JPH06129848A - Atomic force microscope and information processing apparatus using the same - Google Patents
Atomic force microscope and information processing apparatus using the sameInfo
- Publication number
- JPH06129848A JPH06129848A JP30626992A JP30626992A JPH06129848A JP H06129848 A JPH06129848 A JP H06129848A JP 30626992 A JP30626992 A JP 30626992A JP 30626992 A JP30626992 A JP 30626992A JP H06129848 A JPH06129848 A JP H06129848A
- Authority
- JP
- Japan
- Prior art keywords
- cantilever
- atomic force
- force microscope
- sample surface
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Length Measuring Devices With Unspecified Measuring Means (AREA)
Abstract
(57)【要約】
【目的】 大気中における水の表面張力の影響を抑えた
原子間力顕微鏡を提供する。
【構成】 試料表面との間に作用する力によって変位可
能な片持梁１２の試料表面へ接近する向きの変形を抑制
する構造部材１１を設けた原子間力顕微鏡。
【効果】 試料表面を覆う水の表面張力による片持梁１
２の急激な動きを制限でき、マイクロティップ１３を試
料表面に衝突させることなく接触させることが可能とな
り、試料の損傷が避けられる。
(57) [Summary] [Objective] To provide an atomic force microscope in which the influence of the surface tension of water in the atmosphere is suppressed. [Structure] An atomic force microscope provided with a structural member 11 that suppresses deformation of a cantilever 12 that is displaceable by a force acting between a cantilever 12 and a sample surface in a direction approaching the sample surface. [Effect] Cantilever 1 by surface tension of water covering the sample surface 1
The rapid movement of the sample 2 can be limited, and the microtip 13 can be brought into contact with the sample surface without colliding with the sample surface, and damage to the sample can be avoided.
Description
【０００１】[0001]
【産業上の利用分野】本発明は原子間力顕微鏡及びそれ
を用いて記録媒体に対して情報の記録再生等を行う情報
処理装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an atomic force microscope and an information processing apparatus for recording and reproducing information on a recording medium using the atomic force microscope.
【０００２】[0002]
【従来の技術】近年、導体の表面原子の電子構造を直接
観測できる走査型トンネル顕微鏡（以後、ＳＴＭと略
す）が開発され［Ｇ．Ｂｉｎｎｉｇ ｅｔ ａｌ．，Ｐ
ｈｙｓ．Ｒｅｖ．Ｌｅｔｔ．，４９，５７（１９８
２）］、単結晶、非晶質を問わず実空間像を高い分解能
で観察できるようになった。2. Description of the Related Art In recent years, a scanning tunneling microscope (hereinafter abbreviated as STM) has been developed which can directly observe the electronic structure of surface atoms of a conductor [G. Binnig et al. , P
hys. Rev. Lett. , 49, 57 (198
2)], it has become possible to observe a real space image with high resolution regardless of whether it is single crystal or amorphous.
【０００３】かかるＳＴＭは試料に電流による損傷を与
えずに低電力で観察を行なえる利点を有しており、更に
大気中で動作させることができ、種々の材料に対して用
いることができるため広範な応用が期待されている。最
近では導体表面に吸着した有機分子の分子像観察すら可
能であることが報告されている。Such an STM has an advantage that observation can be performed with low power without damaging a sample with an electric current, and further, it can be operated in the atmosphere and can be used for various materials. Wide application is expected. Recently, it has been reported that even a molecular image of organic molecules adsorbed on the surface of a conductor can be observed.
【０００４】一方、ＳＴＭの技術を応用した原子間力顕
微鏡（以後、ＡＦＭと略す）が開発され［Ｇ．Ｂｉｎｎ
ｉｇ ｅｔ ａｌ．，Ｐｈｙｓ．Ｒｅｖ．Ｌｅｔｔ．，
５６，９３０（１９８５）］、ＳＴＭ同様、表面の凹凸
情報を得ることができるようになった。かかるＡＦＭは
導電体に限らず、絶縁性の試料に対しても原子オーダー
での観察が可能である。On the other hand, an atomic force microscope (hereinafter abbreviated as AFM), which is an application of the STM technique, has been developed [G. Binn
ig et al. , Phys. Rev. Lett. ，
56, 930 (1985)] and STM, it has become possible to obtain surface irregularity information. Such an AFM is not limited to a conductor, and it is possible to observe an insulating sample in atomic order.
