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JPH0626667B2 - Cyclodextrin adsorbent and its application - Google Patents

Cyclodextrin adsorbent and its application

Info

Publication number
JPH0626667B2
JPH0626667B2 JP61250832A JP25083286A JPH0626667B2 JP H0626667 B2 JPH0626667 B2 JP H0626667B2 JP 61250832 A JP61250832 A JP 61250832A JP 25083286 A JP25083286 A JP 25083286A JP H0626667 B2 JPH0626667 B2 JP H0626667B2
Authority
JP
Japan
Prior art keywords
cyclodextrin
adsorbent
resin
ligand
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61250832A
Other languages
Japanese (ja)
Other versions
JPS62216640A (en
Inventor
佳明 八木
憲一 山本
幸夫 土山
充克 佐藤
幸喜 藤井
知之 石倉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mercian Corp
Original Assignee
Mercian Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mercian Corp filed Critical Mercian Corp
Publication of JPS62216640A publication Critical patent/JPS62216640A/en
Publication of JPH0626667B2 publication Critical patent/JPH0626667B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08BPOLYSACCHARIDES; DERIVATIVES THEREOF
    • C08B37/00Preparation of polysaccharides not provided for in groups C08B1/00 - C08B35/00; Derivatives thereof
    • C08B37/0006Homoglycans, i.e. polysaccharides having a main chain consisting of one single sugar, e.g. colominic acid
    • C08B37/0009Homoglycans, i.e. polysaccharides having a main chain consisting of one single sugar, e.g. colominic acid alpha-D-Glucans, e.g. polydextrose, alternan, glycogen; (alpha-1,4)(alpha-1,6)-D-Glucans; (alpha-1,3)(alpha-1,4)-D-Glucans, e.g. isolichenan or nigeran; (alpha-1,4)-D-Glucans; (alpha-1,3)-D-Glucans, e.g. pseudonigeran; Derivatives thereof
    • C08B37/0012Cyclodextrin [CD], e.g. cycle with 6 units (alpha), with 7 units (beta) and with 8 units (gamma), large-ring cyclodextrin or cycloamylose with 9 units or more; Derivatives thereof
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/22Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising organic material
    • B01J20/26Synthetic macromolecular compounds
    • B01J20/261Synthetic macromolecular compounds obtained by reactions only involving carbon to carbon unsaturated bonds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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    • B01J20/00Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/22Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising organic material
    • B01J20/26Synthetic macromolecular compounds
    • B01J20/262Synthetic macromolecular compounds obtained otherwise than by reactions only involving carbon to carbon unsaturated bonds, e.g. obtained by polycondensation
    • BPERFORMING OPERATIONS; TRANSPORTING
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    • B01J20/00Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
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    • B01J20/26Synthetic macromolecular compounds
    • B01J20/265Synthetic macromolecular compounds modified or post-treated polymers
    • B01J20/267Cross-linked polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
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    • B01J20/00Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/28Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties
    • B01J20/28014Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties characterised by their form
    • B01J20/28016Particle form
    • BPERFORMING OPERATIONS; TRANSPORTING
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    • B01J20/00Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/281Sorbents specially adapted for preparative, analytical or investigative chromatography
    • B01J20/286Phases chemically bonded to a substrate, e.g. to silica or to polymers
    • B01J20/289Phases chemically bonded to a substrate, e.g. to silica or to polymers bonded via a spacer
    • BPERFORMING OPERATIONS; TRANSPORTING
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    • B01J20/30Processes for preparing, regenerating, or reactivating
    • B01J20/3092Packing of a container, e.g. packing a cartridge or column
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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    • B01J20/00Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/30Processes for preparing, regenerating, or reactivating
    • B01J20/32Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating
    • B01J20/3202Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating characterised by the carrier, support or substrate used for impregnation or coating
    • B01J20/3206Organic carriers, supports or substrates
    • B01J20/3208Polymeric carriers, supports or substrates
    • B01J20/321Polymeric carriers, supports or substrates consisting of a polymer obtained by reactions involving only carbon to carbon unsaturated bonds
    • BPERFORMING OPERATIONS; TRANSPORTING
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    • B01J20/00Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/30Processes for preparing, regenerating, or reactivating
    • B01J20/32Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating
    • B01J20/3202Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating characterised by the carrier, support or substrate used for impregnation or coating
    • B01J20/3206Organic carriers, supports or substrates
    • B01J20/3208Polymeric carriers, supports or substrates
    • B01J20/3212Polymeric carriers, supports or substrates consisting of a polymer obtained by reactions otherwise than involving only carbon to carbon unsaturated bonds
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    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
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    • B01J20/30Processes for preparing, regenerating, or reactivating
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    • B01J20/3214Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating characterised by the method for obtaining this coating or impregnating
    • B01J20/3217Resulting in a chemical bond between the coating or impregnating layer and the carrier, support or substrate, e.g. a covalent bond
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/30Processes for preparing, regenerating, or reactivating
    • B01J20/32Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating
    • B01J20/3214Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating characterised by the method for obtaining this coating or impregnating
    • B01J20/3217Resulting in a chemical bond between the coating or impregnating layer and the carrier, support or substrate, e.g. a covalent bond
    • B01J20/3219Resulting in a chemical bond between the coating or impregnating layer and the carrier, support or substrate, e.g. a covalent bond involving a particular spacer or linking group, e.g. for attaching an active group
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/30Processes for preparing, regenerating, or reactivating
    • B01J20/32Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating
    • B01J20/3214Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating characterised by the method for obtaining this coating or impregnating
    • B01J20/3217Resulting in a chemical bond between the coating or impregnating layer and the carrier, support or substrate, e.g. a covalent bond
    • B01J20/3221Resulting in a chemical bond between the coating or impregnating layer and the carrier, support or substrate, e.g. a covalent bond the chemical bond being an ionic interaction
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/30Processes for preparing, regenerating, or reactivating
    • B01J20/32Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating
    • B01J20/3231Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating characterised by the coating or impregnating layer
    • B01J20/3242Layers with a functional group, e.g. an affinity material, a ligand, a reactant or a complexing group
    • B01J20/3244Non-macromolecular compounds
    • B01J20/3246Non-macromolecular compounds having a well defined chemical structure
    • B01J20/3248Non-macromolecular compounds having a well defined chemical structure the functional group or the linking, spacer or anchoring group as a whole comprising at least one type of heteroatom selected from a nitrogen, oxygen or sulfur, these atoms not being part of the carrier as such
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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    • B01J20/00Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/30Processes for preparing, regenerating, or reactivating
    • B01J20/32Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating
    • B01J20/3231Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating characterised by the coating or impregnating layer
    • B01J20/3242Layers with a functional group, e.g. an affinity material, a ligand, a reactant or a complexing group
    • B01J20/3244Non-macromolecular compounds
    • B01J20/3246Non-macromolecular compounds having a well defined chemical structure
    • B01J20/3248Non-macromolecular compounds having a well defined chemical structure the functional group or the linking, spacer or anchoring group as a whole comprising at least one type of heteroatom selected from a nitrogen, oxygen or sulfur, these atoms not being part of the carrier as such
    • B01J20/3251Non-macromolecular compounds having a well defined chemical structure the functional group or the linking, spacer or anchoring group as a whole comprising at least one type of heteroatom selected from a nitrogen, oxygen or sulfur, these atoms not being part of the carrier as such comprising at least two different types of heteroatoms selected from nitrogen, oxygen or sulphur
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/30Processes for preparing, regenerating, or reactivating
    • B01J20/32Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating
    • B01J20/3231Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating characterised by the coating or impregnating layer
    • B01J20/3242Layers with a functional group, e.g. an affinity material, a ligand, a reactant or a complexing group
    • B01J20/3244Non-macromolecular compounds
    • B01J20/3246Non-macromolecular compounds having a well defined chemical structure
    • B01J20/3248Non-macromolecular compounds having a well defined chemical structure the functional group or the linking, spacer or anchoring group as a whole comprising at least one type of heteroatom selected from a nitrogen, oxygen or sulfur, these atoms not being part of the carrier as such
    • B01J20/3253Non-macromolecular compounds having a well defined chemical structure the functional group or the linking, spacer or anchoring group as a whole comprising at least one type of heteroatom selected from a nitrogen, oxygen or sulfur, these atoms not being part of the carrier as such comprising a cyclic structure not containing any of the heteroatoms nitrogen, oxygen or sulfur, e.g. aromatic structures
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/30Processes for preparing, regenerating, or reactivating
    • B01J20/32Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating
    • B01J20/3231Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating characterised by the coating or impregnating layer
    • B01J20/3242Layers with a functional group, e.g. an affinity material, a ligand, a reactant or a complexing group
    • B01J20/3244Non-macromolecular compounds
    • B01J20/3246Non-macromolecular compounds having a well defined chemical structure
    • B01J20/3248Non-macromolecular compounds having a well defined chemical structure the functional group or the linking, spacer or anchoring group as a whole comprising at least one type of heteroatom selected from a nitrogen, oxygen or sulfur, these atoms not being part of the carrier as such
    • B01J20/3255Non-macromolecular compounds having a well defined chemical structure the functional group or the linking, spacer or anchoring group as a whole comprising at least one type of heteroatom selected from a nitrogen, oxygen or sulfur, these atoms not being part of the carrier as such comprising a cyclic structure containing at least one of the heteroatoms nitrogen, oxygen or sulfur, e.g. heterocyclic or heteroaromatic structures
    • BPERFORMING OPERATIONS; TRANSPORTING
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    • B01J2220/00Aspects relating to sorbent materials
    • B01J2220/50Aspects relating to the use of sorbent or filter aid materials
    • B01J2220/54Sorbents specially adapted for analytical or investigative chromatography
    • BPERFORMING OPERATIONS; TRANSPORTING
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    • B01J2220/00Aspects relating to sorbent materials
    • B01J2220/50Aspects relating to the use of sorbent or filter aid materials
    • B01J2220/58Use in a single column
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
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    • Y10T428/26Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
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    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/29Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991Coated
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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    • Y10T428/31971Of carbohydrate

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
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  • Health & Medical Sciences (AREA)
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  • General Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Molecular Biology (AREA)
  • Medicinal Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
  • Treatment Of Liquids With Adsorbents In General (AREA)

Description

【発明の詳細な説明】 本発明はサイクロデキストリン吸着材に関し、さらに詳
しくは、サイクロデキストリンを含む溶液、例えば、未
反応原料及び各種の副生成物を含むサイクロデキストリ
ンの生成反応混合物からサイクロデキストリンを高効率
かつ高選択性をもつて吸着することのできるサイクロデ
キストリン吸着材及びその用途に関する。
Description: TECHNICAL FIELD The present invention relates to a cyclodextrin adsorbent, and more particularly, to a cyclodextrin-containing solution, for example, a cyclodextrin-producing reaction mixture containing an unreacted raw material and various byproducts. The present invention relates to a cyclodextrin adsorbent capable of adsorbing with high efficiency and high selectivity and its use.

