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JPH06132502A - Solid-state image sensing device - Google Patents

Solid-state image sensing device

Info

Publication number
JPH06132502A
JPH06132502A JP27706692A JP27706692A JPH06132502A JP H06132502 A JPH06132502 A JP H06132502A JP 27706692 A JP27706692 A JP 27706692A JP 27706692 A JP27706692 A JP 27706692A JP H06132502 A JPH06132502 A JP H06132502A
Authority
JP
Japan
Prior art keywords
layer
incident light
photoelectric conversion
conversion element
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP27706692A
Other languages
Japanese (ja)
Inventor
Tomoo Okuya
智雄 奥谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP27706692A priority Critical patent/JPH06132502A/en
Publication of JPH06132502A publication Critical patent/JPH06132502A/en
Withdrawn legal-status Critical Current

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  • Optical Filters (AREA)
  • Solid State Image Pick-Up Elements (AREA)

Abstract

PURPOSE:To improve the sensitivity of a solid-state image sensing device having a microlens layer in a state where its diaphragm is open. CONSTITUTION:A photoelectric conversion element part 2 is prepared on the surface of a semiconductor substrate 1. On the part 2 a microlens layer 5 is formed with an intermediate layer 4 in between. A plate condensing layer 6 which is made of a material having a larger refractive index than that of the layers 4 and 5 is formed in the layer 4. Thus the incident angle range of diagonal incident light Lt to be collected will become wider and the decrease in sensitivity in a peripheral part be prevented while the diaphragm is open. Especially, by making the layer 6 to become like a convex lens in the central part of the part 2, the condensing range of vertical incident light is widen in the central part where there are much vertical incident light and the incident angle range to collect the diagonal incident light is also widen in the peripheral part where are relatively much diagonal incident light, so that high sensing effect can be obtained.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体基板上の光電素
子変換部の上にフィルター等の中間層を介してマイクロ
レンズ層を設けてなる固体撮像装置の改良に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an improvement of a solid-state image pickup device in which a microlens layer is provided on a photoelectric conversion portion on a semiconductor substrate via an intermediate layer such as a filter.

【0002】[0002]

【従来の技術】近年、半導体基板上に光電変換素子を形
成した固体撮像装置は、カメラ一体型VTRの小型化,
軽量化に対応して、光学サイズの縮小化が急速に進んで
いるが、その際、光電変換素子の上部にマイクロレンズ
層といわれる樹脂膜によるレンズを形成して、光電変換
素子の縮小化による集光率の低下を防止するようにして
いる。
2. Description of the Related Art In recent years, a solid-state image pickup device having a photoelectric conversion element formed on a semiconductor substrate has been reduced in size of a camera-integrated VTR,
In response to the weight reduction, the optical size has been rapidly reduced. At that time, a lens made of a resin film called a microlens layer is formed on the photoelectric conversion element to reduce the size of the photoelectric conversion element. It is designed to prevent a decrease in light collection rate.

【0003】以下、固体撮像装置の従来の構成につい
て、図4を参照しながら説明する。
The conventional structure of the solid-state image pickup device will be described below with reference to FIG.

【0004】図4は従来の一般的な固体撮像装置の受光
部の断面図である。同図において、1は半導体基板、2
は該半導体基板1の表面に設けられ、入射した光を信号
電荷に変換する光電変換素子部、3は遮光部、5はカメ
ラレンズを通して入射した光を光電変換素子部2に集光
するために光電変換素子部2の上部に設けられたマイク
ロレンズ層、4は上記光電変換素子部2−マイクロレン
ズ層5間に介設された中間層であって、該中間層層4は
上部にマイクロレンズ層5を形成するための平坦化膜
や、カラーの固体撮像装置の場合には、カラー化を行う
のに必要なカラーフィルター膜等から形成されるもので
ある。
FIG. 4 is a sectional view of a light receiving portion of a conventional general solid-state image pickup device. In the figure, 1 is a semiconductor substrate, 2
Is provided on the surface of the semiconductor substrate 1, and is a photoelectric conversion element section for converting incident light into signal charges, 3 is a light shielding section, and 5 is for converging light incident through the camera lens on the photoelectric conversion element section 2. The microlens layer 4 provided on the photoelectric conversion element portion 2 is an intermediate layer interposed between the photoelectric conversion element portion 2 and the microlens layer 5, and the intermediate layer layer 4 is provided with the microlens on the upper portion. In the case of a color solid-state imaging device, a flattening film for forming the layer 5, a color filter film necessary for colorization, and the like are formed.

