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JPH05211386A - Printed wiring board and manufacture thereof - Google Patents

Printed wiring board and manufacture thereof

Info

Publication number
JPH05211386A
JPH05211386A JP888792A JP888792A JPH05211386A JP H05211386 A JPH05211386 A JP H05211386A JP 888792 A JP888792 A JP 888792A JP 888792 A JP888792 A JP 888792A JP H05211386 A JPH05211386 A JP H05211386A
Authority
JP
Japan
Prior art keywords
layer
copper
hole
nickel
wiring board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP888792A
Other languages
Japanese (ja)
Inventor
Masao Ishibashi
正朗 石橋
Akira Maniwa
亮 馬庭
Koichi Hirozawa
孝一 廣澤
Keisuke Okada
圭祐 岡田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP888792A priority Critical patent/JPH05211386A/en
Publication of JPH05211386A publication Critical patent/JPH05211386A/en
Withdrawn legal-status Critical Current

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  • Parts Printed On Printed Circuit Boards (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To protect a copper layer located under a nickel layer against corrosion caused by a solder layer in a soldering process such at reflow soldering by a method wherein a front and a rear outer layer and a conductor formed on both the front and the rear outer layer and inside a through-hole are of three-layered structure composed of copper-nickel-copper. CONSTITUTION:A copper foil 2 is pasted on the surface of an insulating board 1 to form a copper plated board. A nickel electroplating layer 5 is provided to both the sides of the board 1 as thick as 2mum through watt bath. A through- hole 11 is selectively provided. A copper plating layer 3 is formed as thick as 24mum on all the surface of the inner wall of the through-hole 11 and the nickel layer 5 through an electroplating method with copper sulfate solution. An etching resist film 12 is selectively formed through a conventional tenting method with dry film. The copper plating layer 3, the nickel plating layer 5, and the copper foil 2 are successively etched with cupric chloride solution to obtain a pad 7, a circuit 8, and a through-hole 4. A solder resist film 9 is applied through a screen printing method.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は印刷配線板およびその製
造方法に関し、特に表面実装に用いる印刷配線板および
その製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a printed wiring board and a manufacturing method thereof, and more particularly to a printed wiring board used for surface mounting and a manufacturing method thereof.

【0002】[0002]

【従来の技術】従来の印刷配線板は、表裏外層面のパッ
ド,回路等は銅箔及び銅めっき層の銅を用いて形成さ
れ、スルーホールは銅めっき層により形成されている。
このように印刷配線板の表裏の外装面及びスルーホール
を形成する全ての導体部が電気伝導性に優れ、安価で加
工し易く、良好なはんだ付け性を示す銅より構成されて
いた。
2. Description of the Related Art In a conventional printed wiring board, pads and circuits on the front and back outer layers are formed by using copper foil and copper of a copper plating layer, and through holes are formed by a copper plating layer.
In this way, all the conductor parts forming the front and back exterior surfaces of the printed wiring board and the through holes are made of copper which has excellent electrical conductivity, is inexpensive and easy to process, and has good solderability.

【0003】図8(a)〜(f)は従来の印刷配線板の
製造方法を説明する工程順に示した断面図である。
FIGS. 8A to 8F are cross-sectional views showing a method of manufacturing a conventional printed wiring board in the order of steps.

【0004】まず、図8(a)に示すように、絶縁基板
1の表面に銅箔2を積層により張り合わせる。
First, as shown in FIG. 8A, a copper foil 2 is laminated on the surface of an insulating substrate 1 by lamination.

【0005】次に、図8(b)に示すように、選択的に
穿孔して貫通孔11を形成する。
Next, as shown in FIG. 8B, a through hole 11 is formed by selectively punching.

【0006】次に、図8(c)に示すように、パネルめ
っき工法にて表裏の銅箔2及び貫通孔11の内壁を含む
表面に銅めっき層3を形成する。
Next, as shown in FIG. 8C, a copper plating layer 3 is formed on the surface including the front and back copper foils 2 and the inner walls of the through holes 11 by a panel plating method.

