JPH0668831B2 - Magnetic storage body and manufacturing method thereof - Google Patents
Magnetic storage body and manufacturing method thereofInfo
- Publication number
- JPH0668831B2 JPH0668831B2 JP3329286A JP3329286A JPH0668831B2 JP H0668831 B2 JPH0668831 B2 JP H0668831B2 JP 3329286 A JP3329286 A JP 3329286A JP 3329286 A JP3329286 A JP 3329286A JP H0668831 B2 JPH0668831 B2 JP H0668831B2
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- JP
- Japan
- Prior art keywords
- layer
- polymer
- coated
- formula
- represented
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Paints Or Removers (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】 [産業上の利用分野] この発明は磁気的記憶装置、たとえば磁気ディスク装置
および磁気ドラム装置等に用いられる磁気記憶体および
その製造方法に関するものである。Description: TECHNICAL FIELD The present invention relates to a magnetic storage device used in a magnetic storage device such as a magnetic disk device and a magnetic drum device, and a method for manufacturing the same.
[従来の技術] 一般に記録再生磁気ヘッド(以下ヘッドと呼ぶ)と磁気
記憶体とを主構成部とする磁気記憶装置の記録再生方法
には、大別して次のような二種類の方法がある。すなわ
ち第一の方法は、操作開始時にヘッドと磁気記憶体面と
の間に空気層分の空間を作り、この状態で記録再生をす
る方法である。この方法では、操作終了時に磁気記憶体
の回転が止まり、この時ヘッドと磁気記憶体面は操作開
始時と同様に接触摩擦状態にある。第二の方法は磁気記
憶体に予め所要の回転を与えておき、急激にヘッドを磁
気記憶体面上に押しつけることにより前記ヘッドと前記
磁気記憶体面との間に空気層分の空間を作り、この状態
で記録再生する方法である。[Prior Art] Generally, there are roughly the following two types of recording / reproducing methods of a magnetic storage device having a recording / reproducing magnetic head (hereinafter referred to as a head) and a magnetic storage body as main components. That is, the first method is a method of creating a space corresponding to an air layer between the head and the surface of the magnetic memory at the start of the operation, and recording / reproducing in this state. In this method, the rotation of the magnetic storage body stops at the end of the operation, and at this time, the head and the surface of the magnetic storage body are in the contact friction state as at the start of the operation. The second method is to apply a required rotation to the magnetic storage medium in advance, and suddenly press the head against the surface of the magnetic storage medium to create a space corresponding to an air layer between the head and the surface of the magnetic storage medium. This is a method of recording and reproducing in the state.
このように第一の方法では操作開始時および終了時にヘ
ッドと磁気記憶体面は接触摩擦状態にあり、第二の方法
ではヘッドを磁気記憶体面に押しつける際に接触摩擦状
態にある。したがっていずれの場合もヘッドと磁気記憶
体の間には摩擦力が生じ、この摩擦力は、ヘッドおよび
磁気記憶体を摩耗させついにはヘッドおよび金属磁性薄
膜媒体に傷を作ることがある。また前記接触摩擦状態に
おいてヘッドのわずかな姿勢の変化がヘッドにかかる荷
重を不均一にさせヘッドおよび磁気記憶体表面に傷を作
ることもある。更に前記接触摩擦状態におけるヘッドと
磁気記憶体間に生じる摩擦力は、特に多くのヘッドを取
りつけた場合に大きなトルクを生じ磁気記憶体を回転さ
せるモーターに好ましからぬ負担をかける。また記録再
生中に突発的にヘッドが磁気記憶体に接触し、ヘッドと
磁気記憶体間に大きな摩擦力が働き、ヘッドおよび磁気
記憶体が破壊されることがしばしば起こる。As described above, in the first method, the head and the magnetic memory surface are in a contact friction state at the start and end of the operation, and in the second method, the head is in a contact friction state when the head is pressed against the magnetic memory surface. Therefore, in either case, a frictional force is generated between the head and the magnetic storage medium, and this frictional force may abrade the head and the magnetic storage medium, and eventually may damage the head and the metal magnetic thin film medium. Further, in the contact friction state, a slight change in the posture of the head may make the load applied to the head non-uniform, and may scratch the surface of the head and the magnetic memory. Further, the frictional force generated between the head and the magnetic memory in the contact friction state causes a large torque particularly when a large number of heads are mounted, and imposes an unfavorable burden on the motor for rotating the magnetic memory. Further, during recording / reproduction, the head suddenly contacts the magnetic storage body, a large frictional force acts between the head and the magnetic storage body, and the head and the magnetic storage body are often destroyed.
このようなヘッドと磁気記憶体との接触摩擦力からヘッ
ドおよび磁気記憶体を保護するために磁気記憶体の表面
に保護被膜を被覆して前記ヘッドと磁気記憶体間に生じ
る接触摩擦力を小さくすることが要求される。In order to protect the head and the magnetic storage body from the contact frictional force between the head and the magnetic storage body, a protective coating is applied to the surface of the magnetic storage body to reduce the contact friction force generated between the head and the magnetic storage body. Required to do so.
そのための方法の一つとして磁気記憶体の表面に潤滑層
を設けるということが行なわれている。この潤滑層は、
上記した接触摩擦力を小さくさせるものであることを要
するがそれとともに、潤滑層が下地体から取り去られた
り、あるいはヘッド周辺またはヘッドと磁気記憶体間に
凝集して記録再生時のヘッドの浮揚安定性に悪影響をお
よぼすことのないよう下地体と十分に結合していること
が必要である。したがって潤滑層は上記の接触摩擦力を
小さくさせるためにヘッドと磁気記憶体の界面に吸着な
いし凝着が起こりにくい非極性の分子層が介在している
ことが望ましく、したがって潤滑層は磁気記憶体と結合
する部分に配向していることが望ましい。As one of the methods for this purpose, a lubricating layer is provided on the surface of the magnetic memory. This lubrication layer is
It is necessary to reduce the above-mentioned contact frictional force, and at the same time, the lubricating layer is removed from the underlayer, or the head floats during recording / reproduction by aggregating around the head or between the head and the magnetic memory body. It must be well bonded to the substrate so that stability is not adversely affected. Therefore, in order to reduce the above-mentioned contact frictional force, it is desirable that the lubricating layer has a non-polar molecular layer which is less likely to be adsorbed or adhered at the interface between the head and the magnetic storage medium. It is desirable to orient in the part that bonds with.
