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JPH06152139A - Multilayer wiring board and adhesive film used for it - Google Patents

Multilayer wiring board and adhesive film used for it

Info

Publication number
JPH06152139A
JPH06152139A JP30094192A JP30094192A JPH06152139A JP H06152139 A JPH06152139 A JP H06152139A JP 30094192 A JP30094192 A JP 30094192A JP 30094192 A JP30094192 A JP 30094192A JP H06152139 A JPH06152139 A JP H06152139A
Authority
JP
Japan
Prior art keywords
adhesive
wiring board
conductive particles
film
wiring pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP30094192A
Other languages
Japanese (ja)
Other versions
JP3324660B2 (en
Inventor
Isao Tsukagoshi
功 塚越
Mitsugi Fujinawa
貢 藤縄
Kazuhiro Isaka
和博 井坂
Tomohisa Ota
共久 太田
Yutaka Yamaguchi
豊 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP30094192A priority Critical patent/JP3324660B2/en
Publication of JPH06152139A publication Critical patent/JPH06152139A/en
Application granted granted Critical
Publication of JP3324660B2 publication Critical patent/JP3324660B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PURPOSE:To provide a multilayer wiring board that requires no cover film or plating process and can respond to thinner circuits and contribute to reducing thickness and costs. CONSTITUTION:Relating to two or more double-side wiring boards bearing a wiring pattern 2 farmed on an insulation substrate 1, an adhesive layer 6, consisting of conductive particles and bonding agent, is formed on both sides of an insulation film having through holes anywhere required, then heated and pressurized far forming laminated one body.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、多層配線板の層間接続
構造に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an interlayer connection structure for a multilayer wiring board.

【0002】[0002]

【従来の技術】多層配線板は、信号回路、電源、アース
回路等を内蔵できることから、配線の高密度化の有効な
方法として種々の電子機器に多用されている。従来の多
層印刷配線板の代表的製造法は、相互接続部以外をカバ
ーレイフィルム等で覆い絶縁性を得ながら、銅めっき等
により各層の配線パターンを相互に電気的に接続するこ
とが一般的に行われている。また、比較的新しい試みと
して、相互接続部以外をカバーレイフィルムやマスクフ
ィルム、レジストフィルム等(これらをカバーフィルム
と以下総称)で覆う等して絶縁性を得ながら、相互接続
部を導電粒子を分散した接着剤よりなる材料を用いて各
層の配線パターンを相互に接続することも提案(例えば
特開昭61−49499号公報や、特開平2−3659
3号公報)されており、この場合の導電粒子としてはは
んだ粒子が用いられている。
2. Description of the Related Art Since a multilayer wiring board can contain a signal circuit, a power supply, an earth circuit, etc., it is widely used in various electronic devices as an effective method for increasing the wiring density. A typical manufacturing method of a conventional multilayer printed wiring board is to electrically connect the wiring patterns of each layer to each other by copper plating or the like while covering the parts other than the interconnection part with a coverlay film to obtain insulation. Has been done in. In addition, as a relatively new attempt, a coverlay film, a mask film, a resist film, etc. (these are collectively referred to as a cover film hereinafter) other than the interconnection portion are covered to obtain insulation, while the interconnection portion is covered with conductive particles. It is also proposed to connect the wiring patterns of the respective layers to each other by using a material composed of a dispersed adhesive (for example, JP-A-61-49499 and JP-A-2-3659).
No. 3), and solder particles are used as the conductive particles in this case.

【0003】[0003]

