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JPH0513529A - Semiconductor integrated circuit - Google Patents

Semiconductor integrated circuit

Info

Publication number
JPH0513529A
JPH0513529A JP3164830A JP16483091A JPH0513529A JP H0513529 A JPH0513529 A JP H0513529A JP 3164830 A JP3164830 A JP 3164830A JP 16483091 A JP16483091 A JP 16483091A JP H0513529 A JPH0513529 A JP H0513529A
Authority
JP
Japan
Prior art keywords
chip
integrated circuit
semiconductor integrated
aluminum layer
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3164830A
Other languages
Japanese (ja)
Inventor
Toshihiko Nakajima
俊彦 中島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Kyushu Ltd
Original Assignee
NEC Kyushu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Kyushu Ltd filed Critical NEC Kyushu Ltd
Priority to JP3164830A priority Critical patent/JPH0513529A/en
Publication of JPH0513529A publication Critical patent/JPH0513529A/en
Pending legal-status Critical Current

Links

Classifications

    • H10W46/601
    • H10W46/603

Landscapes

  • Tests Of Electronic Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Semiconductor Integrated Circuits (AREA)

Abstract

(57)【要約】 【目的】アルミニウム層のパターニング工程のステッパ
ー露光時に、半導体集積回路個片に各々の識別コードを
作り込み、製造における生産効率の向上を図る。 【構成】半導体ウェーハ上に設けたチップ領域2の周囲
にアルミニウム層3を設け、アルミニウム層3をパター
ニングする際に、ステッパー露光により夫々のチップに
対する個体識別コードをパターン化したコードパターン
6をコード領域4,5内に形成し、チップ上の半導体集
積回路の電気的特性試験時に個片の情報を光学的に読み
取り、その良否の判定結果・グレード情報等を夫々のチ
ップ上に設けたメモリセルに記録することが出来、需要
に応じたグレードのチップのみを選別して組立てること
が可能となり、不用品の在庫を無くすことが出来る。
(57) [Abstract] [Purpose] In the stepper exposure of the patterning process of the aluminum layer, each identification code is formed in the semiconductor integrated circuit piece to improve the production efficiency in manufacturing. An aluminum layer 3 is provided around a chip region 2 provided on a semiconductor wafer, and when patterning the aluminum layer 3, a code pattern 6 is formed by patterning an individual identification code for each chip by stepper exposure. 4, 5 and optically read the information of the individual pieces at the time of the electrical characteristic test of the semiconductor integrated circuit on the chip, and the judgment result of the quality, grade information, etc. are stored in the memory cells provided on each chip. It is possible to record, and it is possible to select and assemble only the chips of the grade that meets the demand, and it is possible to eliminate the inventory of disused items.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は半導体集積回路の製造方
法に関し、特に同一半導体基板上にある複数の半導体集
積回路を識別する方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a semiconductor integrated circuit, and more particularly to a method for identifying a plurality of semiconductor integrated circuits on the same semiconductor substrate.

【0002】[0002]

【従来の技術】従来の半導体集積回路は図3に示すよう
に、半導体ウェーハ1のチップ領域2に設けた半導体集
積回路の電気的特性試験を行い、その結果不良となった
チップ上にインカー等によりマークを形成し、無印の良
品Aとマーク付の不良品Bを識別できるようにしてい
た。
2. Description of the Related Art In a conventional semiconductor integrated circuit, as shown in FIG. 3, an electrical characteristic test of a semiconductor integrated circuit provided in a chip area 2 of a semiconductor wafer 1 is performed, and as a result, an inker or the like is placed on a defective chip. The mark is formed by the above method so that the non-marked good product A and the marked defective product B can be distinguished.

【0003】[0003]

【発明が解決しようとする課題】上述した従来の半導体
集積回路では、グレード分類を行なう製品についても良
品のチップ全数を組立てて製品化し、電気的特性による
グレード選別を行っているため、需要の多いグレードの
ものから出荷され、需要の少いグレードのもは在庫され
ていた。そのため、需要の少いものまでも余分に作って
しまい、製造原価が高くなったり生産効率が低くなると
いう欠点がある。
In the conventional semiconductor integrated circuit described above, there is a great demand for grade classification products because all the good chips are assembled into products and grade selection is performed based on electrical characteristics. Shipped from grades, low demand grades were in stock. Therefore, there is a drawback in that even a product with a small demand is additionally manufactured, resulting in a high manufacturing cost and a low production efficiency.