このような潤滑層としてシリコンオイル、ふっ素油、フ
ロロシリコンなどのオイル類やオクタデシルトリクロロ
シラン、ヘキサメチルジシラザンなどの塩化ケイ素類ま
たはシラザン類が提案されている(特開昭55−40932号
公報)。As such a lubricating layer, oils such as silicone oil, fluorine oil, fluorosilicone, and silicon chlorides or silazanes such as octadecyltrichlorosilane and hexamethyldisilazane have been proposed (JP-A-55-40932). .
[発明が解決しようとする問題点] これらの潤滑層は、各々優れた特性を示すものの、オイ
ル類においては下地体である非晶質無機酸化物との結合
力が十分でなく、塩化ケイ素またはシラザン類において
はヘッドと磁気記憶体の界面に吸着ないし凝着が起こり
にくい非極性の分子層の分子量が十分でない。このため
オイル類においては長期間の使用における潤滑剤の損
失、塩化ケイ素またはシラザン類においてはヘッドと磁
気記憶体間に生じる接触摩擦力を小さくする効果が完全
でないという問題があった。[Problems to be Solved by the Invention] Although these lubricating layers each exhibit excellent properties, the oils do not have sufficient bonding force with the amorphous inorganic oxide that is the base material, and therefore, silicon chloride or In the silazanes, the molecular weight of the non-polar molecular layer, which is less likely to be adsorbed or adhered to the interface between the head and the magnetic memory, is not sufficient. Therefore, there has been a problem that the loss of the lubricant in oils after long-term use and the effect of reducing the contact frictional force generated between the head and the magnetic memory in silicon chlorides or silazanes are not perfect.
本発明の目的はこの問題点を解決した磁気記憶体および
その製造方法を提供することにある。An object of the present invention is to provide a magnetic memory body and a method of manufacturing the magnetic memory body that solve this problem.
[問題点を解決するための手段] 本発明は、表面が鏡面の非磁性合金層が被覆された合金
円盤上または表面が鏡面の合金円盤上に金属磁性薄膜媒
体が被覆されており、この上に非晶質無機酸化物層が被
覆され、さらにこの上に配向性潤滑剤が被覆されている
磁気記憶体において、前記配向性潤滑剤が、一般式 HO−(CH2)n−COOH [I] (nは10以上23以下の整数) で表わされる物質を含む有機化合物の単分子層と、式
C2F4Oで示される構造単位および式CF2Oで示され
る構造単位が線状に不規則に配列し、末端基が式O=C
=N−CF2−で示される分子量500〜30000の重合体で形
成された重合体層からなることを特徴とする磁気記憶体
であり、またその製造方法は、表面が鏡面の非磁性合金
層を被覆した合金円盤上または表面が鏡面の合金円盤上
に金属磁性薄膜媒体を被覆し、この上に非晶質無機酸化
物層を被覆し、さらにこの非晶質無機酸化物層の上に、
直接、または前記非晶質無機酸化物層の表面をプラズマ
中で処理した後に、一般式 HO−(CH2)n−COOH [I] (nは10以上23以下の整数) で表わされる物質を含む有機化合物の単分子層を作製
し、次いで式C2F4Oで示される構造単位および式C
F2Oで示される構造単位が線状に不規則に配列し、末
端基が式O=C=N−CF2−で示される分子量500〜3000
0の重合体を塗布し、または塗布後焼成して前記非晶質
無機酸化物層上に前記重合体層を設けることを特徴とす
る。[Means for Solving the Problems] In the present invention, a metal magnetic thin film medium is coated on an alloy disk coated with a non-magnetic alloy layer having a mirror surface or on an alloy disk having a mirror surface. amorphous inorganic oxide layer is coated on, still in the magnetic storage body orientation lubricant is coated thereon, said orientation lubricant, the general formula HO- (CH 2) n -COOH [ I ] (N is an integer of 10 or more and 23 or less) A monolayer of an organic compound containing a substance represented by the formula:
The structural unit represented by C 2 F 4 O and the structural unit represented by the formula CF 2 O are linearly and irregularly arranged, and the terminal group is represented by the formula O═C.
Is a polymer layer formed of a polymer having a molecular weight of 500 to 30,000 represented by the formula: = N-CF 2- , and a manufacturing method thereof is a nonmagnetic alloy layer having a mirror surface. A metal magnetic thin film medium is coated on an alloy disk or a metal alloy disk whose surface is a mirror surface, which is coated with an amorphous inorganic oxide layer, and further, on this amorphous inorganic oxide layer,
Directly or after said surface of the amorphous inorganic oxide layer was treated in a plasma, the general formula HO- (CH 2) n -COOH [ I] substances (n is 10 or more and 23 or less an integer) is represented by A monolayer of an organic compound containing is prepared and then a structural unit of formula C 2 F 4 O and a formula C
Structural units represented by F 2 O are linearly and irregularly arranged, and end groups have a molecular weight of 500 to 3000 represented by the formula O = C = N-CF 2-.
The polymer layer is provided on the amorphous inorganic oxide layer by coating the polymer of No. 0 or baking after coating.
この発明の要旨とするところは、水酸基およびカルボキ
シル基を両末端に有する物質を、ラングミュアーブロジ
ェット法のような単分子膜形成法によってカルボキシル
基またはその金属塩の非晶質無機酸化物層への固着力を
利用して酸化膜を被覆した磁気記憶体の上に単分子層を
形成した後、末端に水酸基と化学結合する官能基をもつ
ふっ素油分子を塗布することである。すなわち、水酸基
およびカルボキシル基を両末端に有する物質の単分子層
を、酸化膜とふっ素油分子を強固に結びつけるバインダ
として使用し、さらに分子量の大きなふっ素油分子を使
用することで、ヘッドと下地体との界面に吸着ないし凝
集が起こりにくい非極性の分子層を十分に介在させ、潤
滑層とヘッドとの接触摩擦力を小さくすることである。
バインダとして水酸基およびカルボキシル基を両末端に
有する物質の単分子層を用いること、および、非極性の
分子層として水酸基と化学結合するイソシアネート基を
有するふっ素油分子を用いることが重要な点である。The gist of the present invention is to convert a substance having a hydroxyl group and a carboxyl group at both ends into an amorphous inorganic oxide layer of a carboxyl group or a metal salt thereof by a monomolecular film forming method such as Langmuir-Blodgett method. This is to form a monomolecular layer on the magnetic memory body coated with an oxide film by using the adhesive force of the above, and then apply a fluorine oil molecule having a functional group chemically bonded to a hydroxyl group at the end. That is, by using a monomolecular layer of a substance having a hydroxyl group and a carboxyl group at both ends as a binder that firmly binds the oxide film and the fluorine oil molecule, and by using the fluorine oil molecule having a larger molecular weight, The non-polar molecular layer, which is unlikely to be adsorbed or aggregated, is sufficiently interposed at the interface between the and to reduce the contact frictional force between the lubricating layer and the head.