【発明が解決しようとする課題】上記従来の方法はいず
れも、相互接続部以外をカバーフィルムで覆うため、対
向する配線板間にカバーフィルムが2層存在し多層配線
板とした時、厚みの減少が得にくくコストアップの一因
ともなっていた。また配線パターンの相互接続法につい
ては、銅等でめっきする方法は複雑なめっき工程が必要
であり、またカバーフィルムを熱圧着する時に銅めっき
が破壊し易い欠点がある。導電粒子と接着剤よりなる材
料で接続する場合は、導電粒子が接着中の全体に均一分
散されているので接続時の熱圧着により接着剤が流動
し、配線パターンの接続を必要とする部分以外でも導通
してしまい、導電粒子がはんだの場合は特に融点以下で
は硬質なことからカバーフィルムに傷がつくので絶縁性
が低下し、融点以上では隣接配線パターンで溶融して連
結しリークする等、ますます進行する配線の細線化に対
応不可能となってきた。本発明は、カバーフィルムやめ
っき工程が不要で配線の細線化に対応可能な層間接続を
用いた多層配線板に関する。
In any of the above-mentioned conventional methods, since the portions other than the interconnections are covered with the cover film, when two layers of cover films are present between the opposing wiring boards to form a multilayer wiring board, it is possible to reduce the thickness. It was difficult to obtain a decrease, and this was one of the causes of the cost increase. Further, regarding the interconnection method of the wiring patterns, the method of plating with copper or the like requires a complicated plating step, and the copper plating is easily broken when the cover film is thermocompression bonded. When connecting with a material consisting of conductive particles and an adhesive, the conductive particles are uniformly dispersed throughout the bonding, so the adhesive will flow due to thermocompression bonding at the time of connection, except for the part that requires connection of the wiring pattern. However, if the conductive particles are solder, the insulating property deteriorates because the cover film is scratched because it is hard below the melting point, especially if the conductive particles are solder, and if the melting point is higher than the melting point, the adjacent wiring pattern melts and leaks. It has become impossible to cope with the progress of thinner wiring. TECHNICAL FIELD The present invention relates to a multilayer wiring board using an interlayer connection which does not require a cover film or a plating step and can cope with a fine wiring.

【0004】[0004]

【課題を解決するための手段】本発明は、絶縁基板に配
線パターンを形成してなる2枚以上の両面配線板の間
に、要部に貫通孔を有する絶縁フィルムの両面に導電粒
子と接着剤とよりなる接着剤層を配置し、加熱加圧によ
り積層一体化してなる多層印刷配線板及び、接着剤と導
電粒子よりなる接着剤層が絶縁フィルムの両面に形成さ
れており、前記導電粒子の熱的変態点が絶縁フィルムよ
り低温である接着フィルムに関するものである。
SUMMARY OF THE INVENTION According to the present invention, conductive particles and an adhesive are provided on both sides of an insulating film having a through hole in a main part between two or more double-sided wiring boards each having a wiring pattern formed on an insulating substrate. A multilayer printed wiring board is formed by arranging an adhesive layer made of, and laminated and integrated by heating and pressing, and an adhesive layer made of an adhesive and conductive particles is formed on both sides of the insulating film. The present invention relates to an adhesive film having a dynamic transformation point lower than that of an insulating film.

【0005】本発明の構成を図面を参照しながら説明す
る。図1は、本発明の一実施例を説明する断面模式図で
ある。1は絶縁基板であり、フェノール樹脂、エポキシ
樹脂、ポリイミド等を、紙、ガラス布、ガラス不織布、
等の基材に含浸し加熱加圧したものや、ポリエステルや
ポリイミド等のプラスチックフィルム、AlやFe等の
金属、及びセラミックス等がある。配線パターン2は、
図1のように絶縁基板1の両面に形成するが、多層配線
板を構成したときの最外層は片面でも良い。配線パター
ン2は図1のように基板面から突出しても、図示してな
いが平面状や凹面状等いずれでも良い。接続安定性の点
から対向する配線パターンの少なくとも一方が突出する
ことが好ましい。これらの配線パターンは、テンティン
グ法、アディティブ法、及び転写法等の一般手段で形成
できる。絶縁基板1と配線パターン2の間に接着層が存
在しても良い。
The structure of the present invention will be described with reference to the drawings. FIG. 1 is a schematic sectional view illustrating an embodiment of the present invention. Reference numeral 1 denotes an insulating substrate, which is made of phenol resin, epoxy resin, polyimide, etc.
And the like, which are impregnated into a base material such as, and heated and pressurized, plastic films such as polyester and polyimide, metals such as Al and Fe, and ceramics. Wiring pattern 2 is
Although it is formed on both surfaces of the insulating substrate 1 as shown in FIG. 1, the outermost layer when a multilayer wiring board is formed may be one surface. The wiring pattern 2 may be projected from the substrate surface as shown in FIG. 1 or may be flat or concave although not shown. From the viewpoint of connection stability, it is preferable that at least one of the opposing wiring patterns projects. These wiring patterns can be formed by general means such as a tenting method, an additive method, and a transfer method. An adhesive layer may exist between the insulating substrate 1 and the wiring pattern 2.

