JPH056852A - X-ray irradiation device and X-ray irradiation method - Google Patents
X-ray irradiation device and X-ray irradiation methodInfo
- Publication number
- JPH056852A JPH056852A JP3155015A JP15501591A JPH056852A JP H056852 A JPH056852 A JP H056852A JP 3155015 A JP3155015 A JP 3155015A JP 15501591 A JP15501591 A JP 15501591A JP H056852 A JPH056852 A JP H056852A
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- Prior art keywords
- ray
- window
- thin film
- rays
- irradiation
- Prior art date
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
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- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
(57)【要約】
【目的】 半導体装置の製造に用いられるX線照射装置
の構造に関し,薄くて長波長X線の透過率が高く,かつ
圧力差に対する強度の高いX線取り出し窓を提供するこ
とを目的とする。
【構成】 真空のX線発生装置と大気圧の外部雰囲気と
の間に該外部雰囲気中にX線16を透過する薄膜2を真
空保持のための隔壁として設けたX線取り出し窓1にお
いて,薄膜2の少なくとも一面にメッシュ状の補強板3
が密着され,X線16の照射量を被照射体8の表面で均
一にするために,X線を照射する間,薄膜2及び該被照
射体8のうち少なくとも一方を揺動することを特徴とし
て構成する。
(57) [Abstract] [PROBLEMS] To provide an X-ray extraction window which is thin, has a high transmittance for long-wavelength X-rays, and has a high strength against a pressure difference, in regard to the structure of an X-ray irradiation apparatus used for manufacturing a semiconductor device. The purpose is to An X-ray extraction window (1) provided with a thin film (2) that transmits X-rays (16) in the external atmosphere between a vacuum X-ray generator and an external atmosphere at atmospheric pressure as a partition for holding a vacuum. Mesh-like reinforcing plate 3 on at least one surface of 2
And the at least one of the thin film 2 and the irradiated body 8 is swung during the irradiation of the X-rays in order to make the irradiation amount of the X-rays 16 uniform on the surface of the irradiated body 8. Configure as.
Description
【0001】[0001]
【産業上の利用分野】本発明は半導体装置の製造に用い
られるX線照射装置の構造及びX線照射方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a structure of an X-ray irradiator used for manufacturing a semiconductor device and an X-ray irradiating method.
【0002】近年の半導体装置の高集積,高性能化に伴
い,微細パターンを形成することができるX線露光が有
望視されている。しかし,X線発生装置は真空に保たれ
ているから,X線を大気中の露光装置に導入するために
は,装置の真空を保ちつつX線を透過する窓を設ける必
要があるが,かかる窓のX線の吸収は窓の厚さの指数関
数であって厚さとともに急激に増加する。With the recent trend toward higher integration and higher performance of semiconductor devices, X-ray exposure capable of forming fine patterns is considered promising. However, since the X-ray generator is kept in a vacuum, it is necessary to provide a window for transmitting the X-ray while keeping the vacuum of the apparatus in order to introduce the X-ray into the exposure apparatus in the atmosphere. The absorption of X-rays in a window is an exponential function of the thickness of the window and increases rapidly with thickness.
【0003】このため,X線の透過率を高めるために薄
くて,かつ真空を保つことができる強度を有するX線取
り出し窓を有するX線照射装置が要望されている。For this reason, there is a demand for an X-ray irradiator having an X-ray extraction window which is thin and has a strength capable of maintaining a vacuum in order to increase the X-ray transmittance.
【0004】[0004]
【従来の技術】従来,真空のX線発生装置から大気中に
X線を取り出すための窓には,ベリリウムの薄膜が用い
られている。2. Description of the Related Art Conventionally, a beryllium thin film has been used as a window for extracting X-rays from a vacuum X-ray generator into the atmosphere.
【0005】この窓を構成するベリリウム薄膜は,X線
発生装置の内外の圧力差に耐える強度が必要であり,こ
のため大口径の窓を設けるときはベリリウム薄膜も厚く
しなければならない。The beryllium thin film forming this window is required to have strength to withstand the pressure difference between the inside and the outside of the X-ray generator, and therefore the beryllium thin film must be thick when a window having a large diameter is provided.
