JPH05104879A - Desensitizing liquid for offset printing - Google Patents
Desensitizing liquid for offset printingInfo
- Publication number
- JPH05104879A JPH05104879A JP26991891A JP26991891A JPH05104879A JP H05104879 A JPH05104879 A JP H05104879A JP 26991891 A JP26991891 A JP 26991891A JP 26991891 A JP26991891 A JP 26991891A JP H05104879 A JPH05104879 A JP H05104879A
- Authority
- JP
- Japan
- Prior art keywords
- group
- general formula
- treatment liquid
- desensitizing
- offset printing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000007645 offset printing Methods 0.000 title claims abstract description 12
- 239000007788 liquid Substances 0.000 title abstract description 41
- -1 imide compound Chemical class 0.000 claims abstract description 78
- IMQLKJBTEOYOSI-UHFFFAOYSA-N Diphosphoinositol tetrakisphosphate Chemical compound OP(O)(=O)OC1C(OP(O)(O)=O)C(OP(O)(O)=O)C(OP(O)(O)=O)C(OP(O)(O)=O)C1OP(O)(O)=O IMQLKJBTEOYOSI-UHFFFAOYSA-N 0.000 claims abstract description 18
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 9
- 239000001257 hydrogen Substances 0.000 claims abstract description 9
- 150000003839 salts Chemical class 0.000 claims abstract description 8
- 125000003277 amino group Chemical group 0.000 claims abstract description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 5
- 150000001408 amides Chemical class 0.000 claims abstract description 4
- 150000003863 ammonium salts Chemical class 0.000 claims abstract description 4
- 125000005843 halogen group Chemical group 0.000 claims abstract description 4
- 125000001424 substituent group Chemical group 0.000 claims abstract description 4
- 239000000126 substance Substances 0.000 claims description 15
- IMQLKJBTEOYOSI-GPIVLXJGSA-N Inositol-hexakisphosphate Chemical compound OP(O)(=O)O[C@H]1[C@H](OP(O)(O)=O)[C@@H](OP(O)(O)=O)[C@H](OP(O)(O)=O)[C@H](OP(O)(O)=O)[C@@H]1OP(O)(O)=O IMQLKJBTEOYOSI-GPIVLXJGSA-N 0.000 claims description 13
- 235000002949 phytic acid Nutrition 0.000 claims description 13
- 229940068041 phytic acid Drugs 0.000 claims description 12
- 239000000467 phytic acid Substances 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 239000002253 acid Substances 0.000 abstract description 5
- 238000000586 desensitisation Methods 0.000 abstract description 2
- JMANVNJQNLATNU-UHFFFAOYSA-N oxalonitrile Chemical compound N#CC#N JMANVNJQNLATNU-UHFFFAOYSA-N 0.000 abstract 3
- 230000000052 comparative effect Effects 0.000 description 16
- 238000005530 etching Methods 0.000 description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- 238000007639 printing Methods 0.000 description 12
- 206010016807 Fluid retention Diseases 0.000 description 11
- 230000007613 environmental effect Effects 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 7
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 150000001412 amines Chemical class 0.000 description 6
- 230000007774 longterm Effects 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 239000012153 distilled water Substances 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- YAGKRVSRTSUGEY-UHFFFAOYSA-N ferricyanide Chemical compound [Fe+3].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-] YAGKRVSRTSUGEY-UHFFFAOYSA-N 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 125000000547 substituted alkyl group Chemical group 0.000 description 3
- 125000006039 1-hexenyl group Chemical group 0.000 description 2
- 125000006023 1-pentenyl group Chemical group 0.000 description 2
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 2
- 125000005999 2-bromoethyl group Chemical group 0.000 description 2
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 2
- GJYCVCVHRSWLNY-UHFFFAOYSA-N 2-butylphenol Chemical compound CCCCC1=CC=CC=C1O GJYCVCVHRSWLNY-UHFFFAOYSA-N 0.000 description 2
- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 2
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 2
- 125000006040 2-hexenyl group Chemical group 0.000 description 2
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 2
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 2
- 125000006020 2-methyl-1-propenyl group Chemical group 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- 125000004924 2-naphthylethyl group Chemical group C1=C(C=CC2=CC=CC=C12)CC* 0.000 description 2
- 125000006024 2-pentenyl group Chemical group 0.000 description 2
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 2
- QOXOZONBQWIKDA-UHFFFAOYSA-N 3-hydroxypropyl Chemical group [CH2]CCO QOXOZONBQWIKDA-UHFFFAOYSA-N 0.000 description 2
- 125000006050 3-methyl-2-pentenyl group Chemical group 0.000 description 2
- 125000006201 3-phenylpropyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 125000006278 bromobenzyl group Chemical group 0.000 description 2
- 125000004799 bromophenyl group Chemical group 0.000 description 2
- YFNONBGXNFCTMM-UHFFFAOYSA-N butoxybenzene Chemical group CCCCOC1=CC=CC=C1 YFNONBGXNFCTMM-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000013522 chelant Substances 0.000 description 2
- 125000004803 chlorobenzyl group Chemical group 0.000 description 2
- 125000000068 chlorophenyl group Chemical group 0.000 description 2
- 125000002946 cyanobenzyl group Chemical group 0.000 description 2
- 125000004802 cyanophenyl group Chemical group 0.000 description 2
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 239000003975 dentin desensitizing agent Substances 0.000 description 2
- 125000004188 dichlorophenyl group Chemical group 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- 125000006182 dimethyl benzyl group Chemical group 0.000 description 2
- ILRSCQWREDREME-UHFFFAOYSA-N dodecanamide Chemical compound CCCCCCCCCCCC(N)=O ILRSCQWREDREME-UHFFFAOYSA-N 0.000 description 2
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000001207 fluorophenyl group Chemical group 0.000 description 2
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 125000006178 methyl benzyl group Chemical group 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 125000004372 methylthioethyl group Chemical group [H]C([H])([H])SC([H])([H])C([H])([H])* 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 125000004923 naphthylmethyl group Chemical group C1(=CC=CC2=CC=CC=C12)C* 0.000 description 2
- 125000006502 nitrobenzyl group Chemical group 0.000 description 2
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000003755 preservative agent Substances 0.000 description 2
