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JPH052973A - Electrostatic relay - Google Patents

Electrostatic relay

Info

Publication number
JPH052973A
JPH052973A JP15191991A JP15191991A JPH052973A JP H052973 A JPH052973 A JP H052973A JP 15191991 A JP15191991 A JP 15191991A JP 15191991 A JP15191991 A JP 15191991A JP H052973 A JPH052973 A JP H052973A
Authority
JP
Japan
Prior art keywords
movable
contact
fixed
side base
electrostatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15191991A
Other languages
Japanese (ja)
Inventor
Koichi Aizawa
浩一 相澤
Atsushi Sakai
淳 阪井
Keiji Kakinote
啓治 柿手
Hiromi Nishimura
広海 西村
Fumihiro Kasano
文宏 笠野
Takayoshi Awai
崇善 粟井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP15191991A priority Critical patent/JPH052973A/en
Publication of JPH052973A publication Critical patent/JPH052973A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H59/00Electrostatic relays; Electro-adhesion relays
    • H01H2059/009Electrostatic relays; Electro-adhesion relays using permanently polarised dielectric layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H59/00Electrostatic relays; Electro-adhesion relays
    • H01H59/0009Electrostatic relays; Electro-adhesion relays making use of micromechanics

Landscapes

  • Micromachines (AREA)

Abstract

PURPOSE:To allow an electrostatic relay to stand the influence of external electromagnetic field and thermal shock, enhance the inter-contact withstand voltage, and lower the drive voltage by forming both a movable side base and a stationary side base from an electroconductive material, and furnishing an electret between a movable side driving electrode and a stationary side driving electrode. CONSTITUTION:Bases A, B consisting of an electroconductive material such as Si monocrystal are arranged in electrical continuity at their joint surfaces D so that a movable contact 2 on the rear of a movable side base A and a stationary contact 3 on the front of a stationary side base B are facing each other. Thereby the stress and strain when thermal shock is applied are lessened, and influence of external electromagnetic field is reduced. An electret 8 is furnished between driving electrodes 11, 22 to strengthen the electrostatic power generated through impression of driving voltage, and thereby the contact is opened and shunt by displacing the movable part 12. Thus the inter-contact withstand voltage can be enhanced by lowering the driving voltage or widening the contact gap, compared with a conventional arrangement where no such an electret 8 is provided.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、静電力(クーロン
力)を利用して接点の接離を行う静電リレーに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrostatic relay that uses electrostatic force (Coulomb force) to contact and separate contacts.

【0002】[0002]

【従来の技術】静電リレーは、電磁リレーとは違って電
磁コイルを必要とせず、より小型化が図れることから、
開発が盛んに進められている。素子サイズ10mm□以
下のものが可能である。図8および図9は、従来の静電
リレーをあらわす。この静電リレー191では、可動側
基体Aの裏側に設けられた可動接点194と固定側基体
Bの表側に設けられた固定接点197が対面するように
して前記可動側基体Aと固定側基体Bが配置されてい
る。これら両基体A,BはスペーサCを介して接合され
ている。
2. Description of the Related Art An electrostatic relay, unlike an electromagnetic relay, does not require an electromagnetic coil and can be further miniaturized.
Development is actively progressing. A device size of 10 mm □ or less is possible. 8 and 9 show a conventional electrostatic relay. In this electrostatic relay 191, the movable contact 194 provided on the back side of the movable base A and the fixed contact 197 provided on the front side of the fixed base B face each other so that the movable base A and the fixed base B are opposed to each other. Are arranged. The two bases A and B are joined via a spacer C.

【0003】可動側基体Aは裏面に可動接点194を備
えた可動板(可動部)192とこの可動板192を可動
接点194と固定接点197が接離する変位可能に支持
する支持部(枠部)193からなる。そして、可動側基
体Aの駆動電極を兼ねる可動板192と固定側基体Bの
駆動電極198の間への駆動電圧印加により発生する静
電力で前記可動板192が固定側基体Bに近づいて前記
両接点194,197が接触し、静電力の消滅に伴い前
記可動板192が自身のバネ性で元の水平状態に復元す
ることにより固定側基体Bから遠ざかり前記両接点19
4,197が離れるようになっている。
The movable base A has a movable plate (movable portion) 192 having a movable contact 194 on its back surface, and a support portion (frame portion) for movably supporting the movable plate 192 such that the movable contact 194 and the fixed contact 197 come into contact with and separate from each other. ) 193. Then, the movable plate 192 approaches the fixed-side substrate B by an electrostatic force generated by applying a drive voltage between the movable plate 192 which also serves as the drive electrode of the movable-side substrate A and the drive electrode 198 of the fixed-side substrate B, and both of them are moved. The contacts 194 and 197 contact each other, and the movable plate 192 restores to its original horizontal state by its own spring property as the electrostatic force disappears, and thus the movable plate 192 moves away from the fixed side base B and the contacts 19
4,197 are separated.

【0004】可動基体Aはシリコン基板を選択エッチン
グ等の微細加工手段で加工することにより必要な構造部
分の作り込みがなされており、一方、固定側基体Bはガ
ラス基板である。可動接点194や固定接点197、あ
るいは、固定側駆動電極198は、金属薄膜形成・パタ
ーンニング等により形成されている。
The movable base A is formed with a necessary structural portion by processing a silicon substrate by a fine processing means such as selective etching, while the fixed side base B is a glass substrate. The movable contact 194, the fixed contact 197, or the fixed side drive electrode 198 is formed by forming a metal thin film, patterning, or the like.

【0005】[0005]

【発明が解決しようとする課題】上記のような構造およ
び動作から分かるように、静電リレーは、写真製版技術
や微細加工技術等の半導体素子の製造技術を利用して製
造することができるので、極めて小型のものが製造で
き、従来の電磁リレーに比べて体積を1/10以下にす
ることも可能になり、また、高速動作が可能で、使用時
の発熱が非常に小さく、低コストで大量生産することが
できる等の利点がある。
As can be seen from the above structure and operation, the electrostatic relay can be manufactured by utilizing the semiconductor element manufacturing technology such as the photolithography technology and the microfabrication technology. , Very small size can be manufactured, the volume can be reduced to 1/10 or less compared to the conventional electromagnetic relay, high speed operation is possible, heat generation during use is very small, and the cost is low. There are advantages such as mass production.

【0006】しかしながら、上記の静電リレーは、外部
の電磁界に影響されやすいという問題や熱衝撃に弱いと
いう問題がある。上記の静電リレーは、固定側基体Bの
ガラス基板が絶縁材であるため、外部からの電磁誘導が
強く影響する場や強電界の場に静電リレーが置かれた場
合、駆動電圧による静電力が変動して誤動作するのであ
る。
However, the above electrostatic relay has a problem that it is easily affected by an external electromagnetic field and that it is weak against thermal shock. In the electrostatic relay described above, since the glass substrate of the fixed side base B is an insulating material, when the electrostatic relay is placed in a field strongly influenced by electromagnetic induction from the outside or a field of a strong electric field, static electricity due to a driving voltage is applied. The power fluctuates and malfunctions.

