JPH07139876A - Method for purifying krypton and xenon - Google Patents
Method for purifying krypton and xenonInfo
- Publication number
- JPH07139876A JPH07139876A JP5289587A JP28958793A JPH07139876A JP H07139876 A JPH07139876 A JP H07139876A JP 5289587 A JP5289587 A JP 5289587A JP 28958793 A JP28958793 A JP 28958793A JP H07139876 A JPH07139876 A JP H07139876A
- Authority
- JP
- Japan
- Prior art keywords
- krypton
- xenon
- tower
- oxygen
- column
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
- F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
- F25J3/04406—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air using a dual pressure main column system
- F25J3/04412—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air using a dual pressure main column system in a classical double column flowsheet, i.e. with thermal coupling by a main reboiler-condenser in the bottom of low pressure respectively top of high pressure column
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
- F25J3/0228—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream characterised by the separated product stream
- F25J3/028—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream characterised by the separated product stream separation of noble gases
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
- F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
- F25J3/04642—Recovering noble gases from air
- F25J3/04745—Krypton and/or Xenon
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
- F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
- F25J3/04642—Recovering noble gases from air
- F25J3/04745—Krypton and/or Xenon
- F25J3/04751—Producing pure krypton and/or xenon recovered from a crude krypton/xenon mixture
- F25J3/04757—Producing pure krypton and/or xenon recovered from a crude krypton/xenon mixture using a hybrid system, e.g. using adsorption, permeation or catalytic reaction
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2200/00—Processes or apparatus using separation by rectification
- F25J2200/34—Processes or apparatus using separation by rectification using a side column fed by a stream from the low pressure column
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2205/00—Processes or apparatus using other separation and/or other processing means
- F25J2205/82—Processes or apparatus using other separation and/or other processing means using a reactor with combustion or catalytic reaction
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2215/00—Processes characterised by the type or other details of the product stream
- F25J2215/34—Krypton
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2215/00—Processes characterised by the type or other details of the product stream
- F25J2215/36—Xenon
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/40—Capture or disposal of greenhouse gases of CO2
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Thermal Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Separation By Low-Temperature Treatments (AREA)
Abstract
(57)【要約】 (修正有)
【目的】 簡単な装置構成で、連続して効率よくクリプ
トン及びキセノンを高純度に精製する方法を提供する。
【構成】 クリプトン及びキセノンを含む液化酸素を濃
縮塔3に導入してクリプトン及びキセノンを濃縮する濃
縮工程、濃縮塔塔底液を気化後に炭化水素類と酸素とを
反応させて除去する銅・クロム複合触媒の触媒反応筒1
5及び反応生成物の二酸化炭素,水を除去する吸着器1
8とによる触媒精製工程、吸着器導出後のガスを分岐し
一方を濃縮塔塔底に導入して濃縮塔塔底液中の炭化水素
類を希釈する触媒精製ガス循環工程、濃縮塔下部へ再導
入する触媒反応工程後のクリプトン,キセノン含有ガス
の導入量の制御工程、他方を再度液化し脱酸素塔23に
導入し精留して酸素を除去する工程、脱酸素塔塔底液を
分離塔28で精留してキセノンとクリプトンとを分離す
る工程からなるキセノンとクリプトンの精製方法。
(57) [Summary] (Modified) [Objective] To provide a method for purifying krypton and xenon to high purity continuously and efficiently with a simple apparatus configuration. [Constitution] A concentration step of introducing liquefied oxygen containing krypton and xenon into a concentration column 3 to concentrate krypton and xenon, and copper / chromium for removing hydrocarbons by reacting oxygen with oxygen after vaporizing the bottom liquid of the concentration column Complex reaction catalyst reaction tube 1
5 and adsorber 1 for removing carbon dioxide and water of reaction products
8, a catalyst refining process for diluting hydrocarbons in the bottom liquid of the concentration tower by branching the gas after advancing the adsorber and introducing one to the bottom of the concentration tower. A step of controlling the introduction amount of krypton- and xenon-containing gas after the catalytic reaction step to be introduced, a step of liquefying the other again and introducing it into the deoxygenation tower 23 to rectify and remove oxygen, a deoxygenation tower bottom liquid is a separation tower A method for purifying xenon and krypton, which comprises the step of rectifying at 28 to separate xenon and krypton.
Description
【0001】[0001]
【産業上の利用分野】本発明は、クリプトン及びキセノ
ンの精製方法に関し、詳しくは、空気液化分離装置の複
精留塔上部塔下部の液化酸素中に濃縮されるクリプトン
及びキセノンを精製する方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for purifying krypton and xenon, and more particularly to a method for purifying krypton and xenon concentrated in liquefied oxygen in the upper part and lower part of the double rectification column of an air liquefaction separation apparatus. .
【0002】[0002]
【従来の技術】従来から、空気液化分離装置の液化酸素
中に濃縮されるクリプトン及びキセノンをさらに濃縮
し、濃縮した液又はガスをさらに精製後、クリプトン及
びキセノンをそれぞれに分離することが行われている。2. Description of the Related Art Conventionally, krypton and xenon, which are concentrated in liquefied oxygen of an air liquefaction separation apparatus, are further concentrated, the concentrated liquid or gas is further purified, and then krypton and xenon are separated from each other. ing.
【0003】通常、これらの装置は、精留工程,触媒工
程,吸着工程を繰り返し、精留によりクリプトン90〜
95%及びキセノン5〜10%の濃縮液を得た後、さら
にクリプトンとキセノンとを分離するようにしている。
このため複精留塔主凝縮蒸発器を導出後の液化酸素を約
10工程の精製工程を経て、最終製品であるクリプトン
及びキセノンを得ていた。Usually, these apparatuses repeat a rectification step, a catalyst step and an adsorption step, and the krypton 90-
After obtaining a concentrated solution of 95% and xenon 5-10%, krypton and xenon are further separated.
Therefore, liquefied oxygen after being discharged from the main condenser / evaporator of the double rectification column was subjected to about 10 purification steps to obtain krypton and xenon as final products.
【0004】[0004]
【発明が解決しようとする課題】しかしながら、大気中
に含まれるクリプトン及びキセノンは、それぞれ1.1
4ppm,0.086ppmと極微量であり、これを濃
縮すると同時に大気中の炭化水素類(主としてメタン、
以下同)をも濃縮するため、上記の如く多数の工程を必
要とし、かつ、連続した精製を行うことができず、一貫
した精製工程を有する装置の製作が困難であった。However, the amount of krypton and xenon contained in the atmosphere is 1.1, respectively.
