JPH04160173A - Discoloration preventive liquid for copper - Google Patents
Discoloration preventive liquid for copperInfo
- Publication number
- JPH04160173A JPH04160173A JP28337390A JP28337390A JPH04160173A JP H04160173 A JPH04160173 A JP H04160173A JP 28337390 A JP28337390 A JP 28337390A JP 28337390 A JP28337390 A JP 28337390A JP H04160173 A JPH04160173 A JP H04160173A
- Authority
- JP
- Japan
- Prior art keywords
- copper
- silver
- discoloration
- plating
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
- C23F11/14—Nitrogen-containing compounds
- C23F11/149—Heterocyclic compounds containing nitrogen as hetero atom
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、銅の変色防止液に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a discoloration prevention solution for copper.
最近、リードフレーム等の電子部品材料に銀めっきを施
すとき高速部分めっきを行うことが多い。Recently, high-speed partial plating is often performed when silver plating materials for electronic components such as lead frames.
この高速部分銀めっきは、通常以下の様にして行われる
。This high-speed selective silver plating is usually performed as follows.
先ず、リードフレーム等の電子部品材料に用いられる基
材を脱脂、酸洗後、基材との密着性を良くするため、必
要に応じ銅ストライクめっき又は銅若しくは銅合金めっ
き処理(以下、本明細書では、これらを総称して銅スト
ライクめっき処理等と呼ぶ)が施される。次に、銅スト
ライクめっき処理等が施された基材は、水洗後、基材を
銀めっき液に浸漬した時に銀の置換析出を防止するため
の前処理を行った後、高速電気銀めっきを行う。First, after degreasing and pickling the base material used for electronic component materials such as lead frames, copper strike plating or copper or copper alloy plating treatment (hereinafter referred to in this specification) is performed as necessary to improve adhesion to the base material. In this book, these are collectively referred to as copper strike plating, etc.). Next, the base material that has been subjected to copper strike plating treatment, etc. is washed with water, then pretreated to prevent silver displacement precipitation when the base material is immersed in a silver plating solution, and then subjected to high-speed electrolytic silver plating. conduct.
ところが、この銀めっきにおいて、種々の理由により、
前記基材の銀めっき不要部分にも銀がめっき又は析出す
ることが多い。このような銀の異常析出部を放置してお
くと、銀のマイグレーションが起る可能性があり、電子
部品材料の信頼性が低下する。However, in this silver plating, due to various reasons,
Silver is often plated or deposited on portions of the base material that do not require silver plating. If such abnormal silver precipitation areas are left untreated, silver migration may occur, reducing the reliability of electronic component materials.
従って、通常このような銀の異常析出部は、公知の銀の
剥離液を用いて選択的に溶解除去される。Therefore, such abnormal silver deposits are usually selectively dissolved and removed using a known silver stripping solution.
ところが、この様にして製造されたリードフレーム等の
電子部品材料の運搬、貯蔵等を行っている場合等に銅ス
トライクめっき処理等が施された処理面、特に前記材料
を重ねた部分が変色するという問題点があることが近年
認識される様になって来た。However, when electronic component materials such as lead frames manufactured in this manner are being transported or stored, the treated surfaces that have been subjected to copper strike plating, etc., especially the areas where the materials are overlapped, may become discolored. In recent years, it has come to be recognized that there is a problem.
この変色原因については、現在の所では明確な結論は出
ていないが、変色部には酸化銅が生成していることが確
認されていることから、(1)銀を剥離した直後なので
、銅表面が活性である、(2)銀と銅との間に電位差が
発生し銅表面が活性となる、等の理由により銅面が酸化
されているものと考えられる。There is currently no clear conclusion as to the cause of this discoloration, but it has been confirmed that copper oxide is generated in the discolored area. It is thought that the copper surface is oxidized for reasons such as the surface being active or (2) a potential difference occurring between silver and copper, making the copper surface active.