【0004】[0004]

【課題を解決するための手段】本発明の半導体集積回路
は、半導体チップ領域の外周に設けた金属層と、前記金
属層の一部に設けて前記半導体チップの個体識別情報を
表示する識別パターンと、少くとも前記半導体チップの
一部に設けたメモリセルとを有する。
According to another aspect of the present invention, there is provided a semiconductor integrated circuit including a metal layer provided on an outer periphery of a semiconductor chip region and an identification pattern provided on a part of the metal layer to display individual identification information of the semiconductor chip. And a memory cell provided in at least a part of the semiconductor chip.

【0005】[0005]

【実施例】次に、本発明について図面を参照して説明す
る。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described with reference to the drawings.

【0006】図1(a),(b)は本発明の一実施例を
示す半導体チップの平面図及び部分拡大図である。
1A and 1B are a plan view and a partially enlarged view of a semiconductor chip showing an embodiment of the present invention.

【0007】図1(a),(b)に示すように、チップ
領域2の外周に設けたアルミニウム層3の一部にロット
番号や個体番号等の各チップ毎に固有の製品情報・個体
情報等をコード化して記録させたコードパターン6を有
するコード領域4,5を設けている。
As shown in FIGS. 1 (a) and 1 (b), product information / individual information unique to each chip such as a lot number and an individual number is provided in a part of the aluminum layer 3 provided on the outer periphery of the chip area 2. There are provided code areas 4 and 5 having a code pattern 6 in which the above codes are coded and recorded.

【0008】図2は本発明のコードパターン形成方法を
説明するための模式図である。
FIG. 2 is a schematic diagram for explaining the code pattern forming method of the present invention.

【0009】図2に示すように、アルミニウム層のパタ
ーニング工程のステッパー露光時にレチクル8に近接し
てコードパターンに対応するブラインド7を配置させ固
有データを縮小レンズ9を通して半導体ウェーハ1に同
時露光して各チップ領域2の外周に製品情報や個体認識
データを記録する。半導体ウェーハ上の半導体集積回路
の電気的特性試験時にチップ領域のコードパターンを光
学的に読み取り、その良否の判定結果や電気的特性によ
るグレード選別情報等を各々の半導体集積回路の個別情
報と共にチップ上のメモリセルに電子的に記録すること
が出来る。そのために、特性試験においてはマーキング
を行う必要もなく機械的なダメージを無くすことも出来
る。又、組立投入時には光学的に個体情報を読み取り記
録媒体上に記録されたデータと照合し必要なグレードの
チップのみを選別して組立てることが可能となる。
As shown in FIG. 2, a blind 7 corresponding to the code pattern is arranged close to the reticle 8 during stepper exposure in the patterning process of the aluminum layer, and unique data is simultaneously exposed to the semiconductor wafer 1 through the reduction lens 9. Product information and individual recognition data are recorded on the outer periphery of each chip area 2. When a semiconductor integrated circuit on a semiconductor wafer is tested for electrical characteristics, the code pattern in the chip area is optically read, and the quality judgment result and grade selection information based on the electrical characteristics are recorded on the chip along with individual information for each semiconductor integrated circuit. Can be electronically recorded in the memory cell. Therefore, it is possible to eliminate mechanical damage without performing marking in the characteristic test. In addition, at the time of assembling, the individual information is optically read and collated with the data recorded on the recording medium, and only the required grade chips can be selected and assembled.

【0010】[0010]

【発明の効果】以上説明したように本発明は、半導体ウ
ェーハの各チップ領域毎にステッパーによる識別パター
ンを形成することによって、電気的特性試験結果を個体
認識させることができ、製品組立における効率的投入や
製造コストを改善させるという効果を有する。
As described above, according to the present invention, the electric characteristic test result can be individually recognized by forming the identification pattern by the stepper for each chip area of the semiconductor wafer, and the product assembling efficiency can be improved. It has the effect of improving the input and manufacturing costs.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例を示す半導体チップの平面図
及び部分拡大図。
FIG. 1 is a plan view and a partially enlarged view of a semiconductor chip showing an embodiment of the present invention.

【図2】本発明のコードパターン形成方法を説明するた
めの模式図。
FIG. 2 is a schematic diagram for explaining a code pattern forming method of the present invention.

【図3】従来の半導体集積回路の一例を説明するための
半導体ウェーハの平面図。
FIG. 3 is a plan view of a semiconductor wafer for explaining an example of a conventional semiconductor integrated circuit.

