JPH0684203A - Substrate for optical disk - Google Patents
Substrate for optical diskInfo
- Publication number
- JPH0684203A JPH0684203A JP4238158A JP23815892A JPH0684203A JP H0684203 A JPH0684203 A JP H0684203A JP 4238158 A JP4238158 A JP 4238158A JP 23815892 A JP23815892 A JP 23815892A JP H0684203 A JPH0684203 A JP H0684203A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- optical disk
- compound
- group
- molecule
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 30
- 239000000758 substrate Substances 0.000 title claims abstract description 25
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 27
- 239000003822 epoxy resin Substances 0.000 claims abstract description 23
- 229920000642 polymer Polymers 0.000 claims abstract description 22
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 21
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims abstract description 18
- 150000008065 acid anhydrides Chemical class 0.000 claims abstract description 17
- 150000007519 polyprotic acids Polymers 0.000 claims abstract description 17
- 229920005989 resin Polymers 0.000 claims abstract description 17
- 239000011347 resin Substances 0.000 claims abstract description 17
- 239000002253 acid Substances 0.000 claims abstract description 11
- 150000001875 compounds Chemical class 0.000 claims description 36
- 239000003795 chemical substances by application Substances 0.000 claims description 21
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 13
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 229920000728 polyester Polymers 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 5
- 238000006735 epoxidation reaction Methods 0.000 claims description 4
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 2
- CCEFMUBVSUDRLG-UHFFFAOYSA-N limonene-1,2-epoxide Chemical group C1C(C(=C)C)CCC2(C)OC21 CCEFMUBVSUDRLG-UHFFFAOYSA-N 0.000 claims description 2
- 229920000570 polyether Polymers 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 abstract description 9
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 6
- 239000001257 hydrogen Substances 0.000 abstract description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 5
- 125000002843 carboxylic acid group Chemical group 0.000 abstract description 5
- 238000010292 electrical insulation Methods 0.000 abstract 2
- 239000004848 polyfunctional curative Substances 0.000 abstract 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 24
- 239000003054 catalyst Substances 0.000 description 18
- -1 glycidyl styryl ether Chemical compound 0.000 description 14
- 239000000203 mixture Substances 0.000 description 13
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 12
- 150000001412 amines Chemical class 0.000 description 10
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 9
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 9
- 239000004593 Epoxy Substances 0.000 description 8
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 8
- 238000006297 dehydration reaction Methods 0.000 description 8
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 7
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 7
- 229920003986 novolac Polymers 0.000 description 7
- 229920000768 polyamine Polymers 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 6
- 125000001931 aliphatic group Chemical group 0.000 description 6
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
- 230000018044 dehydration Effects 0.000 description 6
- 230000001737 promoting effect Effects 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 5
- 238000005886 esterification reaction Methods 0.000 description 5
- 229940083124 ganglion-blocking antiadrenergic secondary and tertiary amines Drugs 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000007142 ring opening reaction Methods 0.000 description 5
- 229910015900 BF3 Inorganic materials 0.000 description 4
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 4
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 4
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 4
- 150000001735 carboxylic acids Chemical class 0.000 description 4
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 4
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 4
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 4
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 4
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 229920005862 polyol Polymers 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 235000014113 dietary fatty acids Nutrition 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 229930195729 fatty acid Natural products 0.000 description 3
- 239000000194 fatty acid Substances 0.000 description 3
- 150000004665 fatty acids Chemical class 0.000 description 3
- 150000002432 hydroperoxides Chemical class 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 150000004965 peroxy acids Chemical class 0.000 description 3
- 229920006122 polyamide resin Polymers 0.000 description 3
- 229920001610 polycaprolactone Polymers 0.000 description 3
- 229920005668 polycarbonate resin Polymers 0.000 description 3
- 239000004431 polycarbonate resin Substances 0.000 description 3
- 150000003077 polyols Chemical class 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 3
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- DKIDEFUBRARXTE-UHFFFAOYSA-N 3-mercaptopropanoic acid Chemical compound OC(=O)CCS DKIDEFUBRARXTE-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- AWMVMTVKBNGEAK-UHFFFAOYSA-N Styrene oxide Chemical compound C1OC1C1=CC=CC=C1 AWMVMTVKBNGEAK-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 235000011054 acetic acid Nutrition 0.000 description 2
- 229920006243 acrylic copolymer Polymers 0.000 description 2
- 239000001361 adipic acid Substances 0.000 description 2
- 235000011037 adipic acid Nutrition 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 229920006026 co-polymeric resin Polymers 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 2
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 2
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 2
- QXYJCZRRLLQGCR-UHFFFAOYSA-N dioxomolybdenum Chemical compound O=[Mo]=O QXYJCZRRLLQGCR-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- DNJIEGIFACGWOD-UHFFFAOYSA-N ethanethiol Chemical compound CCS DNJIEGIFACGWOD-UHFFFAOYSA-N 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- DPBLXKKOBLCELK-UHFFFAOYSA-N pentan-1-amine Chemical compound CCCCCN DPBLXKKOBLCELK-UHFFFAOYSA-N 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920002857 polybutadiene Polymers 0.000 description 2
- 229920001748 polybutylene Polymers 0.000 description 2
- 239000004632 polycaprolactone Substances 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- SUVIGLJNEAMWEG-UHFFFAOYSA-N propane-1-thiol Chemical compound CCCS SUVIGLJNEAMWEG-UHFFFAOYSA-N 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 2
- 150000003573 thiols Chemical class 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- CFQZKFWQLAHGSL-FNTYJUCDSA-N (3e,5e,7e,9e,11e,13e,15e,17e)-18-[(3e,5e,7e,9e,11e,13e,15e,17e)-18-[(3e,5e,7e,9e,11e,13e,15e)-octadeca-3,5,7,9,11,13,15,17-octaenoyl]oxyoctadeca-3,5,7,9,11,13,15,17-octaenoyl]oxyoctadeca-3,5,7,9,11,13,15,17-octaenoic acid Chemical compound OC(=O)C\C=C\C=C\C=C\C=C\C=C\C=C\C=C\C=C\OC(=O)C\C=C\C=C\C=C\C=C\C=C\C=C\C=C\C=C\OC(=O)C\C=C\C=C\C=C\C=C\C=C\C=C\C=C\C=C CFQZKFWQLAHGSL-FNTYJUCDSA-N 0.000 description 1
- XBTRYWRVOBZSGM-UHFFFAOYSA-N (4-methylphenyl)methanediamine Chemical compound CC1=CC=C(C(N)N)C=C1 XBTRYWRVOBZSGM-UHFFFAOYSA-N 0.000 description 1
- DTCCVIYSGXONHU-CJHDCQNGSA-N (z)-2-(2-phenylethenyl)but-2-enedioic acid Chemical compound OC(=O)\C=C(C(O)=O)\C=CC1=CC=CC=C1 DTCCVIYSGXONHU-CJHDCQNGSA-N 0.000 description 1
- NWRZGFYWENINNX-UHFFFAOYSA-N 1,1,2-tris(ethenyl)cyclohexane Chemical compound C=CC1CCCCC1(C=C)C=C NWRZGFYWENINNX-UHFFFAOYSA-N 0.000 description 1
- KYVBNYUBXIEUFW-UHFFFAOYSA-N 1,1,3,3-tetramethylguanidine Chemical compound CN(C)C(=N)N(C)C KYVBNYUBXIEUFW-UHFFFAOYSA-N 0.000 description 1
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 1
- BPXVHIRIPLPOPT-UHFFFAOYSA-N 1,3,5-tris(2-hydroxyethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound OCCN1C(=O)N(CCO)C(=O)N(CCO)C1=O BPXVHIRIPLPOPT-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- AUTBTTGBSQUMMR-UHFFFAOYSA-N 1,6-bis(ethenyl)-7-oxabicyclo[4.1.0]hepta-2,4-diene Chemical compound C1=CC=CC2(C=C)C1(C=C)O2 AUTBTTGBSQUMMR-UHFFFAOYSA-N 0.000 description 1
- AFFLGGQVNFXPEV-UHFFFAOYSA-N 1-decene Chemical compound CCCCCCCCC=C AFFLGGQVNFXPEV-UHFFFAOYSA-N 0.000 description 1
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- XYPISWUKQGWYGX-UHFFFAOYSA-N 2,2,2-trifluoroethaneperoxoic acid Chemical compound OOC(=O)C(F)(F)F XYPISWUKQGWYGX-UHFFFAOYSA-N 0.000 description 1
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Landscapes
- Epoxy Resins (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、光信号を高速、高密度
に記録、再生する光デイスク記録媒体用基板、さらに詳
しくは、低複屈折性、耐熱性に優れた光デイスク用基板
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate for an optical disc recording medium which records and reproduces an optical signal at a high speed and a high density, and more particularly to a substrate for an optical disc excellent in low birefringence and heat resistance.
