JPH052264A - Pellicle - Google Patents

Abstract

(57) [Summary] [Object] To obtain a pellicle capable of easily performing the work of peeling the pellicle from the mask for replacement of the pellicle and reducing the contamination of the mask in this work. A pellicle according to the present invention has a groove 4 on a mounting surface of a pellicle frame 2, and an opening 5 communicating with the groove 4.
When the pellicle is peeled from the photomask by providing the above, the peeling agent is injected from the opening 5 and the peeling agent is selectively permeated into the adhesive tape 3 to peel the pellicle from the photomask.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pellicle used to prevent foreign matter from adhering to a photomask.

[0002]

2. Description of the Related Art FIG. 3 is a sectional view showing a conventional pellicle. In the figure, 1 is a transparent film made of a polymer material such as nitrocellulose having a thickness of 2 to 3 mm, and 2 is an alumite for fixing the film 1. A pellicle frame 3 made of, for example, is an adhesive tape adhered to the lower surface of the pellicle frame 2 for attaching the pellicle to a photomask (not shown),
The lower surface of the pellicle 2 forms an adhesive surface by this adhesive tape.

A conventional pellicle is constructed as described above,
By mounting the pellicle on the photomask with the adhesive tape 3, contamination of the photomask surface is prevented, and the influence of fine particles during transfer due to the contamination is reduced.

[0004]

Since the conventional pellicle is configured as described above, when the pellicle is peeled off from the photomask for replacement of the pellicle due to damage of the film 1 or the like, the adhesive tape 3 is used. Since the pellicle is attached to the photomask in step 3, it is not easy to peel off the pellicle.
There was a problem that it was easily contaminated with debris and the like. Further, the conventional mechanical peeling method is used to replace the damaged pellicle, but there is a problem that the photomask cannot be used because the glass substrate of the photomask is scratched.

The present invention has been made to solve the above problems, and an object of the present invention is to obtain a pellicle which can easily peel off a pellicle from a photomask and has less contamination of the photomask at the time of peeling. .

[0006]

A pellicle according to the present invention has a groove formed on an adhesive surface such as a pellicle frame and an opening communicating with the groove.

[0007]

In the present invention, when peeling the pellicle from the photomask, by injecting the peeling agent from the opening, the peeling agent penetrates into the adhesive surface and the pellicle is easily peeled off.

[0008]

【Example】

Example 1. FIG. 1 is a cross-sectional view showing an embodiment of the present invention, 4 is a groove portion formed along the entire circumference of the lower surface of the pellicle frame 2, and 5 is an opening portion formed outward from the groove portion. .

When the pellicle configured as described above is to be peeled off from the photomask, by injecting the peeling agent from the opening 5, the peeling agent penetrates into the adhesive tape 3, whereby the adhesive tape 3 is used. When the mounting is released, the pellicle is peeled off from the photomask. Since the release agent is an organic solvent or the like, it can be easily injected through the opening 5 by using a syringe or the like, and the adhesive agent used for the adhesive tape 3 is easily dissolved in the organic solvent and bonded. Lose power. Therefore, the pellicle frame 2 made of metal such as alumite can be easily removed.

[0010]

As described above, according to the pellicle of the present invention, the release agent is injected from the opening of the pellicle frame, and the release agent selectively permeates the adhesive surface. It can be peeled off more easily than the mask, and there is an effect that the contamination of the mask when peeling the pellicle can be reduced. Also,
Compared with the mechanical peeling method, there is also an effect that the possibility of scratching the mask surface is reduced.

[Brief description of drawings]

FIG. 1 is a sectional view showing a pellicle according to an embodiment of the present invention.

FIG. 2 is a perspective view of the pellicle of FIG.

FIG. 3 is a cross-sectional view showing an example of a conventional pellicle.

[Explanation of symbols]

 2 Pellicle part 3 Adhesive tape 4 Groove part 5 Opening part

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[Procedure amendment]

[Submission date] June 19, 1992

[Procedure Amendment 1]

[Document name to be amended] Statement

[Name of item to be corrected] 0002

[Correction method] Change

[Correction content]

[0002]

2. Description of the Related Art FIG. 3 is a sectional view showing a conventional pellicle. In FIG. 3, 1 is a transparent film made of a polymer material such as nitrocellulose having a thickness of 2 to 3 μm , and 2 is a film 1 fixed. A pellicle frame 3 made of alumite or the like is an adhesive tape adhered to the lower surface of the pellicle frame 2 for attaching the pellicle to a photomask (not shown),
The lower surface of the pellicle 2 forms an adhesive surface by this adhesive tape.

Claims (1)

Claim: What is claimed is: 1. In a pellicle used for adhering a pellicle frame to a mask to prevent foreign matter from adhering to the mask, a groove is formed on the adhering surface of the pellicle frame, and the groove is formed in the groove. A pellicle characterized by having an opening communicating therewith.