【0006】しかし,厚いベリリウム薄膜は,X線の透
過率が低いという欠点がある。さらに,厚いベリリウム
薄膜は長波長のX線の吸収が大きく短波長のX線をより
多く透過することから,X線露光におけるマスクコント
ラストが低下し微細パターンの形成が困難になるという
問題があった。However, the thick beryllium thin film has a drawback that the X-ray transmittance is low. Further, since the thick beryllium thin film has a large absorption of long wavelength X-rays and transmits a large amount of short wavelength X-rays, there is a problem that the mask contrast in X-ray exposure is lowered and it becomes difficult to form a fine pattern. .
【0007】かかる短波長のX線に起因するマスクコン
トラストの低下を回避するために,厚い吸収パターンを
設けたX線マスクが常用されている。しかし,この方法
は厚い吸収パターンをを精密に加工することが難しいと
いう欠点がある。In order to avoid the deterioration of the mask contrast due to the short wavelength X-ray, an X-ray mask provided with a thick absorption pattern is commonly used. However, this method has a drawback that it is difficult to precisely process a thick absorption pattern.
【0008】[0008]
【発明が解決しようとする課題】上述したように,従来
の技術では,薄くかつ大口径のX線取り出し窓を設ける
ことができなかった。このため,大面積の被照射体を短
時間に露光することができない,或いは微細パターンの
形成が困難であるという欠点があった。As described above, the conventional technique cannot provide a thin and large-diameter X-ray extraction window. Therefore, there is a drawback that a large-area irradiation target cannot be exposed in a short time or it is difficult to form a fine pattern.
【0009】本発明は,薄くて長波長X線の透過率が高
く,かつ圧力差に対する強度の高いX線取り出し窓を有
するX線照射装置を提供することを目的とする。It is an object of the present invention to provide an X-ray irradiator having an X-ray extraction window which is thin and has a high transmittance for long wavelength X-rays and a high strength against a pressure difference.
【0010】[0010]
【課題を解決するための手段】図1は本発明の第一実施
例説明図であり,図1(a)はX線取り出し窓及びX線
露光装置の主要な構成を表し,図1(b)は本発明にか
かるX線取り出し窓の構成を,図1(c)はそのAB断
面を表している。FIG. 1 is an explanatory view of a first embodiment of the present invention. FIG. 1 (a) shows the main construction of an X-ray extraction window and an X-ray exposure apparatus, and FIG. 1) shows the structure of the X-ray extraction window according to the present invention, and FIG. 1C shows the AB cross section.
【0011】また,図2は本発明の第二実施例部分平面
図であり,補強板に設けられた透過窓の配列を表してい
る。上記課題を解決するするための本発明の第一の構成
は,図1を参照して,真空のX線発生装置と大気圧の外
部雰囲気との間にX線16を透過する薄膜2を真空保持
のための隔壁として設けたX線取り出し窓1を有するX
線照射装置において,該薄膜2の少なくとも一面に複数
の開口を有する補強板3が密着され,該X線16の照射
量を被照射体8の表面で均一化するために,X線を照射
する間,該薄膜2及び該被照射体8のうち少なくとも一
方を該X線16の入射方向に垂直な面内で揺動するよう
に構成されてなることを特徴として構成し,及び,第二
の構成は,図2を参照して,第一の構成のX線照射装置
であって,上記補強板には,X線を透過するために開口
された矩形の透過窓を等ピッチで並設した透過窓列14
a1〜14a6が2列以上,該ピッチの整数分の一の距離
ずつ順次該透過窓列(14a1〜14a6)に沿い一方向
にずらせて平行に等距離で配置されており,前期揺動
は,上記窓の面内で該透過窓列方位と直交し,該列の中
心間距離を該整数倍した振幅の往復運動であることを特
徴として構成し,及び,第三の構成は,図2を参照し
て,第二の構成のX線照射装置であって,第二の構成に
係る往復運動に加えて,該ピッチの整数分の一の距離を
こえる振幅を有する該列方向の往復運動をすることを特
徴として構成し,及び,第四の構成は,図1を参照し
て,少なくとも一面に複数の開口を有する補強板3が密
着され,真空のX線発生装置と大気圧の外部雰囲気との
間に真空保持のための隔壁として設けられた薄膜2を透
過したX線を,該薄膜2及び被照射体8のうち少なくと
も一方を該X線16の入射方向に垂直な面内で揺動しつ
つ該被照射体に照射して,該被照射体8の表面での該X
線16の照射量を均一化することを特徴として構成す
る。FIG. 2 is a partial plan view of the second embodiment of the present invention, showing the arrangement of the transmission windows provided on the reinforcing plate. A first configuration of the present invention for solving the above-mentioned problems is to vacuum a thin film 2 that transmits X-rays 16 between a vacuum X-ray generator and an external atmosphere at atmospheric pressure, with reference to FIG. X having an X-ray extraction window 1 provided as a partition for holding
In the radiation irradiator, a reinforcing plate 3 having a plurality of openings is adhered to at least one surface of the thin film 2 and is irradiated with X-rays in order to make the irradiation amount of the X-rays 16 uniform on the surface of the irradiated body 8. In the meantime, at least one of the thin film 2 and the irradiated body 8 is configured to oscillate in a plane perpendicular to the incident direction of the X-ray 16, and the second With reference to FIG. 2, the structure is the X-ray irradiating device of the first structure, in which rectangular transmission windows opened to transmit X-rays are arranged in parallel at the equal pitch on the reinforcing plate. Transparent window row 14
