JPH06132001A - Sheet mesh, and sample and its formation for transmission electron microscope - Google Patents
Sheet mesh, and sample and its formation for transmission electron microscopeInfo
- Publication number
- JPH06132001A JPH06132001A JP5141704A JP14170493A JPH06132001A JP H06132001 A JPH06132001 A JP H06132001A JP 5141704 A JP5141704 A JP 5141704A JP 14170493 A JP14170493 A JP 14170493A JP H06132001 A JPH06132001 A JP H06132001A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- opening
- electron microscope
- sheet mesh
- transmission electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
(57)【要約】
【目的】 試料に照射されるイオンビームを均一にし、
広範囲の研磨を可能にするシートメッシュを提供する。
【構成】 円板形状のシートメッシュ11の中央の開口
部11aエッジにテーパ部11bを形成し、イオンビー
ムBがエッジにあたらないようにすることにより、広範
囲な試料面が研磨でき、しかもビーム乱流の発生を防止
して均一な研磨を可能にする。
(57) [Summary] [Purpose] Make the ion beam irradiated on the sample uniform,
Provide a sheet mesh capable of polishing a wide range. [Structure] By forming a tapered portion 11b at the edge of the central opening 11a of the disk-shaped sheet mesh 11 so that the ion beam B does not hit the edge, a wide range of sample surfaces can be polished and the beam disturbance can be improved. Prevents flow from occurring and enables uniform polishing.
Description
【0001】[0001]
【産業上の利用分野】この発明は、透過型電子顕微鏡
(TEM:Transmission Electro
n Microscope)に用いられる試料を支持す
るシートメッシュ及び試料の作製方法に関する。BACKGROUND OF THE INVENTION The present invention relates to a transmission electron microscope (TEM).
The present invention relates to a sheet mesh for supporting a sample used in a Microscope) and a method for preparing the sample.
【0002】[0002]
【従来の技術】従来より半導体素子の微細構造の評価手
段として、透過型電子顕微鏡による素子の断面方向から
の観察が行なわれている。この透過型電子顕微鏡で観察
する試料は、例えば、2枚の半導体基板1,1を図14
(A)に示すように積層膜2どうしを向い合わせて接着
剤3で貼り合わせ、薄板aを切出す。次に、図14
(B)に示すように、薄板aを接着剤5で研磨用回転体
4に接着して研磨粉6を用いて回転研磨して厚みを20
μm程度まで薄くし、両面を鏡面に仕上げる。次いで、
このようにして薄く加工された薄板aを、図14(C)
に示すように、中央に孔7aが開設された金属性の厚さ
数10μm単孔メッシュ(シートメッシュ)7に該孔7
aを覆うように載せて固定し、図14(D)に示すよう
回転支持体8に装着し、真空中で高圧放電により生じた
Ar+イオンを加速して照射角9〜20゜で薄板aにイ
オンビームBを照射し、薄板aの中央に小さな穴があい
た時点でイオン照射を止める。このようにして、透過型
電子顕微鏡の試料が作製できる。2. Description of the Related Art Conventionally, as a means for evaluating the fine structure of a semiconductor device, observation with a transmission electron microscope from the cross-sectional direction of the device has been performed. The sample observed with this transmission electron microscope is, for example, two semiconductor substrates 1 and 1 shown in FIG.
As shown in (A), the laminated films 2 are faced to each other and bonded with an adhesive 3, and a thin plate a is cut out. Next, FIG.
As shown in (B), the thin plate a is adhered to the polishing rotator 4 with the adhesive 5 and is rotationally polished with the polishing powder 6 to have a thickness of 20.
Thin to about μm and mirror-finish both sides. Then
The thin plate a thus thinly processed is shown in FIG.
As shown in FIG. 3, the hole 7a is formed in the central part of the metallic single hole mesh (sheet mesh) having a thickness of several 10 μm.
14a is fixed so as to cover a and mounted on the rotary support 8 as shown in FIG. 14D, and Ar + ions generated by high-voltage discharge in a vacuum are accelerated to accelerate the thin plate a at an irradiation angle of 9 to 20 °. The ion beam B is irradiated onto the thin plate a, and the ion irradiation is stopped when there is a small hole in the center of the thin plate a. In this way, a transmission electron microscope sample can be prepared.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、このよ
うな従来の透過型電子顕微鏡用試料の作製方法による
と、図15に示すように、斜め方向から入射するAr+
イオンビームBが単孔メッシュ7の開口部のエッジ部に
衝突して孔7aに面する薄板(試料)aの下面周辺は図
16に示すように、あまり研磨されず、また、エッジ部
の近くで発生する乱流によって研磨むらや表面荒れが生
じ良好に研磨されない問題があった。However, according to such a conventional method for producing a sample for a transmission electron microscope, as shown in FIG. 15, Ar + incident from an oblique direction is used.
As shown in FIG. 16, the periphery of the lower surface of the thin plate (sample) a facing the hole 7a when the ion beam B collides with the edge of the opening of the single-hole mesh 7 is not much polished and is close to the edge. There is a problem that uneven polishing and surface roughness occur due to the turbulent flow generated in 1., and the polishing is not performed properly.