【０００５】ＡＦＭは一般に先端径の小さなマイクロテ
ィップを持つカンチレバーと、このカンチレバーの曲が
りを測定する変位測定部から構成される。一般にマイク
ロティップと物質表面との間において、比較的遠距離で
は分散力による微弱な引力が働き、近距離では斥力が働
く。カンチレバーの曲がりは作用する力に比例するの
で、この曲がりを測定することによってマイクロティッ
プ先端とこれに数ｎｍ以内に近接する試料表面との間に
働く微弱で局所的な力を検出することが可能となる。更
に試料を走査することで試料表面の力の２次元的情報が
得られる。また、カンチレバーの曲がりを一定にするよ
うにフィードバックをかけながら走査することにより、
試料表面の微小な凹凸形状を観察できる。The AFM generally comprises a cantilever having a microtip with a small tip diameter and a displacement measuring section for measuring the bending of the cantilever. Generally, between the microtip and the material surface, a weak attractive force due to the dispersive force works at a relatively long distance, and a repulsive force works at a short distance. Since the bending of the cantilever is proportional to the acting force, by measuring this bending, it is possible to detect the weak and local force acting between the tip of the microtip and the sample surface that is close to it within a few nm. Becomes Further, by scanning the sample, two-dimensional information of the force on the sample surface can be obtained. In addition, by scanning while applying feedback so that the bending of the cantilever is constant,
It is possible to observe minute irregularities on the sample surface.
【０００６】[0006]
【発明が解決しようとする課題】前記ＡＦＭの動作中、
マイクロティップと試料表面との間に働く力は通常１０
-8Ｎ程度で、この力を検出するためにカンチレバーのば
ね定数は１Ｎ／ｍ程度に選ばれる。さらに微弱な力を検
出する必要がある場合には、さらにばね定数の値の小さ
いものを選択する。例えば有機分子を観察する場合、か
かる力は１０-9〜１０-10 Ｎ程度に設定されるため、カ
ンチレバーのばね定数は０．１Ｎ／ｍ程度に選ばれる。During the operation of the AFM,
The force acting between the microtip and the sample surface is usually 10
At about -8 N, the spring constant of the cantilever is selected to be about 1 N / m in order to detect this force. If it is necessary to detect a weaker force, a smaller spring constant value is selected. For example, when observing organic molecules, the force is set to about 10 −9 to 10 −10 N, and therefore the spring constant of the cantilever is selected to be about 0.1 N / m.
【０００７】しかしながら、マイクロティップと試料表
面との間に実際に働く力は、前述した分散力による引力
ないし斥力ばかりではない。特に、大気中で観察を行な
う際には試料表面は水で覆われている可能性が高く、マ
イクロティップが試料表面に接近した時、水の表面張力
による強い引力が働くことが多い。この強い引力によっ
てカンチレバーは大きく曲がり、マイクロティップは急
激に試料表面に接触して大きな力を表面に作用させるこ
とになる。試料が有機分子のような場合には、この力に
よって試料が損傷し、観察が不可能になることが多かっ
た。この解決のためカンチレバーおよび試料を水中に入
れ、表面張力を相殺する方法が通常とられている。However, the force actually acting between the microtip and the sample surface is not limited to the attractive force or repulsive force due to the dispersion force described above. In particular, when observing in the air, the sample surface is likely to be covered with water, and when the microtip approaches the sample surface, a strong attractive force due to the surface tension of water often acts. Due to this strong attractive force, the cantilever bends greatly, and the microtip suddenly comes into contact with the sample surface and exerts a large force on the surface. When the sample is an organic molecule, this force often damages the sample and makes observation impossible. To solve this problem, a method of putting the cantilever and the sample in water to cancel the surface tension is usually adopted.
【０００８】しかし、ＡＦＭによる表面観察と局所的な
電気測定を同時に行なう場合など、水中で動作させる訳
にはゆかず、他の手段で表面張力の影響を除く必要があ
った。また、強い引力によるカンチレバーの曲がりは、
ばね定数の大きなカンチレバーの選択によって避けられ
るが、ＡＦＭ観察時のマイクロティップと試料表面との
間に働く力を小さく設定することが困難となり、有機分
子の観察などが困難になる場合が多かった。However, when the surface observation by the AFM and the local electrical measurement are simultaneously performed, it cannot be operated in water, and it is necessary to remove the influence of the surface tension by other means. Also, the bending of the cantilever due to strong attractive force,
This can be avoided by selecting a cantilever with a large spring constant, but it is difficult to set a small force acting between the microtip and the sample surface during AFM observation, and it is often difficult to observe organic molecules.
