JPH059036A - Method for producing quartz glass having a refractive index distribution - Google Patents
Method for producing quartz glass having a refractive index distributionInfo
- Publication number
- JPH059036A JPH059036A JP18547491A JP18547491A JPH059036A JP H059036 A JPH059036 A JP H059036A JP 18547491 A JP18547491 A JP 18547491A JP 18547491 A JP18547491 A JP 18547491A JP H059036 A JPH059036 A JP H059036A
- Authority
- JP
- Japan
- Prior art keywords
- refractive index
- gel
- index distribution
- glass
- silica
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 32
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000002184 metal Substances 0.000 claims abstract description 16
- 229910052751 metal Inorganic materials 0.000 claims abstract description 16
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims abstract description 13
- 150000004703 alkoxides Chemical class 0.000 claims description 9
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 239000010703 silicon Substances 0.000 claims description 7
- -1 silicon alkoxide Chemical class 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- 239000002253 acid Substances 0.000 claims description 2
- 239000011521 glass Substances 0.000 abstract description 13
- 238000005245 sintering Methods 0.000 abstract description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract description 8
- 238000001035 drying Methods 0.000 abstract description 6
- 239000002245 particle Substances 0.000 abstract description 6
- 239000006185 dispersion Substances 0.000 abstract description 5
- 239000007788 liquid Substances 0.000 abstract description 4
- 239000007864 aqueous solution Substances 0.000 abstract description 2
- 238000006243 chemical reaction Methods 0.000 abstract description 2
- 238000009792 diffusion process Methods 0.000 abstract description 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 239000010419 fine particle Substances 0.000 abstract 1
- 239000007863 gel particle Substances 0.000 abstract 1
- 239000000499 gel Substances 0.000 description 10
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 6
- 239000010936 titanium Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000011240 wet gel Substances 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000003980 solgel method Methods 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
Abstract
(57)【要約】
【目的】 ゾル−ゲル反応によって屈折率分布を有する
石英ガラスを製造する際に、ゲルの乾燥中及び焼結中に
クラックが入ること及び焼結後のガラス中に微細な気泡
が発生することを防止する。
【構成】 シリカゾル分散液に粒径1μm以下のシリカ
粒子を1モル%〜10モル%添加し、このシリカゾル分
散液をガラス管に入れ、密封して室温で放置しゲル体を
得る。この後、上記ゲル体をガラス管から取り出し、塩
酸水溶液中に浸漬し、Si成分とSi以外の金属からなる
不完全網目構造体からSi以外の金属製分を拡散によっ
て溶出し、ゲル体内部のSi以外の金属成分に濃度勾配
を与え、次いで、上記の工程で得たゲル体を乾燥せしめ
た後、焼結して屈折率分布を有する石英ガラスを得る。
(57) [Summary] [Objective] When silica glass having a refractive index distribution is produced by the sol-gel reaction, cracks are generated during drying and sintering of the gel, and fine particles are present in the glass after sintering. Prevent the formation of bubbles. [Structure] 1 mol% to 10 mol% of silica particles having a particle diameter of 1 μm or less is added to a silica sol dispersion liquid, the silica sol dispersion liquid is put into a glass tube, sealed and left at room temperature to obtain a gel body. After that, the gel body is taken out from the glass tube and immersed in a hydrochloric acid aqueous solution to elute the metal component other than Si from the incomplete network structure composed of the Si component and the metal other than Si by diffusion, and A concentration gradient is given to a metal component other than Si, and then the gel body obtained in the above step is dried and then sintered to obtain quartz glass having a refractive index distribution.
Description
【0001】[0001]
【産業上の利用分野】本発明はロッドレンズ等として用
いられる屈折率分布を有する石英ガラスの製造方法に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing silica glass having a refractive index distribution used as a rod lens or the like.
