JPH06118200A - Electron beam irradiation device - Google Patents

Abstract

PURPOSE:To obtain an electron beam irradiation device capable of unifying the irradiation quantity of electron beam emitted from a scanning tube by a bias means, and reducing the energy lost in a window part and also the heat generated at the window part. CONSTITUTION:To an electron beam irradiation device provided with a scanning tube 5, a bias means is provided to bias an electron beam 6 in the scanning tube 5 and guide the electron beam 6 to go in perpendicular to the window 7 of the scanning tube 5. The bias means consists of magnetic field generators 9 and 10 placed next to the window 7.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electron beam irradiation device,
In particular, it relates to an electron beam irradiation apparatus for irradiating an electron beam accelerated from a scanning tube through a window into a substance or gas.

[0002]

2. Description of the Related Art Conventionally, a scanning electron beam irradiation apparatus has been used for surface treatment, modification of plastics, exhaust gas treatment and the like.

Next, a conventional scanning electron beam irradiation apparatus is shown in FIG.
Will be described with reference to. The electron beam irradiation apparatus includes an acceleration tube 1 connected to a DC high voltage power supply 13 via a high voltage cable 14.
5, an electronic scanning section 16 provided adjacent to the acceleration tube 15, and a scanning tube 17 provided adjacent to the electronic scanning section 16. Further, the scanning tube 17 has a primary window 19, and the primary window 19 is also provided.
A secondary window 20 is installed adjacent to. There is also an electron beam irradiation device of the type in which the secondary window 20 is not installed.

However, in the above scanning electron beam irradiation apparatus, the electron beam 18 is accelerated by the accelerating tube 15.
It receives the scan of the electronic scanning unit 16, passes through the scanning tube 17, passes through the primary window 19, and further passes through the secondary window 2.
0 is transmitted. That is, in such an electron beam irradiation device,
The electron beam 18 changes its electron orbit by the magnetic field and electric field of the electron scanning unit 16, and then changes its electron orbit up to the primary window 19 at the end of the primary window 19 to the first position.
It was obliquely incident on the next window 19.

[0005]

As described above, in the conventional electron beam irradiation apparatus, the electron beam 18 is used as the electron scanning unit 1.
After changing the electron orbit by the magnetic field and the electric field of No. 6, most of the electron beam was obliquely incident on the window without changing the electron orbit until the primary window 19. In this case, the distance that electrons pass through the thin film that serves as a window is not the shortest, and the transmittance is smaller than that of vertical incidence due to reflection or the like. That is, there is a problem that the electron energy does not pass through the window effectively and becomes energy such as heat and is consumed in the scanning tube. In addition, there is a problem in that, after obliquely entering the window, the electrons exiting the window gradually spread and do not become a uniform electron beam, and the irradiation efficiency deteriorates.

The present invention has been made in view of the above circumstances, and can make the irradiation amount of the electron beam emitted from the scanning tube uniform by the deflecting means and reduce the energy lost in the window portion. It is an object of the present invention to provide an electron beam irradiation device capable of reducing the amount of heat generated in.

[0007]

In order to achieve the above-mentioned object, one aspect of the electron beam irradiation apparatus of the present invention is an electron beam irradiation apparatus equipped with a scanning tube, in which the electron beam is deflected and scanned. The present invention is characterized in that a deflecting means for causing an electron beam to enter the window of the tube perpendicularly is provided. Another aspect of the electron beam irradiation apparatus of the present invention is an electron beam irradiation apparatus including a scanning tube, wherein a secondary window is provided outside a window of the scanning tube, and an electron beam transmitted through the window of the scanning tube. And a deflection means for deflecting the electron beam to enter the secondary window perpendicularly to the secondary window.

[0008]

According to the present invention having the above-described structure, the electron beam is accelerated by the accelerating tube and, after being scanned by the electronic scanning section, is provided adjacent to the deflecting means in the scanning tube or the window of the scanning tube. It is deflected by the deflecting means installed in the secondary window section. As a result, the electron beam is vertically incident on the window of the scanning tube or the secondary window, and the electron energy effectively passes through the window. The deflection means is, for example, a magnetic field generator, and the magnetic field generator is composed of a permanent magnet or an electromagnet. The magnetic field should be weak at the center of the window and strong at the edges, or multiple magnets with different magnetic field strength should be installed so that all electrons are vertically incident on the window, or a strong magnetic field is applied to the edges. But you can reach your goal. Also, a dipole magnet used to obtain a parallel beam in the ion implanter can be installed in the window portion.