【0005】[0005]

【発明が解決しようとする課題】ところで、上記マイク
ロレンズ層5と中間層層4の屈折率はともに1.5程度
であるため、マイクロレンズ層5からフィルター層4に
光が入射するときに屈折することはなく、光電変換素子
2に対し垂直に入射してきた光Ls、光電変換素子部2
に対し斜めに入射してきた光Ltのいずれも中間層4内
では直進する。なお、Aは垂直入射光Ls が有効に光電
変換素子部2に集光し得る範囲である。
By the way, since both the microlens layer 5 and the intermediate layer 4 have a refractive index of about 1.5, when the microlens layer 5 enters the filter layer 4, the light is refracted. The light Ls incident perpendicularly to the photoelectric conversion element 2 and the photoelectric conversion element portion 2
On the other hand, any of the light Lt that is obliquely incident goes straight in the intermediate layer 4. In addition, A is a range in which the vertically incident light Ls can be effectively condensed on the photoelectric conversion element unit 2.

【0006】しかしながら、上述のような従来の固体撮
像装置では、有効集光範囲Aの外方から垂直に入射する
光や、図4の斜め入射光Lt のようにある入射角以下で
入射する斜め入射光は、遮光部3にさえぎられ光電変換
素子部2に到達することができなかった。そして、絞り
を開いた状態では斜め入射光の割合が増大するが、この
ような斜め入射光の集光範囲が狭いために、集光率が低
下し、特に光電変換素子の周辺部では斜め入射光の入射
角が非常に低角度となるので、集光率の低下に起因する
固体撮像装置の感度の低下が大きな問題となっている。
However, in the conventional solid-state image pickup device as described above, the light which is vertically incident from the outside of the effective condensing range A or the oblique incident light Lt shown in FIG. The incident light was blocked by the light shielding portion 3 and could not reach the photoelectric conversion element portion 2. Then, the ratio of obliquely incident light increases when the diaphragm is opened, but the condensing ratio is reduced because the condensing range of such obliquely incident light is narrowed, and especially in the peripheral portion of the photoelectric conversion element, the obliquely incident light is obliquely incident. Since the incident angle of light is extremely low, the sensitivity of the solid-state imaging device is reduced due to the reduction of the light collection rate, which is a serious problem.

【0007】本発明は斯かる点に鑑みてなされたもので
あり、その目的は、光電変換素子部の上に中間層を介し
てマイクロレンズ層を設けた固体撮像装置において、中
間層の内部に高い屈折率を有する層を設けることによ
り、特に斜め入射光を有効に集光し得る範囲の拡大を図
ることにある。
The present invention has been made in view of the above points, and an object thereof is to provide a solid-state image pickup device in which a microlens layer is provided on a photoelectric conversion element portion via an intermediate layer, and the microlens layer is provided inside the intermediate layer. By providing the layer having a high refractive index, it is intended to expand the range in which obliquely incident light can be effectively condensed.

【0008】[0008]

【課題を解決するための手段】上記目的を達成するた
め、請求項1の発明の講じた手段は、図1に示すよう
に、半導体基板上に形成された光電変換素子部と、該光
電変換素子部の上にフィルター等の中間層を介して設け
られ、光電変換素子部に光を集めるためのマイクロレン
ズ層とを有する固体撮像装置を前提とする。
Means for Solving the Problems To achieve the above object, the means taken by the invention of claim 1 is, as shown in FIG. 1, a photoelectric conversion element portion formed on a semiconductor substrate, and the photoelectric conversion element portion. It is premised on a solid-state image pickup device having a microlens layer which is provided on the element section via an intermediate layer such as a filter and collects light in the photoelectric conversion element section.

