を置き、挟持部15のピ
ン挿入孔51の開口位置に渦巻状ダイヤフラム１のピン孔
50を位置させ、ピン孔50及びピン挿入孔51にピン53を挿
入し、ピン53とピン挿入孔52とを嵌合させることによ
り、前記三者の渦巻状波紋の位相を簡単かつ正確に合わ
せることができる。そして、渦巻状ダイヤフラム１の外
周部が挟持部15，16によって接合され、本体６及び側板
７に形成された複数のボルト孔19，20に複数のボルト22
が挿通され、複数のボルト22に複数のナット23がねじ込
まれる。The spiral ripple P 1 of the spiral diaphragm 1
Match the phases of the spiral ripples of these three so that P 3 and the spiral ripples on the wall surfaces of the recesses 8 and 9 match (for example, match the start position angle of each spiral ripple). It is necessary to mount the spiral diaphragm 1 on the main body 6 and the side plate 7. For phase matching, a pin hole 50 is formed at a predetermined position near the outer circumference of the spiral diaphragm 1, and pin insertion holes 51 and 52 are formed at positions corresponding to the pin holes 50 of the holding portions 15 and 16. . The outer peripheral portion (holding portion) of the spiral diaphragm 1 is placed on the holding portion 15 of the main body 6, and the pin hole of the spiral diaphragm 1 is placed at the opening position of the pin insertion hole 51 of the holding portion 15.
Positioning 50, inserting the pin 53 into the pin hole 50 and the pin insertion hole 51, and fitting the pin 53 and the pin insertion hole 52, the phases of the spiral ripples of the three parties are easily and accurately matched. be able to. The outer peripheral portion of the spiral diaphragm 1 is joined by the holding portions 15 and 16, and the bolts 22 are inserted into the bolt holes 19 and 20 formed in the body 6 and the side plate 7.
Are inserted, and the nuts 23 are screwed into the bolts 22.
【００１１】こうして、渦巻状波紋の位相が合致され、
渦巻状ダイヤフラム１の外周部が挟持部15，16によって
挟持され、第１シール11及び第２シール12によって渦巻
状ダイヤフラム１の上下の空間（凹所８及び凹所９）の
間が密封される。側板７の凹所９と渦巻状ダイヤフラム
１との間の空間はガス室13とされ、ガス室13には側板７
の連結口28に連結された給気口27を介してガスが封入さ
れる。同様に、本体６の凹所８と渦巻状ダイヤフラム１
との間の空間は流体室14とされ、流体室14には本体６の
給排口25、接続口26を介して外部の流体が導入される。
このダイヤフラム式アキュムレータは、流体の脈動吸
収、サージ圧吸収等に使用され、例えば塗料を吹きつけ
する場合に、脈動を吸収して塗料の圧力を一定にするた
めに用いられる。Thus, the phases of the spiral ripples are matched,
The outer peripheral portion of the spiral diaphragm 1 is sandwiched by the sandwiching portions 15 and 16, and the first seal 11 and the second seal 12 seal between the upper and lower spaces (recesses 8 and 9) of the spiral diaphragm 1. . The space between the recess 9 of the side plate 7 and the spiral diaphragm 1 is a gas chamber 13, and the gas chamber 13 has a side plate 7
Gas is filled through the air supply port 27 connected to the connection port 28 of the. Similarly, the recess 8 of the body 6 and the spiral diaphragm 1
A space between and is defined as a fluid chamber 14, and an external fluid is introduced into the fluid chamber 14 through a supply / discharge port 25 and a connection port 26 of the main body 6.
This diaphragm type accumulator is used for absorbing pulsation of fluid, absorbing surge pressure, etc., for example, when spraying paint, it is used for absorbing pulsation and making the pressure of the paint constant.