【0004】また、このような従来の透過型電子顕微鏡
用試料の作製方法によると、研磨しようとする試料の積
層膜2の材質によっては、接着剤3が効かず、その後の
研磨工程に進めないという問題があった。接着不可能な
材質としては、例えばAlがあげられる。Further, according to such a conventional method for producing a sample for a transmission electron microscope, the adhesive 3 does not work depending on the material of the laminated film 2 of the sample to be polished, and the subsequent polishing step cannot proceed. There was a problem. Examples of the non-adhesive material include Al.
【0005】さらに、このような従来の透過型電子顕微
鏡用試料の作製方法によると、観察対象部分である積層
膜2が孔7aの中央にくるように薄板aを配置すること
が困難で、おおむね図17に示すように積層膜2が孔7
aの中央からずれて固定され、観察対象部分である積層
膜2部分が図17(B)に示すように良好に研磨されな
い問題があった。Further, according to such a conventional method for producing a sample for a transmission electron microscope, it is difficult to arrange the thin plate a so that the laminated film 2 which is an observation target portion is located at the center of the hole 7a, and it is generally. As shown in FIG. 17, the laminated film 2 has holes 7
There is a problem in that the laminated film 2 portion, which is the portion to be observed and is fixed while being displaced from the center of a, is not polished well as shown in FIG. 17 (B).
【0006】この発明が解決しようとする課題は、イオ
ンビームが試料の広範囲に亘って均一に照射されるシー
トメッシュ及び透過型電子顕微鏡用試料の作製方法を得
るにはどのような手段を講じればよいかという点にあ
る。また、試料の接着を確実にするにはどのような手段
を用いればよいかという点にある。さらに、シートメッ
シュの中央に積層膜(被観察膜)を厳密に配置するに
は、どのような手段を講じればよいかという点にある。The problem to be solved by the present invention is, what kind of means should be taken to obtain a method for preparing a sheet mesh and a transmission electron microscope sample in which an ion beam is uniformly irradiated over a wide range of the sample. There is a point. Moreover, what kind of means should be used to ensure the adhesion of the sample? Furthermore, what kind of means should be taken to strictly arrange the laminated film (observed film) at the center of the sheet mesh.
【0007】[0007]
【課題を解決するための手段】請求項1記載の発明は、
中央に開口部を有し、該開口部を覆うように透過型電子
顕微鏡用試料を載置した状態で該試料を支持するシート
メッシュにおいて、前記開口部のエッジ部をテーパ状に
形成したことを、その解決手段としている。The invention according to claim 1 is
In a sheet mesh having an opening in the center and supporting the sample for a transmission electron microscope so as to cover the opening, the edge portion of the opening is formed in a tapered shape. , As a solution.
【0008】請求項2記載の発明は、前記エッジ部のテ
ーパを試料研磨用エネルギー線の照射角と同じ角度にし
たことを特徴としている。The invention according to claim 2 is characterized in that the taper of the edge portion is set to the same angle as the irradiation angle of the sample polishing energy beam.
【0009】請求項3記載の発明は、中央に開口部を有
し、該開口部を覆うように透過型電子顕微鏡用試料を載
置した状態で該試料を支持するシートメッシュにおい
て、前記試料を支持する領域に凹部を形成し、該凹部に
前記試料を嵌め込むことを特徴としている。According to a third aspect of the present invention, there is provided a sheet mesh which has an opening in the center and supports the sample in a state where the sample for a transmission electron microscope is placed so as to cover the opening. It is characterized in that a concave portion is formed in the supporting region and the sample is fitted into the concave portion.
【0010】請求項4記載の発明は、中央に開口部を有
し、該開口部のエッジ部をテーパ状に形成したシートメ
ッシュに試料を支持し、エネルギー線により該試料を研
磨することを、解決手段としている。According to the fourth aspect of the invention, the sample is supported on a sheet mesh having an opening at the center and the edge of the opening is formed in a tapered shape, and the sample is polished with an energy beam. It is a solution.
【0011】請求項5記載の発明は、前記エッジ部のテ
ーパを前記エネルギー線の照射角と同じ角度にしたシー
トメッシュを用いることを特徴としている。According to a fifth aspect of the invention, a sheet mesh is used in which the taper of the edge portion is the same as the irradiation angle of the energy rays.
【0012】請求項6記載の発明は、中央に開口部を有
し、且つ試料を支持する領域に凹部を形成したシートメ
ッシュの該凹部に前記試料を嵌め込み、エネルギー線に
より該試料を研磨することを、解決手段としている。According to a sixth aspect of the present invention, the sample is fitted into the recess of a sheet mesh having an opening in the center and a recess is formed in a region for supporting the sample, and the sample is polished with energy rays. Is the solution.