【0007】また、可動側基体Aのシリコン基板と固定
側基体Bのガラス基板は熱膨係数が大きく異なってお
り、熱衝撃を受けた際の両基体A,Bの寸法変動量の差
が大きく大きな歪みや応力が発生するため、破損してし
まうのである。従来の静電リレーは、可動側・固定側の
二つの駆動電極の間に印加する駆動電圧によって発生す
る静電力(クーロン力)で動作するものであるが、十分
な接点圧を確保するために両駆動電極間の距離を短くし
ている。静電力は両駆動電極間の距離の2乗に逆比例す
る一方、接点圧が静電力に比例するからである。しか
し、両駆動電極間の距離を短くしているため、接点間の
耐圧がどうしても低くなるという問題があった。
Further, the silicon substrate of the movable base A and the glass substrate of the fixed base B have greatly different coefficients of thermal expansion, and the difference in dimensional variation between the bases A and B upon thermal shock is large. Large strains and stresses are generated, which causes damage. The conventional electrostatic relay operates with the electrostatic force (Coulomb force) generated by the drive voltage applied between the two drive electrodes on the movable side and the fixed side, but in order to secure sufficient contact pressure. The distance between both drive electrodes is shortened. This is because the electrostatic force is inversely proportional to the square of the distance between both drive electrodes, while the contact pressure is proportional to the electrostatic force. However, since the distance between both drive electrodes is shortened, there is a problem that the breakdown voltage between the contacts is inevitably lowered.

【0008】また、静電リレーの場合、必要な静電力を
得るための駆動電圧が高め(普通、数十V〜数百V)で
あるために使い難く、駆動電圧の低下が望まれている。
通常の電子回路では信号電圧は数V〜十数V程度なの
で、昇圧回路が必要となる。駆動電圧の低下は外付回路
の不用化ないし軽減化をもたらす。この発明は、上記事
情に鑑み、外部の電磁界に影響され難く、かつ、熱衝撃
に強く、さらに、接点間耐圧の向上や駆動電圧の低下が
図れる静電リレーを提供することを課題とする。
In the case of an electrostatic relay, the driving voltage for obtaining the necessary electrostatic force is high (usually several tens V to several hundreds V), which makes it difficult to use, and a reduction in the driving voltage is desired. .
Since the signal voltage of an ordinary electronic circuit is about several V to several tens of V, a booster circuit is required. The lowering of the driving voltage causes the external circuit to be unnecessary or reduced. In view of the above circumstances, it is an object of the present invention to provide an electrostatic relay that is not easily affected by an external electromagnetic field, is resistant to thermal shock, and can improve contact breakdown voltage and drive voltage. .

【0009】[0009]

【課題を解決するための手段】請求項1〜5記載の静電
リレーは、前記課題を解決するため、可動側基体の裏側
に設けられた可動接点と固定側基体の表側に設けられた
固定接点が対面するようにして前記可動側基体と固定側
基体とが配置され、前記可動側基体が裏面に前記可動接
点を有する可動部とこの可動部を可動接点と固定接点が
接離する変位可能に支持する支持部とを備えており、前
記両基体における駆動電極への駆動電圧印加により発生
する静電力で前記可動部が変位して接点の接離がなされ
るようになっている構成において、可動側基体と固定側
基体とがともに導電性材料からなっており、前記固定側
駆動電極と可動側駆動電極の間に変位の際の静電力を強
めるエレクトレットを設けるようにしている。
In order to solve the above-mentioned problems, the electrostatic relay according to the present invention has a movable contact provided on the back side of the movable base and a fixed contact provided on the front side of the fixed base. The movable side base body and the fixed side base body are arranged so that the contacts face each other, and the movable side base body has a movable part having the movable contact point on the back surface, and the movable part has a movable contact point and a fixed contact point that can be displaced. In a configuration in which the movable portion is displaced by the electrostatic force generated by the application of the drive voltage to the drive electrodes in the both bases to bring the contacts into and out of contact with each other, Both the movable side base body and the fixed side base body are made of a conductive material, and an electret for enhancing electrostatic force at the time of displacement is provided between the fixed side drive electrode and the movable side drive electrode.

【0010】導電性材料からなる基体としては、例え
ば、請求項2のように、シリコン基板が挙げられる。可
動側・固定側の具体的形態例としては、請求項3のよう
に、可動側基体の表面には絶縁膜が形成されていて、そ
の上に可動接点と可動側駆動電極が形成されており、固
定側基体の表面には絶縁膜が形成されていて、その上に
固定接点と固定側駆動電極が形成されている態様が挙げ
られる。また、請求項4のように、可動側基体と固定側
基体が電気的に接続され同電位にある態様が好ましい。
As the substrate made of a conductive material, for example, a silicon substrate may be mentioned. As a concrete example of the movable side and the fixed side, as in claim 3, an insulating film is formed on the surface of the movable side substrate, and a movable contact and a movable side drive electrode are formed thereon. An example is a mode in which an insulating film is formed on the surface of the fixed-side substrate, and a fixed contact and a fixed-side drive electrode are formed thereon. Further, it is preferable that the movable side base body and the fixed side base body are electrically connected to each other and have the same electric potential.

【0011】さらに、静電リレーの利用性を高めるため
の形態例として、請求項5のように、可動側基体および
/または固定側基体に駆動用回路部を設けた態様が挙げ
られる。前述のように、静電リレーの場合、普通、数十
V〜数百Vの駆動電圧が必要とされる。したがって、駆
動電圧発生用の昇圧回路が必要となる。また、駆動電圧
の解除後、駆動電極の間に蓄積された電荷を放電させな
いと接点が開かないため、通常、放電回路も要求され
る。静電リレー自体は小型でも、他に昇圧回路や放電回
路等の外付回路を付加する必要があるため使い難いので
ある。
Further, as an example of a mode for enhancing the utilization of the electrostatic relay, there is a mode in which a driving circuit section is provided on the movable side base body and / or the fixed side base body as described in claim 5. As described above, in the case of the electrostatic relay, a driving voltage of tens of volts to hundreds of volts is usually required. Therefore, a booster circuit for driving voltage generation is required. Further, after the drive voltage is released, the contacts do not open unless the electric charge accumulated between the drive electrodes is discharged, and therefore a discharge circuit is usually required. Even though the electrostatic relay itself is small, it is difficult to use because it is necessary to add external circuits such as a booster circuit and a discharge circuit.