【0006】層間接続法は、接続を必要とする配線パタ
ーン2を有する、第1及び第2の配線板3、4の間に、
導電粒子5と接着剤6よりなる接着剤層を要部に貫通孔
7を有する絶縁フィルム8の両面に形成した接着フィル
ム10を用いて積層一体化し、2つの配線板同士3−4
を接着すると共に、これらの接続を必要とする配線パタ
ーン間2−2’の電気的導通を得るものである。ここに
接続を必要とする配線パターン2は、パターン全体でも
パターンの一部でも良く、接続面に接続不要配線パター
ン9(例えばバイアホール部)が存在しても良い。
In the interlayer connection method, between the first and second wiring boards 3 and 4 having the wiring pattern 2 which requires connection,
An adhesive layer made of conductive particles 5 and an adhesive 6 is laminated and integrated using an adhesive film 10 formed on both sides of an insulating film 8 having a through hole 7 in a main portion, and two wiring boards are attached 3-4.
And to electrically connect the wiring patterns 2-2 ′ that require these connections. The wiring pattern 2 that needs to be connected may be the entire pattern or a part of the pattern, and the connection-free wiring pattern 9 (for example, a via hole portion) may be present on the connection surface.

【0007】本発明に好適な接着フィルムについて説明
する。接着剤6としては、シート等に用いられる熱可塑
性材料や、熱、光、電子線等のエネルギーによる硬化性
材料が広く適用出来る。多層配線板の耐熱性や耐湿性に
優れることから硬化性材料が好ましく、中でもエポキシ
系接着剤やイミド系接着剤は、分子構造上接着性や耐熱
性に優れることや硬化時間が広く設定出来ることから好
ましい。エポキシ系接着剤は、例えば高分子量エポキ
シ、固形エポキシと液状エポキシ、ウレタンやポリエス
テル、NBR等で変性したエポキシを主成分とし、硬化
剤や触媒、カップリング剤、充填剤等を添加してなるも
のが一般的である。これら材料は、抽出水のNaイオン
やClイオンが20ppm以下の高純度品であると、多
層配線板の耐電食性が向上することが好ましい。
The adhesive film suitable for the present invention will be described. As the adhesive 6, a thermoplastic material used for a sheet or the like and a curable material by energy of heat, light, electron beam or the like can be widely applied. Curable materials are preferred because of the excellent heat resistance and moisture resistance of the multilayer wiring board. Among them, epoxy adhesives and imide adhesives have excellent adhesiveness and heat resistance due to their molecular structure, and the curing time can be set widely. Is preferred. Epoxy adhesives include, for example, high molecular weight epoxy, solid epoxy and liquid epoxy, urethane, polyester, epoxy modified with NBR, etc. as a main component, and a curing agent, catalyst, coupling agent, filler, etc. added. Is common. When these materials are high-purity products having 20 ppm or less of Na ion and Cl ion of extracted water, it is preferable that the electrolytic corrosion resistance of the multilayer wiring board is improved.