サイクロデキストリンは通常デンプンをサイクロデキス
トリングリコシルトランスフエラーゼ(CGTase)で処
理することにより製造されているが、その際、生成反応
混合物中には、目的生成物のであるサイクロデキストリ
ンのほかに、未反応のデンプン及びデンプンの各種分解
産物、例えばオリゴデキストリン、グルコース、使用酵
素等が混在している。このような未反応原料及び各種の
副生成物を含むサイクロデキストリンの生成反応混合物
からサイクロデキストリンを分離する1つの方法とし
て、該反応混合物にサイクロデキストリンによつて包接
されうる有機溶媒を添加してサイクロデキストリンを固
体として沈澱させて分別する方法が提案されているが、
サイクロデキストリンの主な用途である医薬、食品分野
の用途に対しては、かかる有機溶媒の使用は好ましくな
く、有機溶媒を用いない分離法の開発が望まれている。
Cyclodextrin is usually produced by treating starch with cyclodextrin glycosyl tranferase (CGTase), in which case the reaction product mixture contains unreacted cyclodextrin as well as unreacted product. Starch and various degradation products of starch, such as oligodextrin, glucose, and enzymes used, are mixed. Formation of cyclodextrin containing such unreacted raw materials and various by-products As one method for separating cyclodextrin from a reaction mixture, an organic solvent that can be included by cyclodextrin is added to the reaction mixture. A method has been proposed in which cyclodextrin is precipitated as a solid and fractionated.
The use of such an organic solvent is not preferable for the main applications of cyclodextrin in the fields of medicine and food, and development of a separation method without using an organic solvent is desired.

かかる有機溶媒を用いないサイクロデキストリンの分
離、精製法として、従来、(1)多孔質スチレン−ジビニ
ルベンゼン共重合体からなる樹脂に吸着させる方法(特
開昭56−805号公報)、(2)アニオン交換樹脂を用
い、還元糖及びサイクロデキストリンの混液から還元糖
のみを吸着除去し、サイクロデキストリンを分離する方
法(特開昭51−136,889号公報)、(3)強酸性カ
チオン交換樹脂のアルカリ金属塩又はアルカリ土類金属
塩を充填してカラムで処理して、サイクロデキストリン
区分トグルコース区分とに分画する方法(特開昭57−
146600号公報)等が知られているが、しかしこれ
ら従来の方法において使用されている多孔質樹脂及びイ
オン交換樹脂は選択性に乏しく、サイクロデキストリン
の分離回収に際して煩雑な溶離処理を必要とし、工業的
に充分に満足できるものではない。
As a method for separating and purifying cyclodextrin without using such an organic solvent, conventionally, (1) a method of adsorbing the resin on a porous styrene-divinylbenzene copolymer (JP-A-56-805), (2) A method of adsorbing and removing only reducing sugar from a mixed solution of reducing sugar and cyclodextrin using an anion exchange resin to separate cyclodextrin (JP-A-51-136,889), (3) strong acid cation exchange resin A method in which an alkali metal salt or an alkaline earth metal salt is packed and treated in a column to fractionate into a cyclodextrin compartment and a glucose compartment (JP-A-57-
However, the porous resin and the ion exchange resin used in these conventional methods have poor selectivity and require a complicated elution treatment when separating and recovering cyclodextrin. Is not completely satisfactory.

そこで、本発明者らは選択性に優れしかも簡単な溶離操
作でサイクロデキストリンを分離しうる吸着材について
鋭意研究を行なった結果本発明を完成するに至った。
Therefore, the present inventors have completed the present invention as a result of earnest research on an adsorbent having excellent selectivity and capable of separating cyclodextrin by a simple elution operation.

しかして、本発明によれば、サイクロデキストリンによ
つて包接されうる大きさのリガンドがスペーサ基(space
r radical)を介して化学的に結合されている水不溶性
樹脂基体からなることを特徴とするサイクロデキストリ
ン吸着材が提供される。
Therefore, according to the present invention, a ligand having a size that can be included by cyclodextrin is a spacer group (space group).
There is provided a cyclodextrin adsorbent characterized by comprising a water-insoluble resin substrate chemically bound via (r radical).

以下、本発明のサイクロデキストリン吸着材について、
さらに詳細に説明する。
Hereinafter, for the cyclodextrin adsorbent of the present invention,
It will be described in more detail.

リガンド: 本発明の特徴は、サイクロデキストリン吸着材として、
従来の多孔質樹脂やイオン交換樹脂の代りに、サイクロ
デキストリンによつて包接される大きさのリガンドがス
ペーサ基を介して結合している樹脂基体を使用する点に
ある。
Ligand: A feature of the present invention is as a cyclodextrin adsorbent,
Instead of the conventional porous resin or ion-exchange resin, a resin substrate in which a ligand having a size to be included by cyclodextrin is bound via a spacer group is used.

しかして、本発明の吸着材において使用されるリガンド
は、サイクロデキストリンの環状空洞の中に入りこみ、
該空洞内面に疎水性結合によつて吸着される程度の、す
なわち包接されうる大きさの原子団であり、一般的に言
って、嵩高な分子構造をもつ疎水性の有機残基が包含さ
れる。サイクロデキストリンによつて包接されるリガン
ドの大きさは、サイクロデキストリンの環状空洞の径に
よつて制限され、リガンドの大きさを該リガンドの原子
団全体をちょうど包囲する楕円体として観念したとき、
その楕円体の短径が約4〜約10Å、好ましくは約5〜
約7.5Åの範囲内に入るような大きさが適当である。
Thus, the ligand used in the adsorbent of the present invention enters the cyclodextrin annular cavity,
It is an atomic group of a size that can be adsorbed to the inner surface of the cavity by a hydrophobic bond, that is, a size that can be included, and generally includes a hydrophobic organic residue having a bulky molecular structure. It The size of the ligand clathrated by the cyclodextrin is limited by the diameter of the cyclodextrin's annular cavity, and when the size of the ligand is considered as an ellipsoid just surrounding the entire atomic group of the ligand,
The minor axis of the ellipsoid is about 4 to about 10Å, preferably about 5
A size that is within the range of about 7.5Å is suitable.

しかして、本発明の吸着材において使用しうるリガンド
の具体例としては以下に示すものが包含される:tert−
ブチル、3,3−ジメチルブチル、2,2−ジメチルブ
チル、2,3−ジメチルブチルなどのC3〜C7、好まし
くはC4〜C6分岐鎖状脂肪族炭化水素基;シクロヘキシ
ル、シクロヘキセニル、アダマンチル、ノルボルネニ
ル、グリチルレチン酸残基、カンフアー残基、ボルネオ
ール残基、3−ジメチルシクロヘキシル、4−エチルシ
クロヘキシル、アビエチン酸残基、ヘコゲニン残基、ス
テビオ類残基などのC5〜C34、好ましくはC6〜C29
環式炭化水素基;フエニル、ナフチル、p−tert−ブチ
ルフエニル、フエナンスリルなどの芳香族炭化水素基;
フリル、チオフエン残基、テトラヒドロフリル、テトラ
ヒドロチオフエン残基などの複素環式基。
Therefore, specific examples of the ligand that can be used in the adsorbent of the present invention include the following: tert-
Butyl, 3,3-dimethylbutyl, 2,2-dimethylbutyl, 2,3-C 3 -C 7 such dimethylbutyl, preferably C 4 -C 6 branched-chain aliphatic hydrocarbon group; cyclohexyl, cyclohexenyl , adamantyl, norbornenyl, glycyrrhetinic acid residue, Kanfua residue, borneol residue, 3-dimethyl-cyclohexyl, 4-ethylcyclohexyl, abietic acid residue, hecogenin residue, C 5 -C 34, such as Sutebio acids residues, preferably Is a C 6 -C 29 alicyclic hydrocarbon group; aromatic hydrocarbon groups such as phenyl, naphthyl, p-tert-butylphenyl, and fennathryl;
Heterocyclic groups such as furyl, thiophene residue, tetrahydrofuryl, tetrahydrothiophene residue.

これらのリガンドの中で好ましいものとしては、tert−
ブチル基、シクロヘキシル基、アダマンチル基、ノルボ
ネニル基、グリチルレチン酸残基、アビエチン酸残基、
p−tert−ブチルフエニル基などが挙げられる。
Preferred among these ligands are tert-
Butyl group, cyclohexyl group, adamantyl group, norbonenyl group, glycyrrhetinic acid residue, abietic acid residue,
A p-tert-butylphenyl group and the like can be mentioned.

水不溶性樹脂基体: 本発明の吸着材において基体として使用される樹脂は、
実質的に水に不溶性のものであれば、その種類には制限
はなく任意のものを用いることができる。以下に、本発
明の吸着材の基体として使用しうる樹脂のうちの代表的
なものを例示するが、本発明で使用する吸着材用の樹脂
基体はこれらに限定されるものではなく、後述する方法
でスペーサ基を介して前記リガンドを導入することがで
きるものである限り任意の樹脂が使用できることを理解
すべきである。
Water-insoluble resin substrate: The resin used as the substrate in the adsorbent of the present invention is
There is no limitation on the kind as long as it is substantially insoluble in water, and any one can be used. Hereinafter, representative ones of the resins that can be used as the base material of the adsorbent of the present invention are exemplified, but the resin base material for the adsorbent used in the present invention is not limited to these and will be described later. It should be understood that any resin can be used as long as the method allows the ligand to be introduced via a spacer group.

なお、本明細書において「樹脂基体」とは、樹脂の主体を
なす骨格構造部分をいい、該樹脂がリガンドを導入する
ための官能基含有側鎖を有する場合には、その側鎖を除
いた部分である。
In the present specification, the “resin substrate” refers to a skeleton structure portion which is a main component of the resin, and when the resin has a functional group-containing side chain for introducing a ligand, the side chain is excluded. It is a part.

以下においては、かかる樹脂基体のみならず、かかる樹
脂基体にさらに、リガンドを導入するための官能基含有
側鎖が既に導入されているものをも含めて例示すること
を了解されたい。
It should be understood that in the following, not only such a resin substrate but also a resin substrate having a functional group-containing side chain for introducing a ligand has been already introduced.

(1)多糖類系化合物及びその誘導体 多糖類系化合物としては、例えばセルロース、デキスト
ラン、アガロース、キチン、キトサン等が挙げられ、ま
た、その誘導体には、該多等類系化合物の架橋物又は該
多等類系化合物に存在する水酸基を利用して、エポキシ
基、活性化カルボキシル基、ハロアセチル基、第3級も
しくは第4級アンモニウム塩基などの官能基を含む側鎖
を導入したものが包含される[かかる基の導入法につい
ては、例えば「新実験化学講座」第20巻第67〜70
頁、昭和53年6月20日(株)丸善発行;P.Cautrec
asas,J,Biol. Chem. ,2453059(1970);
P.Cautrecasas,I.Parikh,Biochemistry,11,2
291(1972);L.Sundberg,J.Porath,J.C
hromatgr.,90,87(1974)などを参照]。
(1) Polysaccharide-based compounds and derivatives thereof Polysaccharide-based compounds include, for example, cellulose, dextran, agarose, chitin, chitosan, and the like, and its derivatives include cross-linked products of the polyheterogeneous compound or Those in which a side chain containing a functional group such as an epoxy group, an activated carboxyl group, a haloacetyl group, a tertiary or quaternary ammonium salt group is introduced by utilizing a hydroxyl group existing in a multi-class compound are included. [For the introduction method of such a group, see, for example, "New Experimental Chemistry Course", Vol. 20, No. 67-70.
Page, published by Maruzen Co., Ltd. on June 20, 1978; Cautrec
asas, J, Biol. Chem., 245 3059 (1970);
P. Cautrecasas, I. Parikh, Biochemistry, 11 , 2
291 (1972); Sundberg, J .; Porath, J .; C
hromatgr. , 90 , 87 (1974)].

