JPH07109814B2 - Method for manufacturing electrode foil for aluminum electrolytic capacitor - Google Patents
Method for manufacturing electrode foil for aluminum electrolytic capacitorInfo
- Publication number
- JPH07109814B2 JPH07109814B2 JP2326360A JP32636090A JPH07109814B2 JP H07109814 B2 JPH07109814 B2 JP H07109814B2 JP 2326360 A JP2326360 A JP 2326360A JP 32636090 A JP32636090 A JP 32636090A JP H07109814 B2 JPH07109814 B2 JP H07109814B2
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- boric acid
- foil
- minutes
- chemical conversion
- voltage
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Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明はアルミニウム電解コンデンサ用電極箔の製造方
法に関するものである。TECHNICAL FIELD The present invention relates to a method for manufacturing an electrode foil for an aluminum electrolytic capacitor.
一般に、この種の電極箔は次のようにして製造されてい
る。まず、エッチングされたアルミニウム箔を用意し、
このアルミニウム箔を燐酸や硼酸等の水溶液に浸漬し、
一定の電圧を印加して陽極酸化処理（化成処理）を行な
い、所望の厚さの酸化皮膜を生成させる。そして、酸ま
たはアルカリ水溶液中に浸漬する減極処理および数100
℃の高温雰囲気中に数分間放置する熱処理工程を行な
う。これら化成処理、減極処理、熱処理は、通常数回繰
り返される。Generally, this kind of electrode foil is manufactured as follows. First, prepare the etched aluminum foil,
Immerse this aluminum foil in an aqueous solution of phosphoric acid or boric acid,
Anodizing treatment (chemical conversion treatment) is performed by applying a constant voltage to form an oxide film having a desired thickness. Then, depolarization treatment by immersing in acid or alkaline aqueous solution and several hundred
A heat treatment step of leaving it in a high temperature atmosphere of ° C for several minutes is performed. These chemical conversion treatment, depolarization treatment and heat treatment are usually repeated several times.
しかしながら、この方法では静電容量を高めるのに限度
があり、最近とみに要望されているより一層の小形かつ
高容量に応えることができない。However, this method has a limit to increase the electrostatic capacity, and cannot meet the demand for smaller size and higher capacity recently.
本発明はこのような事情に鑑みなされたもので、より高
い静電容量が得られることができるようにしたアルミニ
ウム電解コンデンサ用電極箔の製造方法を提供すること
にある。The present invention has been made in view of the above circumstances, and an object thereof is to provide a method for manufacturing an electrode foil for an aluminum electrolytic capacitor, which is capable of obtaining a higher capacitance.
上記した目的を達成するため、本発明においては、まず
エッチングされたアルミニウム箔を高温の純水中に所定
時間浸漬したのち、本化成および再化成を行なうにあた
って、そのいずれの工程においても、少なくとも一回は
脂肪族飽和ジカルボン酸またはその塩を含有する硼酸水
溶液中で化成することを特徴としている。In order to achieve the above-mentioned object, in the present invention, first, the etched aluminum foil is immersed in high temperature pure water for a predetermined time, and then the main formation and re-formation are performed, and at least one of the steps is performed. It is characterized in that it is formed in an aqueous boric acid solution containing an aliphatic saturated dicarboxylic acid or its salt.
すなわち、本化成工程および再化成工程において、例え
ば最初にアルミニウム箔を硼酸水溶液中に浸漬し、所定
時間電圧を印加して第１の陽極酸化（本化成処理）を行
ない、必要に応じて減極処理を行なった後、引き続きそ
のアルミニウム箔を脂肪族飽和ジカルボン酸またはその
塩を含有する硼酸水溶液中に浸漬し、所定時間電圧を印
加して第２の陽極酸化（再化成処理）を行なう。これと
は反対にこの第１の陽極酸化工程と第２の陽極酸化工程
とを入れ替えてもよい。That is, in the main chemical conversion step and the re-chemical conversion step, for example, the aluminum foil is first immersed in a boric acid aqueous solution, a voltage is applied for a predetermined time to perform a first anodic oxidation (main chemical conversion treatment), and depolarization is performed as necessary. After the treatment, the aluminum foil is subsequently immersed in an aqueous solution of boric acid containing an aliphatic saturated dicarboxylic acid or its salt, and a voltage is applied for a predetermined time to carry out a second anodization (reformation treatment). On the contrary, the first anodizing step and the second anodizing step may be interchanged.
本化成処理および再化成処理は、それぞれ液組成、電圧
印加時間などの条件を代えた複数の陽極酸化処理であっ
てもよい。The main chemical conversion treatment and the re-chemical conversion treatment may be a plurality of anodizing treatments in which conditions such as liquid composition and voltage application time are changed.
この場合、脂肪族飽和ジカルボン酸としては、 XOOC−（CH2）ｎ−COOX の化学式（但し、ＸはH+またはNH4 +,n＝１〜12好ましく
はｎ＝１〜８）で表わされ、その代表例としては、コハ
ク酸、グルタル酸、アジピン酸、ピメリン酸、スベリン
酸、アゼライン酸、セバシン酸などがある。In this case, the aliphatic saturated dicarboxylic acid, XOOC- (CH 2) n -COOX formula (wherein, X is H + or NH 4 +, n = 1~12 preferably n = 1 to 8) Table with Typical examples thereof include succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid and sebacic acid.
本発明においては、脂肪族飽和ジカルボン酸またはその
塩に代えて、その前駆体を適宜用いてもよい。この場合
の前駆体としては、酸アミド、エステル、酸無水物など
が例示される。In the present invention, a precursor thereof may be appropriately used instead of the aliphatic saturated dicarboxylic acid or its salt. Examples of the precursor in this case include acid amide, ester, and acid anhydride.
上記脂肪族飽和ジカルボン酸もしくはその塩を含有する
硼酸水溶液のpHは３〜９、好ましくは4.57に設定され
る。この硼酸水溶液中における脂肪族飽和ジカルボン酸
の濃度は0.002〜1.0％、液温は70〜100℃が好適であ
る。また、硼酸の濃度は、0.5〜10wt％が好ましい。The pH of the aqueous boric acid solution containing the aliphatic saturated dicarboxylic acid or its salt is set to 3 to 9, preferably 4.57. The concentration of the saturated aliphatic dicarboxylic acid in this boric acid aqueous solution is preferably 0.002 to 1.0%, and the liquid temperature is preferably 70 to 100 ° C. Further, the concentration of boric acid is preferably 0.5 to 10 wt%.