【0008】導電粒子5としては、Au、Ag、Ni、
Cu、W、Sb、Sn、はんだ等の金属粒子やカーボン
等があり、これら及び非導電性のガラス、セラミック
ス、プラスチック等の高分子核材等に、前記した導電層
を被覆等により形成したものでも良い。さらに前記した
ような導電粒子と絶縁層で被覆してなる絶縁被覆粒子
や、導電粒子と絶縁粒子の併用等も、回路の細線化に極
めて有用である。はんだ等の熱溶融金属や、プラスチッ
ク等の高分子核材に導電層を形成したものは、融点やガ
ラス転移点等の熱的変態点を有するので加熱加圧もしく
は加圧により変形性を有し、積層時に回路との接触面積
が増加し信頼性が向上するので好ましい。この場合導電
粒子の少なくとも核材の熱的変態点が絶縁フィルムによ
り低温であると、積層一体化時の加熱加圧により接着フ
ィルムの絶縁フィルム8に傷がつかないので層間絶縁性
が高度に保たれるので好ましい。特に高分子類を核とし
た場合、はんだのように融点を示さないので軟化の状態
を接続温度で広く制御でき、配線板や配線パターンの厚
みや平坦性ばらつきに対応し易くより好ましい。また例
えばNiやW等の硬質金属粒子の場合、導電粒子が配線
パターンに突きささるので、配線パターン上の酸化膜や
汚染層の存在する場合にも低い接続抵抗が得られ、加え
て接続部の固定による膨張収縮の抑制にも有効で信頼性
が向上する。そのため硬質金属粒子の場合の粒径は、接
続を必要とする配線パターン間の距離(接続後の厚み)
よりも若干大きな粒径が好ましくそれ以下の粒径の場
合、凝集状となっていることが好ましい。導電粒子の数
は、原則的には配線パターン上の接続を必要とする部分
に1個あれば良いが、5個以上とすることで接続信頼性
がさらに向上するので好ましい。粒径は細線化に対応す
るため隣接する配線パターンとの距離以下が好ましい。
As the conductive particles 5, Au, Ag, Ni,
There are metal particles such as Cu, W, Sb, Sn and solder, carbon, etc., and these, and non-conductive glass, ceramics, polymer core materials such as plastics, etc. formed with the above-mentioned conductive layer by coating, etc. But good. Furthermore, the insulating coated particles obtained by coating the conductive particles and the insulating layer as described above, the combined use of the conductive particles and the insulating particles, and the like are also extremely useful for thinning the circuit. A heat-melting metal such as solder or a polymer core material such as plastic with a conductive layer has a thermal transformation point such as a melting point or a glass transition point. It is preferable because the contact area with the circuit is increased at the time of stacking and the reliability is improved. In this case, if at least the thermal transformation point of the core material of the conductive particles is at a low temperature due to the insulating film, the insulating film 8 of the adhesive film is not damaged by heat and pressure during lamination integration, so that the interlayer insulating property is maintained at a high level. It is preferable because it will drip. In particular, when a polymer is used as a core, it does not exhibit a melting point like solder, so that the softened state can be widely controlled at the connection temperature, and it is more preferable because it can easily cope with variations in thickness and flatness of the wiring board or wiring pattern. Further, in the case of hard metal particles such as Ni or W, the conductive particles stick to the wiring pattern, so that a low connection resistance can be obtained even in the presence of an oxide film or a contaminated layer on the wiring pattern. It is also effective in suppressing expansion and contraction by fixing, and improves reliability. Therefore, in the case of hard metal particles, the particle size is the distance between wiring patterns that require connection (thickness after connection).
It is preferable that the particle size is slightly larger than that, and if the particle size is smaller than that, it is preferable that the particles are in an agglomerated state. In principle, the number of conductive particles may be one in the portion on the wiring pattern where connection is required, but it is preferable to set it to five or more because the connection reliability is further improved. Since the grain size corresponds to thinning, it is preferable that the grain size be equal to or smaller than the distance between adjacent wiring patterns.

【0009】要部に貫通孔7を有する絶縁フィルム8と
しては、ポリイミド、ポリエチレンテレフタレート、ポ
リエチレン等の一般的な絶縁フィルムで良く、なるべく
薄いものが多層配線板の厚みの減少やコスト低減から好
ましい。接貫通孔7は層間の導電性が必要な部分に形成
するが、導電粒子5と接着剤6よりなる接着剤層を含ん
でも(図1、7A)、接着剤層を含まないで絶縁フィル
ムのみ(図1、7B)でも良い。加工性の点から後者が
好ましい。積層一体化の前に貫通孔7に接着フィルム1
0が存在しても良い。
The insulating film 8 having the through holes 7 in the main part may be a general insulating film such as polyimide, polyethylene terephthalate, or polyethylene, and the thinnest possible film is preferable from the viewpoint of reducing the thickness of the multilayer wiring board and reducing the cost. The contact through hole 7 is formed in a portion where conductivity between layers is required, but even if an adhesive layer composed of the conductive particles 5 and the adhesive 6 is included (FIGS. 1 and 7A), only the insulating film is included without including the adhesive layer. (FIGS. 1 and 7B). The latter is preferable in terms of workability. Adhesive film 1 in through-hole 7 before lamination integration
There may be 0.

