JPH0613920B2 - Liquefied gas quantitative injection device - Google Patents

Description

The present invention relates to an apparatus for injecting a liquefied gas in a liquid state, and more particularly to injecting a liquefied gas into a container filled with non-foaming beverages or general foods in an open state, and then sealing the container. Accordingly, the present invention relates to a device suitable for quantitatively injecting a liquefied gas when manufacturing a liquefied gas sealed container and preventing moisture in the atmosphere from icing inside and outside the device.

Conventionally, as a liquefied gas quantitative injection device, JP-A-56-109996
As disclosed in Japanese Patent Laid-Open No. 58-137698 and Japanese Patent Laid-Open No. 58-137698, liquefied gas is retained in an insulated liquefied gas retention chamber, and the liquefied gas is stored in an outside container by an injection nozzle equipped with an on-off valve device. Some are injected quantitatively. In this apparatus, the amount of staying is changed by continuously injecting the liquefied gas, and the pressure of the vaporized gas on the liquid surface of the liquefied gas in the staying chamber is changed so that the amount injected from the injecting nozzle is constant. Since it becomes difficult to quantitatively inject a small amount without doing so, the liquefied gas supply control device controlled by the liquid level position detector and the pressure in the stagnation chamber are kept constant as a means for keeping the liquid level position of the liquefied gas in the stagnation chamber constant. And a pressure regulator for maintaining the pressure.

In this way, when the pressure of the vaporized gas in the retention chamber is kept constant, the variation in the injection amount caused by the fluctuation of the pressure can be eliminated, but even if the variation of the pressure is suppressed as much as possible, the liquefied gas is Due to the pressurized state, when the liquefied gas is ejected from the injection nozzle, it flows in as a mist, and there is a possibility that the amount of liquefied gas that is vaporized and remains in the container will vary during the time until the sealing. . Further, when the vaporized gas pressure in the retention chamber is high, the injection output of the liquefied gas ejected from the injection nozzle also becomes large, so that it tends to collide with the contents of the container that receives it and scatter, and as a result, remain in the container. The amount of liquefied gas may vary. In order to avoid this, it is necessary to take measures such as changing the ejection angle of the injection nozzle.

Furthermore, since the liquefied gas is at a low temperature, a temperature difference of, for example, 100 to 150 ° C. occurs between the environment temperature around the filling machine and the injection nozzle,
Moisture in the air around the nozzle freezes and grows on the nozzle,
The operation of the nozzle became sluggish, and it was necessary to stop the operation frequently to remove ice. Also, when the operation of the device is stopped and the operation is restarted from the state where there is no liquefied gas inside, the moisture in the air that has entered the inside is frozen by the newly supplied liquefied gas, which causes a problem. It was necessary to disassemble the device and heat dry.

The present invention has been studied in order to eliminate such a conventional inconvenience, and as a result, a small amount of liquefied gas is reliably and continuously injected by maintaining the liquefied gas in the liquefied gas retention chamber at the atmospheric pressure above the liquid surface. A first aspect of the present invention provides a liquefied gas quantitative injection device capable of preventing the inconvenience caused by freezing of moisture in the air. The first invention provides a liquefied gas retention chamber that is insulated and a liquefied gas inside the chamber. An injection nozzle equipped with an on-off valve device for connection, a position detector for the liquid surface of the liquefied gas in the chamber, a position below the surface of the liquefied gas in the chamber and a position below the surface of the liquefied gas in the liquefied gas reservoir are connected. Liquefied gas supply pipe, a liquefied gas flow relaxation device provided at the inlet of the supply pipe to the retention chamber, and the liquefied gas in the liquefied gas reservoir into the retention chamber by the detection signal of the position detector Liquid of liquefied gas in the chamber In a liquefied gas quantitative injection device comprising a liquefied gas supply control device for holding the height of the injection nozzle at a predetermined position, the space surrounding the injection nozzle and the outer diameter of the injection nozzle facing the injection nozzle and concentric with the space. A nozzle cover having an open air opening is provided in the lower part of the injector, and the space above the liquid surface of the liquefied gas retention chamber is communicated with the space inside the nozzle cover by a vaporized gas discharge pipe line. The space is kept at atmospheric pressure.

