JPH04161437A - Polyimide film - Google Patents
Polyimide filmInfo
- Publication number
- JPH04161437A JPH04161437A JP28754690A JP28754690A JPH04161437A JP H04161437 A JPH04161437 A JP H04161437A JP 28754690 A JP28754690 A JP 28754690A JP 28754690 A JP28754690 A JP 28754690A JP H04161437 A JPH04161437 A JP H04161437A
- Authority
- JP
- Japan
- Prior art keywords
- polyimide film
- copolymer
- polyamic acid
- repeating units
- elastic modulus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
Landscapes
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、耐水性及び耐湿性に優れ且つ高い弾性率を有
し、そのため、優れた寸法安定性を持つポリイミドフィ
ルムに関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a polyimide film that has excellent water resistance and moisture resistance, high elastic modulus, and therefore excellent dimensional stability.
ポリイミドは、一般に、耐熱性、電気絶縁性、耐薬品性
および耐放射線性に優れており、フレキシブルプリント
基板の絶縁層等の用途に広く利用されている。しかし乍
ら、従来のポリイミドは、その化学構造上、耐水性、耐
湿性が悪い、つまり吸水率、吸湿率が高いという欠点が
ある。そのため、例えば、このポリイミドのフィルムを
フレキシブルプリント基板の絶縁層に用いた場合、エツ
チング工程などの水に曝される工程において吸湿して寸
法変化を生じ、微細加工を施す際に非常に大きな困難を
招いていた。Polyimide generally has excellent heat resistance, electrical insulation, chemical resistance, and radiation resistance, and is widely used for applications such as insulating layers of flexible printed circuit boards. However, conventional polyimides have the disadvantage of poor water resistance and moisture resistance, that is, high water absorption and moisture absorption rates, due to their chemical structure. Therefore, for example, when this polyimide film is used as an insulating layer of a flexible printed circuit board, it absorbs moisture during the etching process and other processes where it is exposed to water, resulting in dimensional changes, making it very difficult to carry out microfabrication. I was invited.
そこで、吸水率、吸湿率を下げるための試みとして、長
鎖の芳香族ジアミンを用いて、イミド環の数の全体に占
める割合を減らし、吸水率の低いポリイミドフィルムを
製造することが提案されている、しかしながら、このポ
リイミドフィルムは耐水性、耐湿性に優れてはいるが、
多くの長鎖ジアミンはいくつかの屈曲基を構造中に有す
るため、弾性率が低くなってしまうという欠点を持つ。Therefore, as an attempt to lower the water absorption rate and moisture absorption rate, it has been proposed to use a long-chain aromatic diamine to reduce the proportion of the total number of imide rings and to produce a polyimide film with a low water absorption rate. However, although this polyimide film has excellent water resistance and moisture resistance,
Many long-chain diamines have several bending groups in their structure, which has the disadvantage of low elastic modulus.
すなわち、このポリイミドフィルムはテンシランに対す
る歪が大きく、例えばフレキシブルプリント基板の製造
において微細加工を施す際などの寸法安定性に問題があ
る。That is, this polyimide film has a large strain against tensilan, and has a problem in dimensional stability when microfabrication is performed, for example, in the production of flexible printed circuit boards.
上記の如く、従来、優れた耐水性、耐湿性および高い弾
性率を併せ持つポリイミドフィルムの出現が望まれてい
た。As mentioned above, there has been a desire for a polyimide film that has both excellent water resistance, moisture resistance, and high elastic modulus.
〔発明が解決しようとする!i!題)
本発明は、優れた耐水性、耐湿性と高い弾性率を併せ持
つポリイミドフィルムを得ることを目的とする。[Invention tries to solve! i! The object of the present invention is to obtain a polyimide film having both excellent water resistance and moisture resistance and high elastic modulus.
すなわち本発明は、下記一般式(A)および(B)で表
される反復単位を有するポリイミドフィルムを内容とす
るものである。That is, the present invention includes a polyimide film having repeating units represented by the following general formulas (A) and (B).