このような多等類系化合物及びその誘導体の具体例とし
ては、AH−セフアロース4B、CH−セフアロース4
B、エポキシ−活性化セフアロース6B、ジエチルアミ
ノエチル−セフアデツクス、第4級アミノエチル−セフ
アデツクス、スルホプロピル−セフアデツクス等の商品
名でフアルマシア・フアインケミカル社から市販されて
いるものやキトパール、キトビーズ等の商品名で富士紡
績(株)から市販されているものが挙げられる。
Specific examples of such multi-class compounds and derivatives thereof include AH-Sepharose 4B and CH-Sepharose 4
B, epoxy-activated cepharose 6B, diethylaminoethyl-cephadex, quaternary aminoethyl-cephadex, sulfopropyl-cephadex, and the like, which are commercially available from Huarmacia Huaine Chemical Co., and products such as chitopearl and chitobeads. Examples include those commercially available from Fuji Spinning Co., Ltd.

(2)スチレン系樹脂 スチレン系樹脂としては、スチレン又はその核置換誘導
体(例えばハロアルキル置換スチレン、アミノアルキル
置換スチレン、第4級アミノアルキル置換スチレン、カ
ルボキシアルキル置換スチレン)を主たる構成単位とし
て含有する単独又は共重合体が包含され、特にクロルメ
チル化ポリスチレン、スチレン−ジビニルベンゼン共重
合体又はそのベンゼン環上にクロルメチル基、アミノア
ルキル基、第4級アミノアルキル基、カルボキシアルキ
ル基等の官能基含有側鎖を導入したものが好適である。
そのような樹脂の具体例としては、クロルメチル化ポリ
スチレン、或いはダイヤイオンWA系樹脂、ダイヤイオ
ンPA系樹脂、ダイヤイオンWK系樹脂などの商品名で
三菱化成工業(株)から市販されているものが挙げられ
る。
(2) Styrene-based resin A styrene-based resin is a styrene-based resin that contains styrene or a nuclear-substituted derivative thereof (for example, haloalkyl-substituted styrene, aminoalkyl-substituted styrene, quaternary aminoalkyl-substituted styrene, carboxyalkyl-substituted styrene) as a main constituent unit. Or a copolymer, especially a chloromethylated polystyrene, a styrene-divinylbenzene copolymer or a functional group-containing side chain such as a chloromethyl group, an aminoalkyl group, a quaternary aminoalkyl group or a carboxyalkyl group on its benzene ring. Those introduced with are preferable.
Specific examples of such resins include those commercially available from Mitsubishi Kasei Kogyo Co., Ltd. under the trade names of chloromethylated polystyrene, Diaion WA resin, Diaion PA resin, Diaion WK resin and the like. Can be mentioned.

(3)ポリアクリルアミド系樹脂 ポリアクリルアミド系樹脂としては、アクリルアミドの
単独重合体又はアクリルアミドを主体とする共重合体、
或いはこれら重合体のアミド基を介してアミノアルキル
基、第4級アミノアルキル基、アミノフエニル基、第4
級アミノフエニル基等を導入したものが包含され、具体
的には例えば、バイオーゲル(Bio−Gel)、エンズアク
リル(Enzacryl)などの商品名でバイオ−ラツド社から
市販されているものが挙げられる。
(3) Polyacrylamide-based resin As the polyacrylamide-based resin, a homopolymer of acrylamide or a copolymer mainly composed of acrylamide,
Alternatively, through the amide group of these polymers, an aminoalkyl group, a quaternary aminoalkyl group, an aminophenyl group, a quaternary aminoalkyl group,
Those containing a primary aminophenyl group and the like are included, and specific examples thereof include those commercially available from Bio-Rad Co. under the trade names of Bio-Gel, Enzacryl and the like.

(4)ペプチド類 例えばp−アミノ−DL−フエニルアラニン−L−ロイ
シン等。
(4) Peptides such as p-amino-DL-phenylalanine-L-leucine.

(5)その他 後述する方法でリガンドを化学的に結合しうる官能基を
有するペンダント側鎖を有するか又は導入された各種の
(共)重合体、例えば、それ自体既知の水不溶性樹脂を製
造するために用いられる、各種モノマーの単独重合体ま
たはそれらの適当な組合せからなる共重合体が挙げら
れ、具体的なものとしては、ブタジエン、イソプレン等
のジエン類の重合体;クロルメチルビニルエーテル、ア
リルグリシジルエーテル等のビニルエーテル類の重合
体;アクリル酸アミド、アクリル酸エステル、アクリロ
ニトリル、N−メチロールアクリルアミド等のアクリル
酸類の重合体;メタクリル酸エステル、メタクリロニト
リル、グリシジルメタクリレート、2−ヒドロキシエチ
ルメタクリレート、2−スルホエチルメタクリレート、
2−クロロ(ブロモ)エチルメタクリレート等のメタクリ
ル酸類の重合体;イタコン酸、クロトン酸等の不飽和カ
ルボン酸類の重合体;フエノール、テトラエチレンペン
タミン、およびフエニレンジアミンとホルマリンとの重
合体;並びにそれらの二種以上のモノマーからなる共重
合体を挙げることができる。また、これらのモノマーに
上記リガンドを下記の共有結合によるいずれかの結合法
により結合せしめた誘導体をモノマーとした各種共重合
体の場合は、以下のリガンドを結合せしめるまでもな
く、本発明の担体とすることができる。なお、これらの
重合体はそれ自体公知の重合方法、例えば、ラジカル重
合、重縮合法によつて製造することができる。
(5) Others Various kinds of pendant side chains having a functional group capable of chemically binding a ligand by the method described below or having been introduced
(Co) polymers, for example, used for producing a water-insoluble resin known per se, homopolymers of various monomers or copolymers composed of a suitable combination thereof, and specific examples include Polymers of dienes such as butadiene, butadiene and isoprene; Polymers of vinyl ethers such as chloromethyl vinyl ether and allyl glycidyl ether; Polymers of acrylic acid such as acrylic acid amide, acrylic ester, acrylonitrile and N-methylol acrylamide; Methacryl Acid ester, methacrylonitrile, glycidyl methacrylate, 2-hydroxyethyl methacrylate, 2-sulfoethyl methacrylate,
Polymers of methacrylic acids such as 2-chloro (bromo) ethyl methacrylate; polymers of unsaturated carboxylic acids such as itaconic acid and crotonic acid; polymers of phenol, tetraethylenepentamine, and phenylenediamine with formalin; and The copolymer which consists of those 2 or more types of monomers can be mentioned. Further, in the case of various copolymers using a derivative obtained by binding the above ligand to these monomers by any one of the following covalent bonding methods, the carrier of the present invention does not need to be bound with the following ligands. Can be Incidentally, these polymers can be produced by a polymerization method known per se, for example, radical polymerization or polycondensation method.

以上に述べた樹脂の中、好適なものとしては、(1)の多
糖類系化合物及びその誘導体が挙げられ、中でも、キト
サン及びその架橋物が特に好適である。
Among the resins described above, preferable examples include the polysaccharide compound (1) and derivatives thereof, and among them, chitosan and its crosslinked product are particularly preferable.

本発明によるサイクロデキストリン吸着材の製造 本発明の吸着材は、前述したリガンドを、上記の水不溶
性樹脂基体に、適当なスペーサ基を介して導入すること
によつて製造することができる。以下その方法について
述べる。
Production of Cyclodextrin Adsorbent According to the Present Invention The adsorbent of the present invention can be produced by introducing the above-mentioned ligand into the above water-insoluble resin substrate via a suitable spacer group. The method will be described below.

(1)共有結合反応を利用する方法 式中、は水不溶性樹脂基体であり、 Lはリガンドであり、 X及ぴYは相互に反応して共有結合しうる官能基を表わ
し、 Z1はスペーサ基を表わし、 Q1はスペーサ基Z1の一部をなすもので、上記水不溶性
樹脂が有し又は該樹脂に導入された官能基含有側鎖から
官能基Xを除いた部分を表わし、 Q2はスペーサ基Z1の他の一部をなすもので、リガンド
Lと官能基Yをつなぐ2価の残基を表わし、 p及びqはそれぞれ0又は1である。
(1) Method using covalent bond reaction In the formula, is a water-insoluble resin substrate, L is a ligand, X and Y represent functional groups capable of reacting with each other to form a covalent bond, Z 1 represents a spacer group, and Q 1 represents a spacer group Z. 1 is a part of 1 and represents a portion excluding the functional group X from the functional group-containing side chain that the water-insoluble resin has or is introduced into the resin, and Q 2 represents another part of the spacer group Z 1. It represents a divalent residue that connects the ligand L and the functional group Y, and p and q are 0 or 1, respectively.

ここでX及びYで表わされる官能基及びその共有結合に
使用される反応のタイプを示せば下記表−1に例示する
とおりである: 上記表−1において、カルボキシル基(−COOH)の反
応性誘導体としては、カルボン酸ハライド(例:−CO
Cl、−COBr)、カルボン酸無水物、混合酸無水物、
活性カルボン酸エステル基 等が挙げられる[後記表−2においても同じ]。
The functional groups represented by X and Y and the type of reaction used for the covalent bond thereof are shown in Table 1 below: In Table 1 above, the reactive derivative of the carboxyl group (—COOH) is a carboxylic acid halide (eg, —COOH).
Cl, --COBr), carboxylic acid anhydride, mixed acid anhydride,
Active carboxylic acid ester group Etc. [the same applies to Table 2 below].

また、上記反応式Aにおいて使用される式(I)及び(II)
の出発原料及び式(III)の吸着材樹脂のタイプを例示す
れば次のとおりである。
Further, the formulas (I) and (II) used in the above reaction scheme A are
Examples of the starting material and the type of the adsorbent resin of the formula (III) are as follows.

(i) 又は 又は 又は (ii) 式中、 はセルロースの基本骨核のうち部分的に水酸基を省略し
た水不溶性樹脂基体を表わす。
(i) Or Or Or (ii) In the formula, Represents a water-insoluble resin substrate in which hydroxyl groups are partially omitted in the basic bone nucleus of cellulose.

なお、ここで 及びLは前記表−2におけるNo.1〜18及びNo.33〜
41の 及びLと同じものを表わし、 がスペーサ基に相当する。
In addition, here And L are No. 1 to 18 and No. 33 to in Table 2 above.
41's And the same as L, Corresponds to the spacer group.