【０００９】本発明は上記問題点に鑑みてなされたもの
であり、本発明の目的は、大気中においても水の表面張
力の影響を抑えた原子間力顕微鏡、更には、この原子間
力顕微鏡を用いて各種記録媒体に対して情報の記録再生
等を行う情報処理装置を提供することにある。The present invention has been made in view of the above problems, and an object of the present invention is an atomic force microscope which suppresses the influence of the surface tension of water even in the atmosphere, and further, this atomic force microscope. An object of the present invention is to provide an information processing apparatus that records and reproduces information on various recording media by using the.
【００１０】[0010]
【課題を解決するための手段及び作用】本発明によれ
ば、カンチレバー（片持梁）等からなる弾性部材の試料
表面側への変位量を制限することにより、大気中におけ
る水の表面張力の影響を低減したものである。According to the present invention, the amount of surface tension of water in the atmosphere can be reduced by limiting the amount of displacement of the elastic member such as a cantilever (cantilever) toward the sample surface. The effect is reduced.
【００１１】即ち、本発明は、試料表面との間に作用す
る力によって変位可能な弾性部材を有する原子間力顕微
鏡において、上記弾性部材の試料表面へ接近する向きの
変形を抑制する構造部材を具備することを特徴とする原
子間力顕微鏡である。That is, according to the present invention, in an atomic force microscope having an elastic member which can be displaced by a force acting between the elastic member and a sample surface, a structural member for suppressing deformation of the elastic member in a direction approaching the sample surface is provided. It is an atomic force microscope characterized by being provided.
【００１２】以下、図面を用いて本発明を詳細に説明す
る。The present invention will be described in detail below with reference to the drawings.
【００１３】図１は、本発明の主要構成の一例を示した
ものである。FIG. 1 shows an example of the main configuration of the present invention.
【００１４】通常、ＡＦＭによる表面観察を行なう際、
マイクロティップ１３は試料表面との間で斥力が作用す
る状態におかれるため、支持体１４に支持された弾性部
材であるところの片持梁１２は力の働いていない状態
（図１（ｂ）参照）を基準に、試料表面から遠ざかる向
きに曲がる時（図１（ａ）参照）には、特に有機分子等
を観察する際には微小な力に対して敏感に応答する必要
がある。一方、試料表面に近づく向きに対しては、大気
中における水の表面張力による強い引力が作用する場
合、片持梁１２が敏感に応答すると、マイクロティップ
１３が試料表面に衝突し、試料を損傷させるため、片持
梁１２の変位を制限する方が好ましい。そこで、試料に
近づく時には構造部材１１によって片持梁１２の変位を
制限する（図１（ｃ）参照）。すなわち、構造部材１１
によって片持梁１２は試料表面に近づく向きに変形する
際、片持梁の長さがＬからＬ’に変化し、実効的にばね
定数が大きくなる。これによって表面張力による片持梁
１２の急激な動きを制限でき、マイクロティップ１３を
試料表面に衝突することなく接触させることが可能にな
り、試料の損傷が避けられ、同時に片持梁１２が試料表
面から遠ざかる向きに変形する時には片持梁１２自体の
ばね定数に戻るため（図１（ａ）参照）、片持梁１２の
ばね定数は表面張力の影響に制限されることなく所望の
値のものを選択できる。Usually, when observing the surface by AFM,
Since the microtip 13 is in a state where a repulsive force acts on the sample surface, the cantilever 12 which is an elastic member supported by the support 14 is in a state where no force is exerted (FIG. 1B). With reference to (1), when bending in a direction away from the sample surface (see FIG. 1A), it is necessary to respond sensitively to a minute force, particularly when observing organic molecules. On the other hand, when a strong attractive force due to the surface tension of water in the atmosphere acts on the direction approaching the sample surface, if the cantilever 12 responds sensitively, the microtip 13 collides with the sample surface and damages the sample. Therefore, it is preferable to limit the displacement of the cantilever 12. Therefore, when approaching the sample, the displacement of the cantilever 12 is limited by the structural member 11 (see FIG. 1C). That is, the structural member 11
As a result, when the cantilever 12 is deformed toward the sample surface, the length of the cantilever changes from L to L ', and the spring constant is effectively increased. As a result, the abrupt movement of the cantilever 12 due to surface tension can be restricted, the microtip 13 can be brought into contact with the sample surface without colliding, the damage of the sample can be avoided, and at the same time, the cantilever 12 can be used. The spring constant of the cantilever 12 returns to the spring constant of the cantilever 12 itself when deformed in the direction away from the surface (see FIG. 1 (a)). Therefore, the spring constant of the cantilever 12 is not limited by the influence of the surface tension and has a desired value. You can choose one.