【0010】積層一体化に際しては、配線パターン面の
接続を必要とする部分を位置合わせし加熱加圧する。こ
の時積層を必要とする所定枚の配線板と接着フィルムに
例えば貫通孔を形成しておきピン等で位置合わせするい
わゆるピンラミネーション法が好適であり、一体化の方
法としては、プレスやロールラミネータ等の一般的な方
法で良い。ピンラミネーション法の貫通孔を導電性接着
剤で充填することや、スルーホールめっきすることで、
全層間の電気的接続を得ることも出来る。
When the layers are integrated, the portions of the wiring pattern surface that require connection are aligned and heated and pressed. At this time, a so-called pin lamination method in which, for example, through holes are formed in a predetermined number of wiring boards and an adhesive film that need to be laminated and alignment is performed with pins or the like is suitable, and as a method of integration, a press or roll laminator is used. A general method such as By filling the through holes of the pin lamination method with a conductive adhesive or by through-hole plating,
It is also possible to obtain electrical connection between all layers.

【0011】図2は図1の構成の積層一体化後を示す断
面模式図である。加熱加圧により、接着剤は流動し導電
粒子5が配線パターン上の接続を必要とする部分2−
2’に集中し電気的接続を可能とし、接着剤は流動して
両基板1−1’間を充填して接着し、絶縁フィルム8に
より層間絶縁性が保たれる。また接続不要配線パターン
9も同様に絶縁性が保たれる。この層を任意に積層する
ことで任意の多層配線板とすることが出来る。好ましい
導電粒子であるはんだ等の熱溶融金属や、プラスチック
等の高分子核材に導電層を形成したものは、導電粒子5
が配線パターン上の接続を必要とする部分2−2’に変
形して挟まれパターンとの接触面積が増大し接続抵抗が
安定化し信頼性も向上する。接着剤の最適充填量は接着
剤の厚みで管理できるが、積層一体化により端部に流出
させて不要部を除去すると気泡の混入が少なく好まし
い。
FIG. 2 is a schematic cross-sectional view showing the structure of FIG. 1 after lamination and integration. By heating and pressing, the adhesive flows and the conductive particles 5 need to be connected on the wiring pattern.
Concentrating on 2'to enable electrical connection, the adhesive flows to fill and bond between the substrates 1-1 ', and the insulating film 8 maintains the interlayer insulating property. In addition, the connection-free wiring pattern 9 also maintains its insulating property. An arbitrary multilayer wiring board can be obtained by stacking these layers arbitrarily. A conductive particle formed by forming a conductive layer on a hot-melt metal such as solder, which is a preferable conductive particle, or a polymer core material such as plastic is
Is deformed into a portion 2-2 'that requires connection on the wiring pattern and is sandwiched, the contact area with the pattern is increased, the connection resistance is stabilized, and the reliability is also improved. The optimum filling amount of the adhesive agent can be controlled by the thickness of the adhesive agent, but it is preferable to let the flow out to the end portion and remove the unnecessary portion by laminating and integrating so that air bubbles are less mixed.