(iii) 式中、 は架橋デキストリンの基本骨核の部分的に水酸基を省略
した水不溶性樹脂基体を表わす。
(iii) In the formula, Represents a water-insoluble resin substrate in which hydroxyl groups are partially omitted in the basic bone nucleus of crosslinked dextrin.

なお、ここで 及びLは前記表−2におけるNo.1〜18及びNo.33〜
41の 及びLと同じものを表わし、 がスペーサ基に相当する。
In addition, here And L are No. 1 to 18 and No. 33 to in Table 2 above.
41's And the same as L, Corresponds to the spacer group.

(iv)スチレン系樹脂 a) 式中、は例えば一般式 で示されるスチレン系樹脂基体を表わす。(iv) Styrenic resin a) In the formula, is, for example, the general formula Represents a styrene resin substrate represented by.

ここで、 及びLは前記表−2におけるNo.1〜18及びNo.33〜
41の 及びLと同じものを表わし、 がスペーサ基に相当する。
here, And L are No. 1 to 18 and No. 33 to in Table 2 above.
41's And the same as L, Corresponds to the spacer group.

b) 式中、は例えば一般式 で示されるスチレン系樹脂基体を表わす。b) In the formula, is, for example, the general formula Represents a styrene resin substrate represented by.

ここで、 及びLは前記表−2におけるNo.19〜31の 及びLと同じものを表わし、 がスペーサ基に相当する。here, And L are those of Nos. 19 to 31 in Table 2 above. And the same as L, Corresponds to the spacer group.

c) 式中、は例えば一般式 で示されるスチレン系樹脂基体を表わし、 m=5〜20を表わす。c) In the formula, is, for example, the general formula Represents a styrene resin substrate represented by, and represents m = 5 to 20.

ここで、 及びLは前記表−2におけるNo.1〜18及びNo.33〜
41の 及びLと同じものを表わし、 がスペーサ基に相当する。
here, And L are No. 1 to 18 and No. 33 to in Table 2 above.
41's And the same as L, Corresponds to the spacer group.

(v)アクリル系樹脂 a) 式中、は一般式 で示されるアクリル系樹脂基体を表わす。(v) Acrylic resin a) Where is a general formula Represents an acrylic resin substrate represented by.

ここで、 及びLは前記表−2におけるNo.19〜31の 及びLと同じものを表わし、 がスペーサ基に相当する。here, And L are those of Nos. 19 to 31 in Table 2 above. And the same as L, Corresponds to the spacer group.

b) 式中、は一般式 で示されるアクリル系樹脂基体を表わす。b) Where is a general formula Represents an acrylic resin substrate represented by.

ここで、 及びLは前記表−2におけるNo.1〜18及びNo.33〜4
1の 及びLと同じものを表わし、 がスペーサ基に相当する。
here, And L are Nos. 1-18 and Nos. 33-4 in Table 2 above.
One And the same as L, Corresponds to the spacer group.

(vi)ポリアミノ酸系樹脂 式中、は一般式 で示されるポリアミノ酸系樹脂基体を表わす。(vi) Polyamino acid resin Where is a general formula Represents a polyamino acid resin substrate represented by.

ここで、 及びLは前記表−2におけるNo.1〜18及びNo.33〜
41の 及びLと同じものを表わし、 がスペーサ基に相当する。
here, And L are No. 1 to 18 and No. 33 to in Table 2 above.
41's And the same as L, Corresponds to the spacer group.

(2)イオン結合反応を利用する方法 式中、 及びLは前記の意味を有し、 A及びBは相互に反応してイオン結合しうる官能基を表
わし、 Z2はスペーサ基を表わし、 Q3はスペーサ基Z2の一部をなすもので、水不溶性樹脂
が有し又は該樹脂に導入された官能基含有側鎖から官能
基Aを除いた部分を表わし、 Q4はスベーサ基Z2の他の一部をなすもので、リガンド
Lと官能基Bをつなぐ2価の残基を表わし、 a及びbはそれぞれ0又は1である。
(2) Method using ionic bond reaction Wherein, and L have the above-mentioned meanings, A and B represent functional groups capable of reacting with each other to form an ionic bond, Z 2 represents a spacer group, and Q 3 represents a part of the spacer group Z 2 . Which represents a portion of the functional group-containing side chain that the water-insoluble resin has or has been introduced into the resin, excluding the functional group A, and Q 4 is another part of the spacer group Z 2 . It represents a divalent residue connecting the ligand L and the functional group B, and a and b are 0 or 1, respectively.

上記反応式Bの具体例を示せば次のとおりである。A specific example of the reaction formula B is as follows.

(a) (b) 上記反応式(a)、(b)において 及びLの具体例には以下のものが挙げられる。(a) (b) In the above reaction formulas (a) and (b) Specific examples of L and L include the following.

上記(1)及び(2)に示す共有結合又はイオン結合反応を利
用した本発明の吸着材の製造における式(I)又は(IV)の
水不溶性樹脂成分と(II)又は(V)のリガンド導入成分と
の反応はそれ自体既知の方法で行なうことができ、例え
ば、千畑一郎編「固定化酵素」9〜85頁、昭和50年3
月20日(株)講談社発行;K.Mosbach,ed. ,“Metho
ds in Enzymology”,Voll44,Academic Press,
New York(1976);R.Axen,S.Ernback,Eu
r.J.Biochem. ,18,351(1971)などに記載
の方法に準じて行なうことができるので、ここでは本文
献の引用をもつて詳細な記述に代える。
Water-insoluble resin component of formula (I) or (IV) and ligand of (II) or (V) in the production of the adsorbent of the present invention using the covalent bond or ionic bond reaction shown in (1) and (2) above The reaction with the introduced component can be carried out by a method known per se, for example, “Immobilized Enzyme” edited by Ichiro Chibata, pp. 9-85, March 1975.
Published by Kodansha Co., Ltd. on March 20; K. Mosbach, ed., "Metho
ds in Enzymology ”, Voll44, Academic Press,
New York (1976); Axen, S.M. Ernback, Eu
r. J. Biochem., 18 , 351 (1971) and the like can be carried out according to the method, and therefore the detailed description will be replaced with the citation of this document.

本発明の吸着材樹脂において、リガンドと樹脂基体との
間に介在するスペーサ基は、サイクロデキストリンが吸
着材樹脂に近接してリガンドを包接する際に、樹脂基体
が立体的障害となるのを避ける役割をはたすものであ
り、そのため該スペーサ基はリガンドを樹脂基体(支持
体)から或る程度以上隔てるだけの長さを有しているこ
とが望ましく、その長さは基体樹脂及び/又はリガンド
の種類によつて異なり一概には規定できないが、一般的
に云えば、スペーサ基部とリガンド部を合わせた長さが
少なくとも10オングストローム以上、好ましくは10
〜60オングストローム、さらに好ましくは15〜30
オングストロームの範囲内の長さをもつようにスペーサ
基を選ぶことができる。
In the adsorbent resin of the present invention, the spacer group interposed between the ligand and the resin substrate prevents the resin substrate from becoming a steric hindrance when the cyclodextrin is in the vicinity of the adsorbent resin and includes the ligand. It is desirable that the spacer group has a length enough to separate the ligand from the resin substrate (support) to a certain extent or more, and the length of the spacer group should be the same as that of the substrate resin and / or the ligand. Although it differs depending on the type and cannot be specified in a general manner, generally speaking, the total length of the spacer base portion and the ligand portion is at least 10 angstroms or more, preferably 10 angstroms or more.
-60 angstrom, more preferably 15-30
Spacer groups can be chosen to have lengths in the Angstrom range.

ここでスペーサ基とリガンド部を合わせた長さは、CP
K(Corey−Pauling Koltun)分子モデル(米国、Eal
ing社製)に基づき算出した値を表わす。
Here, the total length of the spacer group and the ligand is CP
K (Corey-Pauling Koltun) molecular model (Eal, USA
ing company).

本発明により提供される吸着材樹脂は、後述する用途に
応じて適した任意の形態に成形されていることができ、
例えば、ビーズ状、繊維状、中空繊維状、円柱状、角柱
状、フイルム状等の形態をとることができ、特にビーズ
状であることが好ましい。
The adsorbent resin provided by the present invention can be molded in any suitable form depending on the application described below,
For example, it can be in the form of beads, fibers, hollow fibers, cylinders, prisms, films, etc., with beads being particularly preferred.

以下、本発明の吸着材の具体的製造法を実施例により更
に詳細に説明する。
Hereinafter, a specific method for producing the adsorbent of the present invention will be described in more detail with reference to examples.

実施例1 乾燥したダイヤイオンWA−20(OH型)樹脂20mlを
乾燥クロロホルム中に1時間浸漬したあと、10.8ml
(77.4mmol)のトリエチルアミンと50mlの乾燥クロ
ロホルムに溶解した4′-ニトロベンゼン−4−tert−
ブチル安息香酸エステル16.2g(54.1mmol)を加
えた。還流下で6時間反応させたのち、樹脂を取し、
2%(W/V)の水酸化ナトリウムを含む50%(V/V)
エタノール水溶液で洗浄し、p−ニトロフエノールを除
去した。更に水洗、乾燥し、WA−20樹脂のエチレン
アミン側鎖P−カイスト−ブチル安息香酸がそのカルボ
キシル基を介してアミド結合した吸着材樹脂を得た。
Example 1 20 ml of dried Diaion WA-20 (OH type) resin was immersed in dry chloroform for 1 hour and then 10.8 ml.
4'-Nitrobenzene-4-tert- dissolved in (77.4 mmol) triethylamine and 50 ml dry chloroform.
Butylbenzoic acid ester 16.2 g (54.1 mmol) was added. After reacting under reflux for 6 hours, remove the resin,
50% (V / V) containing 2% (W / V) sodium hydroxide
It was washed with an aqueous ethanol solution to remove p-nitrophenol. Further, it was washed with water and dried to obtain an adsorbent resin in which the ethyleneamine side chain P-kaist-butylbenzoic acid of WA-20 resin was amide-bonded through its carboxyl group.

実施例2 2−ノルボルネン酢酸、3−メチル−1−アダマンタン
酢酸とパラニトロフエノールとの活性エステル体を用い
て、上記実施例1と同様に処理し対応するリガンドを有
する吸着材樹脂を調製した。
Example 2 Using an active ester of 2-norbornene acetic acid, 3-methyl-1-adamantane acetic acid and para-nitrophenol, the same treatment as in Example 1 was carried out to prepare an adsorbent resin having a corresponding ligand.

実施例3 グリチルリチン7.9g(6.8mmol)を乾燥N,N−ジ
メチルホルムアミド(DMF)200mlに溶解させる。
Example 3 7.9 g (6.8 mmol) of glycyrrhizin are dissolved in 200 ml of dry N, N-dimethylformamide (DMF).

そこへジシクロヘキシルカルボジイミド(DCC)7.0
g(33.9mmol)を乾燥DMF100mlに溶解した溶液
を加え、室温で3時間撹拌した。
Dicyclohexylcarbodiimide (DCC) 7.0
A solution of g (33.9 mmol) dissolved in 100 ml of dry DMF was added, and the mixture was stirred at room temperature for 3 hours.

