JPH06312102A - Finish drying - Google Patents
Finish dryingInfo
- Publication number
- JPH06312102A JPH06312102A JP5128536A JP12853693A JPH06312102A JP H06312102 A JPH06312102 A JP H06312102A JP 5128536 A JP5128536 A JP 5128536A JP 12853693 A JP12853693 A JP 12853693A JP H06312102 A JPH06312102 A JP H06312102A
- Authority
- JP
- Japan
- Prior art keywords
- dodecamethylpentasiloxane
- drying
- weight
- finish drying
- finish
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001035 drying Methods 0.000 title claims abstract description 32
- FBZANXDWQAVSTQ-UHFFFAOYSA-N dodecamethylpentasiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C FBZANXDWQAVSTQ-UHFFFAOYSA-N 0.000 claims abstract description 22
- 229940087203 dodecamethylpentasiloxane Drugs 0.000 claims abstract description 22
- 150000001875 compounds Chemical class 0.000 claims abstract description 9
- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000007788 liquid Substances 0.000 claims description 14
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 5
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 239000000203 mixture Substances 0.000 description 9
- 239000004033 plastic Substances 0.000 description 9
- 229920003023 plastic Polymers 0.000 description 9
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 8
- AJDIZQLSFPQPEY-UHFFFAOYSA-N 1,1,2-Trichlorotrifluoroethane Chemical compound FC(F)(Cl)C(F)(Cl)Cl AJDIZQLSFPQPEY-UHFFFAOYSA-N 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 6
- 238000004817 gas chromatography Methods 0.000 description 6
- -1 cyclic siloxane Chemical class 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- 238000007664 blowing Methods 0.000 description 4
- 239000004417 polycarbonate Substances 0.000 description 4
- 229920000515 polycarbonate Polymers 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- ADANNTOYRVPQLJ-UHFFFAOYSA-N [dimethyl(trimethylsilyloxy)silyl]oxy-[[dimethyl(trimethylsilyloxy)silyl]oxy-dimethylsilyl]oxy-dimethylsilane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C ADANNTOYRVPQLJ-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000005060 rubber Substances 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 229940008424 tetradecamethylhexasiloxane Drugs 0.000 description 2
- LOCOMRPWMOCMPV-UHFFFAOYSA-N 2,3-dichloro-1,1,1,2-tetrafluoropropane Chemical compound FC(F)(F)C(F)(Cl)CCl LOCOMRPWMOCMPV-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000010533 azeotropic distillation Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000004811 liquid chromatography Methods 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- MQUIHBQDYYAEMH-UHFFFAOYSA-N methedrone Chemical compound CNC(C)C(=O)C1=CC=C(OC)C=C1 MQUIHBQDYYAEMH-UHFFFAOYSA-N 0.000 description 1
- 235000014593 oils and fats Nutrition 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000005437 stratosphere Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- CYRMSUTZVYGINF-UHFFFAOYSA-N trichlorofluoromethane Chemical compound FC(Cl)(Cl)Cl CYRMSUTZVYGINF-UHFFFAOYSA-N 0.000 description 1
- 239000005436 troposphere Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Landscapes
- Surface Treatment Of Optical Elements (AREA)
- Extraction Or Liquid Replacement (AREA)
- Detergent Compositions (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、フロンの使用を不要と
するとともに、硝子レンズ、プラスチック部品等の光学
部品やモールド部品、金属部品、セラミック部品、電子
部品等の洗浄工程の最終工程で行う仕上げ乾燥方法、特
にシミ,残渣等が無く、洗浄後に行われる真空蒸着膜等
の表面処理においても不具合の生じない仕上げ乾燥方法
に関する。BACKGROUND OF THE INVENTION The present invention eliminates the need for using CFCs and is performed in the final step of the cleaning process for optical parts such as glass lenses and plastic parts, mold parts, metal parts, ceramic parts and electronic parts. The present invention relates to a finish drying method, in particular, a finish drying method which is free from stains, residues, etc. and does not cause any trouble in the surface treatment such as a vacuum deposition film performed after cleaning.