【0012】[0012]

【作用】本発明によれば、絶縁基板に配線パターンを形
成してなる複数枚以上の両面配線板の間に、要部に貫通
孔を有する絶縁フィルムの両面に導電粒子と接着剤とよ
りなる接着剤層を形成し、加熱加圧により積層一体化し
てなる多層印刷配線板なので、相互接続部以外は絶縁性
接着剤に接するためカバーフィルムが不要であり、相互
接続部は導電粒子により電気的接続を得ているのでめっ
きが不要である。本発明の導電粒子は、積層一定化によ
り配線パターンの要部のみに集中的に流動し配置される
ので、隣接パターン間でリークが発生せず熱圧着の条件
が広範囲に適用可能である。たとえ接続部以外に導電粒
子が存在しても絶縁フィルムが層間に存在するので絶縁
性が保たれ、その濃度も薄いので隣接配線パターンでの
リークが発生しない。そのため接続抵抗が安定化し信頼
性も向上し回路の細線化に対応可能であり、加えて多層
配線板の厚みの減少やコスト低減にも有効な多層配線板
が極めて容易に得られる。
According to the present invention, an adhesive composed of conductive particles and an adhesive is provided on both sides of an insulating film having a through hole in a main portion between a plurality of double-sided wiring boards each having a wiring pattern formed on an insulating substrate. Since it is a multilayer printed wiring board that is formed by forming layers and laminating and integrating by heating and pressing, a cover film is not necessary because it contacts the insulating adhesive except for the interconnection part, and the interconnection part is electrically connected by conductive particles. Since it is obtained, plating is unnecessary. Since the conductive particles of the present invention are concentratedly flowed and arranged only in the main part of the wiring pattern due to the constant stacking, no leak occurs between the adjacent patterns, and the thermocompression bonding conditions can be widely applied. Even if there are conductive particles other than the connection portion, the insulating film is present between the layers, so that the insulating property is maintained and the concentration thereof is low, so that no leak occurs in the adjacent wiring pattern. Therefore, the connection resistance is stabilized, the reliability is improved, it is possible to cope with the thinning of the circuit, and in addition, the multilayer wiring board which is effective in reducing the thickness and cost of the multilayer wiring board can be obtained very easily.

【0013】また本発明に好適な接着フィルムは、接着
剤と導電粒子よりなる接着剤層を絶縁フィルムの両面に
形成してなるので、従来のカバーフィルムとそれを接着
する接着剤とが当初から一体化しているので、コスト低
減に有効な多層印刷配線板が極めて容易に得られる。特
に導電粒子として高分子類を核とした場合、軟化の状態
を接続温度で広く制御でき配線板や配線パターンの厚み
や平坦性ばらつきに対応し易くなる。
Further, since the adhesive film suitable for the present invention is formed by forming an adhesive layer composed of an adhesive and conductive particles on both sides of an insulating film, a conventional cover film and an adhesive for adhering the same are used from the beginning. Since they are integrated, a multilayer printed wiring board effective for cost reduction can be obtained very easily. In particular, when a polymer is used as the core of the conductive particles, the softened state can be widely controlled at the connection temperature, and it becomes easy to deal with variations in the thickness and flatness of the wiring board or wiring pattern.

【0014】[0014]

【実施例】以下実施例でさらに詳細に説明するが、本発
明はこれに限定されない。また、説明を分かりやすくす
るため2枚の両面基板を層間接続した4層配線板につい
て述べるが、2枚の両面基板のうち1枚が片面基板でも
よく、4層をこえる多層配線板にも当然適用できる。
The present invention will be described in more detail with reference to the following examples, but the present invention is not limited thereto. Also, for the sake of clarity, a four-layer wiring board in which two double-sided boards are connected to each other will be described, but one of the two double-sided boards may be a single-sided board or a multilayer wiring board having more than four layers. Applicable.