【００１５】同様の効果は図２に示すように弾性体２１
を構造部材として設けることによっても達成される。す
なわち、試料に近づく時には弾性体２１と一体で変形す
ることによって片持梁１２のばね定数を実効的に大きく
できる（図２（ｃ）参照）。The same effect can be obtained as shown in FIG.
Can also be achieved by providing as a structural member. That is, when approaching the sample, the spring constant of the cantilever 12 can be effectively increased by deforming integrally with the elastic body 21 (see FIG. 2C).
【００１６】本発明において、弾性部材は上述のような
片持梁構造に限定されるものではなく、両持梁構造であ
ってもよい。In the present invention, the elastic member is not limited to the cantilever structure as described above, but may have a cantilever structure.
【００１７】また、弾性部材の試料表面へ接近する向き
の変形を抑制する構造部材としては、上述のように弾性
部材のばね定数を変化させるものが好ましく、この構造
部材も片持梁構造或いは両持梁構造とすることができ
る。As the structural member for suppressing the deformation of the elastic member in the direction approaching the sample surface, it is preferable to change the spring constant of the elastic member as described above, and this structural member also has a cantilever structure or both. It can have a cantilever structure.
【００１８】これらの弾性部材或いは構造部材の材料は
特に限定されるものではないが、例えばＳｉＯ2 ，Ｓｉ
3 Ｎ4 等を用いることができる。The material of these elastic members or structural members is not particularly limited, but for example, SiO 2 , Si
3 N 4 etc. can be used.
【００１９】また、本発明の原子間力顕微鏡を用いて、
マイクロティップを記録媒体表面に接近させ、該記録媒
体に対して情報の記録再生等を行う情報処理装置では、
動作時に記録媒体を損傷させることのない装置となる。Further, using the atomic force microscope of the present invention,
In the information processing device that brings the microtip closer to the surface of the recording medium and records and reproduces information on the recording medium,
The device does not damage the recording medium during operation.
【００２０】[0020]
【実施例】以下、本発明の実施例を説明する。EXAMPLES Examples of the present invention will be described below.
【００２１】実施例１ 本実施例では、図１に示したような構成を持つ原子間力
顕微鏡を作製した。 Example 1 In this example, an atomic force microscope having the structure shown in FIG. 1 was produced.
【００２２】図３はかかる構成の作製方法の一例を示す
ものであり、マイクロメカニクスにおいて良く知られた
犠牲層エッチングの方法を用いた。まず、後に支持体１
４となるところのシリコン基板３１の（１００）面上に
ＳｉＯ2 膜３２を形成し（図３（ａ）参照）、片持梁１
２の形状にパターニングする（図３（ｂ）参照）。片持
梁１２のばね定数はＳｉＯ2 膜３２の膜厚、片持梁１２
の幅および長さを決めることによって種々の値を設定す
ることができる。次に片持梁１２上にこれを覆うように
ポリシリコン犠牲層３３を形成し（図３（ｃ）参照）、
さらに犠牲層３３上にＳｉＯ2 膜により構造部材１１を
形成する（図３（ｄ）参照）。次にＫＯＨをもちいてポ
リシリコン犠牲層３３を除去し、片持梁１２と構造部材
１１を独立な構造物とした後（図３（ｅ）参照）、片持
梁１２の自由端側にマイクロティップ１３を形成し（図
３（ｆ）参照）、最後に片持梁１２背面のＳｉ基板３１
をＫＯＨによって異方性エッチングし、片持梁構造を得
た（図３（ｇ）参照）。本実施例の構造部材１１は両持
梁構造であるが、そのばね定数もＳｉＯ2 膜の膜厚、両
持梁の幅および長さを決めることによって決まる。構造
部材１１が片持梁１２に対して、例えば剛性部材とみな
せるように形成する場合には、構造部材１１のばね定数
は片持梁１２のばね定数に比べ充分大きくなるよう膜
厚、幅、長さを設定する。片持梁１２が構造部材１１に
制限されず試料表面側へ変位する変位量はポリシリコン
犠牲層３３の膜厚によって制御することができる。FIG. 3 shows an example of a method of manufacturing such a structure, and a sacrifice layer etching method well known in micromechanics was used. First, later support 1
The SiO 2 film 32 is formed on the (100) surface of the silicon substrate 31 which is to be 4 (see FIG. 3A).