It is important to use a monomolecular layer of a substance having a hydroxyl group and a carboxyl group at both ends as a binder, and to use a fluorine oil molecule having an isocyanate group chemically bonded to a hydroxyl group as a non-polar molecular layer.
本発明のバインダとして作用する前記一般式[I]で示
されるオキシカルボン酸は良好な単分子膜を形成するた
めにnが10〜23の範囲のものが好ましい。The oxycarboxylic acid represented by the above general formula [I] acting as the binder of the present invention preferably has n in the range of 10 to 23 in order to form a good monomolecular film.
非晶質無機酸化物層上に上記一般式[I]で示される化
合物の単分子層を形成する方法としてはたとえばラング
ミュアーブロジェット法があげられる。この際、オキシ
カルボン酸の水酸基はあらかじめ疎水基に変換しておく
ことにより、もう一方の官能基であるカルボキシル基が
水素結合等を介して非晶質無機酸化物層と結合し、強固
な単分子膜が形成される。またカルボキシル基はそのま
まの状態でも、あるいはラングミュアーブロジェット法
による吸着の際に用いる水相に、カドミウム、バリウム
などの2価金属イオンを加えておき、カルボン酸の金属
塩として、上記物質を吸着させてもよい。As a method for forming a monomolecular layer of the compound represented by the general formula [I] on the amorphous inorganic oxide layer, for example, the Langmuir-Blodgett method can be mentioned. At this time, by converting the hydroxyl group of the oxycarboxylic acid into a hydrophobic group in advance, the other functional group, the carboxyl group, is bonded to the amorphous inorganic oxide layer through a hydrogen bond or the like to form a strong monovalent group. A molecular film is formed. In addition, the carboxyl group may be left as it is, or a divalent metal ion such as cadmium or barium may be added to the aqueous phase used for adsorption by the Langmuir-Blodgett method to adsorb the above substance as a metal salt of carboxylic acid. You may let me.
本発明においては単分子膜の構成成分として上記一般式
[I]で示される化合物のほかに、ミリスチン酸のよう
な長鎖アルキルカルボン酸等の親水基、疎水基をあわせ
もつ化合物を含有させることができるが、バインダとし
ての作用を十分に発揮するためには一般式[I]の化合
物が全有機化合物中の10重量%以上を占めていることが
望ましい。In the present invention, in addition to the compound represented by the above general formula [I] as a constituent of the monomolecular film, a compound having a hydrophilic group and a hydrophobic group such as a long-chain alkylcarboxylic acid such as myristic acid is contained. However, in order to fully exhibit the action as a binder, it is desirable that the compound of the general formula [I] accounts for 10% by weight or more of the total organic compounds.
このようにして得られた単分子層は、水酸基が疎水基に
変換されている場合には再び水酸基とした後、イソシア
ネート基を有する重合体を塗布する。この重合体は式
C2F4Oおよび式CF2Oを繰り返し単位とするが、こ
の両単位の割合は任意に選択することができる。重合体
の分子量は、繰り返し単位1つ分である500以上、かつ
合成が容易で適当な溶媒に溶解可能な30000以下であれ
ばよいが、通常1000〜10000のものがより好適に用いら
れる。When the hydroxyl group is converted into a hydrophobic group, the monomolecular layer thus obtained is converted into a hydroxyl group again, and then a polymer having an isocyanate group is applied. This polymer has the formula
C 2 F 4 O and formula CF 2 O are used as repeating units, but the ratio of these two units can be arbitrarily selected. The molecular weight of the polymer may be 500 or more, which is one repeating unit, and 30,000 or less, which is easy to synthesize and can be dissolved in a suitable solvent, and usually 1,000 to 10,000 is more preferably used.
本発明ではバインダとしての前記単分子層と前記重合体
層との組み合わせたものを潤滑層として用いることによ
って下地体と強固に結合させることができるが、非晶質
無機酸化物形成後の下地体をプラズマ中で処理してから
前記潤滑層を作製すれば、表面のクリーニングが完全に
なること、およびイオンの打ち込みにより非晶質無機酸
化物層の表面がさらに親水性になるなどの理由で下地体
と潤滑剤の結合はさらに強固になる。In the present invention, the combination of the monolayer as the binder and the polymer layer can be firmly bonded to the base by using as the lubricating layer, but the base after forming the amorphous inorganic oxide is used. If the surface of the amorphous inorganic oxide layer is made more hydrophilic by implanting ions, the surface of the amorphous inorganic oxide layer becomes more hydrophilic if the lubricating layer is prepared after the treatment of the surface layer in plasma. The bond between the body and the lubricant becomes stronger.
更に、記録および再生にとってはスペーシング(記録お
よび再生時におけるヘッドと磁気記憶体の間隔)は小さ
い方が有利である。このため潤滑層の膜厚はできる限り
薄い方が望ましいが、この単分子膜と重合体は非常に薄
い潤滑層を形成することが可能である。非晶質無機酸化
物の上に単分子層を形成し重合体を塗布した後、化学反
応を起こさせ、単分子層と重合体とを結合させた後、フ
レオン洗浄することにより単分子層と結合していない余
分の潤滑剤がとりさられ、非常に薄い潤滑層が形成され
る。Further, for recording and reproduction, it is advantageous that the spacing (the distance between the head and the magnetic memory at the time of recording and reproduction) is small. For this reason, it is desirable that the thickness of the lubricating layer be as thin as possible, but the monomolecular film and the polymer can form a very thin lubricating layer. After forming a monomolecular layer on the amorphous inorganic oxide and applying the polymer, a chemical reaction is caused to combine the monomolecular layer and the polymer, and then the monomolecular layer is formed by Freon washing. The extra unbonded lubricant is removed, forming a very thin lubricating layer.