【0002】[0002]
【従来の技術】高密度記録媒体である光デイスクは再生
用のもの、光により記録可能なもの、記録と書込みが可
能なものなどに分類される。2. Description of the Related Art Optical disks, which are high density recording media, are classified into those for reproduction, those which can be recorded by light, those which can be recorded and written.
【0003】これら光デイスクは (1)大容量である (2)記録デ−タの長期記録保存が可能である (3)非接触で記録再生が可能である (4)他の情報機器システムとの適合性がある などの特徴を有しており、今後の情報化社会においては
不可欠なものとして成長が期待されるものである。These optical disks have (1) large capacity (2) long-term recording / storing of recording data (3) non-contact recording / reproducing (4) other information equipment system It is expected to grow as an indispensable element in the information society of the future.
【0004】これら光デイスク基板用材料としてはアク
リル樹脂(PMMA)やポリカ−ボネ−ト樹脂(PC)
が現在用いられている。Acrylic resin (PMMA) and polycarbonate resin (PC) are used as materials for these optical disk substrates.
Is currently used.
【0005】一般的に光デイスク基板用の材料として要
求される性能としては (1)光透過性に優れていること (2)複屈折率が小さいこと (3)透湿性が少ないこと (4)耐熱性が良好であること (5)成形性、生産性、機械的強度、表面硬度などに優
れていること などがある。Generally, the performance required as a material for an optical disk substrate is (1) excellent light transmittance (2) low birefringence (3) low moisture permeability (4) Good heat resistance (5) Excellent moldability, productivity, mechanical strength, surface hardness, etc.
【0006】上記材料の中でアクリル樹脂は吸湿性を有
しているためソリが生じること、耐熱性に欠けること、
ポリカ−ボネ−ト樹脂は吸湿性、耐熱性には優れている
が分子構造に起因する大きな複屈折率を有し、流動性が
悪く、成形性が悪いという欠点がある。Among the above materials, acrylic resin has hygroscopicity, so warping occurs and heat resistance is lacking.
Polycarbonate resins have excellent hygroscopicity and heat resistance, but have a large birefringence due to the molecular structure, poor flowability, and poor moldability.
【0007】これらの欠点を改良した信頼性の高い材料
としてエポキシ樹脂がある。Epoxy resin is a highly reliable material in which these drawbacks have been improved.
【0008】光デイスク用エポキシ樹脂としてはビスフ
ェノ−ルA、ビスフェノ−ルF、ノボラック樹脂、水添
ビスフェノ−ルFなどの多価アルコ−ル類とエピクロル
ヒドリンを反応させたグリシジルエ−テル型の樹脂、お
よび脂環型エポキシ樹脂がある。Epoxy resins for optical disks include glycidyl ether type resins obtained by reacting polychloroalcohol such as bisphenol A, bisphenol F, novolac resin, hydrogenated bisphenol F and epichlorohydrin, And alicyclic epoxy resins.
【0009】[0009]
【発明が解決しようとする課題】しかし、ノボラック樹
脂のグリシジルエ−テルを用いた硬化物は耐熱性は高い
が色相が悪く、一方他のグリシジルエ−テル型のエポキ
シ樹脂を用いた硬化物は充分な耐熱性が得られなかっ
た。また、ベンゼン環を主骨格とするため複屈折性も満
足できるものではない。However, a cured product of glycidyl ether of novolak resin has high heat resistance but poor hue, while a cured product of other glycidyl ether type epoxy resin is sufficient. Heat resistance was not obtained. Further, since the main skeleton is a benzene ring, birefringence is not satisfactory.
【0010】一方、脂環型エポキシ樹脂は本質的に塩素
を含まず、グリシジルエ−テル型のエポキシ樹脂に比べ
耐熱性、透明性、電気特性に優れているが、耐熱性が充
分でない。本発明は耐熱性、透明性、電気特性、複屈折
性に優れた光デイスク用基板を提供するものである。On the other hand, the alicyclic epoxy resin essentially does not contain chlorine and is superior in heat resistance, transparency and electric characteristics to the glycidyl ether type epoxy resin, but the heat resistance is not sufficient. The present invention provides a substrate for an optical disc which is excellent in heat resistance, transparency, electric characteristics and birefringence.
【0011】また、用いる(a)、(b)、(c)をい
ろいろ組み合わせることによってエポキシ樹脂の特性を
変えることができ、幅広い特性を与えることができるこ
とが明らかになった。Further, it has been clarified that the characteristics of the epoxy resin can be changed by giving various combinations of (a), (b) and (c) to be used, and a wide range of characteristics can be given.
【0012】[0012]
【課題を解決するための手段】本発明は、(a)1分子
中に1個以上のビニル基と1個のエポキシ基を有する化
合物と、(b)多塩基酸無水物、多塩基酸、酸末端重合
体、およびカルボン酸基を含有する重合体から選ばれた
少なくとも1種と、(c)1個以上の活性水素を有する
化合物から選ばれた少なくとも1種を反応させて得られ
る、ビニル基を有する樹脂を、さらにエポキシ化して得
られるエポキシ樹脂とエポキシ樹脂用硬化剤を主成分と
する事を特徴とする光デイスク用基板に関するものであ
る。The present invention comprises (a) a compound having at least one vinyl group and one epoxy group in one molecule, (b) a polybasic acid anhydride, a polybasic acid, Vinyl obtained by reacting at least one selected from acid-terminated polymers and polymers containing carboxylic acid groups with at least one selected from (c) compounds having one or more active hydrogens. The present invention relates to a substrate for an optical disk, which comprises an epoxy resin obtained by further epoxidizing a resin having a group and a curing agent for the epoxy resin as main components.
【0013】次に、本発明について、さらに詳しく説明
する。Next, the present invention will be described in more detail.