a1 to 14a6 are arranged in two or more rows and are arranged at equal distances parallel to each other along the transmission window row (14a1 to 14a6) one by one by a distance of an integer fraction of the pitch, and It is characterized in that it is a reciprocating motion orthogonal to the azimuth direction of the transmission window in the plane of the window and having an amplitude obtained by multiplying the center distance of the row by the integer. With reference to the X-ray irradiator of the second structure, in addition to the reciprocating motion according to the second structure, a reciprocating motion in the row direction having an amplitude exceeding a distance of an integer fraction of the pitch is performed. In the fourth configuration, with reference to FIG. 1, a reinforcing plate 3 having a plurality of openings on at least one surface is closely attached, and a vacuum X-ray generator and an external atmosphere of atmospheric pressure are provided. X-rays transmitted through the thin film 2 provided as a partition for holding a vacuum between And at least one of the objects to be irradiated 8 is irradiated on the object to be irradiated while swinging in a plane perpendicular to the incident direction of the X-ray 16, and the X on the surface of the object to be irradiated 8 is irradiated.
The feature is that the irradiation amount of the line 16 is made uniform.
【0012】[0012]
【作用】本発明の構成では,図1(b)及び(c)を参
照して,X線を透過する物質からなる薄膜2の一面に,
多数の透過窓14が設けられリブ15によりメッシュを
なす補強板3が密着されている。In the configuration of the present invention, referring to FIGS. 1 (b) and 1 (c), one surface of the thin film 2 made of a substance that transmits X-rays,
A large number of transmission windows 14 are provided, and the reinforcing plate 3 forming a mesh is in close contact with the ribs 15.
【0013】このため,薄膜2の差圧に対する強度は,
各個の透過窓14の大きさについての強度があればよ
く,従来のようにX線取り出し窓1全面の大きさについ
ての強度は必要ではない。Therefore, the strength of the thin film 2 against the differential pressure is
It suffices that each of the transmission windows 14 has strength with respect to the size thereof, and does not require strength with respect to the size of the entire surface of the X-ray extraction window 1 as in the conventional case.
【0014】実験によれば,本発明にかかる差圧に対す
るX線取り出し窓1の強度は,通常の薄膜2材料におい
ては薄膜2の強度よりもリブ15の強度で限定され,略
透過窓14がない場合の補強板3の強度に近い強度を有
するのである。According to the experiment, the strength of the X-ray extraction window 1 with respect to the differential pressure according to the present invention is limited by the strength of the ribs 15 rather than the strength of the thin film 2 in the usual thin film 2 material, and the substantially transparent window 14 is It has a strength close to that of the reinforcing plate 3 when there is no such structure.
【0015】従って,大きなX線取り出し窓1を,薄い
薄膜2を用いてかつ差圧に対する十分な強度をもって製
造することができ,長波長のX線透過率の高い大口径の
X線取り出し窓1を実現することができるのである。Therefore, the large X-ray extraction window 1 can be manufactured using the thin thin film 2 and with sufficient strength against the differential pressure, and the large-diameter X-ray extraction window 1 having a high long-wavelength X-ray transmittance. Can be realized.
【0016】さらに本構成では,被照射体8とX線取り
出し窓1との相対位置は照射中に揺動している。このた
め,X線取り出し窓1のメッシュ像が被照射体8の同一
位置に長時間停留することなく,空間的強度分布は平均
化される。Further, in this configuration, the relative position between the irradiated body 8 and the X-ray extraction window 1 swings during irradiation. Therefore, the mesh image of the X-ray extraction window 1 does not stay at the same position on the irradiated body 8 for a long time, and the spatial intensity distribution is averaged.