It is an extremely small amount of 4 ppm and 0.086 ppm, and at the same time it is concentrated, hydrocarbons in the atmosphere (mainly methane,
In the following, since the same is also concentrated, a large number of steps are required as described above, and continuous purification cannot be performed, making it difficult to manufacture a device having a consistent purification step.
【0005】そこで本発明は、工程数を低減し、クリプ
トン及びキセノンを連続的かつ効率よく分離することが
でき、しかも高純度に精製したクリプトン及びキセノン
を得ることができる精製方法を提供することを目的とし
ている。Therefore, the present invention aims to provide a purification method in which the number of steps is reduced, krypton and xenon can be continuously and efficiently separated, and highly purified krypton and xenon can be obtained. Has an aim.
【0006】[0006]
【課題を解決するための手段】上記した目的を達成する
ため、本発明のクリプトン及びキセノンの精製方法は、
空気液化分離装置から導出されるクリプトン及びキセノ
ンを含む液化酸素からクリプトン及びキセノンを精製す
る方法において、前記液化酸素を濃縮塔に導入して塔底
液にクリプトン及びキセノンを濃縮する工程と、該濃縮
塔塔底液を気化して触媒反応筒に導入して含有する炭化
水素類と酸素とを反応させる触媒反応工程と、該触媒反
応筒導出後のガスを吸着器に導入して触媒反応工程で生
成した水,二酸化炭素を吸着除去する吸着工程と、該吸
着工程導出後のガスを再度冷却した後2分し、その一方
を濃縮塔下部に再導入して濃縮塔塔底液中の炭化水素類
を希釈する工程と、前記濃縮塔下部へ再導入する前記触
媒反応工程後のクリプトン,キセノン含有ガスの導入量
の制御を前記濃縮塔塔底液中の炭化水素類の含有量又は
含有する炭化水素類と酸素とを反応させる触媒反応工程
へ導入される前のクリプトン,キセノン含有ガス中の炭
化水素類の含有量を検出し、該検出された炭化水素類の
含有量に応じて行う工程と、前記分岐した他方を脱酸素
塔に導入して精留分離を行い、該脱酸素塔塔頂から小量
のクリプトンを含む酸素ガスを導出し、塔底にクリプト
ン,キセノンの混合液を留出する脱酸素工程と、脱酸素
塔塔底液を導出して分離塔に導入し、該分離塔塔頂部か
らクリプトンを、塔底部からキセノンをそれぞれ導出す
る分離工程とを順次行うことを特徴としている。In order to achieve the above object, the method for purifying krypton and xenon of the present invention comprises:
In a method for purifying krypton and xenon from liquefied oxygen containing krypton and xenon derived from an air liquefaction separation device, a step of introducing the liquefied oxygen into a concentration column to concentrate krypton and xenon in a bottom liquid, and the concentration In the catalytic reaction step of vaporizing the tower bottom liquid and introducing it into the catalytic reaction tube to react the contained hydrocarbons with oxygen, and introducing the gas after the catalytic reaction tube is introduced into the adsorber into the catalytic reaction step. The adsorption step of adsorbing and removing the produced water and carbon dioxide, and the gas after the desorption of the adsorption step are cooled again and then divided into 2 minutes, and one of them is reintroduced into the lower part of the concentrating tower to introduce hydrocarbons in the bottom liquid of the concentrating tower. Of the amount of hydrocarbons contained in the bottom liquid of the concentration column or the carbonization of containing them hydrogen And krypton before being introduced into the catalytic reaction step of reacting oxygen with oxygen, a step of detecting the content of hydrocarbons in the xenon-containing gas, and performing according to the content of the detected hydrocarbons, The other branched one is introduced into a deoxygenation tower for rectification separation, oxygen gas containing a small amount of krypton is discharged from the top of the deoxygenation tower, and a mixture liquid of krypton and xenon is distilled out to the bottom of the tower. The method is characterized in that an oxygen step and a deoxidizing tower bottom liquid are introduced and introduced into a separation tower, and krypton is discharged from the top of the separation tower and xenon is discharged from the tower bottom, respectively.
【0007】また、本発明は、前記触媒反応筒に導入し
て含有する炭化水素類と酸素とを反応させる触媒反応工
程は、触媒に銅・クロム複合触媒を使用すること、該触
媒反応筒に導入して含有する炭化水素類と酸素とを反応
させる触媒反応工程の反応温度は300〜700℃、空
間速度は1000〜6000h-1で反応させること、前
記脱酸素塔塔頂部から導出するクリプトン含有酸素ガス
の一部又は全部を前記濃縮塔中部あるいは中下部へ再度
導入すること、前記分離塔塔頂から導出する酸素含有ク
リプトンガスの一部又は全部を前記濃縮塔下部へ再度導
入することを特徴としている。Further, in the present invention, in the catalytic reaction step of reacting the hydrocarbons contained in the catalytic reaction tube with oxygen, a copper-chromium composite catalyst is used as a catalyst, The reaction temperature of the catalytic reaction step for reacting the introduced hydrocarbons and oxygen with each other is 300 to 700 ° C., the space velocity is 1000 to 6000 h −1 , and the reaction is carried out at a top of the deoxygenation column containing krypton. Reintroducing part or all of the oxygen gas into the middle part or the lower part of the concentration column, and again introducing part or all of the oxygen-containing krypton gas discharged from the top of the separation column into the lower part of the concentration column. I am trying.