(Xは水素原子またはフッ素原子、Rは水酸基、メチル
基、メトキシ基、塩素原子またはフッ素原子を表す、)
本発明者らは、耐水性、耐湿性に優れ、且つ高弾性率の
ポリイミドフィルムを得るべく種々の長鎖ジアミンと剛
直なジアミンと酸二無水物の共重合を検討した結果、比
較的長鎖が長く屈曲基数が多いジアミンであるにもかか
わらず、それを用いて共重合して得たポリイミドフィル
ムが、ある特定の組合せにおいて、高弾性率を示すこと
を見い出した。(X represents a hydrogen atom or a fluorine atom; R represents a hydroxyl group, a methyl group, a methoxy group, a chlorine atom, or a fluorine atom) As a result of studying the copolymerization of various long-chain diamines, rigid diamines, and acid dianhydrides, we found that although the diamine has a relatively long chain and a large number of bent groups, it is possible to copolymerize it using it. It has been found that the obtained polyimide film exhibits a high elastic modulus in certain specific combinations.
すなわち、本発明によるポリイミドフィルムは、屈曲基
を持つ長鎖の芳香族ジアミン残基を含む一般式(A)で
表される反復単位と、剛直な芳香族ジアミン残基を含む
一般式(B)で表される反復単位で構成される共重合体
からなる。That is, the polyimide film according to the present invention has a repeating unit represented by the general formula (A) containing a long-chain aromatic diamine residue having a bending group, and a repeating unit represented by the general formula (B) containing a rigid aromatic diamine residue. It consists of a copolymer composed of repeating units represented by
本発明のポリイミド共重合体はランダム共重合体、交互
共重合体、ブロック共重合体のいずれでもよい、また、
一般式(A)及び(B)で表される反復単位の繰返し数
はそれぞれ100〜10000の範囲が好ましく、また
モル比(A)/ (B)は20/80〜80/20の範
囲にあることが好ましく、更に好ましくは40/60〜
60/40の範囲である。(A)の比率が上記範囲より
小さいとフィルムの吸水率が高くなり、逆に(A)の比
率が上記範囲より大きいと弾性率が低くなる。The polyimide copolymer of the present invention may be a random copolymer, an alternating copolymer, or a block copolymer, and
The number of repeating units represented by general formulas (A) and (B) is preferably in the range of 100 to 10,000, and the molar ratio (A)/(B) is in the range of 20/80 to 80/20. is preferable, more preferably 40/60~
The range is 60/40. If the ratio of (A) is smaller than the above range, the water absorption rate of the film will be high, and conversely, if the ratio of (A) is larger than the above range, the elastic modulus will be low.
また、このポリイミド共重合体に各種の有機添加材、或
いは無機のフィラー類、或いは各種の強化材を単独又は
組み合わせて複合することも可能である。It is also possible to compound various organic additives, inorganic fillers, or various reinforcing materials singly or in combination with this polyimide copolymer.
次に、このポリイミドフィルムの製造法について説明す
る。このポリイミド共重合体は、その前駆体であるポリ
アミド酸共重合体溶液から得られるが、このポリアミド
酸共重合体溶液は、公知の方法で製造することができる
。すなわち、酸無水吻とジアミン成分を実質等モル使用
し、有機極性溶媒中で重合して得られる。Next, a method for manufacturing this polyimide film will be explained. This polyimide copolymer is obtained from a polyamic acid copolymer solution which is its precursor, and this polyamic acid copolymer solution can be produced by a known method. That is, it is obtained by polymerizing in an organic polar solvent using substantially equimolar amounts of acid anhydride and diamine components.
このポリアミド酸共重合体溶液の製造方法の具体例を以
下に示す。A specific example of the method for producing this polyamic acid copolymer solution is shown below.
(1)芳香族テトラカルボン酸二無水物(a)と、芳香
族ジアミン化合物(b)と(c)の混合物を実質的に等
モル、有機極性溶媒中で反応させる共重合方法、この方
法ではランダム共重合体が得られる。(1) A copolymerization method in which a mixture of aromatic tetracarboxylic dianhydride (a) and aromatic diamine compounds (b) and (c) are reacted in substantially equimolar amounts in an organic polar solvent; A random copolymer is obtained.