【0002】[0002]
【従来の技術】仕上げ乾燥方法として、従来より1,
1,2−トリクロロ−1,2,2−トリフルオロエタン
(フロン113)のベーパー仕上げ乾燥が用いられてき
た。これはフロン113が不燃性である;生体に対する
毒性が低い;プラスチック,ゴムなどの高分子材料を浸
食しないが、油脂等を溶解するという選択的溶解性を有
する;乾燥速度が速い等の優れた特徴を有しているため
である。2. Description of the Related Art As a finishing drying method,
Vapor finish drying of 1,2-trichloro-1,2,2-trifluoroethane (CFC 113) has been used. This is because CFC 113 is non-flammable; it has low toxicity to living organisms; it does not erode polymeric materials such as plastics and rubber, but it has selective solubility of dissolving oils and fats; excellent drying speed, etc. This is because it has features.
【0003】しかし、近年のオゾン層保護に伴うフロン
113の使用量削減の規制があり、このためフロン代替
を目的として種々の混合物や共沸組成物が開発されてい
る。例えば、特開平1−318094号公報には、フロ
ン113とイソプロピルアルコール,メチルエチルケト
ンとの混合物が、特開平2−289693号公報にはジ
クロロテトラフルオプロパン(フロン234)とエタノ
ール等の脂肪族低級アルコールとの共沸組成物が開示さ
れている。さらに他には、イソプロピルアルコール(I
PA)を用いたベーパー仕上げ乾燥も行われている。However, in recent years, there has been a regulation to reduce the amount of CFC 113 used due to protection of the ozone layer, and therefore various mixtures and azeotropic compositions have been developed for the purpose of CFC substitution. For example, Japanese Patent Application Laid-Open No. 1-318094 discloses a mixture of Freon 113 with isopropyl alcohol and methyl ethyl ketone, and Japanese Patent Application Laid-Open No. 2-289693 describes dichlorotetrafluoropropane (CFC 234) and an aliphatic lower alcohol such as ethanol. Azeotropic compositions are disclosed. In addition, isopropyl alcohol (I
Vapor finish drying using PA) is also performed.
【0004】[0004]
【発明が解決しようとする課題】ところで、フロン11
3等のパーハロエタンは、化学的に特に安定であるため
対流圏内での寿命が長く、拡散して成層圏に達し、ここ
で太陽光線により分解して発生する塩素ラジカルがオゾ
ンと連鎖反応を起こし、オゾン層を破壊することからこ
れらの使用の削減が求められている。そこでこの使用量
を削減する方法として、上述のように、フロン113と
パーハロエタン以外の有機溶剤との共沸組成物が検討さ
れているが、フロン113を必須とするためその使用量
をある程度以上減らすことはできない。また、フロン2
34はフロン113に比べオゾン層の破壊性が比較的小
さいが、オゾン層の破壊を完全になくすことはできな
い。一方、IPAベーパーを用いた仕上げ乾燥は、水等
の影響があると共に、それ自体が引火性を有し、この引
火物をベーパー状態で用いることによる引火の危険性、
プラスチック等を劣化させる等の問題があり実質的でな
い。By the way, Freon 11
Since perhaloethanes such as 3 are chemically stable, they have a long life in the troposphere, diffuse and reach the stratosphere, where the chlorine radicals decomposed by solar rays cause a chain reaction with ozone to generate ozone. There is a need to reduce their use because they destroy the layers. Therefore, as a method for reducing the usage amount, an azeotropic composition of CFC 113 and an organic solvent other than perhaloethane has been studied as described above. However, since CFC 113 is essential, the usage amount is reduced to some extent or more. It is not possible. Also, Freon 2
34 is relatively less destructive to the ozone layer than Freon 113, but cannot completely eliminate the destruction of the ozone layer. On the other hand, the finish drying using IPA vapor has the influence of water and the like, and also has an inflammability, and the risk of ignition due to the use of this flammable substance in a vapor state.