【0008】また、上記本発明方法を実施するための装
置構成としては、空気液化分離装置から導出されるクリ
プトン及びキセノンを含む液化酸素からクリプトン及び
キセノンを精製する装置において、前記液化酸素を導入
して塔底液にクリプトン及びキセノンを濃縮する濃縮塔
と、該濃縮塔塔底液をを気化後、含有する炭化水素類と
酸素とを反応させる触媒反応筒と、該触媒反応筒で生成
した水,二酸化炭素を吸着除去する吸着器と、該吸着器
導出後のガスを2分して一方を前記濃縮塔に再度導入す
る経路と、前記濃縮塔塔底液中の炭化水素類の含有量又
は含有する炭化水素類と酸素とを反応させる触媒反応工
程へ導入される前のクリプトン,キセノン含有ガス中の
炭化水素類の含有量を検出する検出手段と、該検出され
た炭化水素類の含有量に応じて前記濃縮塔下部へ再導入
する前記触媒反応工程後のクリプトン,キセノン含有ガ
スの導入量を制御する制御手段と、前記2分した他方を
導入して精留分離を行い、塔頂から小量のクリプトンを
含む酸素ガスを導出し、塔底にクリプトン,キセノンの
混合液を留出する脱酸素塔と、該脱酸素塔塔底液を導入
して精留分離し、塔頂部からクリプトンを、塔底部から
キセノンをそれぞれ導出する分離塔とを備えているもの
が適している。Further, as an apparatus configuration for carrying out the above-mentioned method of the present invention, in the apparatus for purifying krypton and xenon from liquefied oxygen containing krypton and xenon which is derived from an air liquefaction separation apparatus, the liquefied oxygen is introduced. Concentration column for concentrating krypton and xenon in the column bottom liquid, a catalyst reaction column for reacting the hydrocarbons contained therein with oxygen after vaporizing the concentration column column bottom liquid, and water produced in the catalyst reaction column. An adsorber for adsorbing and removing carbon dioxide, a path for dividing the gas discharged from the adsorber into two and reintroducing one into the concentrating tower, a content of hydrocarbons in the bottom liquid of the concentrating tower, or Detecting means for detecting the content of hydrocarbons in the krypton- and xenon-containing gas before being introduced into the catalytic reaction step of reacting the contained hydrocarbons with oxygen, and the content of the detected hydrocarbons. A control means for controlling the introduction amount of the krypton / xenon-containing gas after the catalytic reaction step, which is re-introduced into the lower part of the concentrating column according to the amount, and the other of the two divided parts are introduced to carry out rectification separation, A deoxygenation column that derives oxygen gas containing a small amount of krypton from the column and distills a mixed solution of krypton and xenon at the bottom of the column, and the deoxygenation column bottom liquid is introduced for rectification separation, Those equipped with krypton and a separation column for extracting xenon from the bottom of the column are suitable.
【0009】[0009]
【作 用】上記構成によれば、空気液化分離装置から導
出した液化酸素中のクリプトン及びキセノンを工程数を
低減し、連続一貫した工程で効率よく高純度に精製する
ことができる。[Operation] According to the above configuration, the krypton and xenon in the liquefied oxygen derived from the air liquefaction separation device can be efficiently purified to a high purity in a continuous and consistent process by reducing the number of processes.
【0010】[0010]
【実施例】以下、本発明を、図面に示す一実施例に基づ
いてさらに詳細に説明する。まず、空気液化分離装置の
複精留塔1の上部塔下部の主凝縮蒸発器1a部分から、
クリプトン400ppm、キセノン20ppm及び炭化
水素類(主としてメタン)100ppmが濃縮された液
化酸素を導出し、液酸ポンプ2により濃縮塔3中部又は
上部に導入する。この場合、該濃縮塔3を主凝縮蒸発器
1aより下方に設置しておけば、液化酸素の液柱圧によ
り前記ポンプ無しで濃縮塔2の頂部に導入することがで
きる。BEST MODE FOR CARRYING OUT THE INVENTION The present invention will now be described in more detail based on an embodiment shown in the drawings. First, from the main condenser evaporator 1a portion of the upper column lower part of the double rectification column 1 of the air liquefaction separation device,
Liquefied oxygen in which 400 ppm of krypton, 20 ppm of xenon and 100 ppm of hydrocarbons (mainly methane) are concentrated is extracted and introduced into the middle or upper part of the concentration column 3 by the liquid acid pump 2. In this case, if the concentration tower 3 is installed below the main condenser evaporator 1a, it can be introduced into the top of the concentration tower 2 without the pump due to the liquid column pressure of liquefied oxygen.
【0011】上記濃縮塔3の底部には、管5aから供給
される酸素ガス,窒素ガス,アルゴンガス又は空気を加
熱源とするリボイラー5が設けられており、塔底液を加
熱して上昇ガスを生成する。該上昇ガスは塔内を上昇
し、該濃縮塔3頂部に設けられた濃縮塔凝縮器6で凝縮
し、還流液となって流下し前記上昇ガスと接触して精留
が行われる。リボイラー5で加熱源となり生成した液化
ガスの一部は,調節弁5cで圧力の制御を行った上、濃
縮塔凝縮器6で寒冷源として使用し、残りの液化ガスは
後記する脱酸素塔凝縮器25の寒冷源として使用し、更
に余剰分は、後記する冷媒用液化ガス貯槽36に導入し
貯留される。At the bottom of the concentrating column 3, there is provided a reboiler 5 which uses oxygen gas, nitrogen gas, argon gas or air supplied from a pipe 5a as a heating source, and heats the column bottom liquid to raise the rising gas. To generate. The ascending gas rises in the tower, is condensed in the condensing tower condenser 6 provided at the top of the concentrating tower 3, becomes a reflux liquid, flows down, and comes into contact with the ascending gas for rectification. A part of the liquefied gas generated as a heating source in the reboiler 5 was used as a cold source in the condensing tower condenser 6 after controlling the pressure with the control valve 5c, and the remaining liquefied gas was condensed in the deoxidation tower as described later. It is used as a cold source of the vessel 25, and the surplus is introduced and stored in a refrigerant liquefied gas storage tank 36 described later.
【0012】該リボイラー5での加熱量の調節、すなわ
ち上昇ガス量の調節は、該濃縮塔3塔底液の液面を液面
調節計(LIC)L1で検出して、弁5bを調節するこ
とにより行う。The amount of heating in the reboiler 5, that is, the amount of rising gas, is adjusted by detecting the liquid level of the bottom liquid of the concentrating tower 3 with a liquid level controller (LIC) L1 and adjusting the valve 5b. By doing.
【0013】前記濃縮塔3内での精留により、前記複精
留塔1から導入されたクリプトン及びキセノンを含む液
化酸素は、塔底部においてはクリプトン及びキセノンを
20〜50倍に濃縮した濃縮液となり、塔頂部からは酸
素ガスが管7に導出される。該濃縮塔3の底部には、ク
リプトンが約9000ppm、キセノンが約1000p
pmに濃縮されるとともに、原料液化酸素中に含まれて
いた炭化水素類が1000ppm以上に濃縮される。Liquefied oxygen containing krypton and xenon introduced from the double rectification column 1 by the rectification in the concentration column 3 is a concentrated liquid in which krypton and xenon are concentrated 20 to 50 times at the bottom of the column. And oxygen gas is led to the pipe 7 from the top of the column. At the bottom of the concentrating tower 3, krypton is about 9000 ppm and xenon is about 1000 p.