[作用] 非晶質無機酸化物はポリ珪酸あるいはSiO2、ガラス、ア
ルミナなどのスパッタ膜である。本発明の水酸基および
カルボキシル基を両末端に有する物質は、水酸基を一時
的に化学的な方法で疎水基に変換しておけば、ラングミ
ュアーブロジェット法を用いて前記非晶質無機酸化物の
表面に単分子層として強固に吸着させることができる。
このようにして得られた単分子層は、カルボキシル基ま
たはその金属塩の強い親水性により、非晶質無機酸化物
層と強固に結合する。この単分子層を吸着後に水酸基を
一時的に変換しておいた疎水基を再び化学的な方法でも
との水酸基にもどしてやれば、水酸基が基板と反対側を
向いて並んでいるためイソシアネート基を有するふっ素
油分子と化学結合をつくることができ、非晶質無機酸化
物とふっ素分子を強固に結びつけるバインダの役割を果
たすことができる。一方、ふっ素油分子は表面エネルギ
ーを低下させ、優れた潤滑効果を示す。したがってこの
単分子層とふっ素油分子層との組み合わせにより、下地
体と潤滑剤層とが強固に結合し、しかも潤滑効果の優れ
た磁気記憶体を得ることができる。単分子層と重合体の
化学反応は塗布後自然に進行するが、焼成すれば短時間
ですむ。[Function] The amorphous inorganic oxide is polysilicic acid or a sputtered film of SiO 2 , glass, alumina or the like. The substance having a hydroxyl group and a carboxyl group at both ends of the present invention, if the hydroxyl group is temporarily converted into a hydrophobic group by a chemical method, the amorphous inorganic oxide of the above-mentioned amorphous inorganic oxide can be obtained by the Langmuir-Blodgett method. It can be strongly adsorbed as a monomolecular layer on the surface.
The monomolecular layer thus obtained is strongly bonded to the amorphous inorganic oxide layer due to the strong hydrophilicity of the carboxyl group or its metal salt. After the adsorption of this monolayer, the hydrophobic group, which had been temporarily converted to a hydroxyl group, is returned to the original hydroxyl group by a chemical method again. It can form a chemical bond with the fluorine oil molecule that it has, and can play the role of a binder that firmly bonds the amorphous inorganic oxide and the fluorine molecule. On the other hand, fluorine oil molecules reduce the surface energy and show an excellent lubricating effect. Therefore, by combining this monomolecular layer and the fluorine oil molecular layer, it is possible to obtain a magnetic memory body in which the underlayer and the lubricant layer are firmly bonded to each other and which has an excellent lubricating effect. The chemical reaction between the monolayer and the polymer proceeds naturally after coating, but it takes only a short time if baked.
[実施例] 以下、実施例により本発明を詳細に説明する。[Examples] Hereinafter, the present invention will be described in detail with reference to Examples.
(実施例1) 第1図は、この発明の磁気記憶体の構成を概略的に示す
断面図である。図面において本発明の磁気記憶体7は、
合金円盤1上に非磁性合金層2が被覆され、この被膜の
研磨面上に金属磁性薄膜媒体3が被覆されており、さら
にこの上に非晶質無機酸化物4が被覆され、さらにこの
上に単分子膜5および重合体層6よりなる潤滑剤が被覆
されている。(Embodiment 1) FIG. 1 is a sectional view schematically showing the structure of a magnetic memory body of the present invention. In the drawings, the magnetic memory 7 of the present invention is
The alloy disk 1 is coated with the non-magnetic alloy layer 2, the polished surface of the coating is coated with the metal magnetic thin film medium 3, and the amorphous inorganic oxide 4 is further coated thereon. Is coated with a lubricant composed of the monomolecular film 5 and the polymer layer 6.
合金円盤1として旋盤加工および熱矯正によって十分小
さなうねり(円周方向および半径方向でともに50μm以
下)をもった面に仕上げられたディスク状アルミニウム
合金基盤上に非磁性合金層2としてニッケル−燐(Ni−
P)合金を約50μmの厚さにメッキし、このNi−Pメッ
キ膜を機械的研磨により表面粗さ0.04μm以下、厚さ約
30μmまで鏡面仕上げしたのち、その上に金属磁性薄膜
媒体3としてコバルト−ニッケル−燐(Co−Ni−P)合
金を約0.05μmの厚さにメッキした。さらにこのCo−Ni
−P合金膜の上に、下に示した組成の溶液を十分に混合
し、ごみまたは析出したSiO2をろ過膜を通して取り除い
た後、回転塗布法により塗布した。Nickel-phosphorus as the non-magnetic alloy layer 2 on the disk-shaped aluminum alloy substrate finished on the surface having a sufficiently small waviness (50 μm or less in both the circumferential direction and the radial direction) by lathe processing and heat correction as the alloy disk 1 Ni-
P) alloy is plated to a thickness of about 50 μm, and this Ni-P plated film is mechanically polished to a surface roughness of 0.04 μm or less and a thickness of about
After mirror-finishing to 30 μm, a cobalt-nickel-phosphorus (Co—Ni—P) alloy as a metal magnetic thin film medium 3 was plated thereon to a thickness of about 0.05 μm. Furthermore, this Co-Ni
On the -P alloy film, a solution having the composition shown below was sufficiently mixed, and dust or precipitated SiO 2 was removed through a filtration film, and then applied by spin coating.
テトラヒドロキシシラン11%エチルアルコール溶液 :20
重量% n−ブチルアルコール :80重量% その後このディスク基盤を200℃の温度で3時間焼成しC
o−Ni−P合金膜の上に非晶質無機酸化物6であるポリ
珪酸の被膜を形成した。Tetrahydroxysilane 11% ethyl alcohol solution: 20
% By weight n-butyl alcohol: 80% by weight After that, the disc substrate was baked at a temperature of 200 ° C. for 3 hours C
A polysilicic acid film, which is an amorphous inorganic oxide 6, was formed on the o-Ni-P alloy film.
