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JPH046273A - Continuous surface treating device - Google Patents

Continuous surface treating device

Info

Publication number
JPH046273A
JPH046273A JP10644790A JP10644790A JPH046273A JP H046273 A JPH046273 A JP H046273A JP 10644790 A JP10644790 A JP 10644790A JP 10644790 A JP10644790 A JP 10644790A JP H046273 A JPH046273 A JP H046273A
Authority
JP
Japan
Prior art keywords
processing
processing chamber
surface treatment
continuous surface
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10644790A
Other languages
Japanese (ja)
Other versions
JP2952957B2 (en
Inventor
Hitoshi Kono
等 河野
Masanori Tsuda
正徳 津田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinko Electric Co Ltd
Original Assignee
Shinko Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinko Electric Co Ltd filed Critical Shinko Electric Co Ltd
Priority to JP10644790A priority Critical patent/JP2952957B2/en
Publication of JPH046273A publication Critical patent/JPH046273A/en
Application granted granted Critical
Publication of JP2952957B2 publication Critical patent/JP2952957B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Treatment Of Fiber Materials (AREA)
  • Physical Vapour Deposition (AREA)
  • Tunnel Furnaces (AREA)
  • Furnace Details (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は不活性ガスで満たした処理室内を布等の被処理
材を通過させつつ表面f着処理を行う連続表面処理装置
に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a continuous surface treatment apparatus that performs surface f-adhesion treatment on a material to be treated, such as cloth, while passing it through a treatment chamber filled with an inert gas.

〔従来の技術〕[Conventional technology]

一対の処理電極を収納した容器(処理室)内に不活性ガ
スを充満させ、上記処理電極間でグロー放電を発生させ
て、両処理電極間を通過する布等の被処理材表面に蒸着
処理を行う装置では、処理室内の大気を真空排気装置で
排気したのち、上記不活性ガスを送給してガス置換する
A container (processing chamber) housing a pair of processing electrodes is filled with inert gas, glow discharge is generated between the processing electrodes, and vapor deposition is performed on the surface of the material to be processed, such as cloth, that passes between both processing electrodes. In an apparatus that performs this, the atmosphere in the processing chamber is evacuated by a vacuum exhaust device, and then the above-mentioned inert gas is supplied for gas replacement.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

このため、従来は、第5図に示す如(、処理室10の被
処理材導入口1)、被処理送出口12をロール対41A
、41Bで塞ぐようにしているが、処理室内全体の圧力
を所定の圧力になるまで真空排気しなくてはならない上
、被処理材導入口1)、被処理送出口12からの真空漏
れ分も排気しなくてはならないので1、真空排気装置と
して、かなり大形のものを必要とし、高価になるという
問題があった。
For this reason, conventionally, as shown in FIG.
, 41B, but it is necessary to evacuate the entire processing chamber until it reaches a predetermined pressure, and there is also a vacuum leakage from the processing material inlet 1) and the processing material outlet 12. Since the vacuum must be evacuated, there was a problem that 1. a fairly large vacuum evacuation device was required, making it expensive.

本発明は上記問題を解消するためになされたもので、真
空排気時には、完全真空シール状態で排気することがで
き、処理室内全体の真空排気を必要とせず、従来に比し
小型の真空排気装置を用いることができる連続表面処理
装置を提供することを目的とする。
The present invention has been made to solve the above problems, and can perform evacuation in a completely vacuum-sealed state during evacuation, does not require evacuation of the entire processing chamber, and is a smaller vacuum evacuation device than conventional ones. The purpose of the present invention is to provide a continuous surface treatment device that can use the following methods.

〔課題を解決するための手段〕[Means to solve the problem]