【0007】次に、図8(d)に示すように、ドライフ
ィルムを用いて選択的にエッチングレジスト膜12を形
成する。
Next, as shown in FIG. 8D, an etching resist film 12 is selectively formed using a dry film.

【0008】次に、図8(e)に示すように、エッチン
グレジスト膜12をマスクとして銅めっき層3及び銅箔
2を順次エッチングした後、エッチングレジスト12を
剥離することにより所望のパッド7,回路8及びスルー
ホール4を得る。
Next, as shown in FIG. 8E, the copper plating layer 3 and the copper foil 2 are sequentially etched using the etching resist film 12 as a mask, and then the etching resist 12 is peeled off to remove the desired pad 7, A circuit 8 and a through hole 4 are obtained.

【0009】次に、図8(f)に示すように、選択的に
ソルダレジスト膜9を形成し所望の印刷配線板10を構
成する。
Next, as shown in FIG. 8F, a solder resist film 9 is selectively formed to form a desired printed wiring board 10.

【0010】[0010]

【発明が解決しようとする課題】上述した従来の印刷配
線板は、フローソルダ等のはんだ付けを複数回行うとス
ルーホール開口部の銅層がはんだ拡散することにより銅
層が薄化し、スルーホール断線が発生しやすい等、接続
信頼性の問題が生じるためはんだ付の回数が制限され、
また、表面実装部品を搭載した場合、再度リフローソル
ダ、又は、手付け等の手法によるリペア工事を行うと部
品実装用パッドの銅層がはんだに拡散することにより銅
層が薄化、ないしは、最悪の場合消失し、表面実装部品
とパッドとの接続信頼性が低下するためリペア工事の回
数が制限されるという問題点があった。
In the above-mentioned conventional printed wiring board, when the soldering such as the flow soldering is performed a plurality of times, the copper layer in the through hole opening is diffused by the solder and the copper layer is thinned, resulting in the breakage of the through hole. The number of soldering operations is limited due to problems in connection reliability, such as
Also, when surface-mounted components are mounted, if repair work is performed again by a method such as reflow soldering or hand-mounting, the copper layer of the component mounting pads diffuses into the solder, and the copper layer becomes thin, or the worst case occurs. In this case, the reliability of the connection between the surface mount component and the pad is reduced, and the number of repair works is limited.

【0011】本発明の目的は、スルーホール開口部及び
部品実装用パッドの銅層がはんだに拡散することによる
銅層の薄化を防止し、接続信頼性の高い印刷配線板およ
びその製造方法を提供することにある。
An object of the present invention is to prevent a thinned copper layer of a through hole opening and a copper layer of a component mounting pad from diffusing into solder, and to provide a printed wiring board having high connection reliability and a method of manufacturing the same. To provide.

【0012】[0012]

【課題を解決するための手段】本発明の印刷配線板は、
絶縁基板に形成された導体層が順次積層して設けた下層
の銅層,中間層のニッケル層,上層の銅層の3層構造を
有する。
The printed wiring board of the present invention comprises:
It has a three-layer structure of a lower copper layer, an intermediate nickel layer, and an upper copper layer, which are formed by sequentially stacking conductor layers formed on an insulating substrate.

【0013】第1の発明の印刷配線板は、絶縁基板の表
裏外層面に形成された前記導体層が順次積層して設けた
下層の銅層,中間層のニッケル層,上層の銅層の3層構
造を有する。
The printed wiring board according to the first aspect of the present invention comprises a lower copper layer, an intermediate nickel layer, and an upper copper layer formed by sequentially laminating the conductor layers formed on the front and back outer layers of the insulating substrate. It has a layered structure.