There is a problem such as deterioration of plastic etc. and it is not practical.
【0005】そこで本発明は、これらの問題を鑑みてな
されたものであり、オゾン層を破壊するフロンを使用す
ることなく、水の影響を受けにくく、引火の危険性が少
ない液体状態で用いることができ、プラスチック等を浸
すこともなく、乾燥後におけるシミ,残渣等がない仕上
げ乾燥方法を提供することを目的とする。Therefore, the present invention has been made in view of these problems, and it is used in a liquid state that is not easily affected by water and has a low risk of ignition, without using CFCs that destroy the ozone layer. It is an object of the present invention to provide a finish drying method that does not immerse plastics and the like and that has no stains or residues after drying.
【0006】[0006]
【課題を解決するための手段および作用】本発明の仕上
げ乾燥方法は、ドデカメチルペンタシロキサンの含有量
が0.01重量%未満であり、且つドデカメチルペンタ
シロキサンより揮発性が劣る化合物を実質的に取り除い
た低分子シロキサンを仕上げ乾燥液として用いるもので
ある。低分子シロキサンを用いる理由は、人体への安全
性が高く、プラスチックへのアタック性が少なく、しか
も表面張力が小さく浸透性が良好である等の優れた特性
を有しているためである。ここで実質的に取り除かれた
状態とはGC(ガスクロマトグラフィー)、LC(液体
クロマトグラフィー)等の一般的な分離分析を用いても
検出されないレベルであることを意味する。また、揮発
性の程度を把握する尺度としては蒸気圧を目安とし、そ
の他、蒸発潜熱等を考慮して把握するものである。Means and Actions for Solving the Problems In the finish drying method of the present invention, a compound having a content of dodecamethylpentasiloxane of less than 0.01% by weight and being less volatile than dodecamethylpentasiloxane is substantially used. The low-molecular-weight siloxane removed in step 1 is used as a finishing drying liquid. The reason for using the low-molecular-weight siloxane is that it has excellent properties such as high safety to human body, low attack to plastic, low surface tension and good permeability. Here, the state of being substantially removed means a level that is not detected even by using a general separation analysis such as GC (gas chromatography) and LC (liquid chromatography). Further, the vapor pressure is used as a standard for grasping the degree of volatility, and in addition, it is grasped in consideration of the latent heat of vaporization and the like.
【0007】本発明における低分子シロキサンとして
は、直鎖状シロキサン,環状シロキサンのいずれでも良
く、これらのシロキサンを単体或いは混合物として用い
ることができる。ここで揮発性、引火の危険性を考慮し
た場合、オクタメチルトリシロキサン、またはオクタメ
チルシクロテトラシロキサンが望ましく、実用的であ
る。また、これらの低分子シロキサンの混合系でも用い
ることは可能である。The low-molecular-weight siloxane used in the present invention may be either a linear siloxane or a cyclic siloxane, and these siloxanes may be used alone or as a mixture. Considering volatility and risk of ignition, octamethyltrisiloxane or octamethylcyclotetrasiloxane is desirable and practical. It is also possible to use a mixed system of these low molecular weight siloxanes.
【0008】仕上げ乾燥工程は、洗浄工程、あるいは水
置換工程の上述した仕上げ乾燥液に、浸漬・引き上げを
行い、その後、常温放置,送風あるいは減圧乾燥等によ
り乾燥を行い仕上げ乾燥を行う。これらの乾燥方法は単
独で、あるいは併用して用いることが出来る。In the finish drying step, the above-mentioned finish drying liquid of the washing step or the water replacement step is dipped and pulled up, and then left to stand at room temperature, dried by blowing air or reduced pressure to finish drying. These drying methods can be used alone or in combination.