この銅面の酸化変色は、■はんだ付性が悪くなる、■酸
化された銅がはがれて、短絡の恐れがある、等の理由に
より電子部品材料の信頼性を低下させるため大きな問題
となりつつある。This oxidation discoloration of the copper surface is becoming a major problem as it reduces the reliability of electronic component materials due to the following reasons: - Poor solderability, - Oxidized copper peels off, and there is a risk of short circuits. .
上記問題点を解決するため、本発明者等が各種の添加剤
の変色防圧効果、水濡れ性等について鋭意検討した結果
、特定の添加剤を用いかつこれを無機酸及び/又は有機
酸に溶解させ酸性を呈する処理液に銀剥離後の基材を浸
漬することにより、銅の酸化変色を防止出来ることを見
い出した。In order to solve the above-mentioned problems, the inventors of the present invention have conducted intensive studies on the anti-discoloration effect, water wettability, etc. of various additives. It has been discovered that oxidative discoloration of copper can be prevented by immersing the substrate after silver removal in a treatment solution that dissolves and exhibits acidity.
従って、本発明の目的は、銀めっきされたリードフレー
ム等の電子部品材料の銅の酸化変色を防止し、電子部品
材料の信頼性を高める銅の変色防止液を提供することに
ある。Accordingly, an object of the present invention is to provide a copper discoloration preventing solution that prevents oxidation discoloration of copper in electronic component materials such as silver-plated lead frames and improves the reliability of electronic component materials.
〔発明の構成]
すなわち本発明は、
(1)銅若しくは銅合金又は金属材料に銅若しくは銅合
金をめっきした基材表面に、銀めっきし、該銀めっきの
不要部分に付着した銀を剥離した後、前記銀剥離面の銅
の変色を防止するための処理液において、銅の変色防止
剤としてS−メチル・IH−ベンゾトリアゾール、5,
6−ジメチル・IH−ベンゾトリアゾール及び2−メル
カプトピリミジンから選ばれる1種又は2種以上を含有
し、かつ無機酸及び/又は有機酸を含有していて酸性を
呈することを特徴とする銅の変色防止液。[Structure of the Invention] That is, the present invention provides the following: (1) Silver plating is applied to the surface of copper or a copper alloy or a metal material plated with copper or copper alloy, and the silver adhering to unnecessary parts of the silver plating is peeled off. After that, in the treatment solution for preventing discoloration of copper on the silver peeled surface, S-methyl IH-benzotriazole, 5,
Discoloration of copper characterized by containing one or more selected from 6-dimethyl/IH-benzotriazole and 2-mercaptopyrimidine, and containing an inorganic acid and/or an organic acid to exhibit acidity. Prevention liquid.
(2)銅の変色防止液が、pH緩衝剤を含むことを特徴
とする前記(1)記載の銅の変色防止液。(2) The copper discoloration preventing solution as described in (1) above, wherein the copper discoloration preventing solution contains a pH buffering agent.
を提供する。I will provide a.
次に本発明の理解を容易にするため具体的がっ詳細に説
明する。Next, in order to facilitate understanding of the present invention, the present invention will be specifically explained in detail.
まず、本発明において用いられる基材は、リードフレー
ム等の電子部品材料が主であり、これらは通常銅、銅合
金、鉄、鉄合金、ニッケル、ニッケル合金及びこれらを
めっきしたものなどの銀より卑な金属のいずれかから成
るものである。First, the base materials used in the present invention are mainly electronic component materials such as lead frames, and these are usually made from silver such as copper, copper alloys, iron, iron alloys, nickel, nickel alloys, and those plated with these materials. consisting of any base metal.
これらは通常脱脂、酸洗後、必要に応じ銅ストライクめ
っき処理等が施される。この処理は基材と密着性の良い
銀皮膜を得るために行うものであり、基材が銅、銅合金
及びこれらをめっきしたものでかつめっき密着性が良い
場合には省略することも出来る。These are usually degreased, pickled, and then subjected to copper strike plating treatment, etc., if necessary. This treatment is performed to obtain a silver film that has good adhesion to the base material, and can be omitted if the base material is copper, copper alloy, or a material plated with these and has good plating adhesion.