【符号の説明】[Explanation of symbols]

1 半導体ウェーハ 2 チップ領域 3 アルミニウム層 4,5 コード領域 6 コードパターン 7 ブラインド 8 レチクル 9 縮小レンズ A 良品 B 不良品 1 semiconductor wafer 2 chip area 3 aluminum layer 4,5 code area 6 code pattern 7 blind 8 reticle 9 reduction lens A good product B defective product

Claims (1)

【特許請求の範囲】 【請求項1】 半導体チップ領域の外周に設けた金属層
と、前記金属層の一部に設けて前記半導体チップの個体
識別情報を表示する識別パターンと、少くとも前記半導
体チップの一部に設けたメモリセルとを有することを特
徴とする半導体集積回路。
Claim: What is claimed is: 1. A metal layer provided on an outer periphery of a semiconductor chip region, an identification pattern provided on a part of the metal layer to display individual identification information of the semiconductor chip, and at least the semiconductor. A semiconductor integrated circuit having a memory cell provided in a part of a chip.
JP3164830A 1991-07-05 1991-07-05 Semiconductor integrated circuit Pending JPH0513529A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3164830A JPH0513529A (en) 1991-07-05 1991-07-05 Semiconductor integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3164830A JPH0513529A (en) 1991-07-05 1991-07-05 Semiconductor integrated circuit

Publications (1)

Publication Number Publication Date
JPH0513529A true JPH0513529A (en) 1993-01-22

Family

ID=15800741

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3164830A Pending JPH0513529A (en) 1991-07-05 1991-07-05 Semiconductor integrated circuit

Country Status (1)

Country Link
JP (1) JPH0513529A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6703573B2 (en) 1997-01-17 2004-03-09 Micron Technology, Inc. Method for sorting integrated circuit devices
US6944567B2 (en) 1997-02-26 2005-09-13 Micron Technology, Inc. Method in an integrated circuit (IC) manufacturing process for identifying and redirecting ICs mis-processed during their manufacture
US7107117B2 (en) 1997-02-17 2006-09-12 Micron Technology, Inc. Sorting a group of integrated circuit devices for those devices requiring special testing
US7120287B2 (en) 1998-02-20 2006-10-10 Micron Technology, Inc. Non-lot based method for assembling integrated circuit devices
US7120513B1 (en) 1997-06-06 2006-10-10 Micron Technology, Inc. Method for using data regarding manufacturing procedures integrated circuits (ICS) have undergone, such as repairs, to select procedures the ICS will undergo, such as additional repairs
US7155300B2 (en) 1997-06-06 2006-12-26 Micron Technology, Inc. Method for using data regarding manufacturing procedures integrated circuits (IC's) have undergone, such as repairs, to select procedures the IC's will undergo, such as additional repairs
FR2906646A1 (en) * 2006-10-03 2008-04-04 Microcomposants De Haute Secur Integrated circuit marking method, involves marking primary information of type binary or hexadecimal on integrated circuit, and cutting marked integrated circuit to separate marked integrated circuit from rest of semiconductor wafer

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6703573B2 (en) 1997-01-17 2004-03-09 Micron Technology, Inc. Method for sorting integrated circuit devices
US7107117B2 (en) 1997-02-17 2006-09-12 Micron Technology, Inc. Sorting a group of integrated circuit devices for those devices requiring special testing
US7502659B2 (en) 1997-02-17 2009-03-10 Micron Technology, Inc. Sorting a group of integrated circuit devices for those devices requiring special testing
US6944567B2 (en) 1997-02-26 2005-09-13 Micron Technology, Inc. Method in an integrated circuit (IC) manufacturing process for identifying and redirecting ICs mis-processed during their manufacture
US7120513B1 (en) 1997-06-06 2006-10-10 Micron Technology, Inc. Method for using data regarding manufacturing procedures integrated circuits (ICS) have undergone, such as repairs, to select procedures the ICS will undergo, such as additional repairs
US7155300B2 (en) 1997-06-06 2006-12-26 Micron Technology, Inc. Method for using data regarding manufacturing procedures integrated circuits (IC's) have undergone, such as repairs, to select procedures the IC's will undergo, such as additional repairs
US7561938B2 (en) 1997-06-06 2009-07-14 Micron Technology, Inc. Method for using data regarding manufacturing procedures integrated circuits (ICS) have undergone, such as repairs, to select procedures the ICs will undergo, such as additional repairs
US7120287B2 (en) 1998-02-20 2006-10-10 Micron Technology, Inc. Non-lot based method for assembling integrated circuit devices
FR2906646A1 (en) * 2006-10-03 2008-04-04 Microcomposants De Haute Secur Integrated circuit marking method, involves marking primary information of type binary or hexadecimal on integrated circuit, and cutting marked integrated circuit to separate marked integrated circuit from rest of semiconductor wafer
WO2008043934A3 (en) * 2006-10-03 2008-06-26 Microcomposants Haute Securite Method for individually marking integrated circuits and integrated circuit marked according to said method

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