JPH0476984A - Method for producing a three-dimensional molded product having a three-dimensional conductive circuit on its surface - Google Patents
Method for producing a three-dimensional molded product having a three-dimensional conductive circuit on its surfaceInfo
- Publication number
- JPH0476984A JPH0476984A JP19118090A JP19118090A JPH0476984A JP H0476984 A JPH0476984 A JP H0476984A JP 19118090 A JP19118090 A JP 19118090A JP 19118090 A JP19118090 A JP 19118090A JP H0476984 A JPH0476984 A JP H0476984A
- Authority
- JP
- Japan
- Prior art keywords
- dimensional
- photomask
- molded product
- circuit
- dimensional molded
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Manufacturing Of Printed Wiring (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は立体的な成形品の表面に立体的導電回路を正確
に形成するための方法に関し、電機・電子機器等の分野
で回路部品として使用される、表面に立体的導電回路を
有する立体成形品を効率良く製造する方法に関するもの
である。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for accurately forming a three-dimensional conductive circuit on the surface of a three-dimensional molded product, and is used as a circuit component in the fields of electrical and electronic equipment. The present invention relates to a method for efficiently manufacturing a three-dimensional molded article having a three-dimensional conductive circuit on its surface.
〔従来の技術及びその課題]
従来、立体的な成形品の表面に3次元回路を形成する方
法としては、たとえば金属との接着性の異なる2種の材
料を用いたSKW法、またはPCK法などがあるが、こ
れらの方法は二回の成形工程が必要な為、煩雑、不経済
であるばかりでなく、2種の樹脂界面の密着性を良くす
る事が困難で、高度な気密性を要求される電子部品等の
パンケージの場合には問題となっている。また、2樹脂
間の密着不良からその界面にメツキ工程中に浸透したメ
ツキ液が残存し、後に回路部金属の腐食を起こし、重大
な支障を起こすこともあり、成形条件の厳密な管理を要
する。更にまた、この方法では形成できる回路の幅にも
限界があると同時に回路エツジの明瞭さに乏しく、回路
の精度や緻密さにも問題があった。[Prior art and its problems] Conventionally, methods for forming a three-dimensional circuit on the surface of a three-dimensional molded product include, for example, the SKW method using two types of materials with different adhesion properties to metals, or the PCK method. However, these methods require two molding steps, which are not only complicated and uneconomical, but also make it difficult to improve the adhesion between the two resin interfaces, requiring a high degree of airtightness. This is a problem in the case of pan-cages for electronic components and the like. In addition, due to poor adhesion between the two resins, the plating liquid that penetrated during the plating process may remain at the interface, which may later cause corrosion of the circuit metal and cause serious problems, so strict control of molding conditions is required. . Furthermore, with this method, there is a limit to the width of the circuit that can be formed, and at the same time, the clarity of the circuit edges is poor, and there are also problems with the accuracy and precision of the circuit.
一方、1回の成形による立体成形品に平面状のマスクを
使用してその立体表面にアディティブ法又はサブトラク
ティブ法により立体回路を形成する方法もあるが、この
方法では成形品の凹部とマスクの間に間隙を有するため
凹部の内底面や側面にマスクに描いた回路パターンが正
確に投影されないため、回路エツジの精度も悪く、凹部
の内底面が深い場合や内側面が照射光と平行に近い場合
はマスクの回路パターンを正確に転写することは不可能
であった。On the other hand, there is a method in which a planar mask is used for a three-dimensional molded product made by one molding, and a three-dimensional circuit is formed on the three-dimensional surface by an additive method or a subtractive method, but in this method, the recesses of the molded product and the mask Because there is a gap between them, the circuit pattern drawn on the mask cannot be accurately projected onto the inner bottom or side surfaces of the recess, resulting in poor circuit edge accuracy. In this case, it was impossible to accurately transfer the circuit pattern on the mask.