上記陽極酸化工程後に、減極処理、熱処理および再陽極
酸化処理が少なくとも１回実施される。その場合、再陽
極酸化処理には本化成と同様、脂肪族飽和ジカルボン酸
またはその塩を含有する硼酸水溶液が用いられるのであ
るが、これによれば、従来法に比べて静電容量が約５〜
10％以上増大する。なお、減極処理にはpH7〜９で液温5
0〜90℃のアンモニア水（濃度0.001〜0.2wt％）、また
はpH4〜８の燐酸水溶液（濃度0.1〜8wt％）などが用い
られ、その浸漬時間は１〜５分間であることが好まし
い。After the anodizing step, depolarization treatment, heat treatment and re-anodizing treatment are performed at least once. In that case, an aqueous boric acid solution containing an aliphatic saturated dicarboxylic acid or a salt thereof is used for the re-anodizing treatment as in the case of the present chemical conversion. According to this, the electrostatic capacity is about 5 compared with the conventional method. ~
Increase by 10% or more. For depolarization treatment, pH 7-9 and liquid temperature 5
Ammonia water at 0 to 90 ° C. (concentration 0.001 to 0.2 wt%) or phosphoric acid aqueous solution at pH 4 to 8 (concentration 0.1 to 8 wt%) is used, and the immersion time is preferably 1 to 5 minutes.
〔実施例１〕 （Ａ）純度99.99％で厚さ100μｍのアルミニウムエッチ
ング箔を用意した。この場合、そのエッチング倍率はエ
ッチングしていない平坦（プレーン）箔に対して20倍で
ある。Example 1 (A) An aluminum etching foil having a purity of 99.99% and a thickness of 100 μm was prepared. In this case, the etching magnification is 20 times that of a non-etched flat foil.
（Ｂ）このアルミニウムエッチング箔を液温98℃以上の
純水中で15分間ボイル処理した。(B) This aluminum etching foil was boiled for 15 minutes in pure water having a liquid temperature of 98 ° C. or higher.
（Ｃ）次に、純水１に硼酸20gおよびコハク酸アンモ
ニウムを0.1g添加した液温85℃の硼酸水溶液中にアルミ
ニウムエッチング箔を浸漬し、電流密度10mA/cm2の電流
を流し、化成電圧200Vまで上昇させ、同電圧を10分間印
加して第１の本化成を行なった。(C) Next, the aluminum etching foil was immersed in a boric acid aqueous solution having a liquid temperature of 85 ° C. in which 20 g of boric acid and 0.1 g of ammonium succinate were added to pure water 1, and a current having a current density of 10 mA / cm 2 was applied to form the formation voltage. The voltage was increased to 200 V and the same voltage was applied for 10 minutes to perform the first main chemical conversion.
（Ｄ）引き続き、同アルミニウムエッチング箔を純水１
に硼酸を20gおよび硼酸アンモニウムを0.5g添加した
液温85℃の硼酸水溶液中に浸漬し、電流密度10mA/cm2の
電流を流し、化成電圧400Vまで上昇させ、同電圧を10分
間印加して第２の本化成を行なった。(D) Subsequently, the same aluminum etching foil was replaced with pure water 1
Immersed in a boric acid aqueous solution at a liquid temperature of 85 ° C with 20 g of boric acid and 0.5 g of ammonium borate added, a current density of 10 mA / cm 2 was applied, the formation voltage was raised to 400 V, and the same voltage was applied for 10 minutes. The second main chemical conversion was performed.
（Ｅ）さらに、第３の本化成として、同アルミニウムエ
ッチング箔を純水１に硼酸を20gおよび硼酸アンモニ
ウムを0.5g添加した液温85℃の硼酸水溶液中に浸漬し、
電流密度10mA/cm2の電流を流し、化成電圧600Vまで上昇
させ、同電圧を40分間印加した。(E) Further, as a third main chemical conversion, the aluminum etching foil was immersed in pure water 1 in a boric acid aqueous solution at a liquid temperature of 85 ° C. in which 20 g of boric acid and 0.5 g of ammonium borate were added,
A current having a current density of 10 mA / cm 2 was passed to raise the formation voltage to 600 V, and the same voltage was applied for 40 minutes.
（Ｆ）化成後のアルミニウムエッチング箔を液温70℃、
pH7〜９に調整したアンモニア水に３分間浸漬し、減極
処理を行なった。(F) The aluminum etching foil after chemical conversion has a liquid temperature of 70 ° C,
Depolarization treatment was carried out by immersing in ammonia water adjusted to pH 7 to 9 for 3 minutes.
（Ｇ）500℃の加熱雰囲気中で２分間熱処理した。(G) Heat treatment was performed for 2 minutes in a heating atmosphere of 500 ° C.
（Ｈ）上記（Ｃ）と同じ条件の水溶液、すなわち純水１
に硼酸を20gおよびコハク酸アンモニウムを0.1g添加
した液温85℃の硼酸水溶液中に浸漬し、電流密度10mA/c
m2の電流を流し、化成電圧600Vまで上昇させ、同電圧を
13分間印加して第１の再化成を行なった。(H) Aqueous solution under the same conditions as in (C) above, that is, pure water 1
Immersed in a boric acid aqueous solution containing 20g of boric acid and 0.1g of ammonium succinate at a liquid temperature of 85 ° C to obtain a current density of 10mA / c
Apply a current of m 2 to raise the formation voltage to 600V,
The first re-formation was performed by applying for 13 minutes.
（Ｉ）500℃の加熱雰囲気中で２分間熱処理した。(I) Heat treatment was performed for 2 minutes in a heating atmosphere of 500 ° C.
（Ｊ）引き続き、上記（Ｈ）と同じ条件で再化成を繰り
返した（第２の再化成）。(J) Subsequently, re-formation was repeated under the same conditions as (H) above (second re-formation).
（Ｋ）水洗し、乾燥させて化成箔の静電容量を測定した
ところ、0.458μF/cm2であった。(K) After washing with water and drying, the capacitance of the formed foil was measured and found to be 0.458 μF / cm 2 .
