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JPH0614591B2 - Manufacturing method of printed wiring board - Google Patents

Manufacturing method of printed wiring board

Info

Publication number
JPH0614591B2
JPH0614591B2 JP6610585A JP6610585A JPH0614591B2 JP H0614591 B2 JPH0614591 B2 JP H0614591B2 JP 6610585 A JP6610585 A JP 6610585A JP 6610585 A JP6610585 A JP 6610585A JP H0614591 B2 JPH0614591 B2 JP H0614591B2
Authority
JP
Japan
Prior art keywords
catalyst
adhesive
wiring board
printed wiring
plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP6610585A
Other languages
Japanese (ja)
Other versions
JPS61225890A (en
Inventor
武博 豊島
清 長谷川
昭士 中祖
寿郎 岡村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP6610585A priority Critical patent/JPH0614591B2/en
Publication of JPS61225890A publication Critical patent/JPS61225890A/en
Publication of JPH0614591B2 publication Critical patent/JPH0614591B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、無電解銅めっきでプリント配線板の導体回路
を形成するプリント配線板の製造法に関する。
TECHNICAL FIELD The present invention relates to a method for manufacturing a printed wiring board for forming a conductor circuit of the printed wiring board by electroless copper plating.

(従来の技術) 従来、無電解銅めっきでプリント配線板を製造する方法
として、 (1)絶縁基板表面に合成ゴム、フェノール樹脂を含むめ
っき膜の接着層を形成する工程と、 (2)該接着層表面を粗化する工程と、 (3)電解めっきの触媒溶液で活性化する工程と、 (4)回路形成部分以外をマスクする工程(レジスト形成
工程)と、 (5)無電解めっきにより回路を形成することを特徴とす
るプリント配線板の製造方法がある。
(Prior Art) Conventionally, as a method of manufacturing a printed wiring board by electroless copper plating, (1) a step of forming an adhesive layer of a plating film containing synthetic rubber and phenol resin on the surface of an insulating substrate, and (2) The step of roughening the surface of the adhesive layer, (3) the step of activating with a catalytic solution for electroplating, (4) the step of masking parts other than the circuit formation part (resist forming step), and (5) the electroless plating There is a method for manufacturing a printed wiring board, which is characterized by forming a circuit.

また、上記方法によって得られるプリント配線板のめっ
き膜と接着層の密着力を向上させるため、上記接着剤表
面の粗化工程に次いでアルカリ水溶液処理工程を含むこ
とを特徴とするプリント配線板の製造方法がある(特開
昭55−22841)。
Further, in order to improve the adhesion between the plating film and the adhesive layer of the printed wiring board obtained by the above method, a manufacturing method of a printed wiring board characterized by including an alkaline aqueous solution treatment step after the roughening step of the adhesive surface. There is a method (JP-A-55-22841).

(発明が解決しようとする問題点) これらの方法では、活性化工程の次にレジスト形成工程
を行うために回路部分の接着剤表面に触媒が付与される
が、接着剤とレジストの界面にも触媒層が形成される。
従って、接着剤表面のめっき付性は良好であるが、回路
間隔が狭くなると回路間の絶縁抵抗が小さくなるという
欠点があった。
(Problems to be Solved by the Invention) In these methods, a catalyst is applied to the adhesive surface of the circuit part in order to perform the resist forming step after the activation step. A catalyst layer is formed.
Therefore, the plating property of the surface of the adhesive is good, but there is a drawback that the insulation resistance between the circuits decreases when the circuit interval becomes narrow.

又活性化工程後から無電解銅めっき液に浸漬するまでの
間の取り扱いに特別な配慮が必要である。すなわち、活
性化によって形成した無電解銅めっきの触媒層は基板の
表面のみに形成されておるので、その表面を装置の1部
あるいは指などが強く接触すると触媒がそれらに付着
し、更に付着した触媒が他の基板のめっきレジスト表面
に転移するという欠点、および小さなひっかき傷でも触
媒が欠けるのでその部分は回路の欠けや断線になるとい
う欠点があった。
In addition, special consideration is required for handling after the activation step and before immersion in the electroless copper plating solution. That is, since the catalyst layer of electroless copper plating formed by activation is formed only on the surface of the substrate, when a part of the device or a finger or the like makes strong contact with the surface, the catalyst adheres to them and further adheres to them. The catalyst has a defect that it is transferred to the plating resist surface of another substrate, and that even if it is a small scratch, the catalyst is lacking, and that part has a defect of a circuit or disconnection.