【0014】本発明で用いる1分子中に1個のエポキシ
基と1個以上のビニル基を有する化合物は、(IV) 《iは1から5の整数、R1 、R4 は水素原子または炭
素数が1から50のアルキル基または置換フェニル基、
R2 、R3 は水素原子または炭素数が1から50のアル
キル基であり、R2 、R3 は環を巻いていてもよい》で
表される。The compound having one epoxy group and one or more vinyl groups in one molecule used in the present invention is (IV) << i is an integer of 1 to 5, R 1 and R 4 are hydrogen atoms or alkyl groups having 1 to 50 carbon atoms or substituted phenyl groups,
R 2 and R 3 are each a hydrogen atom or an alkyl group having 1 to 50 carbon atoms, and R 2 and R 3 may be wrapped around a ring.
【0015】(IV)で表される化合物の例は、以下に示す
ような化合物である。Examples of the compound represented by (IV) are the compounds shown below.
【0016】4−ビニルシクロヘキセン−1−オキシ
ド、5−ビニルビシクロ[2.2.1]ヘプト−2−エ
ン−2−オキシド、リモネンモノオキシド、トリビニル
シクロヘキサンモノオキシド、ジビニルベンゼンモノオ
キシド、ブタジエンモノオキシドや1,2−エポキシ−
9−デセンなどの(I)で表される化合物、アリルグリシ
ジ ルエーテルなどの(II)で表される化合物、グリシジ
ルスチリルエーテルなどの化合物などである。4-vinylcyclohexene-1-oxide, 5-vinylbicyclo [2.2.1] hept-2-ene-2-oxide, limonene monoxide, trivinylcyclohexane monoxide, divinylbenzene monoxide, butadiene mono Oxide and 1,2-epoxy-
Examples include compounds represented by (I) such as 9-decene, compounds represented by (II) such as allyl glycidyl ether, and compounds such as glycidyl styryl ether.
【0017】さらに、以下の化合物なども用いることが
できる。Further, the following compounds can also be used.
【0018】[0018]
【化1】 [Chemical 1]
【化2】 [Chemical 2]
【化3】 [Chemical 3]
【化4】 これらは、それぞれ単独で用いても、2種以上を同時に
用いてもよい。[Chemical 4] These may be used alone or in combination of two or more.
【0019】また、必要に応じて、エチレンオキシド、
プロピレンオキシド、シクロヘキセンオキシド、スチレ
ンオキシド、α−オレフィンエポキシドなどのモノエポ
キシドや、ビニルシクロヘキセンジオキシド、3,4−
エポキシシクロヘキシルメチル−3,4−エポキシシク
ロヘキシルカルボキシレートなどのジエポキシドなど
を、上記の1分子中に1個のエポキシ基と1個以上のビ
ニル基を有する化合物と同時に用いてもよい。If necessary, ethylene oxide,
Propylene oxide, cyclohexene oxide, styrene oxide, monoepoxides such as α-olefin epoxide, vinyl cyclohexene dioxide, 3,4-
A diepoxide such as epoxycyclohexylmethyl-3,4-epoxycyclohexylcarboxylate may be used at the same time as the compound having one epoxy group and one or more vinyl groups in one molecule.
【0020】さらに、本発明で用いる(b)多塩基酸無
水物または多塩基酸としては、芳香族多塩基酸およびそ
の酸無水物や脂肪族多塩基酸およびその酸無水物があ
る。芳香族多塩基酸およびその酸無水物の例としては、
無水フタル酸、イソフタル酸、テレフタル酸、無水トリ
メリット酸などがある。また、脂肪族多塩基酸およびそ
の酸無水物としては、テトラヒドロフタル酸、4−メチ
ルヘキサヒドロフタル酸、ヘキサヒドロフタル酸、アジ
ピン酸、マレイン酸、およびそれらの酸無水物、フマル
酸、セバシン酸、ドデカン2酸、およびそれらの酸無水
物などがある。The polybasic acid anhydrides or polybasic acids (b) used in the present invention include aromatic polybasic acids and acid anhydrides thereof, and aliphatic polybasic acids and acid anhydrides thereof. Examples of aromatic polybasic acids and acid anhydrides thereof include:
Examples include phthalic anhydride, isophthalic acid, terephthalic acid and trimellitic anhydride. Examples of the aliphatic polybasic acid and its acid anhydride include tetrahydrophthalic acid, 4-methylhexahydrophthalic acid, hexahydrophthalic acid, adipic acid, maleic acid, and their acid anhydrides, fumaric acid and sebacic acid. , Dodecane diacid, and their acid anhydrides.
【0021】また、本発明で用いる酸末端重合体として
は、ポリエチレングリコールやポリプロピレングリコー
ルやポリテトラメチレングリコールやポリブチレングリ
コールやポリシクロヘキセングリコールやポリビニルシ
クロヘキセングリコールなどに多塩基酸を反応させた酸
末端ポリエーテル、酸末端ポリエステル、酸末端ポリブ
タジエン、酸末端ポリカプロラクトンなどがある。The acid-terminated polymer used in the present invention is an acid-terminated polymer obtained by reacting a polybasic acid with polyethylene glycol, polypropylene glycol, polytetramethylene glycol, polybutylene glycol, polycyclohexene glycol, polyvinyl cyclohexene glycol or the like. Examples include ethers, acid-terminated polyesters, acid-terminated polybutadienes and acid-terminated polycaprolactones.
【0022】また、酸末端重合体のかわりにカルボン酸
基を有するアクリル共重合体なども使用することがで
き、多塩基酸無水物、多塩基酸、酸末端重合体、および
カルボン酸基を含有する重合体は単独で用いても、2種
以上を併用してもよい。Further, an acrylic copolymer having a carboxylic acid group can be used instead of the acid terminal polymer, and it contains a polybasic acid anhydride, a polybasic acid, an acid terminal polymer, and a carboxylic acid group. These polymers may be used alone or in combination of two or more.
【0023】次に、本発明で用いる(c)活性水素を有
する化合物としては、アルコ−ル類、フェノ−ル類、カ
ルボン酸類、アミン類、チオ−ル類、水酸基末端重合
体、および水酸基を含有する重合体等があげられる。ア
ルコ−ル類としては1価、2価、3価以上のものであ
り、例えば、メタノ−ル、エタノ−ル、ベンジルアルコ
−ル、エチレングリコール、プロピレングリコール、ジ
エチレングリコール、ジプロピレングリコール、ブタン
ジオール、ヘキサンジオール、グリセリン、ブタントリ
オール、トリメチロールエタン、トリメチロールプロパ
ン、ペンタエリスリトール、ジグリセロール、トリグリ
セロールなどがあげられる。その他、ネオペンチルグリ
コール、ヒドロキシヒバリン酸のネオペンチルグリコー
ルエステル、ジペンタエリスリトール、1,4−シクロ
ヘキサンジメタノール、トリメチルペンタンジオール、
1,3,5−トリス(2−ヒドロキシエチル)シアヌル
酸、水添ビスフェノールA、水添ビスフェノールAのエ
チレンオキシド付加物、ビスフェノールAのプロピレン
オキシド付加物なども用いることができる。Next, as the compound (c) having active hydrogen used in the present invention, alcohols, phenols, carboxylic acids, amines, thiols, hydroxyl-terminated polymers, and hydroxyl groups can be used. The polymer etc. which are contained are mentioned. The alcohols are monovalent, divalent, trivalent or higher, and include, for example, methanol, ethanol, benzyl alcohol, ethylene glycol, propylene glycol, diethylene glycol, dipropylene glycol, butanediol, Examples include hexanediol, glycerin, butanetriol, trimethylolethane, trimethylolpropane, pentaerythritol, diglycerol, triglycerol and the like. In addition, neopentyl glycol, neopentyl glycol ester of hydroxyhivalic acid, dipentaerythritol, 1,4-cyclohexanedimethanol, trimethylpentanediol,
1,3,5-Tris (2-hydroxyethyl) cyanuric acid, hydrogenated bisphenol A, hydrogenated bisphenol A ethylene oxide adduct, bisphenol A propylene oxide adduct and the like can also be used.