While being concentrated to pm, hydrocarbons contained in the raw material liquefied oxygen are concentrated to 1000 ppm or more.
【0014】炭化水素類の濃度が高まると危険であるた
め、後記するように触媒反応筒15導出後のクリプト
ン,キセノン含有ガスを分岐して再度濃縮塔3へ導入す
る。これにより炭化水素類は10倍以下の濃縮度で濃縮
した濃縮液となる。Since it is dangerous if the concentration of hydrocarbons increases, the krypton- and xenon-containing gas after being discharged from the catalytic reaction tube 15 is branched and introduced into the concentration column 3 again as described later. As a result, the hydrocarbons become a concentrated liquid concentrated at a concentration of 10 times or less.
【0015】濃縮塔3の底部の濃縮液は、管4に導出さ
れて該濃縮液の液ヘッドで自然流入可能な位置に設置さ
れた熱交換器8,13、加熱器14,触媒筒15,冷却
器17,吸着器18を経て脱酸素塔23及び/又は濃縮
塔3に導入される。この工程を行うのに十分な前記液柱
圧が得られる位置に濃縮塔3を設置する。The concentrated liquid at the bottom of the concentrating tower 3 is introduced into a pipe 4 and is installed at a position where the liquid head of the concentrated liquid can spontaneously flow into it, a heat exchanger 8, a heater 14, a catalyst cylinder 15, It is introduced into the deoxidizing tower 23 and / or the concentrating tower 3 via the cooler 17 and the adsorber 18. The concentration column 3 is installed at a position where the liquid column pressure sufficient to perform this step is obtained.
【0016】次いで、濃縮塔3底部から管4に導出した
塔底液を、濃縮塔熱交換器8で触媒精製後のガスと熱交
換して気化した後、前記液柱圧で触媒精製工程へ送気す
る。該液柱圧で送気ができるように濃縮塔3の位置が設
定されていない場合は、ラインポンプ9で昇圧し、触媒
精製工程へ送気する。Next, the bottom liquid discharged from the bottom of the concentration tower 3 to the pipe 4 is heat-exchanged with the gas after catalyst purification in the concentration tower heat exchanger 8 to be vaporized, and then to the catalyst purification step by the liquid column pressure. Send air. When the position of the concentration tower 3 is not set so that the gas can be supplied by the liquid column pressure, the pressure is increased by the line pump 9 and the air is supplied to the catalyst refining step.
【0017】いずれの場合も、炭化水素類分析計11a
により検出測定された濃縮塔3塔底液中の炭化水素類の
濃度に応じて調節弁10を開閉し、触媒反応筒15へ導
入するガス量を調節して触媒反応筒15における空間速
度を後記する最適速度範囲内に制御する。In any case, the hydrocarbon analyzer 11a
The control valve 10 is opened and closed according to the concentration of hydrocarbons in the bottom liquid of the concentrating tower 3 detected and measured by, and the space velocity in the catalytic reaction cylinder 15 is adjusted by adjusting the amount of gas introduced into the catalytic reaction cylinder 15. Control within the optimum speed range.
【0018】この結果起こる濃縮塔塔底液の上下は、液
面指示調節計(LIC)L1からの信号により開閉する
弁5bでリボイラー5の加熱量を制御することにより調
節する。The top and bottom of the bottom liquid of the concentrating tower resulting from this are adjusted by controlling the heating amount of the reboiler 5 with a valve 5b which is opened and closed by a signal from a liquid level indicator controller (LIC) L1.
【0019】このように前記触媒反応筒15に導入して
含有する炭化水素類と酸素とを反応させる触媒反応工程
へ導入される前のクリプトン,キセノン含有ガス中の炭
化水素類の含有量を検出し、該検出された炭化水素類の
含有量に応じて前記触媒反応工程の反応条件(空間速
度)を、該触媒反応筒出口における炭化水素類の濃度が
0.05ppm以下になるように手動又は自動で調節す
る。Thus, the content of hydrocarbons in the krypton- and xenon-containing gas before being introduced into the catalytic reaction step in which the hydrocarbons contained in the catalytic reaction cylinder 15 and oxygen react with each other is detected. The reaction conditions (space velocity) of the catalytic reaction step depending on the detected content of hydrocarbons are set manually or so that the concentration of hydrocarbons at the outlet of the catalytic reaction tube is 0.05 ppm or less. Adjust automatically.
【0020】なお、本実施例の自動調節弁10は、前記
液柱圧を利用して送気する場合は送気量調節弁であり、
ポンプ9を使用する場合はポンプ9を循環するガス量の
調節弁である。送気量を調節された濃縮液は、次いで導
管12から触媒筒熱交換器13に入り、触媒反応筒15
の出口ガスと熱交換して略触媒反応の温度に昇温し、次
いで加熱器14で温度調節計16からの触媒反応筒15
内の検出温度に基づいた信号により、触媒反応筒15内
の反応温度が最適になるよう、すなわち、触媒反応筒1
5出口における炭化水素類の残存量が0.05ppm以
下になるように温度調節を行う。触媒反応塔15内で
は、濃縮ガスに含有する炭化水素類と酸素とを反応さ
せ、二酸化炭素及び水にする。The automatic control valve 10 of this embodiment is an air supply amount control valve when air is supplied by utilizing the liquid column pressure.
When the pump 9 is used, it is a valve for adjusting the amount of gas circulating in the pump 9. The concentrated liquid whose amount of air is adjusted then enters the catalyst tube heat exchanger 13 through the conduit 12 and the catalyst reaction tube 15
Of the catalyst reaction tube 15 from the temperature controller 16 with the heater 14 to heat up to the temperature of the catalytic reaction.
The signal based on the detected temperature in the catalyst reaction tube 15 is used to optimize the reaction temperature, that is, the catalyst reaction tube 1
The temperature is adjusted so that the residual amount of hydrocarbons at the 5th outlet is 0.05 ppm or less. In the catalytic reaction tower 15, the hydrocarbons contained in the concentrated gas are reacted with oxygen to produce carbon dioxide and water.