【0013】請求項7記載の発明は、少なくとも一方の
基板の表面に積層膜を成膜した基板どうしを、該積層膜
を挟むように接着して試料を作製し、該試料の切断及び
研磨を行って透過型電子顕微鏡用試料を作製する方法に
おいて、前記積層膜上に該積層膜及び接着剤に対して密
着性の高い密着層を形成した後に、該密着層の表面に該
接着剤を付着させて接着を行うことを、解決手段として
いる。According to a seventh aspect of the present invention, a substrate having a laminated film formed on the surface of at least one of the substrates is adhered so as to sandwich the laminated film to prepare a sample, and the sample is cut and polished. In the method for producing a sample for a transmission electron microscope by performing the method, after forming an adhesive layer having high adhesiveness to the laminated film and the adhesive on the laminated film, the adhesive is attached to the surface of the adhesive layer. The solution is to perform the adhesion.
【0014】請求項8記載の発明は、接着剤層を挟む密
着層を有し、該密着層の外側には積層膜を有し、該積層
膜の外側には基板を有することを、解決手段としてい
る。The invention according to claim 8 has an adhesive layer sandwiching an adhesive layer, a laminated film is provided outside the adhesive layer, and a substrate is provided outside the laminated film. I am trying.
【0015】請求項9記載の発明は、中央に開口部を有
し、該開口部を覆うように透過型電子顕微鏡用試料を載
置した状態で該試料を支持するシートメッシュにおい
て、前記開口部に対する前記透過型電子顕微鏡用試料の
位置決め手段を設けたことを、解決手段としている。According to a ninth aspect of the present invention, in a sheet mesh having an opening in the center and supporting the sample for a transmission electron microscope placed on the opening so as to cover the opening, the opening is provided. The solution means is to provide a means for positioning the sample for the transmission electron microscope with respect to.
【0016】請求項10記載の発明は、前記位置決め手
段は、前記開口部の周辺に形成した、中心に向かう線で
あることを、特徴としている。According to a tenth aspect of the present invention, the positioning means is a line extending toward the center, which is formed around the opening.
【0017】請求項11記載の発明は、前記位決め手段
は、前記透過型電子顕微鏡用試料を嵌め込む凹部である
ことを特徴としている。The invention according to claim 11 is characterized in that the positioning means is a concave portion into which the transmission electron microscope sample is fitted.
【0018】請求項12記載の発明は、中央に開口部を
有し、該開口部の周辺に中心に向かう線が形成されたシ
ートメッシュに、透過型電子顕微鏡用試料を支持し、該
試料をエネルギー線により研磨することを、解決手段と
している。According to a twelfth aspect of the present invention, a transmission electron microscope sample is supported on a sheet mesh having an opening at the center and a line directed toward the center is formed around the opening, and the sample is attached to the sheet mesh. Polishing with energy rays is the solution.
【0019】請求項13記載の発明は、中央に開口部を
有し、且つ位置決め用の凹部を有するシートメッシュの
該凹部に透過型電子顕微鏡用試料を嵌め込んで支持し、
該試料をエネルギー線により研磨することを、解決手段
としている。According to a thirteenth aspect of the present invention, a transmission electron microscope sample is fitted and supported in the recess of a sheet mesh having an opening in the center and a recess for positioning.
Polishing the sample with energy rays is the solution.
【0020】[0020]
【作用】この出願の請求項1〜6記載の発明において
は、シートメッシュの開口部のエッジ部をテーパ状とし
たことにより、開口部に面する試料面へ試料研磨用エネ
ルギー線を均一に照射させることが可能となる。特に、
エッジ部のテーパをエネルギー線の照射角と同じ角度と
することにより、試料面に開口部エッジの影がなくな
り、良好な研磨が可能となる。また、中央に開口部を有
するシートメッシュに凹部を形成し、この凹部に試料を
嵌め込むことにより、シートメッシュの凹部を形成しな
い側の表面と試料面との段差が小さくなり、試料研磨用
のエネルギー線が広範囲な試料面に照射される、エネル
ギー線の乱流の発生を抑制されて良好な研磨が行なえ
る。In the invention according to claims 1 to 6 of this application, the edge portion of the opening of the sheet mesh is tapered so that the sample surface facing the opening is uniformly irradiated with the energy beam for sample polishing. It becomes possible. In particular,
By setting the taper of the edge portion to the same angle as the irradiation angle of the energy ray, the shadow of the edge of the opening is eliminated on the sample surface, and good polishing can be performed. Further, by forming a concave portion in the sheet mesh having an opening in the center and fitting the sample into the concave portion, the step between the surface of the sheet mesh on the side where the concave portion is not formed and the sample surface becomes small, so that the sample polishing Irradiation of the energy beam onto a wide range of the sample surface suppresses the generation of turbulent flow of the energy beam, and good polishing can be performed.
【0021】また、この出願の請求項7及び8記載の発
明においては、密着層を用いて接着することで、積層膜
が成膜された基板どうしを一体化し、試料の切断及び研
磨を可能にする作用を奏する。特に積層膜がAl等の接
着剤が効かない材料膜である場合に有効となる。Further, in the inventions according to claims 7 and 8 of this application, the substrates on which the laminated films are formed are integrated by adhering with each other by using the adhesion layer, and it is possible to cut and polish the sample. Play an action. This is particularly effective when the laminated film is a material film such as Al that does not work with an adhesive.