（Ｊ）この化成箔（15mm×270mm）を陽極とし、一方純
度99.2％で厚さ20μｍ、エッチング倍率50倍のアルミニ
ウム箔（15mm×300mm）を陰極とし、セパレータを介し
て巻回して、コンデンサ素子を作成した。そして、この
コンデンサ素子に電解液を含浸させ、ケース内に封入
し、定格400V16μＦの電解コンデンサを作成したとこ
ろ、その静電容量は18.2μＦであった。(J) This formed foil (15 mm x 270 mm) was used as an anode, while an aluminum foil (15 mm x 300 mm) with a purity of 99.2% and a thickness of 20 µm and an etching magnification of 50 times was used as a cathode, and was wound with a separator interposed between the capacitor element. It was created. Then, when this capacitor element was impregnated with an electrolytic solution and enclosed in a case to prepare an electrolytic capacitor rated at 400 V and 16 μF, its capacitance was 18.2 μF.
なお、上記工程（Ｈ）と工程（Ｉ）との間に、85wt％の
燐酸25ml/の水溶液であって、アンモニア水でpH6.5に
調整した液温30℃の水溶液に４分間浸漬処理を行なう工
程を介在させてもよい。この工程を追加した電解コンデ
ンサは、例えば105℃、1000時間の高温貯蔵試験におけ
る製品の漏れ電流による劣化を防止できる。In addition, between the steps (H) and (I), a dipping treatment was performed for 4 minutes in an aqueous solution of 85 wt% phosphoric acid 25 ml /, which was adjusted to pH 6.5 with ammonia water and had a liquid temperature of 30 ° C. You may intervene the process to perform. The electrolytic capacitor to which this step is added can prevent deterioration due to leakage current of the product in a high temperature storage test at 105 ° C. for 1000 hours.
〔実施例２〕 （Ａ）純度99.99％で厚さ100μｍのアルミニウムエッチ
ング箔を用意した。この場合、そのエッチング倍率はエ
ッチングしていない平坦箔に対して20倍である。Example 2 (A) An aluminum etching foil having a purity of 99.99% and a thickness of 100 μm was prepared. In this case, the etching magnification is 20 times that of the unetched flat foil.
（Ｂ）このアルミニウムエッチング箔を液温98℃以上の
純水中で15分間ボイル処理した。(B) This aluminum etching foil was boiled for 15 minutes in pure water having a liquid temperature of 98 ° C. or higher.
（Ｃ）純水１に硼酸を20gおよびコハク酸アンモニウ
ムを0.1g添加した液温85℃の硼酸水溶液中にアルミニウ
ムエッチング箔を浸漬し、電流密度10mA/cm2の電流を流
し、化成電圧200Vまで上昇させ、同電圧を10分間印加し
て第１の本化成を行なった。(C) The aluminum etching foil is immersed in a boric acid aqueous solution having a liquid temperature of 85 ° C in which 20 g of boric acid and 0.1 g of ammonium succinate are added to pure water 1 and a current having a current density of 10 mA / cm 2 is applied until the formation voltage is 200 V. The voltage was increased and the same voltage was applied for 10 minutes to perform the first main chemical conversion.
（Ｄ）引き続き、同アルミニウムエッチング箔を純水１
に硼酸を20gおよび硼酸アンモニウムを0.5g添加した
液温85℃の硼酸水溶液中に浸漬し、電流密度10mA/cm2の
電流を流し、化成電圧400Vまで上昇させ、同電圧を10分
間印加して第２の本化成を行なった。(D) Subsequently, the same aluminum etching foil was replaced with pure water 1
Immersed in a boric acid aqueous solution at a liquid temperature of 85 ° C with 20 g of boric acid and 0.5 g of ammonium borate added, a current density of 10 mA / cm 2 was applied, the formation voltage was raised to 400 V, and the same voltage was applied for 10 minutes. The second main chemical conversion was performed.
（Ｅ）さらに、純水１に硼酸を20gおよびコハク酸ア
ンモニウムを0.1g添加した液温85℃の硼酸水溶液中にア
ルミニウムエッチング箔を浸漬し、電流密度10mA/cm2の
電流を流し、化成電圧600Vまで上昇させ、同電圧を40分
間印加して第３の本化成を行なった。(E) Furthermore, the aluminum etching foil was immersed in a boric acid aqueous solution having a liquid temperature of 85 ° C in which 20 g of boric acid and 0.1 g of ammonium succinate were added to pure water 1, and a current having a current density of 10 mA / cm 2 was applied to form the chemical conversion voltage. The voltage was increased to 600 V and the same voltage was applied for 40 minutes to perform the third main chemical conversion.
（Ｆ）化成後のアルミニウムエッチング箔を液温70℃、
pH7〜９に調整したアンモニア水に３分間浸漬し、減極
処理を行なった。(F) The aluminum etching foil after chemical conversion has a liquid temperature of 70 ° C,
Depolarization treatment was carried out by immersing in ammonia water adjusted to pH 7 to 9 for 3 minutes.
（Ｇ）500℃の加熱雰囲気中で２分間熱処理した。(G) Heat treatment was performed for 2 minutes in a heating atmosphere of 500 ° C.
（Ｈ）純水１に硼酸を20gおよびコハク酸アンモニウ
ムを0.1g添加した液温85℃の硼酸水溶液中に浸漬し、電
流密度10mA/cm2の電流を流し、化成電圧600Vまで上昇さ
せ、同電圧を13分間印加して第１の再化成を行なった。(H) Immersion in pure water 1 containing 20 g of boric acid and 0.1 g of ammonium succinate in a boric acid aqueous solution at a liquid temperature of 85 ° C., applying a current having a current density of 10 mA / cm 2 to raise the formation voltage to 600 V, The voltage was applied for 13 minutes to perform the first reformation.
（Ｉ）500℃の加熱雰囲気中で２分間熱処理した。(I) Heat treatment was performed for 2 minutes in a heating atmosphere of 500 ° C.
（Ｊ）引き続き、上記（Ｈ）と同じ条件で再化成を繰り
返した（第２の再化成）。(J) Subsequently, re-formation was repeated under the same conditions as (H) above (second re-formation).
（Ｋ）水洗し、乾燥させて化成箔の静電容量を測定した
ところ、0.453μF/cm2であった。(K) After washing with water and drying, the capacitance of the formed foil was measured and found to be 0.453 μF / cm 2 .
（Ｊ）この化成箔（15mm×270mm）を陽極として、実施
例１と同様、定格400V16μＦの電解コンデンサを作成し
たところ、その静電容量は18.4μＦであった。(J) When this formed foil (15 mm × 270 mm) was used as an anode, an electrolytic capacitor having a rating of 400 V and 16 μF was prepared in the same manner as in Example 1. Its electrostatic capacity was 18.4 μF.