乾燥したダイヤイオンWA−20(OH型)樹脂20mlを
加え、室温で24時間撹拌した。
20 ml of dried Diaion WA-20 (OH type) resin was added, and the mixture was stirred at room temperature for 24 hours.

反応後樹脂を取しエタノールで十分に洗浄しジシクロ
ヘキシル尿素を除去した。更に水洗し、乾燥しWA−2
0樹脂のエチレンアミン側鎖にケリチルリチン酸がその
カルボキシル基を介してアミド結合した吸着材樹脂を得
た。
After the reaction, the resin was taken and thoroughly washed with ethanol to remove dicyclohexylurea. Wash with water and dry WA-2
An adsorbent resin was obtained in which kerithyrrhizinic acid was amide-bonded to the ethyleneamine side chain of No. 0 resin via its carboxyl group.

実施例4 乾燥したダイヤイオンWA−20(OH型)樹脂20mlに
乾燥したテトラヒドロフラン30mlとトリエチルアミン
20ml(0.14mol)を加えた。17ml(0.127mol)
のシクロヘキシルカルボニルクロライドを20mlのテト
ラヒドロフランにとかした溶液を窒素雰囲気中で氷冷下
に滴下し、加え終った後、室温まで反応温度を上げ、一
夜かきまぜた。樹脂を取し、テトラヒドロフランで過
剰の試薬を洗浄除去し、更に水洗、乾燥して、WA−2
0樹脂のエチレンアミン側鎖にシクロヘキシルカルボニ
ル基がアミド結合した吸着材樹脂を得た。
Example 4 To 20 ml of dried Diaion WA-20 (OH type) resin was added 30 ml of dried tetrahydrofuran and 20 ml (0.14 mol) of triethylamine. 17 ml (0.127 mol)
A solution of cyclohexylcarbonyl chloride in 20 ml of tetrahydrofuran was added dropwise under ice cooling in a nitrogen atmosphere, and after the addition was completed, the reaction temperature was raised to room temperature and stirred overnight. Remove the resin, wash away excess reagent with tetrahydrofuran, wash with water, and dry to remove WA-2.
An adsorbent resin in which a cyclohexylcarbonyl group was amide-bonded to the ethyleneamine side chain of 0 resin was obtained.

実施例5 シクロヘキシルカルボニルクロライドの代りに、ミリス
チン酸クロライド又はシクロヘキシルプロピオン酸クロ
ライドを用い実施例4と同様に処理して、WA−20樹
脂にミリスチル基又はシクロヘキシルプロピオニル基が
結合した吸着材樹脂を得た。
Example 5 Instead of cyclohexylcarbonyl chloride, myristin chloride or cyclohexylpropionyl chloride was used and treated in the same manner as in Example 4 to obtain an adsorbent resin in which myristyl group or cyclohexylpropionyl group was bonded to WA-20 resin. .

実施例6 膨潤した活性化CHセフアロース4B 30mlと0.1
M炭酸緩衝液(pH8.0)100mlを混合したあと、22
6(2.0mmol)のシクロヘキシルメチルアミンを加え、
室温で1時間反応させた。樹脂を別し、0.05Mト
リス緩衝液(pH8.0)と0.05Mギ酸緩衝液(pH4.
0)のそれぞれ100mlで交互に洗浄し、過剰のシクロ
ヘキシルメチルアミンを除去した。そのあと水洗し、乾
燥してCH−セフアロース4Bのカルボキシル基にシク
ロヘキシルメチルアミンがアミド結合した吸着材樹脂が
得られた。
Example 6 30 ml of swollen activated CH Sepharose 4B plus 0.1
After mixing 100 ml of M carbonate buffer (pH 8.0), 22
6 (2.0 mmol) cyclohexylmethylamine was added,
The reaction was carried out at room temperature for 1 hour. Separate the resin, 0.05M Tris buffer (pH 8.0) and 0.05M formate buffer (pH 4. 0).
Alternating washes with 100 ml each of 0) to remove excess cyclohexylmethylamine. Then, it was washed with water and dried to obtain an adsorbent resin in which cyclohexylmethylamine was amide-bonded to the carboxyl group of CH-Sepharose 4B.

同様に、1−アダマンチルオキシエチルアミン、4−te
rt−ブチルフエニルアミン等の各リガンドのアミン誘導
体と活性化CHセフアロース4Bを反応させ、アガロー
ス系のそれぞれ対応するリガンドを有する吸着材樹脂を
得た。
Similarly, 1-adamantyloxyethylamine, 4-te
An amine derivative of each ligand such as rt-butylphenylamine was reacted with activated CH sepharose 4B to obtain an adsorbent resin having an agarose-based corresponding ligand.

以上で得られた樹脂は、それぞれIRにより1630cm
-1付近にアミドのカルボニルに基づく吸収が確認され
た。
The resin obtained above is 1630 cm by IR.
Absorption based on carbonyl of amide was confirmed near -1 .

実施例7 N,N−ジメチルアセトアミド(以後DMAという)中で
充分に膨潤させた乾燥キトサン樹脂[キトパールBCW
1010(富士紡績株式会社製)]20mlにDMA15ml
を加えたあと、(N−3−シクロヘキシルプロピオニル
−β−アラニル)−β−アラニンとピバリン酸の混酸無
水物2.29mmolを5mlのDMAにとかした液を加え、
室温で24時間かきまぜた。樹脂を取し、アセトン4
0mlでの浸漬洗浄を3回行なった。さらに希アルカリ性
50%メタノール水250ml、次いで水250mlで洗浄
し、キトサン樹脂のアミノ基に(N−3−シクロヘキシ
ルプロピオニル−β−アラニル)−β−アラニンが酸ア
ミド結合を介して導入された置換キトサン樹脂を得た。
Example 7 Dry chitosan resin fully swelled in N, N-dimethylacetamide (hereinafter referred to as DMA) [Chitopearl BCW
1010 (Fuji Spinning Co., Ltd.)] 20 ml DMA 15 ml
Was added, and then a solution prepared by dissolving 2.29 mmol of a mixed acid anhydride of (N-3-cyclohexylpropionyl-β-alanyl) -β-alanine and pivalic acid in 5 ml of DMA was added,
Stir at room temperature for 24 hours. Remove the resin and use acetone 4
Immersion washing with 0 ml was performed 3 times. Furthermore, it was washed with 250 ml of dilute alkaline 50% methanol water and then with 250 ml of water, and substituted chitosan in which (N-3-cyclohexylpropionyl-β-alanyl) -β-alanine was introduced into the amino group of the chitosan resin through an acid amide bond. A resin was obtained.

実施例8 (N−3−シクロヘキシルプロピオニル−β−アラニル)
−β−アラニンの代りにシクロヘキサンプロピオン酸に
β−アラニンを酸アミド結合で連鎖状に0〜3個結合し
た化合物、例えばシクロヘキサンプロピオン酸、(N−
3−シクロヘキシルプロピオニル−β−アラニル)−β
−アラニル−β−アラニンなど、或いはt−ブチル安息
香酸にβ−アラニンを酸アミド結合で連鎖状に0〜4個
結合した化合物、例えば(N−4−t−ブチルベンゾイル
−β−アラニル)−β−アラニル−β−アラニル−β−
アラニンなど、或いは(N−2−ノルボルナンアセチル
−β−アラニル)−β−アラニンを用いて、上記実施例
7と同様に処理し、対応するリガンドを有する置換キト
サン樹脂を調製した。このようにして得られた樹脂はそ
れぞれIRにより1650と1550cm-1付近にアミド
のカルボニルにもとづく吸収が確認された。
Example 8 (N-3-cyclohexylpropionyl-β-alanyl)
Instead of -β-alanine, a compound in which β-alanine is linked to 0 to 3 in a chain form by an acid amide bond in cyclohexanepropionic acid, for example, cyclohexanepropionic acid, (N-
3-cyclohexylpropionyl-β-alanyl) -β
-Alanyl-β-alanine or the like, or a compound in which β-alanine is linked to t-butylbenzoic acid by an acid amide bond in a chain form of 0 to 4 groups, for example, (N-4-t-butylbenzoyl-β-alanyl)- β-alanyl-β-alanyl-β-
Alanine or the like or (N-2-norbornaneacetyl-β-alanyl) -β-alanine was used and treated in the same manner as in Example 7 above to prepare a substituted chitosan resin having a corresponding ligand. The resins thus obtained were confirmed by IR to have absorptions at around 1650 and 1550 cm -1 based on amide carbonyl.

実施例9 4%(wt/V)水酸化ナトリウム水溶液によりOH型とし
たPA−308樹脂35mlをφ15mmのカラムに詰め、
水で十分洗浄後、50%(V/V)エタノール水溶液で洗
浄を行う。
Example 9 35 ml of PA-308 resin, which was OH type with 4% (wt / V) sodium hydroxide aqueous solution, was packed in a φ15 mm column,
After thorough washing with water, washing with a 50% (V / V) ethanol aqueous solution is performed.

p−tert−ブチル安息香酸9.0g(50.5mmol)を40
%(V/V)メチルアミン水溶液3.0mlを含む50%
(V/V)エタノール水溶液160mlに溶解し、PA−3
08(OH型)樹脂のカラムにS.V.約65ml/hrの流速
で流す。その後更に50%(V/V)エタノール水溶液約
500mlで洗浄した後、水洗、乾燥してPA−308樹
脂にp−tert−ブチル安息香酸がイオン結合した吸着材
樹脂を得た。
40 g of p-tert-butylbenzoic acid 9.0 g (50.5 mmol)
% (V / V) 50% containing 3.0 ml of methylamine aqueous solution
(V / V) dissolved in 160 ml of ethanol aqueous solution, PA-3
A column of 08 (OH type) resin is flowed at a flow rate of about 65 ml / hr SV. After further washing with about 500 ml of 50% (V / V) ethanol aqueous solution, washing with water and drying, an adsorbent resin in which p-tert-butylbenzoic acid was ionically bonded to PA-308 resin was obtained.

実施例10 p−tert−ブチル安息香酸にかえて、t−ブチル酢酸、シ
クロヘキシルプロピオン酸、グリチルリチン酸、アダマ
ンチル酢酸、ノルボルネン酢酸等を用いて、上記実施例
9と同様に処理することにより、それぞれ対応するリガ
ンドを有する吸着材樹脂が得られた。
Example 10 Instead of p-tert-butylbenzoic acid, t-butylacetic acid, cyclohexylpropionic acid, glycyrrhizinic acid, adamantylacetic acid, norborneneacetic acid, etc. were used and treated in the same manner as in Example 9 above, respectively. An adsorbent resin having a ligand that reacts was obtained.

実施例11 1%(wt/V)水酸化ナトリウム水溶液によりOH型とし
たQAE A−25樹脂12.5mlをφ15mmのカラム
につめ、水で十分洗浄後、50%(V/V)エタノール水
溶液で洗浄を行う。
Example 11 12.5 ml of QAE A-25 resin made OH type with 1% (wt / V) sodium hydroxide aqueous solution was packed in a column of φ15 mm, thoroughly washed with water, and then with 50% (V / V) ethanol aqueous solution. Perform cleaning.

