JPH05178864A - Production of trialkoxysilane - Google Patents
Production of trialkoxysilaneInfo
- Publication number
- JPH05178864A JPH05178864A JP35798791A JP35798791A JPH05178864A JP H05178864 A JPH05178864 A JP H05178864A JP 35798791 A JP35798791 A JP 35798791A JP 35798791 A JP35798791 A JP 35798791A JP H05178864 A JPH05178864 A JP H05178864A
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- trialkoxysilane
- silicon
- catalyst
- product
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 15
- 238000006243 chemical reaction Methods 0.000 claims abstract description 69
- 239000010703 silicon Substances 0.000 claims abstract description 37
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 37
- 125000005233 alkylalcohol group Chemical group 0.000 claims abstract description 22
- 239000003054 catalyst Substances 0.000 claims abstract description 22
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 37
- 238000000034 method Methods 0.000 abstract description 14
- 239000002184 metal Substances 0.000 abstract description 7
- 229910052751 metal Inorganic materials 0.000 abstract description 7
- 239000007792 gaseous phase Substances 0.000 abstract 1
- 239000000047 product Substances 0.000 description 25
- 238000009835 boiling Methods 0.000 description 14
- 230000007423 decrease Effects 0.000 description 11
- 239000007789 gas Substances 0.000 description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000007788 liquid Substances 0.000 description 9
- 239000007795 chemical reaction product Substances 0.000 description 8
- 238000004458 analytical method Methods 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 239000012071 phase Substances 0.000 description 6
- 238000007086 side reaction Methods 0.000 description 5
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 239000007791 liquid phase Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000005046 Chlorosilane Substances 0.000 description 2
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 2
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- 229940045803 cuprous chloride Drugs 0.000 description 2
- 239000000539 dimer Substances 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 238000010574 gas phase reaction Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000013638 trimer Substances 0.000 description 2
- OZWKZRFXJPGDFM-UHFFFAOYSA-N tripropoxysilane Chemical compound CCCO[SiH](OCCC)OCCC OZWKZRFXJPGDFM-UHFFFAOYSA-N 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 239000005749 Copper compound Substances 0.000 description 1
- JJLJMEJHUUYSSY-UHFFFAOYSA-L Copper hydroxide Chemical compound [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 description 1
- 239000005750 Copper hydroxide Substances 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- 229910021594 Copper(II) fluoride Inorganic materials 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- HRNSPWKFRJGQEC-UHFFFAOYSA-N [Cu]C Chemical compound [Cu]C HRNSPWKFRJGQEC-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- ODWXUNBKCRECNW-UHFFFAOYSA-M bromocopper(1+) Chemical compound Br[Cu+] ODWXUNBKCRECNW-UHFFFAOYSA-M 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 229940116318 copper carbonate Drugs 0.000 description 1
- 150000001880 copper compounds Chemical class 0.000 description 1
- 229910001956 copper hydroxide Inorganic materials 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- GDVQAJIJTGEYHX-UHFFFAOYSA-N copper(1+);ethane Chemical compound [Cu+].[CH2-]C GDVQAJIJTGEYHX-UHFFFAOYSA-N 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- OMZSGWSJDCOLKM-UHFFFAOYSA-N copper(II) sulfide Chemical compound [S-2].[Cu+2] OMZSGWSJDCOLKM-UHFFFAOYSA-N 0.000 description 1
- DOBRDRYODQBAMW-UHFFFAOYSA-N copper(i) cyanide Chemical compound [Cu+].N#[C-] DOBRDRYODQBAMW-UHFFFAOYSA-N 0.000 description 1
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 1
- GWFAVIIMQDUCRA-UHFFFAOYSA-L copper(ii) fluoride Chemical compound [F-].[F-].[Cu+2] GWFAVIIMQDUCRA-UHFFFAOYSA-L 0.000 description 1
- GEZOTWYUIKXWOA-UHFFFAOYSA-L copper;carbonate Chemical compound [Cu+2].[O-]C([O-])=O GEZOTWYUIKXWOA-UHFFFAOYSA-L 0.000 description 1
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 1
- BQVVSSAWECGTRN-UHFFFAOYSA-L copper;dithiocyanate Chemical compound [Cu+2].[S-]C#N.[S-]C#N BQVVSSAWECGTRN-UHFFFAOYSA-L 0.000 description 1
- QYCVHILLJSYYBD-UHFFFAOYSA-L copper;oxalate Chemical compound [Cu+2].[O-]C(=O)C([O-])=O QYCVHILLJSYYBD-UHFFFAOYSA-L 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 230000009849 deactivation Effects 0.000 description 1
- 239000012024 dehydrating agents Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005243 fluidization Methods 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 229960004592 isopropanol Drugs 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- HCOKJWUULRTBRS-UHFFFAOYSA-N propan-2-yloxysilane Chemical compound CC(C)O[SiH3] HCOKJWUULRTBRS-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000013076 target substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
- COKLPZSYWJNYBJ-UHFFFAOYSA-N tri(butan-2-yloxy)silane Chemical compound CCC(C)O[SiH](OC(C)CC)OC(C)CC COKLPZSYWJNYBJ-UHFFFAOYSA-N 0.000 description 1
- UCSBCWBHZLSFGC-UHFFFAOYSA-N tributoxysilane Chemical compound CCCCO[SiH](OCCCC)OCCCC UCSBCWBHZLSFGC-UHFFFAOYSA-N 0.000 description 1
- QCKKBOHAYRLMQP-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[SiH](OC(C)(C)C)OC(C)(C)C QCKKBOHAYRLMQP-UHFFFAOYSA-N 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明はトリアルコキシシランの
効率的な製造方法に関するものである。FIELD OF THE INVENTION The present invention relates to an efficient method for producing trialkoxysilane.