- 230000002335 preservative effect Effects 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000005017 substituted alkenyl group Chemical group 0.000 description 2
- 125000003107 substituted aryl group Chemical group 0.000 description 2
- 125000005346 substituted cycloalkyl group Chemical group 0.000 description 2
- 125000003944 tolyl group Chemical group 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical group NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 244000215068 Acacia senegal Species 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- 238000005642 Gabriel synthesis reaction Methods 0.000 description 1
- 229920000084 Gum arabic Polymers 0.000 description 1
- UEZVMMHDMIWARA-UHFFFAOYSA-N Metaphosphoric acid Chemical compound OP(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-N 0.000 description 1
- 238000006845 Michael addition reaction Methods 0.000 description 1
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical group C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical group C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 1
- 239000004288 Sodium dehydroacetate Substances 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 description 1
- 235000010489 acacia gum Nutrition 0.000 description 1
- 239000000205 acacia gum Substances 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 150000001350 alkyl halides Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000004069 aziridinyl group Chemical group 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 229920006317 cationic polymer Polymers 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- XPPKVPWEQAFLFU-UHFFFAOYSA-J diphosphate(4-) Chemical compound [O-]P([O-])(=O)OP([O-])([O-])=O XPPKVPWEQAFLFU-UHFFFAOYSA-J 0.000 description 1
- 235000011180 diphosphates Nutrition 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 150000002357 guanidines Chemical class 0.000 description 1
- 229940051250 hexylene glycol Drugs 0.000 description 1
- 239000003906 humectant Substances 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- 108091008695 photoreceptors Proteins 0.000 description 1
- XKJCHHZQLQNZHY-UHFFFAOYSA-N phthalimide Chemical compound C1=CC=C2C(=O)NC(=O)C2=C1 XKJCHHZQLQNZHY-UHFFFAOYSA-N 0.000 description 1
- 125000003386 piperidinyl group Chemical group 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000006268 reductive amination reaction Methods 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229940079839 sodium dehydroacetate Drugs 0.000 description 1
- 235000019259 sodium dehydroacetate Nutrition 0.000 description 1
- DSOWAKKSGYUMTF-GZOLSCHFSA-M sodium;(1e)-1-(6-methyl-2,4-dioxopyran-3-ylidene)ethanolate Chemical compound [Na+].C\C([O-])=C1/C(=O)OC(C)=CC1=O DSOWAKKSGYUMTF-GZOLSCHFSA-M 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 235000010356 sorbitol Nutrition 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 150000003752 zinc compounds Chemical class 0.000 description 1
Landscapes
- Printing Plates And Materials Therefor (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は電子写真オフセットマス
ター、直描マスター等の主として金属酸化物、金属硫化
物とその結着樹脂よりなる平版印刷版用の親水化処理
液、即ちエッチング液及び湿し水に関する。FIELD OF THE INVENTION The present invention relates to a hydrophilic treatment liquid for a lithographic printing plate mainly composed of a metal oxide, a metal sulfide and a binder resin for an electrophotographic offset master and a direct drawing master, that is, an etching liquid and a wetting liquid. Regarding Shimizu.
【０００２】[0002]
【従来の技術】本発明は電子写真オフセット印刷版面処
理液に関し、シアン化合物を一切含有しない、シアンフ
リーオフセット印刷用不感脂化処理液に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrophotographic offset printing plate surface treatment liquid, and more particularly to a cyan-free desensitizing treatment liquid for offset-free offset printing.
【０００３】電子写真オフセット印刷原版（以下マスタ
ーと称する）は、酸化亜鉛のごとき光導電性微粉末体を
樹脂結着剤中に分散した感光層を有し、この層上に通常
の電子写真操作を施して、親油性画像を形成させること
によって得られる。An electrophotographic offset printing original plate (hereinafter referred to as a master) has a photosensitive layer in which a photoconductive fine powder such as zinc oxide is dispersed in a resin binder, and a normal electrophotographic operation is performed on this layer. To obtain a lipophilic image.
【０００４】一般にオフセット印刷では、水に湿潤され
易い非画線部（親水性部）と湿潤され難い画線部（親油
性部）とから構成された版が使用されているが、電子写
真オフセット印刷原版は、疎水性の光導電層より成って
いるためそのまま印刷を施すと、非画線部にも印刷イン
キが付着し、正常な印刷を行うことができない。Generally, in offset printing, a plate composed of a non-image area (hydrophilic area) that is easily wetted by water and an image area (lipophilic area) that is difficult to be wetted is used. Since the printing original plate is composed of a hydrophobic photoconductive layer, if printing is performed as it is, the printing ink adheres to the non-image area, and normal printing cannot be performed.
【０００５】それ故に、印刷に先だって印刷原版の非画
線部を不感脂化処理し、親水性を付与してやる必要があ
る。従来より、この種の不感脂化処理液としてフェロシ
アン塩、フェリシアン塩を主成分とするシアン化合物含
有処理液、また、アンミンコバルト醋体、フィチン酸
（イノシットヘキサりん酸エステル）及びその誘導体、
グァニジン誘導体を主成分としたシアンフリー処理液が
提起されている。Therefore, prior to printing, it is necessary to desensitize the non-image areas of the printing original plate to render it hydrophilic. Conventionally, as this type of desensitizing treatment liquid, a ferrocyanine salt, a cyanide-containing treatment liquid containing a ferricyanide as a main component, an amminecobalt body, phytic acid (inosit hexaphosphate ester) and derivatives thereof ,
A cyan-free treatment liquid containing a guanidine derivative as a main component has been proposed.
【０００６】しかしながら、これらの処理液は充分満足
出来る処理液とは言えない。即ち、前者のフェロシアン
塩、フェリシアン塩含有処理液の場合は、不感脂化力は
強く、強固な親水性被膜形成能を持ち、成膜速度も速い
利点はあるが、反面フェロシアンイオン、フェリシアン
イオンは熱や光に対し不安定で光にさらすと着色し、沈
澱を生じて不感脂化力が弱まり、さらに強酸で処理する
シアンの分析において、毒性のないシアン錯体が遊離シ
アンとして検出されることにより排水等、公害の面にお
いて種々の問題を生じる欠点を持っている。However, these processing solutions cannot be said to be sufficiently satisfactory. That is, in the case of the former ferrocyan salt, a ferricyanate-containing treatment liquid, the desensitizing power is strong, has a strong hydrophilic film-forming ability, and has the advantage of a high film-forming rate, but on the other hand, ferrocyan ion, The ferricyan ion is unstable to heat and light and is colored when exposed to light, causing precipitation and weakening the desensitizing power.In addition, in the analysis of cyanide treated with strong acid, a non-toxic cyanide complex is detected as free cyanide. This causes various problems in terms of pollution such as drainage.