2−ノルボルネン酢酸5.0ml(34.5mmol)を40%
(V/V)メチルアミン水溶液1.0mlを含む32%(V
/V)エタノール水溶液125mlに溶解し、QAE A
−25(OH型)樹脂のカラムにS.V.約65ml/hrの流
速で流す。
40% of 5.0 ml (34.5 mmol) of 2-norbornene acetic acid
(V / V) 32% containing 1.0 ml of methylamine aqueous solution (V
/ V) Dissolve in 125 ml of ethanol aqueous solution and use QAE A
A column of -25 (OH type) resin is flowed at a flow rate of about 65 ml / hr SV.

その後更に50%(V/V)エタノール水溶液約300ml
で洗浄した後、水洗、乾燥してQAE A−25樹脂の
アニオン交換部に2−ノルボルネン酢酸がイオン結合し
た吸着材樹脂が得られた。
After that, about 300 ml of 50% (V / V) ethanol aqueous solution
After washing with water, washing with water and drying, an adsorbent resin in which 2-norbornene acetic acid was ionically bonded to the anion exchange part of the QAE A-25 resin was obtained.

実施例12 同様に3−メチル−1−アダマンタン酢酸、アビエチン
酸、ミリスチン酸、シクロヘキサンプロピオン酸等をイ
オン結合せしめて対応する吸着材樹脂を得た。
Example 12 Similarly, 3-methyl-1-adamantane acetic acid, abietic acid, myristic acid, cyclohexanepropionic acid and the like were ionically bonded to obtain a corresponding adsorbent resin.

本発明の吸着材樹脂のサイクロデキストリン吸着特性 本発明の吸着材樹脂について、そのサイクロデキストリ
ン(以下“CD”と略記する)吸着特性を以下の表−4〜
11に示す。なお、吸着試験は各表に示すCD吸着性担
体各35mlをカラム(1.5cm×25cm)に充填し、担体
を十分水洗した後、CD含有液[α−CD,1(W/V)
%;β−CD,1(W/V)%;γ−CD,1(W/V)%水
溶液]45mlを通流した。その後350mlの水を流して
水洗した後、エタノール/氷(1/1)混合液を180ml
流し、通過液の各CD含量をHPLC(Shodex,RS−p
ak CD−613カラム;CH3CN/H2O(65/3
5),15ml/min)法によつて測定した。得られたCD量
を樹脂1当り吸着されるCD量(g)に換算した値を表
−5〜9に示す。
Cyclodextrin Adsorption Properties of the Adsorbent Resin of the Present Invention Regarding the adsorbent resin of the present invention, its cyclodextrin (hereinafter abbreviated as “CD”) adsorption properties are shown in Table 4 to
11 shows. In the adsorption test, 35 ml of each CD adsorbent carrier shown in each table was packed in a column (1.5 cm × 25 cm), and the carrier was thoroughly washed with water, and then the CD-containing liquid [α-CD, 1 (W / V)
%; Β-CD, 1 (W / V)%; γ-CD, 1 (W / V)% aqueous solution] 45 ml. Then rinse with 350 ml of water and wash with 180 ml of ethanol / ice (1/1) mixture.
The content of each CD in the flow-through was measured by HPLC (Shodex, RS-p
ak CD-613 column; CH 3 CN / H 2 O (65/3
5), 15 ml / min) method. Values obtained by converting the obtained CD amount into the CD amount (g) adsorbed per resin 1 are shown in Tables 5 to 9.

また、スペーサ基の長さの変化に対応するβ−CDの吸
着材樹脂への吸着量を表−11に示す。なお、吸着量の
換算値は上記と同様の方法により算出した。
Table 11 shows the amount of β-CD adsorbed on the adsorbent resin corresponding to the change in the length of the spacer group. The converted value of the adsorption amount was calculated by the same method as above.

次に、一般式 で示される樹脂の製造に際し、式 で示されるピパリン酸酸無水物の仕込量と該樹脂へのβ
−CD吸着量の相関性について表−11に示す。
Then the general formula When manufacturing the resin represented by And the amount of piparinic acid anhydride charged and β to the resin
-Table 11 shows the correlation of the CD adsorption amount.

本発明の吸着材樹脂の用途 本発明のサイクロデキストリン吸着性担体は、前述した
ごとく、そのリガンドとサイクロデキストリンの疎水性
空洞との選択的な物理的吸着能を有するため以下の如き
具体的用途がある。
Use of the Adsorbent Resin of the Present Invention Since the cyclodextrin-adsorbing carrier of the present invention has the selective physical adsorption ability between the ligand and the hydrophobic cavity of cyclodextrin, as described above, the following specific applications are possible. is there.

(1)サイクロデキストリン含有水性液からのサイクロデ
キストリンの選択的分離・精製 本発明の吸着材は、例えば、サイクロデキストリン(C
D)製造反応液からCDを選択的に分離・精製するのに
用いることができる。CDは前述のごとく澱粉類の水性
懸濁液または水溶液に各種のCGTaseを作用させ、生
成するα−,β−および/又はγ−CD並びに未反応の
澱粉および副生する各種オリゴデキストリン、グルコー
ス等を含む反応液からCDを分離・精製することにより
製造されている(前掲の公報参照)。本発明の吸着材は、
CDを選択的に吸着しうるから、カラムクロマトグラフ
イーの担体として使用するか、または回分式により上記
反応液の如きサイクロデキストリン含有水性液に接触せ
しめてCDを該吸着材に吸着せしめ、それによつて未反
応の澱粉、副生物と分離した後、該吸着材から吸着した
CDを熱水またはアルカノール/水混合溶媒等を用いて
脱着することにより、好収率でCDを分離精製すること
ができる。
(1) Selective Separation and Purification of Cyclodextrin from Cyclodextrin-Containing Aqueous Liquid The adsorbent of the present invention is, for example, cyclodextrin (C
D) It can be used to selectively separate and purify CD from the production reaction solution. As described above, CD is an α-, β- and / or γ-CD produced by reacting various CGTases with an aqueous suspension or aqueous solution of starch, unreacted starch and various oligodextrins and glucose produced as by-products. It is produced by separating and purifying CD from a reaction solution containing (see the above-mentioned publication). The adsorbent of the present invention is
Since it can selectively adsorb CD, it is used as a carrier for column chromatography, or it is contacted with a cyclodextrin-containing aqueous liquid such as the above reaction liquid by a batch method so that CD is adsorbed onto the adsorbent. Then, after separating unreacted starch and by-products, the CD adsorbed from the adsorbent is desorbed by using hot water or an alkanol / water mixed solvent, whereby the CD can be separated and purified in good yield. .

吸着材とサイクロデキストリン含有水性液との接触は一
般に常温で行なうことができるが場合には約30〜約7
0℃の加温下に行なってもよい。接触時間は厳密に制限
されるものではないが、通常1〜4時間の範囲内で十分
である。
The contact between the adsorbent and the cyclodextrin-containing aqueous liquid can generally be carried out at room temperature, but in the case of about 30 to about 7
The heating may be performed at 0 ° C. The contact time is not strictly limited, but is usually in the range of 1 to 4 hours.

サイクロデキストリンを吸着した樹脂からのサイクロデ
キストリンの脱着に使用される熱水の温度は約70〜約
90℃の範囲内であることができ、また、アルカノール
/水混合溶媒におけるアルカノールとしてはメタノー
ル、エタノール、プロパノールなどの低級アルカノール
等があげられ、アルカノール/水の混合比は一般に1/
5〜3/5(V/V)の範囲内が好適である。脱着溶接と
しては、上記の他、アセトン、アセトニトリル、テトラ
ヒドロフラン、ジオキサン、等もまた使用することがで
きる。
The temperature of the hot water used for the desorption of cyclodextrin from the cyclodextrin-adsorbed resin may be in the range of about 70 to about 90 ° C, and the alkanol in the alkanol / water mixed solvent may be methanol, ethanol. , Lower alkanols such as propanol, etc., and the mixing ratio of alkanol / water is generally 1 /
The range of 5 to 3/5 (V / V) is preferable. In addition to the above, acetone, acetonitrile, tetrahydrofuran, dioxane, etc. can also be used for desorption welding.

上記の方法に供しうるサイクロデキストリン含有水性液
としては、上に述べたサイクロデキストリン生成反応液
のほかに、CDを触媒として用いた化学反応液又はCD
を生成物の保護剤として用いる酵素反応液又は微生物発
酵液等が挙げられる。
Examples of the cyclodextrin-containing aqueous liquid that can be used in the above method include, in addition to the cyclodextrin-forming reaction liquid described above, a chemical reaction liquid or CD using CD as a catalyst.
An enzyme reaction solution or a microbial fermentation solution in which is used as a protective agent for the product is exemplified.

以下にサイクロデキストリンの選択的分離・精製法につ
いて、その具体的を示す。
The specifics of the selective separation and purification method of cyclodextrin are shown below.

例 1 馬れいしょ澱粉100gにネオスピターゼ(長瀬産業(株)
製)を0.05g添加後加水し、全容を2とし、80
℃、20分加熱液化後、120℃、10分間オートクレ
ーブ処理した。次に50℃まで冷却し、バチルス・オー
ベンシス(Bacillus ohbensis)FERM P−199
0より得たCGTase1000uを添加し、pH6.0、5
0℃にて24時間CD生成反応を行なった。反応液を1
00℃で15分間熱処理して酵素を失活させた後、その
一部を液体クロマトグラフイーにて生成CD量を測定し
たところ、α−CDが0.8%(wt/wt)、β−CDが3
1.0%(wt/wt)、γ−CDが8.5%(wt/wt)であつ
た。
Example 1 100 g of horseradish starch with neospitase (Nagase Sangyo Co., Ltd.)
(Manufactured) was added and then water was added to bring the total volume to 2, and 80
After heating and liquefying at 20 ° C. for 20 minutes, it was autoclaved at 120 ° C. for 10 minutes. Then cool to 50 ° C. and Bacillus ohbensis FERM P-199
CGTase1000u obtained from 0 was added to pH 6.0, 5
The CD generation reaction was performed at 0 ° C. for 24 hours. 1 reaction mixture
After inactivating the enzyme by heat treatment at 00 ° C for 15 minutes, a part of the enzyme was measured for the amount of produced CD by liquid chromatography. Α-CD was 0.8% (wt / wt), β-CD 3 CDs
It was 1.0% (wt / wt) and γ-CD was 8.5% (wt / wt).

次に、この反応液をtert−ブチル酢酸をイオン結合させ
たPA−308 700mlを充填したカラムに下降法に
より通液した後、3.0の水でカラムを洗浄した。こ
のカラムに50%(V/V)エタノール水溶液5を通
し、濃縮乾固したところ、純度95.3%のβ−CD3
2.0gが得られた。
Next, this reaction solution was passed through a column filled with 700 ml of PA-308 ion-bonded with tert-butylacetic acid by a descending method, and then the column was washed with 3.0 water. When 50% (V / V) ethanol aqueous solution 5 was passed through this column and concentrated to dryness, β-CD3 having a purity of 95.3% was obtained.
2.0 g was obtained.

