JPH0440290Y2 - - Google Patents
Info
- Publication number
- JPH0440290Y2 JPH0440290Y2 JP600286U JP600286U JPH0440290Y2 JP H0440290 Y2 JPH0440290 Y2 JP H0440290Y2 JP 600286 U JP600286 U JP 600286U JP 600286 U JP600286 U JP 600286U JP H0440290 Y2 JPH0440290 Y2 JP H0440290Y2
- Authority
- JP
- Japan
- Prior art keywords
- light
- reflected
- laser chip
- semiconductor laser
- blackened
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- 239000004065 semiconductor Substances 0.000 claims description 16
- 230000005855 radiation Effects 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 230000003287 optical effect Effects 0.000 description 14
- 238000010586 diagram Methods 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 238000003776 cleavage reaction Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 230000007017 scission Effects 0.000 description 2
- 229920002050 silicone resin Polymers 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
Landscapes
- Optical Head (AREA)
Description
【考案の詳細な説明】 (イ) 産業上の利用分野 本考案は半導体レーザ装置に関する。[Detailed explanation of the idea] (b) Industrial application fields The present invention relates to a semiconductor laser device.
(ロ) 従来の技術
現在、半導体レーザチツプは光フアイバ(情報
が光学的に読出し可能に記録されているデイス
ク)に対して利用される光学式ピツクアツプ装置
の光源として利用されている。(b) Prior Art Currently, semiconductor laser chips are used as light sources in optical pickup devices that are used for optical fibers (disks on which information is optically readably recorded).
光学式ピツクアツプ装置として、第3図に示す
構造を有するものが知られている(例えば、実開
昭58−75342号公報参照)。図に於いて、半導体レ
ーザ1より出たレーザ光は回折格子2によつて回
折され、三つのビームP0(主ビーム)、P1,P2(補
助ビーム)となつて、ビームスプリツタ(透過光
と反射光との比が同一のもの、或いは比が相違す
るもの)3、対物レンズ4を経てデイスクDに入
射する。デイスクDにて反射されたビームは反射
光P′0,P′1,P′2となつて、元の光路を逆に戻り
(補助ビームP1,P2はデイスクに対して垂直では
なく若干角度をもつて入射するがこの角度は極め
て小さい為、反射光P′1,P′2は実質的に元の光路
を戻ると考えて良い)。対物レンズ4を経てビー
ムスプリツタ3に至る。ビームスプリツタ3にて
反射された反射ビーム(P′0,P′1,P′2)は、凹
レンズ5、シリンドリカルレンズ6を経てフオト
センサ7に至る。フオトセンサ7は反射主ビーム
P′0を受けるセンサ7c、反射補助ビームP′1を受
けるセンサ7a及び反射補助ビームP′2を受ける
センサ7bより構成されている。そして、センサ
7cより情報信号及びフオーカスエラー信号が得
られ、またセンサ7a,7bの出力差としてラジ
アルエラー信号が得られることは、既に知られて
いる。 As an optical pickup device, one having the structure shown in FIG. 3 is known (for example, see Japanese Utility Model Application No. 75342/1983). In the figure, a laser beam emitted from a semiconductor laser 1 is diffracted by a diffraction grating 2, and becomes three beams P 0 (main beam), P 1 , and P 2 (auxiliary beams), and a beam splitter ( The transmitted light and the reflected light have the same ratio or different ratios) 3 and enter the disk D through the objective lens 4. The beam reflected by disk D becomes reflected light P′ 0 , P′ 1 , P′ 2 and returns along the original optical path in the opposite direction (auxiliary beams P 1 and P 2 are not perpendicular to the disk but slightly The light enters at an angle, but since this angle is extremely small, it can be considered that the reflected lights P' 1 and P' 2 essentially return along their original optical paths.) The beam passes through the objective lens 4 and reaches the beam splitter 3. The reflected beams (P' 0 , P' 1 , P' 2 ) reflected by the beam splitter 3 reach the photo sensor 7 via the concave lens 5 and the cylindrical lens 6 . Photo sensor 7 is the reflected main beam
It is composed of a sensor 7c that receives P'0 , a sensor 7a that receives reflected auxiliary beam P'1 , and a sensor 7b that receives reflected auxiliary beam P'2 . It is already known that an information signal and a focus error signal can be obtained from the sensor 7c, and that a radial error signal can be obtained as the difference in output between the sensors 7a and 7b.
