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JPH07134809A - Method of manufacturing thin film head - Google Patents

Method of manufacturing thin film head

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Publication number
JPH07134809A
JPH07134809A JP5283231A JP28323193A JPH07134809A JP H07134809 A JPH07134809 A JP H07134809A JP 5283231 A JP5283231 A JP 5283231A JP 28323193 A JP28323193 A JP 28323193A JP H07134809 A JPH07134809 A JP H07134809A
Authority
JP
Japan
Prior art keywords
thin film
substrate
protective substrate
head
substrate material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5283231A
Other languages
Japanese (ja)
Inventor
Seijiro Okada
誠治郎 岡田
Kunio Makino
邦夫 牧野
Yukio Kodama
幸雄 児玉
Hiroshi Fujimori
洋 藤盛
Koichi Sakai
公一 坂井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP5283231A priority Critical patent/JPH07134809A/en
Publication of JPH07134809A publication Critical patent/JPH07134809A/en
Pending legal-status Critical Current

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Abstract

(57)【要約】 【目的】 生産性が良くかつ加工精度良好な薄膜ヘッド
の製造方法を提供することを目的としてなされたもので
ある。 【構成】 基板1上に薄膜2と電極部3を構成して前記
薄膜部を保護基板4によって覆うようにした薄膜ヘッド
の製造方法であって、1個分のヘッドに相当する薄膜2
と電極部3の構成を一組とするパターンPを縦横に多数
配列した基板1aと、この基板1aと同サイズで前記各
電極部3に対向する部分に溝7が一定のピッチで形成さ
れた保護基板材4aとを準備し、前記基板1aの表面上
に保護基板材4aの溝7が前記電極部3に対向するよう
に接着し、この接着後前記保護基板材4aの表面側より
前記溝7の深さまで平面研削し、次に基板1の薄膜2側
が端面となるように縦列方向の複数個のヘッドを一体と
して縦列切断し、その後横列切断して個々のヘッドに切
り分け、個々の薄膜ヘッドHとする。
(57) [Summary] [Purpose] The present invention has been made for the purpose of providing a method for manufacturing a thin film head having high productivity and good processing accuracy. A method of manufacturing a thin film head in which a thin film 2 and an electrode portion 3 are formed on a substrate 1 and the thin film portion is covered with a protective substrate 4, and the thin film 2 corresponds to one head.
And a substrate 1a in which a large number of patterns P each having a configuration of the electrode portion 3 are arranged vertically and horizontally, and grooves 7 are formed at a constant pitch in a portion of the same size as the substrate 1a and facing each electrode portion 3. A protective substrate material 4a is prepared, and a groove 7 of the protective substrate material 4a is adhered on the surface of the substrate 1a so as to face the electrode portion 3. After this adhesion, the groove is formed from the surface side of the protective substrate material 4a. 7. The surface is ground to a depth of 7, and then a plurality of heads in the column direction are integrally cut in tandem so that the thin film 2 side of the substrate 1 becomes the end face, and then cut in rows to cut into individual heads. Let H.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、ハードディスクドライ
ブ(HDD)、ディジタルコンパクトカセット(DC
C)等に用いる薄膜ヘッドの製造方法に関するものであ
る。
BACKGROUND OF THE INVENTION The present invention relates to a hard disk drive (HDD), a digital compact cassette (DC).
The present invention relates to a method of manufacturing a thin film head used in C) and the like.

【0002】[0002]

【従来の技術】近年、パーソナルコンピュータの記録装
置としてハードディスクドライブ(HDD)は広く普及
し、またテープメディアのディジタルコンパクトカセッ
ト(DCC)が従来のアナログカセットに置き変わろう
としている。両者の記録読み取りディバイスとして用い
られるのが高密度の薄膜ヘッドである。薄膜ヘッドは通
常直径3インチから6インチの丸型または角型の基板の
表面上に数百個から数千個同時に形成し、後で個々のヘ
ッドに切り分けて1個のヘッドを完成させる。
2. Description of the Related Art In recent years, a hard disk drive (HDD) has become widespread as a recording device of a personal computer, and a digital compact cassette (DCC) of tape media is about to be replaced with a conventional analog cassette. A high-density thin film head is used as a recording / reading device for both. Thin film heads are usually formed on a surface of a round or square substrate having a diameter of 3 to 6 inches at the same time, and hundreds to thousands are formed at the same time. Then, the heads are cut into individual heads to complete one head.