【0014】第1の発明の印刷配線板の製造方法は、銅
張り積層板の表裏外層面全面にニッケル層をめっき形成
する工程と、前記銅張り積層板を選択的に穿孔して貫通
孔を形成する工程と、該貫通孔の内面と前記ニッケル層
上全面に銅めっき層を形成する工程と、下層の銅層,中
間層のニッケル層,上層の銅層の3層構造のパターンを
形する工程とを含んで構成される。
The method of manufacturing a printed wiring board according to the first aspect of the present invention comprises a step of forming a nickel layer on the entire front and back outer surface of the copper-clad laminate by plating, and selectively punching the copper-clad laminate to form through holes. Forming step, forming an inner surface of the through hole and a copper plating layer on the entire surface of the nickel layer, and forming a pattern of a three-layer structure of a lower copper layer, an intermediate nickel layer, and an upper copper layer And a process.

【0015】第2の発明の印刷配線板は、絶縁基板の表
裏外層面全面とスルーホール内面に形成された前記導体
層が順次積層して設けた下層の銅層,中間層のニッケル
層,上層の銅層の3層構造を有する。
A printed wiring board according to a second aspect of the present invention comprises a lower copper layer, an intermediate nickel layer, and an upper layer formed by sequentially stacking the conductor layers formed on the entire front and back outer layers of the insulating substrate and the through hole inner surface. The copper layer has a three-layer structure.

【0016】第2の発明の印刷配線板の製造方法は、銅
張り積層板を選択的に穿孔して貫通孔を形成し該貫通孔
内面に銅めっきを施しスルーホールを形成する工程と、
銅層をパターニングし所定の回路を形成する工程と、該
回路上と前記スルーホール内面の銅層上にニッケルめっ
きによりニッケル層を形成する工程と、無電解厚付銅め
っきにより前記ニッケル層上に銅層を形成する工程と、
選択的にソルダレジストを塗布する工程とを含んで構成
される。
A method of manufacturing a printed wiring board according to a second aspect of the present invention includes a step of selectively punching a copper-clad laminate to form a through hole, and plating the inner surface of the through hole with copper to form a through hole.
Forming a predetermined circuit by patterning a copper layer, forming a nickel layer on the copper layer on the circuit and on the inner surface of the through hole by nickel plating, and forming a nickel layer on the nickel layer by electroless thick copper plating A step of forming a copper layer,
And a step of selectively applying a solder resist.

【0017】[0017]

【実施例】次に、第1の発明の第1の実施例の製造方法
について図面を参照して説明する。
Next, a manufacturing method of a first embodiment of the first invention will be described with reference to the drawings.

【0018】図1(a)〜(g)は第1の発明の第1の
実施例の製造方法を説明する工程順に示した断面図であ
る。
FIGS. 1A to 1G are sectional views showing the manufacturing method of the first embodiment of the first invention in the order of steps for explaining the manufacturing method.

【0019】まず、図1(a)に示すように、絶縁基板
1の表面に銅箔2を張り合わせた銅張り積層板を形成す
る。
First, as shown in FIG. 1A, a copper-clad laminate is formed by laminating a copper foil 2 on the surface of an insulating substrate 1.

【0020】次に、図1(b)に示すように、表裏全面
にワット浴を用い約2μmの電気ニッケルめっきを施
し、ニッケルめっき層5を形成する。
Next, as shown in FIG. 1B, a nickel plating layer 5 is formed by subjecting the entire front and back surfaces to electroplating with nickel of about 2 μm using a Watts bath.

【0021】次に、図1(c)に示すように、選択的に
穿孔して貫通孔1を設ける。
Next, as shown in FIG. 1C, a through hole 1 is provided by selectively punching.

【0022】次に、図1(d)に示すように、貫通孔1
1内壁とニッケル層5の表面に、硫酸銅溶液による電気
めっき法により全面に約25μmの銅めっき層3を形成
する。
Next, as shown in FIG. 1D, the through hole 1
1. On the inner wall and the surface of the nickel layer 5, a copper plating layer 3 having a thickness of about 25 μm is formed on the entire surface by an electroplating method using a copper sulfate solution.

【0023】次に、図1(e)に示すように、通常のテ
ンティング法に従いドライフィルムを用いエッチングレ
ジスト膜12を選択的に形成する。
Next, as shown in FIG. 1E, an etching resist film 12 is selectively formed using a dry film according to a normal tenting method.