A second aspect of the present invention is an insulated liquefied gas retention chamber, an injection nozzle equipped with an opening / closing valve device connected to the liquefied gas in the chamber, a position detector for the liquid level of the liquefied gas in the chamber, and A liquefied gas supply line connecting a position below the surface of the liquefied gas and a position below the surface of the liquefied gas in the liquefied gas reservoir, and a liquefied gas flow relaxation device provided at the inlet of the supply line to the retention chamber ,
Liquefied gas supply controller for supplying the liquefied gas in the liquefied gas reservoir into the retention chamber in response to the detection signal of the position detector and holding the liquid level of the liquefied gas in the chamber at a predetermined position. In the quantitative injection device, a nozzle cover having a space surrounding the injection nozzle and an atmosphere opening port concentrically facing the injection nozzle and having a size larger than the outer diameter of the injection nozzle is provided in the lower portion of the injector, and the liquefaction is performed. The space above the liquid surface of the gas retention chamber is communicated with the space inside the nozzle cover by a vaporized gas discharge pipe line, the space of the liquefied gas retention chamber is maintained at atmospheric pressure, and the liquefied gas retention chamber and the liquefied gas supply It is characterized in that a drying gas supply device for supplying a vaporizing gas for drying is provided in the pipeline.

The following will describe the embodiment of the present invention in more detail with reference to FIGS. 1 to 3. FIG. 1 shows a schematic view of the apparatus for carrying out the invention. (1) is an injector for liquefied nitrogen gas (hereinafter referred to as “LN ₂ gas”) which is a liquefied inert gas, and (2) is LN.
A storage device for ₂ gas, (3) a supply control device for controlling the supply amount of LN ₂ gas from the storage device (2) to the injector (1), and (4) a drying gas supply device. The injector (1) is specifically provided with an LN ₂ gas retention chamber (5) as shown in FIGS. 2 and 3, and the retention chamber (5) is surrounded by a vacuum heat insulation chamber (6). The LN ₂ gas supply pipe (7) opened below the liquid level of the LN ₂ gas in the room is connected to the reservoir (2).

An injection nozzle (8) for letting out LN ₂ gas that accumulates at the bottom of the accumulation chamber (5) and an on-off valve device for opening and closing the nozzle (8)
(9) is provided. In addition, in order to reduce the flow of LN ₂ gas flowing into the retention chamber (5), as shown in FIG.
A flow easing device (12) having a through hole (11) (Fig. 2) facing the outlet (10) of the LN ₂ gas supply pipe (7) was provided.
The injection nozzle (8) was attached by a nozzle clamp (13) to make it replaceable. Further, the on-off valve device (9) detects a valve rod (14) penetrating the inside of the retention chamber (5) by a solenoid drive device (15) detected by a position detector (16) of the can body a shown in FIG. The control device (17) is driven by a signal.

The LN ₂ gas supply controller (3) is a retention chamber shown in FIG.
A liquid level detector (18) using a capacitance sensor or the like provided in (5) detects the height position of the LN ₂ gas liquid level and sends a detection signal to the liquid level using an indicator controller or computer. Transmitted to the control device (19), the pressurized N ₂ gas storage (20) to the vaporized nitrogen gas of the LN ₂ gas storage (2) (hereinafter referred to as “N ₂ gas”)
A pressurization N ₂ gas supply pipe to be connected to the region (21) via the feed of N ₂ gas feeds, LN ₂ gas reservoir (2) tubes LN ₂ gas LN ₂ gas pressurized in A pressurized N ₂ gas supply pipe (which operates so as to supply the liquid level of the LN ₂ gas in the retention chamber (5) to a predetermined position by supplying the same to the retention chamber (5) by a channel (7) twenty one)
It has a pressure adjusting valve (22) provided in, for example, using an electropneumatic conversion regulator or the like.