Patterning is performed in the shape of 2 (see FIG. 3B). The spring constant of the cantilever 12 depends on the thickness of the SiO 2 film 32, the cantilever 12
Various values can be set by determining the width and length of the. Next, a polysilicon sacrificial layer 33 is formed on the cantilever 12 so as to cover it (see FIG. 3C),
Further, the structural member 11 is formed of the SiO 2 film on the sacrificial layer 33 (see FIG. 3D). Next, KOH is used to remove the polysilicon sacrificial layer 33 to form the cantilever 12 and the structural member 11 as independent structures (see FIG. 3 (e)), and then the microbeam is formed on the free end side of the cantilever 12. The tip 13 is formed (see FIG. 3 (f)), and finally the Si substrate 31 on the rear surface of the cantilever 12 is formed.
Was anisotropically etched with KOH to obtain a cantilever structure (see FIG. 3 (g)). The structural member 11 of this embodiment has a cantilever structure, and its spring constant is also determined by determining the film thickness of the SiO 2 film and the width and length of the cantilever. When the structural member 11 is formed so that it can be regarded as a rigid member with respect to the cantilever 12, the spring constant of the structural member 11 is sufficiently large as compared with the spring constant of the cantilever 12, and the film thickness, width, Set the length. The amount of displacement that the cantilever 12 is not limited to the structural member 11 and is displaced toward the sample surface side can be controlled by the film thickness of the polysilicon sacrificial layer 33.
【００２３】このようにして構造部材１１を設けること
によって、ＡＦＭ動作のためマイクロティップ１３を試
料表面に接近させる際の片持梁１２の大きな変形を抑え
ることができた。By providing the structural member 11 in this way, it is possible to suppress a large deformation of the cantilever 12 when the microtip 13 is brought close to the sample surface for the AFM operation.
【００２４】尚、マイクロティップ１３の形成は、例え
ばＳｉＯ2 からなる片持梁１２上にＳｉをフォーカスト
・イオンビームで打ち込み、Ｓｉ上に選択的にＳｉを結
晶させて行なうことができる。The microtips 13 can be formed by implanting Si on a cantilever 12 made of, for example, SiO 2 with a focused ion beam and selectively crystallizing Si on Si.
【００２５】実施例２ 本実施例では実施例１で示した構成に、さらに片持梁１
２上に引き出し電極を形成し、かかる原子間力顕微鏡を
用いて記録媒体に対して情報の記録再生を行った。 Embodiment 2 In this embodiment, a cantilever 1 is added to the structure shown in Embodiment 1.
An extraction electrode was formed on No. 2, and information was recorded / reproduced on / from the recording medium by using the atomic force microscope.
【００２６】図４はかかる構成の作製方法を示すもので
あり、ＳｉＯ2 からなる片持梁１２上に引き出し電極４
１を形成しておき（図４（ｂ）参照）、マイクロティッ
プ１３を形成後金属コートするか、或いは金属の蒸着に
よりマイクロティップ１３を形成する（図４（ｆ）参
照）。かかる片持梁１２を用い、ＡＦＭ動作によりマイ
クロティップ１３を記録媒体表面に接近させ、一定の斥
力が作用する状態に保持しながら、記録媒体とマイクロ
ティップの間に電圧を印加して記録を行ない、更に流れ
る電流を検出することによって再生を行なった結果、良
好な記録再生特性が得られた。記録媒体としては、例え
ばＳＯＡＺ（スクアリリウム−ビス−６−オクチルアズ
レン）をＬＢ法をもちいて金電極基板上に８層累積した
ものを用いた。FIG. 4 shows a method of manufacturing such a structure, in which the extraction electrode 4 is formed on the cantilever 12 made of SiO 2.
1 is formed in advance (see FIG. 4B), the microtips 13 are formed and then metal-coated, or the microtips 13 are formed by vapor deposition of metal (see FIG. 4F). By using the cantilever 12, the microtip 13 is brought close to the surface of the recording medium by the AFM operation, and a voltage is applied between the recording medium and the microtip to perform recording while maintaining a state where a constant repulsive force acts. As a result of reproducing by detecting the further flowing current, good recording and reproducing characteristics were obtained. As the recording medium, for example, a medium in which eight layers of SOAZ (squarylium-bis-6-octylazulene) was accumulated on the gold electrode substrate by using the LB method was used.
【００２７】実施例３ 本実施例では、図２に示したような構成を持つ原子間力
顕微鏡を作製した。 Example 3 In this example, an atomic force microscope having the structure shown in FIG. 2 was produced.