そこで、本発明者らはこれらの問題を解決し、2段成形
を行わず、通常の1回の成形で成形した立体形状の成形
品の表面にアディティブ法又はサブトラクティブ法を用
いて、正確な立体的回路パターンを形成する方法につい
て鋭意検討した結果、本発明に到達し、精度の良い細密
回路の形成を可能ならしめたものである。Therefore, the present inventors solved these problems by using an additive method or a subtractive method on the surface of a three-dimensional molded product that was molded in a single molding process without performing two-stage molding. As a result of intensive study on methods for forming three-dimensional circuit patterns, the present invention has been arrived at, and has made it possible to form highly accurate minute circuits.
即ち本発明は、立体的な成形品表面にアディティブ法ま
たはサブトラクティブ法によって導電回路を形成するに
際し、その成形品と密接に嵌合する立体形状を有し、透
明又は少なくとも半透明で、成形品に付与する回路パタ
ーンと同形のパターンを有するフォトマスクをその成形
品に嵌合し、これを介して露光することにより、回路パ
ターンを立体成形品表面に転写することを特徴とする、
表面に立体的導電回路を有する立体成形品の製造方法で
ある。That is, the present invention provides a method for forming a conductive circuit on the surface of a three-dimensional molded product by an additive method or a subtractive method. The circuit pattern is transferred to the surface of the three-dimensional molded product by fitting a photomask having a pattern of the same shape as the circuit pattern to be applied to the molded product and exposing it to light through the photomask,
This is a method for manufacturing a three-dimensional molded product having a three-dimensional conductive circuit on its surface.
本発明はメツキ等により金属の接着が可能な材料で、た
とえば射出成形によって作られた3次元形状の基板もし
くは部品表面に、その材料に適した方法によって予め金
属膜を形成し、これに電着塗装等によって光反応性エツ
チングレジストを塗布し、又一方その立体的成形品表面
に正確に嵌合する(例えばオス形の)3次元形状の回路
パターン露光用フォトマスクを介して、回路パターンを
露光し、従来のセミアデイティブ法またはサブトラクテ
ィブ法で立体成形品に回路を転写し形成する事を特徴と
する3次元立体成形回路を製造する方法である。この方
法によって成形品に転写した回路パターン部とパターン
以外の部分は露光の有無によりユノチングレジストの感
応が異なり、露光した反応部と区別されるので、後処理
によりパターン部分のみに金属膜を残すことが可能とな
り、成形品へ導電回路が形成される。The present invention is a material to which metal can be bonded by plating or the like. For example, a metal film is formed in advance on the surface of a three-dimensional substrate or component made by injection molding by a method suitable for the material, and then electrodeposited on this. A photoreactive etching resist is applied by painting or the like, and the circuit pattern is exposed through a three-dimensional (e.g., male) circuit pattern exposure photomask that accurately fits onto the surface of the three-dimensional molded product. However, this is a method for manufacturing a three-dimensional three-dimensional molded circuit, which is characterized in that the circuit is transferred and formed onto a three-dimensional molded article by a conventional semi-additive method or subtractive method. The sensitivity of the Unoting resist differs depending on whether the circuit pattern area and the non-pattern area transferred to the molded product using this method are exposed or not, and are distinguished from the exposed reaction area, so post-processing leaves a metal film only on the pattern area. This makes it possible to form a conductive circuit in the molded product.
ここで用いる立体成形品の材質はメツキ、スパッタリン
グ、その他の手法で強固な金属膜を接着しうる材料であ
れば、熱可塑性樹脂、熱硬化性樹脂の何れにてもよいが
、かかる成形部品が後にハンダ付加工等の苛酷な処理を
受けることを考慮すると耐熱性が高く、且つ機械的強度
の優れたものが好ましく、又多量生産の点では熱可り性
樹脂が好ましい。その例を挙げれば、芳香族ポリエステ
ル、ポリアミド、ポリアセタール、ポリフェニレンサル
ファイド、ポリサルホン、ポリフェニレンオキサイド、
ポリイミド、ポリエーテルケトン、ボリアリレート等が
好ましいが、これらに限定されるものではない。The material of the three-dimensional molded product used here may be either thermoplastic resin or thermosetting resin, as long as it is a material that can adhere a strong metal film by plating, sputtering, or other methods. Considering that it will be subjected to severe processing such as soldering later, it is preferable to use a material with high heat resistance and excellent mechanical strength, and from the viewpoint of mass production, thermoplastic resin is preferable. Examples include aromatic polyester, polyamide, polyacetal, polyphenylene sulfide, polysulfone, polyphenylene oxide,
Polyimide, polyetherketone, polyarylate, etc. are preferred, but the material is not limited thereto.