【0002】[0002]
【従来の技術】アルコキシシランは、各種シランカップ
リング剤や、絶縁薄膜の原材料等として有用であり、特
にトリアルコキシシランは分子内にSiH結合を有し、
しかもモノアルコキシシラン、ジアルコキシシランに比
べて化学的に安定であるとことから、その需要性は高
く、安価で効率の良い製造法が求められている。BACKGROUND OF THE INVENTION Alkoxysilanes are useful as various silane coupling agents and raw materials for insulating thin films. Trialkoxysilanes have SiH bonds in their molecules.
Moreover, since it is chemically more stable than monoalkoxysilane and dialkoxysilane, there is a demand for a highly costly and efficient manufacturing method.
【0003】従来、トリアルコキシシランの製造法とし
ては、クロロシラン類と低級アルキルアルコールを原料
とする方法が知られているが、クロロシラン類がコスト
高である上、目的とするアルコキシシランの他に塩酸が
副生するため、生成物の精製が困難で、かつ反応装置が
腐食する等の欠点があった。Conventionally, as a method for producing trialkoxysilane, a method using chlorosilanes and lower alkyl alcohols as raw materials has been known. However, chlorosilanes are expensive and, in addition to the desired alkoxysilane, hydrochloric acid. As a by-product, it is difficult to purify the product, and the reaction apparatus is corroded.
【0004】一方、金属珪素とアルキルアルコールとを
直接反応させる方法も知られており、この方法は例えば
銅触媒の存在下に気相または液相で行われているが、気
相で行う場合、トリアルコキシシランよりも高次のテト
ラアルコキシシランの生成が優先して、トリアルコキシ
シランの選択率が低くなるので、近年の工業的な技術開
発は専ら液相で行われてきた。On the other hand, a method of directly reacting silicon metal with an alkyl alcohol is also known. This method is carried out in a gas phase or a liquid phase in the presence of a copper catalyst. Since the production of higher-order tetraalkoxysilane has priority over that of trialkoxysilane and the selectivity of trialkoxysilane becomes low, the industrial development in recent years has been carried out exclusively in the liquid phase.
【0005】しかし液相系は、気相系に比べて反応器容
量当りの反応速度が低い上、高沸点の反応溶媒を用いる
のでコスト高となり、また反応残査は高沸点生成物等を
含むためヘドロ状になり反応残査の処理が困難であった
り、生成物に反応溶媒が混入して来るため反応生成物の
精製が煩雑である等の問題があった。However, the liquid phase system has a lower reaction rate per reactor volume than the gas phase system, and the cost is high because a reaction solvent having a high boiling point is used, and the reaction residue contains a product having a high boiling point. As a result, there are problems that the reaction product becomes sludge-like and it is difficult to process the reaction residue, and that the reaction solvent is mixed in the product, so that the purification of the reaction product is complicated.