【００１２】流体室14内の圧力変動に従って、渦巻状ダ
イヤフラム１がガス室13側又は流体室14側に伸縮（移
動）し、この渦巻状ダイヤフラム１の伸縮によりダイヤ
フラム１が凹所８又は凹所９に接触する。そして、前記
のとおり、渦巻状ダイヤフラム１の渦巻状波紋Ｐ1 〜Ｐ
3 と凹所８及び凹所９の壁面の渦巻状波紋とが合致する
ように、これら三者の渦巻状波紋の位相を合わせてあ
る。従って、渦巻状ダイヤフラム１が接触する凹所８及
び凹所９の表面の接触箇所は、伸長した渦巻状ダイヤフ
ラム１の渦巻状波紋Ｐ1 〜Ｐ3 の山部３、谷部４等の対
向部分と対応した対称的な形状で、渦巻状波紋の谷部3
0、山部31等が交互に連続した形状とされる。例えば、
渦巻状ダイヤフラム１がガス室13側に伸長して、渦巻状
ダイヤフラム１が凹所９の表面と全面的に接触すると
き、渦巻状ダイヤフラム１の渦巻状波紋Ｐ1 〜Ｐ3 の山
部３及び谷部４等は、凹所９に形成された谷部30、山部
31等に、それぞれぴったりと接触し嵌合し合致するよう
に形成される。The spiral diaphragm 1 expands and contracts (moves) toward the gas chamber 13 side or the fluid chamber 14 side in accordance with the pressure fluctuation in the fluid chamber 14, and the expansion and contraction of this spiral diaphragm 1 causes the diaphragm 1 to become a recess 8 or a recess. Contact 9. Then, as described above, the spiral ripples P 1 to P of the spiral diaphragm 1
The phases of the spiral ripples of these three are aligned so that 3 and the spiral ripples on the wall surfaces of the recesses 8 and 9 coincide with each other. Therefore, the contact points on the surfaces of the recesses 8 and 9 with which the spiral diaphragm 1 comes into contact are the facing portions such as the peaks 3 and valleys 4 of the spiral ripples P 1 to P 3 of the expanded spiral diaphragm 1. With a symmetrical shape corresponding to, the valley part 3 of the spiral ripple
The shape is such that 0, mountain portions 31 and the like are alternately continuous. For example,
When the spiral diaphragm 1 extends toward the gas chamber 13 and the spiral diaphragm 1 comes into full contact with the surface of the recess 9, the peaks 3 of the spiral ripples P 1 to P 3 of the spiral diaphragm 1 and The valleys 4 etc. are the valleys 30, the peaks formed in the recesses 9.
31 and the like are formed so as to be in close contact with each other and to be fitted and matched.
【００１３】次に、図１及び図３を用いて、本発明の第
２実施例について説明する。図１に示す渦巻状ダイヤフ
ラム１は、第１実施例〜第３実施例に用いられるもので
あり、その内容は第１実施例における説明のとおりであ
る。図３において、図２と同一の部分には、図２に記入
した符号と同一の符号を用い、その構造の説明は原則と
して省略する。図３に示すように、本発明の第２実施例
のアキュムレータには、本体６と側板７とがあり、本体
６と側板７との対向面には凹所８（本体６側）及び凹所
10（側板７側）がある。そして、第２実施例において
は、渦巻状ダイヤフラム１が凹所10に接触する可能性が
存在しないことを前提とする。こうした前提があるの
で、凹所８（容器）の壁面形状は、第１実施例と同様
に、流体圧によって渦巻状ダイヤフラム１がこの壁面に
押し付けられて接触するときの変形形状に合致した形状
である。これに対して、凹所10の壁面形状は滑らかな曲
面であって、渦巻状ダイヤフラム１がこの壁面に押し付
けられて接触するときの変形形状に合致した形状ではな
い。Next, a second embodiment of the present invention will be described with reference to FIGS. The spiral diaphragm 1 shown in FIG. 1 is used in the first to third embodiments, and its contents are as described in the first embodiment. In FIG. 3, the same parts as those in FIG. 2 are denoted by the same reference numerals as those in FIG. 2, and the description of the structure is omitted in principle. As shown in FIG. 3, the accumulator of the second embodiment of the present invention has a main body 6 and a side plate 7, and a recess 8 (on the main body 6 side) and a recess are provided on the facing surfaces of the main body 6 and the side plate 7.