銅ストライクめっき処理等の条件は当業界で採用されて
いる公知のもので良く、目的に応じ適宜選択すれば良い
。Conditions for the copper strike plating treatment and the like may be those known in the art and may be selected as appropriate depending on the purpose.
なお、本発明において、「銅若しくは銅合金又は金属材
料に銅若しくは銅合金をめっきした基材」とは、銅、銅
合金のみならず銅、銅合金、鉄、鉄合金、ニッケル、ニ
ッケル合金などの銀より卑な金属に銅ストライクめっき
処理等を施したものすべてを包含する。当然のことなが
ら、銅ストライクめっき処理等は、必要に応じ複数回行
っても良い。In the present invention, "copper or copper alloy, or a base material in which a metal material is plated with copper or copper alloy" refers not only to copper and copper alloys, but also to copper, copper alloys, iron, iron alloys, nickel, nickel alloys, etc. This includes all metals baser than silver that have been subjected to copper strike plating, etc. Naturally, the copper strike plating treatment and the like may be performed multiple times as necessary.
次に、前記銅ストライクめっき処理等が施された基材は
、水洗後通常銀めっきの前処理液(銀置換防止液)へ浸
漬される。この理由は、高速銀めっき液は銀濃度が高く
、銀より卑な金属からなる基材を浸漬すると、浸漬した
だけで銀が大量に置換析出し、この置換析出銀層は基材
に対する密着性が極めて悪く、この上に銀を電気めっき
しても密着性は改善されず、従って、めっき皮膜のはが
れ、加熱時のふくれや変色を生ずるなどの結果を呈する
ことになり、要すれば銀めっき層の基材への密着性は極
めて劣悪なもととなる他に、基材のめっき不要部分も銀
で被覆されてしまうため、高価格な銀の損失となり、又
、めっき液が銀との置換反応によっ溶出した銅など卑金
属のイオンにより汚染されてしまう等の問題点があるか
らである。Next, the base material subjected to the copper strike plating treatment, etc. is washed with water and then immersed in a usual silver plating pretreatment solution (silver displacement prevention solution). The reason for this is that the high-speed silver plating solution has a high silver concentration, and when a substrate made of a metal less base than silver is immersed, a large amount of silver is precipitated by displacement, and this displacement-precipitated silver layer has poor adhesion to the substrate. The adhesion is extremely poor, and even if silver is electroplated on top of this, the adhesion will not be improved, resulting in peeling of the plating film, blistering and discoloration when heated, and if necessary, the silver plating will fail. In addition to extremely poor adhesion of the layer to the base material, parts of the base material that do not need to be plated are also coated with silver, resulting in the loss of expensive silver. This is because there are problems such as contamination by ions of base metals such as copper eluted by substitution reactions.
−銀めっきの前処理液は、このような銀の厘換防届剤を
含有しており、基材表面に薄い置換防止皮膜を形成する
ことにより、銀の置換析出を防止するものであり、特に
限定はなく例えば、チオカルボン酸又はその塩(特開昭
60−190589参照)、2.2’−ジピリジル等の
含窒素複素環化合物(特開昭60−190591参照)
及び2−チオバルビッル酸等のチオウレイレン基を環内
に含む化合物(特公平1−32318参照)等、を含む
公知のもので良い。- The pre-treatment solution for silver plating contains such a silver conversion prevention agent and prevents silver displacement precipitation by forming a thin displacement prevention film on the surface of the substrate. There are no limitations, and examples include thiocarboxylic acids or salts thereof (see JP-A-60-190589), nitrogen-containing heterocyclic compounds such as 2,2'-dipyridyl (see JP-A-60-190591)
and compounds containing a thioureylene group in the ring such as 2-thiobarbic acid (see Japanese Patent Publication No. 1-32318).
そして、前処理された基材は銀めっき液へ浸漬され、電
気めっきによりめっきされる。なお、銀めっき液中に前
記置換析出防止剤が添加しである場合は、当然のことな
がら前記前処理を省くことができる。The pretreated base material is then immersed in a silver plating solution and plated by electroplating. Note that if the substitutional precipitation inhibitor is added to the silver plating solution, the pretreatment can naturally be omitted.