【0009】本発明において、安定剤等の添加は可能で
あるが、安定剤が備える性質としては、本発明に使用す
る組成物を安定化する効果の大きいことが必要であり、
より好ましくは蒸留操作により同伴留出されるものや共
沸を形成するものが望ましい。In the present invention, it is possible to add a stabilizer and the like, but it is necessary that the stabilizer has a large effect of stabilizing the composition used in the present invention.
More preferably, those that are co-distilled by the distillation operation or those that form an azeotropic distillation are desirable.
【0010】本発明の仕上げ乾燥方法に用いる低分子シ
ロキサンは蒸留・精留または/および活性炭等の吸着に
よりドデカメチルペンタシロキサン等を除去したもので
ある。この組成物は、ドデカメチルペンタシロキサンが
0.01重量%未満であり、しかもドデカメチルペンタ
シロキサンより揮発性が劣るものを取り除いているた
め、送風、減圧乾燥等の乾燥を行った後におけるシミ,
残渣等の発生がない。The low-molecular-weight siloxane used in the finish drying method of the present invention is obtained by removing dodecamethylpentasiloxane by distillation / rectification or / and adsorption of activated carbon. Since this composition contains less than 0.01% by weight of dodecamethylpentasiloxane and is less volatile than dodecamethylpentasiloxane, it removes stains after drying by blowing air or drying under reduced pressure.
No residue is generated.
【0011】本発明においては、 微量含有される揮発
性の劣る成分の仕上げ状態への影響を以下の実験により
確認することができる。理論段数30段以上の蒸留装置
を用いて得たガスクロマトグラフィでの純度99.99
9%以上のオクタメチルトリシロキサン及びオクタメチ
ルシクロテトラシロキサンにドデカメチルペンタシロキ
サンを0.001重量%ずつ加え、それぞれの液に清浄
なスライドガラスを浸漬し引き上げて送風乾燥を行い、
その後、シミ,残渣の状態を双眼実体顕微鏡及び呼気を
かけたときの曇り状態から判断する呼気テストを実施す
る。In the present invention, it is possible to confirm the influence of a trace amount of a component having poor volatility on the finishing state by the following experiment. Purity 99.99 in gas chromatography obtained using a distillation apparatus with a theoretical plate number of 30 or more
Dodecamethylpentasiloxane was added to each of 9% or more of octamethyltrisiloxane and octamethylcyclotetrasiloxane in an amount of 0.001% by weight, and a clean slide glass was dipped in each liquid and pulled up to perform air drying.
After that, an exhalation test is performed to judge the condition of stains and residues from the binocular stereomicroscope and the cloudy condition when exhaled.
【0012】また同様に、テトラデカメチルヘキサシロ
キサンを0.001重量%ずつ加え同様の実験を行う。
この評価として、双眼実体顕微鏡観察及び呼気テストの
どちらかもシミ,残渣が認められないものを「○」、ど
ちらか一方の観察でシミ,残渣が認められたものを
「×」とする。この結果を表1に示す。但し、表1は上
述した実験の中からの抜粋である。この結果からも理解
できるように、ドデカメチルペンタシロキサンが0.0
1重量%より多く含有されるか、もしくはドデカメチル
ペンタシロキサンより揮発性が劣るテトラデカメチルヘ
キサシロキサン等が微量でも含有されるとシミ,残渣が
発生する。Similarly, tetradecamethylhexasiloxane is added in an amount of 0.001% by weight, and the same experiment is conducted.
In this evaluation, “O” indicates that no stain or residue was observed in either the binocular stereoscopic microscope observation or the breath test, and “X” indicates that stain or residue was observed in either observation. The results are shown in Table 1. However, Table 1 is an excerpt from the above-mentioned experiment. As can be understood from these results, dodecamethylpentasiloxane is 0.0
If it is contained in an amount of more than 1% by weight, or even a small amount of tetradecamethylhexasiloxane having a lower volatility than dodecamethylpentasiloxane is contained, stains and residues are generated.