次に本発明で用いるフォトマスクの形状は目的の成形品
と少なくとも回路形成部分が密接に嵌合し、接合する形
状のものであり、たとえば射出成形品においてその成形
に使用される金型のキャビティと同じ立体的形状の型が
好ましい。Next, the shape of the photomask used in the present invention is such that at least the circuit forming part of the target molded product closely fits and joins, for example, the cavity of the mold used for molding the injection molded product. A mold with the same three-dimensional shape is preferable.
かかる形状は射出成形、真空成形、圧縮成形、注型その
他従来公知の熱硬化性樹脂や熱硬化性樹脂の成形法を用
いて成形すればよく、又切削加工により成形してもよい
。Such a shape may be formed by injection molding, vacuum forming, compression molding, casting, or other conventionally known molding methods for thermosetting resins or thermosetting resins, or may be formed by cutting.
次に本発明のフォトマスクを形成するための材料は照射
露光が透過することが必要であり、その点で透明の材料
が好ましく、少なくとも半透明の材料でなければならな
い。Next, the material for forming the photomask of the present invention needs to be able to transmit exposure light, and in this respect, a transparent material is preferable, and it must be at least a semi-transparent material.
かかる見地からフォトマスクに用いる基体としてはシリ
コーン系樹脂、アクリル系樹脂、エポキシ系樹脂、ポリ
カーボネート系樹脂、ポリエステル系樹脂、ポリスチレ
ン系樹脂等があげられるが、透明性があればこれに限定
する必要はない。又、ガラスを使用することも出来る。From this point of view, substrates used for photomasks include silicone resins, acrylic resins, epoxy resins, polycarbonate resins, polyester resins, polystyrene resins, etc., but there is no need to limit them to these as long as they are transparent. do not have. Moreover, glass can also be used.
次に本発明のフォトマスクを形成する材料は照射光が立
体表面の各部へ均一に分散することが好ましく、この目
的のためにフォトマスク材料には光分散剤を適量配合す
るのが好ましい。Next, it is preferable that the material forming the photomask of the present invention allows irradiation light to be uniformly dispersed to each part of the three-dimensional surface, and for this purpose, it is preferable to mix an appropriate amount of a light dispersing agent in the photomask material.
かかる目的でフォトマスク材料に配合する光分散材とし
ては、一般に無機質の微粒子が用いられ、例えばアルミ
ニウムの如き金属の微粒子、屈折率の大きいマイカ、ガ
ラス粉末、ガラスピーズ、ガラスフレーク、ガラス短繊
維等であり、これらの無機質微粒子はその表面に金属皮
膜を付与し光輝化したものであれば一層好ましい。Inorganic fine particles are generally used as the light dispersing material to be added to the photomask material for this purpose, such as metal fine particles such as aluminum, mica having a high refractive index, glass powder, glass peas, glass flakes, short glass fibers, etc. It is more preferable that these inorganic fine particles have their surfaces coated with a metallic film to make them bright.