さて、第4図は、従来のピツクアツプ装置に於
けるラジアルエラー信号REの変化を示している。
ラジアルエラー信号REの直流成分はデイスクの
1回転に対応して変動し、この変動は面振れの大
きいデイスク程大きくなる。デイスクに記録され
ている曲を検索する等の特殊なデイスク再生を行
う場合、ラジアルエラー信号の直流成分RE,DC
の変動許容範囲は、直流成分の変動振幅をA、ラ
ジアルエラー信号の振幅をREp−pとすれば、
A/REp−p≦0.2を満足する必要がある。従来
のピツクアツプ装置は、必ずしも上記条件を満足
するものではなかつた。 Now, FIG. 4 shows changes in the radial error signal RE in a conventional pickup device.
The DC component of the radial error signal RE fluctuates in response to one rotation of the disk, and this fluctuation increases as the surface runout of the disk increases. When performing special disc playback such as searching for songs recorded on a disc, the DC component of the radial error signal RE, DC
The permissible range of variation is as follows, where A is the variation amplitude of the DC component and REp-p is the amplitude of the radial error signal.
It is necessary to satisfy A/REp-p≦0.2. Conventional pickup devices do not necessarily satisfy the above conditions.
上述したラジアルエラー信号の直流成分の変動
の原因は、ピツクアツプ装置より出力されるビー
ムの光軸のデイスクに対する垂直度が、特にデイ
スクのタンジエンシヤル方向に於いて、デイスク
の面振れに応じて1回転周期にて変動し、この垂
直度の変動に応じて、信号再生に必要なビームと
不要なビーム(迷光)との間に於いて生じる光の
干渉度合が変化することにあると考えられる。以
下、この点について、第5図を参照して更に詳述
する。 The reason for the above-mentioned fluctuation in the DC component of the radial error signal is that the perpendicularity of the optical axis of the beam output from the pickup device to the disk changes over one rotation period depending on the surface runout of the disk, especially in the tangential direction of the disk. It is thought that this is because the degree of light interference that occurs between the beam necessary for signal reproduction and the unnecessary beam (stray light) changes in accordance with the change in verticality. This point will be explained in more detail below with reference to FIG.
第5図に於いて、8は半導体レーザチツプを示
しており、このチツプ8はチツプ取付台(サブマ
ウント)9にロウ付け又は導電性接着剤にて固定
されている。チツプ8の放射点0より放射された
レーザビームP0は、回折格子2により、そのま
ま直進する(回折を受けない)主ビームP0と、
回折により生じる補助ビームP1,P2(±1次回折
光)に分かれて、デイスクに向う。デイスクにて
反射されたビーム(P0′,P1′,P2′)は、その一
部が〔第3図に於いて示すビームスプリツタ3を
透過した分が〕回折格子2に戻る。これ等のビー
ムは回折格子2を経て、レーザチツプ8側に向
う。これ等のビームのうち、Xの光路をたどるビ
ーム〔P0′(+1),P2′(0)〕はレーザチツプ
8の放射面N(この面は鏡面となつている)のQ
点にて反射され、元の光路Xを戻る〔光路Xは放
射面(結晶へき開面)Nに対して垂直ではなく若
干の角度を持つているが、この角度は極めて小さ
い為、反射光は元の光路を戻ると考えて良い〕。
この反射戻り光(迷光)がビームP′2と干渉を起
し、斯かる干渉を受けたビームP2′がフオトセン
サ7bに向う為、このフオトセンサ7bの出力信
号Sbの直流成分に変動を生じる(第6図参照)。
第θ図に於いて横軸θは、対物レンズの光軸がデ
イスク面に対する垂直線に対してタンジエンシヤ
ル方向に於いてなす角度を示しており、出力信号
Sbの1波長が約1.3度となつている。 In FIG. 5, reference numeral 8 indicates a semiconductor laser chip, and this chip 8 is fixed to a chip mount (submount) 9 by brazing or conductive adhesive. The laser beam P 0 emitted from the radiation point 0 of the chip 8 is transformed into a main beam P 0 that travels straight (does not undergo diffraction) due to the diffraction grating 2.