【0006】そこで、気相法でトリアルコキシシランを
効率良く製造する方法が望まれているが、従来の気相法
には、前記した問題点の他に次のような問題点があっ
た。銅触媒の存在下、金属珪素とアルキルアルコールを
反応させる場合、例えばテトラエトキシシラン等のテト
ラアルコキシシランや、シリコンの二量体、三量体等の
高沸点生成物が生成するが、気相系の場合、これらの高
沸点生成物によって粉体が湿った状態になるため、固定
床方式ではガスの流れにムラが生じたり、流動床方式で
は流動化が妨げられるなどの問題があり、長時間円滑に
反応を進めることが難しかった。この問題を解決する為
に、例えば反応器容積に対して大量の不活性ガスを流す
ことにより、円滑に反応を進める方法が提案されている
が、この方法では、不活性ガスのコストやプロセス上の
コストが嵩む上、原料である低級アルキルアルコールの
分圧が下がり、反応速度が遅く、工業的に適切な方法と
は言い難かった。Therefore, a method for efficiently producing trialkoxysilane by a vapor phase method is desired, but the conventional vapor phase method has the following problems in addition to the above-mentioned problems. When metal silicon and an alkyl alcohol are reacted in the presence of a copper catalyst, tetraalkoxysilanes such as tetraethoxysilane and high-boiling products such as dimers and trimers of silicon are produced. In the case of the above, since powders become wet due to these high boiling point products, there are problems such as uneven gas flow in the fixed bed system and fluidization hindered in the fluidized bed system, which causes a problem for a long time. It was difficult for the reaction to proceed smoothly. In order to solve this problem, for example, a method has been proposed in which a large amount of inert gas is caused to flow into the reactor volume to smoothly proceed the reaction. In addition to increasing the cost, the partial pressure of the lower alkyl alcohol as a raw material was lowered, and the reaction rate was slow, so it was difficult to say that this method was industrially appropriate.
【0007】[0007]
【発明が解決しようとする課題】本発明は金属珪素とア
ルキルアルコールを、触媒の存在下、気相系で反応させ
てトリアルコキシシランを製造する方法において、トリ
アルコキシシランの選択率が高く、反応が長時間安定で
あり、トリアルコキシシランの分離取得が容易な製造方
法を提供するために鋭意研究した結果、本発明を完成し
た。DISCLOSURE OF THE INVENTION The present invention is a method for producing trialkoxysilane by reacting metallic silicon and an alkyl alcohol in a gas phase system in the presence of a catalyst. The present invention has been completed as a result of earnest research to provide a manufacturing method that is stable for a long time and that facilitates the separation and acquisition of trialkoxysilane.
【0008】[0008]
【課題を解決するための手段】本発明は、金属珪素と炭
素数1〜4のアルキルアルコール(以下低級アルキルア
ルコールと称する)とを、触媒の存在下に気相で反応さ
せてトリアルコキシシランを製造するに際し、該反応を
減圧下で行うことを特徴とするトリアルコキシシランの
製造方法である。DISCLOSURE OF THE INVENTION According to the present invention, metallic silicon and an alkyl alcohol having 1 to 4 carbon atoms (hereinafter referred to as lower alkyl alcohol) are reacted in the gas phase in the presence of a catalyst to give trialkoxysilane. In the production, a trialkoxysilane production method is characterized in that the reaction is carried out under reduced pressure.
【0009】本発明方法において原料の一つとして使用
される金属珪素は、純度80wt%以上のものが適してお
り、形状は粒状が好適であり、粒径は特に限定されるも
のではないが、通常、平均粒径2mm以下が好ましく、更
に好ましくは平均粒径25〜500μm、特に好ましく
は平均粒径50〜300μmである。The metallic silicon used as one of the raw materials in the method of the present invention preferably has a purity of 80% by weight or more, and the shape is preferably granular, and the particle size is not particularly limited. Generally, the average particle size is preferably 2 mm or less, more preferably 25 to 500 μm, and particularly preferably 50 to 300 μm.
【0010】もう一つの原料である低級アルキルアルコ
ールとしては、直鎖状あるいは分岐状のいずれでもよ
く、具体的にはメタノール、エタノール、n−プロパノ
ール、iso −プロパノ−ル、n−ブタノ−ル、sec −ブ
タノ−ル、iso −ブタノール、tert−ブタノールがあ
り、これらの内でも、後記実施例2と比較例2を対比す
れば明らかなように、本発明の減圧法によるトリアルコ
キシシランの選択率および珪素転化率の改善効果は、エ
タノールを原料とするトリエトキシシランの製法におい
て特に顕著である。The lower alkyl alcohol, which is another raw material, may be linear or branched, and specifically, methanol, ethanol, n-propanol, iso-propanol, n-butanol, There are sec-butanol, iso-butanol, and tert-butanol, and among these, as will be apparent from comparison between Example 2 and Comparative Example 2 below, the selectivity of trialkoxysilane by the reduced pressure method of the present invention is shown. The effect of improving the silicon conversion rate is particularly remarkable in the method for producing triethoxysilane using ethanol as a raw material.
