JPH07108796B2 - Method for manufacturing base glass substrate for gradient index lens - Google Patents
Method for manufacturing base glass substrate for gradient index lensInfo
- Publication number
- JPH07108796B2 JPH07108796B2 JP61222715A JP22271586A JPH07108796B2 JP H07108796 B2 JPH07108796 B2 JP H07108796B2 JP 61222715 A JP61222715 A JP 61222715A JP 22271586 A JP22271586 A JP 22271586A JP H07108796 B2 JPH07108796 B2 JP H07108796B2
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- electric field
- glass
- gradient index
- molten salt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 title claims description 44
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 238000000034 method Methods 0.000 title description 7
- 239000006121 base glass Substances 0.000 title description 3
- 239000011521 glass Substances 0.000 claims description 54
- 230000005684 electric field Effects 0.000 claims description 24
- 150000003839 salts Chemical class 0.000 claims description 20
- 238000009826 distribution Methods 0.000 claims description 18
- 229910052760 oxygen Inorganic materials 0.000 claims description 18
- 150000001768 cations Chemical class 0.000 claims description 14
- 150000002500 ions Chemical class 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 12
- 229910052708 sodium Inorganic materials 0.000 claims description 7
- 239000011734 sodium Substances 0.000 description 23
- 238000005342 ion exchange Methods 0.000 description 20
- 230000000052 comparative effect Effects 0.000 description 5
- 239000000203 mixture Substances 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 3
- 230000004075 alteration Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910005793 GeO 2 Inorganic materials 0.000 description 1
- 229910018068 Li 2 O Inorganic materials 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910000323 aluminium silicate Inorganic materials 0.000 description 1
- -1 borosilicate Chemical compound 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- 229910001417 caesium ion Inorganic materials 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- 235000011151 potassium sulphates Nutrition 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
- C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
- C03C21/002—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions
- C03C21/003—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions under application of an electrical potential difference
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Glass Compositions (AREA)
Description
【発明の詳細な説明】 〔発明の技術分野〕 本発明は、軸方向屈折率分布型レンズを製造するのに適
した母材ガラス基板の製造方法に関するものである。Description: TECHNICAL FIELD OF THE INVENTION The present invention relates to a method for producing a base glass substrate suitable for producing an axial gradient index lens.
一様な屈折率を持つ光学ガラスより成る球面単レンズで
は避け難い球面収差を補正するための有効な方法とし
て、光軸方向に変化する屈折率分布をもつ球面レンズ
(以後、軸方向屈折率分布型レンズと呼ぶ)の使用が提
案されている。As an effective method for correcting spherical aberration that is difficult to avoid with a spherical single lens made of optical glass with a uniform refractive index, a spherical lens with a refractive index distribution that changes in the optical axis direction (Referred to as mold lens) is proposed.
軸方向屈折率分布型レンズは、たとえば屈折率が厚さ方
向に単調減少し、かつ光軸に垂直な面内では一様な屈折
率を有する透明板状体の両面を球面又は平面に加工した
ものであり、球面収差をごく小さくおさえることができ
る。The axial gradient index lens has, for example, a transparent plate-like body whose refractive index monotonically decreases in the thickness direction and which has a uniform refractive index in a plane perpendicular to the optical axis. The spherical aberration can be suppressed to a very small value.
上記の軸方向屈折率分布型レンズを製作するための母材
としては、精密に制御された屈折率分布を、球面加工に
必要な厚さにわたってもつ屈折率分布型ガラス材が必要
である。As a base material for manufacturing the above axial direction gradient index lens, a gradient index glass material having a precisely controlled refractive index distribution over the thickness required for spherical surface processing is required.
屈折率分布型ガラス材の製造方法として最も実用的なも
のはイオン交換法である。イオン交換法では、一価の陽
イオンを含むガラス体を他の一価陽イオンを含む溶融塩
などの媒質と接触させて、ガラス中の一価陽イオンと媒
質中の他の一価陽イオンとを交換させ、ガラス体中に一
価陽イオンの濃度分布をつけることによって屈折率分布
が形成される。通常は、Liイオン、Csイオン、Tlイオン
などガラス中において屈折率を高める効果の大きい一価
陽イオンの濃度分布を形成させることにより屈折率分布
をもつガラス体が製造される。The most practical method for producing the gradient index glass material is the ion exchange method. In the ion exchange method, a glass body containing a monovalent cation is brought into contact with a medium such as a molten salt containing another monovalent cation, and the monovalent cation in the glass and another monovalent cation in the medium are contacted with each other. Are exchanged, and the concentration distribution of monovalent cations is given in the glass body to form a refractive index distribution. Usually, a glass body having a refractive index distribution is produced by forming a concentration distribution of monovalent cations having a large effect of increasing the refractive index in glass such as Li ions, Cs ions, and Tl ions.