【0003】以下図面を参照しながら、上述した従来の
薄膜ヘッドの製造方法の一例について説明する。
An example of a conventional method of manufacturing the above-mentioned thin film head will be described below with reference to the drawings.

【0004】図7は従来のディジタルコンパクトカセッ
ト(DCC)等に用いる薄膜ヘッドの製造方法を示すも
のである。図7において、(a)図の9はその表面上に
多数の薄膜を形成した角形の基板であり、この基板9を
点線で示すようにダイシングソー等でまず短冊状の基板
10として切り出し、(b)図に示すように、その短冊
状の基板10上に、同じく短冊状でかつ電極部を露出す
る幅を有する保護基板材11を接着する。次に、同
(b)図に点線で示すように、テープ接触面を円筒研磨
し、(c)図に示すような曲面を有する複数個縦列のヘ
ッド材12とし、これを同図に示す点線に沿って切断す
ることにより、図(d)に示すような1個のヘッドチッ
プ13に切り出して完成させる。そして、基板13a上
の保護基板13bから露出した電極部(図示せず)にフ
レキシブルプリント基板14を接続するものである。
FIG. 7 shows a method of manufacturing a thin film head used in a conventional digital compact cassette (DCC) or the like. In FIG. 7, reference numeral 9 in (a) of FIG. 7 is a rectangular substrate having a large number of thin films formed on its surface. This substrate 9 is first cut out as a strip-shaped substrate 10 with a dicing saw or the like as shown by a dotted line. b) As shown in the figure, a protective substrate material 11 having the same strip shape and having a width exposing the electrode portion is adhered onto the strip substrate 10. Next, as shown by the dotted line in the same figure (b), the tape contact surface is cylindrically polished to form a plurality of columns of head material 12 having a curved surface as shown in the figure (c), and this is shown by the dotted line in the same figure. The head chip 13 as shown in FIG. 3D is completed by cutting along the line. The flexible printed board 14 is connected to the electrode portion (not shown) exposed from the protective board 13b on the board 13a.

【0005】[0005]

【発明が解決しようとする課題】しかしながら前記のよ
うな従来の薄膜ヘッドの製造方法は、短冊状の基板ごと
に保護基板材を接着しなければならず、一枚の基板から
の加工に多大の時間を要した。またチップサイズが微小
化するに伴い、保護基板材を精度よく短冊状の基板に接
着するのが困難になるという問題点を有していた。
However, in the conventional method of manufacturing a thin film head as described above, a protective substrate material has to be adhered to each of the strip-shaped substrates, which is very difficult to process from one substrate. It took time. Further, as the chip size becomes smaller, it becomes difficult to bond the protective substrate material to the strip-shaped substrate with high accuracy.

【0006】本発明は、前記従来の問題点に鑑み、生産
性が良くかつ加工精度良好な薄膜ヘッドの製造方法を提
供することを目的としてなされたものである。
The present invention has been made in view of the above problems, and an object thereof is to provide a method of manufacturing a thin film head having high productivity and good processing accuracy.

【0007】[0007]

【課題を解決するための手段】前記従来の課題を解決す
るために本発明の薄膜ヘッドの製造方法は、基板上に薄
膜磁気ヘッド用の薄膜と電気接続用の電極部を構成して
前記薄膜部を保護基板によって覆うようにした薄膜ヘッ
ドの製造方法であって、1個分のヘッドに相当する薄膜
と電気接続のための電極部の構成を一組とするパターン
を縦横に多数配列した基板と、この基板と同サイズで前
記各電極部に対向する縦列方向部分に空隙を形成するよ
うその断面が櫛歯状の溝が一定のピッチで形成された保
護基板材とを準備し、前記基板のパターンを配列した側
の表面上に保護基板材の溝を形成した面の当該溝が前記
電極部に対向するように接着し、この接着後前記保護基
板材の表面側より前記溝の深さまで平面研削し、次に基
板の薄膜側が端面となるように縦列方向の複数個のヘッ
ドを一体として列切断し、その後横列切断して個々のヘ
ッドに切り分け、個々の薄膜ヘッドとするものである。
In order to solve the above-mentioned conventional problems, a method of manufacturing a thin film head according to the present invention comprises forming a thin film for a thin film magnetic head and an electrode portion for electrical connection on a substrate to form the thin film. A method of manufacturing a thin film head in which a portion is covered with a protective substrate, wherein a plurality of thin and long patterns corresponding to one head and a set of electrode portions for electrical connection are arranged vertically and horizontally. And a protective substrate material of the same size as this substrate, in which grooves having comb-shaped cross sections are formed at a constant pitch so as to form voids in the column-direction portions facing the respective electrode parts, The surface of the side where the pattern is arranged is adhered so that the groove of the surface on which the groove of the protective substrate material is formed faces the electrode portion, and after this adhesion, from the surface side of the protective substrate material to the depth of the groove. Surface grinding, then the thin film side of the substrate is the end face And column cleaved integrally tandem direction of the plurality of heads such that, cut into individual heads and then row cut, it is an individual thin film head.