【0009】そして、上記中間層の中に上記マイクロレ
ンズ層及び中間層より高い屈折率を有する材料からなる
板状の集光層を設ける構成としたものである。
Then, a plate-shaped light collecting layer made of a material having a higher refractive index than the microlens layer and the intermediate layer is provided in the intermediate layer.

【0010】請求項2の発明の講じた手段は、図2に示
すように、上記請求項1の発明において、集光層を、光
電変換素子部の中央付近では凸レンズ状に形成したもの
である。
As shown in FIG. 2, the means taken by the invention of claim 2 is the invention of claim 1 in which the light collecting layer is formed in the shape of a convex lens near the center of the photoelectric conversion element part. .

【0011】[0011]

【作用】以上の構成により、請求項1の発明では、垂直
入射光はマイクロレンズでやや内方に曲げられた後、屈
折率の高い集光層で光電変換素子部の外方にずれるの
で、その分垂直入射光の有効集光範囲がやや縮小され
る。一方、低角度で入射した斜め入射光は、集光層で遮
光部から光電変換素子部の側にずれるので、斜め入射光
を集光しうる入射角範囲が拡大する。
With the above structure, in the invention of claim 1, the vertically incident light is slightly inwardly bent by the microlens, and then is shifted to the outside of the photoelectric conversion element portion by the light-collecting layer having a high refractive index. The effective condensing range of the vertically incident light is slightly reduced accordingly. On the other hand, the obliquely incident light incident at a low angle shifts from the light shielding part to the photoelectric conversion element part side in the light collecting layer, so that the incident angle range in which the obliquely incident light can be condensed is expanded.

【0012】特に、絞りを開いた状態で光電変換素子の
周辺部では、斜め入射光の割合が増大するが、このよう
に集光可能な斜め入射光の入射角範囲が拡大すること
で、周辺部での集光率が増大し、問題となる周辺部での
感度が向上することになる。
Particularly, in the peripheral portion of the photoelectric conversion element with the diaphragm open, the proportion of obliquely incident light increases, but by expanding the incident angle range of obliquely incident light that can be condensed in this way, The light collection rate at the peripheral portion is increased, and the sensitivity at the peripheral portion, which is a problem, is improved.

【0013】請求項2の発明では、光電素子部の中央部
では、垂直入射光が凸レンズ状の集光層によって光電変
換素子部の内方に曲げられ、垂直入射光の集光範囲が拡
大する一方、集光可能な斜め入射光の入射角範囲はそれ
ほど変化しない。
According to the second aspect of the present invention, in the central portion of the photoelectric element portion, the vertically incident light is bent inwardly of the photoelectric conversion element portion by the light-condensing layer having the convex lens shape, and the light condensing range of the vertically incident light is expanded. On the other hand, the incident angle range of the obliquely incident light that can be condensed does not change so much.

【0014】また、光電変換素子部の周辺付近では、板
状の集光層により上記請求項1の発明と同様の作用によ
って集光可能な斜め入射光の入射角範囲が拡大する。
Further, in the vicinity of the periphery of the photoelectric conversion element portion, the incident angle range of obliquely incident light that can be condensed by the plate-like condensing layer is expanded by the same operation as that of the above-mentioned invention.

【0015】したがって、垂直入射光の割合が多い中央
部と斜め入射角の割合が多い周辺部のいずれにおいて
も、感度が向上することになる。
Therefore, the sensitivity is improved in both the central portion where the proportion of vertically incident light is large and the peripheral portion where the proportion of oblique incident angle is large.

【0016】[0016]

【実施例】以下、本発明の実施例について、図面を参照
しながら説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0017】まず、第1実施例について、図1に基づき
説明する。図1は第1実施例に係る固体撮像装置の構成
を示し、上記図4の従来例と同一部分には同一番号を付
して説明を省略する。そして、本発明の特徴として、マ
イクロレンズ層5と光電変換素子2とにはさまれた中間
層層4の中には、マイクロレンズ層5や中間層4より高
い屈折率を有する材料からなる板状の集光層6が形成さ
れている。
First, the first embodiment will be described with reference to FIG. FIG. 1 shows the configuration of the solid-state imaging device according to the first embodiment. The same parts as those in the conventional example of FIG. As a feature of the present invention, a plate made of a material having a higher refractive index than the microlens layer 5 or the intermediate layer 4 is included in the intermediate layer 4 sandwiched between the microlens layer 5 and the photoelectric conversion element 2. The light-collecting layer 6 having a shape of a circle is formed.