【0011】低級アルキルアルコールは純度95wt%以
上が好ましく、脱水剤を浸漬することにより水分の含有
量を2000ppm 以下、更に好ましくは500ppm 以下
としたものが好ましい。The lower alkyl alcohol preferably has a purity of 95 wt% or more, and it is preferable that the water content is set to 2000 ppm or less, more preferably 500 ppm or less by dipping a dehydrating agent.
【0012】低級アルキルアルコールの反応系への供給
速度は、金属珪素1モルに対し、低級アルキルアルコー
ル10〜1,000ミリモル/hrが好ましく、更に好ま
しくは50〜500ミリモル/hrである。1,000ミ
リモル/hrを超えると未反応の低級アルキルアルコール
が増加し経済的とは言えず、あまり少ないとトリアルコ
キシシランの収率が低下する恐れがある。The supply rate of the lower alkyl alcohol to the reaction system is preferably 10 to 1,000 mmol / hr of the lower alkyl alcohol, and more preferably 50 to 500 mmol / hr, to 1 mol of metal silicon. When it exceeds 1,000 mmol / hr, unreacted lower alkyl alcohol increases, which is not economical, and when it is too small, the yield of trialkoxysilane may decrease.
【0013】本発明で得られるトリアルコキシシラン
は、原料として使用するアルキルアルコールに対応した
アルコキシ基を有しており、具体的にはトリメトキシシ
ラン、トリエトキシシラン、トリ−n−プロポキシシラ
ン、トリイソプロポキシシラン、トリ−n−ブトキシシ
ラン、トリ−sec −ブトキシシラン、トリイソブトキシ
シラン、トリ−tert−ブトキシシランがある。The trialkoxysilane obtained according to the present invention has an alkoxy group corresponding to the alkyl alcohol used as a raw material, and specifically, trimethoxysilane, triethoxysilane, tri-n-propoxysilane, and tri-n-propoxysilane. There are isopropoxysilane, tri-n-butoxysilane, tri-sec-butoxysilane, triisobutoxysilane and tri-tert-butoxysilane.
【0014】本発明における触媒としては、銅触媒、亜
鉛触媒、ニッケル触媒のいずれもが使用でき、特に限定
するものではないが、銅触媒が特に好ましい。具体例と
しては塩化第一銅、塩化第二銅、臭化銅、沃化銅、弗化
銅、炭酸銅、硫酸銅、酢酸銅、蓚酸銅、チオシアン酸銅
等の銅塩、あるいは水酸化銅、シアン化銅、硫化銅、酸
化銅等の銅含有無機化合物、メチル銅、エチル銅などの
有機銅化合物、または金属銅が挙げられる。触媒は、粉
末状のものを金属硅素と混合したり、金属珪素に担持さ
せた後、反応系に供給すればよく、必要であれば加熱処
理等の活性化処理を行ってもよい。As the catalyst in the present invention, any of a copper catalyst, a zinc catalyst and a nickel catalyst can be used, and it is not particularly limited, but a copper catalyst is particularly preferable. Specific examples thereof include copper salts such as cuprous chloride, cupric chloride, copper bromide, copper iodide, copper fluoride, copper carbonate, copper sulfate, copper acetate, copper oxalate, and copper thiocyanate, or copper hydroxide. Examples thereof include copper-containing inorganic compounds such as copper cyanide, copper sulfide, and copper oxide, organic copper compounds such as methyl copper and ethyl copper, or metallic copper. The catalyst may be mixed in powder form with metal silicon or supported on metal silicon and then supplied to the reaction system. If necessary, activation treatment such as heat treatment may be performed.
【0015】触媒の反応系への供給割合は、金属珪素1
gを基準として0.5〜20wt%が好ましく、更に好ま
しくは1〜10wt%である。あまり多いとコスト高につ
ながり、0.5wt%未満では珪素の転化率が低下する恐
れがある。The catalyst is supplied to the reaction system at a rate of 1% metallic silicon.
The amount is preferably 0.5 to 20% by weight, more preferably 1 to 10% by weight, based on g. If it is too large, the cost will be high, and if it is less than 0.5 wt%, the conversion rate of silicon may be lowered.