(2)芳香族テトラカルボン酸二無水物(a)と一方の
芳香族ジアミン化合物(b)を、(a)を(b)より過
剰モル用い、有機極性溶媒中にて反応させ、両末端に酸
無水物基を有するプレポリマーを得て、続いてここに芳
香族ジアミン化合物(C)を、全芳香族ジアミン((b
)+ (c))が芳香族テトラカルボン酸二無水物(a
)と実質的に等モルになるように添加する共重合方法、
この方法により、どちらか一方の反復単位が存在するセ
グメントの長さが共重合体分子内において一定である共
重合体を得ることができる。(2) Aromatic tetracarboxylic dianhydride (a) and one aromatic diamine compound (b) are reacted in an organic polar solvent using a molar excess of (a) over (b), and both ends are reacted. A prepolymer having an acid anhydride group is obtained, and then an aromatic diamine compound (C) is added thereto, and a wholly aromatic diamine ((b
) + (c)) is aromatic tetracarboxylic dianhydride (a
), a copolymerization method in which the copolymerization method is added in a substantially equimolar amount with
By this method, a copolymer can be obtained in which the length of the segment in which one of the repeating units is present is constant within the copolymer molecule.
(3)芳香族ジアミン化合物(b)に対して芳香族テト
ラカルボン酸二無水物(a)を、(b)が(a)より過
剰になるように反応させ、両末端にアミノ基を有するプ
レポリマーを得て、続いてこれに芳香族ジアミン成分(
c)を追加添加後、全ジアミン成分C(b)+ (c)
)と実質的に等モルになるように、不足分の芳香族テト
ラカルボン酸二無水物(a)を添加反応させる共重合方
法。(3) React the aromatic tetracarboxylic dianhydride (a) with the aromatic diamine compound (b) in such a manner that (b) is in excess of (a), and prepare a precipitate having amino groups at both ends. A polymer is obtained and then an aromatic diamine component (
After additional addition of c), total diamine component C(b) + (c)
) A copolymerization method in which the insufficient amount of aromatic tetracarboxylic dianhydride (a) is added and reacted so as to be substantially equimolar.
この方法により、プロンク共重合体を得ることができる
。By this method, a Pronk copolymer can be obtained.
ポリアミド酸共重合体を得るには上記以外の方法を用い
てもよく、さらには異種のポリアミド酸溶液の混合によ
り得ることも可能である。(2)の方法を用いると、特
性の面で優れたものが得られるので好ましい。Methods other than those described above may be used to obtain the polyamic acid copolymer, and it is also possible to obtain the polyamic acid copolymer by mixing different types of polyamic acid solutions. It is preferable to use the method (2) because it yields products with excellent properties.
上記のポリアミド酸を得るために、芳香族テトラカルボ
ン酸二無水物としてピロメリット酸二無水物を用いる。In order to obtain the above polyamic acid, pyromellitic dianhydride is used as the aromatic tetracarboxylic dianhydride.
芳香族ジアミン成分として一般式(1)で表される芳香
族ジアミン成分、及び一般式(If)で表される芳香族
ジアミン成分を前記の成分(b)及び(c)として用い
る。The aromatic diamine component represented by the general formula (1) and the aromatic diamine component represented by the general formula (If) are used as the components (b) and (c).
一般式(1)で表される芳香族ジアミンとして、2.2
−ビスC4−(4−アミノフェノキシ)フェニル〕プロ
パン、2,2−ビスC4−C4−アミノフェノキシ)フ
ェニル〕へキサフルオロプロパン等を挙げることができ
、これらは単独または2種以上組み合わせて用いられる
。As the aromatic diamine represented by general formula (1), 2.2
-BisC4-(4-aminophenoxy)phenyl]propane, 2,2-bisC4-C4-aminophenoxy)phenyl]hexafluoropropane, etc., which may be used alone or in combination of two or more. .
また、一般式(I[)で示される芳香族ジアミンとして
、3.3′−ジヒドロキシ−4,4′−ジアミノビフェ
ニル、3.3′−ジメチル−4,4′−ジアミノビフェ
ニル、3.3′−ジメトキシ−4,4’−ジアミノビフ
ェニル、3.3′−ジクロロ−4,4′−ジアミノビフ
ェニル、3.3′−ジフルオロ−4,4′−ジアミノビ
フェニル等を挙げることができ、これらは単独または2
種以上組み合わせて用いられる。Further, as the aromatic diamine represented by the general formula (I[), 3.3'-dihydroxy-4,4'-diaminobiphenyl, 3.3'-dimethyl-4,4'-diaminobiphenyl, 3.3'-dimethoxy-4,4'-diaminobiphenyl,3.3'-dichloro-4,4'-diaminobiphenyl,3.3'-difluoro-4,4'-diaminobiphenyl, etc., and these may be used alone. or 2
Used in combination of more than one species.