【0012】駆動用回路部の具体的形態例としては、放
電回路を有する態様や、駆動電圧発生用昇圧回路の少な
くとも一部を有する態様が挙げられる。駆動用回路部は
駆動に必要な全ての回路を備えている必要はなく一部の
回路だけを有していてもよい。例えば、昇圧回路の一部
と放電回路を有するという態様もある。もちろん、駆動
に必要な全ての回路を有している態様が望ましい。な
お、駆動用回路部は、可動側基体あるいは固定側基体の
どちらに設けられてもよいし、分割して両基体にまたが
って設けるようにしてもよい。
Specific examples of the driving circuit section include a mode having a discharge circuit and a mode having at least a part of a drive voltage generating booster circuit. The driving circuit unit does not have to include all circuits necessary for driving, and may have only some circuits. For example, there is a mode in which a part of the booster circuit and the discharge circuit are included. Of course, a mode in which all circuits necessary for driving are included is desirable. The driving circuit unit may be provided on either the movable side base body or the fixed side base body, or may be divided and provided on both base bodies.

【0013】可動側駆動電極と固定側駆動電極の間に設
けられるエレクトレットは、正および/または負の電荷
を有しかつその和が0でない電荷を保持する絶縁体が挙
げられるが、これに限らない。エレクトレットには様々
な材質・厚みものが挙げられる。例えば、厚み5μmの
ポリプロピレンでコロナ放電で帯電させたものが例示さ
れる。
The electret provided between the movable side drive electrode and the fixed side drive electrode includes an insulator having positive and / or negative charges and holding a charge whose sum is not 0, but is not limited thereto. Absent. Various materials and thicknesses can be used for the electret. For example, a polypropylene having a thickness of 5 μm and charged by corona discharge is exemplified.

【0014】次に、駆動用回路部の具体的構成例につい
て説明する。駆動用回路部は、通常、図5にみるよう
に、昇圧回路と放電回路とを備え、信号電圧が昇圧回路
で昇圧され駆動電圧として可動側駆動電極16と固定側
駆動電極22の間に印加される。なお、放電回路は、駆
動電圧印加時には放電動作を行わないことは言うまでも
ない。そして、駆動電圧印加が停止された時には放電回
路が駆動電極16,22の間に蓄積された電荷を速やか
に放電させる。
Next, a specific example of the structure of the driving circuit section will be described. As shown in FIG. 5, the drive circuit section usually includes a booster circuit and a discharge circuit, and a signal voltage is boosted by the booster circuit and applied as a drive voltage between the movable side drive electrode 16 and the fixed side drive electrode 22. To be done. It goes without saying that the discharge circuit does not perform the discharge operation when the drive voltage is applied. When the drive voltage application is stopped, the discharge circuit quickly discharges the electric charge accumulated between the drive electrodes 16 and 22.

【0015】駆動用回路部のより具体的な回路例を図6
に示す。図6の場合、発光ダイオード(発光素子)10
0と、この発光ダイオード100の光を受けて起電力を
発生する複数の光電池102・・・が直列接続されたフ
ォトセルアレイ101とで昇圧回路が構成され、ノーマ
リイオフ型NPNトランジスタ103、抵抗104およ
びダイオード105で放電回路が構成されている。
A more specific circuit example of the driving circuit section is shown in FIG.
Shown in. In the case of FIG. 6, a light emitting diode (light emitting element) 10
0 and a photocell array 101 in which a plurality of photocells 102 ... Which generate electromotive force in response to light from the light emitting diode 100 are connected in series constitutes a booster circuit, which includes a normally-off NPN transistor 103, a resistor 104, and a diode. A discharge circuit is composed of 105.

【0016】図6の駆動用回路部の動作は、以下の通り
である。低い信号電圧で発光ダイオード100を発光さ
せるとフォトセルアレイ101で信号電圧より高い駆動
電圧が発生する。必要な高さの電圧が得られるように光
電池102の数が調整されているのである。駆動電圧の
発生中は、トランジスタ103はオフ状態であり、駆動
電圧が両駆動電極16,22の間に正常にかかり充電さ
れる。信号電圧が消滅すると駆動電圧はなくなるが、駆
動電極16,22の間の蓄積電荷による電圧でトランジ
スタ103がオン状態になると共に蓄積電荷の放電が始
まる。
The operation of the drive circuit section shown in FIG. 6 is as follows. When the light emitting diode 100 emits light with a low signal voltage, a driving voltage higher than the signal voltage is generated in the photo cell array 101. The number of photovoltaic cells 102 is adjusted so that the required voltage level can be obtained. During the generation of the drive voltage, the transistor 103 is in the off state, and the drive voltage is normally applied between the drive electrodes 16 and 22 to be charged. When the signal voltage disappears, the drive voltage disappears, but the voltage due to the accumulated charge between the drive electrodes 16 and 22 turns on the transistor 103 and starts discharging the accumulated charge.

【0017】駆動回路部は、上記のものに限らない。例
えば、昇圧回路として、n個のダイオードとn個のコン
デンサを直並列接続したチャージポンプ式の回路や薄膜
トランスとダイオードとコンデンサの整流部を組み合わ
せた薄膜トランス型整流昇圧回路などが使える。ただ、
これらの昇圧回路は交流信号電圧を入力としている。こ
の発明の静電リレーは、上記の構成に限らない。例え
ば、可動・固定の駆動電極の一方は基体の絶縁膜上に設
けるが、他方の駆動電極は導電性基体自身の全体ないし
一部で構成するようにしてもよい。この場合は、駆動電
極やその上を覆う絶縁膜の形成工程が省けるため、製造
工程の簡素化・コストダウンが図れるという利点が出て
くる。
The drive circuit section is not limited to the above. For example, as the booster circuit, a charge pump type circuit in which n diodes and n capacitors are connected in series and parallel, or a thin film transformer type rectifier booster circuit in which a thin film transformer and a rectifying unit of a diode and a capacitor are combined can be used. However,
These booster circuits receive an AC signal voltage as an input. The electrostatic relay of this invention is not limited to the above configuration. For example, one of the movable and fixed drive electrodes is provided on the insulating film of the base, but the other drive electrode may be formed by the whole or a part of the conductive base itself. In this case, since the step of forming the drive electrode and the insulating film covering the drive electrode can be omitted, there is an advantage that the manufacturing process can be simplified and the cost can be reduced.

【0018】[0018]

【作用】この発明の静電リレーでは、可動側基体と固定
側基体の両方ともが導電性材料である。そのため、熱膨
張率の差が小さく熱衝撃を受けた際に生ずる歪みや応力
が小さくなるために熱衝撃に対し強く、両導電性基体に
挟まれた区間は電気的シールド区間となるために外部の
電磁界の影響が軽減され外的要因による誤動作が起り難
い。
In the electrostatic relay of the present invention, both the movable side base body and the fixed side base body are conductive materials. Therefore, the difference in the coefficient of thermal expansion is small and the strain and stress that occurs when a thermal shock is applied is small, so it is strong against thermal shock, and the section sandwiched between both conductive substrates becomes an electrical shield section. The influence of the electromagnetic field is reduced, and malfunction due to external factors hardly occurs.