[0009]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the electron beam irradiation apparatus according to the present invention will be described below with reference to FIG. The electron beam irradiation apparatus includes an accelerating tube 3 connected to a DC high-voltage power source 1 via a high-voltage cable 2, and an electronic scanning unit 4 provided adjacent to the accelerating tube 3.
And a scanning tube 5 provided adjacent to the electronic scanning unit 4. The scanning tube 5 has a primary window 7 and a second window adjacent to the primary window 7.
Next window 8 is installed.

A Ti film is mainly used for the primary window 7 and the secondary window 8, and the primary window 7 has a role of maintaining the vacuum of the scanning tube 5. The primary window 7 and the secondary window 8 are preferably as thin as possible so that the electron energy is effectively the energy for irradiation on the atmosphere side. However, since most of the electron beams scanned by the electronic scanning unit 4 are obliquely incident on the primary window 7 and the secondary window 8, in the present invention, the primary window 7 is adjacent to the primary window 7. The magnetic field generators 9 and 10 for secondary windows and the magnetic field generators 11 and 12 for secondary windows are installed adjacent to the secondary window 8. These magnetic field generators 9, 1
0, 11, 12 depending on the primary window 7 and the second
By applying a magnetic field that is vertically incident on the next window 8, the electron beam 6 is vertically incident on the primary window and the secondary window 8, resulting in efficient electron irradiation.
Moreover, since the amount of heat generated in the primary window 7 and the secondary window 8 is also small, it is easy to cool the primary window 7 and the secondary window 8.

The magnetic field for vertical incidence has an electron acceleration voltage of 5
At 00 KeV and 30 ° deflection, about 100 gauss is enough.
It is a magnetic field that can be easily obtained. The vertically incident electron beam has a positionally more uniform spread than the obliquely incident one. This feature is effective for exhaust gas treatment, plastic modification, and the like. This is because the irradiation dose per unit area is uniform and the processing is also uniform. The primary window magnetic field generators 9 and 10 are configured to apply a magnetic field through a vacuum container (scan tube). In order to reduce the loss of electron energy, it is more effective before the electron beam passes through the primary window 7, but there is a risk that the attachment of magnets will become complicated. Therefore, as a simple method, the electrons after passing through the primary window 7
There is a method in which the magnetic field is generated by the next window magnetic field generators 11 and 12 and then vertically incident on the secondary window 8.

Further, a dipole magnet can be installed to easily deflect the electrons. It is also possible to inject electrons perpendicularly to the window by electrostatic deflection instead of magnetic field deflection. In this case, for example, a pair of electrode plates is installed in the scanning tube 5, and an electrostatic field is applied to the electron beam to deflect the electron beam.

[0013]

As described above, according to the present invention,
By vertically injecting electrons into the window or secondary window of the scanning tube, uniform electron irradiation can be performed, irradiation efficiency can be improved, and loss of electron energy can be reduced.

Further, according to the present invention, the amount of heat generated in the window portion can be reduced. Considering the electron irradiation of the same energy in the device of the present invention and the conventional device, the present invention can reduce the size of the entire device and reduce the power consumption.

[Brief description of drawings]

FIG. 1 is an explanatory diagram showing an embodiment of an electron beam irradiation apparatus according to the present invention.

FIG. 2 is an explanatory view showing a conventional electron beam irradiation apparatus.

[Explanation of symbols]

 1 DC high-voltage power supply 2 High-voltage cable 3 Accelerating tube 4 Electronic scanning unit 5 Scanning tube 6 Electron beam 7 Primary window 8 Secondary window 9,10 Primary window magnetic field generator 11, 12 Secondary window Magnetic field generator

Claims (7)

[Claims] 1. An electron beam irradiating device having a scanning tube, characterized in that a deflection means is provided for deflecting the electron beam in the scanning tube so that the electron beam is perpendicularly incident on a window of the scanning tube. X-ray irradiation device. 2. The electron beam irradiation apparatus according to claim 1, wherein the deflecting means comprises a magnetic field generating device installed adjacent to the window. 3. The electron beam irradiation apparatus according to claim 2, wherein the magnetic field generator is a dipole magnet. 4. The electron beam irradiation apparatus according to claim 1, wherein the deflecting means comprises an electrostatic field generator. 5. An electron beam irradiation apparatus having a scanning tube, wherein a secondary window is provided outside a window of the scanning tube, and an electron beam transmitted through the window of the scanning tube is deflected to be perpendicular to the secondary window. An electron beam irradiating device, characterized in that a deflection means for making an electron beam incident is provided. 6. The electron beam irradiation apparatus according to claim 5, wherein the deflecting means comprises a magnetic field generator installed adjacent to the secondary window. 7. The electron beam irradiation apparatus according to claim 6, wherein the magnetic field generator is a dipole magnet.