本発明は上記目的を達成するため、処理室内を真空排気
して処理ガスと置換し、被処理材を、大気圧以上の処理
ガスで満たされた上記処理室を通過させつつ該被処理材
の表面処理を行う表面処理装置において、 端面相互対接して処理室内に副室を区画可能な一対の筒
状可動体と、両可動体を同軸に支持する支持装置を設け
、一方の可動体は、上記処理室の被処理材導入口を真空
シール性を確保して摺動可能に貫通して外部に伸び、他
方の可動体は上記処理室の被処理材送出口を真空シール
性を確保して摺動可能に貫通して外部に伸びる構造とし
、上記両可動体は、通常運転時、上記端面相互が所定間
隔を隔てる第1位置へ位置決めされ、真空排気時には、
上記端面が真空シル性を確保して相互対接する第2位置
へ駆動される構成としたものである。
In order to achieve the above object, the present invention evacuates the inside of the processing chamber and replaces it with a processing gas, and the material to be processed is passed through the processing chamber filled with the processing gas at atmospheric pressure or higher. In a surface treatment apparatus that performs surface treatment, a pair of cylindrical movable bodies whose end faces face each other and can partition a sub-chamber within the processing chamber, and a support device that supports both movable bodies coaxially are provided, one of the movable bodies is The other movable body extends outward by slidingly penetrating the processing material inlet of the processing chamber while ensuring vacuum sealability, and the other movable body extends to the outside through the processing material inlet of the processing chamber while ensuring vacuum sealability. The movable body has a structure that extends through the movable body slidably to the outside, and during normal operation, the two movable bodies are positioned at a first position where the end faces are spaced apart from each other by a predetermined distance, and during evacuation,
The end faces are configured to be driven to a second position where they face each other while ensuring vacuum sealing properties.

請求項2では、通常運転時、被処理材が通過する間隙を
隔てて対向する一対の放電用処理電極を有する場合に、
画電極を、処理室外に設けた昇降装置により個別昇降可
能に支持する構成とした。
According to a second aspect of the present invention, in the case of having a pair of discharge processing electrodes facing each other with a gap through which the material to be processed passes during normal operation,
The picture electrodes were supported so that they could be raised and lowered individually by a lifting device provided outside the processing chamber.

請求項3では、支持装置は、ローラ列からなる構成とし
、請求項4では、支持装置がローラ列とレール体からな
り、可動体の一方端部に該レール体上を転動する車輪が
設けられている構成とした。
In claim 3, the support device is constituted by a row of rollers, and in claim 4, the support device is comprised of a row of rollers and a rail body, and one end of the movable body is provided with a wheel that rolls on the rail body. The configuration is as follows.

〔作用〕[Effect]

本発明では、一対の可動体は、端面相互対接状態に位置
決めされると、処理室内に副室を区画するので、処理室
内全体の空間からこの副室骨を除いた空間が真空排気の
対象となり、その分、排気すべき空気量が低減し、また
・処理室外部とは、完全に真空シールされた状態となる
ので、前記した真空漏れ分を排気する必要がないので、
小型の真空排気装置で済ませることができる。
In the present invention, when the pair of movable bodies are positioned so that their end faces face each other, a sub-chamber is defined within the processing chamber, so that the space excluding the sub-chamber bones from the entire space of the processing chamber is the target of vacuum evacuation. Therefore, the amount of air to be evacuated is reduced accordingly, and the outside of the processing chamber is completely vacuum sealed, so there is no need to evacuate the vacuum leakage mentioned above.
This can be done with a small vacuum evacuation device.

〔実施例〕〔Example〕

以下、本発明の1実施例を図面を参照して説明する。 Hereinafter, one embodiment of the present invention will be described with reference to the drawings.