銀めっき液は、シアン化銀アルカリの形で含有された銀
の濃度が10〜1oOg/Q、フリーのシアン化合物の
濃度が10g/fi以下である高速銀めっき液である。The silver plating solution is a high-speed silver plating solution in which the concentration of silver contained in the form of alkali silver cyanide is 10 to 1 oOg/Q, and the concentration of free cyanide is 10 g/fi or less.
シアン化銀アルカリとしてはシアン化銀カリウムが最良
であり、又液の電気型、導性を向上させ、pHを7.5
〜9.0の範囲内に緩衝する効果を持つ塩として、リン
酸、ビロリン酸、クエン酸のアルカリ金属塩や硼酸を含
有する。Potassium silver cyanide is the best alkali silver cyanide, and it also improves the electrical type and conductivity of the liquid and lowers the pH to 7.5.
As salts having a buffering effect within the range of ~9.0, alkali metal salts of phosphoric acid, birophosphoric acid, citric acid and boric acid are contained.
以上の様な処理により、基材に銀めっきが施されるが、
種々の理由により、基材の銀めっき不要部分に銀がめっ
き又は析出することが多い。Through the above treatments, silver plating is applied to the base material,
For various reasons, silver is often plated or deposited on parts of the base material that do not require silver plating.
前述のように、このような銀の異常析出部を放置してお
くと、銀のマイグレーションが起る可能性があり、電子
部品材料の信頼性が低下するため、通常このような異常
析出部は公知の銀の剥離液を用いて選択的に溶解除去す
る。As mentioned above, if such abnormal silver precipitation areas are left untreated, silver migration may occur, reducing the reliability of electronic component materials. It is selectively dissolved and removed using a known silver stripping solution.
この銀をgOTJ離した後、基材を本発明の主眼である
銅の変色防止液に浸漬し、銅の変色を防止し、電子部品
材料の信頼性を向上させる。After this silver is released from the gOTJ, the base material is immersed in a copper discoloration preventing solution, which is the main focus of the present invention, to prevent copper discoloration and improve the reliability of electronic component materials.
本発明の銅の変色防止液は前述したとおり、銅の変色防
止剤として、5−メチル弓H−ベンゾトリアゾール、5
,6−ジメチル弓H−ベンゾトリアゾール及び2−メル
カプトピリミジンから選ばれる1種又は2種以上を含有
し、かつ無機酸及び/又は有機酸を含有していて酸性を
呈することを重要な特徴とする。As mentioned above, the copper discoloration preventing liquid of the present invention contains 5-methyl-H-benzotriazole, 5-methyl-benzotriazole,
, 6-dimethyl, H-benzotriazole, and 2-mercaptopyrimidine, and an important characteristic is that it contains an inorganic acid and/or an organic acid and exhibits acidity. .
本発明の銅の変色防止液において、液性を酸性とした理
由は、変色防止剤として5−メチル・IH−ベンゾトリ
アゾール、5,6−ジメチル弓H−ベンゾトリアゾール
及び2−メルカプトピリミジンから選ばれる1種又は2
種以上を選定した場合に理由は不明であるが、アルカリ
性にすると銅の変色防止効果が半減し、実用上使用出来
ないがらである。In the copper discoloration preventing liquid of the present invention, the reason why the liquid is acidic is that the discoloration preventing agent is selected from 5-methyl IH-benzotriazole, 5,6-dimethyl H-benzotriazole, and 2-mercaptopyrimidine. Type 1 or 2
Although the reason is unknown when more than 100% of copper is selected, if it is made alkaline, the discoloration prevention effect of copper is halved, making it practically unusable.
従って本発明でいう酸性とは、pH7以下の領域を意味
し、好ましいpHは1〜6、更に好ましくは3〜5であ
る。pHを1未満にすると銅ストライクめっき処理等が
施された処理面が浸食される恐れがあるので好ましくな
い。Therefore, acidic in the present invention means a pH range of 7 or less, preferably pH 1-6, more preferably 3-5. If the pH is less than 1, the treated surface subjected to copper strike plating or the like may be eroded, which is not preferable.