【0016】本発明は気相系で行う。すなわち金属珪素
および触媒に気体状の低級アルキルアルコールを接触さ
せて反応させる。反応方式は、金属珪素および触媒を最
初に全量を仕込むバッチ方式でも、また反応中に連続的
に仕込む連続式のどちらでもよく、また金属珪素および
触媒を振動させて反応を行う振動方式や、反応気体によ
り流動化させて反応を行う流動床方式、振動や物理的な
力により金属珪素および触媒を移動させながら反応を行
う移動床方式、あるいは金属珪素および触媒を固定して
反応を行う固定床方式のいずれを採用してもよい。これ
らのいずれの方式においても、低級アルコールは気体と
して反応系に供給され、その供給は連続して行うのが一
般的であるが、断続的に行うことも出来る。The present invention is carried out in a gas phase system. That is, a gaseous lower alkyl alcohol is brought into contact with metallic silicon and a catalyst to cause a reaction. The reaction system may be either a batch system in which the entire amount of metallic silicon and the catalyst are initially charged, or a continuous system in which the metallic silicon and the catalyst are continuously charged during the reaction. Fluidized bed system in which the reaction is carried out by fluidizing with gas, moving bed system in which the reaction is carried out while moving metallic silicon and catalyst by vibration or physical force, or fixed bed system in which the reaction is carried out by fixing metallic silicon and catalyst. Either of these may be adopted. In any of these methods, the lower alcohol is generally supplied as a gas to the reaction system, and the supply is generally carried out continuously, but it can also be carried out intermittently.
【0017】本発明の反応温度は100℃〜450℃が
好ましく、特に好ましくは100℃〜300℃である。
100℃未満では反応率の低下につながり、また450
℃を越えると低級アルキルアルコールが金属珪素や触媒
との接触により分解し、触媒の失活につながる恐れがあ
る。The reaction temperature of the present invention is preferably 100 ° C to 450 ° C, particularly preferably 100 ° C to 300 ° C.
If the temperature is less than 100 ° C, the reaction rate will decrease,
If the temperature exceeds ℃, the lower alkyl alcohol may be decomposed by contact with metallic silicon and the catalyst, leading to deactivation of the catalyst.
【0018】本発明の反応は減圧下で行う。好適な圧力
は、テトラアルコキシシラン、その他の高沸点生成物が
反応温度において気化し得る圧力であり、具体的には7
10mmHg〜60mmHg、更に好ましくは660〜460mm
Hgである。710mmHgを超えると高沸点生成物の反応系
外への留出が円滑に行われず、トリアルコキシシランの
選択率が低下する恐れがあり、60mmHg未満では低級ア
ルキルアルコールが希薄となり、反応量が低下して、ト
リアルコキシシランの収量の低下につながる恐れがあ
る。The reaction of the present invention is carried out under reduced pressure. A suitable pressure is a pressure at which tetraalkoxysilane or other high-boiling products can vaporize at the reaction temperature, specifically, 7
10 mmHg-60 mmHg, more preferably 660-460 mm
Hg. If it exceeds 710 mmHg, the distillation of the high boiling point product to the outside of the reaction system may not be carried out smoothly, and the selectivity of trialkoxysilane may decrease. If it is less than 60 mmHg, the lower alkyl alcohol will be diluted and the reaction amount will decrease. As a result, the yield of trialkoxysilane may decrease.
【0019】反応器の材質としては、石英管、ガラス
管、金属管等を使用することができ、特に限定されるも
のではないが、反応器の構造は低級アルキルアルコール
の導入口、加熱冷却装置、生成物の出口を具えており、
気密構造になっているものが適切である。The material of the reactor may be a quartz tube, a glass tube, a metal tube or the like, and is not particularly limited, but the structure of the reactor is a lower alkyl alcohol inlet, a heating and cooling device. , With product outlet,
An airtight structure is suitable.
【0020】本発明の反応方式による反応生成液は、高
濃度のトリアルコキシシランを含有し、その他にテトラ
アルコキシシランその他の副反応生成物を含んでいる。
目的物であるトリアルコキシシランはこの反応生成液か
ら蒸留その他の常法によって容易に分離取得することが
でき、この分離取得は、副反応生成物の生成量が抑制さ
れている本発明においては、従来の常圧以上で行われる
気相反応方式に比較して一層容易である。The reaction product solution according to the reaction system of the present invention contains a high concentration of trialkoxysilane, and further contains tetraalkoxysilane and other side reaction products.
The target product trialkoxysilane can be easily separated and obtained from this reaction product solution by distillation or another ordinary method, and in the present invention in which the amount of the side reaction product is suppressed, This is easier than the conventional gas phase reaction method that is performed at atmospheric pressure or higher.