第1図および第2図において、Aは被処理材、10は処
理室、1)は処理室10の被処理材導入口、12は処理
室10の被処理材送出口である。13は所定長さを有す
る筒状の可動体であって、処理室IOの被処理材導入口
1)側外部に設けられたローラ列14Aおよび処理室1
゜の内部に設けられたローラ列14Bからなる支持装置
14上に支持されて、被処理材導入口llに全周で密に
、摺動可能に嵌合して該被処理材導入口1)を貫通して
いる。被処理材導入口1)は該導入口1)と可動体13
との間に良好な真空シール性を持たせるために充分な巾
Wを持たせである。15は所定長さを有する筒状の可動
体であって、処理室10の被処理材送出口12例外部に
設けられたローラ列16Aおよび処理室lOの内部に設
けられたローラ列16Bからなる支持装置16上に支持
されて、被処理材送出口12に全周で密に、摺動可能に
嵌合して咳被処理材送出口12を貫通している。被処理
材導入口12は該導入口12と可動体15との間に良好
な真空シール性を持たせるために充分な巾Wを持たせで
ある。
In FIG. 1 and FIG. 2, A is a material to be processed, 10 is a processing chamber, 1) is an inlet for the material to be processed in the processing chamber 10, and 12 is an outlet for the material to be processed in the processing chamber 10. Reference numeral 13 denotes a cylindrical movable body having a predetermined length, which is connected to a roller row 14A provided outside the processing chamber IO on the side of the material inlet 1) and the processing chamber 1.
It is supported on a support device 14 consisting of a roller row 14B provided inside the processing material inlet 1), and is slidably fitted tightly around the entire circumference to the processing material inlet 1). penetrates through. The material to be treated inlet 1) is connected to the inlet 1) and the movable body 13.
A sufficient width W should be provided to provide good vacuum sealing properties between the two. Reference numeral 15 denotes a cylindrical movable body having a predetermined length, which is composed of a roller row 16A provided outside the 12 processing material outlet ports of the processing chamber 10 and a roller row 16B provided inside the processing chamber IO. It is supported on the support device 16 and is slidably fitted tightly around the entire circumference of the cough treatment material outlet 12 to pass through the cough treatment material outlet 12 . The material introduction port 12 has a sufficient width W to provide good vacuum sealing between the introduction port 12 and the movable body 15.

21Pおよび21Nは互いに対向する板状の処理電極で
あって、処理電極21Pば支持ロッド22で支持され、
この支持ロッド22は処理室10の天井に設けた絶縁ブ
ロック23内を密に、摺動可能に貫通して処理室10外
に伸び、上端に形成された係合部22Aを絶縁物24を
介して昇降機構29に連結されている。この係合部22
Aは受電部を兼ねており、給電線25を介して高周波電
#31に接続されている。処理電極21Nも支持ロンド
26で支持され、この支持口ノド26は処理室10の床
に設けたガイド筒部27を密に、摺動可能に貫通して下
に伸び、下端に形成された保合部26Aを昇降機構30
に連結されている。この係合部26Aは接地線28でア
ースされている。
21P and 21N are plate-shaped processing electrodes facing each other, and the processing electrode 21P is supported by a support rod 22.
This support rod 22 tightly and slidably penetrates the inside of an insulating block 23 provided on the ceiling of the processing chamber 10 and extends to the outside of the processing chamber 10, and connects an engaging portion 22A formed at the upper end with an insulator 24 interposed therebetween. and is connected to a lifting mechanism 29. This engaging portion 22
A also serves as a power receiving section, and is connected to high frequency power #31 via a power supply line 25. The processing electrode 21N is also supported by a support rod 26, which extends downward through a guide tube 27 provided on the floor of the processing chamber 10 in a tight and slidable manner. The joint part 26A is moved up and down by the lifting mechanism 30.
is connected to. This engaging portion 26A is grounded by a grounding wire 28.

この構成において、処理電極21Pと21N間にグロー
放電を生起させて、両電極間を通過する被処理材への表
裏に蒸着処理を行う通常進展時は、可動体13と15は
第1図に示す第1位置に位置決めされ、図示しない係止
機構で該位置に保持される。即ち、可動体13と15は
各々の一方端部13B、15Bが被処理材導入口1)、
被処理材送出口12近傍に臨む位置まで退避しており、
処理室i21 P、21Nは各々下降、上昇駆動された
所要の放電間隙Gを隔てている。本実施例では、この放
電間隙Gは可動体13.15の外径より大きくない値と
なっている。
In this configuration, during normal progress in which a glow discharge is generated between the processing electrodes 21P and 21N and a vapor deposition process is performed on the front and back surfaces of the material to be processed passing between the two electrodes, the movable bodies 13 and 15 are moved as shown in FIG. It is positioned at the first position shown and held at this position by a locking mechanism (not shown). That is, the movable bodies 13 and 15 each have one end 13B, 15B as the material inlet port 1),
It has been evacuated to a position facing the vicinity of the processing material outlet 12,
The processing chambers i21P and 21N are separated by a required discharge gap G, which is driven downward and upward, respectively. In this embodiment, this discharge gap G has a value that is not larger than the outer diameter of the movable body 13.15.