【0021】該触媒反応筒15には銅・クロム(CuC
r)複合触媒が所定量充填されている。触媒は白金(P
t)又はパラジウム(Pd)のような貴金属触媒でも良
い。これら金属触媒は、単独は勿論それぞれを組み合わ
せて積層充填して用いても良い。該触媒反応筒15にお
ける反応条件は、温度300〜700℃、反応温度は触
媒の寿命からみると低い程よいが、完全除去の点からは
350℃以上が良い。そして空間速度は、約1000〜
5000h-1の範囲内であれば、上記残存メタンを主と
する炭化水素類約1000ppmを0.05ppm以下
に除去し得る。The catalytic reaction tube 15 contains copper / chromium (CuC).
r) The composite catalyst is filled in a predetermined amount. The catalyst is platinum (P
It may be a noble metal catalyst such as t) or palladium (Pd). These metal catalysts may be used alone or in combination and stacked and filled. Regarding the reaction conditions in the catalytic reaction tube 15, a temperature of 300 to 700 ° C. and a lower reaction temperature are better in view of the life of the catalyst, but 350 ° C. or higher is preferable from the viewpoint of complete removal. And the space velocity is about 1000 ~
Within the range of 5000 h -1 , about 1000 ppm of hydrocarbons mainly containing the above residual methane can be removed to 0.05 ppm or less.
【0022】上記銅・クロム触媒では、温度650℃、
空間速度3600h-1で、炭化水素類は、検出限界以下
(0.05ppm)であった。With the above copper / chromium catalyst, the temperature is 650 ° C.
Hydrocarbons were below the detection limit (0.05 ppm) at a space velocity of 3600 h -1 .
【0023】触媒反応筒15、即ち炭化水素類の除去工
程を導出したガスは、前記熱交換器13に入り向流する
前記濃縮ガスと熱交換して降温し、さらに冷却器17で
冷却水により降温した後、切換え使用される吸着器18
の一方に導入され、触媒反応で生成した二酸化炭素と水
が吸着除去される。なお、吸着器18は、一方が吸着工
程の時は他方は再生工程である。再生工程は、該吸着器
内に加熱窒素ガスを導入して行う加熱再生工程と、酸素
ガスを導入して行う洗浄工程とにより行う。The catalytic reaction tube 15, that is, the gas that has been discharged from the process of removing hydrocarbons, exchanges heat with the concentrated gas that flows into the heat exchanger 13 and flows down, and is cooled by cooling water in the cooler 17. Adsorber 18 that is used after switching after cooling
The carbon dioxide and water produced by the catalytic reaction are adsorbed and removed. In addition, one of the adsorbers 18 is in the adsorption process and the other is in the regeneration process. The regeneration step is performed by a heating regeneration step performed by introducing heated nitrogen gas into the adsorber and a cleaning step performed by introducing oxygen gas.
【0024】炭化水素類の除去工程から導出した濃縮ガ
スは、前記熱交換器8で向流する濃縮塔塔底液と熱交換
して再び液化され、2分してその一方は前記炭化水素類
分析計11aにより検出測定される塔底液中の炭化水素
類の濃度又は含有する炭化水素類と酸素とを反応させる
触媒反応工程へ導入される前のクリプトン,キセノン含
有ガス中の炭化水素類の含有量を検出し、該検出された
炭化水素類の含有量に応じて開閉する調節弁21aの作
動によりその流量が調節されつつ再度前記濃縮塔3の下
部に導入され濃縮塔3の塔底液を希釈する。なお、濃縮
塔3塔底液の炭化水素類濃度の急激な変化は無いので、
上記流量の調節、即ち調節弁21aは手動でも良い。The concentrated gas derived from the step of removing hydrocarbons is liquefied again by exchanging heat with the bottom liquid of the concentrating tower flowing countercurrently in the heat exchanger 8, and one minute is divided into the above hydrocarbons. The concentration of hydrocarbons in the bottom liquid detected by the analyzer 11a or the hydrocarbons in the krypton- and xenon-containing gas before being introduced into the catalytic reaction step of reacting the contained hydrocarbons with oxygen The content of the bottom liquid of the concentration column 3 is again introduced into the lower part of the concentration column 3 while its flow rate is adjusted by the operation of the control valve 21a which opens and closes according to the detected content of the hydrocarbons. Dilute. In addition, since there is no sudden change in the concentration of hydrocarbons in the bottom liquid of the concentration tower 3,
The above-mentioned flow rate adjustment, that is, the adjustment valve 21a may be manually operated.
【0025】分岐した他方は,遮断弁21bを経て導管
20から熱交換器22で脱酸塔凝縮器25で気化して導
出したガスと熱交換して更に降温した後、脱酸素塔23
の中段に導入される。該導管20には、遮断弁21bが
設けられていて、触媒反応筒15を導出した濃縮ガス中
の残存炭化水素類濃度を炭化水素類分析計11bで検出
し、これが0.05ppmを超えた場合又は水分が露点
−70℃を超えた場合は、これが作動して脱酸素塔23
への導入を遮断する。The other branched one exchanges heat with the gas vaporized in the deoxidizing tower condenser 25 in the heat exchanger 22 from the conduit 20 through the shutoff valve 21b to further lower the temperature, and then the deoxidizing tower 23.
Introduced in the middle stage. When the conduit 20 is provided with a shutoff valve 21b, the concentration of residual hydrocarbons in the concentrated gas discharged from the catalytic reaction tube 15 is detected by the hydrocarbon analyzer 11b, and when it exceeds 0.05 ppm. Or, when the water content exceeds a dew point of −70 ° C., this operates and the deoxidation tower 23
Cut off the introduction.
【0026】脱酸素塔23は、シーブトレイ又はバブル
キャップ等の実段数で約20〜40段の精留段を備え、
塔底部にはリボイラー24が、塔頂部にはリボイラー2
4で液化した液化酸素及び前記濃縮塔リボイラー5で液
化した液化ガスを寒冷源とする凝縮器25が設けられて
いる。The deoxygenation tower 23 is equipped with a rectification stage of about 20 to 40 actual stages such as a sieve tray or a bubble cap.
The reboiler 24 is at the bottom of the tower and the reboiler 2 is at the top of the tower.
A condenser 25 is provided which uses the liquefied oxygen liquefied in 4 and the liquefied gas liquefied in the concentration tower reboiler 5 as a cold source.