かかる光分散剤の添加は過大になると透明性を阻害する
ので、その物質にもよるがフォトマスク基体に対し多く
ともlO重蓋%以下一般には5重量%以下である。かか
る光分散剤の配合は外部より照射された光を反射または
屈折して何れの方向へも分散する作用を有し、フォトマ
スクのあらゆる角度の面を均一に露光するのに有効であ
る。しかしフォトマスク材質によってはそれ自体が光分
散性を有するものもあり、かかる分散剤を配合する必要
のない場合もある。Addition of such a light dispersing agent in an excessive amount will impede transparency, and therefore, although it depends on the substance, the amount of the light dispersing agent added is at most 10% by weight or less, and generally 5% by weight or less, based on the photomask substrate. The combination of such a light dispersing agent has the effect of reflecting or refracting light irradiated from the outside and dispersing it in any direction, and is effective in uniformly exposing the surface of the photomask at all angles. However, some photomask materials themselves have light dispersion properties, and there are cases where it is not necessary to include such a dispersant.
次にフォトマスクはその表面に回路パターンを形成し、
これと嵌合する成形品への露光をその部分のみ正確に遮
断(又は透過)し、区別する必要がある。このためフォ
トマスクへ回路パターンを形成する方法としては、従来
のアディティブ法又はサブトラクティブ法に準じ例えば
次の如き方法により実施される。Next, the photomask forms a circuit pattern on its surface,
It is necessary to accurately block (or transmit) only that portion of the exposure to the molded product that fits with this, and distinguish it. Therefore, as a method for forming a circuit pattern on a photomask, the following method is used, for example, in accordance with the conventional additive method or subtractive method.
■乳剤を使用する方法
この方法は、従来のポリエステルフィルムやガラスなど
のフォトマスクに使用されている写真用乳剤を用い、こ
れを立体形状のフォトマスクに塗布、噴霧、または蒸着
、静電塗装などによって表面を被覆し、乾燥した後、形
成しようとする回路パターンをレーザー光線、高圧水銀
ランプのg線、h線、i線などによって直接描画する。■ Method of using an emulsion This method uses a photographic emulsion that is used in conventional photomasks such as polyester film and glass, and applies it to a three-dimensional photomask by spraying, vapor deposition, electrostatic coating, etc. After drying, the circuit pattern to be formed is directly drawn using a laser beam, G-line, H-line, I-line, etc. of a high-pressure mercury lamp.
その後に現像処理する事によって立体形状のフォトマス
ク表面に回路パターンを形成できる。A circuit pattern can then be formed on the surface of a three-dimensional photomask by developing it.
■ドライメツキによる方法
金属マスクを使って、従来の真空蒸着、スパッタリング
、イオンブレーティングなどにより立体形状のフォトマ
スク表面に回路パターンを形成する。この場合にはパタ
ーン部分が光を透過しない程度の薄膜で良い。密着力も
余り必要としない。■Dry plating method Using a metal mask, a circuit pattern is formed on the surface of a three-dimensional photomask using conventional methods such as vacuum evaporation, sputtering, and ion blasting. In this case, the patterned portion may be a thin film that does not transmit light. It doesn't require much adhesion.
■注型、射出成形又は切削加工による方法フォトマスク
表面に回路パターンに対応する凹部を生じるように注型
、射出成形又は切削加工し、この凹部に着色または蛍光
物質を混合した樹脂またはガラスを流し込んだ後、整面
し、紫外線等の光を透過しない回路パターンを形成する
。なお、このとき使用する樹脂組成物は硬化前のエポキ
シ樹脂などでも良い。■ Casting, injection molding, or cutting method Casting, injection molding, or cutting is performed to create a recess corresponding to the circuit pattern on the photomask surface, and resin or glass mixed with colored or fluorescent material is poured into the recess. After that, the surface is leveled to form a circuit pattern that does not transmit light such as ultraviolet rays. Note that the resin composition used at this time may be an epoxy resin or the like before curing.