【0024】次に、図1(f)に示すように、塩化第二
銅溶液を用いて銅めっき層3,ニッケルめっき層5及び
銅箔2を順次エッチングしてパッド7,回路8及びスル
ーホール4を得る。
Next, as shown in FIG. 1 (f), the copper plating layer 3, the nickel plating layer 5 and the copper foil 2 are sequentially etched using a cupric chloride solution to form pads 7, circuits 8 and through holes. Get 4.

【0025】次に、図1(g)に示すように、ソルダレ
ジスト膜9をスクリーン印刷法により露出した絶縁基板
1の表面及び配線7の表面に塗布し印刷配線板を構成す
る。
Next, as shown in FIG. 1G, a solder resist film 9 is applied to the exposed surface of the insulating substrate 1 and the surface of the wiring 7 by a screen printing method to form a printed wiring board.

【0026】図2(a)〜(d)及び図3(a),
(b)は第1の発明の第2の実施例の製造方法を説明す
る工程順に示した断面図である。
2 (a)-(d) and FIG. 3 (a),
(B) It is sectional drawing shown in order of a process explaining the manufacturing method of the 2nd Example of 1st invention.

【0027】まず、図2(a)に示すように、第1の実
施例と同様の工程により絶縁基板1及び銅箔2からなる
銅張り積層板にニッケルめっき層5及び貫通孔11を形
成した後、パネルめっき法にて厚み約10μmの銅めっ
き層3を形成する。
First, as shown in FIG. 2A, a nickel plating layer 5 and a through hole 11 were formed in a copper-clad laminate consisting of an insulating substrate 1 and a copper foil 2 by the same steps as in the first embodiment. After that, a copper plating layer 3 having a thickness of about 10 μm is formed by a panel plating method.

【0028】次に、図2(b)に示すように、銅めっき
3上にドライフィルムにてめっきレジスト膜14を選択
的に形成する。
Next, as shown in FIG. 2B, a plating resist film 14 is selectively formed on the copper plating 3 by a dry film.

【0029】次に、図2(c)に示すように、めっきレ
ジスト膜14をマスクとして硫酸銅溶液による電気めっ
き法により銅めっき層3の上に銅めっき層13を約15
μm施す。
Next, as shown in FIG. 2C, about 15 copper plating layers 13 are formed on the copper plating layers 3 by electroplating with a copper sulfate solution using the plating resist film 14 as a mask.
Apply μm.

【0030】次に、図2(d)に示すように、銅めっき
層13の上にはんだ層16を積層して設ける。
Next, as shown in FIG. 2D, a solder layer 16 is laminated on the copper plating layer 13 and provided.

【0031】次に、図3(a)に示すように、めっきレ
ジスト膜14を除去した後、はんだ層16をマスクとし
て塩化第二銅溶液で積層された銅めっき層3,ニッケル
めっき層5,銅箔2をエッチングしパッド7,回路8及
びスルーホール4を得る。
Next, as shown in FIG. 3A, after removing the plating resist film 14, a copper plating layer 3, a nickel plating layer 5, and a nickel plating layer 5, which are laminated with a cupric chloride solution using the solder layer 16 as a mask. The copper foil 2 is etched to obtain pads 7, circuits 8 and through holes 4.

【0032】次に図3(b)に示すように、ソルダレジ
スト膜9をスクリーン印刷法にて選択的に塗布し印刷配
線板を構成する。
Next, as shown in FIG. 3B, a solder resist film 9 is selectively applied by a screen printing method to form a printed wiring board.

【0033】次に、第2の発明の第1の実施例の製造方
法について図面を参照して説明する。
Next, a manufacturing method of the first embodiment of the second invention will be described with reference to the drawings.

【0034】図4(a)〜(f)及び図5(a),
(b)は第2の発明の第1の実施例の製造方法を説明す
る工程順に示した断面図である。
4A to 4F and FIG. 5A,
(B) It is sectional drawing shown in order of a process explaining the manufacturing method of the 1st Example of 2nd invention.