【0024】フェノ−ル類としては、フェノ−ル、クレ
ゾ−ル、カテコ−ル、ピロガロ−ル、ハイドロキノン、
ハイドロキノンモノメチルエ−テル、ビスフェノ−ル
A、ビスフェノ−ルF、4,4´−ジヒドロキシベンゾ
フェノン、ビスフェノ−ルS、ビスフェノ−ルAのエチ
レンオキシド付加物、ビスフェノ−ルAのプロピオンオ
キシド付加物、フェノ−ル樹脂、クレゾ−ルノボラック
樹脂等がある。Examples of the phenols include phenol, cresol, catechol, pyrogallol, hydroquinone,
Hydroquinone monomethyl ether, bisphenol A, bisphenol F, 4,4'-dihydroxybenzophenone, bisphenol S, ethylene oxide adduct of bisphenol A, propione oxide adduct of bisphenol A, phenol Resin and cresol-novolak resin.
【0025】本発明で用いる水酸基末端重合体として
は、ポリエチレングリコール、ポリプロピレングリコー
ル、ポリテトラメチレングリコール、ポリブチレングリ
コール、ポリシクロヘキセングリコール、ポリビニルシ
クロヘキセングリコールなどのポリエーテルポリオー
ル、水酸基末端ポリエステル、水酸基末端ポリブタジエ
ン、水酸基末端ポリカプロラクトン、ポリカーボネート
ジオールなどがある。 また、水酸基末端重合体のかわ
りに水酸基を有するアクリル共重合体なども使用するこ
とができる。Examples of the hydroxyl group-terminated polymer used in the present invention include polyether polyols such as polyethylene glycol, polypropylene glycol, polytetramethylene glycol, polybutylene glycol, polycyclohexene glycol and polyvinyl cyclohexene glycol, hydroxyl group terminated polyesters, hydroxyl group terminated polybutadiene, Examples include hydroxyl-terminated polycaprolactone and polycarbonate diol. Further, an acrylic copolymer having a hydroxyl group or the like can be used instead of the hydroxyl group-terminated polymer.
【0026】カルボン酸類としてはギ酸、酢酸、プロピ
オン酸、酪酸、動植物油の脂肪酸、フマル酸、マレイン
酸、アジピン酸、ドデカン2酸、トリメリット酸、ピロ
メリット酸、ポリアクリル酸、フタル酸、イソフタル
酸、テレフタル酸等がある。As carboxylic acids, formic acid, acetic acid, propionic acid, butyric acid, fatty acids of animal and vegetable oils, fumaric acid, maleic acid, adipic acid, dodecane diacid, trimellitic acid, pyromellitic acid, polyacrylic acid, phthalic acid, isophthalic acid. Acid, terephthalic acid, etc.
【0027】また,乳酸、クエン酸、オキシカプロン酸
等、水酸基とカルボン酸を共に有する化合物もあげられ
る。Further, compounds having both a hydroxyl group and a carboxylic acid, such as lactic acid, citric acid and oxycaproic acid, can also be mentioned.
【0028】アミン類としてはモノメチルアミン、ジメ
チルアミン、モノエチルアミン、ジエチルアミン、プロ
ピルアミン、モノブチルアミン、ジブチルアミン、ペン
チルアミン、ヘキシルアミン、シクロヘキシルアミン、
オクチルアミン、ドデシルアミン、4,4´−ジアミノ
ジフェニルメタン、イソホロンジアミン、トルエンジア
ミン、ヘキサメチレンジアミン、キシレンジアミン、ジ
エチレントリアミン、トリエチレンテトラミン、エタノ
ールアミン等がある。The amines include monomethylamine, dimethylamine, monoethylamine, diethylamine, propylamine, monobutylamine, dibutylamine, pentylamine, hexylamine, cyclohexylamine,
Octylamine, dodecylamine, 4,4'-diaminodiphenylmethane, isophoronediamine, toluenediamine, hexamethylenediamine, xylenediamine, diethylenetriamine, triethylenetetramine, ethanolamine and the like.
【0029】チオール類としてはメチルメルカプタン、
エチルメルカプタン、プロピルメルカプタン、フェニル
メルカプタン等のメルカプト類、メルカプトプロピオン
酸あるいはメルカプトプロピオン酸の多価アルコールエ
ステル、例えばエチレングリコールジメルカプトプロピ
オン酸エステル、トリメチロールプロパントリメルカプ
トプロピオン酸、ペンタエリスリトールペンタメルカプ
トプロピオン酸等があげられる。As the thiols, methyl mercaptan,
Mercapto such as ethyl mercaptan, propyl mercaptan, phenyl mercaptan, mercaptopropionic acid or polyhydric alcohol ester of mercaptopropionic acid, for example, ethylene glycol dimercaptopropionic acid ester, trimethylolpropane trimercaptopropionic acid, pentaerythritol pentamercaptopropionic acid, etc. Can be given.
【0030】さらにその他、活性水素を有する化合物と
してはポリビニルアルコール、ポリ酢酸ビニル部分加水
分解物、デンプン、セルロース、セルロースアセテー
ト、セルロースアセテートブチレート、ヒドロキシエチ
ルセルロース、アクリルポリオール樹脂、スチレンアリ
ルアルコール共重合樹脂、スチレン−マレイン酸共重合
樹脂、アルキッド樹脂、ポリエステルポリオール樹脂、
ポリエステルカルボン酸樹脂、ポリカプロラクトンポリ
オール樹脂、ポリプロピレンポリオール、ポリテトラメ
チレングリコール等がある。Further, as the compound having active hydrogen, polyvinyl alcohol, polyvinyl acetate partial hydrolyzate, starch, cellulose, cellulose acetate, cellulose acetate butyrate, hydroxyethyl cellulose, acrylic polyol resin, styrene allyl alcohol copolymer resin, Styrene-maleic acid copolymer resin, alkyd resin, polyester polyol resin,
Examples include polyester carboxylic acid resins, polycaprolactone polyol resins, polypropylene polyols, polytetramethylene glycol, and the like.
【0031】また、活性水素を有する化合物は、その骨
格中に不飽和2重結合を有していても良く、具体例とし
ては、アリルアルコール、アクリル酸、メタクリル酸、
2−ヒドロキシエチルメタクリレート、3−シクロヘキ
センメタノール、テトラヒドロフタル酸等がある。The compound having active hydrogen may have an unsaturated double bond in its skeleton, and specific examples thereof include allyl alcohol, acrylic acid, methacrylic acid,
There are 2-hydroxyethyl methacrylate, 3-cyclohexenemethanol, tetrahydrophthalic acid and the like.