【0019】また、固定側駆動電極と可動側駆動電極の
間にはエレクトレットがあって静電力が増すため、その
分、駆動電圧を下げたり、接点ギャップを大きくし接点
間耐圧の向上が図れる。駆動電圧や接点ギャップがその
ままでよければ接点圧を大きくすることができる。可動
側基体と固定側基体が共にシリコン基板であれば、両基
体の熱膨張率が同一であるため、熱衝撃を受けた際の歪
みや応力が極めて僅かであるため、熱衝撃に対し著しく
強くなる。また、シリコン基板の場合は、駆動用回路部
のためのトランジスタや抵抗等の素子を作り込むのに利
用することもできる。駆動回路部も含め全体を極めて小
型のものにすることが可能となる。
Further, since there is an electret between the fixed-side drive electrode and the movable-side drive electrode, and the electrostatic force increases, the drive voltage can be lowered or the contact gap can be increased to improve the breakdown voltage between the contacts. The contact pressure can be increased if the drive voltage and the contact gap remain unchanged. If the movable side base and the fixed side base are both silicon substrates, the thermal expansion coefficient of both bases is the same, so the strain and stress when subjected to a thermal shock are extremely small, so it is extremely strong against thermal shock. Become. Further, in the case of a silicon substrate, it can also be used to fabricate elements such as transistors and resistors for the driving circuit section. It is possible to make the entire unit including the drive circuit unit extremely small.

【0020】可動・固定の両接点および両駆動電極が基
体の表面の絶縁膜上に形成されている場合、両接点およ
び両駆動電極を導電性の両基体で十分に電気的シールド
することができるため、外部の電磁界の影響が極めて少
なくなり、その結果、外的要因による誤動作が非常に起
り難くなる。可動側基体と固定側基体が同電位にある場
合、両基体の間は常に電界がかからない状態が確実に維
持されることになるため、非常に安定性が高い。
When both movable and fixed contacts and both drive electrodes are formed on the insulating film on the surface of the substrate, both contacts and both drive electrodes can be sufficiently electrically shielded by both conductive substrates. Therefore, the influence of the external electromagnetic field is extremely reduced, and as a result, malfunction due to external factors is extremely unlikely to occur. When the movable base and the fixed base are at the same potential, a state in which no electric field is applied between the two bases is surely maintained, and therefore the stability is very high.

【0021】さらに、駆動用回路部が基体に設けられて
いれば、その分、外付回路の付加が不要ないし軽減され
ることとなり、使い易くなる。
Further, if the drive circuit portion is provided on the base, the addition of an external circuit is unnecessary or reduced correspondingly, which facilitates the use.

【0022】[0022]

【実施例】以下、この発明の実施例を、図面を参照しな
がら詳しく説明する。この発明は、下記の実施例に限ら
ないことは言うまでもない。図1は、実施例にかかる静
電リレーの要部構成をあらわす。図2は、実施例の静電
リレー全体を上方からみた状態をあらわす。図3は、実
施例の静電リレーの駆動用回路部まわりをあらわす。図
4は、図2のX−X断面をあらわす。
Embodiments of the present invention will be described in detail below with reference to the drawings. It goes without saying that the present invention is not limited to the following embodiments. FIG. 1 shows a main configuration of an electrostatic relay according to an embodiment. FIG. 2 shows a state where the entire electrostatic relay of the embodiment is viewed from above. FIG. 3 shows the periphery of the drive circuit portion of the electrostatic relay of the embodiment. FIG. 4 shows the XX cross section of FIG.

【0023】実施例の静電リレー1はリレー部と駆動用
回路部とを有する。リレー部を先に説明し、その後で駆
動用回路部を説明する。静電リレー1のリレー部では、
可動側基体Aの裏側に設けられた可動接点2と固定側基
体Bの表側に設けられた固定接点3が対面するようにし
て、両基体A,Bが配置されている。これら両基体A,
Bは接合面Dで電気的導通がとれるようにして結合され
ている。この場合、導電性ペーストを塗布して接合させ
ることで電気的導通を確保しつつ結合させている。この
他の結合方法もあるが、電気的導通がとれない結合方法
を用いた場合は、結合の後で電気的導通をとる処理を基
体A,Bに対して行うようにする。
The electrostatic relay 1 of the embodiment has a relay section and a driving circuit section. The relay section will be described first, and then the driving circuit section will be described. In the relay section of the electrostatic relay 1,
Both bases A and B are arranged so that the movable contact 2 provided on the back side of the movable base A and the fixed contact 3 provided on the front side of the fixed base B face each other. Both of these substrates A,
B is joined so that electrical continuity can be obtained at the joint surface D. In this case, a conductive paste is applied and bonded to ensure electrical continuity and bond. Although other bonding methods are available, when a bonding method that does not allow electrical conduction is used, the substrates A and B are subjected to a treatment for electrical conduction after the bonding.

【0024】可動側基体Aは裏面に可動接点2を備えた
可動板(可動部)12とこの可動板12を可動接点2と
固定接点3が接離する変位可能に支持する支持部(枠
部)13からなる。可動板12はT字型連結部14で支
持部13とつながって変位可能な支持状態が実現されて
いるのである。可動板12は、例えば、厚み30μmで
あって、支持部13の底から僅かに窪んだ位置、例えば
50μm引っ込んだ位置にある。
The movable base A has a movable plate (movable portion) 12 having a movable contact 2 on its back surface, and a support portion (frame portion) for movably supporting the movable plate 12 such that the movable contact 2 and the fixed contact 3 come into contact with and separate from each other. ) 13. The movable plate 12 is connected to the supporting portion 13 by the T-shaped connecting portion 14 to realize a displaceable supporting state. The movable plate 12 has, for example, a thickness of 30 μm, and is located at a position slightly recessed from the bottom of the support portion 13, for example, at a position retracted by 50 μm.

【0025】可動側基体Aは(100)面を表面にもつ
シリコン単結晶基板からなり、上記のような構造は、水
酸化カリウムの水溶液エッチャントとマスク材料として
窒化シリコン膜を用いることで比較的容易に作ることが
できる。可動板12の裏面(固定側基体B側の面)は絶
縁膜15が形成されている。絶縁膜15上の先端域には
金属薄膜からなる可動接点2がパターン形成され、中央
域には金属薄膜からなる可動側駆動電極16がパターン
形成されている。この駆動電極16は絶縁膜17で被覆
されていて、必要な電気的絶縁が確保されている。駆動
電極16からは接続ライン16aが延びており、この接
続ライン16aも絶縁膜17で覆われているが、絶縁膜
17は固定側基体Bの駆動電圧導入端子29との接続部
分Eは電気的接続のために覆わないパターンとされてい
る。なお、接続部分Eでの接続は、例えば、金共晶法で
行える。
The movable side substrate A is made of a silicon single crystal substrate having a (100) plane on its surface. The above structure is relatively easy by using an aqueous potassium hydroxide etchant and a silicon nitride film as a mask material. Can be made into An insulating film 15 is formed on the back surface of the movable plate 12 (the surface on the side of the fixed base B). The movable contact 2 made of a metal thin film is patterned on the tip region of the insulating film 15, and the movable side drive electrode 16 made of a metal thin film is patterned on the central region. The drive electrode 16 is covered with an insulating film 17 to ensure necessary electrical insulation. A connection line 16a extends from the drive electrode 16, and the connection line 16a is also covered with an insulating film 17. The insulating film 17 is electrically connected to a portion E connected to the drive voltage introducing terminal 29 of the fixed side base B. It is a pattern that is not covered for connection. The connection at the connection portion E can be performed by, for example, the gold eutectic method.