また、該ポリアミド酸共重合体の生成反応に使用される
有機極性溶媒として、ジメチルスルホキシド、ジエチル
スルホキシドなどきスルホキシド系溶媒、N、N−ジメ
チルホルムアミド、N、 N−ジエチルホルムアミド
媒、N,N−ジメチルアセトアミド、N,N−ジエチル
アセトアミドなどのアセトアミド系溶媒、N−メチル−
2−ピロリドン、N−ビニル−2−ピロリドンなどのピ
ロリドン系溶媒、フェノール、0−、m−、またはp−
クレゾール、キシレノール、ハロゲン化フェノール、カ
テコールなどのフェノール系溶媒、あるいはへキサメチ
ルホスホルアミド、T−ブチロラクトンなどを挙げるこ
とができ、これらを単独または2種以上の混合物として
用いるのが望ましく、更にはキシレン、トルエンのよう
な芳香族炭化水素の使用も可能である。In addition, as the organic polar solvent used in the production reaction of the polyamic acid copolymer, sulfoxide solvents such as dimethyl sulfoxide and diethyl sulfoxide, N,N-dimethylformamide, N,N-diethylformamide medium, N,N- Acetamide solvents such as dimethylacetamide, N,N-diethylacetamide, N-methyl-
Pyrrolidone solvents such as 2-pyrrolidone, N-vinyl-2-pyrrolidone, phenol, 0-, m-, or p-
Examples include phenolic solvents such as cresol, xylenol, halogenated phenol, and catechol, hexamethylphosphoramide, and T-butyrolactone, and it is preferable to use these alone or as a mixture of two or more. It is also possible to use aromatic hydrocarbons such as xylene and toluene.
また、このポリアミド酸共重合体は各々前記の有機極性
溶媒中に5〜40重量%、好ましくは10〜30重量%
溶解されているのが取扱いの面からも望ましい。Further, this polyamic acid copolymer is contained in the organic polar solvent in an amount of 5 to 40% by weight, preferably 10 to 30% by weight.
From the viewpoint of handling, it is desirable that the material be dissolved.
次いで、このポリアミド酸溶液からポリイミドフィルム
を製造する方法については、従来公知の方法を用いるこ
とができる.すなわち、熱的に脱水する熱的方法、脱水
剤と触媒を用いる化学的方法のいずれを用いてもよいが
、化学的方法によると生成するポリイミド重合体の機械
特性が優れたものになるので好ましい.なお、ここで言
う脱水剤としては、例えば無水酢酸等の脂肪族酸無水物
、フタル酸無水物等の芳香族酸無水物などが挙げられる
.また触媒として、例えばトリエチルアミンなどの脂肪
族第3級アミン類、N,N−ジメチルアニリン等の芳香
族第3級アミン類、ピリジン、ピコリン、イソキノリン
、キノリン等の複素環式第3級アミン類などが挙げられ
る。Next, a conventionally known method can be used to produce a polyimide film from this polyamic acid solution. That is, either a thermal method of thermal dehydration or a chemical method using a dehydrating agent and a catalyst may be used, but chemical methods are preferred because the resulting polyimide polymer has excellent mechanical properties. .. The dehydrating agent mentioned here includes, for example, aliphatic acid anhydrides such as acetic anhydride, aromatic acid anhydrides such as phthalic anhydride, and the like. Examples of catalysts include aliphatic tertiary amines such as triethylamine, aromatic tertiary amines such as N,N-dimethylaniline, and heterocyclic tertiary amines such as pyridine, picoline, isoquinoline, and quinoline. can be mentioned.
このようにして、低い吸水率と高い弾性率を併せ持つポ
リイミドフィルムを得ることができる。In this way, a polyimide film having both low water absorption and high elastic modulus can be obtained.
以下、実施例により本発明を具体的に説明するが、本発
明はこれら実施例のみに限定されるものではない。EXAMPLES Hereinafter, the present invention will be specifically explained with reference to Examples, but the present invention is not limited only to these Examples.
実施例中、ODAは4.4′−ジアミノジフェニルエー
テル、p−PDAはバラフェニレンジアミン、PMDA
はピロメリット酸二無水物、BAPPは2.2−ビスC
4−(4−アミノフェノキシ)フェニル〕プロパン、D
MBは3,3′−ジメチル−4,4’、ジアミノビフェ
ニル、DMFはジメチルホルムアミドを表す。In the examples, ODA is 4,4'-diaminodiphenyl ether, p-PDA is phenylene diamine, PMDA
is pyromellitic dianhydride, BAPP is 2,2-bisC
4-(4-aminophenoxy)phenyl]propane, D
MB represents 3,3'-dimethyl-4,4', diaminobiphenyl, and DMF represents dimethylformamide.