【０００７】一方、こうした点を考慮して後者のような
不感脂化剤を主成分としたシアンフリー処理液が提案さ
れているが、これらによっても未だ充分満足すべき平版
印刷原版を得る処理液とは言えない。具体的には、前者
に比べ成膜速度が遅く、プロセッサーを用いたエッチン
グ方式では１回通しで直ちに印刷可能な物理強度の高い
親水性被膜形成ができず、地汚れや網点階調につぶれを
生じる欠点を有している。On the other hand, a cyan-free processing liquid containing a desensitizing agent as a main component has been proposed in consideration of the above points, and even with these, a processing liquid for obtaining a sufficiently satisfactory lithographic printing plate precursor. It can not be said. Specifically, the film formation speed is slower than the former, and with the etching method using the processor, it is not possible to form a hydrophilic film with high physical strength that can be printed immediately in one pass, and it is crushed by background stains and halftone dots. It has the drawback of causing
【０００８】従来、フィチン酸及びその金属誘導体は金
属キレート化合物を形成することは周知の通りで、オフ
セット印刷原版の不感脂化剤としてすでに種々提供され
ている。しかし、これらはいずれも成膜速度が遅く、プ
ロセッサー１回の処理で印刷可能な親水性被膜が形成さ
れず、このためインキ分離性が悪く、地汚れや網点階調
のつぶれを生じる欠点がある。It is well known that phytic acid and its metal derivative form a metal chelate compound, and they have been already provided as various desensitizing agents for offset printing original plates. However, all of them have a drawback that the film-forming speed is slow, a printable hydrophilic film is not formed by a single treatment of the processor, and thus the ink separability is poor and background stains and halftone gradation are lost. is there.
【０００９】そこで上記問題点を解決するためにフィチ
ン酸系処理液中に種々の添加剤を添加する検討が行われ
ている。具体的には低級アミン、アルカノールアミン、
ポリアミン類を処理液中に添加したもの（特開昭５４−
１１７２０１、特開昭５３−１０９７０１、特開平１−
２５９９４号公報等）では、使用初期では保水性が良好
だが、連続使用するとエッチングが低下し保水性が低下
する。また、長期保存後使用すると保水性が低下し地汚
れが発生しやすくなる。Therefore, in order to solve the above problems, studies are being made to add various additives to the phytic acid-based treatment liquid. Specifically, lower amine, alkanolamine,
Those in which polyamines are added to the treatment liquid (Japanese Patent Laid-Open No. 54-54
117201, JP-A-53-109701, JP-A-1-
No. 25994, etc.), the water retention property is good at the initial stage of use, but when it is continuously used, etching is reduced and water retention property is reduced. Further, if it is used after long-term storage, the water retention property is lowered, and scumming easily occurs.
【００１０】さらに、カチオンポリマー類を処理液中に
添加したもの（特開昭６０−２３０９９号公報等）で
は、上記のものと同様に連続使用、長期保存後性能が低
下すること及びさびを生じたりする。Further, in the case where the cationic polymer is added to the treatment liquid (JP-A-60-23099, etc.), similar to the above, continuous use, deterioration in performance after long-term storage, and rusting occur. Or
【００１１】一方、近年、省力化という観点から不感脂
化処理システムを組み込んだ特に小型の自動印刷機の普
及がめざましく、また電子写真方式によるオフセットマ
スターは製版までの時間短縮が行われており、不感脂化
処理時間の迅速化、ロングライフ化に対応しなければな
らない状況にある。しかしこれらのことは従来公知の処
理液では困難である。On the other hand, in recent years, a particularly small automatic printing machine incorporating a desensitizing processing system has been remarkably spread from the viewpoint of labor saving, and the time required for plate making of the offset master by the electrophotographic method has been shortened. It is in a situation where it is necessary to deal with faster desensitization processing time and longer life. However, these things are difficult with the conventionally known processing solutions.
【００１２】[0012]
【発明が解決しようとする課題】本発明は公害に対して
問題がなく、長期保存、連続使用に対して安定であり、
更にはエッチング処理時間を短縮することができる不感
脂化処理性能にすぐれたオフセット印刷版用不感脂化処
理液及び湿し水の提供にある。The present invention has no problem with pollution, is stable for long-term storage and continuous use,
Further, it is to provide a desensitizing treatment liquid for offset printing plates and a fountain solution which are excellent in desensitizing treatment performance capable of shortening the etching treatment time.
【００１３】[0013]
【課題を解決するための手段】即ち、本発明になる以下
の処理液をエッチングに用いる事で上記問題点の解決を
達成される。That is, the above-mentioned problems can be solved by using the following processing liquid according to the present invention for etching.
【００１４】本発明のシアンフリーオフセット印刷用不
感脂化処理液は、下記（ａ）および（ｂ）を少なくとも
各々１種以上含有することを特徴とする。The desensitizing solution for cyan-free offset printing of the present invention is characterized by containing at least one or more of the following (a) and (b).
【００１５】（ａ）フィチン酸（イノシットヘキサりん
酸エステル）及び／又はフィチン酸の金属塩及び／又は
アンモニウム塩。(A) Phytic acid (inositol hexaphosphate ester) and / or metal salt and / or ammonium salt of phytic acid.
【００１６】（ｂ）少なくとも１個以上の下記一般式
（１）で示されるアミノ基を含有する無機性／有機性値
０．１以上４．０以下の下記一般式（２）で示されるア
ミド及び／又は下記一般式（３）で示されるイミド化合
物。(B) An amide represented by the following general formula (2) containing at least one amino group represented by the following general formula (1) and having an inorganic / organic value of 0.1 or more and 4.0 or less. And / or an imide compound represented by the following general formula (3).
【００１７】[0017]
【化２】 [Chemical 2]
【００１８】（Ｒ1 、Ｒ2 は水素及び／又は有機残基を
表し、さらには互いに連結して環構造を形成してもよ
い。ａ1 、ａ2 は水素及び／又は有機残基及び／又はハ
ロゲン原子、水酸基等の置換基を表す。） 無機性／有機性値とは、有機化合物の静電的性格（極性
的性格）の程度を表す値であり、甲田善生著「有機概念
図」（三共出版１９８５年５月１０日発行）などに記載
されている。(R 1 and R 2 represent hydrogen and / or an organic residue, and may be linked to each other to form a ring structure. A 1 and a 2 are hydrogen and / or an organic residue and / or Or represents a substituent such as a halogen atom or a hydroxyl group.) The inorganicity / organicity value is a value representing the degree of electrostatic character (polar character) of an organic compound, and Yoshio Koda "Organic Conceptual Diagram" (Sankyo Publishing, published May 10, 1985).
【００１９】Ｒ1 、Ｒ2 は好ましくは水素及び／又は炭
素数１〜２２の置換されてもよいアルキル基、シクロア
ルキル基、アルケニル基、アラルキル基、アリール基を
表し、さらには、これらはともに連結して環を形成して
もよい。また、これらに置換する置換基としては水酸
基、カルボキシル基、アルコキシ基、スルフィド基、ア
ミノ基、ハロゲン原子、シアノ基、ニトロ基、エステル
基等の置換基が挙げられる。R 1 and R 2 are preferably hydrogen and / or an optionally substituted alkyl group having 1 to 22 carbon atoms, a cycloalkyl group, an alkenyl group, an aralkyl group or an aryl group, and further, they are both They may be linked to form a ring. Further, examples of the substituent substituting for these include a hydroxyl group, a carboxyl group, an alkoxy group, a sulfide group, an amino group, a halogen atom, a cyano group, a nitro group, and an ester group.