以上の如くして作成したフォトマスクを立体成形品に嵌
合し、露光することにより、フォトマスク表面の回路パ
ターンは正確に立体成形品に転写され、その成形品の表
面を被覆している反応性エツチングレジストに感応して
成形品に回路パターンに対応する陰陽の識別が形成され
、これを常法により金属皮膜に転化すれば金属回路が形
成される。尚、回路パターンは陽画でも陰画でも、相応
の手法により回路部を金属化することは可能である。By fitting the photomask created as described above to a three-dimensional molded product and exposing it to light, the circuit pattern on the surface of the photomask is accurately transferred to the three-dimensional molded product, and the reaction that coats the surface of the molded product is A yin and yang identification corresponding to a circuit pattern is formed on the molded article in response to the etching resist, and when this is converted into a metal film by a conventional method, a metal circuit is formed. Incidentally, regardless of whether the circuit pattern is a positive or negative image, it is possible to metalize the circuit portion using a suitable method.
本発明によれば、どんな形状の立体成形品でもその表面
に3次元回路を正確に形成する事が出来、しかもこの方
法で製造された回路部品は2段成形で形作られたものと
違い、2樹脂の界面が存在しないためこれに起因する各
種の障害がなく、また、比較的コストのかかる成形の工
程が一回で済むのでかなりのコストダウンが期待出来る
。According to the present invention, it is possible to accurately form a three-dimensional circuit on the surface of a three-dimensional molded product of any shape, and unlike those formed by two-stage molding, the circuit parts manufactured by this method are two-dimensional. Since there is no resin interface, there are no various problems caused by this, and since only one molding process is required, which is relatively costly, considerable cost reductions can be expected.
更に回路幅の精度に関して言えば、フォトマスクが被露
光物に完全に密着しているので細線で緻密な回路でも、
精度良く明瞭にパターンニング出来、入射光と平行な側
面まで、均一に露光することが出来る利点を有する。Furthermore, in terms of circuit width accuracy, the photomask is in complete contact with the exposed object, so even fine-line and dense circuits can be
It has the advantage of being able to pattern accurately and clearly and uniformly exposing even the sides parallel to the incident light.
以下に本発明の実施例を示すが、本発明はこれに限定さ
れるものではない。Examples of the present invention are shown below, but the present invention is not limited thereto.
実施例1
常温硬化性エポキシ樹脂にアルミニウム微粉末を0.0
1重量%均一に混合し、図1に示す様な形に注型硬化さ
せた。次にこの凹んだ部分(回路パターン形成用溝)2
に蛍光物質を混合した常温硬化性エポキシ樹脂を流し込
み回路パターンを形成したフォトマスクを作成した(図
2)。Example 1 0.0% aluminum fine powder added to room temperature curable epoxy resin
The mixture was mixed uniformly at 1% by weight, and cast and cured into the shape shown in FIG. Next, this recessed part (circuit pattern forming groove) 2
A photomask with a circuit pattern was created by pouring a room-temperature curable epoxy resin mixed with a fluorescent substance into the photomask (Figure 2).
一方、図3に示す回路形成用立体成形品4を、液晶ポリ
マー(「ベクトラ」商品名、ポリプラスチックス■製)
を主体とする金属密着性(メツキ性)樹脂組成物を用い
て射出成形し、これに所定の方法にて全面銅メツキし、
電着型フォトエツチングレジスト([ゾンネEDUV6
01 J商品名、関西ペイント株製)を塗装した。これ
に図2のフォトマスクを図4の様に密着嵌合させ、紫外
線を照射し、回路パターンを露光した。On the other hand, a three-dimensional molded product 4 for circuit formation shown in FIG.
It is injection molded using a metal-adhesive (plating property) resin composition mainly composed of
Electrodeposition type photoetching resist ([Sonne EDUV6
01 J (trade name, manufactured by Kansai Paint Co., Ltd.) was painted. The photomask shown in FIG. 2 was tightly fitted onto this as shown in FIG. 4, and ultraviolet rays were irradiated to expose the circuit pattern.
次にフォトマスクをはずし、所定の方法にて回路パター
ンを現像処理し、回路以外のメツキ部分を露出させた。Next, the photomask was removed, and the circuit pattern was developed using a predetermined method to expose the plating area other than the circuit.