処理室10内を不活性ガスで置換する作業工程において
は、第2図に示す如く、処理電極21P、21Nを各々
上昇、下降させて、両者の対向間隔を可動体13.15
の外径より充分に大きくしたのち、可動体13、I5を
、両者の一方端面13B、15Bが相互に圧接して真空
シール性が確保される第2位置まで、処理室10内へ押
し込み、図示しない上記係止機構でこの位置に保持する
。可動体13と15の肉厚は上記圧接により真空シール
性を確保するに充分な肉厚を持たせである。これにより
、処理室IO内は該処理室内面と可動体13.15の外
周面とで囲まれ、外部に対して実質上完全に真空シール
された室Xと、可動体13.15が作る筒状の室(以下
、副室という)Yに区分される。この可動体13と15
の第2位置への位置決めが終わると、図示しない真空排
気装置を駆動して、室X内の大気を排気し、該室X内の
圧力が所定圧力まで低下すると、図示しない不活性ガス
タンクから室X内に送給する。室X内の不活性ガスのガ
ス圧が大気圧以上の所定圧力まで上昇すると、不活性ガ
スの送給を継続しながら、可動体13.15を前記した
第1位置へ向けて、徐々に移動させ、処理電極21P、
21Nも放電間隙Gを隔てる位置まで移動させる。かく
して、処理室10内を不活性ガスで置換する。
In the work process of replacing the inside of the processing chamber 10 with an inert gas, as shown in FIG.
After making the outer diameter sufficiently larger than the outer diameter of the movable body 13, I5, the movable body 13, I5 is pushed into the processing chamber 10 to the second position where one end surface 13B, 15B of both is pressed against each other to ensure vacuum sealing property. It is held in this position by the locking mechanism described above. The wall thickness of the movable bodies 13 and 15 is set to be sufficient to ensure vacuum sealing performance by the above-mentioned pressure contact. As a result, the inside of the processing chamber IO is surrounded by the inner surface of the processing chamber and the outer circumferential surface of the movable body 13.15, and a cylinder formed by the chamber X and the movable body 13.15 is substantially completely vacuum-sealed from the outside. It is divided into Y-shaped chambers (hereinafter referred to as sub-chambers). These movable bodies 13 and 15
When the positioning to the second position is completed, a vacuum evacuation device (not shown) is driven to exhaust the atmosphere in the chamber X, and when the pressure in the chamber Feed within X. When the gas pressure of the inert gas in the chamber and the processing electrode 21P,
21N is also moved to a position that separates the discharge gap G. In this way, the inside of the processing chamber 10 is replaced with inert gas.

このように、本実施例では、可動体13と15で副室Y
を区画し、室Xを外部に対して完全真空シール状態にし
て真空排気を行うので、真空排気装置は、前記した従来
の真空漏れ分を範囲しなくても済み、かつ排気対象は室
Xだけてなる。
In this way, in this embodiment, the movable bodies 13 and 15 move the subchamber Y.
Since chamber X is completely vacuum-sealed from the outside and evacuated, the evacuation equipment does not need to cover the conventional vacuum leakage mentioned above, and only chamber X is evacuated. It becomes.

第3図および第4図は本発明の他の実施例を示したもの
で、コーラ列14.Aに代えて、レール体14Cを用い
るとともに可動体I3の外側端部にフランジ13Aを形
成して該フランジ13Aの下側にレール体14Cに係合
する車輪32を持つ車輸機構を設け、また、ローラ列1
5Aに代えて、レール体16Cを用いるとともに可動体
15の外側端部にフランジ15Aを形成して該フランジ
15Aの下側にレール体16Cに係合する車輪33を持
つ車輸機構を設けている点において、第1図および第2
図の構成と相違する。
3 and 4 show another embodiment of the present invention, in which the cola row 14. Instead of A, a rail body 14C is used, a flange 13A is formed at the outer end of the movable body I3, and a transportation mechanism is provided below the flange 13A with wheels 32 that engage with the rail body 14C, and , roller row 1
5A, a rail body 16C is used, a flange 15A is formed at the outer end of the movable body 15, and a vehicle transport mechanism is provided below the flange 15A, which has wheels 33 that engage with the rail body 16C. At the point, Fig. 1 and Fig. 2
The configuration is different from the one shown in the figure.