Although the above-mentioned structure is the same as the conventional device, in the device of the present invention, the lower surface of the retention chamber (5) is covered with the nozzle cover (23), and the nozzle cover faces the injection nozzle (8). A larger-diameter atmosphere opening port (23a) is provided, and the upper opening of the vaporized gas discharge pipe line (24) is connected to the LN ₂ gas liquid level of the retention chamber (5).
_{In addition} to facing the ₂ gas region, the lower opening of the pipe line (24) faces the inside of the nozzle cover (23) for communication, and the N ₂ gas in the retention chamber (5) is opened from the atmosphere opening port (23a). The N ₂ gas atmosphere in the retention chamber (5) is always kept open to the atmosphere so that the LN ₂ gas can flow out at a constant rate for quantitative filling, and the atmosphere opening port (23a) N ₂ flowing out from
The gas was used to shield the injection nozzle (8) from the outside air to prevent freezing of water in the air.

Since the N ₂ gas atmosphere in the retention chamber (5) is opened to the atmospheric pressure in this way, the jetting power of the LN ₂ gas from the injection nozzle (8) is reduced, so that the injection nozzle (8) has a sufficient opening time. The injection nozzle (8) was mounted vertically for feeding.

In addition, before starting the injection work, the empty retention chamber (5)
When supplying the LN ₂ gas residence chamber (5) via the LN ₂ gas supply circuit (7) in order to fill the LN ₂ gas, the residence chamber through the vaporized gas discharge line (24) (5) and which If moisture enters with the outside air into the LN ₂ gas supply pipe (7) or the like connected to the above, freezing may occur, which is a hindrance, so a drying gas supply device (4) for drying these is provided. Specifically, as shown in the first drawing, the pressurizing N ₂ gas supply line (21) and the LN ₂ gas supply line (7) are connected to each other by LN ₂
An N ₂ gas supply pipe line (25) for drying, which bypasses the gas reservoir (2) and is connected, is provided, and a heater (26) for heating and open / close valves (27) (28) (29) are provided in the pipe line (25). ) Is provided and each of the on-off valves (27), (28) and (29) is opened or closed as appropriate, so that the LN ₂ gas storage device
(2) or pressurization N ₂ gas reservoir (20) of the N ₂ gas feed was heated to about 80 ° C. with the heater (26) feeds, LN ₂ gas supply line
(7), the retention chamber (5) and the portion connected thereto were dried, and the air was replaced with N ₂ gas.

Further, the flow relaxation device (12) provided in the retention chamber (5) is LN ₂
LN ₂ gas inflow and injection nozzle from gas supply line (7)
Retention by injection of LN ₂ gas from (8) chamber (5) LN in ₂
A flow relaxation device (12) is provided as shown in FIGS. 2 and 3 so that the gas does not flow and the injection amount of the LN ₂ gas does not fluctuate. The device (12) includes an injection nozzle (8). Partition wall (30) surrounding the valve rod (14) and partition wall forming several chambers connected to the chamber (31) formed by this partition wall (30) by the opening (32) and the through hole (11) (33) (34) (35) (36).

With the above configuration, the injector (1)
Prior to introducing LN ₂ gas into the retention chamber (5) of
₂ Gas reservoir (2) or pressurization N ₂ gas reservoir (20) of N ₂
The gas is sent to the heating heater (26) interposed in the drying N ₂ gas supply pipe (25) of the drying gas supply device (4) for heating, and this is supplied to the LN ₂ gas supply pipe (7). It is caused to flow into the retention chamber (5) via the above to dry the retention chamber (5) and the portion connected thereto, and the internal air is expelled by N ₂ gas. Then pipeline (2
5) is closed and LN ₂ gas is flown into the retention chamber (5) from the pipe (7) and retained at a predetermined liquid surface position.