【0026】固定側基体Bもシリコン単結晶基板からな
り、可動板12と対面する箇所に絶縁膜21が形成され
ていて、この絶縁膜21の先端域に金属薄膜からなる固
定接点3がパターン形成されており、中央域には金属薄
膜からなる固定側駆動電極22がパターン形成されてい
る。なお、絶縁膜21は駆動用回路形成域等の必要箇所
へも形成されている。
The fixed side substrate B is also made of a silicon single crystal substrate, an insulating film 21 is formed at a position facing the movable plate 12, and a fixed contact 3 made of a metal thin film is formed in a pattern on the tip region of the insulating film 21. The fixed-side drive electrode 22 made of a metal thin film is patterned in the central region. The insulating film 21 is also formed in a necessary portion such as a drive circuit formation area.

【0027】固定接点3は可動接点2と対面し、固定側
駆動電極22は可動側駆動電極16と対面するパターン
で形成されている。固定側駆動電極22も絶縁膜23で
被覆され必要な電気的絶縁が確保されている。駆動電極
22の接続ライン22aの先端は駆動電圧導入端子28
に繋がっている。なお、固定接点3の先端には接続端子
30、30がそれぞれ設けられている。また、図4にみ
るように、支持部13の底の一部が、例えば50μmほ
ど窪んでいて固定接点3の接続ラインと支持部13が接
触しないようになっている。
The fixed contact 3 faces the movable contact 2, and the fixed side driving electrode 22 is formed in a pattern facing the movable side driving electrode 16. The fixed side drive electrode 22 is also covered with the insulating film 23 to ensure the necessary electrical insulation. The tip of the connection line 22 a of the drive electrode 22 has a drive voltage introduction terminal 28.
Connected to. In addition, connection terminals 30 and 30 are provided at the tips of the fixed contacts 3, respectively. Further, as shown in FIG. 4, a part of the bottom of the support portion 13 is recessed by, for example, about 50 μm so that the connection line of the fixed contact 3 and the support portion 13 do not come into contact with each other.

【0028】可動接点2、絶縁膜15,17、駆動電極
16は、よく知られている薄膜形成プロセス、半導体プ
ロセス、フォトリソグラフィー技術等を用いて形成でき
る。また、それらの材料も、目的に応じて種々選択でき
る。固定接点3、絶縁膜21,23、可動側駆動電極2
2、端子28〜30も、やはり、よく知られている薄膜
形成プロセス、半導体プロセス、フォトリソグラフィー
技術等を用いて形成できる。また、それらの材料も、目
的に応じて種々選択できる。
The movable contact 2, the insulating films 15 and 17, and the drive electrode 16 can be formed by a well-known thin film forming process, semiconductor process, photolithography technique, or the like. Moreover, various materials can be selected according to the purpose. Fixed contact 3, insulating films 21 and 23, movable side drive electrode 2
2. The terminals 28 to 30 can also be formed by using well-known thin film forming process, semiconductor process, photolithography technique, or the like. Moreover, various materials can be selected according to the purpose.

【0029】接点2,3や駆動電極16,22は、真空
蒸着法による厚み0.5μmの金薄膜をフォトリソグラ
フィー技術でパターン化したものである。絶縁膜15,
21は、常圧CVD法で厚み1μmの酸化シリコン薄膜
を堆積しフォトリソグラフィー技術でパターン化したも
のである。絶縁膜17,23は、プラズマCVD法で厚
み1μmの酸化シリコン薄膜を堆積しフォトリソグラフ
ィー技術でパターン化したものである。端子28〜30
は、真空蒸着法による厚み1μmのアルミニウム薄膜を
フォトリソグラフィー技術でパターン化したものであ
る。
The contacts 2, 3 and the drive electrodes 16, 22 are formed by patterning a gold thin film having a thickness of 0.5 μm by a vacuum deposition method by photolithography. Insulating film 15,
21 is a silicon oxide thin film having a thickness of 1 μm deposited by atmospheric pressure CVD method and patterned by photolithography technique. The insulating films 17 and 23 are formed by depositing a silicon oxide thin film having a thickness of 1 μm by a plasma CVD method and patterning by a photolithography technique. Terminals 28-30
Is an aluminum thin film having a thickness of 1 μm formed by a vacuum evaporation method and patterned by a photolithography technique.

【0030】そして、この静電リレー1は、駆動電極1
6、22の間にエレクトレット8が設けられている。図
2にみるように、略駆動電極16、22と同程度の大き
さのエレクトレット8が絶縁膜23の上に駆動電極1
6,22に相対するようにして積まれているのである。
実施例のエレクトレット8は比誘電率が約2であってポ
リプロピレンで厚み5μmである。エレクトレット8に
保持する電荷は、そのリレーに持たせる動作状態に合わ
せて選ばれるが、この実施例の場合、エレクトレット8
の可動側駆動電極16側を負に逆の側を正に帯電させ、
かつ、それらの電荷量の合計が0となるようにしてい
る。帯電方法も色々あるが、この場合はコロナ放電を用
いる方法である。
The electrostatic relay 1 is composed of the drive electrode 1
An electret 8 is provided between 6 and 22. As shown in FIG. 2, the electret 8 having substantially the same size as the driving electrodes 16 and 22 is formed on the insulating film 23.
They are stacked so that they face each other.
The electret 8 of the example has a relative dielectric constant of about 2 and is made of polypropylene and has a thickness of 5 μm. The electric charge held in the electret 8 is selected according to the operating state of the relay, but in the case of this embodiment, the electret 8 is used.
Of the movable side drive electrode 16 side is charged negatively and the opposite side is charged positively,
At the same time, the total amount of these charges is zero. There are various charging methods, but in this case, corona discharge is used.

【0031】このようにして形成したエレクトレット8
を用いた静電リレー1は、駆動電圧を印加しない(印加
電圧0)時は接点2、3が開いた状態で安定するような
シングルモード動作を行い、可動側駆動電極16が正の
電圧となるように駆動電圧を印加すると接点が閉じる。
エレクトレット8のある分、静電力が強まることは言う
までもない。
Electret 8 thus formed
The electrostatic relay 1 using is operated in a single mode such that the contacts 2 and 3 are stable when the driving voltage is not applied (the applied voltage is 0), and the movable side driving electrode 16 has a positive voltage. When the drive voltage is applied so that the contact will be closed.
It goes without saying that the electrostatic force is increased by the presence of the electret 8.