【００２０】ａ1 、ａ2 は水素及び／又は炭素数１ない
し１８のＲ1 、Ｒ2 に準ずる有機残基である。A 1 and a 2 are hydrogen and / or an organic residue corresponding to R 1 and R 2 having 1 to 18 carbon atoms.
【００２１】さらに好ましくは、Ｒ1 、Ｒ2 は炭素数１
〜１８の置換されてもよいアルキル基（例えばメチル、
エチル、プロピル、イソプロピル、ブチル、イソブチ
ル、ヘプチル、ヘキシル、２−エチルヘキシル、オクチ
ル、デシル、ドデシル、ヘキサデシル、オクタデシル、
２−ヒドロキシエチル、２−ヒドロキシプロピル、３−
ヒドロキシプロピル、４−ヒドロキシブチル、２−ヒド
ロキシブチル、２−メトキシエチル、２−ブトキシエチ
ル、２−エトキシエチル、４−メトキシブチル、メチル
チオエチル、メチルチオブチル、２−アミノエチル、
Ｎ，Ｎ´−ジメチルアミノエチル、ピペリジノエチル、
ピロリジノエチル、２−クロロエチル、２−クロロブチ
ル、２−ブロモエチル、２−シアノエチル、４−シアノ
ブチル等）、置換されてもよいアルケニル基（例えば２
−メチル−１−プロペニル、２−ブテニル、２−ペンテ
ニル、３−メチル−２−ペンテニル、１−ペンテニル、
１−ヘキセニル、２−ヘキセニル、４−メチル−２−ヘ
キセニル、ビニル、２−プロペニル、３−ブテニル
等）、置換されてもよいアラルキル基（例えばベンジ
ル、フェネチル、３−フェニルプロピル、ナフチルメチ
ル、２−ナフチルエチル、クロロベンジル、ブロモベン
ジル、メチルベンジル、エチルベンジル、メトキシベン
ジル、ジメチルベンジル、ジメトキシベンジル、シアノ
ベンジル、ニトロベンジル等）、置換されてもよいシク
ロアルキル基（例えばシクロプロピル、シクロブチル、
シクロペンチル、シクロヘキシル、シクロヘプチル、４
−メチルシクロヘキシル、４−クロロシクロヘキシル、
４−メトキシシクロヘキシル、４−シアノシクロヘキシ
ル等）、置換されてもよいアリール基（例えば、フェニ
ル基、トリル基、エチルフェニル基、プロピルフェニル
基、クロロフェニル基、フロロフェニル基、ブロモフェ
ニル基、クロロ−メチル−フェニル基、ジクロロフェニ
ル基、メトキシフェニル基、シアノフェニル基、アセト
アミドフェニル基、アセチルフェニル基、ブトキシフェ
ニル基）等を表す。More preferably, R 1 and R 2 have 1 carbon atoms.
To 18 optionally substituted alkyl groups (eg methyl,
Ethyl, propyl, isopropyl, butyl, isobutyl, heptyl, hexyl, 2-ethylhexyl, octyl, decyl, dodecyl, hexadecyl, octadecyl,
2-hydroxyethyl, 2-hydroxypropyl, 3-
Hydroxypropyl, 4-hydroxybutyl, 2-hydroxybutyl, 2-methoxyethyl, 2-butoxyethyl, 2-ethoxyethyl, 4-methoxybutyl, methylthioethyl, methylthiobutyl, 2-aminoethyl,
N, N'-dimethylaminoethyl, piperidinoethyl,
Pyrrolidinoethyl, 2-chloroethyl, 2-chlorobutyl, 2-bromoethyl, 2-cyanoethyl, 4-cyanobutyl, etc.), an optionally substituted alkenyl group (eg 2
-Methyl-1-propenyl, 2-butenyl, 2-pentenyl, 3-methyl-2-pentenyl, 1-pentenyl,
1-hexenyl, 2-hexenyl, 4-methyl-2-hexenyl, vinyl, 2-propenyl, 3-butenyl, etc.), an optionally substituted aralkyl group (eg benzyl, phenethyl, 3-phenylpropyl, naphthylmethyl, 2 -Naphthylethyl, chlorobenzyl, bromobenzyl, methylbenzyl, ethylbenzyl, methoxybenzyl, dimethylbenzyl, dimethoxybenzyl, cyanobenzyl, nitrobenzyl, etc.), an optionally substituted cycloalkyl group (eg cyclopropyl, cyclobutyl,
Cyclopentyl, cyclohexyl, cycloheptyl, 4
-Methylcyclohexyl, 4-chlorocyclohexyl,
4-methoxycyclohexyl, 4-cyanocyclohexyl, etc.), an optionally substituted aryl group (eg, phenyl group, tolyl group, ethylphenyl group, propylphenyl group, chlorophenyl group, fluorophenyl group, bromophenyl group, chloro-methyl group) -Phenyl group, dichlorophenyl group, methoxyphenyl group, cyanophenyl group, acetamidophenyl group, acetylphenyl group, butoxyphenyl group) and the like.
【００２２】さらにＲ1 、Ｒ2 はともに連結してアジリ
ジン環、ピロリジン環、ピペリジン環、モルホリン環等
の環を形成してもよい。Further, R 1 and R 2 may be linked together to form a ring such as an aziridine ring, a pyrrolidine ring, a piperidine ring or a morpholine ring.