【0027】上記脱酸素塔リボイラー24の加熱源とし
てのガスは、前記濃縮塔3と同様に、酸素,窒素,アル
ゴン,空気等を適宜の圧力に加圧して用いる。そして該
リボイラー24及び凝縮器25の加熱・冷却により、還
流比を0.1〜1.2程度の範囲に調節することにより
塔底液中の酸素濃度を0.5ppm以下にすることがで
きる。As the gas used as the heating source of the deoxygenation tower reboiler 24, oxygen, nitrogen, argon, air or the like is pressurized to an appropriate pressure and used as in the concentrating tower 3. By heating and cooling the reboiler 24 and the condenser 25 to adjust the reflux ratio to a range of about 0.1 to 1.2, the oxygen concentration in the bottom liquid can be 0.5 ppm or less.
【0028】また、前記導管20からのクリプトン,キ
セノン濃縮ガスの供給量の変動により該脱酸素塔23の
塔底液液面が変動するが、これは液面検出器(LIC)
L2により塔底液の液面を検出し、この信号を受けた調
節弁26aによって管26からの前記加熱ガスによるリ
ボイラー24の加熱量を調節することにより、塔底液液
面を最適範囲内に制御する。この加熱により液化したガ
スは、弁26bによる最適圧調節後、脱酸素塔凝縮器2
5に導入される。Further, the liquid level at the bottom of the deoxygenation tower 23 changes due to fluctuations in the supply amounts of the krypton and xenon enriched gas from the conduit 20, which is a liquid level detector (LIC).
The liquid level of the column bottom liquid is detected by L2, and the amount of heating of the reboiler 24 by the heating gas from the pipe 26 is adjusted by the control valve 26a receiving this signal, so that the liquid level of the column bottom liquid falls within the optimum range. Control. The gas liquefied by this heating is adjusted to the optimum pressure by the valve 26b, and then the deoxidizing tower condenser 2
Introduced in 5.
【0029】この脱酸素塔23における精留により、該
脱酸素塔23塔底部には、クリプトン90〜95%及び
キセノン5〜10%及び酸素0.5ppm以下からなる
液化ガスが分離する。By the rectification in the deoxygenation tower 23, liquefied gas consisting of 90 to 95% of krypton, 5 to 10% of xenon and 0.5 ppm or less of oxygen is separated at the bottom of the deoxygenation tower 23.
【0030】また、塔頂部にはクリプトンを10〜50
ppm含む酸素ガスが分離して管33aから導出されて
導管33より前記濃縮塔3の中段又は下段へ循環導入さ
れる。該導管33の酸素主成分ガスは複精留塔1の低圧
塔へ導入してもよい。Further, 10 to 50 krypton is provided at the top of the tower.
Oxygen gas containing ppm is separated and led out from the pipe 33a and circulated through the conduit 33 to the middle stage or the lower stage of the concentration tower 3. The oxygen-based gas in the conduit 33 may be introduced into the low pressure column of the double rectification column 1.
【0031】このようにしてクリプトン及びキセノンが
濃縮された脱酸素塔塔底液は、導管24aからクリプト
ンとキセノンとを精留分離する分離塔28の中段又は中
下段に導入される。The deoxygenating column bottoms liquid thus enriched with krypton and xenon is introduced from the conduit 24a into the middle stage or middle lower stage of the separation column 28 for rectifying and separating krypton and xenon.
【0032】また、前記濃縮塔3及び脱酸素塔23の運
転状態により、導管27から供給されるクリプトン,キ
セノン濃縮液の供給量の変動を混合液貯槽35に該混合
液を貯留することにより調整して、該濃縮液を分離塔2
8に供給する。この調整は弁27a,27b,27cを
用いて行う。また該塔底液中の酸素濃度を酸素濃度分析
計24bにより検出してその測定値が所定値を超えた場
合は、遮断弁24cにより塔底液の分離塔28への供給
を遮断する。該遮断弁24cは前記遮断弁21bの作動
にも連動して作動するようにする。Further, the fluctuation of the supply amount of the krypton / xenon concentrate supplied from the conduit 27 is adjusted by storing the mixed solution in the mixed solution storage tank 35 depending on the operating states of the concentration tower 3 and the deoxygenation tower 23. Then, the concentrate is separated into a separation tower 2
Supply to 8. This adjustment is performed using the valves 27a, 27b and 27c. When the oxygen concentration in the column bottom liquid is detected by the oxygen concentration analyzer 24b and the measured value exceeds a predetermined value, the shutoff valve 24c shuts off the supply of the column bottom liquid to the separation column 28. The shutoff valve 24c is operated in conjunction with the actuation of the shutoff valve 21b.
【0033】前記分離塔28には、その底部に塔底液を
蒸発させて上昇ガスとするリボイラー29が設けられる
とともに、頂部に液化酸素,液化窒素,液化アルゴン,
液化空気等を寒冷源として還流液を発生させる凝縮器3
0が設けられている。また、前記リボイラー29には、
前記濃縮塔3,脱酸素塔23と同様所定の温度圧力の、
例えば窒素ガスを加熱源として導入すればよい。The separating column 28 is provided with a reboiler 29 at the bottom thereof for evaporating the column bottom liquid into an ascending gas, and at the top thereof liquefied oxygen, liquefied nitrogen, liquefied argon,
Condenser 3 for generating reflux liquid using liquefied air as a cold source
0 is provided. In addition, the reboiler 29,
Like the concentration tower 3 and the deoxygenation tower 23, at a predetermined temperature and pressure,
For example, nitrogen gas may be introduced as a heating source.
【0034】分離塔28の中段に導入されたクリプトン
及びキセノンからなる混合液化ガスは、該塔における精
留により塔頂部に純度99.99%以上のクリプトンが
分離し、塔底部に純度99.99%以上のキセノンが液
状で分離する。不純物としての酸素は1ppm以下、炭
化水素類も1ppm以下である。The mixed liquefied gas consisting of krypton and xenon introduced into the middle stage of the separation column 28 separates krypton having a purity of 99.99% or more at the top of the column by rectification in the column and has a purity of 99.99 at the bottom of the column. % Or more of xenon is separated in liquid form. Oxygen as an impurity is 1 ppm or less, and hydrocarbons are also 1 ppm or less.