【0017】従って,X線取り出し窓1にメッシュが存
在していても,メッシュの無い通常のX線取り出し窓と
同様に被照射体全面にわたり均一な照射量とすることが
できる。Therefore, even if a mesh exists in the X-ray extraction window 1, it is possible to obtain a uniform irradiation amount over the entire surface of the object to be irradiated, as in the case of a normal X-ray extraction window having no mesh.
【0018】本発明の第二の構成では,図2を参照し
て,透過窓列14a1 〜14a6 が一列毎に順次列方向
にずれて平行に配置され,ある整数回目に一ピッチずれ
て当初の列14a1 とずれのない列14a6 に戻るまで
を一繰り返しとして配置され,また揺動は,透過窓列に
垂直方向に,当初の列14a1 から再び当初の列に戻る
列14a6 までの距離を単位としてその整数倍の振幅の往
復運動により行われる。In the second structure of the present invention, referring to FIG. 2, the transmissive window rows 14a1 to 14a6 are sequentially arranged in parallel in the row direction, and are shifted by one pitch at an integer number of times. The row 14a1 and the row 14a6 which is not displaced are arranged as one cycle, and the swing is perpendicular to the transmission window row, and the unit is the distance from the original row 14a1 to the row 14a6 which returns to the original row again. It is performed by a reciprocating motion with an amplitude that is an integral multiple of that.
【0019】かかる構成では,被照射体の一点において
一往復で照射される量は,その一往復中に被照射体の一
点が透過窓を通過する距離に比例するから,透過窓列1
4a1 〜14a6 に沿っての照射量の変動はリブ15が
在るために生ずる高々一個の透過窓を通過する距離分だ
け減少するに過ぎない。In such a configuration, the amount of irradiation of one point of the irradiated object in one reciprocation is proportional to the distance that one point of the irradiated object passes through the transmissive window during the one reciprocation.
The variation of the dose along 4a1 to 14a6 is reduced only by the distance passing through at most one transmission window caused by the presence of the rib 15.
【0020】従って,照射量の空間的変動の最大照射量
に対する割合は,透過窓列の一繰り返し中に含まれる列
の数の逆数に等しい。本構成では,透過窓の配列を列毎
に列方向へずらすことにより,透過窓列の一繰り返し中
に含まれる列の数を多くしている。このため,照射量の
変動を小さくすることができるのである。Therefore, the ratio of the spatial variation of the dose to the maximum dose is equal to the reciprocal of the number of rows included in one repetition of the transmission window row. In this configuration, the number of columns included in one repetition of the transparent window column is increased by shifting the array of the transparent windows for each column in the column direction. Therefore, it is possible to reduce the fluctuation of the irradiation amount.
【0021】さらに,第三の構成では,列方向にも往復
運動が加えられる。このため,被照射体の一点における
照射量は,リブ15の影にならない点では透過窓を通る
距離は同じであるが,一方リブ15の影となる部分はリ
ブ15の幅以上に往復運動をする結果リブ15の影とな
る期間が短くなる。Further, in the third configuration, reciprocating motion is applied also in the column direction. Therefore, the irradiation amount at one point of the irradiated body is the same as the distance passing through the transmissive window in that it is not in the shadow of the rib 15, but the shadowed portion of the rib 15 reciprocates more than the width of the rib 15. As a result, the period of shadow of the rib 15 becomes shorter.
【0022】従って,リブの影に起因する照射量の変動
を小さくでき,均一な照射量分布を得ることができるの
である。Therefore, it is possible to reduce the variation of the dose due to the shadow of the rib, and to obtain a uniform dose distribution.
【0023】[0023]
【実施例】本発明を実施例を参照して説明する。第一実
施例は,図1を参照して,シンクロトロン軌道放射光を
X線源とするウェーハ露光装置に適用したものである。EXAMPLES The present invention will be described with reference to examples. The first embodiment is applied to a wafer exposure apparatus using synchrotron orbit radiation as an X-ray source with reference to FIG.