【００２３】ａ1 、ａ2 は水素及び／又は炭素数１〜１
８の置換されてもよいアルキル基（例えばメチル、エチ
ル、プロピル、イソプロピル、ブチル、イソブチル、ヘ
プチル、ヘキシル、２−エチルヘキシル、オクチル、デ
シル、ドデシル、ヘキサデシル、オクタデシル、２−ヒ
ドロキシエチル、２−ヒドロキシプロピル、３−ヒドロ
キシプロピル、４−ヒドロキシブチル、２−ヒドロキシ
ブチル、２−メトキシエチル、２−ブトキシエチル、２
−エトキシエチル、４−メトキシブチル、メチルチオエ
チル、メチルチオブチル、２−アミノエチル、Ｎ，Ｎ´
−ジメチルアミノエチル、ピペリジノエチル、ピロリジ
ノエチル、２−クロロエチル、２−クロロブチル、２−
ブロモエチル、２−シアノエチル、４−シアノブチル、
Ｎ，Ｎ´−ジメチルアミノプロピル、Ｎ，Ｎ´−ジエチ
ルアミノプロピル、Ｎ，Ｎ´−ジノルマルプロピルアミ
ノプロピル、Ｎ，Ｎ´−ジイソプロピルアミノプロピ
ル、Ｎ，Ｎ´−ジノルマルブチルアミノプロピル、Ｎ，
Ｎ´−ジノルマルヘキシルアミノプロピル、Ｎ，Ｎ´−
ジエタノールアミノプロピル、Ｎ，Ｎ´−ジイソプロパ
ノールアミノプロピル、Ｎ，Ｎ´−ジメチルアミノブチ
ル、等）、置換されてもよいアルケニル基（例えば２−
メチル−１−プロペニル、２−ブテニル、２−ペンテニ
ル、３−メチル−２−ペンテニル、１−ペンテニル、１
−ヘキセニル、２−ヘキセニル、４−メチル−２−ヘキ
セニル、ビニル、２−プロペニル、３−ブテニル等）、
置換されてもよいアラルキル基（例えばベンジル、フェ
ネチル、３−フェニルプロピル、ナフチルメチル、２−
ナフチルエチル、クロロベンジル、ブロモベンジル、メ
チルベンジル、エチルベンジル、メトキシベンジル、ジ
メチルベンジル、ジメトキシベンジル、シアノベンジ
ル、ニトロベンジル等）、置換されてもよいシクロアル
キル基（例えばシクロプロピル、シクロブチル、シクロ
ペンチル、シクロヘキシル、シクロヘプチル、４−メチ
ルシクロヘキシル、４−クロロシクロヘキシル、４−メ
トキシシクロヘキシル、４−シアノシクロヘキシル
等）、置換されてもよいアリール基（例えば、フェニル
基、トリル基、エチルフェニル基、プロピルフェニル
基、クロロフェニル基、フロロフェニル基、ブロモフェ
ニル基、クロロ−メチル−フェニル基、ジクロロフェニ
ル基、メトキシフェニル基、シアノフェニル基、アセト
アミドフェニル基、アセチルフェニル基、ブトキシフェ
ニル基）等、水酸基、塩素、臭素、ヨウ素等を表す。A 1 and a 2 are hydrogen and / or 1 to 1 carbon atoms
8 optionally substituted alkyl groups (eg methyl, ethyl, propyl, isopropyl, butyl, isobutyl, heptyl, hexyl, 2-ethylhexyl, octyl, decyl, dodecyl, hexadecyl, octadecyl, 2-hydroxyethyl, 2-hydroxypropyl , 3-hydroxypropyl, 4-hydroxybutyl, 2-hydroxybutyl, 2-methoxyethyl, 2-butoxyethyl, 2
-Ethoxyethyl, 4-methoxybutyl, methylthioethyl, methylthiobutyl, 2-aminoethyl, N, N '
-Dimethylaminoethyl, piperidinoethyl, pyrrolidinoethyl, 2-chloroethyl, 2-chlorobutyl, 2-
Bromoethyl, 2-cyanoethyl, 4-cyanobutyl,
N, N'-dimethylaminopropyl, N, N'-diethylaminopropyl, N, N'-dinormalpropylaminopropyl, N, N'-diisopropylaminopropyl, N, N'-dinormalbutylaminopropyl, N,
N'-Dinormalhexylaminopropyl, N, N'-
Diethanolaminopropyl, N, N'-diisopropanolaminopropyl, N, N'-dimethylaminobutyl, etc.), an optionally substituted alkenyl group (eg 2-
Methyl-1-propenyl, 2-butenyl, 2-pentenyl, 3-methyl-2-pentenyl, 1-pentenyl, 1
-Hexenyl, 2-hexenyl, 4-methyl-2-hexenyl, vinyl, 2-propenyl, 3-butenyl, etc.),
Aralkyl groups which may be substituted (eg benzyl, phenethyl, 3-phenylpropyl, naphthylmethyl, 2-
Naphthylethyl, chlorobenzyl, bromobenzyl, methylbenzyl, ethylbenzyl, methoxybenzyl, dimethylbenzyl, dimethoxybenzyl, cyanobenzyl, nitrobenzyl, etc.), optionally substituted cycloalkyl group (eg cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl) , Cycloheptyl, 4-methylcyclohexyl, 4-chlorocyclohexyl, 4-methoxycyclohexyl, 4-cyanocyclohexyl, etc., and an optionally substituted aryl group (eg, phenyl group, tolyl group, ethylphenyl group, propylphenyl group, Chlorophenyl group, fluorophenyl group, bromophenyl group, chloro-methyl-phenyl group, dichlorophenyl group, methoxyphenyl group, cyanophenyl group, acetamidophenyl group, acetyl group Phenyl group, butoxyphenyl group), a hydroxyl group, chlorine, bromine, iodine.
【００２４】また、好ましくはアミノ基は１分子中１個
から１０個含有され、より好ましくは１分子中１個から
６個を含有する。さらに好ましくはアミド結合及び／又
はイミド結合は１分子中１個から１０個含有されより好
ましくは１分子中１個から６個を含有する。Further, preferably 1 to 10 amino groups are contained in one molecule, and more preferably 1 to 6 amino groups are contained in one molecule. More preferably, 1 to 10 amide bonds and / or imide bonds are contained in one molecule, and more preferably 1 to 6 amide bonds are contained in one molecule.
【００２５】本発明で表される化合物について具体例を
以下に述べる。但し本発明の範囲は、これらに限定され
るものではない。Specific examples of the compounds represented by the present invention are described below. However, the scope of the present invention is not limited to these.
【００２６】[0026]
【化３】 [Chemical 3]
【００２７】[0027]
【化４】 [Chemical 4]
【００２８】[0028]
【化５】 [Chemical 5]
【００２９】[0029]
【化６】 [Chemical 6]
【００３０】[0030]
【化７】 [Chemical 7]
【００３１】[0031]
【化８】 [Chemical 8]
【００３２】[0032]
【化９】 [Chemical 9]
【００３３】[0033]
【化１０】 [Chemical 10]
【００３４】[0034]
【化１１】 [Chemical 11]
【００３５】[0035]
【化１２】 [Chemical 12]
【００３６】[0036]
【化１３】 [Chemical 13]
【００３７】[0037]
【化１４】 [Chemical 14]
【００３８】本発明のアミン化合物は「新実験化学講座
１４」（丸善１９７８年刊）Ｊ．Ａｍ．Ｃｈｅｍ．Ｓｏ
ｃ．７２，３０７３（１９５０）記載のアミンとハロゲ
ン化アルキル化合物とのＳＮ２反応、アミンとカルボニ
ル化合物との還元的アミノ化、二重結合へのアミンマイ
ケル付加、酸塩化物と１級及び／又は２級アミン化合物
との反応、１級アミン化合物と酸無水物との脱水縮合反
応、イミド化合物とハロゲン化アルキル化合物とのＳＮ
２反応及びフタルイミドとハロゲン化アルキルによるガ
ブリエル反応等により合成することができる。The amine compound of the present invention is described in "New Experimental Chemistry Course 14" (published by Maruzen 1978) J. Am. Chem. So
c. 72 , 3073 (1950), SN2 reaction of an amine with an alkyl halide compound, reductive amination of an amine with a carbonyl compound, amine Michael addition to a double bond, acid chloride with primary and / or secondary. Reaction with amine compound, dehydration condensation reaction of primary amine compound and acid anhydride, SN of imide compound and alkyl halide compound
It can be synthesized by two reactions, a Gabriel reaction with phthalimide and an alkyl halide, or the like.