【0035】分離後のクリプトンは、凝縮器30の下又
は塔上部に設けた管31から、そしてキセノンは、塔底
に設けた管32からそれぞれ導出され、図示しない充填
工程に送られ、所定のガス容器に充填される。上記塔上
部に設けるクリプトン抜出管31は、塔頂から1段乃至
数段下の精留段から抜き出すようにしてもよい。The separated krypton is led out from a pipe 31 provided under the condenser 30 or at the upper part of the column, and xenon is led out from a pipe 32 provided at the bottom of the column, and sent to a filling process (not shown) to a predetermined state. Fill the gas container. The krypton withdrawal pipe 31 provided in the upper part of the column may be withdrawn from the rectification stage one to several stages below the column top.
【0036】なお、該分離塔28の塔頂部からは酸素1
〜10ppmを含むクリプトンガスを少量抜き出し,前
記導管33より脱酸素塔3の中部又は中下部へ循環導入
してクリプトンの完全回収を図る。From the tower top of the separation tower 28, oxygen 1
A small amount of krypton gas containing 10 ppm is extracted and circulated through the conduit 33 to the middle or lower part of the deoxygenation tower 3 for complete recovery of krypton.
【0037】また、前記濃縮塔3のリボイラー5で液化
した、例えば液化酸素は、脱酸素塔23及び分離塔28
の凝縮器25,30の寒冷源として使用するが、使用量
の調節が可能であるよう冷媒液化ガス貯槽36を設け
る。Further, for example, liquefied oxygen liquefied in the reboiler 5 of the concentration tower 3 is deoxidized tower 23 and separation tower 28.
It is used as a cold source for the condensers 25 and 30 of the above, but a refrigerant liquefied gas storage tank 36 is provided so that the usage amount can be adjusted.
【0038】本発明では、上記実施例に示すようにして
必要最小限の工程で液化酸素中からクリプトン及びキセ
ノンを分離するので、工程数の少ない連続一貫した工程
で繁雑な操作無しで高純度に精製したクリプトン及びキ
セノンを得ることが可能である。また、濃縮工程におけ
る炭化水素類の濃縮による危険を防止し、安全に連続運
転を行うことが可能である。In the present invention, krypton and xenon are separated from liquefied oxygen in the minimum necessary steps as shown in the above-mentioned examples, so that a high purity can be obtained without complicated operations in a continuous process with a small number of steps. It is possible to obtain purified krypton and xenon. Further, it is possible to prevent the danger due to the concentration of hydrocarbons in the concentration step and safely perform continuous operation.
【0039】[0039]
【発明の効果】以上説明したように、本発明のクリプト
ン及びキセノンの精製方法は、空気液化分離装置から導
出した液化酸素中のクリプトン及びキセノンを工程数を
低減し、連続一貫した工程で安全に効率よく、99.9
9%以上の高純度に精製することができ、これらのガス
の製造コストを大幅に低減することが可能である。Industrial Applicability As described above, the method for purifying krypton and xenon of the present invention reduces the number of steps for krypton and xenon in liquefied oxygen derived from an air liquefaction separation device, and makes them safe in a continuous and consistent process. Efficiently, 99.9
It can be purified to a high purity of 9% or more, and the production cost of these gases can be significantly reduced.
【図1】本発明方法を実施するための精製装置の一例を
示す系統図である。FIG. 1 is a system diagram showing an example of a refining device for carrying out the method of the present invention.
1…複精留塔、3…濃縮塔、5…濃縮塔リボイラー、6
…濃縮塔凝縮器塔、8…濃縮塔熱交換器、9…ラインポ
ンプ,11a,11b…炭化水素類分析計、13…触媒
塔熱交換器、14…加熱器、15…触媒反応筒、18…
吸着器、22…熱交換器、23…脱酸素塔、24…脱酸
素塔リボイラー、24b…酸素濃度分析計、25…脱酸
素塔凝縮器、26…混合液化ガス容器、27…冷媒用液
化ガス容器、28…分離塔、29…脱酸素塔リボイラ
ー、30…脱酸素塔凝縮器1 ... Double rectification tower, 3 ... Concentration tower, 5 ... Concentration tower reboiler, 6
Concentration tower condenser tower, 8 ... Concentration tower heat exchanger, 9 ... Line pumps, 11a, 11b ... Hydrocarbons analyzer, 13 ... Catalyst tower heat exchanger, 14 ... Heater, 15 ... Catalytic reaction tube, 18 …
Adsorber, 22 ... Heat exchanger, 23 ... Deoxidizing tower, 24 ... Deoxidizing tower reboiler, 24b ... Oxygen concentration analyzer, 25 ... Deoxidizing tower condenser, 26 ... Mixed liquefied gas container, 27 ... Liquefied gas for refrigerant Container, 28 ... Separation tower, 29 ... Deoxygenation tower reboiler, 30 ... Deoxygenation tower condenser
Claims (4)
トン及びキセノンを含む液化酸素からクリプトン及びキ
セノンを精製する方法において、前記液化酸素を濃縮塔
に導入して塔底液にクリプトン及びキセノンを濃縮する
工程と、該濃縮塔塔底液を気化して触媒反応筒に導入し
て含有する炭化水素類と酸素とを反応させる触媒反応工
程と、該触媒反応筒導出後のガスを吸着器に導入して触
媒反応工程で生成した水,二酸化炭素を吸着除去する吸
着工程と、該吸着工程導出後のガスを再度冷却した後2
分し、その一方を濃縮塔下部に再導入する工程と、前記
濃縮塔下部へ再導入する前記触媒反応工程後のクリプト
ン,キセノン含有ガスの導入量の制御を前記濃縮塔塔底
液中の炭化水素類の含有量又は含有する炭化水素類と酸
素とを反応させる触媒反応工程へ導入される前のクリプ
トン,キセノン含有ガス中の炭化水素類の含有量を検出
し、該検出された炭化水素類の含有量に応じて行う工程
と、前記分岐した他方を脱酸素塔に導入して精留分離を
行い、塔頂から小量のクリプトンを含む酸素ガスを導出
し、塔底にクリプトン,キセノンの混合液を留出する脱
酸素工程と、脱酸素塔塔底液を導出して分離塔に導入
し、該分離塔塔頂部からクリプトンを、塔底部からキセ
ノンをそれぞれ導出する分離工程とを順次行うことを特
徴とするクリプトン及びキセノンの精製方法。1. A method for purifying krypton and xenon from liquefied oxygen containing krypton and xenon, which is discharged from an air liquefaction separation apparatus, wherein the liquefied oxygen is introduced into a concentration column to concentrate krypton and xenon in a bottom liquid. A step, a catalytic reaction step of vaporizing the bottom liquid of the concentrating column and introducing it into the catalytic reaction tube to react the contained hydrocarbons with oxygen, and introducing the gas after the catalytic reaction tube is introduced into the adsorber. After the adsorption step of adsorbing and removing water and carbon dioxide generated in the catalytic reaction step, and after cooling the gas after the derivation of the adsorption step again 2
Separation and reintroducing one of them into the lower part of the concentrating tower and controlling the amount of the krypton- and xenon-containing gas introduced after the catalytic reaction step of reintroducing into the lower part of the concentrating tower are performed by carbonizing the bottom liquid of the concentrating tower. The content of hydrogens or the content of hydrocarbons in the gas containing krypton and xenon before being introduced into the catalytic reaction step of reacting the contained hydrocarbons with oxygen is detected, and the detected hydrocarbons The step of performing according to the content of, the other branched is introduced into the deoxygenation column for rectification separation, oxygen gas containing a small amount of krypton is derived from the top of the column, and krypton and xenon A deoxidation step of distilling the mixed liquid and a deoxidation tower bottom liquid are introduced and introduced into a separation tower, and krypton is taken out from the top of the separation tower and xenon is taken out from the tower bottom, respectively. Krypton characterized by Purification method of fine-xenon.