これを過硫酸ナトリウムに浸漬して、回路以外の部分の
銅を溶解除去し、更に水洗して付着薬剤を完全に除去し
た。かくして、その立体的表面に金属性導電回路5を正
確に形成した成形品(図5)得た。This was immersed in sodium persulfate to dissolve and remove the copper in areas other than the circuit, and was further washed with water to completely remove the adhering chemicals. In this way, a molded article (FIG. 5) having a metallic conductive circuit 5 accurately formed on its three-dimensional surface was obtained.
実施例2
アルミニウム微粉末0.05重量%を均一に混合したポ
リカーボネート製の円筒形の物体(これは回路形成成形
品に密接に嵌合する)を作り(図6)、この側表面にイ
オンブレーティングによって金属クロムを蒸着した。次
いで、電着によフてネガ型エツチングレジスト(「ゾン
ネEDUV376 J商品名、関西ペイント■製)を塗
装し、乾燥後、この円筒状フォトマスクを図7(a)に
示すように回転させな力ぐらレーザー光線をAからBま
で走査し、フォトマスク表面にらせん状の露光パターン
を形成した(図7(ハ))。次に、所定の方法にて現像
処理し、回路パターンになる部分のみエツチングレジス
トを残し、クロムを露出させた。これを10%塩酸溶液
に浸漬して露出しているクロムを溶解した。最後に所定
のアルカリ処理によってエツチングレジストを剥離し、
これを導電回路形成用フォトマスクとした。Example 2 A cylindrical object made of polycarbonate (which fits tightly into the circuit-forming molded part) was made (Fig. 6) with 0.05% by weight of fine aluminum powder evenly mixed therein, and an ion beam was applied to the side surface of this object. Metallic chromium was deposited by rating. Next, a negative-type etching resist ("Sonne EDUV376 J trade name, manufactured by Kansai Paint ■") was applied by electrodeposition, and after drying, the cylindrical photomask was rotated as shown in FIG. 7(a). A spiral laser beam was scanned from A to B to form a spiral exposure pattern on the photomask surface (Figure 7 (c)).Next, development was performed using a prescribed method to etch only the portion that would become the circuit pattern. The resist was left and the chromium was exposed.This was immersed in a 10% hydrochloric acid solution to dissolve the exposed chromium.Finally, the etching resist was removed by a prescribed alkaline treatment.
This was used as a photomask for forming a conductive circuit.
次に、液晶ポリマー(「ベクトラ」商品名、ポリプラス
チックス■製)を主体とする金属密着性(メツキ性)樹
脂組成物を用いて円筒状の成形品(図8)を射出成形に
よって作り、この内側面に所定の方法によって全面銅メ
ツキを施し、更にポジ型フォトエツチングレジスト([
ゾンネEDUV601 J商品名、関西ペイント■製)
を塗装した。これを乾燥後、前記のポリカーボネート製
型体筒フォトマスクと密着嵌合合させ、紫外線を照射し
た(図9)。この際、露光効率を上げるため、鏡6をフ
ォトマスクの下に置いて、下からの反射光も利用した。Next, a cylindrical molded product (Fig. 8) was made by injection molding using a metal-adhesive (plating) resin composition mainly composed of liquid crystal polymer (trade name "Vectra", manufactured by Polyplastics ■). This inner surface is fully plated with copper using a predetermined method, and then a positive photo-etching resist ([
Sonne EDUV601 J product name, manufactured by Kansai Paint ■)
was painted. After drying, it was closely fitted with the polycarbonate mold body photomask and irradiated with ultraviolet rays (FIG. 9). At this time, in order to increase exposure efficiency, a mirror 6 was placed under the photomask to utilize reflected light from below.