There are 10 (side plate 7 side). Then, in the second embodiment, it is premised that there is no possibility that the spiral diaphragm 1 will come into contact with the recess 10. Since there is such a premise, the wall surface shape of the recess 8 (container) is similar to that of the first embodiment, in conformity with the deformed shape when the spiral diaphragm 1 is pressed against and brought into contact with this wall surface by fluid pressure. is there. On the other hand, the wall shape of the recess 10 is a smooth curved surface, and does not match the deformed shape when the spiral diaphragm 1 is pressed against and comes into contact with this wall surface.
【００１４】流体室14内の圧力変動に従って、渦巻状ダ
イヤフラム１がガス室13側へは少しだけ、そして流体室
14側には大きく移動し、この渦巻状ダイヤフラム１の伸
縮によりダイヤフラム１が凹所８に接触するが、凹所10
には接触しない。そして、渦巻状ダイヤフラム１が流体
室14側に伸長して、渦巻状ダイヤフラム１が凹所８の表
面と全面的に接触するとき、渦巻状ダイヤフラム１の渦
巻状波紋Ｐ1 〜Ｐ3 の山部３及び谷部４等は、凹所８に
形成された谷部32、山部33等に、それぞれぴったりと接
触し嵌合し合致するように形成される。In accordance with the pressure fluctuation in the fluid chamber 14, the spiral diaphragm 1 is slightly moved to the gas chamber 13 side, and
It moves largely to the 14 side, and the diaphragm 1 comes into contact with the recess 8 due to the expansion and contraction of the spiral diaphragm 1, but the recess 10
Do not touch. Then, when the spiral diaphragm 1 extends toward the fluid chamber 14 and the spiral diaphragm 1 comes into full contact with the surface of the recess 8, the peaks of the spiral ripples P 1 to P 3 of the spiral diaphragm 1 are formed. 3 and the valley portion 4 and the like are formed so as to be in close contact with, fit into, and match the valley portion 32, the ridge portion 33 and the like formed in the recess 8.
【００１５】図１及び図４を用いて、本発明の第３実施
例のメタルダイヤフラムバルブについて説明する。図４
に示すように、本発明の第３実施例のメタルダイヤフラ
ムバルブには、弁箱54と弁蓋55とがあり、弁箱54と弁蓋
55との対向面には凹所56（弁箱54側）及び凹所57（弁蓋
55側）がある。凹所56と凹所57との間に金属製の渦巻状
ダイヤフラム１が配置される。そして、凹所57の壁面形
状は、金属製の渦巻状ダイヤフラム１の弾性力によって
渦巻状ダイヤフラム１がこの壁面に押し付けられて接触
するときの変形形状（概ね渦巻状ダイヤフラム１と同形
の渦巻波紋状）に合致した形状である。凹所57の中央部
にはシリンダ孔65が開口され、シリンダ孔65には弁棒の
機能を持つピストン66が摺動自在に嵌合されている。こ
れに対して、凹所56の中央部には流入通路61が開口さ
れ、流入通路61の開口の外周部に環状の弁シート52が凸
設される。弁シート52の外周には環状の窪み64が形成さ
れ、窪み64に流出通路63が開口している。このように、
凹所56の壁面形状は、渦巻状ダイヤフラム１がこの壁面
に押し付けられて接触するときの変形形状には合致しな
い。A metal diaphragm valve according to a third embodiment of the present invention will be described with reference to FIGS. 1 and 4. Figure 4
As shown in FIG. 5, the metal diaphragm valve of the third embodiment of the present invention includes a valve box 54 and a valve lid 55.
A recess 56 (valve box 54 side) and a recess 57 (valve lid) are provided on the surface facing 55.