The beam is split into auxiliary beams P 1 and P 2 (±first-order diffracted light) generated by diffraction and directed toward the disk. A portion of the beams (P 0 ', P 1 ', P 2 ') reflected by the disk returns to the diffraction grating 2 (the portion transmitted through the beam splitter 3 shown in FIG. 3). These beams pass through the diffraction grating 2 and head towards the laser chip 8 side. Among these beams, the beam [P 0 ′ (+1), P 2 ′ (0)] that follows the optical path of
It is reflected at the point and returns along the original optical path X. [The optical path You can think of it as returning along the optical path of
This reflected return light (stray light) causes interference with the beam P' 2 , and the beam P 2 ' subjected to such interference is directed toward the photo sensor 7b, causing fluctuations in the DC component of the output signal Sb of the photo sensor 7b ( (See Figure 6).
In Fig. θ, the horizontal axis θ indicates the angle that the optical axis of the objective lens makes in the tangential direction with respect to the perpendicular line to the disk surface, and the output signal
One wavelength of Sb is approximately 1.3 degrees.
ここで、回折後のビームの光量について考える
と、0次回折光(回折を受けない光)と±1次回
折光の光量比は1:1/3〜1/8となる為、2
回以上回折を受けた光は、その光量レベルが小さ
く、干渉を考慮する必要がない。第5図に於い
て、ビームP0′(+1)は、デイスクからの反射
光P0′の+1次回折光であり、1回の回折を受け
たのみであるから、干渉に影響を及ぼす、ビーム
P2′(0)は、レーザ光P0が回折格子2を第6図
に於いて下から上に通過するとき生じた第1次回
折光P2のデイスクによる反射光P2′の0次光〔即
ち、回折格子2を上から下に通過するときに、回
折を受けずに直進した光〕であるから、同じく1
回の回折を受けたのみであり、干渉に影響を及ぼ
す。 Here, considering the light intensity of the beam after diffraction, the light intensity ratio of the 0th-order diffracted light (light that does not undergo diffraction) and the ±1st-order diffracted light is 1:1/3 to 1/8, so 2
Light that has been diffracted more than once has a small light intensity level, and there is no need to consider interference. In FIG. 5, the beam P 0 '(+1) is the +1st-order diffracted light of the reflected light P 0 ' from the disk, and since it has undergone only one diffraction, the beam P 0 '(+1) has no effect on the interference.
P 2 ′(0) is the 0th-order light of the reflected light P 2 ′ of the first-order diffracted light P 2 generated when the laser light P 0 passes through the diffraction grating 2 from bottom to top in FIG. [In other words, when passing through the diffraction grating 2 from top to bottom, it is light that travels straight without undergoing diffraction], so similarly 1
It is only subjected to the second diffraction, which affects the interference.
尚、光路Yに向うビーム〔P0′(−1)(ビー
ムP0′の1次光)、P1′(0)(ビームP1′の0次
光)〕は、共に1回の回折を受けたビームである
が、第5図に示す如くレーザチツプ8に入射する
ことがないので、ビームP1′に干渉が生じること
がない。それ故、ビームP1′を受けるフオトセン
サ7aの出力信号Saの直流成分の変動は第6図
に示す通り、小さくなつている。 Note that the beams [P 0 '(-1) (first order light of beam P 0 ') and P 1 '(0) (0th order light of beam P 1 ')] heading toward optical path Y undergo one diffraction. However, since the received beam does not enter the laser chip 8 as shown in FIG. 5, no interference occurs with the beam P 1 '. Therefore, as shown in FIG. 6, fluctuations in the DC component of the output signal Sa of the photo sensor 7a receiving the beam P 1 ' are reduced.
以上の説明により、光路XのビームP2′(0)
及びP0′(+1)がレーザチツプ8の放射面Nに
より反射した反射光が、ラジアルエラー信号〔フ
オトセンサ7a,7bの出力信号Sa,Sbの差〕
の直流成分の変動の原因となつていることが分
る。 According to the above explanation, beam P 2 ′(0) of optical path
and P 0 '(+1) is reflected by the radiation surface N of the laser chip 8, and the reflected light is a radial error signal [the difference between the output signals Sa and Sb of the photo sensors 7a and 7b]
It can be seen that this is the cause of fluctuations in the DC component of
そこで、レーザチツプ8の放射面Nでの反射を
防止するために第7図に示す如く放射面N上に低
光反射材料からなる膜22を設ける構造が特願昭
60−157604号等で提案されている。 Therefore, in order to prevent reflection on the radiation surface N of the laser chip 8, a structure was proposed in which a film 22 made of a low light reflection material is provided on the radiation surface N as shown in FIG.
It has been proposed in No. 60-157604, etc.