〔実施例３〕 （Ａ）純度99.99％で厚さ100μｍのアルミニウムエッチ
ング箔を用意した。この場合、そのエッチング倍率はエ
ッチングしていない平坦箔に対して20倍である。Example 3 (A) An aluminum etching foil having a purity of 99.99% and a thickness of 100 μm was prepared. In this case, the etching magnification is 20 times that of the unetched flat foil.
（Ｂ）このアルミニウムエッチング箔を液温98℃以上の
純水中で15分間ボイル処理した。(B) This aluminum etching foil was boiled for 15 minutes in pure water having a liquid temperature of 98 ° C. or higher.
（Ｃ）純水１に硼酸を20gおよび硼酸アンモニウムを
0.5g添加した液温85℃の硼酸水溶液中にアルミニウムエ
ッチング箔を浸漬し、電流密度10mA/cm2の電流を流し、
化成電圧200Vまで上昇させ、同電圧を10分間印加して第
１の本化成を行なった。(C) 20 g of boric acid and ammonium borate in pure water 1
The aluminum etching foil was immersed in an aqueous solution of boric acid at a liquid temperature of 85 ° C with 0.5 g added, and a current having a current density of 10 mA / cm 2 was applied,
The formation voltage was increased to 200 V, and the same voltage was applied for 10 minutes to perform the first main formation.
（Ｄ）続いて、同アルミニウムエッチング箔を純水１
に硼酸を20gおよびコハク酸アンモニウムを0.1g添加し
た液温85℃の硼酸水溶液中に浸漬し、電流密度10mA/cm2
の電流を流し、化成電圧400Vまで上昇させ、同電圧を10
分間印加して第２の本化成を行なった。(D) Subsequently, the same aluminum etching foil was replaced with pure water 1
Immersed in a boric acid aqueous solution at a liquid temperature of 85 ° C with 20 g of boric acid and 0.1 g of ammonium succinate added, and a current density of 10 mA / cm 2
Current to raise the formation voltage to 400V,
The second main chemical conversion was performed by applying for 2 minutes.
（Ｅ）さらに、第３の本化成として、同アルミニウムエ
ッチング箔を純水１に硼酸を20gおよびコハク酸アン
モニウムを0.1g添加した液温85℃の硼酸水溶液中に浸漬
し、電流密度10mA/cm2の電流を流し、化成電圧400Vまで
上昇させ、同電圧を40分間印加した。(E) Further, as the third main chemical conversion, the aluminum etching foil was immersed in a boric acid aqueous solution at a liquid temperature of 85 ° C in which pure water 1 was added with 20 g of boric acid and 0.1 g of ammonium succinate, and the current density was 10 mA / cm. A current of 2 was applied to increase the formation voltage to 400 V, and the same voltage was applied for 40 minutes.
（Ｆ）化成後のアルミニウムエッチング箔を液温70℃、
pH7〜９に調整したアンモニア水に３分間浸漬し、減極
処理を行なった。(F) The aluminum etching foil after chemical conversion has a liquid temperature of 70 ° C,
Depolarization treatment was carried out by immersing in ammonia water adjusted to pH 7 to 9 for 3 minutes.
（Ｇ）500℃の加熱雰囲気中で２分間熱処理した。(G) Heat treatment was performed for 2 minutes in a heating atmosphere of 500 ° C.
（Ｈ）純水１に硼酸を20gおよびコハク酸アンモニウ
ムを0.1g添加した液温85℃の硼酸水溶液中に浸漬し、電
流密度10mA/cm2の電流を流し、化成電圧600Vまで上昇さ
せ、同電圧を13分間印加して第１の再化成を行なった。(H) Immersion in pure water 1 containing 20 g of boric acid and 0.1 g of ammonium succinate in a boric acid aqueous solution at a liquid temperature of 85 ° C., applying a current having a current density of 10 mA / cm 2 to raise the formation voltage to 600 V, The voltage was applied for 13 minutes to perform the first reformation.
（Ｉ）500℃の加熱雰囲気中で２分間熱処理した。(I) Heat treatment was performed for 2 minutes in a heating atmosphere of 500 ° C.
（Ｊ）引き続き、上記（Ｈ）と同じ条件で再化成を繰り
返した（第２の再化成）。(J) Subsequently, re-formation was repeated under the same conditions as (H) above (second re-formation).
（Ｋ）水洗し、乾燥させて化成箔の静電容量を測定した
ところ、0.461μF/cm2であった。(K) After washing with water and drying, the capacitance of the formed foil was measured and found to be 0.461 μF / cm 2 .
（Ｊ）この化成箔（15mm×270mm）を陽極として、実施
例１と同様、定格400V16μＦの電解コンデンサを作成し
たところ、その静電容量は18.3μＦであった。(J) Using this formed foil (15 mm × 270 mm) as an anode, an electrolytic capacitor having a rating of 400 V and 16 μF was prepared in the same manner as in Example 1, and its electrostatic capacity was 18.3 μF.
〔実施例４〕 （Ａ）純度99.99％で厚さ100μｍのアルミニウムエッチ
ング箔を用意した。この場合、そのエッチング倍率はエ
ッチングしていない平坦箔に対して20倍である。Example 4 (A) An aluminum etching foil having a purity of 99.99% and a thickness of 100 μm was prepared. In this case, the etching magnification is 20 times that of the unetched flat foil.
（Ｂ）このアルミニウムエッチング箔を液温98℃以上の
純水中で15分間ボイル処理した。(B) This aluminum etching foil was boiled for 15 minutes in pure water having a liquid temperature of 98 ° C. or higher.
（Ｃ）純水１に硼酸を20gおよびコハク酸アンモニウ
ムを0.1g添加した液温85℃の硼酸水溶液中にアルミニウ
ムエッチング箔を浸漬し、電流密度10mA/cm2の電流を流
し、化成電圧200Vまで上昇させ、同電圧を10分間印加し
て第１の本化成を行なった。(C) The aluminum etching foil is immersed in a boric acid aqueous solution having a liquid temperature of 85 ° C in which 20 g of boric acid and 0.1 g of ammonium succinate are added to pure water 1 and a current having a current density of 10 mA / cm 2 is applied until the formation voltage is 200 V. The voltage was increased and the same voltage was applied for 10 minutes to perform the first main chemical conversion.