【0021】[0021]
【作用】本発明では反応系を減圧とすることにより、高
沸点生成物が系外に円滑に留出し、反応器内の金属珪素
および触媒は終始乾燥状態に保たれ、反応が均一に進行
する。常圧反応に比べて反応系内における低級アルキル
アルコ−ルが希薄になるので気体状アルコールと固体状
の金属珪素の表面との接触量が減る結果、反応量が低下
すると予想されたにもかかわらず、そのような低下は長
時間にわたって起こることがなく、珪素の転化率は高
く、目的物であるトリアルコキシシランが高収率で得ら
れる。In the present invention, by reducing the pressure of the reaction system, the high boiling point product is smoothly distilled out of the system, and the metallic silicon and the catalyst in the reactor are kept in a dry state throughout the reaction, and the reaction proceeds uniformly. .. Since the lower alkyl alcohol in the reaction system becomes leaner than in the reaction under atmospheric pressure, the amount of contact between the gaseous alcohol and the surface of solid metallic silicon decreases, resulting in a decrease in the reaction amount. However, such a decrease does not occur over a long period of time, the conversion rate of silicon is high, and the target trialkoxysilane can be obtained in a high yield.
【0022】この理由は定かでないが、以下の作用によ
るものと思われる。従来技術のように常圧以上の圧力で
気相反応を行なった場合は、本発明者らが得た知見によ
れば、前掲した問題に加えて、副反応によって生成した
テトラアルコキシシランや二量体、三量体のシラン化合
物等の高沸点生成物が金属珪素表面に付着して離れず、
副反応が更に進行して高沸点生成物の高分子量化が起こ
り、金属珪素が高沸点生成物に覆われた状態になってい
くため、反応速度は次第に低下し、ついには反応が失活
してしまい、珪素の転化率の低下につながっていた。ま
た高沸点生成物は、目的物であるトリアルコキシシラン
を溶解し、高沸点生成物が反応系内に残留すると、生成
したトリアルコキシシランが金属珪素の表面の高沸点生
成物に溶け込み、更にアルコキシ化反応が進行し、結果
的にトリアルコキシシランの選択率を低下させる原因に
なっていた。The reason for this is not clear, but it is believed to be due to the following action. When the gas phase reaction is carried out at a pressure higher than atmospheric pressure as in the prior art, according to the findings obtained by the present inventors, in addition to the above-mentioned problems, tetraalkoxysilane and dimer formed by the side reaction And high boiling point products such as trimer silane compounds adhere to the surface of metallic silicon and do not separate,
The side reaction proceeds further and the high boiling point product becomes high molecular weight, and the metallic silicon becomes covered with the high boiling point product, so that the reaction rate gradually decreases and finally the reaction is deactivated. And the conversion rate of silicon was lowered. Further, the high-boiling product dissolves the trialkoxysilane which is the target product, and when the high-boiling product remains in the reaction system, the produced trialkoxysilane dissolves in the high-boiling product on the surface of the metal silicon, and further alkoxy The chemical reaction proceeded, resulting in a decrease in the selectivity of trialkoxysilane.
【0023】これに対し本発明では、上記したように、
副反応によって生成した高沸点生成物は、減圧条件下で
あるために、それが高分子量化する前に速やかに取り除
かれ、金属珪素の表面は常に新鮮なまま保たれた状態で
反応が行われるので、反応量は低下せず、珪素の転化率
が高く、しかも目的物であるトリアルコキシシランの選
択率が向上し、長時間安定に製造することが可能であ
る。On the other hand, in the present invention, as described above,
The high boiling point product generated by the side reaction is rapidly removed before it becomes a high molecular weight because of the reduced pressure condition, and the reaction is carried out while the surface of the metallic silicon is always kept fresh. Therefore, the reaction amount does not decrease, the conversion rate of silicon is high, the selectivity of the trialkoxysilane which is the target is improved, and it is possible to stably manufacture for a long time.