55 side). The metallic spiral diaphragm 1 is arranged between the recesses 56 and 57. The wall shape of the recess 57 is a deformed shape when the spiral diaphragm 1 is pressed against the wall surface by the elastic force of the spiral spiral diaphragm 1 made of a metal and comes into contact with the spiral diaphragm 1 (generally, the spiral ripple shape similar to the spiral diaphragm 1). ) Is a shape that matches. A cylinder hole 65 is opened in the center of the recess 57, and a piston 66 having a valve rod function is slidably fitted in the cylinder hole 65. On the other hand, an inflow passage 61 is opened in the center of the recess 56, and an annular valve seat 52 is provided in a protruding manner on the outer peripheral portion of the opening of the inflow passage 61. An annular recess 64 is formed on the outer periphery of the valve seat 52, and an outflow passage 63 opens in the recess 64. in this way,
The wall shape of the recess 56 does not match the deformed shape when the spiral diaphragm 1 is pressed against and makes contact with this wall surface.
【００１６】渦巻状ダイヤフラム１の渦巻状波紋Ｐ1 〜
Ｐ3 と凹所57の壁面の渦巻状波紋とが合致するように、
これら三者の渦巻状波紋の位相を合わせて（例えば各渦
巻状波紋のスタート位置の角度を合わせて）、渦巻状ダ
イヤフラム１を弁箱54と弁蓋55とに装着する必要があ
る。位相合わせのために、第１実施例と同様に、渦巻状
ダイヤフラム１の外周近傍の所定位置にピン孔50を形成
し、挟持部57、ダイヤフラム押え59のピン孔50に対応す
べき位置に開口するピン挿入孔（不図示）を形成する。
弁箱54の挟持部58上に渦巻状ダイヤフラム１の外周部を
置き、挟持部58のピン挿入孔の開口位置に渦巻状ダイヤ
フラム１のピン孔50を位置させ、ピン孔50及びピン挿入
孔にピンを挿入し、ピンとピン挿入孔とを嵌合させるこ
とにより、前記三者の渦巻状波紋の位相を簡単かつ正確
に合わせることができる。こうして、渦巻状波紋の位相
が合致され、渦巻状ダイヤフラム１の外周部が挟持部58
とダイヤフラム押え59によって挟持され、渦巻状ダイヤ
フラム１によって凹所56側の第１室60と凹所57側の第２
室とに区画される。なお、弁シート62及びピストン66の
直径は渦巻状ダイヤフラム１の中心円形部２の直径より
も小さく設定されている。The spiral ripple P 1 of the spiral diaphragm 1
Make sure that P 3 and the spiral ripple on the wall of the recess 57 match.
It is necessary to mount the spiral diaphragm 1 on the valve box 54 and the valve lid 55 by matching the phases of the spiral ripples of these three parties (for example, by matching the angles of the start positions of the spiral ripples). For phase matching, as in the first embodiment, a pin hole 50 is formed at a predetermined position near the outer circumference of the spiral diaphragm 1 and is opened at a position corresponding to the pin hole 50 of the holding portion 57 and the diaphragm retainer 59. A pin insertion hole (not shown) is formed.
The outer peripheral portion of the spiral diaphragm 1 is placed on the sandwiching portion 58 of the valve box 54, the pin hole 50 of the spiral diaphragm 1 is positioned at the opening position of the pin inserting hole of the sandwiching portion 58, and the pin hole 50 and the pin inserting hole are formed. By inserting the pin and fitting the pin and the pin insertion hole, the phases of the spiral ripples of the three can be easily and accurately matched. In this way, the phases of the spiral ripples are matched, and the outer peripheral portion of the spiral diaphragm 1 is clamped by the sandwiching portion 58.
And the diaphragm retainer 59, and by the spiral diaphragm 1, the first chamber 60 on the side of the recess 56 and the second chamber 60 on the side of the recess 57.
It is divided into a room and a room. The diameters of the valve seat 62 and the piston 66 are set smaller than the diameter of the central circular portion 2 of the spiral diaphragm 1.