【0015】実施例1〜4 厚み50μmのポリイミドフィルムの両面に接着剤10
μmを介して銅箔18μmを形成してなる両面基板を、
パターン印刷及びエッチング等を行った配線板を用意し
た。接続を必要とする配線パターンの最小径は50μm
であった。ポリイミドフィルム25μmに接続を必要と
する配線パターンと一致した貫通孔をパンチしこの両面
に、高分子量エポキシを主成分とする厚み15μmの接
着剤(純水で100℃10h抽出後の抽出水のNaイオ
ン、Clイオンがそれぞれ10ppm以下)を形成し
た。この接着剤中には下記の導電粒子を12体積%均一
分散させて、本発明の接着剤フィルムとした。ここに用
いた導電粒子は、架橋ポリスチレンからなる核材の表面
にNi/Auの複合導電層を有する粒径10μmのめっ
きプラスチック球(実施例1)、平均粒径7μmのカー
ボニル法Ni(実施例2)、平均粒径15μmの融点1
80℃のはんだ粒子(実施例3)、実施例1の粒子表面
を厚み約0.2μmのナイロンで被覆した絶縁被覆粒子
(実施例4)である。前記配線板の一方の接続を必要と
する配線パターンと接着フィルムの貫通孔及び他の配線
板との、周辺の4辺に形成したスルーホールにピンで位
置合わせ後、スルーホール部を導電性接着剤で充填し、
180℃20kg/cm2 で30分加熱加圧して接着剤
を硬化した。以上により、2枚の両面基板を層間接続し
た4層配線板を得た。実施例1〜4はいずれも十分な層
間接続特性を示した。
Examples 1 to 4 Adhesive 10 was applied to both sides of a polyimide film having a thickness of 50 μm.
A double-sided board formed by forming a copper foil 18 μm through
A wiring board on which pattern printing and etching were performed was prepared. The minimum diameter of the wiring pattern that requires connection is 50 μm
Met. A polyimide film 25 μm is punched with a through hole corresponding to a wiring pattern that needs to be connected, and an adhesive having a thickness of 15 μm and containing a high molecular weight epoxy as a main component is formed on both surfaces of the through hole. Ion and Cl ion are each 10 ppm or less). 12% by volume of the following conductive particles were uniformly dispersed in this adhesive to obtain an adhesive film of the present invention. The conductive particles used here were plated plastic spheres having a Ni / Au composite conductive layer on the surface of a core material made of crosslinked polystyrene and having a particle diameter of 10 μm (Example 1), and a carbonyl method Ni having an average particle diameter of 7 μm (Example). 2), melting point 1 with an average particle size of 15 μm
80 ° C. solder particles (Example 3) and insulating coated particles (Example 4) obtained by coating the particle surfaces of Example 1 with nylon having a thickness of about 0.2 μm. After aligning the through holes formed on the four peripheral sides of the wiring pattern, the through hole of the adhesive film, and the other wiring board that require connection of one side of the wiring board with a pin, the through hole portion is electrically conductively bonded. Fill with the agent,
180 ° C 20kg / cm 2 The adhesive was cured by heating and pressing for 30 minutes. As described above, a four-layer wiring board in which two double-sided boards were connected to each other was obtained. All of Examples 1 to 4 showed sufficient interlayer connection characteristics.

【0016】実施例5 厚み0.2mmのガラスエポキシ基板の両面に接着剤1
0μmを介して銅箔18μmを形成してなる両面基板
を、パターン印刷及びエッチング等を行った配線板を用
意した。接続を必要とする配線パターンの最小径は20
μmであった。実施例1の接着フィルムを用いて、実施
例1と同様な位置合わせ、加熱加圧、接着剤硬化を行
い、2枚の両面基板を層間接続した4層配線板を得た。
実施例5も十分な層間接続特性を示した。
Example 5 Adhesive 1 was applied to both sides of a glass epoxy substrate having a thickness of 0.2 mm.
A wiring board was prepared by pattern-printing and etching a double-sided substrate having a copper foil of 18 μm formed with a thickness of 0 μm. The minimum diameter of the wiring pattern that requires connection is 20
was μm. Using the adhesive film of Example 1, the same positioning, heating and pressing, and adhesive curing as in Example 1 were performed to obtain a four-layer wiring board in which two double-sided boards were interlayer-connected.
Example 5 also showed sufficient interlayer connection characteristics.