しかしながら、上記のイオン交換処理により軸方向屈折
率分布型ガラス材を製作しようとすると、イオンの拡散
速度が遅いために、所要の厚みに屈折率分布をつけるま
でに非常な長時間を要す点で実用的ではない。However, when an axial gradient index glass material is produced by the above ion exchange treatment, it takes a very long time to obtain the required refractive index profile due to the slow ion diffusion rate. Is not practical.
そこで、ガラス基板の両面間に直流電界を印加してイオ
ンの移動を速める電界印加イオン交換法が有効である。Therefore, an electric field application ion exchange method in which a DC electric field is applied between both surfaces of the glass substrate to accelerate the movement of ions is effective.
電界印加を行なうことによって、ガラス基板中にイオン
の動きは一方向(陽極側から陰極側)にのみ促進される
ため、拡散現象のみにたよる電界印加なしのイオン交換
の場合と比較して、全く異なったイオン濃度分布を形成
することも可能となる。By applying an electric field, the movement of ions in the glass substrate is promoted only in one direction (from the anode side to the cathode side), so compared to the case of ion exchange without applying an electric field due to only the diffusion phenomenon, It is also possible to form completely different ion concentration distributions.
電界印加イオン交換の方法としては特願昭60−265918に
示される様に、Tl2Oを成分として含むガラス基板の片面
にTlイオン以外の一価陽イオンを含む媒質を接触させ、
前記媒質側を陽極とする直流電界をガラス基板の両面に
印加することにより基板中のTlイオン濃度を直線状に変
化させて軸方向屈折率分布ガラス材を製作することがで
きる。たとえば後述する比較例の場合、Tl2O,Na2O,K2O
を成分としてそれぞれ8.2,9.6,2.2モル%を含むガラス
基板と、陽極側媒質としてのKNO3を接触させて電界印加
イオン交換を行なうことにより、第8図に示されるM2O
濃度分布を得ることができる。Tl2O1モル%は屈折率の
増加Δn=0.014に相当するため、第8図においてTl2O
濃度が直線的に増加している部分は、同様に直線状に増
加する屈折率分布を持つ。よって第8図に示されるM2O
濃度分布を持つガラス板は、軸方向屈折率分布材として
用いることができる。As a method of applying an electric field, as shown in Japanese Patent Application No. 60-265918, a medium containing a monovalent cation other than Tl ions is brought into contact with one surface of a glass substrate containing Tl 2 O as a component,
By applying a DC electric field having the medium side as an anode to both surfaces of the glass substrate, the Tl ion concentration in the substrate can be linearly changed to manufacture the axially gradient index glass material. For example, in the case of the comparative example described later, Tl 2 O, Na 2 O, K 2 O
A glass substrate containing 8.2, 9.6, and 2.2 mol% as a component, respectively, and KNO 3 as a medium on the anode side are brought into contact with each other to carry out an ion exchange by applying an electric field, whereby M 2 O shown in FIG.
The concentration distribution can be obtained. Since Tl 2 O1 mol%, corresponding to an increase [Delta] n = 0.014 of the refractive index, Tl 2 O in FIG. 8
The portion where the concentration increases linearly has a refractive index distribution which also linearly increases. Therefore, M 2 O shown in FIG.
A glass plate having a concentration distribution can be used as an axial refractive index distribution material.