【0008】[0008]

【作用】本発明は前記した方法によって、保護基板材を
一括して基板上に接着することにより生産性と加工精度
が著しく向上することとなる。
According to the present invention, the productivity and processing accuracy are remarkably improved by collectively adhering the protective substrate material onto the substrate by the above-mentioned method.

【0009】[0009]

【実施例】以下本発明による薄膜ヘッドの製造方法の実
施例について、図1〜図6を参照しながら詳細に説明す
る。
Embodiments of the method of manufacturing a thin film head according to the present invention will be described in detail below with reference to FIGS.

【0010】本発明は、図3に示すような1個の薄膜ヘ
ッドH、すなわち、基板1上に薄膜磁気ヘッド用の薄膜
2と、電気接続用の電極部3を構成して、前記薄膜部2
を保護基板4によって覆うようにした薄膜ヘッドHの製
造方法である。同図において、5は前記電極部3に接続
されたフレキシブルプリント基板であり、当該ヘッドH
より信号を授受するもので、ワイヤボンディング等によ
り接続されている。このように構成された薄膜ヘッドH
の本発明による製造方法について、以下説明する。
According to the present invention, one thin film head H as shown in FIG. 3, that is, a thin film 2 for a thin film magnetic head and an electrode part 3 for electrical connection are formed on a substrate 1, and the thin film part is formed. Two
Is a method of manufacturing the thin film head H in which the protective substrate 4 is covered. In the figure, 5 is a flexible printed circuit board connected to the electrode portion 3, and the head H
It transmits and receives more signals and is connected by wire bonding or the like. The thin film head H configured in this way
The manufacturing method according to the present invention will be described below.

【0011】図1はその製造方法の過程を示しており、
同図において、図(a)に示す1aは前記基板1の素材
である基板であり、その表面には1個分のヘッドに相当
する前述した薄膜2と電気接続のための電極部3の構成
を一組とするパターンPを縦横に多数配列している。前
記パターンPは、図2に示すように、1つのパターンP
上下左右のパターンP1〜P4と連続して形成(一部パ
ターンを省略)され、ここでは便宜上上下方向を縦列方
向としておく。X,Yは前記それぞれのパターンP〜P
4部分が最終1個の薄膜ヘッドHとして形成される際の
縦列及び横列の切断線であるが、この線X,Yは実際に
は印されているものではなく、端部等に印されたマーカ
により行うものである。
FIG. 1 shows the steps of the manufacturing method,
In the figure, reference numeral 1a shown in FIG. 1 (a) is a substrate which is a material of the substrate 1, and the surface thereof has a structure of the above-mentioned thin film 2 corresponding to one head and an electrode portion 3 for electrical connection. A large number of patterns P, each of which is a set, are arranged vertically and horizontally. As shown in FIG. 2, the pattern P is one pattern P.
It is formed continuously with the upper, lower, left and right patterns P1 to P4 (a part of the pattern is omitted), and here, the upper and lower directions are defined as the column direction for convenience. X and Y are the respective patterns P to P
The four parts are the cutting lines of the vertical and horizontal rows when the thin film head H is finally formed, but these lines X and Y are not actually marked, but are marked at the end or the like. This is done with a marker.

【0012】一方、図(b)に示す4aは前記保護基板
4の素材である保護基板材で、前記基板1aと同サイズ
であり、図(c)に示すようにその一方の表面にスライ
サー6により、一定のピッチで同一深さの多数の溝7を
形成し、その断面が櫛歯状となる歯7aを形成してい
る。ここで、溝7のピッチは、前記基板1a上のパター
ンPの縦列方向のピッチと同一である。本発明の薄膜ヘ
ッドの製造方では、このような基板1aと、保護基板材
4aとを予め準備しておくものである。
On the other hand, reference numeral 4a shown in FIG. 2 (b) is a protective substrate material which is a material of the protective substrate 4 and has the same size as the substrate 1a. As shown in FIG. 2 (c), a slicer 6 is provided on one surface thereof. Thus, a large number of grooves 7 having the same depth are formed at a constant pitch, and teeth 7a having a comb-shaped cross section are formed. Here, the pitch of the grooves 7 is the same as the pitch of the patterns P on the substrate 1a in the column direction. In the method of manufacturing the thin film head of the present invention, such a substrate 1a and the protective substrate material 4a are prepared in advance.