【0002】[0002]
【従来の技術】透明体中を伝送される光は高屈折率な方
に進行する性質をもっている。そこで、表面から中心に
向って屈折率を徐々に高くすることで、光軸に全ての入
射光を交差させるようにした石英ガラスからなるロッド
レンズが製造されている。2. Description of the Related Art Light transmitted through a transparent material has a property of traveling toward a high refractive index. Therefore, a rod lens made of quartz glass is manufactured in which all the incident light is made to intersect the optical axis by gradually increasing the refractive index from the surface toward the center.
【0003】このロッドレンズの製造方法の1つとして
ゾル−ゲル法が知られている。このゾル−ゲル法は図1
に示すように、主成分となるシリコンアルコキシドのア
ルコール溶液及び屈折率分布を形成するための金属アル
コキシドのアルコール溶液に水を加えてシリカゾルと
し、このシリカゾルを数10℃の温度で数時間保持する
ことで湿潤状態のウェットゲルとし、次いでこのウェッ
トゲルを酸性水に浸すことで前記金属アルコキシドを構
成する金属を溶出し、ウェットゲル体中に金属の濃度勾
配をつけ、この後乾燥せしめた後に焼結することで屈折
率分布を有する石英ガラスを得るようにしている。The sol-gel method is known as one of the methods for manufacturing this rod lens. This sol-gel method is shown in FIG.
As shown in, water is added to an alcohol solution of silicon alkoxide as a main component and an alcohol solution of metal alkoxide for forming a refractive index distribution to form a silica sol, and the silica sol is kept at a temperature of several tens of degrees Celsius for several hours. To wet the wet gel, and then immerse this wet gel in acidic water to elute the metal that constitutes the metal alkoxide, give a concentration gradient of the metal in the wet gel body, and then sinter it after drying. By doing so, quartz glass having a refractive index distribution is obtained.
【0004】上述した方法にあっては、ウェットゲルの
乾燥及び焼結時にクラックが発生しやすく、焼結後のガ
ラスが微細な気泡を含んでいるので、厳しい特性が要求
される光伝送部品として課題を残している。そこで、特
開平3−28132号にあってはシリカゾルにシリカ粉
末を添加することを提案している。In the above-mentioned method, cracks are likely to occur during the drying and sintering of the wet gel, and since the glass after sintering contains fine bubbles, it is used as an optical transmission component requiring severe properties. There are challenges. Therefore, JP-A-3-28132 proposes to add silica powder to silica sol.
【0005】[0005]
【発明が解決しようとする課題】シリカゾルにシリカ粉
末を添加することで、クラックや気泡の発生を抑制する
ことができるが、シリカ成分を添加すると、屈折率を高
くできずまた良好な屈折率分布が得られなくなる。Although the generation of cracks and bubbles can be suppressed by adding silica powder to silica sol, the addition of a silica component makes it impossible to raise the refractive index and provides a good refractive index distribution. Will not be obtained.
【0006】[0006]
【課題を解決するための手段】本発明者は添加するシリ
カ成分の割合及び粒径を適切な範囲に設定することで屈
折率を下げずに且つ良好な屈折率分布を維持し得るとい
う知見に基づき本発明を成したものであり、具体的には
シリカゾルに直径1μm以下の単分散シリカ粒子を全ア
ルコキシドに対して1モル%以上で10モル%以下の割
合で添加するようにした。Means for Solving the Problems The present inventor has found that by setting the ratio and particle diameter of the silica component to be added within an appropriate range, a good refractive index distribution can be maintained without lowering the refractive index. The present invention is based on the above. Specifically, monodisperse silica particles having a diameter of 1 μm or less are added to silica sol at a ratio of 1 mol% or more and 10 mol% or less with respect to all alkoxides.
【0007】[0007]
【作用】粒径の小さなシリカ粒子を添加することで、ゲ
ルの骨格構造の強度不足が補われ、乾燥中や焼結中にク
ラックが入ることがない。また焼結後のガラス中の微細
な気泡もなくなる。By adding silica particles having a small particle size, the lack of strength of the skeleton structure of the gel is compensated for, and cracks do not occur during drying or sintering. Also, fine bubbles in the glass after sintering are eliminated.