ところが、第8図の場合、二カ所においてM2O濃度が極
めて急激に変化している(以下、不連続面と呼ぶ)。不
連続面では、ガラス基板の密度、熱膨張率、ガラス転移
温度といった物性値も急激に変化するため、電界印加イ
オン交換の各工程にわたって応力が集中し易く、ガラス
基板のクラッチや変形の原因となるので有害である。However, in the case of FIG. 8, the M 2 O concentration changes extremely rapidly at two locations (hereinafter referred to as discontinuous planes). On the discontinuous surface, the physical properties such as the density, the coefficient of thermal expansion, and the glass transition temperature of the glass substrate change abruptly, so stress tends to concentrate during each step of the electric field application ion exchange, which may cause the clutch or deformation of the glass substrate. It is harmful because
本発明は、1価の陽イオンを含むガラス基板の片面を、
少なくとも前記イオンとは異なる1価の陽イオンを含む
溶融塩に接触させて、前記溶融塩側を陽極とする直流電
界を前記ガラス基板の両面に印加して、前記ガラス基板
の厚み方向に屈折率分布を形成する屈折率分布型レンズ
用母材ガラス基板の製造方法において、前記ガラス基板
はその成分として、Tl2O,Na2O,K2Oのうち2種以上を含
み、かつこれらの成分間でモル%含有率が、 (1) 0.1×(Tl2O+Na2O+K2O)≦Tl2O (2) 0.45×(Tl2O+Na2O+K2O)≧Na2O (3) 0.3×(Tl2O+Na2O+K2O)≦K2O なる関係を満たし、かつTl2O,Na2O,K2Oの合計量がモル
%で、 (4) 5≦(Tl2O+Na2O+K2O)≦40 であることを特徴とする屈折率分布型レンズ用母材ガラ
ス基板の製造方法を提供するものである。According to the present invention, one surface of a glass substrate containing monovalent cations is
A molten salt containing a monovalent cation different from at least the ions is brought into contact, and a DC electric field having the molten salt side as an anode is applied to both surfaces of the glass substrate to obtain a refractive index in the thickness direction of the glass substrate. In the method for producing a base glass substrate for a gradient index lens that forms a distribution, the glass substrate contains, as its component, two or more of Tl 2 O, Na 2 O, and K 2 O, and these components The mol% content between (1) 0.1 × (Tl 2 O + Na 2 O + K 2 O) ≦ Tl 2 O (2) 0.45 × (Tl 2 O + Na 2 O + K 2 O) ≧ Na 2 O (3) 0.3 × ( Tl 2 O + Na 2 O + K 2 O) ≦ K 2 O, and the total amount of Tl 2 O, Na 2 O and K 2 O is mol%, (4) 5 ≦ (Tl 2 O + Na 2 O + K 2 O ) ≦ 40, the present invention provides a method for manufacturing a preform glass substrate for a gradient index lens.
本発明におけるガラス系としては、珪酸塩、アルミノ硅
酸塩、硼硅酸塩、リン酸塩などのガラス系が用いられる
が、化学的耐久性、耐溶融塩性の点からSiO2を主体とす
るガラス系が望ましい。化学的耐久性、溶融性、耐溶融
塩性、屈折率、アッベ数などを考慮して、B2O3,Al2O3な
どの三価成分、MgO,CaO,BaO,SrO,ZnO,PbOなどの二価成
分、TiO2,ZrO2,GeO2などの四価成分などを添加すること
ができる。As the glass system in the present invention, a glass system such as silicate, aluminosilicate, borosilicate, phosphate is used, but mainly composed of SiO 2 from the viewpoint of chemical durability and molten salt resistance. A glass-based glass is desirable. Considering chemical durability, meltability, molten salt resistance, refractive index, Abbe number, etc., trivalent components such as B 2 O 3 , Al 2 O 3 , MgO, CaO, BaO, SrO, ZnO, PbO It is possible to add a divalent component such as, a tetravalent component such as TiO 2 , ZrO 2 , and GeO 2 .
一価成分として、Tl2O,Na2O,K2Oの他に、Li2O,Cs2O,Rb2
Oなどを添加し得ることは、言うまでもない。また、Tl2
O,Na2O,K2Oの合計量は、5〜40モル%の範囲で選ぶのが
望ましい。上記の値が5モル%未満であると、ガラスの
溶融性が悪化すると共に、電界印加イオン交換処理後の
屈折率差が小さくなってしまう。上記の値が40モル%を
越えると、ガラスが不安定となり、不適である。As monovalent components, in addition to Tl 2 O, Na 2 O, K 2 O, Li 2 O, Cs 2 O, Rb 2
Needless to say, O and the like can be added. Also, Tl 2
The total amount of O, Na 2 O and K 2 O is preferably selected in the range of 5 to 40 mol%. When the above value is less than 5 mol%, the meltability of glass deteriorates and the difference in refractive index after the electric field application ion exchange treatment becomes small. When the above-mentioned value exceeds 40 mol%, the glass becomes unstable and is not suitable.