（Ｄ）次に、同アルミニウムエッチング箔を純水１に
硼酸を20gおよびコハク酸アンモニウムを0.1g添加した
液温85℃の硼酸水溶液中に浸漬し、電流密度10mA/cm2の
電流を流し、化成電圧400Vまで上昇させ、同電圧を10分
間印加して第２の本化成を行なった。(D) Next, the same aluminum etching foil was immersed in pure water 1 containing 20 g of boric acid and 0.1 g of ammonium succinate in a boric acid aqueous solution at a liquid temperature of 85 ° C., and an electric current having a current density of 10 mA / cm 2 was applied, The formation voltage was raised to 400 V and the same voltage was applied for 10 minutes to perform the second main formation.
（Ｅ）さらに、第３の本化成として、同アルミニウムエ
ッチング箔を純水１に硼酸を20gおよびコハク酸アン
モニウムを0.1g添加した液温85℃の硼酸水溶液中に浸漬
し、電流密度10mA/cm2の電流を流し、化成電圧600Vまで
上昇させ、同電圧を40分間印加した。(E) Further, as the third main chemical conversion, the aluminum etching foil was immersed in a boric acid aqueous solution at a liquid temperature of 85 ° C in which pure water 1 was added with 20 g of boric acid and 0.1 g of ammonium succinate, and the current density was 10 mA / cm. A current of 2 was applied to increase the formation voltage to 600 V, and the same voltage was applied for 40 minutes.
（Ｆ）化成後のアルミニウムエッチング箔を液温70℃、
pH7〜９に調整したアンモニア水に３分間浸漬し、減極
処理を行なった。(F) The aluminum etching foil after chemical conversion has a liquid temperature of 70 ° C,
Depolarization treatment was carried out by immersing in ammonia water adjusted to pH 7 to 9 for 3 minutes.
（Ｇ）500℃の加熱雰囲気中で２分間熱処理した。(G) Heat treatment was performed for 2 minutes in a heating atmosphere of 500 ° C.
（Ｈ）純水１に硼酸を20gおよびコハク酸アンモニウ
ムを0.1g添加した液温85℃の硼酸水溶液中に浸漬し、電
流密度10mA/cm2の電流を流し、化成電圧600Vまで上昇さ
せ、同電圧を13分間印加して第１の再化成を行なった。(H) Immersion in pure water 1 containing 20 g of boric acid and 0.1 g of ammonium succinate in a boric acid aqueous solution at a liquid temperature of 85 ° C., applying a current having a current density of 10 mA / cm 2 to raise the formation voltage to 600 V, The voltage was applied for 13 minutes to perform the first reformation.
（Ｉ）500℃の加熱雰囲気中で２分間熱処理した。(I) Heat treatment was performed for 2 minutes in a heating atmosphere of 500 ° C.
（Ｊ）しかる後、純水１に硼酸を20gおよび硼酸アン
モニウムを0.5g添加した液温85℃の硼酸水溶液中に浸漬
し、電流密度10mA/cm2の電流を流し、化成電圧600Vまで
上昇させ、同電圧を13分間印加して第２の再化成を行な
った。(J) Then, dip pure water 1 in 20 g of boric acid and 0.5 g of ammonium borate in a boric acid aqueous solution at a liquid temperature of 85 ° C., and apply a current having a current density of 10 mA / cm 2 to raise the formation voltage to 600 V. The same voltage was applied for 13 minutes to carry out the second reformation.
（Ｋ）水洗し、乾燥させて化成箔の静電容量を測定した
ところ、0.465μF/cm2であった。(K) After washing with water and drying, the capacitance of the formed foil was measured and found to be 0.465 μF / cm 2 .
（Ｊ）この化成箔（15mm×270mm）を陽極として、実施
例１と同様、定格400V16μＦの電解コンデンサを作成し
たところ、その静電容量は18.5μＦであった。(J) When this formed foil (15 mm × 270 mm) was used as an anode, an electrolytic capacitor having a rating of 400 V and 16 μF was prepared in the same manner as in Example 1. Its electrostatic capacity was 18.5 μF.
〔実施例５〕 （Ａ）純度99.99％で厚さ100μｍのアルミニウムエッチ
ング箔を用意した。この場合、そのエッチング倍率はエ
ッチングしていない平坦箔に対して20倍である。Example 5 (A) An aluminum etching foil having a purity of 99.99% and a thickness of 100 μm was prepared. In this case, the etching magnification is 20 times that of the unetched flat foil.
（Ｂ）このアルミニウムエッチング箔を液温98℃以上の
純水中で15分間ボイル処理した。(B) This aluminum etching foil was boiled for 15 minutes in pure water having a liquid temperature of 98 ° C. or higher.
（Ｃ）純水１に硼酸を20gおよびコハク酸アンモニウ
ムを0.1g添加した液温85℃の硼酸水溶液中にアルミニウ
ムエッチング箔を浸漬し、電流密度10mA/cm2の電流を流
し、化成電圧200Vまで上昇させ、同電圧を10分間印加し
て第１の本化成を行なった。(C) The aluminum etching foil is immersed in a boric acid aqueous solution having a liquid temperature of 85 ° C in which 20 g of boric acid and 0.1 g of ammonium succinate are added to pure water 1 and a current having a current density of 10 mA / cm 2 is applied until the formation voltage is 200 V. The voltage was increased and the same voltage was applied for 10 minutes to perform the first main chemical conversion.
（Ｄ）次に、同アルミニウムエッチング箔を純水１に
硼酸を20gおよびコハク酸アンモニウムを0.1g添加した
液温85℃の硼酸水溶液中に浸漬し、電流密度10mA/cm2の
電流を流し、化成電圧400Vまで上昇させ、同電圧を10分
間印加して第２の本化成を行なった。(D) Next, the same aluminum etching foil was immersed in pure water 1 containing 20 g of boric acid and 0.1 g of ammonium succinate in a boric acid aqueous solution at a liquid temperature of 85 ° C., and an electric current having a current density of 10 mA / cm 2 was applied, The formation voltage was raised to 400 V and the same voltage was applied for 10 minutes to perform the second main formation.
（Ｅ）さらに、第３の本化成として、同アルミニウムエ
ッチング箔を純水１に硼酸を20gおよびコハク酸アン
モニウムを0.1g添加した液温85℃の硼酸水溶液中に浸漬
し、電流密度10mA/cm2の電流を流し、化成電圧600Vまで
上昇させ、同電圧を40分間印加して第２の本化成を行な
った。(E) Further, as the third main chemical conversion, the aluminum etching foil was immersed in a boric acid aqueous solution at a liquid temperature of 85 ° C in which pure water 1 was added with 20 g of boric acid and 0.1 g of ammonium succinate, and the current density was 10 mA / cm. A current of 2 was flown to raise the formation voltage to 600 V, and the same voltage was applied for 40 minutes to perform the second main formation.