本発明は回路間の絶縁抵抗特性が優れ、又製造時の問題
である触媒の他のものへの転移と基板への再付着という
欠点のない、又ひっかき傷などでもその部分の回路が欠
けや断線のおこらないプリント配線板の製造法を提供す
るものである。
INDUSTRIAL APPLICABILITY The present invention has excellent insulation resistance characteristics between circuits, does not have the drawback of transfer to another catalyst and redeposition on the substrate, which is a problem at the time of manufacture, and the circuit at that portion is not damaged even if scratched. It is intended to provide a method for manufacturing a printed wiring board that does not cause disconnection.

(問題点を解決するための手段) 本発明は無電解銅めっきの触媒を含む接着剤を表面に塗
布した絶縁基板を用いて無電解銅めっきでプリント配線
板を製造する方法において、 a プリント配線基板にスルーホールをあける工程と、 b 接着剤表面を化学粗化液で粗化する工程と c 無電解銅めっきの触媒になる溶液で触媒を付与する
工程と、 d 粗化で生じた接着剤粗化表面の脆弱層を除去する工
程と、 e 回路形成部分以外にめっきレジストを形成する工程
と、 f 無電解銅めっきによって回路を形成する工程とを順
に含むことを特徴とするプリント配線板の製造方法であ
る。
(Means for Solving Problems) The present invention relates to a method for producing a printed wiring board by electroless copper plating using an insulating substrate having an adhesive containing a catalyst for electroless copper plating applied on the surface thereof. A step of forming a through hole in the substrate; a step of roughening the surface of the adhesive with a chemical roughening solution; a step of applying a catalyst with a solution that becomes a catalyst for electroless copper plating; and an adhesive generated by roughening. A printed wiring board comprising: a step of removing a fragile layer on a roughened surface; a step of forming a plating resist on a portion other than a circuit forming portion; and a step of forming a circuit by f electroless copper plating in this order. It is a manufacturing method.

接着剤はめっき銅との密着力を向上させ、かつ無電解銅
めっきの触媒能をもつことを目的とし、一般には合成ゴ
ム−熱硬化性樹脂−充填材−無電解銅めっきの触媒から
成るものが用いられる。触媒としては、パラジウム等の
金属又は金属塩、酸化物等をAl2O3−SiO2等の担体に吸
着させたもの並びに、エポキシ樹脂に分散させたものが
使用される。
The adhesive is intended to improve the adhesion with plated copper and to have a catalytic ability for electroless copper plating, and is generally composed of synthetic rubber-thermosetting resin-filler-catalyst for electroless copper plating. Is used. As the catalyst, those obtained by adsorbing a metal such as palladium or a metal salt, an oxide or the like on a carrier such as Al 2 O 3 —SiO 2 and those dispersed in an epoxy resin are used.

絶縁基板はフェノール形積層板・エポキシ形積層板・ポ
リイミド系積層板などが使用でき無電解銅めっき触媒の
入っている場合でも使用できる。スルーホールをあける
にはパンチ穴あけ、ドリル穴あけなどが使用できる。粗
化は化学粗化液を用いて行なう。
The insulating substrate may be a phenol type laminated plate, an epoxy type laminated plate, a polyimide type laminated plate or the like, and can be used even when an electroless copper plating catalyst is contained. Punching and drilling can be used to open through holes. The roughening is performed using a chemical roughening solution.

化学粗化液としてはクロム酸−硫酸系、重クロム酸塩−
ホウフッ酸系などが使用できる。無電解銅めっきのため
の触媒付与には通常のパラジウム−スズ−塩酸系のもの
が使用できる。
Chromic acid-sulfuric acid system, dichromate-
Borohydrofluoric acid type can be used. For applying a catalyst for electroless copper plating, a usual palladium-tin-hydrochloric acid type catalyst can be used.