水素類と酸素とを反応させる触媒反応工程は、該触媒に
銅・クロム複合触媒を使用することを特徴とする請求項
1記載のクリプトン及びキセノンの精製方法。2. The catalytic reaction step of reacting the hydrocarbons introduced into the catalytic reaction tube and contained therein with oxygen uses a copper-chromium composite catalyst as the catalyst. Method for purifying krypton and xenon.
トン含有酸素ガスの一部又は全部を前記濃縮塔へ再度導
入することを特徴とする請求項1記載のクリプトン及び
キセノンの精製方法。3. The method for purifying krypton and xenon according to claim 1, wherein a part or all of the krypton-containing oxygen gas discharged from the top of the deoxygenation column is reintroduced into the concentration column.
リプトンガスの一部又は全部を前記濃縮塔へ再度導入す
ることを特徴とする請求項1記載のクリプトン及びキセ
ノンの精製方法。4. The method for purifying krypton and xenon according to claim 1, wherein a part or all of the oxygen-containing krypton gas discharged from the top of the separation column is reintroduced into the concentration column.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5289587A JPH07139876A (en) | 1993-11-18 | 1993-11-18 | Method for purifying krypton and xenon |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5289587A JPH07139876A (en) | 1993-11-18 | 1993-11-18 | Method for purifying krypton and xenon |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH07139876A true JPH07139876A (en) | 1995-06-02 |
Family
ID=17745166
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5289587A Pending JPH07139876A (en) | 1993-11-18 | 1993-11-18 | Method for purifying krypton and xenon |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07139876A (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007045702A (en) * | 2005-08-09 | 2007-02-22 | Linde Ag | Process and apparatus for producing krypton and/or xenon |
| JP2010185659A (en) * | 2002-12-12 | 2010-08-26 | Air Products & Chemicals Inc | Method and apparatus for recovering krypton and/or xenon |
| FR2950685A1 (en) * | 2009-12-17 | 2011-04-01 | Air Liquide | Apparatus for extracting xenon and krypton from air separation apparatus, has duct extracting krypton and xenon enriched liquid from tank of concentration column, and another duct transferring gas from head of column towards heat exchanger |
| JP2012007990A (en) * | 2010-06-24 | 2012-01-12 | Taiyo Nippon Sanso Corp | Liquid level meter and measurement method of liquid level, and rectifying column and operation method of rectifying column |
| JP2012042079A (en) * | 2010-08-17 | 2012-03-01 | Taiyo Nippon Sanso Corp | Air liquefaction separation device and method for operating the same |
| JP2012189254A (en) * | 2011-03-10 | 2012-10-04 | Taiyo Nippon Sanso Corp | Separation and refinement process |
| WO2011160775A3 (en) * | 2010-06-22 | 2012-10-18 | Linde Aktiengesellschaft | Process and apparatus for separation of a fluid mixture |
| CN115364659A (en) * | 2022-07-05 | 2022-11-22 | 首钢京唐钢铁联合有限责任公司 | A krypton xenon gas purification system, method, device and electronic equipment |
| US11679979B2 (en) | 2018-05-08 | 2023-06-20 | Curium Us Llc | Systems and methods for production of Xenon-133 |
-
1993
- 1993-11-18 JP JP5289587A patent/JPH07139876A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010185659A (en) * | 2002-12-12 | 2010-08-26 | Air Products & Chemicals Inc | Method and apparatus for recovering krypton and/or xenon |
| JP2007045702A (en) * | 2005-08-09 | 2007-02-22 | Linde Ag | Process and apparatus for producing krypton and/or xenon |
| FR2950685A1 (en) * | 2009-12-17 | 2011-04-01 | Air Liquide | Apparatus for extracting xenon and krypton from air separation apparatus, has duct extracting krypton and xenon enriched liquid from tank of concentration column, and another duct transferring gas from head of column towards heat exchanger |
| WO2011160775A3 (en) * | 2010-06-22 | 2012-10-18 | Linde Aktiengesellschaft | Process and apparatus for separation of a fluid mixture |
| JP2012007990A (en) * | 2010-06-24 | 2012-01-12 | Taiyo Nippon Sanso Corp | Liquid level meter and measurement method of liquid level, and rectifying column and operation method of rectifying column |
| JP2012042079A (en) * | 2010-08-17 | 2012-03-01 | Taiyo Nippon Sanso Corp | Air liquefaction separation device and method for operating the same |
| JP2012189254A (en) * | 2011-03-10 | 2012-10-04 | Taiyo Nippon Sanso Corp | Separation and refinement process |
| US11679979B2 (en) | 2018-05-08 | 2023-06-20 | Curium Us Llc | Systems and methods for production of Xenon-133 |
| CN115364659A (en) * | 2022-07-05 | 2022-11-22 | 首钢京唐钢铁联合有限责任公司 | A krypton xenon gas purification system, method, device and electronic equipment |
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