【0032】静電力の強化に関して簡単なモデルに基づ
いて具体的に説明する。静電リレーの駆動電極とエレク
トレットまわりの構成は、図7にみるように、2枚の電
極a,bが間隔(d1 +d2 )隔てて配置され電極bの
上に厚みd2 のエレクトレットcが載った状態で近似さ
れる。但しε1 は空気の誘電率であり、ε2 はエレクト
レットcの誘電率である。σ1 , σ2 はエレクトレット
の表面電荷である。
The enhancement of the electrostatic force will be specifically described based on a simple model. As shown in FIG. 7, the configuration around the drive electrode and the electret of the electrostatic relay is such that two electrodes a and b are arranged at a distance (d 1 + d 2 ) and an electret c having a thickness d 2 is placed on the electrode b. Is approximated with the. However, ε 1 is the permittivity of air, and ε 2 is the permittivity of the electret c. σ 1 and σ 2 are the surface charges of the electret.

【0033】もし、エレクトレットcがない場合はd2
=0として、電極aに働く力Fxが Fx=−ε1 A(V/d1 2 /2 〔但し:Aは電極およびエレクトレットの面積である〕
となる。一方、エレクトレットcのある場合は、電極a
に働く力Fyが、 Fy=−ε1 A〔(Va−V)/L〕2 /2 となる。ここで、エレクトレットcが表面電荷だけをも
つものとすると、Va=σ2 2 /ε2 ,L=(ε1
2 /ε2 )+d1 であるから、Fy=−ε1 A{〔(σ
2 2 /ε2 )−V〕/〔(ε1 2 /ε2 )+
1 〕}2/2になる。
If there is no electret c, d 2
As = 0, the force Fx acting on the electrode a is Fx = -ε 1 A (V / d 1) 2/2 [where: A-is the area of the electrode and the electret]
Becomes On the other hand, when there is an electret c, the electrode a
Force acting on Fy is, Fy = -ε 1 A [(Va-V) / L] a 2/2. Here, if the electret c has only surface charges, Va = σ 2 d 2 / ε 2 , L = (ε 1 d
2 / ε 2 ) + d 1 , so Fy = −ε 1 A {[(σ
2 d 2 / ε 2) -V] / [(ε 1 d 2 / ε 2 ) +
d 1]} becomes 2/2.

【0034】さらに、σ1 +σ2 =0、σ1 >0、σ2
<0とすると、エレクトレットcの有る場合と無い場合
の比Fy/Fxは、 {〔(σ2 2 /ε2 )−V〕d1 /〔(ε1 2 /ε2 )+d1 〕V}2 ={〔(σ2 2 /ε2 V)−1〕/〔(ε1 2 /ε2 1 )+1〕〕}2 であるから、σ2 <0、V>0とすると、 1− (σ2 2 /ε2 V)>(ε1 2 /ε2 1 )+1 であるから、故に、V<−σ2 1 /ε1 の時、エレク
トレットcを設けた方が電極aに働く静電力は強くな
る。
Further, σ 1 + σ 2 = 0, σ 1 > 0, σ 2
When <0, the ratio Fy / Fx with and without the electret c is: {[(σ 2 d 2 / ε 2 ) -V] d 1 / [(ε 1 d 2 / ε 2 ) + d 1 ] Since V} 2 = {[(σ 2 d 2 / ε 2 V) -1] / [(ε 1 d 2 / ε 2 d 1 ) +1]]} 2 , σ 2 <0, V> 0. Then, since 1- (σ 2 d 2 / ε 2 V)> (ε 1 d 2 / ε 2 d 1 ) +1, therefore, when V <−σ 2 d 1 / ε 1 , the electret c is provided. The stronger the electrostatic force acting on the electrode a is when it is used.

【0035】例えば、電極間ギャップが30μmでエレ
クトレットcの無い場合のFxと電極間ギャップが50
μmで表面電荷−5×10-4C/m 2、厚み5μm、比
誘電率2のエレクトレットcが有る場合のFyは、駆動
電圧が100Vとして、 Fx=−ε1 ×A×1.1×1013÷2 Fy=−ε1 ×A×2.6×1013÷2 となり、エレクトレットcの有る場合の方が電極間ギャ
ップが大きいにもかかわらず倍以上も力が強いのであ
る。
For example, when the interelectrode gap is 30 μm and there is no electret c, Fx and the interelectrode gap are 50.
When there is an electret c having a surface charge of −5 × 10 −4 C / m 2 at μm, a thickness of 5 μm, and a relative dielectric constant of 2, Fy = −ε 1 × A × 1.1 × when the driving voltage is 100V. 10 13 ÷ 2 Fy = −ε 1 × A × 2.6 × 10 13 ÷ 2, which means that with the electret c, the force is more than twice as strong although the gap between the electrodes is larger.

【0036】続いて、駆動用回路部の説明を行う。駆動
用回路部は、固定側基体Bの一側を中心に設けられてい
る。図6は駆動用回路部の等価回路をあらわす。駆動用
回路部は、昇圧回路と放電回路を備える。昇圧回路は、
赤色系の発光ダイオード100とこの発光ダイオード1
00の光を受けて起電力を発生する多数の光電池102
・・・が多数個直列接続されたフォトセルアレイ101
とで構成されている。各光電池102はpin型アモル
ファスシリコン光電池素子を3つ積層したタンデム構成
であって、このフォトセルアレイでは30セル接続され
ている。また、放電回路は、ノーマリイオフ型NPNト
ランジスタ103、抵抗104およびダイオード(ない
しダイオードアレイ)105で構成されている。回路の
動作は前述した通りであるため省略する。なお、発光ダ
イオード100は、フォトセルアレイ101の上に、例
えば、透光性絶縁膜を介して積層したり、空間を隔てて
配置したりすることができる。さらには、発光ダイオー
ド100だけを外付にするようにしてもよい。この場合
は、昇圧回路は一部だけが内蔵という形になる。
Next, the drive circuit section will be described. The drive circuit section is provided centering on one side of the fixed-side base body B. FIG. 6 shows an equivalent circuit of the driving circuit section. The drive circuit unit includes a booster circuit and a discharge circuit. The booster circuit is
Red light emitting diode 100 and this light emitting diode 1
A large number of photovoltaic cells 102 that generate electromotive force by receiving 00 light
A large number of ... Are connected in series in the photo cell array 101.
It consists of and. Each photovoltaic cell 102 has a tandem configuration in which three pin type amorphous silicon photovoltaic cell elements are stacked, and 30 cells are connected in this photo cell array. The discharge circuit is composed of a normally-off NPN transistor 103, a resistor 104, and a diode (or diode array) 105. Since the operation of the circuit is as described above, the description thereof will be omitted. The light emitting diode 100 can be stacked on the photo cell array 101, for example, with a translucent insulating film interposed therebetween, or can be arranged with a space. Further, only the light emitting diode 100 may be externally attached. In this case, only a part of the booster circuit is built-in.