【0008】[0008]
【実施例】以下に本発明の実施例を具体的に説明する。
先ず、シリコンアルコキシドとしてテトラメトキシシラ
ン;Si(OCH3)4、シリコン以外の金属アルコキシ
ドとしてチタン−n−ブトキシド;Ti(O−n−C4H
9)4、アルコールとしてブタノール;n−C3H4OHを
用意し、テトラメトキシシラン:チタン−n−ブトキシ
ド:H2O:ブタノールの比が、モル比で0.8:0.
2:4:4となるように混合してシリカゾル分散液を調
製する。EXAMPLES Examples of the present invention will be specifically described below.
First, tetramethoxysilane silicon alkoxide; Si (OCH 3) 4, titanium -n- butoxide as a metal alkoxide other than silicon; Ti (O-n-C 4 H
9 ) 4 , butanol as alcohol; n-C 3 H 4 OH was prepared, and the ratio of tetramethoxysilane: titanium-n-butoxide: H 2 O: butanol was 0.8: 0.
A silica sol dispersion liquid is prepared by mixing so as to be 2: 4: 4.
【0009】次いで上記のシリカゾル分散液にシリカ粒
子を添加する。ここで添加するシリカ粒子の粒径は1μ
m以下とし、添加割合は1モル%〜10モル%とする。
粒径を1μm以下とするのは、粒径が1μmを超えると
ゾル−ゲル反応(加水分解・脱水縮合)によって形成さ
れるゲルの骨格構造が不均一となり、ゲルの強度不足を
補えないからであり、また添加割合を1モル%〜10モ
ル%とするのは、1モル%未満では添加した効果が現れ
ず、10モル%を超えると開口数が少なくなり且つ滑ら
かな屈折率分布のものが得られないからである。Next, silica particles are added to the above-mentioned silica sol dispersion liquid. The particle size of silica particles added here is 1μ
m or less, and the addition ratio is 1 mol% to 10 mol%.
The particle size is set to 1 μm or less because if the particle size exceeds 1 μm, the skeleton structure of the gel formed by the sol-gel reaction (hydrolysis / dehydration condensation) will be non-uniform and the insufficient strength of the gel cannot be compensated. Also, the addition ratio of 1 mol% to 10 mol% means that the effect of addition does not appear if it is less than 1 mol% and that the numerical aperture becomes small and the refractive index distribution is smooth if it exceeds 10 mol%. Because you cannot get it.
【0010】以上のシリカゾル分散液を内径15mmの
ガラス管に入れ、密封して室温で3日放置しゲル体を得
る。このゲル体はSi(OCH3)4とTi(O−n−C4
H9)4の不十分な加水分解及びシリカ粒子表面の水酸基
も関与する縮合反応により生じたガラス網目の不完全構
造体で、水やブタノールを含んでいる。The above silica sol dispersion is put in a glass tube having an inner diameter of 15 mm, sealed and left at room temperature for 3 days to obtain a gel body. The gel body is Si (OCH 3) 4 and Ti (O-n-C 4
It is an incomplete structure of glass network formed by insufficient hydrolysis of H 9 ) 4 and condensation reaction involving hydroxyl groups on the surface of silica particles, and contains water and butanol.
【0011】この後、上記ゲル体をガラス管から取り出
し、5%塩酸水溶液中に20時間浸漬し、Si成分とTi
からなる不完全網目構造体からSi以外の金属製分即ち
Ti成分の一部を拡散によって溶出し、ゲル体内部のTi
成分に濃度勾配(内部ほど高濃度)を与える。そして、
上記ゲルを水で洗浄して塩酸成分を取り除く。After that, the above gel body was taken out from the glass tube and immersed in a 5% hydrochloric acid aqueous solution for 20 hours to obtain the Si component and Ti.