この構成においては、可動体13のフランジ13Aと被
処理材導入口とが圧接し、可動体15のフランジ15A
と導入口12とが圧接する位置で、可動体13と15の
一方端面13B、15Bが相互に圧接する構成として、
真空シール性を確保するようにしている。
In this configuration, the flange 13A of the movable body 13 and the material introduction port are in pressure contact with each other, and the flange 15A of the movable body 15
A configuration in which one end surfaces 13B and 15B of the movable bodies 13 and 15 are brought into pressure contact with each other at a position where the introduction port 12 and the introduction port 12 are brought into pressure contact with each other,
Vacuum sealability is ensured.

なお、上記各実施例はグロー放電を利用して被処理材A
の連続表面処理を行うものについて説明したが、本発明
は、被処理材導入口と送出口を有する処理室内をガス置
換して、連続表面処理を例えば化学的に行う他の装置に
実施して同様の効果を得ることができる。
In addition, each of the above embodiments uses glow discharge to treat the material A.
Although the present invention has been described with reference to an apparatus that performs continuous surface treatment, the present invention is also applicable to other apparatuses that perform continuous surface treatment, for example chemically, by replacing gas in a processing chamber having an inlet and an outlet for the material to be treated. A similar effect can be obtained.

4、発明の効果 本発明は以上説明した通り、被処理材導入口と送出口を
貫通して伸び、処理室内で端面相互を接離可能な一対の
可動体を設けたことにより、真空排気時、この一対の可
動体で処理室内を区分して、実質上、完全な真空シーJ
し状態で真空排気を行うことができ、しかも真空排気が
必要な空間が従来の場合に比して大幅に狭くなるので、
真空排気装置として大形のものを使用しなくても済む利
点がある。
4. Effects of the Invention As explained above, the present invention is provided with a pair of movable bodies that extend through the inlet and outlet of the material to be treated and whose end faces can be brought into contact with and separated from each other within the processing chamber. , this pair of movable bodies divides the inside of the processing chamber, creating virtually a complete vacuum seam.
It is possible to perform vacuum evacuation in the same state, and the space that needs to be evacuated is much smaller than in the conventional case.
This has the advantage of not requiring the use of a large-sized vacuum evacuation device.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の実施例の通常運転時の状態を示す縦断
面図、第2図は上記実施例の真空排気時の状態を示す縦
断面図、第3図は本発明の他の実施例の通常運転時の状
態を示す縦断面図、第4図は第3図の実施例の真空排気
時の状態を示す縦断面図、第5図は従来の表面処理装置
のシール構造を説明するための縦断面図である。 1〇−処理室、1)−・被処理材導入口、12被処理材
送出口、13.15−可動体、14A、14B、16A
、16B−ローラ列、14C216C−レール体、21
P、21N処理電極、29.3〇−昇降機構。32.3
3・−車輪、
FIG. 1 is a longitudinal sectional view showing the state of the embodiment of the present invention during normal operation, FIG. 2 is a longitudinal sectional view showing the state of the above embodiment during evacuation, and FIG. 3 is a longitudinal sectional view showing the state of the above embodiment during evacuation. FIG. 4 is a vertical cross-sectional view showing the state of the example in normal operation, FIG. 4 is a vertical cross-sectional view showing the state of the embodiment in FIG. 3 during evacuation, and FIG. 5 explains the seal structure of the conventional surface treatment apparatus. FIG. 10-Processing chamber, 1)--Processed material inlet, 12 Processed material outlet, 13.15-Movable body, 14A, 14B, 16A
, 16B-Roller row, 14C216C-Rail body, 21
P, 21N treated electrode, 29.30-lifting mechanism. 32.3
3.-wheels,

Claims (4)