【0037】最後に静電リレーの動作を説明する。発光
ダイオード100に信号電圧が印加されると、フォトセ
ルアレイ101に駆動電圧が発生し、これが可動側基体
Aの駆動電極16と固定側基体Bの駆動電極22の間に
印加されると同時にトランジスタ103がオフになり、
駆動電圧印加による静電力で可動板12が固定側基体B
に近づいて接点2、3が接触する。発光ダイオード10
0に信号電圧が印加されなくなると、フォトセルアレイ
101での電圧発生が停止するとともにトランジスタ1
03がオンになり、蓄積電荷が放電され静電力が消滅
し、可動板12が自身のバネ性で元の水平状態に復元す
ることにより固定側基体Bから遠ざかり接点2、3が離
れる。
Finally, the operation of the electrostatic relay will be described. When a signal voltage is applied to the light emitting diode 100, a drive voltage is generated in the photocell array 101, which is applied between the drive electrode 16 of the movable side base A and the drive electrode 22 of the fixed side base B, and at the same time, the transistor 103. Turned off,
The movable plate 12 is fixed to the base body B by the electrostatic force generated by applying the driving voltage.
The contacts 2 and 3 come into contact with each other. Light emitting diode 10
When the signal voltage is not applied to 0, the voltage generation in the photo cell array 101 is stopped and the transistor 1
03 is turned on, the accumulated charge is discharged, the electrostatic force disappears, and the movable plate 12 returns to the original horizontal state by its own spring property, so that the contacts 2 and 3 separate from the fixed-side base body B.

【0038】[0038]

【発明の効果】以上に述べたように、請求項1〜5記載
の発明にかかる静電リレーでは、熱衝撃を受けた際の歪
みや応力が小さくなるために熱衝撃に対し強くなり、外
部の電磁界の影響が軽減されるために外的要因による誤
動作が起り難くなっており、さらに、固定側駆動電極と
可動側駆動電極の間にはエレクトレットがあって静電力
が増すため、その分、駆動電圧を下げたり、接点ギャッ
プを大きくし接点間耐圧の向上を図ったりすることがで
きるから、大変に実用性が高い。
As described above, in the electrostatic relay according to the invention described in claims 1 to 5, since the strain and the stress upon receiving the thermal shock are reduced, the electrostatic relay is strong against the thermal shock and the external Since the influence of the electromagnetic field is reduced, malfunctions due to external factors are less likely to occur.Furthermore, there is an electret between the fixed-side drive electrode and the movable-side drive electrode, which increases electrostatic force. In addition, the drive voltage can be lowered and the contact gap can be increased to improve the breakdown voltage between contacts, which is extremely practical.

【0039】請求項2記載の静電リレーの場合は、熱衝
撃を受けた際の歪みや応力が極めて小さくなるため、熱
衝撃に対し著しく強く、また、駆動用回路部の素子の形
成に基板がそのまま利用でき、駆動回路も含め全体を極
めて小型のものにすることが可能となるという利点があ
る。請求項3記載の静電リレーの場合は、外部の電磁界
の影響が極めて少なく外的要因による誤動作が非常に起
り難くなるという利点がある。
In the case of the electrostatic relay according to the second aspect, since the strain and the stress upon receiving the thermal shock are extremely small, it is extremely strong against the thermal shock, and the substrate is used for forming the element of the driving circuit section. Can be used as it is, and there is an advantage that the entire size including the drive circuit can be made extremely small. In the case of the electrostatic relay according to the third aspect, there is an advantage that the influence of the external electromagnetic field is extremely small and the malfunction due to the external factor is extremely unlikely to occur.

【0040】請求項4記載の静電リレーの場合は、両基
体の間が常に電界がかからない状態が維持されるため、
非常に安定性が高いという利点がある。請求項5記載の
静電リレーの場合は、駆動用回路部が基体に設けられて
いる分、外付回路の付加が省略ないし軽減できることか
ら、使いやすいという利点がある。
In the case of the electrostatic relay according to the fourth aspect, since a state in which no electric field is applied between the two bases is always maintained,
It has the advantage of being very stable. In the case of the electrostatic relay according to the fifth aspect, since the drive circuit portion is provided on the base body, the addition of an external circuit can be omitted or reduced, which is advantageous in that it is easy to use.

【図面の簡単な説明】[Brief description of drawings]

【図1】実施例にかかる静電リレーの要部構成をあらわ
す断面図である。
FIG. 1 is a cross-sectional view showing a configuration of a main part of an electrostatic relay according to an embodiment.

【図2】実施例の静電リレーを上方からみた状態をあら
わす平面図である。
FIG. 2 is a plan view showing a state of the electrostatic relay of the embodiment as viewed from above.

【図3】実施例の静電リレーの駆動用回路部の詳細をあ
らわす平面図である。
FIG. 3 is a plan view showing details of a driving circuit portion of the electrostatic relay of the embodiment.

【図4】図2のX−X断面図である。FIG. 4 is a sectional view taken along line XX of FIG.

【図5】この発明の静電リレーの駆動用回路部の構成例
をあらわすブロック図である。
FIG. 5 is a block diagram showing a configuration example of a driving circuit unit of the electrostatic relay of the present invention.

【図6】この発明の静電リレーの駆動用回路部の具体的
構成例をあらわす回路図である。
FIG. 6 is a circuit diagram showing a specific configuration example of a drive circuit portion of the electrostatic relay of the present invention.

【図7】静電リレーの駆動電極とエレクトレットまわり
のモデル構成をあらわす概略断面図である。
FIG. 7 is a schematic cross-sectional view showing a model configuration around a drive electrode and an electret of an electrostatic relay.

【図8】従来の静電リレーをあらわす平面図である。FIG. 8 is a plan view showing a conventional electrostatic relay.

【図9】従来の静電リレーをあらわす断面図である。FIG. 9 is a sectional view showing a conventional electrostatic relay.