比較例1
21のセパラブルフラスコに脱水精製したDMF815
gを入れ、ここに0DA49.75 g (0゜248
モル)を投入し均一になるまでfi拌した。Comparative Example 1 Dehydrated and purified DMF815 in 21 separable flasks
g, here 0DA49.75 g (0°248
mol) and stirred until uniform.
次に、ここにPMDAloB、38g (0,497モ
ル)を添加し、2時間反応させた。この間反応系を0℃
の氷水で冷却した。続いて、ここにp−pDA26.8
7 g (0,248モル)を添加し、更に4時間反応
させて、固形分18.5重量%のポリアミド酸溶液を得
た。Next, 38 g (0,497 mol) of PMDAloB was added thereto and reacted for 2 hours. During this time, the reaction system was kept at 0°C.
Cooled with ice water. Next, here is p-pDA26.8
7 g (0,248 mol) was added thereto, and the reaction was further continued for 4 hours to obtain a polyamic acid solution with a solid content of 18.5% by weight.
このポリアミド酸溶液に、脱水剤として無水節″′酸、
触媒としてピリジンを添加した後、ガラス板上に流延塗
布し、約100°Cにて約90秒乾燥した後、ポリアミ
ド酸塗膜をガラス板より剥し、その塗膜を支持枠に固定
した。その後、約110″Cで約90秒、約200℃で
約60秒、約300°Cで約60秒、続いて約400″
Cで約60秒加熱し、脱水閉環、乾燥した後、上記支持
枠より取り外し、約25μmのポリイミドフィルムを得
た。このフィルムの初期弾性率は630 kg/s+w
”であり、吸水率は4.2%であった。Anhydrous acid is added to this polyamic acid solution as a dehydrating agent.
After adding pyridine as a catalyst, it was cast onto a glass plate, dried at about 100°C for about 90 seconds, and then the polyamic acid coating was peeled off from the glass plate and fixed to a support frame. Then about 90 seconds at about 110"C, about 60 seconds at about 200C, about 60 seconds at about 300C, followed by about 400"
After heating at C for about 60 seconds, dehydrating and ring-closing, and drying, the film was removed from the support frame to obtain a polyimide film of about 25 μm. The initial elastic modulus of this film is 630 kg/s+w
”, and the water absorption rate was 4.2%.
比較例2
BAPP120.81g (0,294モル)とPMD
A64.19g (0,294モル)をDMF 815
g中で重合し、18.5重量%のポリアミド酸溶液を得
た。以下、比較例1と同様の操作により約25μmの厚
みを有するポリイミドフィルムを得た。Comparative example 2 BAPP 120.81g (0,294 mol) and PMD
A64.19g (0,294 mol) in DMF 815
The polymer was polymerized in 100 g to obtain a 18.5% by weight polyamic acid solution. Thereafter, a polyimide film having a thickness of about 25 μm was obtained by the same operation as in Comparative Example 1.
このフィルムの初期弾性率は280 kg/■mlであ
り、吸水率は0.5%であった。The initial elastic modulus of this film was 280 kg/ml, and the water absorption rate was 0.5%.
実施N1
比較例1と同様の手順でDMF815gにBAPP71
.72g (0,175モル)、PMDAT6゜21
g (0,35+−ル) 、DMB37.08g (0
,175モル)を順に加えて重合し、18.5重量%の
ポリアミド酸溶液を得た。以下、比較例1と同様の操作
により約25amの厚みを有するポリイミドフィルムを
得た。このフィルムの初期弾性率は660kg/m■2
であり、吸水率は1.3%であった。Implementation N1 Add BAPP71 to 815g of DMF using the same procedure as Comparative Example 1.
.. 72g (0,175 mol), PMDAT6゜21
g (0,35+-le), DMB37.08g (0
, 175 mol) were added in order and polymerized to obtain a 18.5% by weight polyamic acid solution. Thereafter, a polyimide film having a thickness of about 25 am was obtained by the same operation as in Comparative Example 1. The initial elastic modulus of this film is 660 kg/m■2
The water absorption rate was 1.3%.
以上の結果を第1表にまとめて示す。The above results are summarized in Table 1.