変色防止液のpHを酸性とする酸としては、無機酸、有
機酸のいずれでも良く、又これらを混合して使用しても
良い。The acid that makes the pH of the anti-discoloration liquid acidic may be either an inorganic acid or an organic acid, or a mixture of these may be used.
無機酸としては、硫酸、硝酸、塩酸、燐酸等が例示され
、有機酸としては、クエン酸、スルファミン酸、酢酸、
酒石酸等が例示されるが、特にこれらに限定されるもの
ではない。Examples of inorganic acids include sulfuric acid, nitric acid, hydrochloric acid, phosphoric acid, etc., and examples of organic acids include citric acid, sulfamic acid, acetic acid,
Examples include tartaric acid, but are not particularly limited to these.
ただし、基材及びめっき表面への影響を考慮に入れると
燐酸又はクエン酸が特に好ましい。However, phosphoric acid or citric acid is particularly preferred, taking into consideration the effect on the base material and the plating surface.
一方、変色防止剤の添加量は、酸に対する溶解度以下で
あれば特に限定されることはないが、液の持ち出しを考
えるとあまり高濃度にすることは経済的ではない。従っ
て、添加量は変色防止効果から一般的に5〜200■/
Q程度で十分と考えられるが、場合によっては1〜Lo
g/Q程度添加しても良く、処理条件を考慮に入れ適宜
選択すれば良い。On the other hand, the amount of the discoloration inhibitor added is not particularly limited as long as it is less than the solubility in the acid, but it is not economical to increase the concentration too high considering the possibility of liquid being taken out. Therefore, the amount added is generally 5 to 200 μ/cm due to the discoloration prevention effect.
Q level is considered to be sufficient, but in some cases 1~Lo
It may be added in an amount of approximately g/Q, and may be selected appropriately taking into consideration the processing conditions.
又、このような変色防止液を長期に連続して使用する場
合には、使用中のpHの変動を極力少なくするため、公
知のpH緩衝剤を添加しておくことが好ましい。In addition, when such a discoloration prevention liquid is used continuously for a long period of time, it is preferable to add a known pH buffering agent in order to minimize pH fluctuations during use.
本発明の銅の変色防止液は、基材表面に変色防止剤成分
をごく微量吸着させ、その働きにより銅の変色を防止す
るものであるため、その使用方法としては前記銀剥離処
理を施した基材を水洗後、好ましくは直ちに2乃至30
秒浸漬するのみで良い。The copper discoloration prevention liquid of the present invention adsorbs a very small amount of the discoloration inhibitor component on the surface of the base material and prevents discoloration of copper by its action. After washing the base material with water, preferably immediately
All you need to do is soak it for a second.
以下、本発明を実施例により具体的に説明する。Hereinafter, the present invention will be specifically explained with reference to Examples.
〔実施例]
銅ストライクめっきを施した25mmX40mmXO9
2mm’の銅合金基材を純水で水洗後、置換防止剤であ
る2−チオバルビッル酸100■/Qを含みpH=10
の前処理液に液温30℃で10秒間浸漬し、純水流水で
10秒間洗浄してから、KAg(CN)、 : 130
g/ff、 K、HPO4: 100g/Qを含み、p
Hを 8.5 に調整された高速銀めっき液に浸漬し、
Dk=70A/dm”で10秒間銀めっきを行った。[Example] 25mmX40mmXO9 with copper strike plating
After washing a 2 mm' copper alloy base material with pure water, it was washed with 100 μ/Q of 2-thiobarbic acid, which is a substitution inhibitor, and the pH was 10.
KAg(CN), : 130
g/ff, K, HPO4: Contains 100g/Q, p
Immerse it in a high-speed silver plating solution whose H is adjusted to 8.5,
Silver plating was performed for 10 seconds at Dk=70A/dm''.
そして、純水で水洗後生央部(7mmX6mm)を除い
て公知の銀剥離液を用いて溶解除去し、純水で水洗後、
各種の添加剤を100■/Q含みpHの異なる変色防止
液に10秒間浸漬した。Then, after washing with pure water, remove the central part (7 mm x 6 mm) and dissolve it using a known silver stripping solution, and after washing with pure water,
Various additives were immersed for 10 seconds in anti-discoloration liquids containing 100 μ/Q and having different pHs.