【0035】まず、図4(a)に示すように、絶縁基板
1の表面に、銅箔2を積層により張り合わせた銅張り積
層板を形成する。
First, as shown in FIG. 4 (a), a copper clad laminate is formed by laminating copper foils 2 on the surface of an insulating substrate 1 by laminating.

【0036】次に、図4(b)に示すように、選択的に
穿孔して貫通孔11を設ける。
Next, as shown in FIG. 4B, the through holes 11 are provided by selectively punching.

【0037】次に、図4(c)に示すように、薄付け無
電解銅めっきを施した後、硫酸銅溶液による電気めっき
法により貫通孔11内壁を含む全面に約25μmの銅め
っき層3を形成する。
Next, as shown in FIG. 4C, after applying thin electroless copper plating, a copper plating layer 3 of about 25 μm is formed on the entire surface including the inner wall of the through hole 11 by electroplating with a copper sulfate solution. To form.

【0038】次に、図4(d)に示すように、通常のテ
ンティング法に伴いドライフィルムを用いエッチングレ
ジスト膜12を選択的に形成する。
Next, as shown in FIG. 4D, an etching resist film 12 is selectively formed by using a dry film in accordance with the usual tenting method.

【0039】次に、図4(e)に示すように、塩化第二
銅溶液を用いて銅めっき層3,銅箔2を順次エッチング
してパッド7,回路8及びスルーホール4を得る。
Next, as shown in FIG. 4 (e), the copper plating layer 3 and the copper foil 2 are sequentially etched using a cupric chloride solution to obtain pads 7, circuits 8 and through holes 4.

【0040】次に、図4(f)に示すように、無電解ニ
ッケルめっきを施し銅めっき層3上に積層してニッケル
めっき層5を約3μm形成する。
Next, as shown in FIG. 4 (f), electroless nickel plating is performed and laminated on the copper plating layer 3 to form a nickel plating layer 5 of about 3 μm.

【0041】次に、図5(a)に示すように、厚付無電
解銅めっき法によりニッケルめっき層5上に選択的に厚
み5μmの無電解銅めっき層6を形成する。
Next, as shown in FIG. 5A, an electroless copper plating layer 6 having a thickness of 5 μm is selectively formed on the nickel plating layer 5 by a thick electroless copper plating method.

【0042】次に、図5(b)に示すように、ホトSR
等によりソルダレジスト膜9を形成し印刷配線板10を
構成する。
Next, as shown in FIG. 5B, the photo SR
The printed wiring board 10 is formed by forming the solder resist film 9 by the above method.

【0043】次に、第2の発明の第2の実施例の製造方
法について図面を参照し説明する。
Next, a manufacturing method of the second embodiment of the second invention will be described with reference to the drawings.

【0044】図6(a)〜(e)及び図7(a)〜
(c)は第2の発明の第2の実施例の製造方法を説明す
る工程順に示した断面図である。
6A to 6E and 7A to 7A.
(C) It is sectional drawing shown in order of a process explaining the manufacturing method of the 2nd Example of 2nd invention.

【0045】まず、図6(a)に示すように、絶縁基板
1の表面に銅箔2を張り合わせた銅張り積層板を形成す
る。
First, as shown in FIG. 6A, a copper-clad laminate is formed by laminating a copper foil 2 on the surface of an insulating substrate 1.

【0046】次に、図6(b)に示すように、選択的に
穿孔して貫通孔11を設ける。
Next, as shown in FIG. 6B, the through holes 11 are provided by selectively punching.

【0047】次に、図6(c)に示すように、パネルめ
っき法にて厚み約10μmの銅めっき層3を形成する。
Next, as shown in FIG. 6C, a copper plating layer 3 having a thickness of about 10 μm is formed by a panel plating method.

【0048】次に、図6(d)に示すように、銅めっき
層3上にドライフィルムにてめっきレジスト膜14を選
択的に形成する。
Next, as shown in FIG. 6D, a plating resist film 14 is selectively formed on the copper plating layer 3 by a dry film.