【００３９】本発明の処理液を構成する物質の使用量
は、本処理剤１０００重量部中、亜鉛イオンとキレート
形成能を有するフィチン酸及びフィチン酸塩１０〜３０
０重量部、より好ましくは３０〜１００重量部、アミン
化合物０．１〜１００重量部、より好ましくは０．１〜
５０重量部である。また本発明のアミン化合物は単独で
用いても２種以上を併用してもかまわない。The amount of the substance constituting the treating solution of the present invention is 10 to 30 of phytic acid and phytate having a chelate-forming ability with zinc ion in 1000 parts by weight of the present treating agent.
0 parts by weight, more preferably 30 to 100 parts by weight, 0.1 to 100 parts by weight of amine compound, more preferably 0.1 to 100 parts by weight.
It is 50 parts by weight. The amine compound of the present invention may be used alone or in combination of two or more kinds.
【００４０】これらの化合物をイオン交換水又は水道水
に溶解させて本処理液とする。溶解の順序は特に制限さ
れないが、好ましくは水に亜鉛イオンとキレート形成能
を有するアニオン化合物を溶解させた後、アミン化合物
を加える。処理液には上記成分の他にｐＨ調整剤として
有機・無機の酸類、水酸化カリウム、水酸化ナトリウム
等の塩基性水酸化物、湿潤剤としてエチレングリコー
ル、ソルビトール、グリセリン、アラビアゴム、ジプロ
ピレングリコール、ジメチルアセトアミド、ヘキシレン
グリコールブタジオール、ブチルセロソルブ、界面活性
剤等、防腐剤としてサリチル酸、フェノールパラ安息香
酸ブチル、デヒドロ酢酸ナトリウム、４−イソチアゾリ
ン−３−オン化合物等、防錆剤としてＥＤＴＡ、ピロリ
ン酸、メタリン酸、ヘキサメタリン酸、２−メルカプト
ベンズイミダゾール等を適当量添加して使用することが
出来る。また、処理液を実施するにあたり、処理液のｐ
Ｈ値は３〜６の範囲にするのが好ましい。又、水で稀釈
して湿し水としても使用できる。These compounds are dissolved in ion-exchanged water or tap water to obtain the main treatment liquid. The order of dissolution is not particularly limited, but preferably the zinc compound and the anion compound having a chelate-forming ability are dissolved in water, and then the amine compound is added. In the treatment liquid, in addition to the above components, organic and inorganic acids as pH adjusters, basic hydroxides such as potassium hydroxide and sodium hydroxide, and ethylene glycol, sorbitol, glycerin, gum arabic, dipropylene glycol as wetting agents. , Dimethylacetamide, hexylene glycol butadiol, butyl cellosolve, surfactants, and the like, salicylic acid as a preservative, butyl phenol parabenzoate, sodium dehydroacetate, 4-isothiazolin-3-one compound, etc., EDTA as a rust inhibitor, pyrophosphate , Metaphosphoric acid, hexametaphosphoric acid, 2-mercaptobenzimidazole and the like can be used by adding in appropriate amounts. Moreover, when carrying out the treatment liquid, p of the treatment liquid is
The H value is preferably in the range of 3 to 6. It can also be used as fountain solution by diluting with water.
【００４１】[0041]
【作用】フィチン酸及びフィチン酸塩に本発明のアミン
化合物を添加することでフィチン酸のアミン塩が形成さ
れる。この塩は低級アミン及びアルカノールアミン塩と
は異なり、アミン化合物が高級脂肪族基を有しているこ
とにより、不感脂化処理液中に感光体が浸漬されたとき
非画像部との親和性が高められ、酸化亜鉛のイオン化反
応及びキレート反応が容易に進行し、その結果としてエ
ッチング速度を向上させることができるものと考えられ
る。[Function] By adding the amine compound of the present invention to phytic acid and phytate, an amine salt of phytic acid is formed. Unlike the lower amine and alkanolamine salts, this salt has a higher aliphatic group in the amine compound, so that when the photoreceptor is immersed in the desensitizing solution, it has no affinity for the non-image area. It is considered that the ionization reaction and the chelate reaction of zinc oxide are easily promoted, and as a result, the etching rate can be improved.
【００４２】また、エッチング速度が向上することでエ
ッチング時間が短縮されることから、同じランニング枚
数でも版がエッチング液中に存在している時間が少な
く、エッチング液中で沈澱などの原因となるＺｎ2+イオ
ン等の混入を押さえること、さらには、本発明のアミン
化合物は低級アミン及びアルカノールアミン等に比べて
沸点が高いので、長期間経時及びランニング時の液温上
昇等に対して蒸発・分解等による液組成の変化が少なく
なること等の効果により、経時安定性、ランニング性が
向上するものと推定される。Further, since the etching time is shortened by improving the etching rate, the time during which the plate remains in the etching solution is small even with the same number of running sheets, and Zn which causes precipitation etc. in the etching solution. It suppresses the mixing of 2+ ions, etc., and since the amine compound of the present invention has a higher boiling point than lower amines and alkanolamines, it evaporates / decomposes over a long period of time or when the liquid temperature rises during running. It is presumed that the stability with time and the running property are improved due to the effect of reducing the change in the liquid composition due to the above.
【００４３】以上の如く、本発明の処理液は公害上問題
となり、且つ光や熱によって劣化するフェロシアン、フ
ェリシアン化合物を含まず、長期保存下でも安定で、変
色、沈澱をせず、従来のシアンふりー処理液に比べ印刷
環境の影響を受けず、しかも著しく成膜速度が向上し、
高速エッチング処理によっても地汚れや網点階調のつぶ
れの出ないオフセット印刷原版を得ることができる優れ
たシアンフリーの処理液である。以下に本発明の実施例
を例示するが、本発明の内容がこれらに限定されるもの
ではない。As described above, the treatment liquid of the present invention does not contain ferrocyanine and ferricyanide compounds which pose a problem in terms of pollution and are deteriorated by light and heat, are stable even after long-term storage, and do not discolor or precipitate. Compared with Cyan Furi treatment solution, it is not affected by the printing environment, and the film formation speed is significantly improved.
It is an excellent cyan-free processing liquid that can provide an offset printing original plate that does not cause background stains and halftone gradation collapse even by high-speed etching. Examples of the present invention will be illustrated below, but the contents of the present invention are not limited thereto.