【0022】さらに、この出願の請求項9〜13記載の
発明においては、シートメッシュの開口部の周辺に形成
された、中心に向かう線、または位置決め用の凹部によ
って、透過型電子顕微鏡用試料を厳密に配置することが
可能となる。このため、透過型電子顕微鏡による観察を
良好に行うことができる。Further, in the inventions according to claims 9 to 13 of this application, the sample for a transmission electron microscope is provided by a line directed toward the center or a positioning recess formed around the opening of the sheet mesh. It becomes possible to arrange strictly. Therefore, the observation with the transmission electron microscope can be favorably performed.
【0023】[0023]
【実施例】以下、本発明に係るシートメッシュ及び透過
型電子顕微鏡用試料及びその作製方法の詳細を図面に示
す実施例に基づいて説明する。The details of a sheet mesh, a transmission electron microscope sample and a method for producing the same according to the present invention will be described below with reference to the examples shown in the drawings.
【0024】(実施例1)図1は、本実施例のシートメ
ッシュ(単孔メッシュ)11及びこれに載置・固定され
た試料Aの断面図である。シートメッシュ11は、中央
に開口部11aが形成された円板形状であり、試料Aを
一側表面に載置・固定することにより、シートメッシュ
11の開口部11aを覆うようになっている。そして、
シートメッシュ11の他側表面側の開口部11aのエッ
ジ部には、テーパ部11bを周回して形成している。こ
のテーパ部11bのテーパ角度は、図2に示すように、
試料研磨用エネルギー線であるアルゴン(Ar)のイオ
ンビームBの照射角度と同一となるように形成してい
る。なお、試料Aは、図14(A),(B)に示す従来
方法で作成すればよい。(Embodiment 1) FIG. 1 is a sectional view of a sheet mesh (single hole mesh) 11 of this embodiment and a sample A placed and fixed on the sheet mesh 11. The sheet mesh 11 has a disk shape with an opening 11a formed in the center, and the sample A is placed and fixed on one surface to cover the opening 11a of the sheet mesh 11. And
A tapered portion 11b is formed around the edge portion of the opening 11a on the other surface side of the sheet mesh 11. As shown in FIG. 2, the taper angle of the taper portion 11b is as follows.
The irradiation angle of the ion beam B of argon (Ar), which is an energy ray for polishing the sample, is the same. The sample A may be prepared by the conventional method shown in FIGS.
【0025】斯るシートメッシュ11を用いて試料Aの
研磨を行なう場合は、図14(D)に示すような回転支
持体8にシートメッシュ11を取付け、イオンビーム照
射手段からイオンビームBを照射し且つ回転支持体8を
回転させる。When the sample A is polished by using the sheet mesh 11, the sheet mesh 11 is attached to the rotary support 8 as shown in FIG. 14 (D) and the ion beam B is irradiated from the ion beam irradiation means. And the rotary support 8 is rotated.
【0026】本実施例においては、図2に示すように、
イオンビームBが開口部11aのエッジ部に衝突せずに
試料面の広範囲に照射できるため、試料Aの良好な研磨
が可能となる。また、本実施例においては、イオンビー
ムが開口部11aのエッジにあたらないため、ビームの
流れが均一となると共に、シートメッシュ11自身が試
料近傍で研磨されないため、試料Aがシートメッシュ材
料で汚染されにくくなる利点がある。In this embodiment, as shown in FIG.
Since the ion beam B can be applied to a wide area of the sample surface without colliding with the edge of the opening 11a, the sample A can be polished well. Further, in this embodiment, since the ion beam does not hit the edge of the opening 11a, the beam flow is uniform and the sheet mesh 11 itself is not polished in the vicinity of the sample, so that the sample A is contaminated with the sheet mesh material. There is an advantage that it is hard to be done.
【0027】図3〜図7は、実施例の変形例を示す断面
図である。図3に示すシートメッシュ11開口部11a
の内周面を全面的にテーパ部11bとしたものであり、
そのテーパ角度は、上記実施例と同様にイオンビームB
の照射角と同一にしている。このため、イオンビームB
の影が全くできず、より均一な研磨が可能となる。ま
た、図4に示すシートメッシュ11は、シートメッシュ
11下面全体をテーパ部11bとしたものであり、より
低角度のイオンビーム照射を行なう場合に適している。
さらに、図5に示すシートメッシュ11は、図3に示す
シートメッシュ11のテーパ部11bを内側に湾曲する
アール面11cとしたものであり、図6に示すシートメ
ッシュ11は、外側に湾曲するアール面11dを有する
例である。また、図7に示すシートメッシュ11は、上
面に試料Aを嵌め込む凹部11eが形成され、下面には
テーパ部11bが形成されたものであり、試料Aの支持
が良好となると共に、低照射角のイオンビームにも対応
できる構成となっている。3 to 7 are sectional views showing modified examples of the embodiment. Sheet mesh 11 opening 11a shown in FIG.
The inner peripheral surface of is entirely tapered 11b,
The taper angle of the ion beam B is the same as in the above embodiment.
The irradiation angle is the same. Therefore, the ion beam B
No shadow is formed at all, and more uniform polishing becomes possible. The sheet mesh 11 shown in FIG. 4 has a tapered portion 11b on the entire lower surface of the sheet mesh 11, and is suitable for performing ion beam irradiation at a lower angle.