【0024】[0024]
【実施例】次に、本発明を実施例および比較例を挙げて
説明する。 実施例1 化学的純度98wt%、平均粒径約100μmの金属珪素
3 00g(10.68モル)と、塩化第一銅15gと
を、磁製ポットミルに入れ8時間粉砕混合したものを内
径30mm長さ600mmの石英管に詰めた。この石英管の
入口は、気化器を通して気化した低級アルキルアルコー
ルなどを吹き込むための導入管を具えており、出口には
冷却器と受器をセットして生成液を受けるようになって
おり、排気は減圧度調整弁を介してアスピレーターにつ
なぐことにより、反応系内を任意の減圧度に調節できる
ようになっている。前記反応器内に30ml/min の流量
で窒素ガスを流しながら、反応器を350℃で5時間加
熱して触媒の活性化処理を行った。次いで、窒素ガスを
止めて反応器の温度を180℃に保持し、アスピレータ
によって反応器の圧力を660mmHgに保ち、反応器入口
の導入管から気化したメタノールを50g/hr (1.5
6モル/ hr )の割合で導入して反応させた。反応開始
後1〜2分して冷却器から生成液が溜出し始めた。溜出
して来る生成液の組成の経時的変化をガスクロマトグラ
フィ−により分析し、その組成がアルコール100wt%
となった時点を反応終了時とした。反応を開始してから
19時間後に反応は終了し、目的物であるトリメトキシ
シランを含有する反応生成液を取得した。取得した全生
成液の組成の分析結果およびこれに基づくトリアルコキ
シシランの選択率と、珪素転化率を表1に示す。なお、
トリアルコキシシランの選択率および珪素転化率は下記
の式で計算した。 EXAMPLES Next, the present invention will be described with reference to Examples and Comparative Examples. Example 1 Metallic silicon having a chemical purity of 98 wt% and an average particle size of about 100 μm
300 g (10.68 mol) and 15 g of cuprous chloride were placed in a porcelain pot mill and pulverized and mixed for 8 hours, and the mixture was packed in a quartz tube having an inner diameter of 30 mm and a length of 600 mm. The inlet of this quartz tube is equipped with an inlet tube for blowing in the lower alkyl alcohol vaporized through the vaporizer, and the outlet is set with a cooler and a receiver to receive the produced liquid. Is connected to an aspirator via a pressure reduction degree adjusting valve, so that the inside of the reaction system can be adjusted to any degree of pressure reduction. While activating nitrogen gas at a flow rate of 30 ml / min in the reactor, the reactor was heated at 350 ° C. for 5 hours to activate the catalyst. Then, the nitrogen gas was stopped, the temperature of the reactor was maintained at 180 ° C., the pressure of the reactor was maintained at 660 mmHg by an aspirator, and 50 g / hr (1.5 g) of methanol vaporized from the inlet pipe of the reactor inlet was maintained.
It was introduced at a ratio of 6 mol / hr) and reacted. After 1 to 2 minutes from the start of the reaction, the product liquid started to distill out from the cooler. The time-dependent change in the composition of the product liquid distilled out was analyzed by gas chromatography, and the composition was 100% by weight of alcohol.
Was the end of the reaction. After 19 hours from the start of the reaction, the reaction was completed, and a reaction product liquid containing the target substance, trimethoxysilane, was obtained. Table 1 shows the analysis results of the composition of all the obtained product liquids, the selectivity of trialkoxysilane based on the analysis results, and the silicon conversion ratio. In addition,
The selectivity of trialkoxysilane and the conversion rate of silicon were calculated by the following formulas.
【0025】[0025]
【表1】 [Table 1]
【0026】比較例1 洗気瓶を経て排気を大気に開放した常圧系で反応を行な
った以外は実施例1と同様にして反応を行なった。反応
開始後、16時間後に反応が終了した。取得した全生成
液の組成の分析結果およびおよびこれに基づくトリメト
キシシランの選択率と、珪素転化率を表1に示す。Comparative Example 1 The reaction was carried out in the same manner as in Example 1 except that the reaction was carried out in a normal pressure system in which the exhaust gas was opened to the atmosphere through an air washing bottle. 16 hours after the start of the reaction, the reaction was completed. Table 1 shows the analysis results of the composition of all the obtained product liquids, and the selectivity of trimethoxysilane based on the analysis results and the conversion rate of silicon.
【0027】実施例2 メタノールに代えて気化したエタノールを50g/hr
(1.09モル)の割合で導入した以外は実施例1と同
様にして反応を行った。反応開始後、31時間後に反応
が終了し、目的物であるトリエトキシシランを含有する
反応生成液を取得した。取得した全生成液の組成の分析
結果およびこれに基づくトリエトキシシランの選択率
と、珪素転化率を表1に示す。Example 2 Instead of methanol, vaporized ethanol was added at 50 g / hr.
The reaction was carried out in the same manner as in Example 1 except that it was introduced at a ratio of (1.09 mol). After 31 hours from the start of the reaction, the reaction was completed, and a reaction product liquid containing the target product, triethoxysilane, was obtained. Table 1 shows the analysis results of the composition of all the obtained product liquids, the triethoxysilane selectivity based on the results, and the silicon conversion ratio.