【００２８】図５はかかる構成の作製方法の一例を示す
ものである。まず、後に支持体１４となるところのシリ
コン基板３１の（１００）面上にＳｉＯ2 膜３２を形成
し（図５（ａ）参照）、片持梁１２の形状にパターニン
グする（図５（ｂ）参照）。片持梁１２のばね定数はＳ
ｉＯ2 膜３２の膜厚、片持梁１２の幅および長さを決め
ることによって種々の値を設定することができる。次に
片持梁１２上にこれを覆うようにポリシリコン犠牲層３
３を形成し（図５（ｃ）参照）、さらに犠牲層３３上に
ＳｉＯ2 膜により中空の片持梁構造を有する弾性体２１
を形成する（図５（ｄ）参照）。次にＫＯＨをもちいて
ポリシリコン犠牲層３３を除去し、片持梁１２と弾性体
２１を独立な構造物とした後（図５（ｅ）参照）、片持
梁１２の自由端側にマイクロティップ１３を形成し（図
５（ｆ）参照）、最後に片持梁１２背面のＳｉ基板３１
をＫＯＨによって異方性エッチングし、片持梁構造を得
た（図５（ｇ）参照）。本実施例の構造部材であるとこ
ろの弾性体２１は片持梁構造であって、そのばね定数は
ＳｉＯ2 膜の膜厚、片持梁の幅および長さを決めること
によって決まる。弾性体２１が片持梁１２と一体になっ
て変形した時、変形量が所望の値まで小さくなる様に弾
性体２１の膜厚、幅、長さを設定する。片持梁１２が弾
性体２１と一体にならず、それ自体のばね定数で試料表
面側へ変位する変位量はポリシリコン犠牲層３３の膜厚
によって制御することができる。FIG. 5 shows an example of a manufacturing method of such a structure. First, the SiO 2 film 32 is formed on the (100) surface of the silicon substrate 31 which will be the support 14 later (see FIG. 5A) and is patterned into the shape of the cantilever 12 (FIG. 5B). )reference). The spring constant of the cantilever 12 is S
Various values can be set by determining the film thickness of the iO 2 film 32 and the width and length of the cantilever 12. Next, the polysilicon sacrificial layer 3 is formed on the cantilever 12 so as to cover it.
3 (see FIG. 5 (c)), and an elastic body 21 having a hollow cantilever structure by a SiO 2 film on the sacrificial layer 33.
Are formed (see FIG. 5D). Next, KOH is used to remove the polysilicon sacrificial layer 33 to form the cantilever 12 and the elastic body 21 as independent structures (see FIG. 5 (e)). The tip 13 is formed (see FIG. 5F), and finally the Si substrate 31 on the back surface of the cantilever 12 is formed.
Was anisotropically etched with KOH to obtain a cantilever structure (see FIG. 5 (g)). The elastic body 21, which is the structural member of the present embodiment, has a cantilever structure, and its spring constant is determined by determining the film thickness of the SiO 2 film, the width and the length of the cantilever. The film thickness, width, and length of the elastic body 21 are set so that when the elastic body 21 is deformed integrally with the cantilever 12, the amount of deformation is reduced to a desired value. The amount of displacement of the cantilever 12 that is not integrated with the elastic body 21 and is displaced toward the sample surface side by the spring constant of itself can be controlled by the film thickness of the polysilicon sacrificial layer 33.
【００２９】このようにして弾性体２１を設けることに
よって、ＡＦＭ動作のためマイクロティップ１３を試料
表面に接近させる際の片持梁１２の大きな変形を抑える
ことができた。By providing the elastic body 21 in this manner, it is possible to suppress the large deformation of the cantilever 12 when the microtip 13 is brought close to the sample surface for the AFM operation.
【００３０】実施例４ 本実施例では、実施例３で示した構成に、さらに片持梁
１２上に引き出し電極を形成し、かかる原子間力顕微鏡
を用いて記録媒体に対して情報の記録再生を行なった。 Embodiment 4 In this embodiment, in addition to the structure shown in Embodiment 3, an extraction electrode is further formed on the cantilever 12, and the atomic force microscope is used to record / reproduce information on / from a recording medium. Was done.
【００３１】図６はかかる構成の作製方法を示すもので
あり、ＳｉＯ2 からなる片持梁１２上に引き出し電極４
１を形成しておき（図６（ｂ）参照）、マイクロティッ
プ１３を形成後金属コートするか、或いは金属の蒸着に
よりマイクロティップ１３を形成する。かかる片持梁１
２を用い、ＡＦＭ動作によりマイクロティップ１３を記
録媒体表面に接近させ、一定の斥力が作用する状態に保
持しながら、記録媒体とマイクロティップの間に電圧を
印加して記録を行ない、更に流れる電流を検出すること
によって再生を行なった結果、良好な記録再生特性が得
られた。記録媒体としては、例えばＳＯＡＺ（スクアリ
リウム−ビス−６−オクチルアズレン）をＬＢ法をもち
いて金電極基板上に８層累積したものを用いた。FIG. 6 shows a method of manufacturing such a structure, in which the extraction electrode 4 is formed on the cantilever 12 made of SiO 2.