Further, in the sheet mesh 11 shown in FIG. 5, the tapered portion 11b of the sheet mesh 11 shown in FIG. 3 is used as the curved surface 11c that curves inward, and the sheet mesh 11 shown in FIG. This is an example having a surface 11d. Further, the sheet mesh 11 shown in FIG. 7 has a concave portion 11e for fitting the sample A formed on the upper surface thereof and a tapered portion 11b formed on the lower surface thereof. It has a structure that can be used for angular ion beams.
【0028】以上、本実施例について説明したが、本発
明は、これらに限定されるものではなく、構成の要旨に
付随する各種の設計変更が可能である。Although the present embodiment has been described above, the present invention is not limited to these, and various design changes associated with the gist of the configuration can be made.
【0029】(実施例2)図8及び図9は、実施例2の
断面図を示している。本実施例は、図14に示す接着剤
3が効かず、接着不可能な積層膜2について効果がある
ものである。(Second Embodiment) FIGS. 8 and 9 are sectional views of the second embodiment. In this embodiment, the adhesive 3 shown in FIG. 14 is ineffective, and the laminated film 2 which cannot be adhered is effective.
【0030】図8は、透過型電子顕微鏡の観察目的部分
であるAlで成る積層膜2の上に、密着層としてのSi
N膜14をコートした状態の断面図である。半導体基板
1上に積層膜2が成膜された状態までは、通常の半導体
デバイスの製造プロセス下で作製される。積層膜2の膜
圧は実際の半導体デバイスの設計膜厚でよい。そして、
積層膜2の上側にはSiN膜14がコートされている。
SiN膜14は通常の半導体デバイス製造プロセスで行
っている、CVD装置を用いたSiN膜(パッシベーシ
ョン膜)コーティングプロセスにより、500nm程度
コートする。FIG. 8 shows that Si as an adhesion layer is formed on the laminated film 2 made of Al, which is an observation target portion of the transmission electron microscope.
It is a cross-sectional view of a state in which the N film 14 is coated. Up to the state where the laminated film 2 is formed on the semiconductor substrate 1, it is manufactured under a normal semiconductor device manufacturing process. The film pressure of the laminated film 2 may be the actual designed film thickness of the semiconductor device. And
A SiN film 14 is coated on the upper side of the laminated film 2.
The SiN film 14 is coated to a thickness of about 500 nm by a SiN film (passivation film) coating process using a CVD apparatus, which is performed in a normal semiconductor device manufacturing process.
【0031】このようにすると、図9に示すように、エ
ポキシ系接着剤3はSiN膜14に対しては接着効果が
あるため、透過型電子顕微鏡用試料作製の一工程である
試料接着が可能となる。よって、本実施例に示す手法を
用いれば、従来不可能だった、接着剤で接着不可能な積
層膜の透過型電子顕微鏡用試料の作製が可能となる。By doing so, as shown in FIG. 9, since the epoxy adhesive 3 has an adhesive effect on the SiN film 14, sample adhesion, which is one step of preparing a sample for a transmission electron microscope, is possible. Becomes Therefore, by using the method shown in this example, it is possible to prepare a transmission electron microscope sample of a laminated film that cannot be adhered with an adhesive, which has been impossible in the past.
【0032】なお、本実施例は、積層膜2がAlで成る
場合について説明したが、他の材料で成る場合にも適用
が可能である。また、密着層もSiNに限定されるもの
ではない。さらに、接着剤もエポキシ系以外のものを用
いることが可能である。また、上記実施例は、接着する
双方の基板に積層膜が形成された例であるが、一方のみ
の基板に積層膜が形成されている場合でも本発明を適用
することが可能である。Although the present embodiment has been described for the case where the laminated film 2 is made of Al, it can be applied to the case where the laminated film 2 is made of another material. Also, the adhesion layer is not limited to SiN. Furthermore, it is possible to use an adhesive other than an epoxy adhesive. Further, although the above-mentioned embodiment is an example in which the laminated film is formed on both substrates to be adhered, the present invention can be applied even when the laminated film is formed on only one substrate.
【0033】(実施例3)図10は、本実施例のシート
メッシュ(単孔メッシュ)12の平面図、図11は該シ
ートメッシュ12に試料Aを載置・固定した状態の平面
図である。シートメッシュ12は、中央に開口部12a
が形成された円盤形状であり、試料Aを一側表面に載置
・固定することにより、シートメッシュ12の開口部1
2aを覆うようになっている。そして開口部12aの周
辺部には、開口部12aの中心に向かう線12bをけが
いている。図11に示すように、試料Aの積層膜2部分
を線12bに合わせて載置・固定することにより、積層
膜2部分がシートメッシュ12の開口部12a中央に厳
密に配置されている。なお、試料Aは、図14(A),
(B)に示す従来方法で作製すればよい。(Embodiment 3) FIG. 10 is a plan view of a sheet mesh (single hole mesh) 12 of this embodiment, and FIG. 11 is a plan view of a state in which a sample A is placed and fixed on the sheet mesh 12. . The sheet mesh 12 has an opening 12a at the center.