【0032】これら活性水素を有する化合物であればど
のようなものでも用いることができ、それらは2種以上
を混合してもよい。Any compound having these active hydrogens can be used, and two or more kinds thereof may be mixed.
【0033】本発明で用いるエポキシ樹脂は、上記1分
子中に1個以上のビニル基と1個のエポキシ基を有する
化合物(a)と、多塩基酸無水物、多塩基酸、酸末端重
合体、およびカルボン酸基を含有する重合体(b)から
選ばれた少なくとも1種と、活性水素を有する化合物
(c)から選ばれた少なくとも1種を反応させて得られ
るビニル基を有する樹脂をさらにエポキシ化剤でエポキ
シ化して得られる。The epoxy resin used in the present invention is a compound (a) having at least one vinyl group and one epoxy group in the above molecule, a polybasic acid anhydride, a polybasic acid, and an acid terminal polymer. And a vinyl group-containing resin obtained by reacting at least one selected from the polymer (b) containing a carboxylic acid group and at least one selected from the compound (c) having active hydrogen. Obtained by epoxidation with an epoxidizing agent.
【0034】上記出発原料である(a)、(b)、
(c)の仕込み比率は(a)を1〜99重量部、好まし
くは、30〜80部、(b)を99〜1重量部、好まし
くは20〜70部、(c)を0〜99重量部、好ましく
は、0〜30部とする。The starting materials (a), (b),
The charging ratio of (c) is 1 to 99 parts by weight of (a), preferably 30 to 80 parts, 99 to 1 part by weight of (b), preferably 20 to 70 parts, and 0 to 99 parts by weight of (c). Parts, preferably 0 to 30 parts.
【0035】(c)成分は場合によっては使用しなくて
も良い。(c)成分を使用しない場合、反応時間、減圧
度、反応温度などをコントロ−ルすることにより脱水量
を検知しながら分子量をコントロ−ルすることが必要で
ある。The component (c) may not be used depending on the case. When the component (c) is not used, it is necessary to control the molecular weight while detecting the dehydration amount by controlling the reaction time, the degree of reduced pressure, the reaction temperature and the like.
【0036】(a)成分のしよう量が相対的に少ない場
合は、目的とするエポキシ樹脂中のエポキシ基含有量が
少なくなる。(a)成分/(b)成分のモル比率は、
0.4〜5.0,好ましくは、0.5〜3.0である。When the amount of the component (a) used is relatively small, the epoxy group content in the target epoxy resin is small. The molar ratio of component (a) / component (b) is
It is 0.4 to 5.0, preferably 0.5 to 3.0.
【0037】(a)成分の比率が高くなると末端が水酸
基となる割合が多くなり、水酸基とカルボキシル基末端
がある場合では脱水反応が進むにつれ全部の末端が水酸
基となる。When the proportion of component (a) is high, the proportion of hydroxyl groups at the terminals increases, and when there are hydroxyl groups and carboxyl group terminals, all the terminals become hydroxyl groups as the dehydration reaction proceeds.
【0038】逆に、(b)成分の比率が高くなると末端
がカルボキシル基となる割合が多くなり、水酸基末端と
カルボキシル基末端がある場合では、脱水反応が進むに
つれ全部の末端がカルボキシル基となる。但し、(a)
成分の比率は必要以上に多くなると(a)成分の一部が
反応せずに残ってしまう。また、(b)成分の比率が必
要以上に多くなると、(b)成分が反応せずに残ってし
まう。On the contrary, when the ratio of the component (b) is high, the ratio of the terminal being a carboxyl group is large, and when the terminal of the hydroxyl group and the terminal of the carboxyl group are present, all the terminals become the carboxyl groups as the dehydration reaction proceeds. . However, (a)
If the ratio of the components is unnecessarily large, part of the component (a) will remain unreacted. Further, when the ratio of the component (b) becomes unnecessarily large, the component (b) remains without reacting.
【0039】ビニル基を有する樹脂を合成する反応にお
いては、カルボキシル基によるエポキシ基の開環反応を
促進する触媒と、必要に応じて、(脱水)エステル化反
応を促進する触媒を併用してもよい。In the reaction for synthesizing the resin having a vinyl group, a catalyst for promoting the ring-opening reaction of the epoxy group by the carboxyl group and, if necessary, a catalyst for promoting the (dehydration) esterification reaction may be used in combination. Good.
【0040】本発明で用い得るカルボキシル基によるエ
ポキシ基の開環反応を促進する触媒としては、ジメチル
ベンジルアミン、トリエチルアミン、テトラメチルエチ
レンジアミン、トリ−n−オクチルアミンなどの3級ア
ミン、テトラメチルアンモニウムクロライド、テトラメ
チルアンモニウムブロマイド、テトラブチルアンモニウ
ムブロマイドなどの4級アンモニウム塩、テトラメチル
尿素などのアルキル尿素、テトラメチルグアニジンなど
のアルキルグアニジンなどをあげることができる。As the catalyst for promoting the ring-opening reaction of an epoxy group with a carboxyl group which can be used in the present invention, a tertiary amine such as dimethylbenzylamine, triethylamine, tetramethylethylenediamine, tri-n-octylamine, or tetramethylammonium chloride is used. , Quaternary ammonium salts such as tetramethylammonium bromide and tetrabutylammonium bromide, alkylureas such as tetramethylurea, and alkylguanidines such as tetramethylguanidine.
【0041】また、本発明で用い得る開環反応を促進す
る触媒は単独で用いても、2種類以上を併用してもよ
い。この触媒はエポキシ化合物に対して0.1〜5.0
重量%、好ましくは、0.5〜3.0重量%、用いるの
がよい。この開環反応は50〜200℃、好ましくは、
100〜180℃で行う。The catalyst for promoting the ring-opening reaction that can be used in the present invention may be used alone or in combination of two or more kinds. This catalyst is 0.1 to 5.0 relative to the epoxy compound.
%, Preferably 0.5 to 3.0% by weight. The ring-opening reaction is 50 to 200 ° C, preferably
It is carried out at 100 to 180 ° C.
【0042】また、本発明で用い得る(脱水)エステル
化反応を促進する触媒としては、オクチル酸スズ、ジブ
チルスズラウレートなどのSn化合物、テトラブチルチ
タネートなどのTi化合物などがあげられる。Examples of the catalyst for promoting the (dehydration) esterification reaction that can be used in the present invention include Sn compounds such as tin octylate and dibutyltin laurate, and Ti compounds such as tetrabutyl titanate.
【0043】また、本発明で用い得る(脱水)エステル
化反応を促進する触媒は単独で用いても、2種類以上を
併用してもよい。この触媒は反応系に対して0〜100
0ppm、好ましくは、50〜500ppm用いるのが
よい。The catalyst for promoting the (dehydration) esterification reaction used in the present invention may be used alone or in combination of two or more kinds. This catalyst is 0-100 with respect to the reaction system.
It is recommended to use 0 ppm, preferably 50 to 500 ppm.
【0044】この(脱水)エステル化反応は180〜2
40℃で行う。This (dehydration) esterification reaction is 180 to 2
Perform at 40 ° C.