この基板に16−ヒドロキシパルミチン酸[HO(CH2)15C
OOH]のイソプロピルジメチルシリルエーテルエステル
[(CH3)2(CH3)2CHSiO(CH2)15COOSiCH(CH3)2
(CH3)2]を原料として、pH4.5の水相を用いるラング
ミュアーブロジェット法によって16−ヒドロキシパルミ
チン酸のイソプロピルジメチルシリルエーテル[(C
H3)2(CH3)2CHSiO(CH2)15COOH]の単分子膜を形成
した。続いてこの基板を、酢酸−水(3:1)溶液に10分
間浸漬して16−ヒドロキシパルミチン酸の単分子膜5と
した。続いて、分子量約3000のO=C=N−CF2−(C2F
4O)p−(CF2O)q−CF2−N=C=O(p:q=1:1、各
構造単位は不規則である)をフレオンに溶解し0.08重量
%の溶液を作成し、0.2μmのフィルターを通してろ過
した。この溶液を16−ヒドロキシパルミチン酸の単分子
層を形成した前記ディスク基板に2500回/分の回転速度
で回転塗布し、100℃の温度で40分間焼成を行なった
後、フレオンで基板を洗浄し、余分な重合体を洗い落と
して重合体層6を形成した。16-hydroxypalmitic acid [HO (CH 2 ) 15 C
OOH] isopropyl dimethyl silyl ether ester [(CH 3 ) 2 (CH 3 ) 2 CHSiO (CH 2 ) 15 COOSiCH (CH 3 ) 2
(CH 3 ) 2 ] as a raw material and the isopropyldimethylsilyl ether of 16-hydroxypalmitic acid [(C
H 3 ) 2 (CH 3 ) 2 CHSiO (CH 2 ) 15 COOH] was formed as a monomolecular film. Subsequently, this substrate was immersed in an acetic acid-water (3: 1) solution for 10 minutes to form a monomolecular film 5 of 16-hydroxypalmitic acid. Subsequently, a molecular weight of about 3000 O = C = N-CF 2 - (C 2 F
4 O) p - (CF 2 O) q -CF 2 -N = C = O (p: q = 1: 1, to create a solution of the respective structural units are randomly) were dissolved in Freon 0.08 wt% And filtered through a 0.2 μm filter. This solution was spin-coated at a rotation speed of 2500 times / min on the disk substrate on which a monomolecular layer of 16-hydroxypalmitic acid was formed, baked at 100 ° C. for 40 minutes, and then washed with Freon. The excess polymer was washed off to form a polymer layer 6.
重合体を塗布する前後の基板表面の表面エネルギーを種
々の表面張力をもつ液滴の接触角を測定し計算するとポ
リ珪酸被膜上43erg/cm2から重合体塗布後では16erg/c
m2と表面エネルギーが著しく低下しヘッドと下地体との
接着を防止する効果が大きいことがわかった。The surface energy of the substrate surface before and after coating the polymer was calculated by measuring the contact angles of droplets with various surface tensions, and it was calculated from 43 erg / cm 2 on the polysilicic acid film to 16 erg / c after coating the polymer.
It was found that m 2 and the surface energy were remarkably reduced, and the effect of preventing the adhesion between the head and the base body was great.
次に、このディスク基板とヘッドとの間に働く動摩擦係
数を測定した。動摩擦係数はヘッドに歪ゲージを連結
し、ディスクを一定速度で回転させたときに生じるヘッ
ドとディスク間の動摩擦力を測定し、これをヘッドに加
えた荷重で割って求めた。測定は荷重15g、滑り速度100
mm/minの条件で行なった。その結果、動摩擦係数の値
として0.175が得られ、ポリ珪酸被膜上の0.546に比べ、
極めて動摩擦係数の値を小さくすることができた。Next, the dynamic friction coefficient acting between the disk substrate and the head was measured. The dynamic friction coefficient was determined by connecting a strain gauge to the head, measuring the dynamic friction force between the head and the disk generated when the disk was rotated at a constant speed, and dividing this by the load applied to the head. Measurement is load 15g, sliding speed 100
It was performed under the condition of mm / min. As a result, 0.175 was obtained as the value of the dynamic friction coefficient, which was 0.546 compared to 0.546 on the polysilicic acid film.
The value of the dynamic friction coefficient could be made extremely small.
また、この重合体を塗布したディスク基板と荷重70gの
モノリシックヘッドを用いてディスクとヘッドの接触摩
擦試験を30000回繰り返し行なったが、ヘッドクラッシ
ュおよびヘッドによる接触摩擦によるディスクの表面状
態の変化は皆無であった。A contact friction test between the disk and the head was repeated 30000 times using a disk substrate coated with this polymer and a monolithic head with a load of 70 g, but there was no change in the surface condition of the disk due to head crash or contact friction by the head. Met.
(実施例2) 実施例1と同様の方法で作成し、ポリ珪酸被膜を形成し
たディスク基板に同じ方法で16−ヒドロキシパルミチン
酸を形成した。分子量約3000のO=C=N−CF2−(C2F
4O)p−(CF2O)q−CF2−N=C=O(p:q=4:1、各
構造単位は不規則である)をフレオンに溶解し0.08重量
%の溶液を作成し、0.2μmのフィルターを通してろ過
した。単分子層を形成した前記ディスク基板にこの重合
体2500回/分の回転速度で回転塗布し100℃の温度で40
分間焼成した後フレオンで余分な重合体を洗い落とし
た。実施例1と同様の方法で表面エネルギーと動摩擦係
数の値を求めた。その結果、重合体を塗布することによ
り表面エネルギーの値はポリ珪酸被膜上43erg/cm2から
16erg/cm2と低下し、動摩擦係数の値は0.546から0.172
に小さくすることができた。Example 2 16-Hydroxypalmitic acid was formed in the same manner as in Example 1 and on the disk substrate on which the polysilicic acid film was formed, by the same method. Molecular weight of about 3000 O = C = N-CF 2 - (C 2 F
4 O) p - (CF 2 O) q -CF 2 -N = C = O (p: q = 4: 1, to create a solution of the respective structural units are randomly) were dissolved in Freon 0.08 wt% And filtered through a 0.2 μm filter. This polymer was spin-coated at a rotation speed of 2500 times / minute onto the disk substrate having a monomolecular layer formed thereon, and the temperature was 100 ° C.
After baking for a minute, excess polymer was washed off with Freon. The values of the surface energy and the dynamic friction coefficient were obtained by the same method as in Example 1. As a result, by applying the polymer, the surface energy value was changed from 43 erg / cm 2 on the polysilicic acid film.
16erg / cm 2 and the coefficient of dynamic friction is 0.546 to 0.172
Could be made smaller.
また実施例1と同様に耐摩耗性を評価したが、30000回
の接触摩擦試験によるディスクの表面状態の変化は皆無
であった。Further, the abrasion resistance was evaluated in the same manner as in Example 1, but there was no change in the surface condition of the disk due to the contact friction test of 30,000 times.
(実施例3) 実施例1と同様の方法で作成したディスク基板のCo−Ni
−P合金膜の上にポリ珪酸被膜のかわりにAl2O3(非晶
質アルミナ)をスパッタ法により被覆した。このディス
ク基板に実施例1と同じ方法で16−ヒドロキシパルミチ
ン酸の単分子層を形成した。実施例1で作成した重合体
溶液を2500回/分で回転塗布し100℃の温度で40分間焼
成した後フレオンで余分な重合体を洗いおとし、実施例
1と同様の方法で表面エネルギー、動摩擦係数の値を求
めた。その結果、表面エネルギーは非晶質アルミナ上の
45erg/cm2から重合体上15erg/cm2に低下し動摩擦係数
の値は0.270から0.180に小さくすることができた。(Example 3) Co-Ni of a disk substrate prepared by the same method as in Example 1
Instead of the polysilicic acid coating, Al 2 O 3 (amorphous alumina) was coated on the -P alloy film by the sputtering method. A monomolecular layer of 16-hydroxypalmitic acid was formed on this disk substrate in the same manner as in Example 1. The polymer solution prepared in Example 1 was spin-coated at 2500 times / minute, baked at 100 ° C. for 40 minutes, and then the excess polymer was washed off with Freon, and surface energy and dynamic friction were measured in the same manner as in Example 1. The value of the coefficient was calculated. As a result, the surface energy on the amorphous alumina is
The value of reduced from 45erg / cm 2 of polymer on 15erg / cm 2 dynamic friction coefficient could be reduced to 0.180 from 0.270.