【0017】[0017]

【発明の効果】以上のように本発明によれば、カバーフ
ィルムやめっき工程が不要で回路の細線化に対応可能で
あり、加えて多層配線板の厚みの減少やコスト低減にも
有効な接続信頼性が向上した多層配線板が極めて合理的
に容易に得られる。
As described above, according to the present invention, there is no need for a cover film or a plating process, and it is possible to cope with the thinning of the circuit. In addition, the connection is effective for reducing the thickness of the multilayer wiring board and reducing the cost. It is very reasonably easy to obtain a multilayer wiring board with improved reliability.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の製造時の構成の一実施例を示す断面模
式図である。
FIG. 1 is a schematic cross-sectional view showing one example of the constitution at the time of manufacturing of the present invention.

【図2】本発明の積層一体化後の一実施例を示す断面模
式図である。
FIG. 2 is a schematic cross-sectional view showing an example of the present invention after being laminated and integrated.

【符号の説明】[Explanation of symbols]

1 絶縁基板 2 配線パターン 3 第1の配線板 4 第2の配線板 5 導電粒子 6 接着剤 7 貫通孔 8 絶縁フィルム 9 接続不要配線パターン 10 接着フィルム 1 Insulating Substrate 2 Wiring Pattern 3 First Wiring Board 4 Second Wiring Board 5 Conductive Particles 6 Adhesive 7 Through Hole 8 Insulating Film 9 Wiring Pattern 10 Connection-Free Wiring Pattern 10 Adhesive Film

───────────────────────────────────────────────────── フロントページの続き (72)発明者 太田 共久 茨城県下館市大字小川1500番地 日立化成 工業株式会社下館研究所内 (72)発明者 山口 豊 茨城県下館市大字小川1500番地 日立化成 工業株式会社下館研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Kyohisa Ota 1500 Ogawa, Shimodate, Ibaraki Shimodate Research Laboratory, Hitachi Chemical Co., Ltd. (72) Yutaka Yamaguchi 1500 Ogawa, Shimodate, Ibaraki Hitachi Chemical Co., Ltd. Company Shimodate Institute

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】絶縁基板に配線パターンを形成してなる2
枚以上の両面配線板の間に、要部に貫通孔を有する絶縁
フィルムの両面に導電粒子と接着剤とよりなる接着剤層
を配置し、加熱加圧により積層一体化してなる多層配線
板。
1. A wiring pattern formed on an insulating substrate. 2.
A multilayer wiring board in which an adhesive layer composed of conductive particles and an adhesive is disposed on both sides of an insulating film having a through hole in a main portion between two or more double-sided wiring boards and laminated and integrated by heating and pressing.
【請求項2】接着剤と導電粒子よりなる接着剤層が絶縁
フィルムの両面に形成されており、前記導電粒子の熱的
変態点が絶縁フィルムより低温である接着フィルム。
2. An adhesive film in which an adhesive layer composed of an adhesive and conductive particles is formed on both sides of an insulating film, and the thermal transformation point of the conductive particles is lower than that of the insulating film.
JP30094192A 1992-11-11 1992-11-11 Multilayer wiring board and adhesive film used for it Expired - Fee Related JP3324660B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30094192A JP3324660B2 (en) 1992-11-11 1992-11-11 Multilayer wiring board and adhesive film used for it

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30094192A JP3324660B2 (en) 1992-11-11 1992-11-11 Multilayer wiring board and adhesive film used for it

Publications (2)

Publication Number Publication Date
JPH06152139A true JPH06152139A (en) 1994-05-31
JP3324660B2 JP3324660B2 (en) 2002-09-17

Family

ID=17890946

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30094192A Expired - Fee Related JP3324660B2 (en) 1992-11-11 1992-11-11 Multilayer wiring board and adhesive film used for it

Country Status (1)

Country Link
JP (1) JP3324660B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006035692A1 (en) * 2004-09-30 2006-04-06 Sumitomo Electric Industries, Ltd. Conductive paste and method for manufacturing multilayer printed wiring board using same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006035692A1 (en) * 2004-09-30 2006-04-06 Sumitomo Electric Industries, Ltd. Conductive paste and method for manufacturing multilayer printed wiring board using same
US8597459B2 (en) 2004-09-30 2013-12-03 Sumitomo Electric Industries, Ltd. Conductive paste and method for manufacturing multilayer printed wiring board using the same

Also Published As

Publication number Publication date
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