【００４４】[0044]
実施例１ 水 １０００重量部 フィチン酸カリウム塩 ８０重量部 Ｎ−［Ｎ，Ｎ´−ジエチルアミノプロピル］ ４重量部 ノルマルドデシルアミド比較例Ａ 上記実施例１のアミン化合物を含まない無添加系。 比較例Ｂ 上記実施例１のアミン化合物をジエチルアミンに代えた
系。 比較例Ｃ 上記実施例１のアミン化合物をモノエタノールアミンに
代えた系。以上を充分溶解し、ＫＯＨを加えてＰＨ＝
４．３に調整した。これらを用いた実技評価結果を表１
に示す。Example 1 Water 1000 parts by weight Phytic acid potassium salt 80 parts by weight N- [N, N'-diethylaminopropyl] 4 parts by weight Normal dodecyl amide Comparative Example A Additive-free system containing no amine compound of Example 1 above. Comparative Example B A system in which the amine compound of Example 1 above is replaced with diethylamine. Comparative Example C A system in which the amine compound of Example 1 above is replaced with monoethanolamine. Dissolve the above sufficiently, add KOH and PH =
Adjusted to 4.3. Table 1 shows the results of the practical skill evaluation using these.
Shown in.
【００４５】[0045]
【表１】 [Table 1]
【００４６】表１に記した評価項目の実施の態様は以下
の通りである。注１）生版保水生：感光材料そのものを
（製版しない原版：即ち、生版と略称）実施例１及び比
較例Ａ〜Ｃで調製した不感脂化液を用いて、エッチング
マシーンを１回通した。次に、これらの版をハマダスタ
ー（株）製ハマダスター８００ＳＸ型、湿し水として実
施例１の処理液を蒸留水で５倍に希釈したものを用いて
印刷し、刷り出しから５０枚目の印刷物を地汚れの有無
を目視で評価した。Embodiments of the evaluation items shown in Table 1 are as follows. Note 1) Raw plate water retention raw material: The light-sensitive material itself (original plate not made into a plate: abbreviated as raw plate) was subjected to one etching machine using the desensitizing solution prepared in Example 1 and Comparative Examples A to C. did. Next, these plates were printed using a Hamada Star 800SX type manufactured by Hamada Star Co., Ltd., and the dampening water obtained by diluting the treatment liquid of Example 1 to 5 times with distilled water. The printed matter was visually evaluated for the presence or absence of background stain.
【００４７】注２）ランニング性：ＥＬＰ−Ｉ感材及び
全自動製版機ＥＬＰ４０４Ｖ（富士写真フイルム（株）
製）を１昼夜常温・常湿（２０℃、６５％）に放置した
後、製版して複写画像を形成し、得られた複写原版６０
００枚を実施例１及び比較例Ａ〜Ｃで調製した処理液を
入れたエッチングマシーンに１回づつ通した。その後、
６０００枚目の版を生版保水性の場合と同様に印刷及び
地汚れの評価を行った。Note 2) Running property: ELP-I sensitive material and fully automatic plate-making machine ELP404V (Fuji Photo Film Co., Ltd.)
The manufactured original plate 60 after being left at room temperature and normal humidity (20 ° C., 65%) for 1 day and then plate-formed to form a copy image.
One hundred sheets were passed once through an etching machine containing the treatment solutions prepared in Example 1 and Comparative Examples A to C. afterwards,
The 6000th plate was subjected to printing and background stain evaluation in the same manner as in the case of water retention in the original plate.
【００４８】注３）経時安定性：実施例１及び比較例Ａ
〜Ｃの不感脂化液を２週間のサーモ条件下（５０℃、８
０％ＲＨ）においた。その後、ランニング性評価の場合
と同様にして複写原版を作成し、これを上記不感脂化液
を入れたエッチングマシーンに１回通した。その後、生
版保水性の場合と同様に印刷及び地汚れの評価を行っ
た。Note 3) Stability over time: Example 1 and Comparative Example A
To C desensitizing solution under thermo conditions for 2 weeks (50 ° C., 8
0% RH). Thereafter, a copy original plate was prepared in the same manner as in the running property evaluation, and the copy original plate was passed once through the etching machine containing the desensitizing solution. Then, the printing and the background stain were evaluated in the same manner as in the case of the water retention of the original plate.
【００４９】本発明の処理液は生版保水性が良好で、特
に環境条件が（３５℃、８０％ＲＨ）変動した時、比較
例Ｂ、Ｃは生版保水性が大きく低下するのに対して、本
発明の処理液は低下しないという、環境条件に左右され
にくい特徴を有している。The treatment liquids of the present invention have good raw plate water retention, and Comparative Examples B and C greatly reduce the water retention of the original plate when the environmental conditions change (35 ° C., 80% RH). Thus, the treatment liquid of the present invention has a characteristic that it does not deteriorate and is not easily influenced by environmental conditions.
【００５０】ランニング性については比較例Ｂ、Ｃでは
処理液中に沈澱が生じ性能が低下するが、本発明の処理
液は６０００版ランニングした後でも沈澱などの発生が
なく、初期と同等の性能を有している。さらに、経時安
定性も比較例Ａ〜Ｃに比べ良好で、長期間の保存にも十
分耐うる性能を持つ。以上のように、環境条件、連続使
用、長期保存に耐え、地汚れの出ない不感脂化処理液は
本発明の処理液のみであった。Regarding the running property, in Comparative Examples B and C, the performance is lowered due to precipitation in the treatment liquid, but the treatment liquid of the present invention does not cause precipitation even after 6000 plate running, and the performance is equivalent to the initial performance. have. Furthermore, the stability over time is better than that of Comparative Examples A to C, and it has sufficient performance to withstand long-term storage. As described above, the desensitizing treatment liquid which is resistant to environmental conditions, continuous use, and long-term storage and does not cause scumming was the treatment liquid of the present invention.
【００５１】実施例２〜２５ 実施例１におけるアミン化合物を以下の表２に示す他の
化合物に変更し、さらに添加量を変えて実施例１と同様
な評価項目を検討した。Examples 2 to 25 The same evaluation items as in Example 1 were examined by changing the amine compound in Example 1 to another compound shown in Table 2 below and further changing the addition amount.
【００５２】[0052]
【表２】 [Table 2]
【００５３】実施例２〜２５は実施例１と同様に生版保
水性、環境変化、ランニング性、経時安定性共に良好で
あった。Similar to Example 1, Examples 2 to 25 were good in water retention of the original plate, environmental change, running property and stability with time.
【００５４】実施例２６〜４１ 本発明のアミン化合物を以下の表２に示すように数種組
み合わせ、添加量を４重量部に固定し、実施例１と同様
にして生版保水性、ランニング性、経時安定性を評価し
た。Examples 26 to 41 As shown in Table 2 below, several kinds of the amine compounds of the present invention were combined and the addition amount was fixed to 4 parts by weight. The stability over time was evaluated.