【符号の説明】[Explanation of symbols]

1 静電リレー 2 可動接点 3 固定接点 8 エレクトレット 12 可動部 13 支持部 16 可動側駆動電極 22 固定側駆動電極 A 可動側基体 B 固定側基体 1 electrostatic relay 2 movable contacts 3 fixed contacts 8 electrets 12 Moving part 13 Support 16 Movable side drive electrode 22 Fixed side drive electrode A movable base B Fixed side substrate

─────────────────────────────────────────────────────
─────────────────────────────────────────────────── ───

【手続補正書】[Procedure amendment]

【提出日】平成3年9月11日[Submission date] September 11, 1991

【手続補正1】[Procedure Amendment 1]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0017[Correction target item name] 0017

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【0017】駆動回路部は、上記のものに限らない。例
えば、昇圧回路として、n個のダイオードとn個のコン
デンサを直並列接続したチャージポンプ式の回路や薄膜
トランスとダイオードとコンデンサの整流部を組み合わ
せた薄膜トランス型整流昇圧回路などが使える。この発
明の静電リレーは、上記の構成に限らない。例えば、可
動・固定の駆動電極の一方は基体の絶縁膜上に設ける
が、他方の駆動電極は導電性基体自身の全体ないし一部
で構成するようにしてもよい。この場合は、駆動電極や
その上を覆う絶縁膜の形成工程が省けるため、製造工程
の簡素化・コストダウンが図れるという利点が出てく
る。
The drive circuit section is not limited to the above. For example, as the booster circuit, a charge pump type circuit in which n diodes and n capacitors are connected in series and parallel, or a thin film transformer type rectifier booster circuit in which a thin film transformer and a rectifying unit of a diode and a capacitor are combined can be used. The electrostatic relay of this invention is not limited to the above configuration. For example, one of the movable and fixed drive electrodes is provided on the insulating film of the base, but the other drive electrode may be formed by the whole or a part of the conductive base itself. In this case, since the step of forming the drive electrode and the insulating film covering the drive electrode can be omitted, there is an advantage that the manufacturing process can be simplified and the cost can be reduced.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 西村 広海 大阪府門真市大字門真1048番地松下電工株 式会社内 (72)発明者 笠野 文宏 大阪府門真市大字門真1048番地松下電工株 式会社内 (72)発明者 粟井 崇善 大阪府門真市大字門真1048番地松下電工株 式会社内   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Hiromi Nishimura             1048, Kadoma, Kadoma-shi, Osaka Matsushita Electric Works Co., Ltd.             Inside the company (72) Inventor Fumihiro Kasano             1048, Kadoma, Kadoma-shi, Osaka Matsushita Electric Works Co., Ltd.             Inside the company (72) Inventor Takayoshi Awai             1048, Kadoma, Kadoma-shi, Osaka Matsushita Electric Works Co., Ltd.             Inside the company

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 可動側基体の裏側に設けられた可動接点
と固定側基体の表側に設けられた固定接点が対面するよ
うにして前記可動側基体と固定側基体とが配置され、前
記可動側基体が裏面に前記可動接点を有する可動部とこ
の可動部を可動接点と固定接点が接離する変位可能に支
持する支持部とを備えており、前記両基体における駆動
電極への駆動電圧印加により発生する静電力で前記可動
部が変位して接点の接離がなされるようになっている静
電リレーにおいて、前記可動側基体と固定側基体とがと
もに導電性材料からなっており、固定側駆動電極と可動
側駆動電極の間に変位の際の静電力を強めるエレクトレ
ットが設けられていることを特徴とする静電リレー。
1. The movable side base and the fixed side base are arranged so that the movable contact provided on the back side of the movable side base and the fixed contact provided on the front side of the fixed side base face each other, and the movable side. The base body includes a movable portion having the movable contact on the back surface and a support portion that movably supports the movable portion such that the movable contact and the fixed contact come in contact with each other. By applying a drive voltage to the drive electrodes of both the base bodies, In an electrostatic relay in which the movable portion is displaced by the generated electrostatic force to bring the contacts into and out of contact with each other, both the movable side base body and the fixed side base body are made of a conductive material, and the fixed side An electrostatic relay characterized in that an electret for enhancing electrostatic force at the time of displacement is provided between the drive electrode and the movable drive electrode.
【請求項2】 可動側基体と固定側基体がシリコン基板
である請求項1記載の静電リレー。
2. The electrostatic relay according to claim 1, wherein the movable side base body and the fixed side base body are silicon substrates.
【請求項3】 可動側基体の表面には絶縁膜が形成され
ていて、その上に可動接点と可動側駆動電極が形成され
ており、固定側基体の表面には絶縁膜が形成されてい
て、その上に固定接点と固定側駆動電極が形成されてい
る請求項1または2記載の静電リレー。
3. An insulating film is formed on the surface of the movable side substrate, a movable contact and a movable side drive electrode are formed thereon, and an insulating film is formed on the surface of the fixed side substrate. The electrostatic relay according to claim 1 or 2, wherein a fixed contact and a fixed side drive electrode are formed on the fixed contact.
【請求項4】 可動側基体と固定側基体が電気的に接続
され同電位となっている請求項1から3までのいずれか
に記載の静電リレー。
4. The electrostatic relay according to claim 1, wherein the movable side base and the fixed side base are electrically connected and have the same potential.
【請求項5】 可動側基体および/または固定側基体に
駆動用回路部が設けられている請求項1から4までのい
ずれかに記載の静電リレー。
5. The electrostatic relay according to claim 1, wherein a drive circuit section is provided on the movable side base body and / or the fixed side base body.
JP15191991A 1991-06-24 1991-06-24 Electrostatic relay Pending JPH052973A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15191991A JPH052973A (en) 1991-06-24 1991-06-24 Electrostatic relay

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15191991A JPH052973A (en) 1991-06-24 1991-06-24 Electrostatic relay

Publications (1)

Publication Number Publication Date
JPH052973A true JPH052973A (en) 1993-01-08

Family

ID=15529070

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15191991A Pending JPH052973A (en) 1991-06-24 1991-06-24 Electrostatic relay

Country Status (1)

Country Link
JP (1) JPH052973A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6875936B1 (en) 1998-12-22 2005-04-05 Nec Corporation Micromachine switch and its production method
US7113321B2 (en) 2003-04-15 2006-09-26 Ricoh Company, Ltd. Optical deflection apparatus and manufacturing method thereof, optical deflection array, imaging apparatus, and image projection display apparatus
US7439547B2 (en) 2002-07-15 2008-10-21 Kabushiki Kaisha Toshiba Micro electro mechanical system apparatus
JP2009152195A (en) * 2007-12-20 2009-07-09 General Electric Co <Ge> MEMS microswitch with dual actuator and shared gate
JP2015015198A (en) * 2013-07-05 2015-01-22 富士通株式会社 MEMS module and method for manufacturing MEMS module

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6875936B1 (en) 1998-12-22 2005-04-05 Nec Corporation Micromachine switch and its production method
US7439547B2 (en) 2002-07-15 2008-10-21 Kabushiki Kaisha Toshiba Micro electro mechanical system apparatus
US7113321B2 (en) 2003-04-15 2006-09-26 Ricoh Company, Ltd. Optical deflection apparatus and manufacturing method thereof, optical deflection array, imaging apparatus, and image projection display apparatus
JP2009152195A (en) * 2007-12-20 2009-07-09 General Electric Co <Ge> MEMS microswitch with dual actuator and shared gate
JP2015015198A (en) * 2013-07-05 2015-01-22 富士通株式会社 MEMS module and method for manufacturing MEMS module

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