第7図中、11はCuからなるステム、12は
Si単結晶からなるヒートシンクであり、該ヒート
シンクは上記ステムの一主面上に熱的電気的に固
着されている。13は半導体レーザチツプであ
り、該チツプはp型GaAS基板14の一主面上に
p型Ga1−XA1XAS(0<X<1)からなる第1
グラツド層15、ノンドープGa1−YA1YAS(0
≦Y<X)からなる活性層16、n型Ga1−
XAlxASからなる第2グラツド層17及びn型
GaASからなるキヤツプ層18を順次積層してな
り、また放射面Nとなる端面はへき開により形成
され、そのへき開面上にはSiO2等からなる保護
膜19が形成されている。尚、上記基板及び各層
15〜18の層厚は夫々90μm,2μm,0.1μm,
1.5μm,2μmである。22は放射点Oを除く放射
面N上に形成された膜であり、該膜は例えば黒色
シリコン樹脂等の低光反射材料からなる。20,
21は夫々基板14の他主面及びキヤツプ層18
表面に夫々形成されたオートミツク性の第1、第
2電極、23は該第1電極20をヒートシンク1
2上に固着するための導電性接着剤である。 In Fig. 7, 11 is a stem made of Cu, and 12 is a stem made of Cu.
The heat sink is made of Si single crystal, and the heat sink is thermally and electrically fixed to one main surface of the stem. Reference numeral 13 denotes a semiconductor laser chip, and this chip has a first semiconductor laser chip made of p-type Ga1-XA1XAS (0<X<1) on one main surface of a p-type GaAS substrate 14.
Grad layer 15, non-doped Ga1-YA1YAS (0
≦Y<X) active layer 16, n-type Ga1-
Second grading layer 17 made of XAlxAS and n-type
The cap layer 18 made of GaAS is sequentially laminated, and the end face that becomes the radiation surface N is formed by cleavage, and a protective film 19 made of SiO 2 or the like is formed on the cleavage surface. The thicknesses of the substrate and each layer 15 to 18 are 90 μm, 2 μm, 0.1 μm, and 0.1 μm, respectively.
They are 1.5μm and 2μm. Reference numeral 22 denotes a film formed on the radiation surface N excluding the radiation point O, and the film is made of a low light reflection material such as black silicone resin. 20,
21 are the other main surface of the substrate 14 and the cap layer 18, respectively.
The automic first and second electrodes 23 formed on the surfaces connect the first electrodes 20 to the heat sink 1.
2 is a conductive adhesive for adhering to the surface.
斯る構成によれば、第7図において示す戻り光
P2′(0)、P0′(+1)がレーザチツプ8の放射
面Nに入射した場合、反射防止膜22により大部
分は吸収され一部は反射されても乱反射され、光
路Xを戻る量は極めて少なくなる。従つて、戻り
光P0′(0)が放射面Nにて反射され、回折格子
2にて回折された後P2′方向に向う光〔P0′(0)
の放射面による反射光の1次回折光〕が、P2′と
干渉を起すのみであり、フオトセンサ7bの出力
信号Sbの変動は第8図に示す如く大幅に低減さ
れることになる。 According to such a configuration, the return light shown in FIG.
When P 2 ′ (0) and P 0 ′ (+1) are incident on the radiation surface N of the laser chip 8, most of them are absorbed by the anti-reflection film 22, and even if some are reflected, they are diffusely reflected, and the amount that returns along the optical path X is becomes extremely small. Therefore, the returned light P 0 ′(0) is reflected at the radiation surface N, diffracted by the diffraction grating 2, and then the light [P 0 ′ (0)
The first-order diffracted light of the light reflected by the radiation surface] only interferes with P 2 ', and the fluctuation in the output signal Sb of the photo sensor 7b is significantly reduced as shown in FIG.
(ハ) 考案が解決しようとする問題点
然るに斯る構成では、膜22は顕微鏡等を見な
がら手作業で付ける必要があるため生産歩留りが
悪く、また、上記膜22は樹脂性であるため、高
温下でははがれや蒸発を生じ易く、信頼性に欠け
るという問題があつた。(c) Problems to be solved by the invention However, in such a configuration, the production yield is poor because the film 22 must be attached manually while looking at a microscope, etc. Also, since the film 22 is made of resin, There were problems in that it was prone to peeling and evaporation at high temperatures, and lacked reliability.