【0045】カルボキシル基によるエポキシ基の開環反
応と(脱水)エステル化反応を順次行ってもよいが、原
料と触媒を一括仕込みした後、反応温度を反応の進行に
応じて段階的に上昇させる方法が望ましい。また、必要
に応じて(c)成分と触媒を一括仕込みした後、
(a)、(b)成分を滴下しても良い。Although the ring-opening reaction of the epoxy group with the carboxyl group and the (dehydration) esterification reaction may be carried out in sequence, the reaction temperature is raised stepwise in accordance with the progress of the reaction after the raw materials and the catalyst have been charged all at once. Method is preferred. If necessary, after the component (c) and the catalyst are charged at once,
The components (a) and (b) may be dropped.
【0046】さて、このようにして合成された環状オレ
フィンまたはビニル基を有する樹脂にエポキシ化剤を作
用させて、本発明のエポキシ基を有する樹脂を合成する
わけであるが、用い得るエポキシ化剤としては過酸類、
ハイドロパーオキサイド類などをあげることができる。The resin having a cyclic olefin or vinyl group thus synthesized is reacted with an epoxidizing agent to synthesize the resin having an epoxy group of the present invention. As peracids,
Examples thereof include hydroperoxides.
【0047】過酸類としては過ギ酸、過酢酸、過安息香
酸、トリフルオロ過酢酸などがある。 このうち、過酢
酸は工業的に大量に製造されており、安価に入手でき、
安定度も高いので好ましいエポキシ化剤である。Examples of peracids include formic acid, peracetic acid, perbenzoic acid and trifluoroperacetic acid. Of these, peracetic acid is industrially produced in large quantities and is available at low cost.
It is also a preferred epoxidizing agent because of its high stability.
【0048】ハイドロパーオキサイド類としては過酸化
水素、ターシャリブチルハイドロパーオキサイド、クメ
ンパーオキサイド等がある。Hydroperoxides include hydrogen peroxide, tertiary butyl hydroperoxide, cumene peroxide and the like.
【0049】エポキシ化の際には必要に応じて触媒を用
いることができる。In the epoxidation, a catalyst can be used if necessary.
【0050】例えば、過酸の場合、炭酸ソーダ等のアル
カリや硫酸などの酸を触媒として用い得る。For example, in the case of peracid, an alkali such as sodium carbonate or an acid such as sulfuric acid can be used as a catalyst.
【0051】また、ハイドロパーオキサイド類の場合、
タングステン酸と苛性ソーダの混合物を過酸化水素と、
あるいは有機酸を過酸化水素と、あるいはモリブデンヘ
キサカルボニルをターシャリブチルハイドロパーオキサ
イドと併用して触媒効果を得ることができる。In the case of hydroperoxides,
A mixture of tungstic acid and caustic soda with hydrogen peroxide,
Alternatively, a catalytic effect can be obtained by using an organic acid in combination with hydrogen peroxide or molybdenum hexacarbonyl in combination with tertiary butyl hydroperoxide.
【0052】エポキシ化反応は、装置や原料物性に応じ
て溶媒使用の有無や反応温度を調節して行う。The epoxidation reaction is carried out by adjusting the presence or absence of a solvent and the reaction temperature according to the physical properties of the equipment and raw materials.
【0053】用いるエポキシ化剤の反応性によって使用
できる反応温度域は定まる。The reaction temperature range that can be used depends on the reactivity of the epoxidizing agent used.
【0054】好ましいエポキシ化剤である過酢酸につい
ていえば0〜70℃が好ましい。Regarding the preferred epoxidizing agent, peracetic acid, 0 to 70 ° C. is preferable.
【0055】0℃以下では反応が遅く、70℃では過酢
酸の分解がおきる。The reaction is slow below 0 ° C., and the decomposition of peracetic acid occurs at 70 ° C.
【0056】また、ハイドロパーオキサイドの1例であ
るターシャリブチルハイドロパーオキサイド/モリブデ
ン二酸化物ジアセチルアセトナート系では同じ理由で2
0℃〜150℃が好ましい。In the tertiary butyl hydroperoxide / molybdenum dioxide diacetylacetonate system, which is an example of hydroperoxide, 2 is used for the same reason.
0 degreeC-150 degreeC is preferable.
【0057】溶媒は、原料粘度の低下、エポキシ化剤の
希釈による安定化などの目的で使用することができる。
過酢酸の場合であれば芳香族化合物、エーテル類、エス
テル類などを用いることができる。The solvent can be used for the purpose of reducing the viscosity of the raw material and stabilizing it by diluting the epoxidizing agent.
In the case of peracetic acid, aromatic compounds, ethers, esters and the like can be used.
【0058】不飽和結合に対するエポキシ化剤の仕込み
モル比は不飽和結合をどれくらい残存させたいかなどの
目的に応じて変化させることができる。The charged molar ratio of the epoxidizing agent to the unsaturated bond can be changed according to the purpose such as how much unsaturated bond is desired to remain.
【0059】エポキシ基が多い化合物が目的の場合、エ
ポキシ化剤は不飽和基に対して等モルかそれ以上加える
のが好ましい。When a compound having a large number of epoxy groups is intended, the epoxidizing agent is preferably added in an equimolar amount or more with respect to the unsaturated group.
【0060】ただし、経済性、および副反応の問題から
2倍モルを越えることは通常不利であり、過酢酸の場合
1〜1.5倍モルが好ましい。However, it is usually disadvantageous that the amount exceeds 2 times the molar amount in view of economical efficiency and side reactions. In the case of peracetic acid, the molar amount is preferably 1 to 1.5 times.
【0061】目的の組成物は濃縮などの化学工学的手段
によって反応粗液から取り出すことができる。The composition of interest can be removed from the crude reaction liquid by chemical engineering means such as concentration.
【0062】また、本発明に用いるエポキシ樹脂は、組
成物の特性を損なわない限り、他のエポキシ樹脂と混合
して用いることができる。ここで、他のエポキシ樹脂と
は、一般に用いられているものであれば何でも良いが、
例えばエピビス型エポキシ、ビスフェノ−ルFエポキ
シ、ノボラックエポキシ、脂環型エポキシおよびスチレ
ンオキシド、ブチルグリシジルエ−テル等のエポキシ希
釈剤が含まれる。The epoxy resin used in the present invention can be used as a mixture with other epoxy resins as long as the characteristics of the composition are not impaired. Here, the other epoxy resin may be any as long as it is generally used,
Examples include epibis-type epoxies, bisphenol F epoxies, novolac epoxies, cycloaliphatic epoxies and epoxy diluents such as styrene oxide and butylglycidyl ether.
【0063】本発明に用いる硬化剤は、公知のエポキシ
樹脂に用いられる硬化剤を使用することができ、アミン
類、ポリアミド樹脂、酸無水物、ポリメルカプタン樹
脂、ノボラック樹脂、ジシアンジアミド、三フッ化ホウ
素のアミン錯体等のカチオン系触媒が含まれる。As the curing agent used in the present invention, known curing agents used for epoxy resins can be used, and amines, polyamide resins, acid anhydrides, polymercaptan resins, novolac resins, dicyandiamide, boron trifluoride can be used. And a cationic catalyst such as an amine complex.
【0064】ここで、アミン類としては、以下のものが
含まれる。Here, the amines include the following.
【0065】ジエチレントリアミン、トリエチレンテト
ラミン、メンセンジアミン、メタキシリレンジアミン、
ビス(4−アミノ−3メチルシクロヘキシル)メタン等
の脂肪族ポリアミンおよび前記脂肪族ポリアミンと公知
のエポキシ化合物とのアダクト、アクリロニトリルとの
反応物、ケトンとの反応物。Diethylenetriamine, triethylenetetramine, mensendiamine, metaxylylenediamine,
Aliphatic polyamines such as bis (4-amino-3-methylcyclohexyl) methane, adducts of the aliphatic polyamines with known epoxy compounds, reaction products of acrylonitrile, and reaction products of ketones.