【0013】次に、図1の(d)に示すように、前記基
板1aのパターンPを配列した側の表面上に、保護基板
材4aの溝7を形成した面の当該溝7が前記電極部3に
対向し、保護基板材4aの溝7間に形成される歯7aに
より薄膜2部分を覆うように、縦列方向を位置合わせし
て密着させて接着する。その接着状態では、前記各電極
部3に対向する位置の縦列方向部分に空隙が形成されて
おり、このように接着した状態が図(e)に示すもので
ある。
Next, as shown in FIG. 1D, on the surface of the substrate 1a on which the patterns P are arranged, the groove 7 of the surface on which the groove 7 of the protective substrate material 4a is formed is the electrode. The thin film 2 portion is opposed to the portion 3 by the teeth 7a formed between the grooves 7 of the protective substrate material 4a so that the thin film 2 portion is aligned in the column direction so that the thin film 2 portion is closely attached. In the bonded state, voids are formed in the column-direction portions at the positions facing the electrode portions 3, and the bonded state is shown in FIG.

【0014】次に、接着剤が硬化完了後、この(e)図
の状態で、保護基板材4aの上面側より平面研削し、同
図に点線D−Dで示す位置まで削り込むことにより、保
護基板材4aは歯7a部分のみが基板1a上に残ること
となる。次に、図(f)に示すように、基板1a上に保
護基板材4aの歯7aのみが残されたものを、図2によ
り前述した縦列の切断線Xに沿って、ダイシングソーま
たはワイヤーソー等で列切断する。
Next, after the adhesive is completely hardened, in the state shown in FIG. 6E, the surface of the protective substrate 4a is ground from the upper surface side, and the surface is ground to the position shown by the dotted line D-D in FIG. Only the teeth 7a of the protective substrate material 4a will remain on the substrate 1a. Next, as shown in FIG. 2F, a substrate 1a in which only the teeth 7a of the protective substrate material 4a are left is removed along the cutting line X in the column described above with reference to FIG. Cut the column with etc.

【0015】図(g)は縦列切断された1本の短冊上の
チップ列を示し、このとき基板1b及び保護基板4bは
角ばっており、この状態で、ディジタルコンパクトカセ
ット用ヘッドでは、同図に示すようにチップ列の薄膜側
端面であるテープ接触面を円筒研磨することにより、図
(h)に示す曲面をもった基板1c及び保護基板4cの
形状に加工する。そして、最後に前述の横列切断線Yに
沿う線y部分で切断することにより、図(i)に示すよ
うに1個ずつのチップ状の薄膜ヘッドHを完成させるこ
ととなる。
FIG. 3G shows a chip array on one strip cut in a column, and at this time, the substrate 1b and the protective substrate 4b are angular, and in this state, in the head for the digital compact cassette, FIG. As shown in FIG. 3C, the tape contact surface, which is the thin film side end surface of the chip array, is cylindrically polished to form the curved substrate 1c and protective substrate 4c shown in FIG. Then, finally, by cutting along the line y portion along the row cutting line Y, one chip-shaped thin film head H is completed as shown in FIG.

【0016】以上のように本実施例によれば、保護基板
材4aを基板1aの1枚分を一気に接着でき、短冊状の
数チップごとの列の保護基板材を接着する従来の方式と
比較し、生産性は著しく向上する。さらに、チップサイ
ズが例えば1ミリメータ程度に微細化した場合、保護基
板材を精度良く接着するのが非常に困難となり、作業の
バラツキが製品に出ることもありえるが、本実施例によ
れば基板と保護基板材の水平方向の位置合わせのみ正確
にすれば、基板1a上の全チップの保護基板材の取り付
け精度と接着剤の厚みを均一にでき、製品の品質を安定
することができるものである。
As described above, according to this embodiment, the protective substrate material 4a can be bonded to one substrate 1a at a time, and a comparison can be made with the conventional method in which a strip-shaped protective substrate material of several chips is bonded. However, productivity is significantly improved. Further, when the chip size is miniaturized to, for example, about 1 mm, it becomes very difficult to adhere the protective substrate material with high precision, and variations in work may occur in the product. If only the horizontal alignment of the protective substrate material is made accurate, the mounting precision of the protective substrate material of all the chips on the substrate 1a and the thickness of the adhesive can be made uniform, and the product quality can be stabilized. .