【0013】[0013]
【表1】 [Table 1]
【0014】以上のことから、本発明の仕上げ乾燥方法
で用いる仕上げ乾燥液は、ドデカメチルペンタシロキサ
ンが0.01重量%未満であり、且つドデカメチルペン
タシロキサンより揮発性が劣る化合物を取り除いた低分
子シロキサンを用いるものである。From the above, the finish-drying liquid used in the finish-drying method of the present invention contains less than 0.01% by weight of dodecamethylpentasiloxane, and is a low-volatility compound obtained by removing a compound less volatile than dodecamethylpentasiloxane. It uses a molecular siloxane.
【0015】本発明で用いる低分子シロキサンは生体へ
の毒性が少なく、化学的に安定であり、プラスチックや
ゴム,金属,ガラスなどにほとんど影響を与えることが
ない。しかも、塩素等のハロゲンを含んでいないためオ
ゾン層への影響もなく、安全性の高いものである。The low-molecular-weight siloxane used in the present invention has little toxicity to living bodies, is chemically stable, and has almost no effect on plastics, rubbers, metals, glasses and the like. Moreover, since it does not contain halogen such as chlorine, it does not affect the ozone layer and is highly safe.
【0016】[0016]
【実施例1】硝子レンズ、ポリメチルメタクリレート
(PMMA)および、ポリカーボネイト(PC)からな
るプラスチック、アルミニウム製金属部品を以下の手順
により洗浄した。まず、アルカリ鹸化剤中で超音波を加
えながら洗浄物を脱脂した後、界面活性剤中で超音波を
加えながら再度脱脂した。その後、上水で超音波を加え
ながら水洗浄して界面活性剤を除去し、更に純水で超音
波を加えながら洗浄し、上水のイオンや汚れを除去し洗
浄度を高めた。そして純水の水切りとして、IPAで洗
浄した。最後にオクタメチルトリシロキサンを理論段数
30段以上の蒸留器を用いて得た留出液を仕上げ乾燥液
として用い、この乾燥液に洗浄物を浸漬し、引き上げを
行い、その後送風で乾燥した。Example 1 A glass lens, a plastic made of polymethylmethacrylate (PMMA) and polycarbonate (PC), and a metal part made of aluminum were washed by the following procedure. First, the cleaning product was degreased while applying ultrasonic waves in an alkali saponifying agent, and then degreased again while applying ultrasonic waves in a surfactant. After that, water washing was performed while applying ultrasonic waves to clean water to remove the surfactant, and further washing was performed while applying ultrasonic waves to pure water to remove ions and stains of the clean water to enhance the cleaning degree. Then, it was washed with IPA as a drainer of pure water. Finally, a distillate obtained by using octamethyltrisiloxane in a distiller having a theoretical plate number of 30 or more was used as a finishing drying liquid, and the washed product was immersed in this drying liquid, pulled up, and then dried by blowing air.
【0017】上述した、本実施例で用いた仕上げ乾燥液
を、ガスクロマトグラフィで分析を行ったところ、ドデ
カメチルペンタシロキサンが0.009%であり、ドデ
カメチルペンタシロキサンより揮発性が劣る化合物は認
められなかった。ガスクロマトグラフィの分析条件は、
商品名GC14A(株)島津製造所製)のガスクロマト
グラフィを用い、注入温度を260℃とし、検出温度を
280℃とすると共に、50℃より250℃まで10℃
/minで昇温し、FID検出器、OV−1キャピラリ
カラムを用いて行った。仕上げ乾燥状態の評価として双
眼実体顕微鏡及び呼気テストを実施した。その結果、シ
ミ、残渣等は認められず、良好な仕上げ乾燥を行うこと
が出来た。Gas chromatographic analysis of the above-described finishing dry liquid used in this Example showed that the content of dodecamethylpentasiloxane was 0.009%, and that the compound having a lower volatility than dodecamethylpentasiloxane was found. I couldn't do it. The analysis conditions of gas chromatography are
Using a gas chromatography under the product name GC14A (manufactured by Shimadzu Corporation), the injection temperature is 260 ° C, the detection temperature is 280 ° C, and 10 ° C from 50 ° C to 250 ° C.