【0066】メタフェニレンジアミン、ジアミノジフェ
ニルメタン、ジアミノジフェニルスルホン、ジアミノジ
フェニルスルフィド等の芳香族ポリアミンおよび前記芳
香族ポリアミンと公知のエポキシ化合物とのアダクト、
トリス(ジメチルアミノメチル)フェノ−ル、ピペリジ
ン、イミダゾ−ルおよびその誘導体等の第2、第3アミ
ンおよびその塩、および前記アミン類の混合物。Aromatic polyamines such as metaphenylenediamine, diaminodiphenylmethane, diaminodiphenylsulfone and diaminodiphenyl sulfide, and adducts of said aromatic polyamines with known epoxy compounds,
Secondary and tertiary amines and salts thereof such as tris (dimethylaminomethyl) phenol, piperidine, imidazole and its derivatives, and mixtures of said amines.
【0067】ポリアミド樹脂としては、脂肪酸、ダイマ
−酸、トリマ−酸等の脂肪酸と脂肪族ポリアミンとの反
応物が含まれる。The polyamide resin includes a reaction product of a fatty acid such as a fatty acid, a dimer acid and a trimer acid with an aliphatic polyamine.
【0068】酸無水物としては以下のものが含まれる。The acid anhydride includes the following.
【0069】無水フタル酸、無水トリメリット酸、無水
ピロメリット酸、ベンゾフェノンテトラカルボン酸二無
水物、テトラヒドロ無水フタル酸、ヘキサヒドロ無水フ
タル酸、メチルテトラヒドロ無水フタル酸、メチルヘキ
サヒドロ無水フタル酸、無水メチルナジック酸、無水コ
ハク酸、無水ドデセニルコハク酸等の酸無水物および前
記酸無水物の混合物。Phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, benzophenone tetracarboxylic dianhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, methylanhydride Acid anhydrides such as nadic acid, succinic anhydride, dodecenyl succinic anhydride, and mixtures of said acid anhydrides.
【0070】ノボラック樹脂としてはフェノ−ルまた
は、フェノ−ルとクレゾ−ル、ジヒドロキシベンゼンの
混合物とホルムアルデヒドとの縮合によって作られる低
分子量の樹脂状生成物が含まれる。Novolak resins include low molecular weight resinous products made by condensation of phenol or a mixture of phenol and cresol, dihydroxybenzene and formaldehyde.
【0071】三フッ化ホウ素のアミン錯体としてはモノ
エチルアミン、ピペリジン、アニリン、ブチルアミン、
ジブチルアミン、シクロヘキシルアミン、ジシクロヘキ
シルアミン、トリブチルアミン、トリエタノ−ルアミン
等の低分子量のアミン化合物と三フッ化ホウ素との錯体
が含まれる。As the amine complex of boron trifluoride, monoethylamine, piperidine, aniline, butylamine,
A complex of boron trifluoride and a low molecular weight amine compound such as dibutylamine, cyclohexylamine, dicyclohexylamine, tributylamine, and triethanolamine is included.
【0072】また、その他の硬化剤としては四フッ化ホ
ウ素、六フッ化リン、六フッ化ヒ素等の超強酸のジアゾ
ニウム塩、ヨウドニウム塩、ブロモニウム塩、スルフォ
ニウム塩等の塩がある。また、これら硬化剤のうち、脂
肪族ポリアミン、芳香族ポリアミン、ポリアミド樹脂、
ポリメルカプタン樹脂は任意の割合で混合して使用する
ことができ、単独または、硬化速度を調節する目的で硬
化促進剤を併用することもできる。ここで、硬化促進剤
としては前記第2および第3アミン類を用いることがで
きる。Other curing agents include salts of super strong acids such as boron tetrafluoride, phosphorus hexafluoride and arsenic hexafluoride, such as diazonium salts, iodonium salts, bromonium salts and sulfonium salts. Among these curing agents, aliphatic polyamine, aromatic polyamine, polyamide resin,
The polymercaptan resin can be mixed and used at an arbitrary ratio, and can be used alone or in combination with a curing accelerator for the purpose of controlling the curing rate. Here, the secondary and tertiary amines can be used as the curing accelerator.
【0073】酸無水物はそのままで使用することもでき
るがまた硬化速度の調整、硬化物の物性の向上の目的で
硬化触媒、硬化促進剤を併用することもできる。ここ
で、硬化触媒としては、前記第2および第3アミン類お
よびオクチル酸スズである。硬化促進剤としては、水、
エタノ−ル、プロパノ−ル、イソプロパノ−ル、シクロ
ヘキサノ−ル、エチレングリコ−ル等のアルコ−ル類、
酢酸、プロピオン酸、コハク酸、ヘキサヒドロフタル酸
等のカルボン酸およびエチレンジアミン、ジエチレント
リアミン等の活性水素を有するアミン類である。The acid anhydride can be used as it is, but it is also possible to use a curing catalyst and a curing accelerator together for the purpose of adjusting the curing rate and improving the physical properties of the cured product. Here, the curing catalyst is the secondary and tertiary amines and tin octylate. Water as a curing accelerator,
Alcohols such as ethanol, propanol, isopropanol, cyclohexanol and ethylene glycol,
Examples are carboxylic acids such as acetic acid, propionic acid, succinic acid, and hexahydrophthalic acid, and amines having active hydrogen such as ethylenediamine and diethylenetriamine.
【0074】ノボラック樹脂は単独でまたは、硬化速度
の調節の目的で硬化触媒を併用することができる。ここ
で、硬化触媒としては前記第2および第3アミン類であ
る。ジシアンジアミドは、単独でまたは、硬化速度の調
整の目的で硬化触媒と併用することができる。ここで、
硬化触媒としては前記第2および第3アミン類である。The novolac resin may be used alone or in combination with a curing catalyst for the purpose of controlling the curing rate. Here, the curing catalyst is the secondary and tertiary amines. Dicyandiamide can be used alone or in combination with a curing catalyst for the purpose of adjusting the curing rate. here,
As the curing catalyst, the above-mentioned secondary and tertiary amines are used.
【0075】三フッ化ホウ素のアミン錯体は、単独でま
たは、硬化速度の調整の目的で硬化速度調整剤を併用す
ることができる。ここで、硬化速度調整剤としては、従
来のエポキシ樹脂に用いることのできるものであれば、
何でも良いが、具体的には、例えば、カルボン酸類、ア
ミン類、金属のアセチルアセトン錯体、チタン、スズ等
の金属の有機金属化合物、グリコ−ル類、有機ホウ素化
合物等が含まれる。The amine complex of boron trifluoride may be used alone or in combination with a curing rate adjusting agent for the purpose of controlling the curing rate. Here, as the curing rate adjusting agent, if it can be used in the conventional epoxy resin,
Although it may be anything, specifically, for example, carboxylic acids, amines, metal acetylacetone complexes, organometallic compounds of metals such as titanium and tin, glycols, organoboron compounds and the like are included.