（Ｆ）化成後のアルミニウムエッチング箔を液温70℃、
pH7〜９に調整したアンモニア水に３分間浸漬し、減極
処理を行なった。(F) The aluminum etching foil after chemical conversion has a liquid temperature of 70 ° C,
Depolarization treatment was carried out by immersing in ammonia water adjusted to pH 7 to 9 for 3 minutes.
（Ｇ）500℃の加熱雰囲気中で２分間熱処理した。(G) Heat treatment was performed for 2 minutes in a heating atmosphere of 500 ° C.
（Ｈ）純水１に硼酸を20gおよび硼酸アンモニウムを
0.5g添加した液温85℃の硼酸水溶液中に浸漬し、電流密
度10mA/cm2の電流を流し、化成電圧600Vまで上昇させ、
同電圧を13分間印加して第１の再化成を行なった。(H) 20 g of boric acid and ammonium borate in pure water 1
Immerse in 0.5g added boric acid aqueous solution at a liquid temperature of 85 ° C, apply a current with a current density of 10mA / cm 2 , raise the formation voltage to 600V,
The same voltage was applied for 13 minutes to perform the first reformation.
（Ｉ）500℃の加熱雰囲気中で２分間熱処理した。(I) Heat treatment was performed for 2 minutes in a heating atmosphere of 500 ° C.
（Ｊ）しかる後、純水１に硼酸を20gおよびコハク酸
アンモニウムを0.1g添加した液温85℃の硼酸水溶液中に
浸漬し、電流密度10mA/cm2の電流を流し、化成電圧600V
まで上昇させ、同電圧を13分間印加して第１の再化成を
行なった。(J) Thereafter, the pure water 1 was immersed in a boric acid aqueous solution at a liquid temperature of 85 ° C in which 20 g of boric acid and 0.1 g of ammonium succinate were added, and a current having a current density of 10 mA / cm 2 was flowed to form a formation voltage of 600 V.
Then, the same voltage was applied for 13 minutes to perform the first reformation.
（Ｋ）水洗し、乾燥させて化成箔の静電容量を測定した
ところ、0.463μF/cm2であった。(K) After washing with water and drying, the capacitance of the formed foil was measured and found to be 0.463 μF / cm 2 .
（Ｊ）この化成箔（15mm×270mm）を陽極として、実施
例１と同様、定格400V16μＦの電解コンデンサを作成し
たところ、その静電容量は18.4μＦであった。(J) When this formed foil (15 mm × 270 mm) was used as an anode, an electrolytic capacitor having a rating of 400 V and 16 μF was prepared in the same manner as in Example 1. Its electrostatic capacity was 18.4 μF.
＜比較例１＞ （ａ）純度99.99％で厚さ100μｍのアルミニウムエッチ
ング箔を用意した。この場合、そのエッチング倍率はエ
ッチングしていない平坦箔に対して20倍である。Comparative Example 1 (a) An aluminum etching foil having a purity of 99.99% and a thickness of 100 μm was prepared. In this case, the etching magnification is 20 times that of the unetched flat foil.
（ｂ）このアルミニウムエッチング箔を液温98℃以上の
純水中で15分間ボイル処理した。(B) The aluminum etching foil was boiled for 15 minutes in pure water having a liquid temperature of 98 ° C or higher.
（ｃ）純水１に硼酸20gを添加した硼酸水溶液、液温8
5℃中にアルミニウムエッチング箔を浸漬し、電流密度1
0mA/cm2の電流を流し、化成電圧200Vまで上昇させ、同
電圧を10分間印加して第１の本化成を行なった。(C) Boric acid aqueous solution obtained by adding 20 g of boric acid to pure water 1, liquid temperature 8
Immerse the aluminum etching foil in 5 ℃, current density 1
A current of 0 mA / cm 2 was passed to raise the formation voltage to 200 V, and the same voltage was applied for 10 minutes to perform the first main formation.
（ｄ）次に、同アルミニウムエッチング箔を純水１に
硼酸20gを添加した硼酸水溶液、液温85℃中に浸漬し、
電流密度10mA/cm2の電流を流し、化成電圧400Vまで上昇
させ、同電圧を10分間印加して第２の本化成を行なっ
た。(D) Next, the aluminum etching foil was immersed in a boric acid aqueous solution prepared by adding 20 g of boric acid to pure water 1 at a liquid temperature of 85 ° C.,
A second main chemical conversion was carried out by applying a current having a current density of 10 mA / cm 2 to raise the chemical conversion voltage to 400 V and applying the same voltage for 10 minutes.
（ｅ）さらに、第３の本化成として、同アルミニウムエ
ッチング箔を純水１に硼酸20gを添加した硼酸水溶
液、液温85℃中に浸漬し、電流密度10mA/cm2の電流を流
し、化成電圧600Vまで上昇させ、同電圧を40分間印加し
て第２の本化成を行なった。(E) Furthermore, as the third main chemical conversion, the aluminum etching foil was immersed in a boric acid aqueous solution in which 20 g of boric acid was added to pure water 1 at a liquid temperature of 85 ° C., and a current having a current density of 10 mA / cm 2 was flowed to perform chemical conversion. The voltage was increased to 600 V and the same voltage was applied for 40 minutes to perform the second main chemical conversion.
（ｆ）化成後のアルミニウムエッチング箔を液温70℃、
pH7〜９に調整したアンモニア水に３分間浸漬し、減極
処理を行なった。(F) Liquid temperature of the aluminum etching foil after chemical conversion is 70 ° C,
Depolarization treatment was carried out by immersing in ammonia water adjusted to pH 7 to 9 for 3 minutes.
（ｇ）500℃の加熱雰囲気中で２分間熱処理した。(G) Heat treatment was performed in a heating atmosphere of 500 ° C. for 2 minutes.
（ｈ）第１の再化成として、上記（ｃ）と同じ条件の水
溶液、すなわち純水１に硼酸20gを添加した硼酸水溶
液、液温85℃中に浸漬し、電流密度10mA/cm2の電流を流
し、化成電圧600Vまで上昇させ、同電圧を13分間印加し
た。(H) As the first re-chemical conversion, an aqueous solution under the same conditions as in the above (c), that is, a boric acid aqueous solution in which 20 g of boric acid was added to pure water 1 was immersed in a liquid temperature of 85 ° C., and a current density of 10 mA / cm 2 was applied. Was applied to raise the formation voltage to 600 V, and the same voltage was applied for 13 minutes.
