JPH0519101A - reflector - Google Patents

Abstract

(57) [Summary] [Object] An object of the present invention is to provide a reflector which is excellent in heat resistance and durability, and which is free from oxidation or peeling even under environmental conditions that repeatedly and significantly change. [Structure] A mirror surface portion of a reflector base made of an aluminum alloy having a predetermined shape is subjected to plasma treatment in an atmosphere containing an organic silicone such as vinyltrimethoxysilane, vinyltrimethylsilane, or methyltrimethoxysilane,
A surface protective layer made of an organic-silicone plasma-polymerized film is formed to obtain the reflector of the present invention.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reflector used for constructing an illumination system such as OA equipment.

[0002]

2. Description of the Related Art A reflector used in an illuminating device having a light source in an OA device such as a copying machine is for efficiently reflecting a light beam emitted from the light source in a desired direction to illuminate a necessary object. Is the equipment of. And also its mirror surface shape,
Depending on the application, it is used in various ways such as a flat surface, a spherical surface, an elliptical surface, a parabolic surface, and the like.

The reflector in such an illumination system does not have to have a particularly precise mirror surface, but since it has a special shape, it is usually formed by rolling, casting or cutting an aluminum alloy into a desired shape and then reflecting it. It is manufactured by mirror-finishing the surface part by lapping or electrolytic polishing.

When such a reflector is used in, for example, an illuminating device of a copying machine, it is repeatedly irradiated with a blinking halogen lamp used as a light source. Therefore, the temperature of the reflector is 250 to 300 ° C. when continuously used. In many cases, there was a problem that the reflecting surface was oxidized and turned into alumite, and cracks gradually occurred to roughen the mirror surface.

Therefore, as a countermeasure against this, there has been proposed a method of providing a silicon film as a protective film for preventing oxidative deterioration of the mirror surface portion. However, even with a reflection plate having such a structure, cracks or peeling in the use environment occur. The deterioration with time could not be sufficiently suppressed, and the heat resistance and durability were not satisfactory.

[0006]

SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and an object of the present invention is to provide excellent heat resistance and durability, and under environmental conditions that repeatedly and drastically change. However, it is to provide a reflector that does not oxidize or peel.

[0007]

The object of the present invention is as follows.
This can be achieved by a reflection plate characterized in that a surface protection layer made of an organic silicone-based plasma polymerized film is provided on a mirror surface portion of a reflection plate substrate made of an aluminum alloy having a predetermined shape.

The substrate constituting the reflector of the present invention is formed into a desired shape by rolling, casting or cutting an aluminum alloy and then mirror-finished by lapping or electrolytic polishing. A substrate similar to that used as is used.

In the present invention, the mirror surface portion of the substrate is brought into contact with plasma in an atmosphere containing an organic silicone such as vinyltrimethoxysilane, vinyltrimethylsilane or methyltrimethoxysilane to polymerize the above silicone. Form a film. In this case, the plasma polymerized film has a thickness of about 600 to 1000 nm, preferably 800.
It should be around nm.

[0010]

The reflector of the present invention is provided with a dense protective layer on its surface and is excellent in heat resistance, corrosion resistance and adhesion.

[0011]

【Example】

Example 1 A bright aluminum alloy (A5056) was used to form a reflector substrate 1 having the cross-sectional shape shown in FIG. 1 by a rolling method. After the substrate 1 is sufficiently precisely cleaned and dried, the fixture b in the vacuum chamber a of the polymerization film forming apparatus shown in FIG.
After evacuating to a vacuum degree of about 3 to 5 × 10 ⁻⁵ Torr, nitrogen gas containing a vapor of vinyltrimethoxysilane was introduced from the gas introduction port c so as to have a pressure of about 0.5 Torr. Then, a high frequency voltage having a frequency of 13.56 MHz is applied from the power source d, plasma discharge is performed on the substrate 1 for 30 W for 10 minutes, and the mirror surface portion 2 in FIG.
A surface protective layer 3 made of a plasma polymerized film of 0 nm vinyltrimethoxysilane was formed to obtain a reflector A of the invention.

Example 2 Bright aluminum alloy (A6063) as a reflector substrate
On the mirror surface portion of the substrate in the same manner as in Example 1 except that the nitrogen gas containing the vapor of vinyltrimethylsilane was introduced in place of vinyltrimethoxysilane so as to have a pressure of about 0.3 Torr. A surface protective layer made of a plasma-polymerized film having a thickness of 700 nm and having a thickness of 700 nm was formed on the substrate to obtain a reflector B of the present invention.

Control Example 1 Using a reflector substrate similar to that used in Example 1,
400 nm thick on the mirror surface of the substrate by vacuum evaporation method
A surface protective layer composed of the above silicon layer was formed to obtain a control reflection plate C.

Test Examples These reflectors were subjected to the following heat resistance test, temperature and humidity resistance test, and lighting test (thermal shock test) to examine their durability.

Heat resistance test After alternately standing for 20 minutes in an environment of 20 ° C. and 250 ° C. for 1 hour each, the state of the surface protective layer was observed. The reflectors A and B of the present invention and the control reflector C are
Neither generation of clouding, cracking, peeling, etc. was observed.

Temperature and Humidity Resistance Test The surface protective layer was observed by leaving it in an atmosphere of a temperature of 60 ° C. and a relative humidity of 95% for 100 hours and then drying it. No abnormality was observed in the reflectors A and B of the present invention, but partial peeling occurred in the surface protective layer of the control reflector C.

Illumination test A 1350 W halogen lamp was used to repeat irradiation for 6 seconds and extinction for 5 seconds 20 times, followed by a 10-minute rest test for 100 hours to observe the state of the surface protective layer.
While cracks and peeling occurred in the protective layer of the control reflector C, no change was observed in the reflectors A and B of the present invention.

[0018]

The reflector of the present invention has excellent heat resistance, temperature and humidity resistance, and thermal shock resistance, and is characterized in that it can be used stably for a long period of time.

[Brief description of drawings]

FIG. 1 is a cross-sectional view showing a configuration of a reflection plate of the present invention.

FIG. 2 is a conceptual diagram showing a configuration of an apparatus for manufacturing a reflection plate of the present invention.

[Explanation of symbols]

1 Reflector base 2 Mirror surface part 3 Surface protection layer a vacuum chamber b Fixture c Gas inlet d power supply

Claims (3)

[Claims] 1. A reflection plate comprising a surface protection layer made of an organic-silicone-based plasma polymerized film on a mirror surface portion of a reflection plate base made of an aluminum alloy having a predetermined shape. 2. The reflector according to claim 1, wherein the organosilicone plasma polymerized film is a vinyltrimethoxysilane polymerized film having a thickness of 860 nm. 3. The reflector according to claim 1, wherein the organosilicone plasma polymerized film is a vinyltrimethylsilane polymerized film having a thickness of 700 nm.