【0024】図1(b)及び(c)を参照して,厚さ3
μm,直径30mmのベリリウム薄膜2に補強板3とな
る厚さ50μmのステンレス鋼を貼り合わせ,ステンレ
ス鋼にエッチングにより辺長100μmの方形の透過窓
14を開口する。Referring to FIGS. 1B and 1C, the thickness 3
A beryllium thin film 2 having a diameter of 30 μm and a reinforcing plate 3 is bonded to a stainless steel plate having a thickness of 50 μm, and a rectangular transparent window 14 having a side length of 100 μm is opened by etching the stainless steel.
【0025】透過窓の配列は,図2を参照して,透過窓
14a1,1 〜14a1,3 を120μmのピッチで並置し
た透過窓列14a1を配置し,つぎに120μmの5分
の一だけずらした透過窓列14a2を中心間距離120
μmで平行に配置し,さらに同様にして順次透過窓列1
4a3〜14a6を配置する。As for the arrangement of the transmission windows, referring to FIG. 2, the transmission windows 14a1,1 to 14a1,3 are arranged side by side with a transmission window row 14a1 arranged at a pitch of 120 μm, and then shifted by a fifth of 120 μm. The transparent window row 14a2 has a center distance of 120
1 μm parallel arrangement, and in the same manner, the transmission window row 1
4a3 to 14a6 are arranged.
【0026】上記透過窓を配置した補強板3を貼り合わ
せたベリリウム薄膜2からなるX線取り出し窓1は,X
線発生装置の一部をなすX線導入管17にベローズを介
して取付けられた窓枠4に,透過窓列14a1〜14a
6を水平に,周辺に設けた真空シールにより補強板3を
X線導入管17に向けて取付けられる。The X-ray extraction window 1 formed of the beryllium thin film 2 to which the reinforcing plate 3 having the transmission window is attached is
The transmission window rows 14a1 to 14a are attached to the window frame 4 attached to the X-ray introduction tube 17 forming a part of the ray generator via the bellows.
The reinforcing plate 3 is attached horizontally to the X-ray introducing tube 17 by a vacuum seal provided in the periphery.
【0027】かかる構成のX線取り出し窓1は,5気圧
差まで耐えることができる。これに対して,従来の構成
のX線取り出し窓では,同じ30mmの直径及び同じ3
μmの厚さのベリリウム薄膜であっても0.6気圧差ま
でしか耐えることができない。このように,本発明によ
れば,薄くても強度のあるX線取り出し窓を実現するこ
とができる。The X-ray extraction window 1 having such a structure can withstand up to a pressure difference of 5 atm. On the other hand, the conventional X-ray extraction window has the same diameter of 30 mm and the same diameter of 3 mm.
Even a beryllium thin film having a thickness of μm can withstand only a 0.6 atmospheric pressure difference. Thus, according to the present invention, a thin but strong X-ray extraction window can be realized.
【0028】さらに,従来通常用いられる厚さ50μm
のベリリウム薄膜では,波長1.5nmの長波長X線の
透過率は10-4であるのに対し,本発明に係る厚さ3μ
mのベリリウム薄膜では,同波長に対する透過率は0.
62であった。このように,本発明では,透過率が高
い,特に長波長での透過率の低下が少ないX線取り出し
窓を実現することができる。Furthermore, a thickness of 50 μm which is conventionally used
The beryllium thin film of No. 1 has a transmittance of 10 −4 for long-wavelength X-rays having a wavelength of 1.5 nm, while the thickness according to the present invention is 3 μm.
In the beryllium thin film of m, the transmittance for the same wavelength is 0.
It was 62. As described above, according to the present invention, it is possible to realize an X-ray extraction window having a high transmittance, and in particular, a decrease in the transmittance at a long wavelength is small.
【0029】従って,X線マスク7のパターンを薄い層
で形成しても高いコントラストを得ることができるか
ら,本発明ではX線マスクの製造が容易になる。X線取
り出し窓1は,ガス入出力13から流入,流出するヘリ
ウムガスで満たされた管を介して,露光装置10のゲー
トバルブ12に接続される。かかる管は,X線取り出し
窓1のベリリウム薄膜の劣化を防ぐために,またX線の
吸収,散乱を減少するために設けられる。Therefore, even if the pattern of the X-ray mask 7 is formed of a thin layer, a high contrast can be obtained, so that the X-ray mask can be easily manufactured in the present invention. The X-ray extraction window 1 is connected to the gate valve 12 of the exposure apparatus 10 via a tube filled with helium gas that flows in and out from the gas input / output 13. Such a tube is provided to prevent deterioration of the beryllium thin film in the X-ray extraction window 1 and to reduce absorption and scattering of X-rays.