脆弱層の除去には、アルカリ水溶液処理、酸処理、超音
波洗浄処理、高圧水洗処理掃き取りなどが用いられる。
アルカリ水溶液処理にはpH11以上のアルカリ水溶液が
使用でき。処理条件は70℃で5分以上浸漬が効果的で
ある。酸処理には硫酸以外のpH1以下の酸溶液が使用で
きる。
To remove the brittle layer, an alkaline aqueous solution treatment, an acid treatment, an ultrasonic cleaning treatment, a high-pressure water washing treatment, and the like are used.
An alkaline solution having a pH of 11 or higher can be used for the alkaline solution treatment. The treatment condition is effective soaking at 70 ° C. for 5 minutes or more. Acid solutions other than sulfuric acid having a pH of 1 or less can be used for the acid treatment.

アルカリ性水溶液としては、次のものの水溶液が使用さ
れる。リン酸水素ナトリウムと水酸化ナトリウム、炭
酸ナトリウムと塩酸、リン酸とホウ酸と酢酸と水酸化ナ
トリウム、炭酸ナトリウムと炭酸水素ナトリウム、グリ
シンと塩化ナトリウムと水酸化ナトリウム、ホウ砂と水
酸化ナトリウム、水酸化ナトリウム、水酸化カリウム、
アンモニア、モノメチルアンモニア、ジメチルアンモニ
アなどの脂肪族アミン、炭酸ナトリウム、水酸化カルシ
ウム、グアニジンと塩酸等の少なくとも一種である。
As the alkaline aqueous solution, the following aqueous solutions are used. Sodium hydrogen phosphate and sodium hydroxide, sodium carbonate and hydrochloric acid, phosphoric acid and boric acid and acetic acid and sodium hydroxide, sodium carbonate and sodium hydrogen carbonate, glycine and sodium chloride and sodium hydroxide, borax and sodium hydroxide, water Sodium oxide, potassium hydroxide,
At least one of aliphatic amines such as ammonia, monomethyl ammonia and dimethyl ammonia, sodium carbonate, calcium hydroxide, guanidine and hydrochloric acid.

以上の水溶液に界面活性剤を混入することも出来る。A surfactant can be mixed in the above aqueous solution.

酸処理としては、硫酸、ホウフッ酸の水溶液が用いられ
る。
As the acid treatment, an aqueous solution of sulfuric acid or borofluoric acid is used.

超音波洗浄、高圧水洗処理は市販の装置を使用して一般
的な使用条件下でおこなうことができる。又、掃き取り
は軟い有機質スポンジなどが用いられる。このスポンジ
をロール状にしてコンベヤ化して処理することもでき
る。
The ultrasonic cleaning and the high-pressure water cleaning treatment can be performed using a commercially available device under general use conditions. In addition, a soft organic sponge or the like is used for sweeping. The sponge may be rolled into a conveyor for processing.

ここで、脆弱層とは接着剤付絶縁基板を化学粗化した時
に、粗化表面層に形成される間隙の認められる多孔性の
層である。この脆弱層は、めっきで得た回路と基板との
強固な接着をさまたげる作用があるので、少ない方が本
来は望ましいものである。
Here, the brittle layer is a porous layer in which gaps are formed in the roughened surface layer when the insulating substrate with the adhesive is chemically roughened. Since the brittle layer has an effect of impeding the firm adhesion between the circuit obtained by plating and the substrate, it is originally desirable that it is less.

この脆弱層除去においては、除去される脆弱層の量が多
くなるほど、活性化工程で付与した触媒の除去される量
が多くなる。
In this fragile layer removal, the larger the amount of the fragile layer removed, the more the amount of the catalyst applied in the activation step is removed.

したがって除去される脆弱層の量は貴重で表わして、1
00mg/m2以上望ましくは500mg/m2以上である。
Therefore, the amount of the fragile layer removed is precious and expressed as 1
200 mg / m 2 or more preferably is 500 mg / m 2 or more.

スルーホールに付与された触媒はこれらの処理では除去
されずに残る。従ってスルーホールめっき付性は良好で
ある。
The catalyst applied to the through holes remains without being removed by these treatments. Therefore, the through-hole plating property is good.

次にめっきレジストには耐アルカリ性のものが必要で、
熱硬化性インク、UV硬化性インク、ドライフィルムな
どが使用できる。無電解銅めっき液としては例えば次の
ようなものが使用できる。
Next, the plating resist needs to be alkali resistant,
Thermosetting ink, UV curable ink, dry film, etc. can be used. For example, the following can be used as the electroless copper plating solution.