【0049】次に、図6(e)に示すように、めっきレ
ジスト膜14をマスクとして硫酸銅溶液による電気めっ
き法により銅めっき層3上に銅めっき層13を約10μ
m施す。
Next, as shown in FIG. 6 (e), a copper plating layer 13 is formed on the copper plating layer 3 to a thickness of about 10 μm by electroplating with a copper sulfate solution using the plating resist film 14 as a mask.
m.

【0050】次に、図7(a)に示すように、電解はん
だめっき法を用い銅めっき層13上にはんだ層16を施
すことによりエッチングレジスト層を形成する。
Next, as shown in FIG. 7A, an etching resist layer is formed by applying a solder layer 16 on the copper plating layer 13 using an electrolytic solder plating method.

【0051】次に、図7(b)に示すように、めっきレ
ジスト層14を除去した後、塩化第二銅溶液で積層され
た銅めっき層13,3及び銅箔2をエッチングしパッド
7,回路8及びスルーホール4を得る。
Next, as shown in FIG. 7B, after removing the plating resist layer 14, the copper plating layers 13 and 3 and the copper foil 2 laminated with a cupric chloride solution are etched to form pads 7 and 8. A circuit 8 and a through hole 4 are obtained.

【0052】次に、図7(c)に示すように、はんだ層
16を溶解除去する。
Next, as shown in FIG. 7C, the solder layer 16 is dissolved and removed.

【0053】以下、第1の実施例の図4(f),図5
(a),図5(b)と同様の工程にてニッケルめっき層
5,無電解銅めっき層6,ソルダレジスト膜9を形成し
印刷配線板10を構成する。
4 (f) and 5 of the first embodiment.
A printed wiring board 10 is formed by forming a nickel plating layer 5, an electroless copper plating layer 6, and a solder resist film 9 in the same steps as in (a) and FIG. 5 (b).

【0054】[0054]

【発明の効果】以上説明したように本発明は、表裏の外
層面及び表裏の外層面とスルーホールに形成される導体
部が銅−ニッケル−銅の3層構造を有すことにより、フ
ローソルダ等のはんだ付けにおいて、スルーホール開口
部の表層の銅とはんだ中の錫の相互拡散がニッケル層に
より遮断されるため、ニッケル層直下の銅層がはんた層
に侵食されるのを防止することができ、よって複数回、
フローソルダ等のはんだ付を行ってもスルーホール接続
信頼性を維持することができ、また、表面実装部品実装
後のリペア工事においても、パッドの銅とはんだ中の錫
の相互拡散がニッケル層により遮断されるため、ニッケ
ル層直下の銅層がはんだ層に侵食されるのを防止するこ
とができ、よって繰り返しリペア工事を行っても表面実
装部品とパッドとの接続信頼性を維持することができる
という効果がある。
As described above, according to the present invention, since the front and back outer layer surfaces and the conductor portions formed on the front and back outer layer surfaces and the through holes have a three-layer structure of copper-nickel-copper, a flow solder, etc. During soldering, the nickel layer blocks the interdiffusion of copper in the surface layer of the through-hole opening and tin in the solder, preventing the copper layer directly under the nickel layer from being eroded by the solder layer. Can be done multiple times,
Through-hole connection reliability can be maintained even when soldering with flow solder, etc., and also during repair work after mounting surface mount components, the nickel layer blocks the interdiffusion of copper in the pad and tin in the solder. Therefore, it is possible to prevent the copper layer directly below the nickel layer from being eroded by the solder layer, and therefore, it is possible to maintain the connection reliability between the surface mount component and the pad even if repeated repair work is performed. effective.

【図面の簡単な説明】[Brief description of drawings]

【図1】第1の発明の第1の実施例の製造方法を説明す
る工程順に示した断面図である。
FIG. 1 is a cross-sectional view showing the manufacturing method of a first embodiment of the first invention in the order of steps.

【図2】第1の発明の第2の実施例の製造方法を説明す
る工程順に示した断面図である。
FIG. 2 is a cross-sectional view showing the manufacturing method of the second embodiment of the first invention in the order of steps.