Tl+,Na+,K+の三種イオンは、ガラス中での移動度に大き
な差があり、Na+は非常に動き易い。ガラス中の一価陽
イオンを電界の力で移動させる場合、動き易いNa+が優
先的に移動し、電気的中性の条件を満たすために動きの
遅いTl+がNa+の不足分を補う形で追従する。このためTl
+濃度が元のガラス中の濃度より高くなり、しかも極め
て急激にTl+濃度の変化する不連続面をつくる場合があ
る(比較例2参照)。この不連続面は、Tl+−K+,Na+−K
+の組み合わせでも起こり得る(比較例1,2,3参照)。The three types of ions of Tl + , Na + , and K + have a large difference in mobility in glass, and Na + is very mobile. When moving monovalent cations in glass by the force of the electric field, Na +, which is easy to move, moves preferentially, and slow-moving Tl + supplements the shortage of Na + to satisfy the condition of electrical neutrality. Follow in shape. For this reason Tl
In some cases, the + concentration becomes higher than that in the original glass, and furthermore, a discontinuous surface in which the Tl + concentration changes extremely rapidly is formed (see Comparative Example 2). This discontinuity is Tl + −K + , Na + −K
It can also occur with a combination of + (see Comparative Examples 1, 2, and 3).
しかし、本発明者らの研究によると、各イオンの移動度
はその濃度によって大きく変化する。そのため、Tl+,Na
+,K+のイオン濃度を適当に選ぶことにより、電界印加イ
オン交換操作による不連続面の発生を避けることが可能
である。However, according to the research conducted by the present inventors, the mobility of each ion greatly changes depending on its concentration. Therefore, Tl + , Na
By properly selecting the ion concentration of + and K + , it is possible to avoid the generation of discontinuity due to the electric field application ion exchange operation.
電界印加イオン交換操作により不連続面が発生せず、軸
方向屈折率分布材の基板として有用な組成範囲は、次の
様になる。A discontinuous surface is not generated by the electric field application ion exchange operation, and the composition range useful as a substrate for the axial gradient index material is as follows.
まず、ガラス基板中のTl2O濃度が少なすぎると、電界印
加イオン交換後の屈折率差が小さくなると共に、Tl2Oの
直線状濃度分布形状が遅くなる傾向があるので、基板は 0.1×(Tl2O+Na2O+K2O)≦Tl2O の条件を満たす必要がある。First, if the Tl 2 O concentration in the glass substrate is too low, the refractive index difference after the electric field-applied ion exchange tends to be small, and the linear concentration distribution shape of Tl 2 O tends to be slow. The condition of (Tl 2 O + Na 2 O + K 2 O) ≦ Tl 2 O must be satisfied.
また、基板中のNa2Oが多すぎると、電界印加イオン交換
によってTl2Oの濃度分布は滑らかなものとなるが、Na2O
とK2O濃度が急激に変化し、不連続面をつくる。そのた
め 0.45×(Tl2O+Na2O+K2O)≧Na2O となることが求められる。Also, if Na 2 O in the substrate is too high, the concentration distribution of Tl 2 O by the electric field applied ion exchange is becomes smooth, Na 2 O
And K 2 O concentration change rapidly, creating a discontinuous surface. Therefore, 0.45 × (Tl 2 O + Na 2 O + K 2 O) ≧ Na 2 O is required.
さらに、基板中のK2O量が少なすぎる場合は、Tl2O濃度
が急激に変化する不連続面が発生し易くなるので 0.3×(Tl2O+Na2O+K2O)≦K2O の条件が必要となる。Furthermore, if the amount of K 2 O in the substrate is too small, a discontinuous surface where the Tl 2 O concentration changes rapidly is likely to occur, so 0.3 × (Tl 2 O + Na 2 O + K 2 O) ≤ K 2 O Is required.
以下、本発明を実施例に基づいて詳細に説明する。 Hereinafter, the present invention will be described in detail based on examples.
第1図は、電界印加イオン交換処理をおこなうための装
置の縦断面図である。図中1はガラス基板であり、この
基板1の周囲には側壁1Aが一体的に形成してあって容器
状を成している。そしてこの容器空間には、陰極側溶融
塩2Aが満たしてある。溶融塩2A中にはチタン製の円形電
極3Aが浸漬されている。なお6は溶融塩の蒸発防止のた
めの蓋板である。また、ガラス基板1の下面は、石英容
器7中に入れてある陽極側溶融塩2Bと接触している。溶
融塩2B中には白金製電極3Bが浸漬配置してある。FIG. 1 is a longitudinal sectional view of an apparatus for performing an electric field application ion exchange treatment. In the figure, 1 is a glass substrate, and a side wall 1A is integrally formed around the substrate 1 to form a container. The container space is filled with the cathode-side molten salt 2A. A circular electrode 3A made of titanium is immersed in the molten salt 2A. Reference numeral 6 is a cover plate for preventing evaporation of the molten salt. Further, the lower surface of the glass substrate 1 is in contact with the anode side molten salt 2B contained in the quartz container 7. An electrode 3B made of platinum is immersed in the molten salt 2B.