硫酸銅(五水塩) =10g/エチレン ジアミン四酢酸ナトリウム=40g/ 37%ホルマリン =4ml/ シアン化ナトリウム =50mg/ pH =12.0 温度 =70℃ (作用) 本発明は、接着剤表面に無電解銅めっきを行う手段とし
て触媒溶液による活性化(触媒付与)に依存しない。そ
の代りに、接着剤中に無電解銅めっきの触媒を分散させ
た接着剤付絶縁基板を用いる。そして、スルーホールを
活性化するための触媒付与工程後、接着剤粗化表面では
不要でかつ問題となる活性化工程で付与された触媒層を
除去する。その除去の方法が接着剤の化学粗化によって
生じる脆弱層を除去すると同時におこなうものである。
Copper sulfate (pentahydrate) = 10 g / ethylene sodium diamine tetraacetate = 40 g / 37% formalin = 4 ml / sodium cyanide = 50 mg / pH = 12.0 Temperature = 70 ° C. (action) The present invention is applied to the adhesive surface. It does not depend on activation (catalyst application) by a catalyst solution as a means for performing electroless copper plating. Instead, an insulating substrate with an adhesive in which a catalyst for electroless copper plating is dispersed in the adhesive is used. After the catalyst application step for activating the through holes, the catalyst layer applied in the activation step, which is unnecessary and poses a problem on the roughened surface of the adhesive, is removed. The removal method is performed at the same time as removing the brittle layer caused by the chemical roughening of the adhesive.

さて、本発明の方法では、回路間の絶縁抵抗を低下させ
るほど高濃度の活性層はこの脆弱層と共に除去される。
In the method of the present invention, the active layer having such a high concentration that the insulation resistance between the circuits is lowered is removed together with the brittle layer.

又、接着剤粗化表面のひっかき傷に対しても、本発明で
は接着剤に触媒で添加しているので回路の欠けや断線を
防ぐことができる。
Further, even in the case of scratches on the roughened surface of the adhesive, in the present invention, since the adhesive is catalytically added, it is possible to prevent chipping or disconnection of the circuit.

更に、脆弱層が除去されているので、めっき工程中で、
粗化接着剤の小片がめっきレジスト上に付着しその部分
にめっき析出が発生する。即ち、銅ふりの現象が起らな
い。
Furthermore, since the fragile layer has been removed, during the plating process,
A small piece of the roughening adhesive adheres to the plating resist, and plating deposition occurs at that portion. That is, the phenomenon of pretending to be copper does not occur.

実施例1 アクリロニトリルゴム、フェノール樹脂、エポキシ樹
脂、充填材および無電解銅めっきの触媒を添加した接着
剤層を設けた紙エポキシの絶縁基板にスルーホールをあ
けた。
Example 1 Through holes were made in an insulating substrate of paper epoxy provided with an adhesive layer containing an acrylonitrile rubber, a phenol resin, an epoxy resin, a filler and a catalyst for electroless copper plating.

次に化学粗化液に浸漬して接着剤表面を粗化した。Next, the surface of the adhesive was roughened by immersing it in a chemical roughening liquid.

次に、パラジウム−スズ−塩酸系の無電解銅めっきのた
めの触媒溶液で触媒付与をおこなった。
Next, a catalyst was applied with a catalyst solution for palladium-tin-hydrochloric acid based electroless copper plating.

次にアルカリ水溶液処理としてpH12.3の、0.1M
リン酸水素=ナトリウム/水酸化ナトリウム水溶液に7
0℃で3時間浸漬をおこない、水洗後110℃で30分
間乾燥した。
Then, as an alkaline aqueous solution treatment, pH 12.3, 0.1M
Hydrogen phosphate = 7 in sodium / sodium hydroxide solution
Immersion was performed at 0 ° C. for 3 hours, washed with water, and dried at 110 ° C. for 30 minutes.

次に耐アルカリ性のドライブフィルム(日立化成製SR
−3000)を用いてめっきレジストを形成した。
Next, alkali-resistant drive film (SR manufactured by Hitachi Chemical
-3000) was used to form a plating resist.

次に無電解銅めっき液に浸漬してめっき厚が35μmに
なるまでめっきをおこないプリント配線板を得た。
Next, the printed wiring board was obtained by immersing in an electroless copper plating solution and plating until the plating thickness became 35 μm.