【００１７】図４には、渦巻状ダイヤフラム１の渦巻状
波紋が、弁蓋55の略渦巻波紋状（正確には、渦巻状ダイ
ヤフラム１の渦巻状波紋がこの壁面に押し付けられて接
触するときの変形形状に合致した形状）の凹所57に、金
属製渦巻状ダイヤフラム１の弾性力によって押しつけら
れた状態が示されている。このとき、渦巻状ダイヤフラ
ム１が弁シート62から最も離れた全開位置にあるので、
最大量の流体が流入通路61から弁シート62と渦巻状ダイ
ヤフラム１との間隙、第１室60、流出通路63を通って流
出する。ピストン66を弁シート62の方向に移動させる
と、ピストン66の先端部が渦巻状ダイヤフラム１の中心
円形部２のピストン66側を押圧し、渦巻状ダイヤフラム
１が弁シート62に近づき、弁シート62と渦巻状ダイヤフ
ラム１との間隙が減少し、第１室60を通る流体の流量が
減少する。ピストン66を弁シート62の方向に更に移動さ
せると、渦巻状ダイヤフラム１の中心円形部２の弁シー
ト62側が、弁シート62に押圧され、第１室60を通る流体
の流量がゼロになる。In FIG. 4, the spiral ripples of the spiral diaphragm 1 are substantially spiral ripples of the valve lid 55 (more precisely, when the spiral ripples of the spiral diaphragm 1 are pressed against and come into contact with this wall surface). It is shown that the recess 57 having a shape conforming to the deformed shape is pressed by the elastic force of the metallic spiral diaphragm 1. At this time, since the spiral diaphragm 1 is at the fully open position farthest from the valve seat 62,
The maximum amount of fluid flows out of the inflow passage 61 through the gap between the valve seat 62 and the spiral diaphragm 1, the first chamber 60, and the outflow passage 63. When the piston 66 is moved toward the valve seat 62, the tip of the piston 66 presses the piston 66 side of the central circular portion 2 of the spiral diaphragm 1, the spiral diaphragm 1 approaches the valve seat 62, and the valve seat 62 And the spiral diaphragm 1 are reduced, and the flow rate of the fluid passing through the first chamber 60 is reduced. When the piston 66 is further moved toward the valve seat 62, the valve seat 62 side of the central circular portion 2 of the spiral diaphragm 1 is pressed by the valve seat 62, and the flow rate of the fluid passing through the first chamber 60 becomes zero.
【００１８】ピストン66を弁箱55の方向に移動させる
と、渦巻状ダイヤフラム１はそれ自体の弾性力と渦巻状
ダイヤフラム１の第１室60側に作用する流体の力とによ
り、弁箱55の方向に移動する。渦巻状ダイヤフラム１の
移動に応じて、第１室60を通過する流体の流量が増加
し、渦巻状ダイヤフラム１の移動によりダイヤフラム１
が凹所57に接触するに至る。そして、前記のとおり、渦
巻状ダイヤフラム１の渦巻状波紋Ｐ1 〜Ｐ3 と凹所57の
壁面の渦巻状波紋とが合致するように、これら三者の渦
巻状波紋の位相を合わせてある。従って、渦巻状ダイヤ
フラム１が接触する凹所57の表面の接触箇所は、伸長し
た渦巻状ダイヤフラム１の渦巻状波紋Ｐ1 〜Ｐ3 の山
部、谷部等の対向部分と対応した対称的な形状で、渦巻
状波紋の谷部、山部等が交互に連続した形状とされる。
渦巻状ダイヤフラム１が弁蓋55側に移動して、渦巻状ダ
イヤフラム１が凹所57の表面と全面的に接触するとき、
渦巻状ダイヤフラム１の渦巻状波紋Ｐ1 〜Ｐ3 の山部及
び谷部等は、凹所57に形成された谷部、山部等に、それ
ぞれぴったりと接触し嵌合し合致するように形成され
る。When the piston 66 is moved toward the valve box 55, the spiral diaphragm 1 is moved by the elastic force of the spiral diaphragm 1 and the force of the fluid acting on the first chamber 60 side of the spiral diaphragm 1. Move in the direction. The flow rate of the fluid passing through the first chamber 60 increases in accordance with the movement of the spiral diaphragm 1, and the movement of the spiral diaphragm 1 causes the diaphragm 1 to move.