Thereafter, as in the case of the conventional device, as shown in the first drawing, the injection nozzle
(8) The can body a fed below is detected by the position detector (16), and the control device (17) actuates the on-off valve device (9) by the detection signal to generate a predetermined amount of LN ₂ gas. It is injected into the can a through the injection nozzle (8). Then, by continuously injecting LN ₂ gas into each continuously fed can body a, the retention chamber (5)
The liquid surface position of the LN ₂ gas inside is lowered, but this is detected by the liquid surface detector (18), and the liquid level control device is based on the detection signal.
By the pressure control valve (22) of (19), pressurizing N ₂ gas reservoir
The N ₂ gas of (20) is fed to the LN ₂ gas storage (2), and along with this, the retention chamber (5) is sent from the LN ₂ gas storage (2) via the LN ₂ gas supply pipe (7). LN ₂ gas is supplied to the
The liquid level of the LN ₂ gas in (5) is held in place. this
LN ₂ gas supply line to the retention chamber (5) when supplying LN ₂ gas
The LN ₂ gas flows from (7) and tries to flow the LN ₂ gas in the retention chamber (5), but this is prevented by the flow relaxation device (12).

On the other hand, in N ₂ gas pressure retention chamber (5) by injection nozzles (8) gives the variation but always discharged through the residence chamber with N ₂ gas vaporized gas discharge line (5) (24) , This keeps the atmosphere open. Therefore, the injection nozzle (8) has LN
Only the pressure by the _second drop is LN ₂ gas when jetted the LN ₂ gas from acting is dropped without a mist,
Even if it is dropped onto the contents in the can body a, it is securely stored without scattering. Then, since the liquid is dropped vertically from the injection nozzle (8), the timing of the injection into the can a can be easily set.

In addition, the air opening of the vaporized gas discharge canal (24) is connected to the injection nozzle (8).
Since it is exposed to the inside of the nozzle cover (23), the injection nozzle (8) is always surrounded by the N ₂ gas discharged from the atmosphere opening port (23a) and shielded from the outside air, so that the water content in the outside air is reduced. Are not contacted with each other, and freezing of the nozzle (8) is prevented.

In the above-described apparatus, the drying gas supply device (4) is LN
It was constructed by using the ₂ gas supply control device (3), but separately, LN
The object of the present invention is not hindered as long as the drying gas can be supplied to the _two- gas supply pipe (7), the retention chamber (5) and the portion connected to these.

As is clear from the above description, according to the first aspect of the present invention, the liquefied gas retention chamber is provided with the vaporized gas discharge pipe line for keeping the upper portion of the liquid surface of the liquefied gas at the atmospheric pressure. By this, even if the liquefied gas is continuously discharged to the outside of the room, it is possible to avoid pressure fluctuations in the room.
Since the liquefied gas supply pipe is provided below the liquid surface and the liquefied gas flow relaxation device is provided in the liquefied gas stagnant chamber, it is possible to suppress the flowing of the liquefied gas and fluctuation of the dynamic pressure. Since there is no variation in the amount of liquid injected from the chamber, and because the chamber is not pressurized, it is atomized when the liquefied gas is ejected from the injection nozzle, or is scattered by colliding with the contents of the can body to be injected. Since a small amount of a predetermined amount can be surely injected and the injection work is not hindered even when the injection nozzle is suspended, the timing of the injection work of the liquefied gas into the can body can be set. It becomes easy and is discharged from the atmosphere opening port through the liquefied gas discharge pipe line. There is an effect of obtaining a liquefied gas quantitative injection device capable of preventing the injection nozzle from freezing by blocking the injection nozzle from the outside air with N ₂ gas. Moreover, since there is no need to provide a mechanism for adjusting the pressure of the liquefied gas retention chamber or the amount of vaporized gas released from this, the structure is extremely simple and reliable operation, and vaporization that spontaneously evaporates in this liquefied gas retention chamber Since the gas is used as it is to prevent freezing of the nozzle, the structure is simple and
It has an advantage that gas can be effectively used. Further, according to the second invention, in the device of the first invention, a liquefied supply pipe line, a liquefied gas retention chamber, and a portion connected to the liquefied supply pipe line which are in an atmosphere open when newly filling the LN ₂ device. Since the drying gas supply device is connected to the liquefied gas supply device, it is possible to obtain the liquefied gas quantitative injection device which can prevent the inside of the device from being frozen due to invasion of water and can reliably perform the injection work of the liquefied gas.