また、実施例1と同様に30000回の接触摩擦試験による
ディスク表面状態の変化は皆無であった。Further, as in Example 1, there was no change in the disk surface state due to the contact friction test of 30,000 times.
(実施例4) 実施例1と同じ基板に、ラングミュアーブロジェット法
によって、16−ヒドロキシパルミチン酸のイソプロピル
ジメチルシリルエーテルエステルとミリスチン酸の1:1
混合物を原料として、おなじ操作を行ない16−ヒドロキ
シパルミチン酸とミリスチン酸の1:1混合物よりなる単
分子膜を作製し、他の操作は実施例1と全く同様にして
実験を行なった。その結果、表面エネルギーの値はポリ
珪酸被膜上の43erg/cm2から重合体上の16erg/cm2に低
下し動摩擦係数の値として重合体塗布後0.176が得ら
れ、ポリ珪酸被膜上の0.546に比べ、小さくすることが
できた。Example 4 On the same substrate as in Example 1, the isopropyldimethylsilyl ether ester of 16-hydroxypalmitic acid and 1: 1 myristic acid were prepared by the Langmuir-Blodgett method.
The same operation was performed using the mixture as a raw material to prepare a monomolecular film made of a 1: 1 mixture of 16-hydroxypalmitic acid and myristic acid, and the other operations were performed in exactly the same manner as in Example 1. As a result, the value of surface energy after polymer coating as the value of the reduced dynamic friction coefficient 16erg / cm 2 on the polymer from 43erg / cm 2 on poly silicate coating 0.176 was achieved, and 0.546 on polysilicic acid coating In comparison, it was possible to make it smaller.
また、他の実施例と同様に30000回の接触摩擦試験によ
るディスク表面状態の変化は皆無であった。Further, as in the other examples, there was no change in the disk surface state by the contact friction test of 30,000 times.
(実施例5) 実施例4と同様に、ラングミュアーブロジェット法によ
って、16−ヒドロキシパルミチン酸のイソプロピルジメ
チルシリルエーテルエステルとミリスチン酸の1:3混合
物を原料として、おなじ操作を行ない16−ヒドロキシパ
ルミチン酸とミリスチン酸の1:3混合物よりなる単分子
膜を作製し、他の操作は実施例1と全く同様にして実験
を行なった。その結果、表面エネルギーの値はポリ珪酸
被膜上の43erg/cm2から重合体上の15erg/cm2に低下
し、動摩擦係数の値として重合体塗布後0.171が得ら
れ、ポリ珪酸被膜上の0.546に比べ、小さくすることが
できた。(Example 5) In the same manner as in Example 4, the same operation was performed by the Langmuir-Blodgett method using a 1: 3 mixture of isopropyldimethylsilyl ether ester of 16-hydroxypalmitic acid and myristic acid as a starting material. A monomolecular film composed of a 1: 3 mixture of acid and myristic acid was prepared, and the experiment was performed in the same manner as in Example 1 except for the other operations. As a result, the value of the surface energy decreases from 43erg / cm 2 on the polysilicic acid coating 15erg / cm 2 on the polymer, the polymer coating after 0.171 is obtained as the value of dynamic friction coefficient, on polysilicic acid coating 0.546 I was able to make it smaller than.
また、他の実施例と同様に30000回の接触摩擦試験によ
るディスク表面状態の変化は皆無であった。Further, as in the other examples, there was no change in the disk surface state by the contact friction test of 30,000 times.
(実施例6) 実施例5と同様に、ラングミュアーブロジェット法によ
って、16−ヒドロキシパルミチン酸のイソプロピルジメ
チルシリルエーテルエステルとミリスチン酸の1:3混合
物を原料として、おなじ操作を行なった。ただし、ラン
グミュアーブロジェット法による吸着の際に、水相に塩
酸を加えてpHを4.2に調製した2.5×10-4mole/の塩化
カドミウム水溶液を用いて、16−ヒドロキシパルミチン
酸とミリスチン酸の1:3混合物のカドミウム塩よりなる
単分子膜を作製し、他の操作は実施例1と全く同様にし
て実験を行なった。その結果、表面エネルギーの値はポ
リ珪酸被膜上の43erg/cm2から重合体上の16erg/cm2に
低下し、動摩擦係数の値として重合体塗布後0.170が得
られ、ポリ珪酸被膜上の0.546に比べ、小さくすること
ができた。(Example 6) In the same manner as in Example 5, the same operation was performed by the Langmuir-Blodgett method using a 1: 3 mixture of isopropyldimethylsilyl ether ester of 16-hydroxypalmitic acid and myristic acid as a raw material. However, at the time of adsorption by the Langmuir-Blodgett method, hydrochloric acid was added to the aqueous phase to adjust the pH to 4.2, and 2.5 × 10 -4 mole / cadmium chloride aqueous solution was used to remove 16-hydroxypalmitic acid and myristic acid. A monomolecular film composed of a 1: 3 mixture of cadmium salt was prepared, and the experiment was performed in the same manner as in Example 1 except for the other operations. As a result, the value of the surface energy decreases from 43erg / cm 2 on the polysilicic acid coating 16erg / cm 2 on the polymer, the polymer coating after 0.170 is obtained as the value of dynamic friction coefficient, on polysilicic acid coating 0.546 I was able to make it smaller than.
また、他の実施例と同様に30000回の接触摩擦試験によ
るディスク表面状態の変化は皆無であった。Further, as in the other examples, there was no change in the disk surface state by the contact friction test of 30,000 times.
(実施例7) 実施例1と同様の方法で作成し、ポリ珪酸被膜を形成し
たディスク基板を平行平板型のエッチング装置に入れ、
Arを用いて、流量18sccm、電力密度0.35W/cm2、圧力1.