The metal component other than Si, that is, a part of the Ti component is eluted by diffusion from the incomplete network structure of
A concentration gradient (higher concentration toward the inside) is given to the components. And
The gel is washed with water to remove the hydrochloric acid component.
【0012】次いで、上記の工程で得たゲル体を乾燥せ
しめた後、1200℃以上で焼結し、直径5mmで長さ
800mmの透明ガラス体を作成した。ここで、乾燥は
室温から150℃まで1〜2週間かけてゆっくりと行な
い、焼結はヘリウム雰囲気に置換しながら行なう。Next, the gel body obtained in the above process was dried and then sintered at 1200 ° C. or higher to prepare a transparent glass body having a diameter of 5 mm and a length of 800 mm. Here, the drying is slowly performed from room temperature to 150 ° C. over 1 to 2 weeks, and the sintering is performed while replacing the atmosphere with a helium atmosphere.
【0013】以上の工程によって得られる本発明に係る
石英ガラスと従来の石英ガラスとを比較するために、単
分散シリカ粒子を添加した場合と添加しない場合とにつ
いてそれぞれ10本の透明ガラス体を製作し、クラック
及び気泡の発生について比較した。In order to compare the quartz glass according to the present invention obtained by the above-mentioned steps with the conventional quartz glass, 10 transparent glass bodies are produced with and without addition of monodisperse silica particles. However, the generation of cracks and bubbles was compared.
【0014】その結果、単分散シリカ粒子を添加した本
発明の場合にはクラックの発生は皆無であり、気泡の発
生が認められたのは1本だけであった。一方、単分散シ
リカ粒子を添加しない場合にはクラックの発生したもの
は3本、気泡が発生したものは8本、クラックと気泡の
いずれも発生しないものは僅かに1本であった。As a result, in the case of the present invention in which the monodisperse silica particles were added, no cracks were generated, and only one bubble was recognized. On the other hand, when the monodisperse silica particles were not added, there were 3 cracks, 8 bubbles were generated, and only 1 crack or bubble was not generated.
【0015】また、上記透明ガラス体の半径方向の屈折
率分布を調べたが、図2に示すように単分散シリカ粒子
の添加の影響は認められず、滑らかな放物線状の屈折率
分布を示した。Further, the refractive index distribution in the radial direction of the transparent glass body was examined, but as shown in FIG. 2, the effect of the addition of the monodisperse silica particles was not recognized, and a smooth parabolic refractive index distribution was shown. It was
【0016】尚、実施例にあってはシリコンアルコキシ
ドとして、テトラメトキシシランを用いたが、テトラエ
トキシシラン、テトラプロポキシシラン、テトラブトキ
シシラン等を用いてもよく、またシリコン以外の金属と
してチタンを示したが、ゲルマニウム(Ge)、ジルコ
ニウム(Zr)、タンタル(Tl)等の金属アルコキシド
を用いてもよく、更に上記金属を溶出する酸としては塩
酸の他に硫酸、硝酸、フッ酸等を用いることができる。Although tetramethoxysilane was used as the silicon alkoxide in the examples, tetraethoxysilane, tetrapropoxysilane, tetrabutoxysilane, etc. may be used, and titanium is shown as a metal other than silicon. However, a metal alkoxide such as germanium (Ge), zirconium (Zr) or tantalum (Tl) may be used, and sulfuric acid, nitric acid or hydrofluoric acid other than hydrochloric acid may be used as an acid for eluting the metal. You can
【0017】[0017]
【発明の効果】以上に説明したように本発明によれば、
出発原料としてのシリカゾルに直径1μm以下の単分散
シリカ粒子を全アルコキシドに対して1モル%〜10モ
ル%の割合で添加するようにしたので、ゲルの骨格構造
の強度不足が補われ、乾燥中や焼結中にクラックが入る
ことがなくなり、また焼結後のガラス中に微細な気泡が
発生することも防止できる。更に焼成後のガラスの開口
数も実用的な範囲にあり、屈折率分布も滑らかな放物線
を描き、光学的特性にも優れた石英ガラスが得られる。As described above, according to the present invention,
Since monodispersed silica particles having a diameter of 1 μm or less were added to the silica sol as a starting material at a ratio of 1 mol% to 10 mol% with respect to the total alkoxide, the lack of strength of the skeletal structure of the gel was compensated for, and during drying. It also prevents cracks from forming during sintering, and also prevents generation of fine bubbles in the glass after sintering. Further, the numerical aperture of the glass after firing is in a practical range, a parabola with a smooth refractive index distribution is drawn, and quartz glass excellent in optical characteristics can be obtained.