また、反応液のカラム通液と洗浄液とを混ぜて、グリチ
ルリチンをイオン吸着させたPA−308 500mlを
充填したカラムに下降法により通液した後、2.0の
水でカラムを洗浄した。
Further, the column solution of the reaction solution and the washing solution were mixed, and after passing through a column filled with 500 ml of PA-308 ion-adsorbed with glycyrrhizin by a descending method, the column was washed with water of 2.0.

このカラムに70℃の熱水4を通し濃縮乾固したとこ
ろ、純度98.0%のγ−CD6.7gを得た。
When 70 ° C. hot water 4 was passed through this column and the mixture was concentrated to dryness, 6.7 g of γ-CD having a purity of 98.0% was obtained.

例 2 例1と同様に処理した反応液425ml(各種CDの測定
値:β−CD7.40g、γ−CD1.36g)を(N−3
−シクロヘキシルプロピオニル−β−アラニル)−β−
アラニンを44mol%(構成グルコサミンあたり)結合さ
せたキトサン樹脂100mlを充填したカラムに下降法に
より通液した。400mlの水でカラムを洗浄後、50%
(V/V)エタノール水溶液755mlを通して、吸着した
CDを溶出した。溶出液を濃縮し、純度99.9%のβ
−CDの結晶を5.87g(回収率83.4%)得た。
Example 2 425 ml of the reaction solution treated in the same manner as in Example 1 (measured values of various CDs: 7.40 g of .beta.-CD, 1.36 g of .gamma.-CD) were added to (N-3
-Cyclohexylpropionyl-β-alanyl) -β-
The solution was passed through a column filled with 100 ml of chitosan resin bound with alanine at 44 mol% (per constituent glucosamine) by a descending method. After washing the column with 400 ml of water, 50%
The adsorbed CD was eluted by passing 755 ml of (V / V) ethanol aqueous solution. The eluate was concentrated to give a β of 99.9% purity.
5.87 g of -CD crystals (recovery rate 83.4%) was obtained.

(2)CD生成反応に際しての特定CDの増収 CD生成反応は前述のごとくCGTaseによる酵素反応
であり、可逆的に進行する。従つて、CDの増収を図る
ため、反応系にCDに包接されうる有機溶媒を共存せし
めて反応させることにより生成CDを沈澱物として反応
系外に除去し、原料澱粉等からCDへの変換率を高めう
ることが知られている(例えば、特開昭60−1563
98号公報)。
(2) Increase in yield of specific CD during CD production reaction The CD production reaction is an enzymatic reaction by CGTase as described above, and reversibly proceeds. Therefore, in order to increase the yield of CD, an organic solvent capable of being clathrated by CD is allowed to react in the reaction system to cause the reaction to remove the produced CD as a precipitate outside the reaction system, and to convert the raw material starch etc. into CD. It is known that the rate can be increased (for example, JP-A-60-1563).
No. 98).

ところで、本発明の吸着材樹脂は、リガンドとしてCD
に包接されうる有機残基を有するため、該担体を前記反
応系に共存せしめることにより、上記変換率を高めると
ともに、リガンドを選択することにより、α,βおよび
γ−CDのうちの所望のCDの生成率を高めることがで
き、さらに生成CDは吸着材樹脂に選択的に吸着されて
いるので該樹脂から前述のCD吸着方法により容易に高
純度のCDを得ることができる。
By the way, the adsorbent resin of the present invention is used as a ligand for CD
Since it has an organic residue that can be clathrated by the above, by allowing the carrier to coexist in the reaction system, the conversion rate can be increased, and by selecting a ligand, a desired α, β or γ-CD can be selected. The production rate of CD can be increased, and since the produced CD is selectively adsorbed on the adsorbent resin, high-purity CD can be easily obtained from the resin by the above-mentioned CD adsorption method.

本発明の吸着材樹脂を用いるCDの生成反応は、該生成
反応を該吸着材樹脂の存在下に実施するということを除
けば、それ自体既知の出発原料を用いてそれ自体既知の
反応条件下に実施することができる[例えば、英国特許
第1,459,654号明細書;米国特許第4,31
7,881号明細書;Agricultural and Biologica
l Chemistry,49,1189〜1191(1985)参
照]。例えば、出発原料としては通常可溶性デンプンが
使用され、これを水性媒体中でCGTaseによる酵素反
応に付すことにより、CDが生成する。CGTaseとし
ては、Bacillus macerans,B.circulans,B.megate
rium,B.ohbensis,Klebsiella preumoniae,slkalopb
ilie Bacillur,Micrococcus varians,M.luteus等
に由来するものが使用でき、また、酵素反応は各酵素に
応じた至適pH条件下に、一般に30〜65℃の温度にて
12〜48時間程度で終了させることができる。
The reaction for producing CD using the adsorbent resin of the present invention is carried out under the reaction conditions known per se using starting materials known per se, except that the production reaction is carried out in the presence of the adsorbent resin. [E.g., British Patent 1,459,654; U.S. Pat. No. 4,31.
7,881 Specification; Agricultural and Biologica
Chemistry, 49 , 1189-1191 (1985)]. For example, soluble starch is usually used as a starting material, and CD is produced by subjecting this to an enzymatic reaction with CGTase in an aqueous medium. Examples of CGTase include Bacillus macerans, B. circulans, B.I. megate
rium, B. ohbensis, Klebsiella preumoniae, slkalopb
ilie Bacillu, Micrococcus varians, M.I. Those derived from luteus or the like can be used, and the enzyme reaction can be completed in about 12 to 48 hours at a temperature of 30 to 65 ° C. under an optimum pH condition corresponding to each enzyme.

本発明に従えば、この酵素法によるCDの生成反応を前
述した吸着材樹脂の存在下に実施され、これにより生成
CDの収量を従来法に比べて50〜150%程度増加さ
せることができる。
According to the present invention, the CD production reaction by this enzymatic method is carried out in the presence of the adsorbent resin described above, whereby the yield of produced CD can be increased by about 50 to 150% as compared with the conventional method.

該CDの生成反応を該吸着材樹脂の存在下に実施する方
法としては、例えば、CDの反応容器中に吸着材樹脂を
ビーズ状等の形態で仕込み、撹拌懸濁させながら回分式
又は連続的に酵素反応を行なう方法;ビーズ状等適当な
形態に成形された吸着材樹脂を充填した反応カラムに、
前記した出発原料及びCGTaseを含む水性液を一回又
は数回繰返して導通する方法等が挙げられる。
Examples of the method for carrying out the reaction for producing the CD in the presence of the adsorbent resin include, for example, charging the adsorbent resin in the form of beads into a reaction vessel for the CD, and batchwise or continuously while stirring and suspending. A method of carrying out an enzymatic reaction on; a reaction column filled with an adsorbent resin molded in a suitable form such as beads,
Examples include a method of conducting the above-mentioned aqueous solution containing the starting material and CGTase once or several times to conduct electricity.

本発明に従う上記のCD生成反応の1つの利点は、従来
法におけるよりも高濃度の可溶性デンプンを用いて実施
しうることである。例えば、従来一般に行なわれている
CD生成反応においては、可溶性デンプンの濃度は5〜
7%(wt/wt)であるが、本発明の方法を用いれば、CD
生成効率を実質的に低下させることなく、デンプン濃度
を約10〜約20%(wt/wt)程度まで高めることができ
る。
One advantage of the above-described CD-forming reaction according to the present invention is that it can be carried out with higher concentrations of soluble starch than in conventional methods. For example, in the conventional CD-forming reaction, the soluble starch concentration is 5 to
7% (wt / wt), but using the method of the present invention, CD
The starch concentration can be increased to about 10 to about 20% (wt / wt) without substantially reducing the production efficiency.

しかして、本発明に用いるデンプンの水溶液濃度は特に
限定去れるものでないが、3〜20(wt/wt)%、好まし
くは5〜15%の範囲内で選定することができる。
Although the aqueous solution concentration of starch used in the present invention is not particularly limited, it can be selected within the range of 3 to 20 (wt / wt)%, preferably 5 to 15%.

また、反応温度は用いるCGTaseの種類によつて最適
温度が異なり、臨界的でないが、例えば前記Bacillus
ohbensisより得たCGTaseを用いる場合は、45〜6
5℃、好ましくは50〜60℃とすることができ、また
反応系のpHは5〜11、好ましくは6.5〜7.5の範
囲内とすることができる。
The optimum reaction temperature is different depending on the type of CGTase used and is not critical.
When using CGTase obtained from ohbensis, 45 to 6
The temperature may be 5 ° C, preferably 50 to 60 ° C, and the pH of the reaction system may be 5 to 11, preferably 6.5 to 7.5.

反応時間派、反応様式、用いるCGTaseの種類、使用
量によつて異なり、厳密には限定できないが、基質原料
として用いるデンプンがほぼ消費される時点まで反応を
継続すればよい。
The reaction time depends on the reaction time, the reaction mode, the type of CGTase used, and the amount used, and it cannot be strictly limited, but the reaction may be continued until the starch used as the substrate raw material is almost consumed.

また、本発明の樹脂の使用量は反応様式の如何を問わず
基質原料として用いたデンプンが100%完全にCDに
転換したと仮定した場合のそのCDを充分に吸着できる
樹脂量以上とすることができる。なお、吸着材樹脂のC
D吸着量は個々の吸着材樹脂について簡単な実験(routi
ne experiment)により経験的に決定することができ
る。
Further, the amount of the resin of the present invention used should be equal to or more than the amount of the resin capable of sufficiently adsorbing the CD when it is assumed that the starch used as the substrate raw material is completely converted into CD regardless of the reaction mode. You can The adsorbent resin C
The amount of D adsorbed was determined by a simple experiment (routi
It can be determined empirically by a ne experiment).

以上に述べた本発明の方法によれば、生成するCDは反
応系から吸着材樹脂に吸着した形で直接回収することが
できるので、従来法におけるような煩雑なCDの分離、
精製操作を必要とせず、工業的に極めて有利である。
According to the method of the present invention described above, the generated CD can be directly recovered from the reaction system in the form of being adsorbed on the adsorbent resin, so that complicated CD separation as in the conventional method,
No purification operation is required, which is extremely advantageous industrially.

次に、実施例を掲げて上記CD生成反応をさらに具体的
に説明する。
Next, the CD formation reaction will be described more specifically with reference to Examples.

例 3 可溶性デンプン10gを温水に加え全容を500mlと
し、120℃で15分間オートクレーブ処理した反応液
を2本調製した。
Example 3 Soluble starch (10 g) was added to warm water to bring the total volume to 500 ml, and two reaction solutions were prepared by autoclaving at 120 ° C. for 15 minutes.