（ｉ）500℃の加熱雰囲気中で２分間熱処理した。(I) Heat treatment was performed in a heating atmosphere at 500 ° C. for 2 minutes.
（ｊ）再び、純水１に硼酸20gを添加した硼酸水溶
液、液温85℃中に再度浸漬し、電流密度10mA/cm2の電流
を流し、化成電圧600Vまで上昇させ、同電圧を13分間印
加して第２の再化成を行なった。(J) Again, it is immersed again in a boric acid aqueous solution in which 20 g of boric acid is added to pure water 1 at a liquid temperature of 85 ° C., a current having a current density of 10 mA / cm 2 is applied, the formation voltage is increased to 600 V, and the same voltage is applied for 13 minutes. A second re-formation was performed by applying voltage.
（ｋ）水洗し、乾燥させて化成箔の静電容量を測定した
ところ、0.296μF/cm2であった。(K) After washing with water and drying, the capacitance of the formed foil was measured and found to be 0.296 μF / cm 2 .
（ｊ）この化成箔（15mm×270mm）を陽極として、実施
例１と同様の定格400V16μＦの電解コンデンサを作成し
たところ、その容量は11.7μＦであった。(J) When this formed foil (15 mm × 270 mm) was used as an anode, an electrolytic capacitor having a rating of 400 V and 16 μF was prepared in the same manner as in Example 1, and its capacitance was 11.7 μF.
＜比較例２＞ （ａ）純度99.99％で厚さ100μｍのアルミニウムエッチ
ング箔を用意した。この場合、そのエッチング倍率はエ
ッチングしていない平坦箔に対して20倍である。Comparative Example 2 (a) An aluminum etching foil having a purity of 99.99% and a thickness of 100 μm was prepared. In this case, the etching magnification is 20 times that of the unetched flat foil.
（ｂ）このアルミニウムエッチング箔を液温98℃以上の
純水中で15分間ボイル処理した。(B) The aluminum etching foil was boiled for 15 minutes in pure water having a liquid temperature of 98 ° C or higher.
（ｃ）純水１に硼酸を20gおよび硼酸アンモニウムを
0.5g添加し液温85℃の硼酸水溶液中にアルミニウムエッ
チング箔を浸漬し、電流密度10mA/cm2の電流を流し、化
成電圧200Vまで上昇させ、同電圧を10分間印加して第１
の本化成を行なった。(C) 20 g of boric acid and ammonium borate in pure water 1
0.5g was added and the aluminum etching foil was immersed in a boric acid aqueous solution with a liquid temperature of 85 ° C, a current with a current density of 10mA / cm 2 was applied, the formation voltage was raised to 200V, and the same voltage was applied for 10 minutes.
The main formation was done.
（ｄ）次に、同アルミニウムエッチング箔を純水１に
硼酸を20gおよび硼酸アンモニウムを0.5g添加し液温85
℃の硼酸水溶液中に浸漬し、電流密度10mA/cm2の電流を
流し、化成電圧400Vまで上昇させ、同電圧を10分間印加
して第２の本化成を行なった。(D) Next, 20 g of boric acid and 0.5 g of ammonium borate were added to pure water 1 of the same aluminum etching foil to obtain a liquid temperature of 85.
The sample was immersed in an aqueous solution of boric acid at a temperature of 10 ° C., a current having a current density of 10 mA / cm 2 was passed to raise the formation voltage to 400 V, and the same voltage was applied for 10 minutes to perform the second main formation.
（ｅ）さらに、第３の本化成として、同アルミニウムエ
ッチング箔を純水１に硼酸を20gおよび硼酸アンモニ
ウムを0.5g添加した液温85℃の硼酸水溶液中に浸漬し、
電流密度10mA/cm2の電流を流し、化成電圧600Vまで上昇
させ、同電圧を40分間印加した。(E) Further, as the third main chemical conversion, the aluminum etching foil is immersed in a boric acid aqueous solution having a liquid temperature of 85 ° C., in which 20 g of boric acid and 0.5 g of ammonium borate are added to pure water 1.
A current having a current density of 10 mA / cm 2 was passed to raise the formation voltage to 600 V, and the same voltage was applied for 40 minutes.
（ｆ）化成後のアルミニウムエッチング箔を液温70℃、
pH7〜９に調整したアンモニア水に３分間浸漬し、減極
処理を行なった。(F) Liquid temperature of the aluminum etching foil after chemical conversion is 70 ° C,
Depolarization treatment was carried out by immersing in ammonia water adjusted to pH 7 to 9 for 3 minutes.
（ｇ）500℃の加熱雰囲気中で２分間熱処理した。(G) Heat treatment was performed in a heating atmosphere of 500 ° C. for 2 minutes.
（ｈ）第１の再化成として、純水１に硼酸を20gおよ
び硼酸アンモニウムを0.5g添加した液温85℃の硼酸水溶
液中に浸漬し、電流密度10mA/cm2の電流を流し、化成電
圧600Vまで上昇させ、同電圧を13分間印加した。(H) As the first re-formation, the pure water 1 was immersed in a boric acid aqueous solution at a liquid temperature of 85 ° C in which 20 g of boric acid and 0.5 g of ammonium borate were added, and a current having a current density of 10 mA / cm 2 was applied to form the formation voltage. The voltage was raised to 600 V and the same voltage was applied for 13 minutes.
（ｉ）500℃の加熱雰囲気中で２分間熱処理した。(I) Heat treatment was performed in a heating atmosphere at 500 ° C. for 2 minutes.
（ｊ）再び、純水１に硼酸を20gおよび硼酸アンモニ
ウムを0.5g添加した液温85℃の硼酸水溶液中に浸漬し、
電流密度10mA/cm2の電流を流し、化成電圧600Vまで上昇
させ、同電圧を13分間印加して第２の再化成を行なっ
た。(J) Again, the pure water 1 was immersed in an aqueous boric acid solution having a liquid temperature of 85 ° C., to which 20 g of boric acid and 0.5 g of ammonium borate were added,
A second re-formation was performed by applying a current having a current density of 10 mA / cm 2 to raise the formation voltage to 600 V and applying the same voltage for 13 minutes.