【図3】第1の発明の第2の実施例の製造方法を説明す
る工程順に示した断面図である。
3A to 3C are cross-sectional views showing the manufacturing method of the second embodiment of the first invention in the order of steps.

【図4】第2の発明の第1の実施例の製造方法を説明す
る工程順に示した断面図である。
FIG. 4 is a cross-sectional view showing the manufacturing method of the first embodiment of the second invention in the order of steps.

【図5】第2の発明の第1の実施例の製造方法を説明す
る工程順に示した断面図である。
5A to 5D are cross-sectional views showing the manufacturing method of the first embodiment of the second invention in the order of steps.

【図6】第2の発明の第2の実施例の製造方法を説明す
る工程順に示した断面図である。
6A to 6D are cross-sectional views showing the manufacturing method of the second embodiment of the second invention in the order of steps.

【図7】第2の発明の第2の実施例の製造方法を説明す
る工程順に示した断面図である。
FIG. 7 is a cross-sectional view showing the manufacturing method of the second embodiment of the second invention in the order of steps.

【図8】従来の印刷配線板の製造方法の一例を説明する
工程順に示した断面図である。
FIG. 8 is a cross-sectional view showing an example of a conventional method of manufacturing a printed wiring board in process order.

【符号の説明】[Explanation of symbols]

1 絶縁基板 2 銅箔 3,13 銅めっき層 4 スルーホール 5 ニッケルめっき層 6 無電解銅めっき層 7 パッド 8 回路 9 ソルダレジスト膜 10 印刷配線板 11 貫通孔 12 エッチングレジスト膜 14 めっきレジスト膜 16 はんだ層 1 Insulating Substrate 2 Copper Foil 3,13 Copper Plating Layer 4 Through Hole 5 Nickel Plating Layer 6 Electroless Copper Plating Layer 7 Pad 8 Circuit 9 Solder Resist Film 10 Printed Wiring Board 11 Through Hole 12 Etching Resist Film 14 Plating Resist Film 16 Solder layer

フロントページの続き (72)発明者 岡田 圭祐 東京都港区芝五丁目7番1号日本電気株式 会社内Front page continued (72) Inventor Keisuke Okada 5-7-1 Shiba, Minato-ku, Tokyo NEC Corporation