(ニ) 問題点を解決するための手段
本考案はこのような点に鑑みて為されたもので
あつて、その特徴とするところは、1対の共振器
面を有する半導体レーザチツプと、一主面が金属
により黒色化されると共に該黒色化面と直交する
面に溝が形成された金属製ブロツクと、を備え、
上記半導体レーザチツプは上記金属製ブロツクの
溝内に、その放射点が該ブロツクの黒色化面と直
交する面より上方に位置するように配されたこと
にある。(d) Means for solving the problems The present invention was devised in view of the above points, and its features include a semiconductor laser chip having a pair of resonator surfaces, and a semiconductor laser chip having a pair of resonator surfaces; A metal block whose surface is blackened with metal and a groove is formed on a surface perpendicular to the blackened surface,
The semiconductor laser chip is arranged in the groove of the metal block so that its emission point is located above a plane perpendicular to the blackened surface of the block.
(ホ) 作用
斯る構成によりラジアルエラー信号の直流成分
の変動が抑圧される。(E) Effect This configuration suppresses fluctuations in the DC component of the radial error signal.
(ヘ) 実施例
第1図は本考案の実施例を示し、31は例えば
銅製のブロツク、32は該ブロツクの一主面31
a上に形成された黒色層であり、該層はクロムメ
ツキもしくはブロツク表面の酸化により形成でき
る。33は溝部であり、該溝部は上記一主面31
aと直交する面31bに形成される。尚、斯る溝
部33は例えばレーザ加工により精度良く形成で
きる。34はレーザチツプであり、該レーザチツ
プは上記溝部33底面に導電性接着剤35等によ
り固着される。尚、斯るレーザチツプ34は第7
図で説明したものと同一であるので同一箇所には
同一番号を付し、説明を省略する。(F) Embodiment FIG. 1 shows an embodiment of the present invention, where 31 is a block made of copper, for example, and 32 is one main surface 31 of the block.
This is a black layer formed on the block a, and the layer can be formed by chrome plating or oxidation of the block surface. 33 is a groove, and the groove is located on the main surface 31.
It is formed on a surface 31b perpendicular to a. Incidentally, such groove portion 33 can be formed with high accuracy by, for example, laser processing. 34 is a laser chip, and the laser chip is fixed to the bottom surface of the groove 33 with a conductive adhesive 35 or the like. Incidentally, such a laser chip 34 is the seventh laser chip.
Since it is the same as that explained in the figures, the same parts are given the same numbers and the explanation will be omitted.
斯る構成において、面31bに対するレーザチ
ツプ34の放射点Oの高さhを50μmとし、かつ
黒色層32表面からレーザチツプ34の放射面N
までの距離を50μm〜150μmとするように上記溝
部33を形成すると、通常の半導体レーザの出力
光の垂直方向の光拡がり角θは20°〜40°であるの
で、斯る出力光が溝部33側壁33aにより遮断
されることはない。 In such a configuration, the height h of the radiation point O of the laser chip 34 with respect to the surface 31b is 50 μm, and the height h of the radiation point O of the laser chip 34 from the surface of the black layer 32 is
When the groove portion 33 is formed so that the distance from the groove portion 33 to the groove portion 33 is 50 μm to 150 μm, since the vertical light spread angle θ of the output light of a normal semiconductor laser is 20° to 40°, such output light will be directed to the groove portion 33. It is not blocked by the side wall 33a.
また、戻り光P2′(0)、P0′(+1)はブロツ
ク31の黒色層32によつて大部分は吸収される
ので光路Xを戻る量は極めて少なくなる。従つて
従来の構成と同様にフオトセンサ7の出力信号の
変動は大幅に低減される。 Furthermore, since most of the returned lights P 2 '(0) and P 0 '(+1) are absorbed by the black layer 32 of the block 31, the amount of them returning along the optical path X becomes extremely small. Therefore, as with the conventional configuration, fluctuations in the output signal of the photo sensor 7 are significantly reduced.
更に、斯る構成では戻り光を吸収する黒色層3
2はクロムもしくは酸化銅により形成されている
ため、高温下でもはがれや蒸発を生じない。 Furthermore, in such a configuration, a black layer 3 that absorbs returning light is provided.
Since 2 is made of chromium or copper oxide, it does not peel off or evaporate even at high temperatures.
第2図にレーザチツプとして発振波長7900Åの
VSIS型レーザを用いた際の本実施例装置の寿命
試験結果(図中A)及び放射面に黒色シリコン樹
脂を塗布した従来装置の寿命試験結果(図中B)
を示す。尚、斯る寿命試験は60℃の雰囲気中で
4mwの連続発振を行なつた際の駆動電流の経時
変化を調べたものである。 Figure 2 shows a laser chip with an oscillation wavelength of 7900 Å.