二のような処理を行った基材を沸騰純水中に5分間浸漬
熱処理し、銅ストライクめっき部(銀剥離部)の変色を
目視により判定した(このような熱処理は、大気中に放
置した場合の加速試験として通常行われている)。なお
、pH調整剤としては、KOH及び燐酸を用いた。The base material treated as described in 2 was heat treated by immersing it in boiling pure water for 5 minutes, and the discoloration of the copper strike plating area (silver peeled area) was visually determined. (This is usually done as an accelerated test in cases where the Note that KOH and phosphoric acid were used as pH adjusters.
その結果を第1表に示す。The results are shown in Table 1.
以下余白 第1表 組:変色防止効果 O:効果有り(無変色)。Margin below Table 1 Group: Discoloration prevention effect O: Effective (no discoloration).
△:やや効果有り(一部変色)。△: Slightly effective (partially discolored).
×:効果なしくほぼ全面変色)。×: Almost entire surface discolored without any effect).
第1表から明らかなように、5−メチル・IH−ベンゾ
トリアゾール、5,6−ジメチル弓H−ベンゾトリアゾ
ール及び2−メルカプトピリミジンを変色防止剤として
用い、かつ酸性(pH=4)の場合にのみ、銅の変色防
止効果があることが判る。As is clear from Table 1, when 5-methyl IH-benzotriazole, 5,6-dimethyl-H-benzotriazole and 2-mercaptopyrimidine are used as discoloration inhibitors and in acidic (pH = 4) It can be seen that only copper has an effect of preventing discoloration of copper.
〔発明の効果]
以上説明したように、本発明に係る銅の変色防止液は、
銀より卑な金属、例えば銅、銅合金、ニッケル、ニッケ
ル合金及びこれらをめっきしたものなどからなる基材に
対し高速銀めっきを施し、銀めっき不要部分に付着した
銀を剥離剤で溶解除去した後に該基材を浸漬することに
より、銅の変色を防止することが出来る。[Effect of the invention] As explained above, the copper discoloration prevention liquid according to the present invention has the following effects:
High-speed silver plating is applied to base materials made of metals less base than silver, such as copper, copper alloys, nickel, nickel alloys, and those plated with these materials, and silver adhering to areas that do not require silver plating is dissolved and removed using a stripping agent. By dipping the base material afterwards, discoloration of the copper can be prevented.
従って、本発明の銅の変色防止液は、高速銀めっきを施
すリードフレーム等の電子部品材料を製造する際に、電
子部品材料の信頼性を向上させることが出来るため、有
効に使用される利点がある。Therefore, the copper discoloration prevention liquid of the present invention has the advantage of being effectively used when manufacturing electronic component materials such as lead frames that undergo high-speed silver plating, since it can improve the reliability of electronic component materials. There is.
Claims (2)
金をめっきした基材表面に、銀めっきし、該銀めっきの
不要部分に付着した銀を剥離した後、前記銀剥離面の銅
の変色を防止するための処理液において、銅の変色防止
剤として5−メチル・IH−ベンゾトリアゾール、5,
6−ジメチル・IH−ベンゾトリアゾール及び2−メル
カプトピリミジンから選ばれる1種又は2種以上を含有
し、かつ無機酸及び/又は有機酸を含有していて酸性を
呈することを特徴とする銅の変色防止液。(1) Silver plating is applied to the surface of copper or copper alloy or a metal material plated with copper or copper alloy, and after removing the silver adhering to unnecessary parts of the silver plating, discoloration of the copper on the surface from which the silver has been removed In the treatment solution for preventing copper discoloration, 5-methyl IH-benzotriazole, 5,
Discoloration of copper characterized by containing one or more selected from 6-dimethyl/IH-benzotriazole and 2-mercaptopyrimidine, and containing an inorganic acid and/or an organic acid to exhibit acidity. Prevention liquid.