1 is formed (see FIG. 6B), the microtips 13 are formed and then metal coated, or the microtips 13 are formed by vapor deposition of metal. Such a cantilever 1
2, the microtip 13 is brought closer to the surface of the recording medium by the AFM operation, and a voltage is applied between the recording medium and the microtip to perform recording while maintaining a state in which a constant repulsive force is applied. As a result of reproducing by detecting, the good recording and reproducing characteristics were obtained. As the recording medium, for example, a medium in which eight layers of SOAZ (squarylium-bis-6-octylazulene) was accumulated on the gold electrode substrate by using the LB method was used.
【００３２】[0032]
【発明の効果】以上説明したように本発明によって以下
のような効果が得られる。 （１）原子間力顕微鏡を大気中で動作させる際、試料表
面を覆う水の表面張力による弾性部材の急激な動きを制
限することが可能となり、これによってマイクロティッ
プを試料表面に衝突させることなく接触させることが可
能となり、試料の損傷が避けられる。 （２）水の表面張力の影響に制限されることなく、弾性
部材のばね定数は所望の値のものを選択できる。 （３）情報の記録再生等の動作時に媒体を損傷させるこ
とのない情報処理装置を提供できる。As described above, according to the present invention, the following effects can be obtained. (1) When the atomic force microscope is operated in the atmosphere, it is possible to limit the abrupt movement of the elastic member due to the surface tension of the water covering the sample surface, and this makes it possible to prevent the microtip from colliding with the sample surface. It is possible to make contact and avoid damage to the sample. (2) The spring constant of the elastic member can be selected to have a desired value without being limited by the influence of the surface tension of water. (3) It is possible to provide an information processing device that does not damage the medium during operations such as recording and reproducing information.
【図１】本発明の主要構成の一例を示す概略図である。FIG. 1 is a schematic diagram showing an example of a main configuration of the present invention.
【図２】本発明の主要構成のもう一つの例を示す概略図
である。FIG. 2 is a schematic diagram showing another example of the main configuration of the present invention.
【図３】図１の構成を持つ本発明の作製方法の一例を示
す図である。FIG. 3 is a diagram showing an example of the manufacturing method of the present invention having the configuration of FIG. 1.
【図４】図１の構成に更に引き出し電極を設けた本発明
の作製方法の一例を示す図である。FIG. 4 is a diagram showing an example of a manufacturing method of the present invention in which a lead electrode is further provided in the configuration of FIG.
【図５】図２の構成を持つ本発明の作製方法の一例を示
す図である。FIG. 5 is a diagram showing an example of the manufacturing method of the present invention having the configuration of FIG.
【図６】図２の構成に更に引き出し電極を設けた本発明
の作製方法の一例を示す図である。FIG. 6 is a diagram showing an example of the manufacturing method of the present invention in which a lead electrode is further provided in the configuration of FIG.
１１ 構造部材 １２ 弾性部材（片持梁） １３ マイクロティップ １４ 弾性部材の支持体 ２１ 弾性体 ３１ シリコン基板 ３２ ＳｉＯ2 膜 ３３ ポリシリコン犠牲層 ４１ 引き出し電極11 Structural Member 12 Elastic Member (Cantilever) 13 Microtip 14 Elastic Member Support 21 Elastic Body 31 Silicon Substrate 32 SiO 2 Film 33 Polysilicon Sacrificial Layer 41 Extraction Electrode
───────────────────────────────────────────────────── フロントページの続き (72)発明者 矢野 亨治 東京都大田区下丸子３丁目30番２号 キヤ ノン株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Toshiharu Yano 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc.
Claims (6)
位可能な弾性部材を有する原子間力顕微鏡において、上
記弾性部材の試料表面へ接近する向きの変形を抑制する
構造部材を具備することを特徴とする原子間力顕微鏡。1. An atomic force microscope having an elastic member displaceable by a force acting between the elastic member and a sample surface, comprising a structural member for suppressing deformation of the elastic member in a direction approaching the sample surface. Characteristic atomic force microscope.
面へ接近する向きへの変形に対する該弾性部材のばね定
数を変化させるものであることを特徴とする請求項１記
載の原子間力顕微鏡。2. The atomic force microscope according to claim 1, wherein the structural member changes a spring constant of the elastic member with respect to deformation of the elastic member in a direction approaching the sample surface. .