【００５５】[0055]
【表３】 [Table 3]
【００５６】実施例２６〜４１は実施例１と同様に生版
保水性、環境変化、ランニング性、経時安定性共に良好
であり、本発明のアミン化合物は数種併用しても問題な
いことを示す。Similar to Example 1, Examples 26 to 41 are good in water retention of the stencil, environmental change, running property and stability over time, and it is possible to use several kinds of the amine compounds of the present invention without any problem. Show.
【００５７】実施例４２〜４８ 実施例１と同組成の処理液に表４に示す種々の湿潤剤、
防腐剤、防錆剤を添加した処理液を実施例１と同様に種
々の性能を評価した。Examples 42 to 48 Various humectants shown in Table 4 were added to the treatment liquid having the same composition as in Example 1.
Various performances of the treatment liquid containing the preservative and the rust preventive were evaluated in the same manner as in Example 1.
【００５８】[0058]
【表４】 [Table 4]
【００５９】実施例４２〜４８は実施例１と同様に生版
保水性、環境変化、ランニング性、経時安定性共に良好
であり、本発明の不感脂化処理液は上記の種々の添加剤
を添加しても性能に影響しない。 実施例４９ 実施例１の処理液を蒸留水で５倍に希釈したものを湿し
水として使用。Similar to Example 1, Examples 42 to 48 have good raw plate water retention, environmental change, running property, and stability over time. The desensitizing solution of the present invention contains the above-mentioned various additives. Addition does not affect performance. Example 49 The treatment liquid of Example 1 was diluted 5 times with distilled water and used as dampening water.
【００６０】比較例Ｄ 比較例Ａの処理液を蒸留水で５倍に希釈したものを湿し
水として使用。 比較例Ｅ 比較例Ｂの処理液を蒸留水で５倍に希釈したものを湿し
水として使用。表５に実施例４９及び比較例Ｄ、Ｅの評
価結果を示す。Comparative Example D The treatment liquid of Comparative Example A was diluted 5 times with distilled water and used as dampening water. Comparative Example E The treatment liquid of Comparative Example B diluted 5 times with distilled water was used as dampening water. Table 5 shows the evaluation results of Example 49 and Comparative Examples D and E.
【００６１】[0061]
【表５】 [Table 5]
【００６２】表５に記した評価項目の実施の態様は以下
の通りである。 注４）印刷物の地汚れ 注２）と同一の操作で製版した後、実施例１の不感脂化
処理液を用いてエッチングマシーンを１回通した後、こ
れらの版をハマダスター（株）製ハマダスター８００Ｓ
Ｘ型を用い、湿し水として実施例４９及び比較例Ｄ、Ｅ
を使用して印刷を行い、印刷物の地汚れが目視で判別で
きるまでの印刷枚数を調べた。本発明の不感脂化処理液
は比較例Ｄ、Ｅと比較し地汚れが発生せず、湿し水とし
て用いても高い性能を有する。Embodiments of the evaluation items shown in Table 5 are as follows. Note 4) Background stain of printed matter After making a plate by the same operation as that of Note 2), the plate was passed through an etching machine once using the desensitizing solution of Example 1, and then these plates were made by Hamada Star Co., Ltd. Hamada Star 800S
Example 49 and Comparative Examples D and E were used as fountain solution by using the X type.
Was used to print, and the number of printed sheets was checked until the background stain of the printed matter could be visually determined. The desensitizing treatment liquid of the present invention does not cause scumming as compared with Comparative Examples D and E, and has high performance even when used as a fountain solution.
【００６３】[0063]
【発明の効果】本発明によれば、公害に対して問題がな
く、長期保存連続使用、環境変化に対して安定であり、
地汚れ、かぶり汚れが良好で、さらにはエッチング処理
時間を短縮することができる不感脂化処理性能にすぐれ
たオフセット印刷版用不感脂化処理液及び湿し水を提供
することができる。EFFECTS OF THE INVENTION According to the present invention, there is no problem with pollution, it is stable for a long period of continuous use and stable against environmental changes,
It is possible to provide a desensitizing treatment liquid for offset printing plates and a fountain solution which have good background stains and fog stains, and also have excellent desensitizing treatment performance that can shorten the etching treatment time.
Claims (1)
とも１種以上含有することを特徴とするシアンフリーオ
フセット印刷用不感脂化処理液。 （ａ）フィチン酸及び／又はフィチン酸の金属塩及び／
又はアンモニウム塩。 （ｂ）少なくとも１個以上の下記一般式（１）で示され
るアミノ基を含有する無機性／有機性値０．１以上４．
０以下の下記一般式（２）で示されるアミド及び／又は
下記一般式（３）で示されるイミド化合物。 【化１】 （Ｒ1 、Ｒ2 は水素及び／又は有機残基を表し、さらに
は互いに連結して環構造を形成してもよい。ａ1 、ａ2
は水素及び／又は有機残基及び／又はハロゲン原子、水
酸基等の置換基を表す。）1. A desensitizing solution for cyan-free offset printing, comprising at least one or more of the following (a) and (b). (A) Phytic acid and / or metal salt of phytic acid and / or
Or an ammonium salt. (B) Inorganic / organic value of 0.1 or more containing at least one or more amino group represented by the following general formula (1) 4.
An amide represented by the following general formula (2) of 0 or less and / or an imide compound represented by the following general formula (3). [Chemical 1] (R 1 and R 2 represent hydrogen and / or an organic residue, and may further be linked to each other to form a ring structure. A 1 and a 2
Represents hydrogen and / or an organic residue and / or a substituent such as a halogen atom and a hydroxyl group. )
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26991891A JPH05104879A (en) | 1991-10-18 | 1991-10-18 | Desensitizing liquid for offset printing |
| US07/920,862 US5565290A (en) | 1991-07-30 | 1992-07-28 | Desensitizing solution for offset printing |
| DE69222492T DE69222492T2 (en) | 1991-07-30 | 1992-07-30 | Desensitizing solution for offset printing |
| EP92306941A EP0526191B1 (en) | 1991-07-30 | 1992-07-30 | Desensitizing solution for offset printing |
| US08/718,949 US5723239A (en) | 1991-07-30 | 1996-09-26 | Desensitizing solution for offset printing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26991891A JPH05104879A (en) | 1991-10-18 | 1991-10-18 | Desensitizing liquid for offset printing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH05104879A true JPH05104879A (en) | 1993-04-27 |
Family
ID=17479033
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26991891A Withdrawn JPH05104879A (en) | 1991-07-30 | 1991-10-18 | Desensitizing liquid for offset printing |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH05104879A (en) |
-
1991
- 1991-10-18 JP JP26991891A patent/JPH05104879A/en not_active Withdrawn
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19990107 |