The temperature was raised at / min and the measurement was performed using an FID detector and OV-1 capillary column. A binocular stereomicroscope and an exhalation test were performed as an evaluation of the finish dry state. As a result, no stain or residue was observed, and good finish drying could be performed.
【0018】[0018]
【実施例2】硝子レンズ、PMMCおよびPCからなる
プラスチックレンズ、アルミニウム製金属部品を以下の
手順により洗浄した。まず、アルカリ鹸化剤中で超音波
を加えながら洗浄物を脱脂した後、界面活性剤中で超音
波を加えながら再度脱脂した。その後、上水で超音波を
加えながら水洗浄して界面活性剤を除去し、更に純水で
超音波を加えながら洗浄し、上水のイオンや汚れを除去
し洗浄度を高めた。そして、純水の水切りとして、IP
Aで洗浄した。最後にオクタメチルシクロテトラシロキ
サンを理論段数30段以上の蒸留器を用いて得た留出液
を仕上げ乾燥液として用い、この乾燥液に洗浄物を浸漬
し引き上げを行い、その後送風にて乾燥した。本実施例
で用いた仕上げ乾燥液をガスクロマトグラフィで分析を
行ったところ、ドデカメチルペンタシロキサンが0.0
09%であり、ドデカメチルペンタシロキサンより揮発
性が劣る化合物は認められなかった。Example 2 A glass lens, a plastic lens made of PMMC and PC, and an aluminum metal part were washed by the following procedure. First, the cleaning product was degreased while applying ultrasonic waves in an alkali saponifying agent, and then degreased again while applying ultrasonic waves in a surfactant. After that, water washing was performed while applying ultrasonic waves to clean water to remove the surfactant, and further washing was performed while applying ultrasonic waves to pure water to remove ions and stains of the clean water to enhance the cleaning degree. Then, as a drainer of pure water, IP
Washed with A. Finally, a distillate obtained by using octamethylcyclotetrasiloxane in a distiller having a theoretical plate number of 30 or more is used as a finishing dry liquid, and the washed product is immersed in the dry liquid and pulled up, and then dried by blowing air. . When the finishing dried liquid used in this example was analyzed by gas chromatography, it was found that the amount of dodecamethylpentasiloxane was 0.0
It was 09%, and no compound having inferior volatility to dodecamethylpentasiloxane was observed.
【0019】本実施例においても、仕上げ乾燥状態の評
価として実施例1と同様に、双眼実体顕微鏡及び呼気テ
ストにより行った。その結果、シミ,残渣等は認められ
ず良好な仕上げ乾燥を行うことが出来た。Also in this example, the evaluation of the finish dry state was carried out by a binocular stereoscopic microscope and an exhalation test as in Example 1. As a result, no stain or residue was observed, and good finish drying could be performed.
【0020】[0020]
【実施例3】本発明に用いる組成物のアタック性を被洗
浄物に対し行った。アクリル樹脂(PMMA)、ガラス
フィラー入りポリカーボネイト(PC)、ポリプロピレ
ン樹脂(PP)、アクリルニトリルーブタジエンースチ
レン(ABS)の各々で作成された試験片(5×50×
2mm)をガラスビン内にいれ、実施例1及び2の仕上
げ乾燥液として用いたオクタメチルトリシロキサン及び
オクタメチルシクロテトラシロキサン100gで満た
し、常温常湿下に48時間放置し、取り出した後、重量
変化及び外観変化を調べた。結果を表2に示す。Example 3 The composition to be used in the present invention was tested for the attack property on the article to be cleaned. Test pieces (5 × 50 ×) made of acrylic resin (PMMA), polycarbonate with glass filler (PC), polypropylene resin (PP), and acrylonitrile-butadiene-styrene (ABS)
(2 mm) was placed in a glass bottle and filled with 100 g of octamethyltrisiloxane and octamethylcyclotetrasiloxane used as the finishing drying liquid of Examples 1 and 2, left standing at room temperature and normal humidity for 48 hours, taken out, and then changed in weight. And the appearance change was examined. The results are shown in Table 2.