実施例2 実施例1においてアルカリ水溶液処理の代りに、有機質
スポンジを使用して活性化処理後の粗化表面を掃き取っ
た。こと以外は、実施例1と同様におこないプリント配
線板を得た。
Example 2 Instead of the alkaline aqueous solution treatment in Example 1, an organic sponge was used to sweep the roughened surface after the activation treatment. A printed wiring board was obtained in the same manner as in Example 1 except for the above.

比較例1 実施例1において、触媒を含まない接着剤を用い、その
他は実施例1と同様にしてプリント配線板を得た。
Comparative Example 1 A printed wiring board was obtained in the same manner as in Example 1 except that the catalyst-free adhesive was used.

比較例2 比較例1において、粗化の次にアルカリ水溶液処理、次
に活性化(触媒付与)を行った他は比較例1と同様にし
てプリント配線板を得た。
Comparative Example 2 A printed wiring board was obtained in the same manner as in Comparative Example 1 except that roughening was followed by alkaline aqueous solution treatment and then activation (catalyst application).

以上の実施例および比較例について、スルーホールめっ
きつき性、回路(接着剤表面)のめっきつき性、活性化
処理した触媒の転移の有無、すり傷部分のめっきつき性
および回路間の絶縁抵抗性を表に示す。
Regarding the above Examples and Comparative Examples, the through hole plating property, the circuit (adhesive surface) plating property, the presence or absence of transfer of the activated catalyst, the scratching part plating property, and the insulation resistance between circuits Is shown in the table.

(発明の効果) 以上説明したように本発明によって、触媒付与した後の
触媒の転移のない、めっき液投入前に回路部分にすり傷
ができてもめっき欠けや回路の断線のおこらない、また
回路間の絶縁抵抗の優れたプリント配線板を得ることが
できる。
(Effects of the Invention) As described above, according to the present invention, there is no transfer of the catalyst after the catalyst is applied, and even if the circuit portion is scratched before the plating solution is introduced, the plating chipping or the circuit disconnection does not occur. A printed wiring board having excellent insulation resistance between circuits can be obtained.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】A 無電解銅めっきの触媒を含む接着剤を
表面に塗布した絶縁基板にスルーホールをあける工程
と、 B 接着剤表面を化学粗化液で粗化する工程と、 C 無電解銅めっきの触媒溶液で活性化する工程と、 D 粗化で生じた接着剤表面の脆弱層を除去する工程
と、 E 回路形成部分以外にめっきレジストを形成する工程
と、 F 無電解銅めっきによってレジスト形成部分以外に回
路を形成する工程とを順に含むことを特徴とするプリン
ト配線板の製造法。
1. A step of forming a through hole in an insulating substrate coated with an adhesive containing a catalyst for electroless copper plating, a step of roughening the surface of the adhesive with a chemical roughening solution, and a C electroless By the step of activating with a copper plating catalyst solution, the step of removing the fragile layer on the adhesive surface caused by the D roughening, the step of forming a plating resist on a portion other than the E circuit forming portion, and the F electroless copper plating. A method of manufacturing a printed wiring board, which comprises sequentially forming a circuit other than a resist forming portion.
【請求項2】工程Dで脆弱層を100mg/m2以上除去す
る特許請求の範囲第1項記載のプリント配線板の製造
法。
2. The method for producing a printed wiring board according to claim 1, wherein 100 mg / m 2 or more of the brittle layer is removed in step D.
JP6610585A 1985-03-29 1985-03-29 Manufacturing method of printed wiring board Expired - Lifetime JPH0614591B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6610585A JPH0614591B2 (en) 1985-03-29 1985-03-29 Manufacturing method of printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6610585A JPH0614591B2 (en) 1985-03-29 1985-03-29 Manufacturing method of printed wiring board

Publications (2)

Publication Number Publication Date
JPS61225890A JPS61225890A (en) 1986-10-07
JPH0614591B2 true JPH0614591B2 (en) 1994-02-23

Family

ID=13306273

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6610585A Expired - Lifetime JPH0614591B2 (en) 1985-03-29 1985-03-29 Manufacturing method of printed wiring board

Country Status (1)

Country Link
JP (1) JPH0614591B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN120796955A (en) * 2025-08-27 2025-10-17 珠海市天翌电子科技有限公司 Chemical copper for printed circuit board and preparation method thereof

Also Published As

Publication number Publication date
JPS61225890A (en) 1986-10-07

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