Comes into contact with the recess 57. As described above, the phases of the spiral ripples P 1 to P 3 of the spiral diaphragm 1 and the spiral ripples of the wall surface of the recess 57 are matched so that the spiral ripples of these three phases match. Therefore, the contact points on the surface of the recess 57 with which the spiral diaphragm 1 contacts are symmetrical with the facing portions such as the peaks and valleys of the spiral ripples P 1 to P 3 of the expanded spiral diaphragm 1. The shape is such that the valleys and peaks of the spiral ripple are alternately continuous.
When the spiral diaphragm 1 moves to the valve lid 55 side and the spiral diaphragm 1 makes full contact with the surface of the recess 57,
The peaks and valleys of the spiral ripples P 1 to P 3 of the spiral diaphragm 1 are formed so as to be in close contact with and fit into the valleys and peaks formed in the recess 57, respectively. To be done.
【００１９】次に、本発明の第４実施例について説明す
る。ダイヤフラム式のアキュムレータにおいては、流体
の圧力でダイヤフラムが本体６及び側板７の凹所８及び
凹所９に押し付けられる。そこで、第４実施例では、凹
所８及び凹所９に押し付けられるときに、ダイヤフラム
が凹所８及び凹所９の形状に従って変形することを利用
する。つまり、同心の渦巻状波紋が中心円形部の外周の
周方向均等分位の少なくとも２点からスタートさせた形
状（好適には３本の同心の渦巻状波紋が、中心円形部２
の外周に隣接し周方向３等分位の間隔をあけてスタート
した形状。渦巻状波紋数は奇数が好ましく、また渦巻状
波紋の山部及び谷部は連続曲面とするとよい。）が、凹
所８及び凹所９の曲面に投影され形成される。椀状のダ
イヤフラムが凹所８及び凹所９に形成された３本の同心
の渦巻状波紋に流体の圧力で押し付けられると、椀状の
ダイヤフラムが変形して凹所８及び凹所９の渦巻状波紋
に合致した形状（渦巻状ダイヤフラムの形状）となる。
流体の圧力による押し付けを繰り返すと、椀状のダイヤ
フラムは渦巻状ダイヤフラムの形状に変形し易くなり、
渦巻状ダイヤフラムに似た機能を奏し、ダイヤフラムの
寿命が伸びる。Next, a fourth embodiment of the present invention will be described. In the diaphragm type accumulator, the diaphragm is pressed against the recesses 8 and 9 of the main body 6 and the side plate 7 by the pressure of the fluid. Therefore, the fourth embodiment utilizes that the diaphragm is deformed according to the shapes of the recesses 8 and 9 when pressed against the recesses 8 and 9. That is, a shape in which the concentric spiral ripples start from at least two points in the circumferentially uniform quantile on the outer periphery of the central circular portion (preferably, three concentric spiral ripples form the central circular portion 2).
A shape that is adjacent to the outer circumference of the and started at intervals of three equal parts in the circumferential direction. The number of spiral ripples is preferably an odd number, and the peaks and valleys of the spiral ripples may be continuous curved surfaces. ) Is projected and formed on the curved surfaces of the recesses 8 and 9. When the bowl-shaped diaphragm is pressed by the fluid pressure against the three concentric spiral ripples formed in the recesses 8 and 9, the bowl-shaped diaphragm is deformed and the spirals of the recesses 8 and 9 are swirled. The shape matches the shape of a ripple (the shape of a spiral diaphragm).
Repeated pressing by the pressure of the fluid makes the bowl-shaped diaphragm easily deform to the shape of a spiral diaphragm,
It has a function similar to that of a spiral diaphragm and extends the life of the diaphragm.