次に55℃まで冷却し、Bacillus ohbensisより得た
CGTase100unitを各々に添加し、pH7.0にて1
9時間CD生成反応を行った。一方の反応液には反応開
始3時間目に、あらかじめp−tert−ブチル安息香酸を
イオン吸着させたPA−308の樹脂50mlを添加して
おいた。
Then, cool to 55 ° C, add 100 units of CGTase obtained from Bacillus ohbensis to each, and add 1 to pH 7.0.
The CD generation reaction was performed for 9 hours. To one of the reaction solutions, 50 ml of a resin of PA-308 to which p-tert-butylbenzoic acid had been ion-adsorbed was added 3 hours after the start of the reaction.

反応19時間後、各々の反応液のCD生成量を液体クロ
マトグラフイーにて求めた。樹脂を添加した反応液は樹
脂を別し、上澄液及び樹脂を十分水洗した後、50%
(V/V)エタノール水溶液で吸着したCDを溶出した溶
出液とを別々に液体クロマトグラフイーにより求めた。
結果を表−12に示す。
After 19 hours of the reaction, the CD production amount of each reaction solution was determined by liquid chromatography. Separate the resin from the reaction solution containing the resin, wash the supernatant and the resin thoroughly with water, then add 50%
The eluate obtained by eluting the CD adsorbed with the (V / V) ethanol aqueous solution was separately determined by liquid chromatography.
The results are shown in Table-12.

例 4 馬れいしょ澱粉5gとネオスピターゼ[長瀬産業(株)製]
3mgに水を加えて全容を50mlとした。80℃で20分
間液化を行なった後、120℃で15分間オートクレー
ブ処理を行なった。50℃まで冷却し、食塩3g、(N−
3−シクロヘキシルプロピオニル−β−アラニル)−β
−アラニン44mol%(構成グルコサミン当り)をキトパ
ールBCW1010に結合させた樹脂60ml、Bacillu
s ohbensisより得たCGTase250unitを添加し、pH
7.0、50℃にてゆるやかに撹拌しながら19時間C
D生成反応を行なった。反応後、樹脂を別し、水10
0mlで洗浄後、50%(V/V)エタノール水溶液500
mlで吸着したCDを溶出した。CD生成量は反応上澄液
と洗浄液及び溶出液を液体クロマトグラフイーにより測
定して求めた。結果を下記表−13に示す。また、対照
として、樹脂無添加のCD生成反応を行なった。
Example 4 5 g of horseradish starch and neospitase [manufactured by Nagase & Co., Ltd.]
Water was added to 3 mg to bring the total volume to 50 ml. After liquefaction at 80 ° C for 20 minutes, autoclave treatment was performed at 120 ° C for 15 minutes. Cool to 50 ° C., add 3 g of salt, (N-
3-cyclohexylpropionyl-β-alanyl) -β
-Alanine 44 mol% (per component glucosamine) bound to Chitopearl BCW1010 60 ml resin, Bacillu
Add 250 units of CGTase obtained from Sohbensis,
19 hours C with gentle stirring at 7.0 and 50 ° C
The D formation reaction was performed. After the reaction, the resin is separated and water 10
After washing with 0 ml, 50% (V / V) ethanol aqueous solution 500
The CD adsorbed in ml was eluted. The amount of CD produced was determined by measuring the reaction supernatant, the washing solution, and the eluate by liquid chromatography. The results are shown in Table 13 below. Further, as a control, a CD generation reaction without resin was carried out.

例 5 例4と同一条件で液化した基質溶液(濃度10%(wt/w
t))50mlにCGTase200unit添加し、50℃で1.
5時間反応した。その後、50℃で反応を続けながら、
反応液を、(N−3−シクロヘキシルプロピオニル−β
−アラニル)−β−アラニン44mol%(構成グルコサミ
ン当り)をキトパールBCW1010に結合させた樹脂
42mlを充填したカラム(径3cm)に通液し、反応槽との
間を18時間循環(流速1.5ml/min)させた。反応後
樹脂を80mlの水で洗い、50%(V/V)エタノール水
溶液350mlで吸着したCDを溶出した。CD生成量は
例4と同様にして求めた。対照として樹脂を充填しない
カラムを用いて同様の反応を行なった。結果を下記表−
14に示す。
Example 5 Substrate solution liquefied under the same conditions as in Example 4 (concentration 10% (wt / w
t)) Add 50 units of CGTase to 50 ml, and
Reacted for 5 hours. After that, while continuing the reaction at 50 ° C,
The reaction solution was added to (N-3-cyclohexylpropionyl-β
-Alanyl) -β-alanine 44 mol% (per constituent glucosamine) was passed through a column (diameter 3 cm) packed with 42 ml of resin bound to Chitopearl BCW1010, and circulated for 18 hours with the reaction tank (flow rate 1.5 ml). / Min). After the reaction, the resin was washed with 80 ml of water, and the adsorbed CD was eluted with 350 ml of 50% (V / V) ethanol aqueous solution. The CD production amount was determined in the same manner as in Example 4. As a control, a similar reaction was performed using a column not filled with resin. The results are shown in the table below.
14 shows.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 藤井 幸喜 神奈川県横浜市港南区港南台4−5−1− 403 (72)発明者 石倉 知之 神奈川県茅ヶ崎市小和田22−32 ─────────────────────────────────────────────────── ─── Continued Front Page (72) Inventor Koki Fujii 4-5-1-403 Konandai, Konan-ku, Yokohama-shi, Kanagawa Prefecture (72) Tomoyuki Ishikura 22-32 Owada, Chigasaki-shi, Kanagawa Prefecture

Claims (15)

【特許請求の範囲】[Claims] 【請求項1】サイクロデキストリンによつて包接されう
る大きさのリガンドがスペーサ基を介して化学的に結合
されている水不溶性樹脂基体からなるサイクロデキスト
リン吸着材。
1. A cyclodextrin adsorbent comprising a water-insoluble resin substrate to which a ligand having a size capable of being included by cyclodextrin is chemically bound via a spacer group.
【請求項2】リガンドの大きさが、該リガンドの原子団
全体をちょうど包囲する楕円体として観念したとき、そ
の楕円体の短径が約4〜約10Åの範囲内に入るような
大きさである特許請求の範囲第1項記載の吸着材。
2. The size of the ligand is such that, when conceived as an ellipsoid that just surrounds the entire atomic group of the ligand, the minor axis of the ellipsoid falls within the range of about 4 to about 10Å. The adsorbent according to claim 1.
【請求項3】リガンドがC3〜C7の分岐鎖状脂肪族炭化
水素基、C5〜C34脂環式炭化水素基、芳香族炭化水素
基及び複素環式基から選ばれる特許請求の範囲第1項記
載の吸着材。
3. A ligand selected from a C 3 to C 7 branched aliphatic hydrocarbon group, a C 5 to C 34 alicyclic hydrocarbon group, an aromatic hydrocarbon group and a heterocyclic group. The adsorbent according to claim 1.
【請求項4】リガンドがtert−ブチル、シクロヘキシ
ル、アダマンチル、ノルボネニル、グリチルレチン酸残
基、アビエチン酸残基及びp−tert−ブチルフエニル基
から選ばれる特許請求の範囲第1項記載の吸着材。
4. The adsorbent according to claim 1, wherein the ligand is selected from tert-butyl, cyclohexyl, adamantyl, norbonenyl, glycyrrhetinic acid residue, abietic acid residue and p-tert-butylphenyl group.
【請求項5】水不溶性樹脂基体が、多糖類系化合物及び
その誘導体、スチレン系樹脂、ポリアクリルアミド系樹
脂及びペプチド類から選ばれる特許請求の範囲第1項記
載の吸着材。
5. The adsorbent according to claim 1, wherein the water-insoluble resin substrate is selected from polysaccharide compounds and their derivatives, styrene resins, polyacrylamide resins and peptides.
【請求項6】水不溶性樹脂基体が多糖類系化合物又はそ
の誘導体である特許請求の範囲第1項記載の吸着材。
6. The adsorbent according to claim 1, wherein the water-insoluble resin substrate is a polysaccharide compound or a derivative thereof.
【請求項7】水不溶性樹脂基体がキトサン又はその架橋
物である特許請求の範囲第1項記載の吸着材。
7. The adsorbent according to claim 1, wherein the water-insoluble resin substrate is chitosan or a crosslinked product thereof.
【請求項8】スペーサ基とリガンドの合計の長さが少な
くとも10オングストロームである特許請求の範囲第1
項記載の吸着材。
8. The first claim in which the total length of the spacer group and the ligand is at least 10 angstroms.
Adsorbent according to item.
【請求項9】スペーサ基とリガンドの合計の長さが10
〜60オングストロームの範囲内にある特許請求の範囲
第1項記載の吸着材。
9. The total length of the spacer group and the ligand is 10
An adsorbent material according to claim 1 in the range of -60 Angstroms.
【請求項10】ビーズ状である特許請求の範囲第1項記
載の吸着材。
10. The adsorbent according to claim 1, which is in the form of beads.
【請求項11】サイクロデキストリン含有水性液を特許
請求の範囲第1項記載の吸着材と接触せしめ、該サイク
ロデキストリンを吸着材に吸着せしめた後、該吸着材を
サイクロデキストリンの脱着処理に付してサイクロデキ
ストリンを回収することを特徴とする、サイクロデキス
トリン含有水性液からのサイクロデキストリンの分離、
精製方法。
11. A cyclodextrin-containing aqueous liquid is brought into contact with the adsorbent according to claim 1, the cyclodextrin is adsorbed on the adsorbent, and then the adsorbent is subjected to cyclodextrin desorption treatment. Separation of cyclodextrin from an aqueous liquid containing cyclodextrin, characterized by recovering cyclodextrin by
Purification method.
【請求項12】該接触を常温で行なう特許請求の範囲第
11項記載の方法。
12. The method according to claim 11, wherein the contact is performed at room temperature.
【請求項13】該接触を1〜4時間継続する特許請求の
範囲第11項記載の方法。
13. The method according to claim 11, wherein the contact is continued for 1 to 4 hours.
【請求項14】脱着処理を熱水又はアルカノール/水混
合溶媒を用いて行なう特許請求の範囲第11項記載の方
法。
14. The method according to claim 11, wherein the desorption treatment is performed using hot water or an alkanol / water mixed solvent.
【請求項15】酵素法によるサイクロデキストリンの生
成反応を特許請求の範囲第1項記載の吸着材の存在下に
行なうことを特徴とするサイクロデキストリンの収量の
増加方法。
15. A method for increasing the yield of cyclodextrin, which comprises carrying out the reaction for producing cyclodextrin by the enzymatic method in the presence of the adsorbent according to claim 1.
JP61250832A 1985-10-31 1986-10-23 Cyclodextrin adsorbent and its application Expired - Lifetime JPH0626667B2 (en)

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JP60-242956 1985-10-31

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JPH0626667B2 true JPH0626667B2 (en) 1994-04-13

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EP (1) EP0220719B1 (en)
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DE3689607T2 (en) 1994-06-16
EP0220719B1 (en) 1994-02-02
EP0220719A2 (en) 1987-05-06
US4781977A (en) 1988-11-01
DE3689607D1 (en) 1994-03-17
EP0220719A3 (en) 1987-10-21

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