次にフォトマスクをはずし、所定の方法にて現像処理し
、回路部以外のレジストを除去した後に、塩化第2鉄溶
液に浸漬して、露出した銅メツキを溶解した。最後に3
%水酸化ナトリウム溶液に浸漬して、回路部のエツチン
グレジストを除去した。こうして円筒状成形品の内面に
らせん状の導電回路を形成した成形品(図10)を得た
。Next, the photomask was removed and developed using a predetermined method to remove the resist other than the circuit area, and then immersed in a ferric chloride solution to dissolve the exposed copper plating. Finally 3
% sodium hydroxide solution to remove the etching resist on the circuit section. In this way, a molded product (FIG. 10) in which a spiral conductive circuit was formed on the inner surface of a cylindrical molded product was obtained.
図1は本発明に使用するフォトマスク形状(回路パター
ン形成前)の−例(実施例1)を示す。
図2は図1のフォトマスクに回路パターンを形成した形
状を示す。
図3は金属回路を形成するための立体成形品の形状を示
す。
図4は図3の立体成形品に図2のフォトマスクを嵌合し
た露光処理の形態を示す。
図5は図3の立体成形品の表面に金属回路を形成した成
形品を示す。
図6は本発明に使用するフォトマスク形状(回路パター
ン形成前)の別の一例(実施例2)を示す。
図7(a)、(b)は図6のフォトマスクにらせん状回
路パターンを形成する状態、及びらせん状回路パターン
が付与されたフォトマスクを示す。
図8は金属回路を形成するための円筒状の立体成形品の
形状を示す。
図9は図8の立体成形品に図7(b)のフォトマスクを
嵌合した露光処理の形態を示す。
図10は図8の立体成形品の表面に金属回路を形成した
成形品を示す。
フォトマスク用成形品
回路パターン形成用溝
回路パターン
回路形成用立体成形品
金属性導電回路
鏡FIG. 1 shows an example (Example 1) of the photomask shape (before circuit pattern formation) used in the present invention. FIG. 2 shows the shape of a circuit pattern formed on the photomask shown in FIG. FIG. 3 shows the shape of a three-dimensional molded product for forming a metal circuit. FIG. 4 shows an exposure process in which the photomask of FIG. 2 is fitted to the three-dimensional molded product of FIG. 3. FIG. 5 shows a molded product in which a metal circuit is formed on the surface of the three-dimensional molded product shown in FIG. FIG. 6 shows another example (Example 2) of the photomask shape (before circuit pattern formation) used in the present invention. 7A and 7B show a state in which a spiral circuit pattern is formed on the photomask of FIG. 6, and a photomask provided with a spiral circuit pattern. FIG. 8 shows the shape of a cylindrical three-dimensional molded product for forming a metal circuit. FIG. 9 shows an exposure process in which the photomask shown in FIG. 7(b) is fitted to the three-dimensional molded product shown in FIG. FIG. 10 shows a molded product in which a metal circuit is formed on the surface of the three-dimensional molded product shown in FIG. Molded products for photomasks Grooves for circuit pattern formation Three-dimensional molded products for circuit formation Metal conductive circuit mirrors
Claims (1)
ラクティブ法によって導電回路を形成するに際し、その
成形品と密接に嵌合する立体形状を有し、透明又は少な
くとも半透明で、成形品に付与する回路パターンと同形
のパターンを有するフォトマスクをその成形品に嵌合し
、これを介して露光することにより、回路パターンを立
体成形品表面に転写することを特徴とする、表面に立体
的導電回路を有する立体成形品の製造方法。 2 フォトマスクを形成する材料が光分散剤を配合した
組成物から成る請求項1記載の立体成形品の製造方法。 3 光分散剤が無機質微粒子である請求項2記載の立体
成形品の製造方法。 4 光分散剤が金属粉末、マイカ粉末、ガラス粉、ガラ
スビーズ、ガラス短繊維、ガラスフレークより選ばれる
1又は2以上の無機物微粉末、又はこれらの表面に金属
被覆を施した鏡面光沢を有する微粒子である請求項2又
は3記載の立体成形品の製造方法。 5 フォトマスクを形成する基体がシリコーン系樹脂、
アクリル系樹脂、エポキシ系樹脂、ポリカーボネート系
樹脂、ポリエステル系樹脂、ポリスチレン系樹脂又はガ
ラスである請求項1〜4の何れか1項記載の立体成形品
の製造方法。 6 立体成形品が金属膜形成可能な熱可塑性樹脂又は熱
硬化性樹脂から成る請求項1〜5の何れか1項記載の立
体成形品の製造方法。[Claims] 1. When a conductive circuit is formed on the surface of a three-dimensional molded product by an additive method or a subtractive method, it has a three-dimensional shape that closely fits the molded product, is transparent or at least translucent, A surface characterized in that a photomask having a pattern of the same shape as a circuit pattern to be applied to a molded product is fitted onto the molded product, and the circuit pattern is transferred to the surface of the three-dimensional molded product by exposure through the photomask. A method for manufacturing a three-dimensional molded product having a three-dimensional conductive circuit. 