【0018】ここで、固体撮像装置のマイクロレンズ層
5に垂直に入射する垂直入射光Lsは、マイクロレンズ
層5でやや内方につまり光電変換素子部2の内方に向か
うように曲げられる。そして、中間層層4内に入って集
光層6に到達すると、集光層6は中間層4を構成する材
料よりも屈折率の高い材料で形成されているので、集光
層6の上面と中間層4との境界で、入射角よりも小さな
屈折角で曲げられ、さらに、集光層6の下面と中間層4
との境界で、再び入射角度に平行になるよう曲げられ
る。その結果、垂直入射角Lsは、集光層6によって光
電変換素子部2のやや外方にずれるので、垂直入射光L
sの集光範囲Aはやや縮小される。
Here, the vertically incident light Ls vertically incident on the microlens layer 5 of the solid-state image pickup device is bent toward the inside of the microlens layer 5, that is, toward the inside of the photoelectric conversion element portion 2. Then, when the light enters the intermediate layer 4 and reaches the light collecting layer 6, the light collecting layer 6 is formed of a material having a higher refractive index than the material forming the intermediate layer 4, so that the upper surface of the light collecting layer 6 is formed. At the boundary between the intermediate layer 4 and the intermediate layer 4, and is bent at a refraction angle smaller than the incident angle.
At the boundary between and, it is bent again to be parallel to the incident angle. As a result, the vertical incident angle Ls is shifted slightly outward of the photoelectric conversion element section 2 by the light-collecting layer 6, so that the vertical incident light L
The condensing range A of s is slightly reduced.

【0019】一方、斜め入射光Ltは、マイクロレンズ
層5の端部側から光電変換素子部2の反対側の端部近く
に到達する経路のものつまり低角度で入射したものが光
電変換素子部2に入射するが、この斜め入射光Ltが光
電変換素子部2の側にずれるので、集光される斜め入射
光Ltの入射角の範囲が拡大する。
On the other hand, the obliquely incident light Lt has a path from the end of the microlens layer 5 to the vicinity of the end on the opposite side of the photoelectric conversion element 2, that is, the light incident at a low angle. Although it is incident on 2, the oblique incident light Lt shifts to the photoelectric conversion element section 2 side, so that the range of the incident angle of the oblique incident light Lt to be condensed is expanded.

【0020】したがって、上述のごとく、絞りを開いた
状態で増大する斜め入射光Ltに対し、その集光範囲が
拡大することで、特に問題となっている絞りを開いた状
態での周辺部における感度の低下を有効に防止すること
ができるのである。
Therefore, as described above, the condensing range of the obliquely incident light Lt that increases in the state where the diaphragm is opened is expanded, which causes a problem particularly in the peripheral portion when the diaphragm is opened. It is possible to effectively prevent a decrease in sensitivity.

【0021】次に、請求項2の発明について、図2及び
図3に基づき説明する。図2は第2実施例に係る固体撮
像装置の全体構造を示し、固体撮像装置の基本的な構成
は上記図1に示す第1実施例と同様であるが、本実施例
では、集光部6は光電変換素子部2の中央では凸レンズ
状集光層6aに形成され、中央に隣接する部位では中央
よりも曲率半径の大きい凸レンズ状集光層6bに、周辺
部では板状集光層6cとなっている。
Next, the invention of claim 2 will be described with reference to FIGS. FIG. 2 shows the overall structure of the solid-state imaging device according to the second embodiment. The basic structure of the solid-state imaging device is the same as that of the first embodiment shown in FIG. 6 is formed on the convex lens-shaped light-collecting layer 6a at the center of the photoelectric conversion element portion 2, the convex lens-shaped light-collecting layer 6b having a larger radius of curvature than the center at the portion adjacent to the center, and the plate-shaped light-collecting layer 6c at the peripheral portion. Has become.