【0017】次に、他の実施例について、図4〜図6に
基づき説明する。まず、図4においては、基板1a及び
保護基板材4aが、角型で同一の寸法の場合である。
Next, another embodiment will be described with reference to FIGS. First, in FIG. 4, the substrate 1a and the protective substrate material 4a are square and have the same size.

【0018】また、図5は、保護基板材4aを基板1a
の最外周部から1個のヘッド分だけ内側部分のサイズに
したものを接着したものであるが、この場合、一般に半
導体集積回路と同じく基板1aの最外周部は装置への取
り付けのための無効部分であったり、また性能が安定せ
ず加工時に捨てられる部分であり、このようにすれば高
価な保護基板材4aを節約できるメリットがある。ま
た、同時に保護基板材4aを精度良く位置合わせするに
も、基板1aにおいてヘッド1個分内側に保護基板材4
aを接着するほうが加工上のメリットは大きい。
Further, in FIG. 5, the protective substrate material 4a is replaced with the substrate 1a.
In this case, one head having a size corresponding to one head is bonded to the outermost peripheral portion of the substrate 1a. In this case, the outermost peripheral portion of the substrate 1a is generally invalid for attachment to the device, like the semiconductor integrated circuit. It is a part or a part which is not stable in performance and is discarded at the time of processing. By doing so, there is an advantage that the expensive protective substrate material 4a can be saved. In addition, at the same time, in order to accurately align the protective substrate material 4a, the protective substrate material 4 is placed inside one head on the substrate 1a.
Bonding a has a greater processing advantage.

【0019】また、図6は、丸型の基板1aに角型の保
護基板材4aを接着する場合の例である。丸型の基板1
a上に薄膜ヘッドを形成する場合、外周部はすべて捨て
られることになり、最終的に加工完成される中央部のサ
イズに匹敵するサイズの保護基板材4aを接着するもの
である。
Further, FIG. 6 shows an example in which a rectangular protective substrate material 4a is bonded to a round substrate 1a. Round board 1
When the thin film head is formed on a, the entire outer peripheral portion is discarded, and the protective substrate material 4a having a size comparable to the size of the central portion to be finally processed is adhered.

【0020】[0020]

【発明の効果】以上のように本発明は、保護基板材を基
板の1枚分を一気に接着でき、短冊状の数チップごとの
列の保護基板材を接着する従来の方式と比較し、生産性
は著しく向上する。さらに、チップサイズが例えば1ミ
リメータ程度に微細化した場合、保護基板材を精度良く
接着するのが非常に困難となり、作業のバラツキが製品
に出ることもありえるが、本実施例によれば基板と保護
基板材の水平方向の位置合わせのみ正確にすれば、基板
1a上の全チップの保護基板材の取り付け精度と接着剤
の厚みを均一にでき、製品の品質を安定することができ
るものであり、非常に有効な発明である。
INDUSTRIAL APPLICABILITY As described above, according to the present invention, the protective substrate material can be bonded to one substrate at a stretch, and compared with the conventional method of bonding the protective substrate material in strips of several chips in rows. Sex is significantly improved. Further, when the chip size is miniaturized to, for example, about 1 mm, it becomes very difficult to adhere the protective substrate material with high precision, and variations in work may occur in the product. If only the horizontal alignment of the protective substrate material is accurate, the mounting precision of the protective substrate material of all the chips on the substrate 1a and the thickness of the adhesive can be made uniform, and the product quality can be stabilized. , A very effective invention.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1の実施例における薄膜ヘッドの製
造法を示す過程説明図
FIG. 1 is an explanatory process diagram showing a method of manufacturing a thin film head in a first embodiment of the invention.

【図2】同薄膜ヘッドの薄膜部のマスクのパターン図FIG. 2 is a pattern diagram of a mask of a thin film portion of the thin film head.

【図3】同方法により製造される薄膜ヘッドの一部を破
断して示す外観斜視図
FIG. 3 is an external perspective view showing a partially cutaway thin film head manufactured by the same method.

【図4】第2の実施例の素材基板及び保護基板材の斜視
FIG. 4 is a perspective view of a material substrate and a protective substrate material according to a second embodiment.

【図5】第3の実施例の素材基板及び保護基板材の斜視
FIG. 5 is a perspective view of a material substrate and a protective substrate material according to a third embodiment.