上記の装置全体をガラス基板1のガラス転移温度付近に
保持し、陰極側電極3Aが負、陽極側電極3Bが正となる様
にリード線5A,5Bを通じて直流電界を印加してイオン拡
散処理を行なう。電界印加により、陽極側溶融塩2Bから
ガラス基板下面に前述の一価陽イオンが侵入し、ガラス
基板の上面からはガラス基板中の一価陽イオンが陰極側
溶融塩2A中に追い出され、ガラス基板のイオン交換が行
なわれる。The entire apparatus described above is maintained near the glass transition temperature of the glass substrate 1, and a DC electric field is applied through the lead wires 5A and 5B so that the cathode side electrode 3A is negative and the anode side electrode 3B is positive to perform ion diffusion treatment. To do. By applying an electric field, the above-mentioned monovalent cations penetrate into the lower surface of the glass substrate from the molten salt 2B on the anode side, and the monovalent cations in the glass substrate are expelled from the upper surface of the glass substrate into the molten salt 2A on the cathode side. Ion exchange of the substrate is performed.
ガラス基板1は直径60mm,厚さ5mmの円盤状で第1表に示
す組成から成るものを使用した。As the glass substrate 1, a disk-shaped glass substrate having a diameter of 60 mm and a thickness of 5 mm and having the composition shown in Table 1 was used.
(M2Oは、Na2O,K2O,Tl2Oを表わす) 陽極側溶融塩2Bとしては硝酸カリウムの単塩、陰極側溶
融塩2Aとしては硫酸ナトリウム、硫酸カリウム、硫酸亜
鉛をそれぞれ20:20:60のモル比で混合した混塩を用い
た。 (M 2 O represents Na 2 O, K 2 O, Tl 2 O) Anode-side molten salt 2B is a single salt of potassium nitrate, and cathode-side molten salt 2A is sodium sulfate, potassium sulfate, or zinc sulfate. A mixed salt mixed in a molar ratio of: 20: 60 was used.
種々のM2O組成からなるガラス基板を用いて、第2表に
示す条件で電界印加イオン交換処理を行なった。イオン
交換処理後はガラス基板部のみを装置から取り出し、そ
のまま徐冷するか、もしくは一時的に50℃程度温度を上
げ、応力緩和を行なった後に徐冷した。Using the glass substrates having various M 2 O compositions, the electric field application ion exchange treatment was performed under the conditions shown in Table 2. After the ion exchange treatment, only the glass substrate portion was taken out of the apparatus and gradually cooled, or the temperature was temporarily raised by about 50 ° C. to relax stress and then gradually cooled.
実施例1,2,3,4,5の場合、電界印加イオン交換処理によ
って、Tl2O濃度が0.4〜3mmの厚さにわたって直線状に変
化し、かつM2O濃度の変化が滑らかで不連続面の無い軸
方向屈折率分布材を製作することができた。In the case of Examples 1, 2, 3, 4, and 5, the Tl 2 O concentration was linearly changed over the thickness of 0.4 to 3 mm by the electric field applied ion exchange treatment, and the change of the M 2 O concentration was smooth and non-uniform. It was possible to fabricate an axial gradient index material without a continuous surface.
それに対して、本発明の範囲外の組成からなるガラス基
板を用いた比較例1,2,3の場合は、1ないし2カ所の不
連続面が発生した。On the other hand, in Comparative Examples 1, 2, and 3 using the glass substrate having a composition outside the scope of the present invention, one or two discontinuous surfaces were generated.
本発明による基板ガラス材は、電界印加イオン交換処理
を行なうことによって、厚さ方向の一部又は全体にわた
ってTl2O濃度が直線状に変化す ると共に、M2O濃度分布が滑らかであり不連続面の無い
軸方向屈折率分布材とすることができる。In the substrate glass material according to the present invention, the Tl 2 O concentration changes linearly over a part or the whole of the thickness direction by performing the electric field application ion exchange treatment. In addition, the axial direction gradient index material having a smooth M 2 O concentration distribution and no discontinuous surface can be obtained.