とする特許請求の範囲第1項記載の銅の変色防止液。(2) The copper discoloration preventing solution according to claim 1, wherein the copper discoloration preventing solution contains a pH buffering agent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2283373A JP2550436B2 (en) | 1990-10-23 | 1990-10-23 | Anti-tarnish solution for copper |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2283373A JP2550436B2 (en) | 1990-10-23 | 1990-10-23 | Anti-tarnish solution for copper |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04160173A true JPH04160173A (en) | 1992-06-03 |
| JP2550436B2 JP2550436B2 (en) | 1996-11-06 |
Family
ID=17664664
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2283373A Expired - Lifetime JP2550436B2 (en) | 1990-10-23 | 1990-10-23 | Anti-tarnish solution for copper |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2550436B2 (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000061836A1 (en) * | 1999-04-12 | 2000-10-19 | Betzdearborn Inc. | Halogen resistant corrosion inhibitors |
| JP2005105332A (en) * | 2003-09-30 | 2005-04-21 | Nikko Materials Co Ltd | Metal surface treating agent |
| WO2006121516A1 (en) * | 2005-05-06 | 2006-11-16 | Valspar Sourcing, Inc. | Method for improving corrosion resistance of metal surfaces |
| US7393395B2 (en) | 2004-02-05 | 2008-07-01 | Nippon Mining & Metals Co., Ltd. | Surface-treating agent for metal |
| CN100400709C (en) * | 2004-03-25 | 2008-07-09 | 中国印钞造币总公司 | Copper alloy coin blank cake anti-tarnish process and its anti-tarnish preparation |
| JP5995305B2 (en) * | 2010-01-19 | 2016-09-21 | Jx金属株式会社 | Metal surface treatment agent |
| WO2018023048A1 (en) * | 2016-07-29 | 2018-02-01 | Ecolab Usa Inc. | Benzotriazole and tolyltriazole derivatives for corrosion mitigation |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02104699A (en) * | 1988-10-11 | 1990-04-17 | C Uyemura & Co Ltd | Electrolytic peeling agent for silver and electrolytically peeling method |
-
1990
- 1990-10-23 JP JP2283373A patent/JP2550436B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02104699A (en) * | 1988-10-11 | 1990-04-17 | C Uyemura & Co Ltd | Electrolytic peeling agent for silver and electrolytically peeling method |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000061836A1 (en) * | 1999-04-12 | 2000-10-19 | Betzdearborn Inc. | Halogen resistant corrosion inhibitors |
| AU769757B2 (en) * | 1999-04-12 | 2004-02-05 | Betzdearborn Inc. | Halogen resistant corrosion inhibitors |
| JP2005105332A (en) * | 2003-09-30 | 2005-04-21 | Nikko Materials Co Ltd | Metal surface treating agent |
| US7393395B2 (en) | 2004-02-05 | 2008-07-01 | Nippon Mining & Metals Co., Ltd. | Surface-treating agent for metal |
| CN100400709C (en) * | 2004-03-25 | 2008-07-09 | 中国印钞造币总公司 | Copper alloy coin blank cake anti-tarnish process and its anti-tarnish preparation |
| WO2006121516A1 (en) * | 2005-05-06 | 2006-11-16 | Valspar Sourcing, Inc. | Method for improving corrosion resistance of metal surfaces |
| US10767268B2 (en) | 2005-05-06 | 2020-09-08 | Swimc Llc | Articles having improved corrosion resistance |
| JP5995305B2 (en) * | 2010-01-19 | 2016-09-21 | Jx金属株式会社 | Metal surface treatment agent |
| WO2018023048A1 (en) * | 2016-07-29 | 2018-02-01 | Ecolab Usa Inc. | Benzotriazole and tolyltriazole derivatives for corrosion mitigation |
| CN109642331A (en) * | 2016-07-29 | 2019-04-16 | 艺康美国股份有限公司 | For alleviating the benzotriazole and tolytriazole derivative of corrosion |
| US10640473B2 (en) | 2016-07-29 | 2020-05-05 | Ecolab Usa Inc. | Azole derivatives for corrosion mitigation |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2550436B2 (en) | 1996-11-06 |
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