【0022】図3は、上記図2の光電変換素子部2の中
央付近を拡大詳示するものであって、この場合、斜め入
射光Ltの集光される入射角の範囲はそれほど変化しな
いが、垂直入射光Lsの集光範囲Aは凸レンズ状集光層
6aによる絞り効果によって著しく拡大する。一方、周
辺部の板状集光層6cが設けられた部分では、第1実施
例における効果と同様に斜め入射光Ltの集光可能な入
射角の範囲が拡大する。
FIG. 3 is an enlarged detailed view of the vicinity of the center of the photoelectric conversion element portion 2 shown in FIG. 2. In this case, the range of the incident angle at which the oblique incident light Lt is condensed does not change so much. The condensing range A of the vertically incident light Ls is significantly expanded by the diaphragm effect of the convex lens-shaped condensing layer 6a. On the other hand, in the peripheral portion where the plate-shaped light collecting layer 6c is provided, the range of the incident angle at which the obliquely incident light Lt can be collected is expanded similarly to the effect of the first embodiment.

【0023】したがって、垂直入射光の割合が大きい光
電変換素子部2の中央部では凸レンズ状集光層6aによ
り垂直入射光Lsの集光範囲Aが拡大され、斜め入射光
Ltの割合が大きい光電変換素子部2の周辺部では板状
集光層6cにより集光可能な斜め入射光Ltの入射角範
囲が拡大され、上記第1実施例に比べ、さらに固体撮像
装置の感度が向上することになる。
Therefore, in the central portion of the photoelectric conversion element portion 2 in which the proportion of vertically incident light is large, the convex lens-like condensing layer 6a expands the condensing range A of the vertically incident light Ls, and the photoelectric ratio in which the proportion of obliquely incident light Lt is large. In the peripheral portion of the conversion element unit 2, the incident angle range of the oblique incident light Lt that can be condensed by the plate-shaped condensing layer 6c is expanded, and the sensitivity of the solid-state imaging device is further improved as compared with the first embodiment. Become.

【0024】[0024]

【発明の効果】以上説明したように、請求項1の発明に
よれば、光電変換素子部の上に中間層を介してマイクロ
レンズ層を設けた固体撮像装置として、中間層の中にマ
イクロレンズ層及び中間層より高い屈折率を有する板状
の集光層を設ける構成としたので、斜め入射光の割合が
大きい絞りを開いた状態における感度の向上を図ること
ができる。
As described above, according to the invention of claim 1, as a solid-state image pickup device in which the microlens layer is provided on the photoelectric conversion element portion via the intermediate layer, the microlens is provided in the intermediate layer. Since the plate-shaped light condensing layer having a higher refractive index than the layers and the intermediate layer is provided, it is possible to improve the sensitivity in a state where the diaphragm having a large proportion of obliquely incident light is opened.

【0025】請求項2の発明によれば、上記請求項1の
発明において、光電変換素子部の中央部では集光層を凸
レンズ状としたので、垂直入射光の割合が大きい光電変
換素子部の中央部では凸レンズ状集光層によって垂直入
射光の集光範囲を拡大し、斜め入射光の割合が大きい光
電変換素子部の周辺部では斜め入射光の集光可能な入射
角の範囲を拡大することができ、よって、感度の向上に
ついての著効を発揮することができる。
According to the invention of claim 2, in the invention of claim 1, the condensing layer is formed in a convex lens shape in the central portion of the photoelectric conversion element portion, so that the photoelectric conversion element portion in which the proportion of vertically incident light is high is large. The convex lens-shaped light condensing layer expands the condensing range of vertically incident light in the central part, and expands the incident angle range where oblique incident light can be condensed in the peripheral part of the photoelectric conversion element part where the ratio of oblique incident light is large. Therefore, it is possible to exert a remarkable effect in improving the sensitivity.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1実施例に係る固体撮像装置の部分
断面図である。
FIG. 1 is a partial cross-sectional view of a solid-state imaging device according to a first embodiment of the present invention.

【図2】第2実施例に係る固体撮像装置の全体構造を示
す断面図である。
FIG. 2 is a sectional view showing the overall structure of a solid-state imaging device according to a second example.