【図1】ゾル−ゲル法による石英ガラス体の製造手順を
示すブロック図FIG. 1 is a block diagram showing a procedure for manufacturing a quartz glass body by a sol-gel method.
【図2】屈折率分布を示すグラフFIG. 2 is a graph showing a refractive index distribution
Claims (1)
金属アルコキシドを含むシリカゾルをゲル化し、次いで
酸処理することでゲルから前記金属アルコキシドを構成
する金属を溶出させてゲル内に金属の濃度勾配をつけ、
この後ゲルを乾燥した後焼結するようにした屈折率分布
を有する石英ガラスの製造方法において、前記シリカゾ
ルに直径1μm以下の単分散シリカ粒子を全アルコキシ
ドに対して1モル%以上で10モル%以下の割合で添加
することを特徴とする屈折率分布を有する石英ガラスの
製造方法。Claim: What is claimed is: 1. A silica sol containing a silicon alkoxide and a metal alkoxide other than silicon is gelled, and then acid-treated to elute the metal constituting the metal alkoxide from the gel so that the metal Create a concentration gradient,
In the method for producing silica glass having a refractive index distribution, in which the gel is then dried and then sintered, monodispersed silica particles having a diameter of 1 μm or less are added to the silica sol in an amount of 1 mol% or more and 10 mol% based on all alkoxides. A method for producing quartz glass having a refractive index distribution, characterized in that it is added in the following proportions.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18547491A JPH059036A (en) | 1991-06-28 | 1991-06-28 | Method for producing quartz glass having a refractive index distribution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18547491A JPH059036A (en) | 1991-06-28 | 1991-06-28 | Method for producing quartz glass having a refractive index distribution |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH059036A true JPH059036A (en) | 1993-01-19 |
Family
ID=16171401
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18547491A Withdrawn JPH059036A (en) | 1991-06-28 | 1991-06-28 | Method for producing quartz glass having a refractive index distribution |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH059036A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002274860A (en) * | 2001-03-12 | 2002-09-25 | Olympus Optical Co Ltd | Light scattering glass material and its manufacturing method |
| JP2007156036A (en) * | 2005-12-02 | 2007-06-21 | Canon Inc | Image forming apparatus |
| US7346236B2 (en) | 2001-04-03 | 2008-03-18 | Fujikura Ltd. | Collimator lens, fiber collimator and optical parts |
| EP2178093A1 (en) | 2008-10-16 | 2010-04-21 | Orion Tech Anstalt | Treatment of liquid wastes containing heavy metals |
-
1991
- 1991-06-28 JP JP18547491A patent/JPH059036A/en not_active Withdrawn
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002274860A (en) * | 2001-03-12 | 2002-09-25 | Olympus Optical Co Ltd | Light scattering glass material and its manufacturing method |
| US7346236B2 (en) | 2001-04-03 | 2008-03-18 | Fujikura Ltd. | Collimator lens, fiber collimator and optical parts |
| JP2007156036A (en) * | 2005-12-02 | 2007-06-21 | Canon Inc | Image forming apparatus |
| EP2178093A1 (en) | 2008-10-16 | 2010-04-21 | Orion Tech Anstalt | Treatment of liquid wastes containing heavy metals |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19980903 |