第 1 表
〔発明の効果〕
本発明のポリイミドフィルムは弾性率が高く、且つ優れ
た耐水性、耐湿性を備えている。Table 1 [Effects of the Invention] The polyimide film of the present invention has a high elastic modulus and has excellent water resistance and moisture resistance.
Claims (1)
を有するポリイミドフィルム。 ▲数式、化学式、表等があります▼ (Xは水素原子またはフッ素原子、Rは水酸基、メチル
基、メトキシ基、塩素原子またはフッ素原子を表す。) 2、上記一般式(A)および(B)で表される反復単位
の比(A)/(B)が40/60〜60/40の範囲で
ある請求項1記載のポリイミドフィルム。[Claims] 1. A polyimide film having repeating units represented by the following general formulas (A) and (B). ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (X represents a hydrogen atom or a fluorine atom, R represents a hydroxyl group, methyl group, methoxy group, chlorine atom or fluorine atom.) 2. General formulas (A) and (B) above The polyimide film according to claim 1, wherein the ratio (A)/(B) of repeating units represented by is in the range of 40/60 to 60/40.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28754690A JPH04161437A (en) | 1990-10-24 | 1990-10-24 | Polyimide film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28754690A JPH04161437A (en) | 1990-10-24 | 1990-10-24 | Polyimide film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04161437A true JPH04161437A (en) | 1992-06-04 |
Family
ID=17718739
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28754690A Pending JPH04161437A (en) | 1990-10-24 | 1990-10-24 | Polyimide film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04161437A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006011513A1 (en) * | 2004-07-27 | 2006-02-02 | Kaneka Corporation | Polyimide film having high adhesiveness and method for producing same |
| WO2006033324A1 (en) * | 2004-09-24 | 2006-03-30 | Kaneka Corporation | Process for production of polyimide film having high adhesiveness |
| US8158268B2 (en) | 2005-08-04 | 2012-04-17 | Kaneka Corporation | Metal-coated polyimide film |
| JP4969751B2 (en) * | 1999-11-10 | 2012-07-04 | 株式会社ピーアイ技術研究所 | Imido-benzoxazole-based polycondensate and method for producing the same |
| JP2014167132A (en) * | 2014-06-19 | 2014-09-11 | Nippon Steel & Sumikin Chemical Co Ltd | Polyimide film |
-
1990
- 1990-10-24 JP JP28754690A patent/JPH04161437A/en active Pending
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4969751B2 (en) * | 1999-11-10 | 2012-07-04 | 株式会社ピーアイ技術研究所 | Imido-benzoxazole-based polycondensate and method for producing the same |
| JPWO2006011513A1 (en) * | 2004-07-27 | 2008-05-01 | 株式会社カネカ | Polyimide film having high adhesiveness and method for producing the same |
| US7811660B2 (en) | 2004-07-27 | 2010-10-12 | Kaneka Corporation | Polyimide film having high adhesiveness and method for producing same |
| JP2012036401A (en) * | 2004-07-27 | 2012-02-23 | Kaneka Corp | Polyimide film having high adhesiveness and method for producing the same |
| WO2006011513A1 (en) * | 2004-07-27 | 2006-02-02 | Kaneka Corporation | Polyimide film having high adhesiveness and method for producing same |
| JP4996920B2 (en) * | 2004-07-27 | 2012-08-08 | 株式会社カネカ | Polyimide film having high adhesiveness and method for producing the same |
| TWI382040B (en) * | 2004-09-24 | 2013-01-11 | 鐘化股份有限公司 | And a method for producing a polyimide film having high adhesion |
| WO2006033324A1 (en) * | 2004-09-24 | 2006-03-30 | Kaneka Corporation | Process for production of polyimide film having high adhesiveness |
| KR100981852B1 (en) * | 2004-09-24 | 2010-09-13 | 가부시키가이샤 가네카 | Manufacturing method of polyimide film having high adhesiveness |
| US8513373B2 (en) | 2004-09-24 | 2013-08-20 | Kaneka Corporation | Process for production of polyimide film having high adhesiveness |
| US8158268B2 (en) | 2005-08-04 | 2012-04-17 | Kaneka Corporation | Metal-coated polyimide film |
| US8293331B2 (en) | 2005-08-04 | 2012-10-23 | Kaneka Corporation | Metal-coated polyimide film |
| JP2014167132A (en) * | 2014-06-19 | 2014-09-11 | Nippon Steel & Sumikin Chemical Co Ltd | Polyimide film |
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