3Pa、バイアス電位1KVの条件で2分間エッチングを行な
った後、続いて実施例4と同様に、ラングミュアーブロ
ジェット法によって、16−ヒドロキシパルミチン酸のイ
ソプロピルジメチルシリルエーテルエステルとミリスチ
ン酸の1:1混合物を原料として、おなじ操作を行ない16
−ヒドロキシパルミチン酸とミリスチン酸の1:1混合物
よりなる単分子膜を作製し、他の操作は実施例1と全く
同様にして実験を行なった。その結果、表面エネルギー
の値はポリ珪酸被膜上の43erg/cm2から重合体上の15er
g/cm2に低下し、動摩擦係数の値として重合体塗布後0.
174が得られ、ポリ珪酸被膜上の0.546に比べ、小さくす
ることができた。(Example 7) A disk substrate prepared in the same manner as in Example 1 and having a polysilicic acid film formed thereon was placed in a parallel plate type etching apparatus.
Using Ar, flow rate 18sccm, power density 0.35W / cm 2 , pressure 1.
After etching for 2 minutes under the conditions of 3 Pa and a bias potential of 1 KV, subsequently, by the Langmuir-Blodgett method as in Example 4, isopropyldimethylsilyl ether ester of 16-hydroxypalmitic acid and myristic acid 1: 1 were used. Perform the same operation using the mixture as the raw material 16
A monomolecular film made of a 1: 1 mixture of hydroxypalmitic acid and myristic acid was prepared, and the experiment was performed in the same manner as in Example 1 except for the other operations. As a result, the surface energy value was 43 erg / cm 2 on the polysilicic acid film to 15 er on the polymer.
It decreased to g / cm 2 and the value of dynamic friction coefficient was 0.
174 was obtained, which was smaller than 0.546 on the polysilicic acid film.
また、他の実施例と同様に30000回の接触摩擦試験によ
るディスク表面状態の変化は皆無であった。Further, as in the other examples, there was no change in the disk surface state by the contact friction test of 30,000 times.
(実施例8) 実施例1と同様の方法で作成し、ポリ珪酸被膜を形成し
たディスク基板を平行平板型のエッチング装置に入れ、
Arを用いて、流量18sccm、電力密度0.35W/cm2、圧力1.
3Pa、バイアス電位1KVの条件で2分間エッチングを行な
った後、続いて実施例5と同様に、ラングミュアーブロ
ジェット法によって、16−ヒドロキシパルミチン酸のイ
ソプロピルジメチルシリルエーテルエステルとミリスチ
ン酸の1:3混合物を原料として、おなじ操作を行ない16
−ヒドロキシパルミチン酸とミリスチン酸の1:3混合物
よりなる単分子膜を作製し、他の操作は実施例1と全く
同様にして実験を行なった。その結果、表面エネルギー
の値はポリ珪酸被膜上の43erg/cm2から重合体上の16er
g/cm2に低下し、動摩擦係数の値として重合体塗布後0.
172が得られ、ポリ珪酸被膜上の0.546に比べ、小さくす
ることができた。Example 8 A disk substrate prepared in the same manner as in Example 1 and having a polysilicic acid film formed thereon was placed in a parallel plate type etching apparatus,
Using Ar, flow rate 18sccm, power density 0.35W / cm 2 , pressure 1.
After etching for 2 minutes under the conditions of 3 Pa and a bias potential of 1 KV, subsequently, by the Langmuir-Blodgett method, isopropyldimethylsilyl ether ester of 16-hydroxypalmitic acid and 1: 3 of myristic acid were applied by the Langmuir-Blodgett method. Perform the same operation using the mixture as the raw material 16
A monomolecular film composed of a 1: 3 mixture of hydroxypalmitic acid and myristic acid was prepared, and the experiment was performed in the same manner as in Example 1 except for the other operations. As a result, the surface energy value was 43 erg / cm 2 on the polysilicic acid film to 16 er on the polymer.
It decreased to g / cm 2 and the value of dynamic friction coefficient was 0.
172 was obtained, which was smaller than 0.546 on the polysilicic acid film.
また、他の実施例と同様に30000回の接触摩擦試験によ
るディスク表面状態の変化は皆無であった。Further, as in the other examples, there was no change in the disk surface state by the contact friction test of 30,000 times.
(実施例9) 実施例1と同様の方法で作成し、ポリ珪酸被膜を形成し
たディスク基板を平行平板型のエッチング装置に入れ、
Arを用いて、流量18sccm、電力密度0.35W/cm2、圧力1.
3Pa、バイアス電位1KVの条件で2分間エッチングを行な
った後、続いて実施例6と同様に、ラングミュアーブロ
ジェット法によって、16−ヒドロキシパルミチン酸のイ
ソプロピルジメチルシリルエーテルエステルとミリスチ
ン酸の1:3混合物を原料として、水相に塩酸を加えてpH
を4.2に調製した2.5×10-4mole/の塩化カドミウム水
溶液を用いて、16−ヒドロキシパルミチン酸とミリスチ
ン酸の1:3混合物のカドミウム塩よりなる単分子膜を作
製し、他の操作は実施例1と全く同様にして実験を行な
った。その結果、表面エネルギーの値はポリ珪酸被膜上
の43erg/cm2から重合体上の17erg/cm2に低下し、動摩
擦係数の値として重合体塗布後0.178が得られ、ポリ珪
酸被膜上の0.546に比べ、小さくすることができた。(Example 9) A disk substrate prepared in the same manner as in Example 1 and having a polysilicic acid film formed thereon was placed in a parallel plate type etching apparatus.
Using Ar, flow rate 18sccm, power density 0.35W / cm 2 , pressure 1.
After etching for 2 minutes under the conditions of 3 Pa and a bias potential of 1 KV, the isopropyldimethylsilyl ether ester of 16-hydroxypalmitic acid and 1: 3 of myristic acid were then subjected to the Langmuir-Blodgett method in the same manner as in Example 6. Using the mixture as a raw material, add hydrochloric acid to the aqueous phase to
Using a 2.5 x 10 -4 mole / aqueous cadmium chloride solution prepared in 4.2, prepare a monolayer consisting of a cadmium salt of a 1: 3 mixture of 16-hydroxypalmitic acid and myristic acid, and perform other operations. The experiment was conducted in exactly the same manner as in Example 1. As a result, the value of the surface energy decreases from 43erg / cm 2 on the polysilicic acid coating 17erg / cm 2 on the polymer, the polymer coating after 0.178 is obtained as the value of dynamic friction coefficient, on polysilicic acid coating 0.546 I was able to make it smaller than.