（ｋ）水洗し、乾燥させて化成箔の静電容量を測定した
ところ、0.423μF/cm2であった。(K) After washing with water and drying, the capacitance of the formed foil was measured and found to be 0.423 μF / cm 2 .
（ｊ）この化成箔（15mm×270mm）を陽極として、実施
例１と同様の定格400V16μＦの電解コンデンサを作成し
たところ、その容量は16.8μＦであった。(J) When this formed foil (15 mm × 270 mm) was used as an anode, an electrolytic capacitor having a rating of 400 V and 16 μF was prepared in the same manner as in Example 1, and its capacity was 16.8 μF.
参考までに、次表に上記各実施例および各比較例で得ら
れた化成箔の静電容量とその化成箔を用いて試作した電
解コンデンサの静電容量を示す。For reference, the following table shows the capacitance of the chemical conversion foil obtained in each of the examples and the comparative examples and the capacitance of the electrolytic capacitor prototyped using the chemical conversion foil.
この表から明らかなように、本発明によると箔の静電容
量および製品の静電容量ともに、従来法による比較例に
比べて約８〜10％増大している。 As is clear from this table, according to the present invention, both the capacitance of the foil and the capacitance of the product are increased by about 8 to 10% as compared with the comparative example by the conventional method.
以上説明したように、本発明によれば、エッチングされ
たアルミニウム箔を純水ボイルした後の本化成工程およ
び再化成工程のいずれにおいても、少なくとも一度は脂
肪族飽和ジカルボン酸またはその塩を含有する硼酸水溶
液中で化成するようにしたことにより、静電容量の高い
電極箔が製造される。As described above, according to the present invention, the saturated aluminum dicarboxylic acid or its salt is contained at least once in both the main chemical conversion step and the rechemical conversion step after boiling the etched aluminum foil with pure water. By performing chemical conversion in a boric acid aqueous solution, an electrode foil having a high capacitance can be manufactured.
フロントページの続き (72)発明者 遠藤 優 神奈川県藤沢市辻堂新町２丁目２番１号 エルナー株式会社内 (72)発明者 羽賀 昇 神奈川県藤沢市辻堂新町２丁目２番１号 エルナー株式会社内 (72)発明者 佐々木 幹夫 東京都千代田区丸の内２丁目１番２号 旭 硝子株式会社内Front page continued (72) Inventor Yu Endo 2-2-1 Tsujido Shinmachi, Fujisawa-shi, Kanagawa Elner Co., Ltd. (72) Inventor Noboru Haga 2-2-1 Tsujido Shinmachi, Fujisawa-shi, Kanagawa Elner Co., Ltd. (72) Inventor Mikio Sasaki 2-1-2 Marunouchi, Chiyoda-ku, Tokyo Asahi Glass Co., Ltd.
Claims (5)
純水中に所定時間浸漬したのち、本化成工程を行ない、
さらに再化成工程を行なうアルミニウム電解コンデンサ
用電極箔の製造方法において、上記本化成工程および上
記再化成工程のいずれにおいても、少なくとも一度は脂
肪族飽和ジカルボン酸またはその塩を含有する硼酸水溶
液中で化成することを特徴とするアルミニウム電解コン
デンサ用電極箔の製造方法。1. An etched aluminum foil is immersed in high temperature pure water for a predetermined time, and then this chemical conversion step is performed.
In the method for producing an electrode foil for an aluminum electrolytic capacitor, which further performs a re-chemical conversion step, in both the main chemical conversion step and the re-chemical conversion step, chemical conversion is performed at least once in a boric acid aqueous solution containing an aliphatic saturated dicarboxylic acid or a salt thereof. A method of manufacturing an electrode foil for an aluminum electrolytic capacitor, comprising:
されるものからなる請求項１記載のアルミニウム電解コ
ンデンサ用電極箔の製造方法。2. The aliphatic saturated dicarboxylic acid comprises a compound represented by the chemical formula XOOC- (CH 2 ) n -COOX (where X is H + or NH 4 + , n = 1 to 12). 1. The method for producing an electrode foil for an aluminum electrolytic capacitor as described in 1.
１記載のアルミニウム電解コンデンサ用電極箔の製造方
法。3. The method for producing an electrode foil for an aluminum electrolytic capacitor according to claim 1, wherein the aqueous boric acid solution has a pH of 4-9.
0wt％である請求項１記載のアルミニウム電解コンデン
サ用電極箔の製造方法。4. The boric acid aqueous solution has a boric acid concentration of 0.5 to 1
It is 0 wt%, The manufacturing method of the electrode foil for aluminum electrolytic capacitors of Claim 1.
ジカルボン酸の濃度は0.002〜1.0％、液温は70〜100℃
である請求項１記載のアルミニウム電解コンデンサ用電
極箔の製造方法。5. The concentration of the saturated aliphatic dicarboxylic acid in the aqueous boric acid solution is 0.002 to 1.0%, and the liquid temperature is 70 to 100 ° C.
The method for manufacturing an electrode foil for an aluminum electrolytic capacitor according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2326360A JPH07109814B2 (en) | 1990-11-28 | 1990-11-28 | Method for manufacturing electrode foil for aluminum electrolytic capacitor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2326360A JPH07109814B2 (en) | 1990-11-28 | 1990-11-28 | Method for manufacturing electrode foil for aluminum electrolytic capacitor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04196304A JPH04196304A (en) | 1992-07-16 |
| JPH07109814B2 true JPH07109814B2 (en) | 1995-11-22 |
Family
ID=18186928
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2326360A Expired - Fee Related JPH07109814B2 (en) | 1990-11-28 | 1990-11-28 | Method for manufacturing electrode foil for aluminum electrolytic capacitor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07109814B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104109890A (en) * | 2014-07-11 | 2014-10-22 | 四川石棉华瑞电子有限公司 | Formation line tank liquor preheating and consumption-reduction system and formation line tank liquor preheating and consumption-reduction method |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06275473A (en) * | 1993-03-19 | 1994-09-30 | Matsushita Electric Ind Co Ltd | Production of anode foil for aluminum electrolytic capacitor |
-
1990
- 1990-11-28 JP JP2326360A patent/JPH07109814B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104109890A (en) * | 2014-07-11 | 2014-10-22 | 四川石棉华瑞电子有限公司 | Formation line tank liquor preheating and consumption-reduction system and formation line tank liquor preheating and consumption-reduction method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04196304A (en) | 1992-07-16 |
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