Is formed into a disc shape, and by mounting and fixing the sample A on one surface, the opening 1 of the sheet mesh 12 is formed.
It is designed to cover 2a. A line 12b extending toward the center of the opening 12a is marked on the periphery of the opening 12a. As shown in FIG. 11, by placing and fixing the laminated film 2 portion of the sample A in line with the line 12b, the laminated film 2 portion is strictly arranged in the center of the opening 12a of the sheet mesh 12. The sample A is shown in FIG.
It may be manufactured by the conventional method shown in FIG.
【0034】斯るシートメッシュ12を用いて試料Aの
研磨を行う場合は、図14(D)に示すような回転支持
体8にシートメッシュ12を取り付け、イオンビーム照
射手段からイオンビームBを照射し且つ回転支持体8を
回転させる。When the sample A is polished by using the sheet mesh 12, the sheet mesh 12 is attached to the rotary support 8 as shown in FIG. 14D, and the ion beam B is irradiated from the ion beam irradiation means. And the rotary support 8 is rotated.
【0035】ところで、従来の技術で示した、本発明を
実施する際に用いる一連の透過型電子顕微鏡用試料の作
製法では、完成試料Aは、中央付近が最も薄く研磨さ
れ、周辺に近づくにしたがって厚みを増す形状の試料と
なる。従って、観察対象の積層膜2を開口部12aの中
央に配置したときに、積層膜2部分が広範囲にわたって
薄く均一に研磨された、最も良好な試料が得られる。本
実施例においては、図12に示すように、観察対象部分
である積層膜2を開口部12aの中央に厳密に配置する
ことが従来と比較して容易になり、またそのように配置
することで最も良好な透過型電子顕微鏡用試料が得られ
るという利点がある。By the way, in the method of manufacturing a series of transmission electron microscope samples used for carrying out the present invention as shown in the prior art, the finished sample A is polished thinnest in the vicinity of the center and approaches the periphery. Therefore, the sample has a shape with an increased thickness. Therefore, when the laminated film 2 to be observed is arranged in the center of the opening 12a, the best sample in which the laminated film 2 portion is thinly and uniformly polished over a wide range can be obtained. In this embodiment, as shown in FIG. 12, it is easier to strictly arrange the laminated film 2 which is the observation target portion in the center of the opening 12a as compared with the prior art, and such arrangement is required. The advantage is that the best sample for transmission electron microscope can be obtained.
【0036】図13は、本実施例の変形例である。図1
3に示すシートメッシュ13は、一側面に試料Aを位置
決めする凹部13bを形成したもので、試料Aの積層膜
2部分をシートメッシュの開口部中央に配置することが
さらに容易且つ正確となる。FIG. 13 shows a modification of this embodiment. Figure 1
The sheet mesh 13 shown in 3 has a concave portion 13b for positioning the sample A formed on one side surface, and it becomes easier and more accurate to dispose the laminated film 2 portion of the sample A at the center of the opening of the sheet mesh.
【0037】以上、実施例1〜3について説明したが、
本発明はこれらに限定されるものではなく、各種の設計
変更が可能である。Although the first to third embodiments have been described above,
The present invention is not limited to these, and various design changes are possible.
【0038】[0038]
【発明の効果】以上の説明から明らかなように、この出
願の請求項1〜6記載の発明によれば、イオンビームの
流れが均一になると共に、イオンビームが試料の広範囲
にあたるため、良好な試料の研磨が行なえる効果があ
る。また、エネルギー線によりシートメッシュ自身が研
磨されにくくなり、シートメッシュ材料による試料汚染
の発生を抑える効果がある。As is clear from the above description, according to the inventions described in claims 1 to 6 of this application, the flow of the ion beam becomes uniform and the ion beam hits a wide range of the sample, which is favorable. There is an effect that the sample can be polished. Moreover, the sheet mesh itself is less likely to be abraded by the energy rays, which has the effect of suppressing the occurrence of sample contamination by the sheet mesh material.
【0039】また、この出願の請求項7及び8記載の発
明によれば、従来試料作製が不可能だった、接着剤で接
着不可能な積層膜の透過型電子顕微鏡用試料の作製を可
能にする効果を奏する。Further, according to the inventions of claims 7 and 8 of this application, it becomes possible to prepare a sample for a transmission electron microscope of a laminated film which cannot be adhered with an adhesive, which was impossible in the past. Produces the effect of
【0040】さらに、この出願の請求項9〜13記載の
発明によれば、観察対象部分である積層幕がシートメッ
シュの中央に厳密に配置し易くなるため、観察対象部分
の広範囲を薄く均一に研磨することが可能となる効果が
ある。Further, according to the inventions of claims 9 to 13 of the present application, since the laminated curtain as the observation target portion can be easily arranged exactly in the center of the sheet mesh, the observation target portion can be made thin and uniform over a wide range. There is an effect that it becomes possible to polish.
【図1】本発明の実施例1の断面図。FIG. 1 is a sectional view of a first embodiment of the present invention.
【図2】本発明の実施例1の断面図。FIG. 2 is a sectional view of the first embodiment of the present invention.