2. The method for producing a three-dimensional molded article according to claim 1, wherein the material forming the photomask is composed of a composition containing a light dispersing agent. 3. The method for producing a three-dimensional molded article according to claim 2, wherein the light dispersing agent is inorganic fine particles. 4 The light dispersing agent is one or more inorganic fine powders selected from metal powder, mica powder, glass powder, glass beads, short glass fibers, and glass flakes, or fine particles having specular luster whose surfaces are coated with metal. The method for producing a three-dimensional molded article according to claim 2 or 3. 5 The substrate forming the photomask is silicone resin,
The method for producing a three-dimensional molded article according to any one of claims 1 to 4, wherein the material is an acrylic resin, an epoxy resin, a polycarbonate resin, a polyester resin, a polystyrene resin, or a glass. 6. The method for producing a three-dimensional molded article according to any one of claims 1 to 5, wherein the three-dimensional molded article is made of a thermoplastic resin or a thermosetting resin capable of forming a metal film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2191180A JP2590298B2 (en) | 1990-07-19 | 1990-07-19 | Method for producing three-dimensional molded article having three-dimensional conductive circuit on surface |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2191180A JP2590298B2 (en) | 1990-07-19 | 1990-07-19 | Method for producing three-dimensional molded article having three-dimensional conductive circuit on surface |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0476984A true JPH0476984A (en) | 1992-03-11 |
| JP2590298B2 JP2590298B2 (en) | 1997-03-12 |
Family
ID=16270236
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2191180A Expired - Fee Related JP2590298B2 (en) | 1990-07-19 | 1990-07-19 | Method for producing three-dimensional molded article having three-dimensional conductive circuit on surface |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2590298B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6599111B2 (en) | 2000-10-30 | 2003-07-29 | Unisia Jecs Corporation | Vane pump having an intake groove through a side wall member |
| JP2016138176A (en) * | 2015-01-27 | 2016-08-04 | 日本電気硝子株式会社 | Resin composition for three-dimensional molding |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5386471A (en) * | 1976-12-27 | 1978-07-29 | Citizen Watch Co Ltd | Method of forming pattern on rugged board surface |
| JPS5427368A (en) * | 1977-08-03 | 1979-03-01 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of microwave circuit pattern |
| JPS5427367A (en) * | 1977-08-03 | 1979-03-01 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of microwave circuit pattern |
-
1990
- 1990-07-19 JP JP2191180A patent/JP2590298B2/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5386471A (en) * | 1976-12-27 | 1978-07-29 | Citizen Watch Co Ltd | Method of forming pattern on rugged board surface |
| JPS5427368A (en) * | 1977-08-03 | 1979-03-01 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of microwave circuit pattern |
| JPS5427367A (en) * | 1977-08-03 | 1979-03-01 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of microwave circuit pattern |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6599111B2 (en) | 2000-10-30 | 2003-07-29 | Unisia Jecs Corporation | Vane pump having an intake groove through a side wall member |
| JP2016138176A (en) * | 2015-01-27 | 2016-08-04 | 日本電気硝子株式会社 | Resin composition for three-dimensional molding |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2590298B2 (en) | 1997-03-12 |
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