【図3】第2実施例に係る固体撮像装置の中央付近の構
造を示す部分断面図である。
FIG. 3 is a partial cross-sectional view showing the structure near the center of the solid-state imaging device according to the second example.

【図4】従来の一般的な固体撮像装置の部分断面図であ
る。
FIG. 4 is a partial cross-sectional view of a conventional general solid-state imaging device.

【符号の説明】[Explanation of symbols]

1 半導体基板 2 光電変換素子部 3 遮光部 4 中間層 5 マイクロレンズ層 6 集光層 1 semiconductor substrate 2 photoelectric conversion element part 3 light shielding part 4 intermediate layer 5 microlens layer 6 light collecting layer

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 半導体基板上に形成された光電変換素子
部と、該光電変換素子部の上にフィルター等の中間層を
介して設けられ、光電変換素子部に光を集めるためのマ
イクロレンズ層とを有する固体撮像装置において、 上記中間層の中に上記マイクロレンズ層及び中間層より
高い屈折率を有する材料からなる板状の集光層を備えた
ことを特徴とする固体撮像装置。
1. A photoelectric conversion element portion formed on a semiconductor substrate, and a microlens layer provided on the photoelectric conversion element portion with an intermediate layer such as a filter interposed therebetween to collect light in the photoelectric conversion element portion. A solid-state imaging device having: a plate-shaped light condensing layer made of a material having a higher refractive index than the microlens layer and the intermediate layer in the intermediate layer.
【請求項2】 請求項1記載の固体撮像装置において、 集光層は、光電変換素子部の中央付近では凸レンズ状に
形成されていることを特徴とする固体撮像装置。
2. The solid-state imaging device according to claim 1, wherein the light-collecting layer is formed in a convex lens shape in the vicinity of the center of the photoelectric conversion element portion.
JP27706692A 1992-10-15 1992-10-15 Solid-state image sensing device Withdrawn JPH06132502A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27706692A JPH06132502A (en) 1992-10-15 1992-10-15 Solid-state image sensing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27706692A JPH06132502A (en) 1992-10-15 1992-10-15 Solid-state image sensing device

Publications (1)

Publication Number Publication Date
JPH06132502A true JPH06132502A (en) 1994-05-13

Family

ID=17578315

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27706692A Withdrawn JPH06132502A (en) 1992-10-15 1992-10-15 Solid-state image sensing device

Country Status (1)

Country Link
JP (1) JPH06132502A (en)

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JP2006049721A (en) * 2004-08-06 2006-02-16 Matsushita Electric Ind Co Ltd Solid-state imaging device and manufacturing method thereof
JP2006108580A (en) * 2004-10-08 2006-04-20 Matsushita Electric Ind Co Ltd Solid-state imaging device and manufacturing method thereof
JP2007189021A (en) * 2006-01-12 2007-07-26 Fujifilm Corp Solid-state imaging device and manufacturing method of solid-state imaging device
JP2009004533A (en) * 2007-06-21 2009-01-08 Toshiba Corp Array type light receiving element and condensing method
JP2015135936A (en) * 2013-12-18 2015-07-27 ソニー株式会社 Solid-state imaging device, manufacturing method thereof, and electronic apparatus

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006049721A (en) * 2004-08-06 2006-02-16 Matsushita Electric Ind Co Ltd Solid-state imaging device and manufacturing method thereof
US7847852B2 (en) 2004-08-06 2010-12-07 Panasonic Corporation Solid-state imaging device and manufacturing method of solid-state imaging device
JP2006108580A (en) * 2004-10-08 2006-04-20 Matsushita Electric Ind Co Ltd Solid-state imaging device and manufacturing method thereof
US8134110B2 (en) 2004-10-08 2012-03-13 Panasonic Corporation Solid-state imaging device and solid-state imaging device manufacturing method
JP2007189021A (en) * 2006-01-12 2007-07-26 Fujifilm Corp Solid-state imaging device and manufacturing method of solid-state imaging device
JP2009004533A (en) * 2007-06-21 2009-01-08 Toshiba Corp Array type light receiving element and condensing method
JP2015135936A (en) * 2013-12-18 2015-07-27 ソニー株式会社 Solid-state imaging device, manufacturing method thereof, and electronic apparatus

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