また、他の実施例と同様に30000回の接触摩擦試験によ
るディスク表面の状態の変化は皆無であった。Further, like the other examples, there was no change in the state of the disk surface due to the contact friction test of 30,000 times.
[発明の効果] このように本発明における磁気記憶体はヘッドと磁気記
憶体間に生じる接触摩擦力を小さくする効果が大きい。
また潤滑剤と下地体とが強固に結合しているので繰り返
し使用してもディスク表面状態は良好に保持される。し
たがって磁気ディスク装置や磁気ドラム装置等に応用す
るのに適している。[Effects of the Invention] As described above, the magnetic memory according to the present invention has a large effect of reducing the contact frictional force generated between the head and the magnetic memory.
In addition, since the lubricant and the base material are firmly bonded to each other, the disk surface condition is kept good even after repeated use. Therefore, it is suitable for application to magnetic disk devices, magnetic drum devices, and the like.
第1図は本発明の磁気記憶体を概略的に示す断面図であ
る。 1……合金円盤、2……非磁性合金層 3……金属磁性薄膜媒体、4……非晶質無機酸化物 5……単分子膜、6……重合体層 7……磁気記憶体FIG. 1 is a sectional view schematically showing a magnetic memory body of the present invention. 1 ... Alloy disk, 2 ... Non-magnetic alloy layer 3 ... Metal magnetic thin film medium, 4 ... Amorphous inorganic oxide 5 ... Monomolecular film, 6 ... Polymer layer 7 ... Magnetic memory
Claims (3)
金円盤上または表面が鏡面の合金円盤上に金属磁性薄膜
媒体が被覆されており、この上に非晶質無機酸化物層が
被覆され、さらにこの上に配向性潤滑剤が被覆されてい
る磁気記憶体において、前記配向性潤滑剤が、一般式 HO−(CH2)n−COOH (nは10以上23以下の整数) で表わされる物質を含む有機化合物の単分子層と、式
C2F4Oで示される構造単位および式CF2Oで示され
る構造単位が線状に不規則に配列し、末端基が式O=C
=N−CF2−で示される分子量500〜30000の重合体で形
成された重合体層からなることを特徴とする磁気記憶
体。1. A metal magnetic thin film medium is coated on an alloy disc having a mirror-finished surface coated with a non-magnetic alloy layer, or on an alloy disc having a mirror-finished surface, on which an amorphous inorganic oxide layer is formed. coated, further in the magnetic storage body orientation lubricant is coated thereon, said orientation lubricant, the general formula HO- (CH 2) n -COOH ( n is 10 to 23 integer) A monolayer of an organic compound containing the represented substance and a formula
The structural unit represented by C 2 F 4 O and the structural unit represented by the formula CF 2 O are linearly and irregularly arranged, and the terminal group is represented by the formula O═C.
A magnetic memory comprising a polymer layer formed of a polymer having a molecular weight of 500 to 30,000 represented by ═N—CF 2 —.
円盤上または表面が鏡面の合金円盤上に金属磁性薄膜媒
体を被覆し、この上に非晶質無機酸化物層を被覆し、さ
らにこの非晶質無機酸化物層の上に、一般式 HO−(CH2)n−COOH (nは10以上23以下の整数) で表わされる物質を含む有機化合物の単分子層を作製
し、次いで式C2F4Oで示される構造単位および式C
F2Oで示される構造単位が線状に不規則に配列し、末
端基が式O=C=N−CF2−で示される分子量500〜3000
0の重合体を塗布し、または塗布後焼成して前記非晶質
無機酸化物層上に前記重合体層を設けることを特徴とす
る磁気記憶体の製造方法。2. A metal magnetic thin film medium is coated on an alloy disk whose surface is a mirror surface coated with a non-magnetic alloy layer or on a mirror disk whose surface is a mirror surface, and an amorphous inorganic oxide layer is coated thereon. further, on the amorphous inorganic oxide layer, the general formula HO- (CH 2) n -COOH ( n is 10 to 23 integer) to produce a monomolecular layer of an organic compound containing a material represented by, Then, the structural unit represented by the formula C 2 F 4 O and the formula C
Structural units represented by F 2 O are linearly and irregularly arranged, and end groups have a molecular weight of 500 to 3000 represented by the formula O = C = N-CF 2-.
A method for producing a magnetic memory, comprising: applying the polymer of No. 0, or baking after applying the polymer to provide the polymer layer on the amorphous inorganic oxide layer.
円盤上または表面が鏡面の合金円盤上に金属磁性薄膜媒
体を被覆し、この上に非晶質無機酸化物層を被覆し、プ
ラズマ中で処理した後に、前記非晶質無機酸化物層の上
に、一般式 HO−(CH2)n−COOH (nは10以上23以下の整数) で表わされる物質を含む有機化合物の単分子層を作製
し、次いで式C2F4Oで示される構造単位および式C
F2Oで示される構造単位が線状に不規則に配列し、末
端基が式O=C=N−CF2−で示される分子量500〜3000
0の重合体を塗布し、または塗布後焼成して前記非晶質
無機酸化物層上に前記重合体層を設けることを特徴とす
る磁気記憶体の製造方法。3. A metal magnetic thin film medium is coated on an alloy disc having a mirror-finished surface coated with a non-magnetic alloy layer or on an alloy disc having a mirror-finished surface, and an amorphous inorganic oxide layer is coated thereon. after treatment with plasma, the above amorphous inorganic oxide layer, a single general formula HO- (CH 2) n -COOH ( n is 10 to 23 integer) organic compounds containing a substance represented by A molecular layer is prepared, and then the structural unit represented by the formula C 2 F 4 O and the formula C
Structural units represented by F 2 O are linearly and irregularly arranged, and end groups have a molecular weight of 500 to 3000 represented by the formula O = C = N-CF 2-.
A method for producing a magnetic memory, comprising: applying the polymer of No. 0, or baking after applying the polymer to provide the polymer layer on the amorphous inorganic oxide layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3329286A JPH0668831B2 (en) | 1986-02-17 | 1986-02-17 | Magnetic storage body and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3329286A JPH0668831B2 (en) | 1986-02-17 | 1986-02-17 | Magnetic storage body and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62189624A JPS62189624A (en) | 1987-08-19 |
| JPH0668831B2 true JPH0668831B2 (en) | 1994-08-31 |
Family
ID=12382463
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3329286A Expired - Lifetime JPH0668831B2 (en) | 1986-02-17 | 1986-02-17 | Magnetic storage body and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0668831B2 (en) |
-
1986
- 1986-02-17 JP JP3329286A patent/JPH0668831B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62189624A (en) | 1987-08-19 |
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