を特徴とする請求項１又は２記載の原子間力顕微鏡。3. The atomic force microscope according to claim 1, wherein the structural member has a cantilever structure.
を特徴とする請求項１又は２記載の原子間力顕微鏡。4. The atomic force microscope according to claim 1, wherein the structural member has a double-supported beam structure.
を特徴とする請求項１〜４いずれかに記載の原子間力顕
微鏡。5. The atomic force microscope according to claim 1, wherein the elastic member has a cantilever structure.
顕微鏡を用いたことを特徴とする情報処理装置。6. An information processing apparatus using the atomic force microscope according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4306269A JP3062980B2 (en) | 1992-10-20 | 1992-10-20 | Atomic force microscope and information processing apparatus using the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4306269A JP3062980B2 (en) | 1992-10-20 | 1992-10-20 | Atomic force microscope and information processing apparatus using the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06129848A true JPH06129848A (en) | 1994-05-13 |
| JP3062980B2 JP3062980B2 (en) | 2000-07-12 |
Family
ID=17955054
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4306269A Expired - Fee Related JP3062980B2 (en) | 1992-10-20 | 1992-10-20 | Atomic force microscope and information processing apparatus using the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3062980B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5666781A (en) * | 1994-07-22 | 1997-09-16 | Daiichi Shoten Co., Ltd. | Metal fasteners for wood construction use and a method of constructing a house |
-
1992
- 1992-10-20 JP JP4306269A patent/JP3062980B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5666781A (en) * | 1994-07-22 | 1997-09-16 | Daiichi Shoten Co., Ltd. | Metal fasteners for wood construction use and a method of constructing a house |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3062980B2 (en) | 2000-07-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3192887B2 (en) | Probe, scanning probe microscope using the probe, and recording / reproducing apparatus using the probe | |
| US5856672A (en) | Single-crystal silicon cantilever with integral in-plane tip for use in atomic force microscope system | |
| US7391707B2 (en) | Devices and methods of detecting movement between media and probe tip in a probe data storage system | |
| US5811017A (en) | Cantilever for use in a scanning probe microscope and method of manufacturing the same | |
| JPH05284765A (en) | Cantilever type displacement element, cantilever type probe using the same, scanning tunnel microscope and information processing apparatus using the cantilever type probe | |
| US6011261A (en) | Probe formed of mono-crystalline SI, the manufacturing method thereof, and an information processing device using the probe | |
| US5729026A (en) | Atomic force microscope system with angled cantilever having integral in-plane tip | |
| JPH05187867A (en) | Probe drive mechanism, its production method, tonnel current detector, information processor, plezoelectric actuator using said mechanism and its production method | |
| JPH10282130A (en) | Probe and scanning probe microscope using it | |
| US5751686A (en) | Scanning probe tip covered with an electrical resistance to limit recording/reproducing current | |
| JP3062980B2 (en) | Atomic force microscope and information processing apparatus using the same | |
| JPH0763548A (en) | Cantilever type probe, scanning tunneling microscope having the same, and information processing apparatus | |
| JPH10170530A (en) | Afm cantilever and its manufacture | |
| JP3305304B2 (en) | Probe driving mechanism and method of manufacturing piezoelectric actuator using the same | |
| JP3240692B2 (en) | Cantilever with thin film displacement sensor | |
| JP3234722B2 (en) | Arc-shaped warped lever type actuator, method of driving the actuator, and information processing apparatus using information input / output probe | |
| JPH04162339A (en) | Manufacture of probe for surface observation device and surface observation device | |
| JP2890268B2 (en) | Probe unit, information processing apparatus using the same, and scanning tunnel microscope | |
| JPH0875761A (en) | Scanning probe microscope, processing apparatus and information processing apparatus using the microscope | |
| Minne | Increasing the throughput of atomic force microscopy | |
| JPH06323847A (en) | Cantilever for interatomic force microscope, fabrication thereof, and interatomic force microscope | |
| JPH10332717A (en) | Cantilever probe and manufacturing method thereof | |
| JPH0875759A (en) | Micro displacement element and device using the same | |
| US7528371B2 (en) | Semiconductor probe having resistive tip with low aspect ratio and method of fabricating the same | |
| JPH1090288A (en) | Afm cantilever and its manufacture |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20000404 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090512 Year of fee payment: 9 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100512 Year of fee payment: 10 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100512 Year of fee payment: 10 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110512 Year of fee payment: 11 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120512 Year of fee payment: 12 |
|
| LAPS | Cancellation because of no payment of annual fees |