【0076】本発明の光デイスク用基板に用いるエポキ
シ樹脂と硬化剤の他、必要に応じて、離型剤、難燃剤、
安定剤、顔料、染料等を添加してもよい。In addition to the epoxy resin and the curing agent used for the optical disk substrate of the present invention, a release agent, a flame retardant, and
Stabilizers, pigments, dyes and the like may be added.
【0077】また、本発明の光デイスク基板を作成する
場合の一般的方法として、固形の封止剤にする場合はエ
ポキシ樹脂、硬化剤等を所定の組成比で選んだ原料組成
物をミキサ−などによって充分均一に混合した後さらに
熱ロ−ルによる溶融混合処理、またはニ−ダ−などを用
いて混合処理を行い、次いで冷却固化させ、適当な大き
さに粉砕して組成物を得ることができる。As a general method for producing the optical disk substrate of the present invention, when a solid sealing agent is used, a raw material composition in which an epoxy resin, a curing agent, etc. are selected at a predetermined composition ratio is used. And the like, followed by melt-mixing treatment using a heat roll, or mixing treatment using a kneader, etc., followed by cooling and solidifying, and pulverizing to an appropriate size to obtain a composition. You can
【0078】液状の組成物の場合は所定量のエポキシ樹
脂硬化剤等をミキサ−などで混合し、一液または二液等
の組成物を得ることができる。In the case of a liquid composition, a predetermined amount of an epoxy resin curing agent or the like can be mixed with a mixer or the like to obtain a one-part or two-part composition.
【0079】このようにして作成した組成物から各成形
法、例えば、低圧トランスファ−成形法、インジェクシ
ョン成形法、圧縮成形法、注型法などを用いて光デイス
ク用基板を成形する。A substrate for an optical disk is molded from the composition thus prepared by a molding method such as a low pressure transfer molding method, an injection molding method, a compression molding method or a casting method.
【0080】[0080]
【発明の効果】以上のようにして得られた本発明の光デ
イスク用基板は耐熱性、耐水性が良くかつ複屈折性に優
れており再生専用光デイスク、書込み可能な光記録用は
もとより書込み、消去可能な光磁気デイスクとして用い
ることができる。The optical disk substrate of the present invention obtained as described above has good heat resistance, water resistance, and excellent birefringence, and is used not only for reproduction-only optical disks and writable optical recording but also for writing. It can be used as an erasable magneto-optical disk.
【0081】以下に、実施例をあげて、本発明を詳しく
説明する。The present invention will be described in detail below with reference to examples.
Claims (11)
1個のエポキシ基を有する化合物と、(b)多塩基酸無
水物、多塩基酸、酸末端重合体、およびカルボン酸基を
含有する重合体から選ばれた少なくとも1種と、(c)
1個以上の活性水素を有する化合物から選ばれた少なく
とも1種を反応させて得られるビニル基を有する樹脂
を、さらに、エポキシ化して得られるエポキシ樹脂とエ
ポキシ樹脂用硬化剤を主成分とする事を特徴とする光デ
イスク用基板。1. (a) A compound having one or more vinyl groups and one epoxy group in one molecule, and (b) a polybasic acid anhydride, a polybasic acid, an acid terminal polymer, and a carboxylic acid. At least one selected from the group-containing polymers, (c)
A resin having a vinyl group obtained by reacting at least one selected from compounds having one or more active hydrogens, and an epoxy resin obtained by epoxidation and a curing agent for epoxy resin as main components Substrate for optical disk characterized by.
エポキシ基を有する化合物が、4−ビニルシクロヘキセ
ン−1−オキシドである請求項1の光デイスク用基板。2. The optical disk substrate according to claim 1, wherein the compound having one or more vinyl groups and one epoxy group in one molecule is 4-vinylcyclohexene-1-oxide.
エポキシ基を有する化合物が、5−ビニルビシクロ
[2.2.1]ヘプト−2−エン−2−オキシドである
請求項1の光デイスク用基板。3. The compound having one or more vinyl groups and one epoxy group in one molecule is 5-vinylbicyclo [2.2.1] hept-2-ene-2-oxide. Substrate for optical disk 1.
エポキシ基を有する化合物が、リモネンモノオキシドで
ある請求項1の光デイスク用基板。4. The optical disk substrate according to claim 1, wherein the compound having one or more vinyl groups and one epoxy group in one molecule is limonene monoxide.
エポキシ基を有する化合物が、下記(I)で表される化合
物である請求項1の光デイスク用基板。 《nは0から30の整数》5. The substrate for an optical disk according to claim 1, wherein the compound having one or more vinyl groups and one epoxy group in one molecule is a compound represented by the following formula (I). << n is an integer from 0 to 30 >>
エポキシ基を有する化合物が、下記(II)で表される化合
物である請求項1の光デイスク用基板。(化2 ) 《n1、n2は0から30の整数》6. The substrate for an optical disc according to claim 1, wherein the compound having one or more vinyl groups and one epoxy group in one molecule is a compound represented by the following formula (II). (Chemical formula 2) << n1 and n2 are integers from 0 to 30 >>
エポキシ基を有する化合物が、下記(III)で表される化
合物である請求項1の光デイスク用基板。 《Phは置換フェニル基、nは0から30の整数》7. The substrate for an optical disc according to claim 1, wherein the compound having one or more vinyl groups and one epoxy group in one molecule is a compound represented by the following formula (III). << Ph is a substituted phenyl group, n is an integer from 0 to 30 >>
アルコ−ル類、水酸基末端重合体、および水酸基を含有
する重合体である請求項1の光デイスク用基板。8. A compound having one or more active hydrogens,
The optical disk substrate according to claim 1, which is an alcohol, a hydroxyl group-terminated polymer, or a polymer containing a hydroxyl group.
ある請求項1の光デイスク用基板。9. The optical disk substrate according to claim 1, wherein the acid-terminated polymer is an acid-terminated polyester.
エステルである請求項8の光デイスク用基板。10. The optical disk substrate according to claim 8, wherein the hydroxyl-terminated polymer is a hydroxyl-terminated polyester.
エーテルである請求項8の光デイスク用基板。11. The optical disk substrate according to claim 8, wherein the hydroxyl-terminated polymer is a hydroxyl-terminated polyether.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4238158A JPH0684203A (en) | 1992-09-07 | 1992-09-07 | Substrate for optical disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4238158A JPH0684203A (en) | 1992-09-07 | 1992-09-07 | Substrate for optical disk |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0684203A true JPH0684203A (en) | 1994-03-25 |
Family
ID=17026055
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4238158A Pending JPH0684203A (en) | 1992-09-07 | 1992-09-07 | Substrate for optical disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0684203A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003000766A1 (en) * | 2001-06-22 | 2003-01-03 | Venkatram Prasad Shastri | Functionalized degradable polymers |
| US6800663B2 (en) | 2002-10-18 | 2004-10-05 | Alkermes Controlled Therapeutics Inc. Ii, | Crosslinked hydrogel copolymers |
-
1992
- 1992-09-07 JP JP4238158A patent/JPH0684203A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003000766A1 (en) * | 2001-06-22 | 2003-01-03 | Venkatram Prasad Shastri | Functionalized degradable polymers |
| US6730772B2 (en) | 2001-06-22 | 2004-05-04 | Venkatram P. Shastri | Degradable polymers from derivatized ring-opened epoxides |
| US6800663B2 (en) | 2002-10-18 | 2004-10-05 | Alkermes Controlled Therapeutics Inc. Ii, | Crosslinked hydrogel copolymers |
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