[Brief description of drawings]

What is shown is an example of the implementation of the present invention.
FIG. 2 is a schematic diagram, FIG. 2 is a cross-sectional view of the injector of FIG. 1, and FIG.
The drawing is a sectional view taken along line III-III in FIG. (1) …… Injector, (2) …… Liquefied gas reservoir, (3) …… Liquefied gas supply device, (4) …… Drying gas supply device, (5) …… Liquefied gas retention chamber, ( 7) liquefied gas supply line, (8) …… injection nozzle, (9) …… open / close valve device, (12) …… liquefied gas flow relaxation device, (18) …… liquid level position detector, ( 23a) ... Air vent,
(24) …… Vacuum gas release line.

Claims (2)

[Claims] 1. An insulated liquefied gas retention chamber, an injection nozzle equipped with an on-off valve device connected to the liquefied gas in the chamber, a position detector for the liquid level of the liquefied gas in the chamber, and a liquefied gas in the chamber. A liquefied gas supply line connecting a position below the surface and a position below the surface of the liquefied gas in the liquefied gas reservoir, a liquefied gas flow relaxation device provided at the inlet of the supply line to the retention chamber, Liquefied gas supply control device for supplying the liquefied gas in the liquefied gas reservoir into the retention chamber in accordance with the detection signal of the position detector and maintaining the liquid level of the liquefied gas in the chamber at a predetermined position In the injection device, a nozzle cover having a space surrounding the injection nozzle and an atmosphere opening port concentric with the injection nozzle and having a diameter larger than the outer diameter of the injection nozzle is provided in the lower part of the injector, and the liquefied gas is provided. Emission of vaporized gas in the space above the liquid level in the retention chamber Communicates with the space inside the nozzle cover in line, the space of the liquefied gas residence chamber is characterized in that is held at atmospheric pressure liquefied gas metering injection device. 2. A heat-insulated liquefied gas retention chamber, an injection nozzle having an on-off valve device connected to the liquefied gas in the chamber, a position detector for the liquid level of the liquefied gas in the chamber, and a liquefied gas in the chamber. A liquefied gas supply line connecting a position below the surface and a position below the surface of the liquefied gas in the liquefied gas reservoir, a liquefied gas flow relaxation device provided at the inlet of the supply line to the retention chamber, Liquefied gas supply control device for supplying the liquefied gas in the liquefied gas reservoir into the retention chamber in accordance with the detection signal of the position detector and maintaining the liquid level of the liquefied gas in the chamber at a predetermined position In the injection device, a nozzle cover having a space surrounding the injection nozzle and an atmosphere opening port concentric with the injection nozzle and having a diameter larger than the outer diameter of the injection nozzle is provided in the lower part of the injector, and the liquefied gas is provided. Emission of vaporized gas in the space above the liquid level in the retention chamber A pipe for communicating with the space in the nozzle cover, maintaining the space of the liquefied gas retention chamber at atmospheric pressure, and supplying a vaporized gas for drying to the liquefied gas retention chamber and the liquefied gas supply pipe A liquefied gas quantitative injection device, characterized in that a gas supply device is provided.