第1図は電界印加イオン交換処理を行なうための装置の
縦断面図、第2図ないし第6図は、本発明実施例ガラス
基板の電界印加イオン交換処理後のM2O成分の厚さ方向
濃度分布を表わす図、第7図ないし第9図は本発明外の
比較例ガラス基板における上記濃度分布を表わす図であ
る。 1……ガラス基板 1A……ガラス基板側壁 2A……陰極側溶融塩 2B……陽極側溶融塩 3A……陰極 3B……陽極 4……直流電源 5A……リード線 5B……リード線 6……石英蓋 7……石英容器 8……石英リングFIG. 1 is a longitudinal sectional view of an apparatus for performing an electric field applied ion exchange treatment, and FIGS. 2 to 6 are thickness directions of M 2 O components after an electric field applied ion exchange treatment of a glass substrate of an embodiment of the present invention. FIGS. 7 to 9 are graphs showing the concentration distribution, and FIGS. 7 to 9 are graphs showing the concentration distribution on the comparative glass substrate outside the present invention. 1 …… Glass substrate 1A …… Glass substrate side wall 2A …… Cathode side molten salt 2B …… Anode side molten salt 3A …… Cathode 3B …… Anode 4 …… DC power supply 5A …… Lead wire 5B …… Lead wire 6… … Quartz lid 7 …… Quartz container 8 …… Quartz ring
Claims (1)
を、少なくとも前記イオンとは異なる1価の陽イオンを
含む溶融塩に接触させて、前記溶融塩側を陽極とする直
流電界を前記ガラス基板の両面に印加して、前記ガラス
基板の厚み方向に屈折率分布を形成する屈折率分布型レ
ンズ用母材ガラス基板の製造方法において、 前記ガラス基板はその成分として、Tl2O,Na2O,K2Oのう
ち2種以上を含み、かつこれらの成分間でモル%含有率
が、 (1) 0.1×(Tl2O+Na2O+K2O)≦Tl2O (2) 0.45×(Tl2O+Na2O+K2O)≧Na2O (3) 0.3×(Tl2O+Na2O+K2O)≦K2O なる関係を満たし、かつTl2O,Na2O,K2Oの合計量がモル
%で、 (4) 5≦(Tl2O+Na2O+K2O)≦40 であることを特徴とする屈折率分布型レンズ用母材ガラ
ス基板の製造方法。1. A single electric field of a glass substrate containing monovalent cations is brought into contact with a molten salt containing monovalent cations different from at least the ions to form a direct current electric field with the molten salt side serving as an anode. Applying to both surfaces of the glass substrate, in the method of manufacturing a base material glass substrate for gradient index lens for forming a refractive index distribution in the thickness direction of the glass substrate, the glass substrate as a component, Tl 2 O, Na 2 O or K 2 O is contained, and the mol% content between these components is (1) 0.1 × (Tl 2 O + Na 2 O + K 2 O) ≦ Tl 2 O (2) 0.45 × ( Tl 2 O + Na 2 O + K 2 O) ≧ Na 2 O (3) 0.3 × (Tl 2 O + Na 2 O + K 2 O) ≦ K 2 O, and the total amount of Tl 2 O, Na 2 O, K 2 O Is a mol%, and (4) 5 ≦ (Tl 2 O + Na 2 O + K 2 O) ≦ 40 is provided, which is a base material glass substrate for a gradient index lens.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61222715A JPH07108796B2 (en) | 1986-09-20 | 1986-09-20 | Method for manufacturing base glass substrate for gradient index lens |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61222715A JPH07108796B2 (en) | 1986-09-20 | 1986-09-20 | Method for manufacturing base glass substrate for gradient index lens |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6379738A JPS6379738A (en) | 1988-04-09 |
| JPH07108796B2 true JPH07108796B2 (en) | 1995-11-22 |
Family
ID=16786769
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61222715A Expired - Lifetime JPH07108796B2 (en) | 1986-09-20 | 1986-09-20 | Method for manufacturing base glass substrate for gradient index lens |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07108796B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4632776B2 (en) | 2004-12-24 | 2011-02-16 | オリンパス株式会社 | Cleaning brush |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5317605B2 (en) * | 1972-03-30 | 1978-06-09 | ||
| JPS5950047A (en) * | 1982-09-14 | 1984-03-22 | Nippon Sheet Glass Co Ltd | Glass composition suitable for use in manufacture of lens having refractive index distribution and wide angular aperture |
-
1986
- 1986-09-20 JP JP61222715A patent/JPH07108796B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6379738A (en) | 1988-04-09 |
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| EXPY | Cancellation because of completion of term |