【0030】露光装置10は,被照射体8となるウェー
ハを保持するウェーハ保持台と透過型のX線マスク7及
びゲートバルブ12と接続するベロースからなる。X線
発生装置で発生したX線16は,真空中を通過してX線
取り出し窓1に達し,これを透過し大気圧のヘリウム雰
囲気中に取り出され,マスク7のパターンに従って被照
射体上に照射強度のパターンとして照射する。The exposure apparatus 10 is composed of a wafer holder for holding a wafer to be the object to be irradiated 8, a transmission type X-ray mask 7 and bellows connected to the gate valve 12. The X-rays 16 generated by the X-ray generator pass through the vacuum, reach the X-ray extraction window 1, pass through the X-ray extraction window 1, and are extracted into the helium atmosphere at atmospheric pressure. Irradiate as a pattern of irradiation intensity.
【0031】照射中,窓揺動装置6により窓枠4を鉛直
方向に振幅1.2mmで往復運動を与える。また,照射
中,ウエーハ保持台9を水平方向に振幅600μmで往
復運動する。During irradiation, the window swinging device 6 reciprocates the window frame 4 in the vertical direction with an amplitude of 1.2 mm. Further, during irradiation, the wafer holding table 9 is reciprocally moved in the horizontal direction with an amplitude of 600 μm.
【0032】かかる揺動を付加した照射により,メッシ
ュを有するX線取り出し窓を用いても従来の窓と同様に
均一な露光がなされた。本実施例において,窓枠4の揺
動で全ての揺動を担うこともできる。これにより,露光
装置10の設計上の負担が軽減される。By the irradiation added with such a swing, even when the X-ray extraction window having the mesh was used, uniform exposure was performed as in the conventional window. In the present embodiment, the swinging of the window frame 4 can be responsible for all swinging. This reduces the design burden on the exposure apparatus 10.
【0033】また,窓枠を固定し,全ての揺動を露光装
置で担うこともできる。これにより,装置の複雑化を回
避することができる。Alternatively, the window frame may be fixed, and all the swinging may be performed by the exposure device. This makes it possible to avoid complication of the device.
【0034】[0034]
【発明の効果】上述したように本発明によれば,X線取
り出し窓はメッシュ状の補強板により強化され,またX
線照射量分布は均一となるから,長波長X線の透過率が
高い薄い薄膜により形成された,圧力差に対する強度の
高いX線取り出し窓を有するX線照射装置,及び透過す
る長波長X線が多く照射量が均一なX線照射方法を提供
することができ,半導体装置の性能向上に寄与するとこ
ろが大きい。As described above, according to the present invention, the X-ray extraction window is reinforced by the mesh-shaped reinforcing plate, and
Since the radiation dose distribution is uniform, an X-ray irradiator having an X-ray extraction window having a high intensity against pressure difference formed by a thin thin film having a high long-wavelength X-ray transmittance, and a long-wavelength X-ray to be transmitted. However, it is possible to provide an X-ray irradiation method in which the amount of irradiation is large and the irradiation amount is uniform, which greatly contributes to improving the performance of the semiconductor device.
【図1】 本発明の第一実施例説明図FIG. 1 is an explanatory diagram of a first embodiment of the present invention.
【図2】 本発明の第二実施例部分平面図FIG. 2 is a partial plan view of a second embodiment of the present invention.