【００２０】永久歪を起こす素材又は永久歪を起こし易
い素材で椀状ダイヤフラムを作製した場合には、前記の
ように、流体の圧力による押し付けを繰り返すと、椀状
のダイヤフラムが永久歪を起こして渦巻状ダイヤフラム
となり、ダイヤフラムの寿命が伸びる。第４実施例にお
いても、椀状ダイヤフラムに永久歪を起こさせた後、材
質によっては熱処理が必要な場合は、アキュムレータを
分解した後に熱処理を施す。この時、椀状のダイヤフラ
ムに形成された渦巻状波紋が凹所８及び凹所９の渦巻状
波紋と合致するように、渦巻状波紋の位相を合わせるの
がよい。第１実施例と同様に、椀状のダイヤフラムピン
孔を形成し、挟持部15、16に開口するピン挿入孔を形成
すると、位相を簡単かつ正確に合わせることができる。When a bowl-shaped diaphragm is made of a material that causes permanent strain or a material that easily causes permanent strain, as described above, when pressing with a fluid pressure is repeated, the bowl-shaped diaphragm causes permanent strain. It becomes a spiral diaphragm and the life of the diaphragm is extended. Also in the fourth embodiment, after the bowl-shaped diaphragm is permanently deformed, and if heat treatment is necessary depending on the material, the accumulator is decomposed and then heat treated. At this time, the phases of the spiral ripples are preferably matched so that the spiral ripples formed on the bowl-shaped diaphragm match the spiral ripples of the recesses 8 and 9. Similar to the first embodiment, if a bowl-shaped diaphragm pin hole is formed and a pin insertion hole that opens in the holding portions 15 and 16 is formed, the phases can be easily and accurately matched.
【００２１】[0021]
【発明の効果】本発明では、渦巻状ダイヤフラムと相対
する容器の凹所の壁面形状を、渦巻状ダイヤフラムが壁
面に接触するときの変形形状に合致した形状に形成し
た。渦巻状ダイヤフラムが容器の凹所に向かって移動
し、容器の凹所と接触するときに、渦巻状ダイヤフラム
の渦巻状波紋の全面が、渦巻状波紋のある容器の凹所の
と一致し、ぴったりと重なり、渦巻状ダイヤフラムの渦
巻状波紋は変形しない。従って、渦巻状ダイヤフラムの
渦巻形状が長期間維持され、渦巻状ダイヤフラムに生ず
る応力には片寄りがないので、渦巻状ダイヤフラムの寿
命が永くなり、本発明のアキュムレータの寿命も長くな
る。また、本発明では、永久歪を起こし易い素材で作製
された椀状ダイヤフラムと相対する容器の凹所の壁面形
状を、同心の渦巻状波紋の形状が投影された形状に形成
した。この場合には、椀状ダイヤフラムが流体圧によっ
て容器の凹所の壁面に繰り返して押し付けられると、椀
状のダイヤフラムが永久歪を起こして渦巻状ダイヤフラ
ムとなる。従って、使用時において、ダイヤフラムの全
面が、渦巻状波紋のある容器の凹所の全面と一致し、ぴ
ったりと重なり、ダイヤフラムの渦巻状波紋は変形しな
い。前記と同様に本発明のアキュムレータの寿命が長く
なる。According to the present invention, the wall shape of the recess of the container facing the spiral diaphragm is formed in a shape that matches the deformed shape when the spiral diaphragm contacts the wall surface. When the spiral diaphragm moves toward the recess of the container and comes into contact with the recess of the container, the entire surface of the spiral ripple of the spiral diaphragm is aligned with the recess of the container with the spiral ripple, and is a perfect fit. And the spiral ripple of the spiral diaphragm is not deformed. Therefore, since the spiral shape of the spiral diaphragm is maintained for a long period of time and the stress generated in the spiral diaphragm is not biased, the life of the spiral diaphragm is extended and the life of the accumulator of the present invention is also extended. Further, in the present invention, the wall shape of the recess of the container facing the bowl-shaped diaphragm made of a material that easily causes permanent set is formed in a shape in which the concentric spiral ripple shape is projected. In this case, when the bowl-shaped diaphragm is repeatedly pressed against the wall surface of the concave portion of the container by the fluid pressure, the bowl-shaped diaphragm is permanently deformed and becomes a spiral diaphragm. Therefore, when in use, the entire surface of the diaphragm coincides with the entire surface of the recess of the container having the spiral ripple and exactly overlaps with it, and the spiral ripple of the diaphragm is not deformed. Similar to the above, the life of the accumulator of the present invention is extended.