【0028】比較例2 洗気瓶を経て排気を大気に開放した常圧系で反応を行な
った以外は実施例2と同様にして反応を行った。反応開
始後、16時間後に反応が終了した。取得した全生成液
の組成の分析結果およびおよびこれに基づくトリエトキ
シシランの選択率と、珪素転化率を表1に示す。Comparative Example 2 The reaction was carried out in the same manner as in Example 2 except that the reaction was carried out in a normal pressure system in which the exhaust gas was opened to the atmosphere through an air washing bottle. 16 hours after the start of the reaction, the reaction was completed. Table 1 shows the analysis results of the composition of all the obtained product liquids, and the selectivity of triethoxysilane based on the analysis results and the conversion rate of silicon.
【0029】[0029]
【発明の効果】本発明は金属珪素と炭素数1〜4のアル
キルアルコールを、触媒の存在下に気相系で反応させて
トリアルコキシシランを製造する方法において、該反応
を減圧下で行うことにより、トリアルコキシシランの選
択率が高く、珪素の転化率が高く、反応が長時間安定で
あり、さらにトリアルコキシシランを容易に分離取得で
きる製造方法である。INDUSTRIAL APPLICABILITY The present invention is a method for producing trialkoxysilane by reacting metallic silicon and an alkyl alcohol having 1 to 4 carbon atoms in a gas phase system in the presence of a catalyst, wherein the reaction is carried out under reduced pressure. Thus, the production method has a high selectivity of trialkoxysilane, a high conversion rate of silicon, a stable reaction for a long period of time, and can easily separate and obtain trialkoxysilane.
Claims (1)
コールとを、触媒の存在下に気相で反応させてトリアル
コキシシランを製造するに際し、該反応を減圧下で行う
ことを特徴とするトリアルコキシシランの製造方法。1. When a trialkoxysilane is produced by reacting metallic silicon with an alkyl alcohol having 1 to 4 carbon atoms in a gas phase in the presence of a catalyst, the reaction is performed under reduced pressure. Method for producing trialkoxysilane.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3357987A JP2985461B2 (en) | 1991-12-27 | 1991-12-27 | Method for producing trialkoxysilane |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3357987A JP2985461B2 (en) | 1991-12-27 | 1991-12-27 | Method for producing trialkoxysilane |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05178864A true JPH05178864A (en) | 1993-07-20 |
| JP2985461B2 JP2985461B2 (en) | 1999-11-29 |
Family
ID=18456969
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3357987A Expired - Fee Related JP2985461B2 (en) | 1991-12-27 | 1991-12-27 | Method for producing trialkoxysilane |
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| Country | Link |
|---|---|
| JP (1) | JP2985461B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013035956A1 (en) | 2011-09-06 | 2013-03-14 | 오씨아이 주식회사 | Method for preparing trialkoxysilane |
| CN108473512A (en) * | 2015-11-06 | 2018-08-31 | 纳尔逊曼德拉城市大学 | Method for selectively synthesizing trialkoxysilane |
-
1991
- 1991-12-27 JP JP3357987A patent/JP2985461B2/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013035956A1 (en) | 2011-09-06 | 2013-03-14 | 오씨아이 주식회사 | Method for preparing trialkoxysilane |
| US9156861B2 (en) | 2011-09-06 | 2015-10-13 | Oci Company Ltd. | Method for preparing trialkoxysilane |
| CN108473512A (en) * | 2015-11-06 | 2018-08-31 | 纳尔逊曼德拉城市大学 | Method for selectively synthesizing trialkoxysilane |
| JP2018538363A (en) * | 2015-11-06 | 2018-12-27 | ネルソン マンデラ メトロポリタン ユニバーシティ | Selective synthesis method of trialkoxysilane |
| JP2021059567A (en) * | 2015-11-06 | 2021-04-15 | ネルソン マンデラ メトロポリタン ユニバーシティ | Method for selective synthesis of trialkoxysilanes |
| CN112979689A (en) * | 2015-11-06 | 2021-06-18 | 纳尔逊曼德拉城市大学 | Method for selectively synthesizing trialkoxysilanes |
| EP3371197B1 (en) * | 2015-11-06 | 2021-12-08 | Nelson Mandela Metropolitan University | Method for the selective synthesis of trialkoxysilanes |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2985461B2 (en) | 1999-11-29 |
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