1 X線取り出し窓 2 薄膜 3 補強板 4 窓枠 5 ベローズ 6 窓揺動装置 7 マスク 8 被照射体 9 ウェーハ保持台 11 ベローズ 12 ゲートバルブ 13 ガス入出口 14,14a1,1 〜14a6,2 透過窓 14a1〜14a6 透過窓列 15 リブ 16 X線 1 X-ray extraction window 2 thin film 3 Reinforcement plate 4 window frames 5 Bellows 6 Window swing device 7 mask 8 Irradiated body 9 Wafer holder 11 Bellows 12 gate valve 13 gas inlet / outlet 14,14a1,1 to 14a6,2 Transparent window 14a1 to 14a6 Transmission window row 15 ribs 16 X-ray
Claims (4)
気との間にX線(16)を透過する薄膜(2)を真空保
持のための隔壁として設けたX線取り出し窓(1)を有
するX線照射装置において,該薄膜(2)の少なくとも
一面に複数の開口を有する補強板(3)が密着され,該
X線(16)の照射量を被照射体(8)の表面で均一化
するために,X線を照射する間,該薄膜(2)及び該被
照射体(8)のうち少なくとも一方を該X線(16)の
入射方向に垂直な面内で揺動するように構成されてなる
ことを特徴とするX線照射装置。1. An X-ray extraction window (1) provided with a thin film (2) which transmits X-rays (16) as a partition for holding vacuum between a vacuum X-ray generator and an external atmosphere at atmospheric pressure. In the X-ray irradiator having the above-mentioned structure, a reinforcing plate (3) having a plurality of openings is adhered to at least one surface of the thin film (2), and the irradiation amount of the X-ray (16) is applied to the surface of the irradiation object (8). In order to make uniform, at least one of the thin film (2) and the irradiated body (8) is oscillated in a plane perpendicular to the incident direction of the X-ray (16) during irradiation of the X-ray. An X-ray irradiator, which is configured as follows.
上記補強板には,X線を透過するために開口された矩形
の透過窓を等ピッチで並設した透過窓列(14a1〜14
a6)が2列以上,該ピッチの整数分の一の距離ずつ順
次該透過窓列(14a1〜14a6)に沿い一方向にずら
せて平行に等距離で配置されており,前期揺動は,上記
窓の面内で該透過窓列方位と直交し,該列の中心間距離
を該整数倍した振幅の往復運動であることを特徴とする
X線照射装置。2. The X-ray irradiator according to claim 1,
On the reinforcing plate, there are arranged transmissive window rows (14a1 to 14a) in which rectangular transmissive windows opened to transmit X-rays are arranged in parallel at equal pitches.
a6) are arranged in parallel at equal distances by shifting in one direction along the transmission window rows (14a1 to 14a6) sequentially by two or more rows and a distance that is an integer fraction of the pitch. An X-ray irradiator that is orthogonal to the azimuth direction of the transmission window in the plane of the window and has a reciprocating motion with an amplitude obtained by multiplying the center distance of the row by the integer.
請求項2記載の往復運動に加えて,該ピッチの整数分の
一の距離をこえる振幅を有する該列方向の往復運動をす
ることを特徴とするX線照射装置。3. The X-ray irradiation apparatus according to claim 2, wherein
In addition to the reciprocating motion according to claim 2, an X-ray irradiating device which performs a reciprocating motion in the column direction having an amplitude exceeding a distance of an integer fraction of the pitch.
強板(3)が密着され,真空のX線発生装置と大気圧の
外部雰囲気との間に真空保持のための隔壁として設けら
れた薄膜(2)を透過したX線を,該薄膜(2)及び被
照射体(8)のうち少なくとも一方を該X線(16)の
入射方向に垂直な面内で揺動しつつ該被照射体に照射し
て,該被照射体(8)の表面での該X線(16)の照射
量を均一化することを特徴とするX線照射方法。4. A thin film (3), which is adhered to a reinforcing plate (3) having a plurality of openings on at least one surface thereof and is provided as a partition wall for maintaining a vacuum between a vacuum X-ray generator and an external atmosphere at atmospheric pressure. The X-ray transmitted through 2) is oscillated on at least one of the thin film (2) and the irradiation object (8) in a plane perpendicular to the incident direction of the X-ray (16), and An X-ray irradiation method, which comprises irradiating the object to be irradiated (8) with a uniform dose of the X-rays (16).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3155015A JPH056852A (en) | 1991-06-27 | 1991-06-27 | X-ray irradiation device and X-ray irradiation method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3155015A JPH056852A (en) | 1991-06-27 | 1991-06-27 | X-ray irradiation device and X-ray irradiation method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH056852A true JPH056852A (en) | 1993-01-14 |
Family
ID=15596820
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3155015A Withdrawn JPH056852A (en) | 1991-06-27 | 1991-06-27 | X-ray irradiation device and X-ray irradiation method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH056852A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2747137A1 (en) | 2012-12-19 | 2014-06-25 | Fuji Electric Co., Ltd. | Semiconductor module |
-
1991
- 1991-06-27 JP JP3155015A patent/JPH056852A/en not_active Withdrawn
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2747137A1 (en) | 2012-12-19 | 2014-06-25 | Fuji Electric Co., Ltd. | Semiconductor module |
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