【図3】実施例1の変形例を示す断面図。FIG. 3 is a sectional view showing a modified example of the first embodiment.
【図4】実施例1の変形例を示す断面図。FIG. 4 is a cross-sectional view showing a modified example of the first embodiment.
【図5】実施例1の変形例を示す断面図。FIG. 5 is a cross-sectional view showing a modified example of the first embodiment.
【図6】実施例1の変形例を示す断面図。FIG. 6 is a cross-sectional view showing a modified example of the first embodiment.
【図7】実施例1の変形例を示す断面図。FIG. 7 is a cross-sectional view showing a modified example of the first embodiment.
【図8】実施例2を示す断面図。FIG. 8 is a cross-sectional view showing a second embodiment.
【図9】実施例2を示す断面図。FIG. 9 is a cross-sectional view showing a second embodiment.
【図10】実施例3を示す平面図。FIG. 10 is a plan view showing a third embodiment.
【図11】実施例3を示す平面図。FIG. 11 is a plan view showing a third embodiment.
【図12】実施例3を示す断面図。FIG. 12 is a cross-sectional view showing a third embodiment.
【図13】実施例3の変形例を示す斜視図。FIG. 13 is a perspective view showing a modified example of the third embodiment.
【図14】(A)〜(D)は従来の試料の研磨方法の工
程を示す説明図。14A to 14D are explanatory views showing steps of a conventional method for polishing a sample.
【図15】従来のビームの状態を示す説明図。FIG. 15 is an explanatory diagram showing a conventional beam state.
【図16】従来例の断面説明図。FIG. 16 is a cross-sectional explanatory view of a conventional example.
【図17】(A)及び(B)は従来例の断面図17A and 17B are cross-sectional views of a conventional example.
A…試料 B…イオンビーム 1…半導体基板 2…積層膜 3…接着剤 11…シートメッシュ 11a…開口部 11b…テーパ部 11e…凹部 12…シートメッシュ 12a…開口部 12b…線 13…シートメッシュ 13a…開口部 13b…凹部 A ... Sample B ... Ion beam 1 ... Semiconductor substrate 2 ... Laminated film 3 ... Adhesive 11 ... Sheet mesh 11a ... Opening 11b ... Taper 11e ... Recess 12 ... Sheet mesh 12a ... Opening 12b ... Line 13 ... Sheet mesh 13a ... Opening 13b ... Concave
Claims (13)
うに透過型電子顕微鏡用試料を載置した状態で該試料を
支持するシートメッシュにおいて、 前記開口部のエッジ部をテーパ状に形成したことを特徴
とするシートメッシュ。1. A sheet mesh having an opening in the center and supporting a sample for a transmission electron microscope so as to cover the opening, wherein the edge of the opening is tapered. A sheet mesh characterized by being formed into.
ルギー線の照射角と同じ角度にした請求項1記載のシー
トメッシュ。2. The sheet mesh according to claim 1, wherein the taper of the edge portion is the same as the irradiation angle of the sample polishing energy ray.
うに透過型電子顕微鏡用試料を載置した状態で該試料を
支持するシートメッシュにおいて、 前記試料を支持する領域に凹部を形成し、該凹部に前記
試料を嵌め込むことを特徴とするシートメッシュ。3. A sheet mesh having an opening in the center and supporting a sample for a transmission electron microscope so as to cover the opening, wherein a recess is provided in a region supporting the sample. A sheet mesh, which is formed and the sample is fitted into the recess.
部をテーパ状に形成したシートメッシュに試料を支持
し、エネルギー線により該試料を研磨することを特徴と
する透過型電子顕微鏡用試料の作製方法。4. A transmission electron microscope, comprising: a sheet mesh having an opening at the center, the edge of the opening being tapered; and supporting the sample, and polishing the sample with energy rays. For preparing sample for use.
線の照射角と同じ角度にしたシートメッシュを用いる請
求項4記載の透過型電子顕微鏡用試料の作製方法。5. The method for producing a sample for a transmission electron microscope according to claim 4, wherein a sheet mesh in which the taper of the edge portion is the same as the irradiation angle of the energy beam is used.
る領域に凹部を形成したシートメッシュの該凹部に前記
試料を嵌め込み、エネルギー線により該試料を研磨する
ことを特徴とする透過型電子顕微鏡用試料の作製方法。6. A transmission type, characterized in that the sample is fitted into the recess of a sheet mesh having an opening at the center and a recess is formed in a region for supporting the sample, and the sample is polished with energy rays. Method for preparing sample for electron microscope.
を成膜し、基板どうしを、該積層膜を挟むように接着し
て試料を作製し、該試料の切断及び研磨を行って透過型
電子顕微鏡用試料を作製する方法において、 前記積層膜上に該積層膜及び接着剤に対して密着性の高
い密着層を形成した後に、該密着層の表面に該接着剤を
付着させて接着を行うことを特徴とする透過型電子顕微
鏡用試料の作製方法。7. A transmissive type in which a laminated film is formed on the surface of at least one of the substrates, the substrates are adhered to each other so as to sandwich the laminated film to prepare a sample, and the sample is cut and polished. In the method for producing a sample for an electron microscope, after forming an adhesive layer having high adhesiveness to the laminated film and the adhesive on the laminated film, the adhesive is adhered to the surface of the adhesive layer for adhesion. A method for producing a sample for a transmission electron microscope, which is characterized by being performed.