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 絶縁基板に形成された導体層が順次積層
して設けた下層の銅層,中間層のニッケル層,上層の銅
層の3層構造を有することを特徴とする印刷配線板。
1. A printed wiring board having a three-layer structure of a lower copper layer, an intermediate nickel layer, and an upper copper layer, which are formed by sequentially laminating conductor layers formed on an insulating substrate.
【請求項2】 絶縁基板の表裏外層面に形成された前記
導体層が順次積層して設けた下層の銅層,中間層のニッ
ケル層,上層の銅層の3層構造を有することを特徴とす
る請求項1記載の印刷配線板。
2. A three-layer structure comprising a lower copper layer, an intermediate nickel layer, and an upper copper layer, which are formed by sequentially stacking the conductor layers formed on the front and back outer layers of an insulating substrate. The printed wiring board according to claim 1.
【請求項3】 銅張り積層板の表裏外層面全面にニッケ
ル層をめっき形成する工程と、前記銅張り積層板を選択
的に穿孔して貫通孔を形成する工程と、該貫通孔の内面
と前記ニッケル層上全面に銅めっき層を形成する工程
と、下層の銅層,中間層のニッケル層,上層の銅層の3
層構造のパターンを形する工程とを含んで構成されるこ
とを特徴とする請求項2記載の印刷配線板の製造方法。
3. A step of forming a nickel layer on the entire front and back outer surface of the copper-clad laminate by plating, a step of selectively boring the copper-clad laminate to form a through hole, and an inner surface of the through hole. A step of forming a copper plating layer on the entire surface of the nickel layer, and a lower copper layer, an intermediate nickel layer, and an upper copper layer.
3. The method for manufacturing a printed wiring board according to claim 2, further comprising the step of forming a layered pattern.
【請求項4】 絶縁基板の表裏外層面全面とスルーホー
ル内面に形成された前記導体層が順次積層して設けた下
層の銅層,中間層のニッケル層,上層の銅層の3層構造
を有するとを特徴とする請求項1記載の印刷配線板。
4. A three-layer structure including a lower copper layer, an intermediate nickel layer, and an upper copper layer, which are formed by sequentially laminating the conductor layers formed on the front and back outer layer surfaces of an insulating substrate and the through hole inner surface, respectively. It has, The printed wiring board of Claim 1 characterized by the above-mentioned.
【請求項5】 銅張り積層板を選択的に穿孔して貫通孔
を形成し該貫通孔内面に銅めっきを施しスルーホールを
形成する工程と、銅層をパターニングし所定の回路を形
成する工程と、該回路上と前記スルーホール内面の銅層
上にニッケルめっきによりニッケル層を形成する工程
と、無電解厚付銅めっきにより前記ニッケル層上に銅層
を形成する工程と、選択的にソルダレジストを塗布する
工程とを含んで構成されることを特徴とする請求項4記
載の印刷配線板の製造方法。
5. A step of selectively perforating a copper-clad laminate to form a through hole, plating the inner surface of the through hole with a copper to form a through hole, and patterning the copper layer to form a predetermined circuit. A step of forming a nickel layer on the circuit and the copper layer on the inner surface of the through hole by nickel plating, a step of forming a copper layer on the nickel layer by electroless thick copper plating, and selectively soldering The method of manufacturing a printed wiring board according to claim 4, comprising a step of applying a resist.
JP888792A 1992-01-22 1992-01-22 Printed wiring board and manufacture thereof Withdrawn JPH05211386A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP888792A JPH05211386A (en) 1992-01-22 1992-01-22 Printed wiring board and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP888792A JPH05211386A (en) 1992-01-22 1992-01-22 Printed wiring board and manufacture thereof

Publications (1)

Publication Number Publication Date
JPH05211386A true JPH05211386A (en) 1993-08-20

Family

ID=11705194

Family Applications (1)

Application Number Title Priority Date Filing Date
JP888792A Withdrawn JPH05211386A (en) 1992-01-22 1992-01-22 Printed wiring board and manufacture thereof

Country Status (1)

Country Link
JP (1) JPH05211386A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100619348B1 (en) * 2004-09-21 2006-09-12 삼성전기주식회사 Manufacturing Method of Package Substrate Using Electroless Nickel Plating
KR100893100B1 (en) * 2006-09-22 2009-04-10 에스티주식회사 Microcircuit Manufacturing Method of Printed Circuit Board
JP2011129808A (en) * 2009-12-21 2011-06-30 Shinko Electric Ind Co Ltd Wiring board, and method of manufacturing the same
CN103281870A (en) * 2013-05-13 2013-09-04 四川省华兴宇电子科技有限公司 Local electrogilding circuit board manufacturing method capable of avoiding nickel layer suspended falling
JP2014132673A (en) * 2014-02-12 2014-07-17 Shinko Electric Ind Co Ltd Wiring board and method of manufacturing the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100619348B1 (en) * 2004-09-21 2006-09-12 삼성전기주식회사 Manufacturing Method of Package Substrate Using Electroless Nickel Plating
KR100893100B1 (en) * 2006-09-22 2009-04-10 에스티주식회사 Microcircuit Manufacturing Method of Printed Circuit Board
JP2011129808A (en) * 2009-12-21 2011-06-30 Shinko Electric Ind Co Ltd Wiring board, and method of manufacturing the same
CN103281870A (en) * 2013-05-13 2013-09-04 四川省华兴宇电子科技有限公司 Local electrogilding circuit board manufacturing method capable of avoiding nickel layer suspended falling
JP2014132673A (en) * 2014-02-12 2014-07-17 Shinko Electric Ind Co Ltd Wiring board and method of manufacturing the same

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