【特許請求の範囲】[Claims] (1)処理室内を真空排気して処理ガスと置換し、被処
理材を、大気圧以上の処理ガスで満たされた上記処理室
を通過させつつ該被処理材の表面処理を行う表面処理装
置において、 端面相互対接して上記処理室内に副室を区画可能一対の
筒状可動体と、両可動体を同軸に支持する支持装置を有
し、一方の可動体は、上記処理室の被処理材導入口を真
空シール性を確保して摺動可能に貫通して外部に伸び、
他方の可動体は上記処理室の被処理材送出口を真空シー
ル性を確保して摺動可能に貫通して外部に伸び、上記両
可動体は、通常運転時、上記端面相互が所定間隔を隔て
る第1位置へ位置決めされ、上記真空排気時には、上記
端面が真空シール性を確保して相互対接する第2位置へ
駆動されることを特徴とする連続表面処理装置。
(1) A surface treatment device that evacuates the inside of the processing chamber and replaces it with processing gas, and performs surface treatment on the processing material while passing the processing material through the processing chamber filled with processing gas at atmospheric pressure or higher. A pair of cylindrical movable bodies whose end faces face each other and are capable of dividing a sub-chamber within the processing chamber, and a support device that supports both movable bodies coaxially, one of the movable bodies is configured to support the processing target in the processing chamber. The material inlet is slidably penetrated to ensure a vacuum seal and extends to the outside.
The other movable body extends outward by slidingly passing through the processing material outlet of the processing chamber while ensuring a vacuum seal, and during normal operation, the end faces of the two movable bodies are spaced apart from each other by a predetermined distance. A continuous surface treatment apparatus characterized in that the continuous surface treatment apparatus is positioned at a first position separated from each other, and during the evacuation is driven to a second position where the end faces face each other while ensuring vacuum sealing properties.
(2)通常運転時、被処理材が通過する間隙を隔てて対
向する一対の放電用処理電極を有する場合において、両
処理電極が、処理室外に設けた昇降機構により個別昇降
可能に支持されていることを特徴とする請求項1記載の
連続表面処理装置。
(2) During normal operation, when a pair of discharge processing electrodes is provided facing each other with a gap through which the material to be processed passes, both processing electrodes are supported so that they can be raised and lowered individually by a lifting mechanism provided outside the processing chamber. The continuous surface treatment apparatus according to claim 1, characterized in that:
(3)支持装置は、処理室の被処理材導入口・送出口外
部に設けたローラ列と被処理材導入口・送出口内部に設
けたローラ列からなることを特徴とする請求項1または
2記載の連続表面処理装置。
(3) The support device comprises a roller row provided outside the processing material inlet/output port of the processing chamber and a roller row provided inside the processing material inlet/output port. 2. The continuous surface treatment device according to 2.
(4)支持装置は、処理室の被処理材導入口・送出口内
部に設けたローラ列と、処理室の被処理材導入口・送出
口外部に設けたレール体からなり、可動体の一方端部に
該レール体上を転動可能な車輪を持つ車輸機構を有する
ことを特徴とする請求項1または2記載の連続表面処理
装置。
(4) The support device consists of a roller array provided inside the processing chamber's material inlet and outlet, and a rail body provided outside the processing chamber's material inlet and outlet. 3. The continuous surface treatment apparatus according to claim 1, further comprising a transport mechanism having wheels that can roll on the rail body at an end thereof.
JP10644790A 1990-04-24 1990-04-24 Continuous surface treatment equipment Expired - Fee Related JP2952957B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10644790A JP2952957B2 (en) 1990-04-24 1990-04-24 Continuous surface treatment equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10644790A JP2952957B2 (en) 1990-04-24 1990-04-24 Continuous surface treatment equipment

Publications (2)

Publication Number Publication Date
JPH046273A true JPH046273A (en) 1992-01-10
JP2952957B2 JP2952957B2 (en) 1999-09-27

Family

ID=14433873

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10644790A Expired - Fee Related JP2952957B2 (en) 1990-04-24 1990-04-24 Continuous surface treatment equipment

Country Status (1)

Country Link
JP (1) JP2952957B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2381009A1 (en) * 2010-04-22 2011-10-26 PrimeStar Solar, Inc Seal configuration for a system for continuous deposition of a thin film layer on a substrate

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101468373B1 (en) * 2013-05-01 2014-12-03 주식회사 뉴파워 프라즈마 Heat treatment apparatus for carbon fiber manufacture and carbon fiber manufacture system with the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2381009A1 (en) * 2010-04-22 2011-10-26 PrimeStar Solar, Inc Seal configuration for a system for continuous deposition of a thin film layer on a substrate
US8361229B2 (en) 2010-04-22 2013-01-29 Primestar Solar, Inc. Seal configuration for a system for continuous deposition of a thin film layer on a substrate

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