の外側には積層膜を有し、該積層膜の外側には基板を有
することを特徴とする透過型電子顕微鏡用試料。8. A sample for a transmission electron microscope, comprising an adhesive layer sandwiching an adhesive layer, a laminated film outside the adhesive layer, and a substrate outside the laminated film. .
うに透過型電子顕微鏡用試料を載置した状態で該試料を
支持するシートメッシュにおいて、 前記開口部に対する前記透過型電子顕微鏡用試料の位置
決め手段を設けたことを特徴とするシートメッシュ。9. A sheet mesh having an opening in the center and supporting the sample for a transmission electron microscope in a state that the sample is placed so as to cover the opening, wherein the transmission electron microscope with respect to the opening is provided. A sheet mesh, characterized in that it is provided with means for positioning a sample for use.
辺に形成した、中心に向かう線である請求項9記載のシ
ートメッシュ。10. The sheet mesh according to claim 9, wherein the positioning means is a line formed toward the center and formed around the opening.
微鏡用試料を嵌め込む凹部である請求項9記載のシート
メッシュ。11. The sheet mesh according to claim 9, wherein the positioning means is a recess into which the transmission electron microscope sample is fitted.
に中心に向かう線が形成されたシートメッシュに、透過
型電子顕微鏡用試料を支持し、該試料をエネルギー線に
より研磨することを特徴とする透過型電子顕微鏡用試料
の作製方法。12. A transmission electron microscope sample is supported on a sheet mesh having an opening at the center and a line directed toward the center is formed around the opening, and the sample is polished with energy rays. A method for producing a sample for a transmission electron microscope, which comprises:
の凹部を有するシートメッシュの該凹部に透過型電子顕
微鏡用試料を嵌め込んで支持し、該試料をエネルギー線
により研磨することを特徴とする透過型電子顕微鏡用試
料の作製方法。13. A transmission electron microscope sample is fitted and supported in the recess of a sheet mesh having an opening in the center and a recess for positioning, and the sample is polished with energy rays. And a method for preparing a sample for a transmission electron microscope.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5141704A JPH06132001A (en) | 1992-09-03 | 1993-06-14 | Sheet mesh, and sample and its formation for transmission electron microscope |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23502692 | 1992-09-03 | ||
| JP4-235026 | 1992-09-13 | ||
| JP5141704A JPH06132001A (en) | 1992-09-03 | 1993-06-14 | Sheet mesh, and sample and its formation for transmission electron microscope |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06132001A true JPH06132001A (en) | 1994-05-13 |
Family
ID=26473893
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5141704A Pending JPH06132001A (en) | 1992-09-03 | 1993-06-14 | Sheet mesh, and sample and its formation for transmission electron microscope |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06132001A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005010158A (en) * | 2003-06-20 | 2005-01-13 | Fei Co | Sample carrier for carrying sample to be irradiated with electron beam |
| WO2012136583A1 (en) * | 2011-04-08 | 2012-10-11 | Valeo Systemes D'essuyage | Apparatus for treating two opposed surfaces by ion bombardment |
| JP2019164119A (en) * | 2018-03-14 | 2019-09-26 | 住友金属鉱山株式会社 | Transmission electron microscope observation sample and manufacturing method thereof |
| JP2020193969A (en) * | 2019-05-24 | 2020-12-03 | 住友金属鉱山株式会社 | Method for preparing sample for transmission electron microscope observation |
| CN117727711A (en) * | 2024-02-07 | 2024-03-19 | 厦门超新芯科技有限公司 | High-inclination-angle in-situ heating chip |
-
1993
- 1993-06-14 JP JP5141704A patent/JPH06132001A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005010158A (en) * | 2003-06-20 | 2005-01-13 | Fei Co | Sample carrier for carrying sample to be irradiated with electron beam |
| WO2012136583A1 (en) * | 2011-04-08 | 2012-10-11 | Valeo Systemes D'essuyage | Apparatus for treating two opposed surfaces by ion bombardment |
| FR2973811A1 (en) * | 2011-04-08 | 2012-10-12 | Valeo Systemes Dessuyage | INSTALLATION FOR THE IONIC BOMBING TREATMENT OF TWO OPPOSED SURFACES |
| JP2019164119A (en) * | 2018-03-14 | 2019-09-26 | 住友金属鉱山株式会社 | Transmission electron microscope observation sample and manufacturing method thereof |
| JP2020193969A (en) * | 2019-05-24 | 2020-12-03 | 住友金属鉱山株式会社 | Method for preparing sample for transmission electron microscope observation |
| CN117727711A (en) * | 2024-02-07 | 2024-03-19 | 厦门超新芯科技有限公司 | High-inclination-angle in-situ heating chip |
| CN117727711B (en) * | 2024-02-07 | 2024-05-10 | 厦门超新芯科技有限公司 | High-inclination-angle in-situ heating chip |
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