【図１】本発明の第１実施例の渦巻状ダイヤフラムの平
面図である。FIG. 1 is a plan view of a spiral diaphragm according to a first embodiment of the present invention.
【図２】本発明の第１実施例の断面図である。FIG. 2 is a sectional view of the first embodiment of the present invention.
【図３】本発明の第２実施例の断面図である。FIG. 3 is a sectional view of a second embodiment of the present invention.
【図４】本発明の第３実施例の要部の断面図である。FIG. 4 is a sectional view of an essential part of a third embodiment of the present invention.
１ 渦巻状ダイヤフラム ２ 中心円形部 ８ 凹所（本体の） ９ 凹所（側板の） 1 spiral diaphragm 2 center circular part 8 recess (of main body) 9 recess (of side plate)
───────────────────────────────────────────────────── フロントページの続き (72)発明者 杉村 宣行 静岡県清水市馬走北３−27 (72)発明者 杉村 登夢 静岡県清水市馬走北３−27 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Nobuyuki Sugimura 3-27 Mabashikita, Shimizu City, Shizuoka Prefecture (72) Inventor Tome Yume Sugimura 3-27 Mabashikita, Shimizu City, Shizuoka Prefecture
Claims (3)
の周方向均等分位の少なくとも２点からスタートした同
心の渦巻状波紋が形成された渦巻状ダイヤフラムが、凹
所を有する二つの容器によって挟持され、前記渦巻状ダ
イヤフラムと相対する容器の凹所の壁面形状を、前記渦
巻状ダイヤフラムが前記壁面に接触するときの変形形状
に合致した形状に形成したダイヤフラム接触面が渦巻状
の容器。1. A spiral-shaped diaphragm having concentric spiral-shaped ripples formed adjacent to the circumference of a central portion of a material plate and starting from at least two points in the circumferentially uniform quantiles, has two recesses. A container with a diaphragm contact surface that is sandwiched by a container and has a shape in which the wall shape of the recess of the container facing the spiral diaphragm matches the deformed shape when the spiral diaphragm contacts the wall surface. .
ラムが、凹所を有する二つの容器によって挟持され、前
記渦巻状ダイヤフラムと相対する容器の凹所のうち、前
記渦巻状ダイヤフラムの渦巻状波紋が接触する側だけ、
前記渦巻状ダイヤフラムが接触するときの変形形状に合
致した形状に形成したダイヤフラム接触面が渦巻状の容
器。2. A spiral diaphragm in which a spiral ripple is formed is sandwiched between two containers having a recess, and the spiral ripple of the spiral diaphragm is included in the recess of the container facing the spiral diaphragm. Only the side where
A container in which the diaphragm contact surface formed in a shape that matches the deformed shape when the spiral diaphragm comes into contact has a spiral shape.
状ダイヤフラムが、凹所を有する二つの容器によって挟
持され、前記椀状ダイヤフラムと相対する容器の凹所の
一方又は双方の壁面形状を、中心円形部の周りに隣接し
て、その周方向均等分位の少なくとも２点からスタート
した同心の渦巻状波紋の形状が投影された形状に形成し
たダイヤフラム接触面が渦巻状の容器。3. A bowl-shaped diaphragm made of a material that easily causes permanent set is sandwiched between two containers having recesses, and a wall shape of one or both of the recesses of the container facing the bowl-shaped diaphragm is formed. A container having a spiral spiral contact surface formed adjacent to the central circular portion and having a shape projected from the concentric spiral ripples starting from at least two points in the circumferential uniform quantile.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5320919A JPH07151101A (en) | 1993-11-29 | 1993-11-29 | Vessel having spiral diaphragm contact surface |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5320919A JPH07151101A (en) | 1993-11-29 | 1993-11-29 | Vessel having spiral diaphragm contact surface |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH07151101A true JPH07151101A (en) | 1995-06-13 |
Family
ID=18126743
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5320919A Pending JPH07151101A (en) | 1993-11-29 | 1993-11-29 | Vessel having spiral diaphragm contact surface |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07151101A (en) |
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