【図6】第4の実施例の素材基板及び保護基板材の平面
FIG. 6 is a plan view of a material substrate and a protective substrate material according to a fourth embodiment.

【図7】従来の薄膜ヘッドの製造法を示す過程説明図FIG. 7 is a process explanatory view showing a conventional method of manufacturing a thin film head.

【符号の説明】[Explanation of symbols]

1,1a 基板 2 薄膜 3 電極部 4 保護基板 4a 保護基板材 7 溝 H 薄膜ヘッド P パターン 1, 1a Substrate 2 Thin film 3 Electrode part 4 Protective substrate 4a Protective substrate material 7 Groove H Thin film head P pattern

───────────────────────────────────────────────────── フロントページの続き (72)発明者 藤盛 洋 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 坂井 公一 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hiroshi Fujimori 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. (72) Koichi Sakai, 1006 Kadoma, Kadoma City, Osaka Matsushita Electric Industrial Co., Ltd.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 基板上に薄膜磁気ヘッド用の薄膜と電気
接続用の電極部を構成して前記薄膜部を保護基板によっ
て覆うようにした薄膜ヘッドの製造方法であって、1個
分のヘッドに相当する薄膜と電気接続のための電極部の
構成を一組とするパターンを縦横に多数配列した基板
と、この基板と同サイズで前記各電極部に対向する縦列
方向部分に空隙を形成するようその断面が櫛歯状の溝が
一定のピッチで形成された保護基板材とを準備し、前記
基板のパターンを配列した側の表面上に保護基板材の溝
を形成した面の当該溝が前記電極部に対向するように接
着し、この接着後前記保護基板材の表面側より前記溝の
深さまで平面研削し、次に基板の薄膜側が端面となるよ
うに縦列方向の複数個のヘッドを一体として列切断し、
その後横列切断して個々のヘッドに切り分け、個々の薄
膜ヘッドとすることを特徴とする薄膜ヘッドの製造方
法。
1. A method of manufacturing a thin film head, wherein a thin film for a thin film magnetic head and an electrode portion for electrical connection are formed on a substrate, and the thin film portion is covered with a protective substrate. A substrate on which a large number of vertical and horizontal patterns each having a set of a thin film and an electrode portion for electrical connection are arranged, and voids are formed in a column direction portion having the same size as the substrate and facing each electrode portion. A protective substrate material having grooves with a comb-like cross section formed at a constant pitch, and the grooves on the surface of the substrate on which the patterns of the protective substrate material are formed are Bonding so as to face the electrode portion, and after this bonding, surface grinding is performed from the surface side of the protective substrate material to the depth of the groove, and then a plurality of heads in the column direction are formed so that the thin film side of the substrate is the end surface. Cut the row as one,
Then, a method for manufacturing a thin film head is characterized in that the thin film head is cut in rows and cut into individual thin film heads.
【請求項2】 保護基板材料の形状を基板の形状と異な
らせたことを特徴とする請求項1記載の薄膜ヘッドの製
造方法。
2. The method of manufacturing a thin film head according to claim 1, wherein the shape of the protective substrate material is different from the shape of the substrate.
【請求項3】 縦列方向の列切断後、ヘッド表面となる
端面側より基板と保護基板を同時に円筒研磨して、所定
のテープ接触面を形成することを特徴とする請求項1記
載の薄膜ヘッドの製造方法。
3. The thin-film head according to claim 1, wherein after the row is cut in the longitudinal direction, the substrate and the protective substrate are simultaneously cylindrically polished from the end surface side which is the head surface to form a predetermined tape contact surface. Manufacturing method.
JP5283231A 1993-11-12 1993-11-12 Method of manufacturing thin film head Pending JPH07134809A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5283231A JPH07134809A (en) 1993-11-12 1993-11-12 Method of manufacturing thin film head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5283231A JPH07134809A (en) 1993-11-12 1993-11-12 Method of manufacturing thin film head

Publications (1)

Publication Number Publication Date
JPH07134809A true JPH07134809A (en) 1995-05-23

Family

ID=17662791

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5283231A Pending JPH07134809A (en) 1993-11-12 1993-11-12 Method of manufacturing thin film head

Country Status (1)

Country Link
JP (1) JPH07134809A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015085431A (en) * 2013-10-30 2015-05-07 京セラ株式会社 Grinding wheel, and grinding method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015085431A (en) * 2013-10-30 2015-05-07 京セラ株式会社 Grinding wheel, and grinding method

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