Life test results of this example device using a VSIS type laser (A in the figure) and life test results of a conventional device whose radiation surface was coated with black silicone resin (B in the figure)
shows. Furthermore, this life test was conducted in an atmosphere of 60℃.
This study investigated the change in drive current over time during continuous oscillation of 4mW.
第2図より明らかな如く、従来装置では7000時
間を超えると駆動電流が急激に上昇するのに対し
て、本実施例装置では10000時間を超えても駆動
電流に変化は見受けられない。 As is clear from FIG. 2, in the conventional device, the drive current increases rapidly after 7,000 hours, whereas in the device of this embodiment, no change is observed in the drive current even after 10,000 hours.
(ト) 考案の効果
本考案は以上の説明から明らかなように、半導
体レーザチツプを金属製ブロツクの溝内に、その
放射点が該ブロツクの黒色化面と直交する面より
上方に位置するように配されているので、戻り光
の大部分がその黒色化面で吸収され、フオトセン
サの出力信号の変動は大幅に低減される。またそ
の戻り光を吸収するための黒色化面はブロツク表
面に形成されるので、その形成工程が従来に比し
て簡単なものとなると共に、この黒色化面は金属
により黒色化されているので、その寿命が長く、
信頼性の高い半導体レーザ装置が得られる。(g) Effects of the invention As is clear from the above explanation, the present invention is based on a method in which a semiconductor laser chip is placed in a groove of a metal block so that its emission point is located above a surface perpendicular to the blackened surface of the block. Since most of the returned light is absorbed by the blackened surface, fluctuations in the output signal of the photo sensor are significantly reduced. In addition, since the blackened surface for absorbing the returned light is formed on the surface of the block, the formation process is simpler than before, and since this blackened surface is blackened with metal, , its lifespan is long;
A highly reliable semiconductor laser device can be obtained.
第1図は本考案の実施例を示す断面図、第2図
は寿命特性を示す特性図、第3図は従来のピツク
アツプ装置を示す図、第4図は従来装置のラジア
ルエラー信号を示す図、第5図は干渉が起る原理
の説明に供する図、第6図は従来装置のフオトセ
ンサの出力信号の変化を示す図、第7図は改良さ
れた従来装置を示す断面図、第8図はフオトセン
サの出力変化を示す図である。
31……ブロツク、32……黒色層、33……
溝、34……半導体レーザチツプ。
Fig. 1 is a sectional view showing an embodiment of the present invention, Fig. 2 is a characteristic diagram showing life characteristics, Fig. 3 is a diagram showing a conventional pickup device, and Fig. 4 is a diagram showing a radial error signal of the conventional device. , FIG. 5 is a diagram explaining the principle of interference, FIG. 6 is a diagram showing changes in the output signal of the photo sensor of the conventional device, FIG. 7 is a sectional view showing the improved conventional device, and FIG. 8 FIG. 2 is a diagram showing changes in the output of a photo sensor. 31...Block, 32...Black layer, 33...
Groove, 34... semiconductor laser chip.
Claims (1)
と、一主面が金属により黒色化されると共に該黒
色化面と直交する面に溝が形成された金属製ブロ
ツクと、からなり、 上記半導体レーザチツプは上記金属製ブロツク
の溝内に、その放射点が該ブロツクの黒色化面と
直交する面より上方に位置するように配されたこ
とを特徴とする半導体レーザ装置。[Claims for Utility Model Registration] A semiconductor laser chip having a pair of resonator surfaces; a metal block having one main surface blackened with metal and a groove formed in a surface perpendicular to the blackened surface; A semiconductor laser device, characterized in that the semiconductor laser chip is disposed in a groove of the metal block such that its radiation point is located above a surface perpendicular to the blackened surface of the block.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP600286U JPH0440290Y2 (en) | 1986-01-20 | 1986-01-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP600286U JPH0440290Y2 (en) | 1986-01-20 | 1986-01-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62118468U JPS62118468U (en) | 1987-07-28 |
| JPH0440290Y2 true JPH0440290Y2 (en) | 1992-09-21 |
Family
ID=30788105
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP600286U Expired JPH0440290Y2 (en) | 1986-01-20 | 1986-01-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0440290Y2 (en) |
-
1986
- 1986-01-20 JP JP600286U patent/JPH0440290Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62118468U (en) | 1987-07-28 |
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