【0021】[0021]
【表2】 [Table 2]
【0022】[0022]
【発明の効果】本発明の仕上げ乾燥方法は、オゾン層を
破壊することなく、水の影響を受けにくく、引火の危険
性が少ない液体状態で用いることができると共に、プラ
スチック等を浸すこともなく、シミ,残渣等がなくな
る。EFFECTS OF THE INVENTION The finish drying method of the present invention can be used in a liquid state that does not destroy the ozone layer, is not easily affected by water, and is less likely to catch fire, and does not soak plastics or the like. , Stains, residues, etc. are gone.
Claims (3)
チルペンタシロキサンの含有量が0.01重量%未満で
あり、且つ、ドデカメチルペンタシロキサンより揮発性
が劣る化合物を実質的に含有しない仕上げ乾燥液を用い
ることを特徴とする仕上げ乾燥方法。1. A finishing dry liquid in which the content of dodecamethylpentasiloxane contained in the low-molecular-weight siloxane is less than 0.01% by weight, and substantially no compound having a lower volatility than dodecamethylpentasiloxane is contained. A method of finish drying, which comprises using
が0.01重量%未満であり、且つ、ドデカメチルペン
タシロキサンより揮発性が劣る化合物を実質的に含有し
ないオクタメチルトリシロキサンを用いることを特徴と
する請求項1記載の仕上げ乾燥方法。2. An octamethyltrisiloxane having a dodecamethylpentasiloxane content of less than 0.01% by weight and containing substantially no compound less volatile than dodecamethylpentasiloxane. The finish drying method according to claim 1.
が0.01重量%未満であり、且つ、ドデカメチルペン
タシロキサンより揮発性が劣る化合物を実質的に含有し
ないオクタメチルシクロテトラシロキサンを用いること
を特徴とする請求項1記載の仕上げ乾燥方法。3. Use of octamethylcyclotetrasiloxane having a dodecamethylpentasiloxane content of less than 0.01% by weight and substantially not containing a compound having a lower volatility than dodecamethylpentasiloxane. The finishing drying method according to claim 1.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12853693A JP3272479B2 (en) | 1993-04-29 | 1993-04-29 | Finish drying method |
| EP94303021A EP0622452B1 (en) | 1993-04-29 | 1994-04-27 | Cleaning process |
| DE69418645T DE69418645T2 (en) | 1993-04-29 | 1994-04-27 | Cleaning process |
| US08/235,298 US5562945A (en) | 1993-04-29 | 1994-04-29 | Method for post-cleaning finishing drying |
| TW083109984A TW474990B (en) | 1993-04-29 | 1994-10-28 | Composition for cleaning and drying and method of cleaning and drying |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12853693A JP3272479B2 (en) | 1993-04-29 | 1993-04-29 | Finish drying method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06312102A true JPH06312102A (en) | 1994-11-08 |
| JP3272479B2 JP3272479B2 (en) | 2002-04-08 |
Family
ID=14987187
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12853693A Expired - Fee Related JP3272479B2 (en) | 1993-04-29 | 1993-04-29 | Finish drying method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3272479B2 (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR0145061B1 (en) | 1990-03-16 | 1998-08-17 | 아오이 죠이치 | Method and apparatus for cleaning |
-
1993
- 1993-04-29 JP JP12853693A patent/JP3272479B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP3272479B2 (en) | 2002-04-08 |
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