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JPH04139094A - Method for growing magneto-optical garnet crystal - Google Patents

Method for growing magneto-optical garnet crystal

Info

Publication number
JPH04139094A
JPH04139094A JP25970090A JP25970090A JPH04139094A JP H04139094 A JPH04139094 A JP H04139094A JP 25970090 A JP25970090 A JP 25970090A JP 25970090 A JP25970090 A JP 25970090A JP H04139094 A JPH04139094 A JP H04139094A
Authority
JP
Japan
Prior art keywords
film
magneto
growing
garnet
furnace
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25970090A
Other languages
Japanese (ja)
Inventor
Hisao Kurosawa
黒沢 久夫
Masazumi Sato
佐藤 正純
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Priority to JP25970090A priority Critical patent/JPH04139094A/en
Publication of JPH04139094A publication Critical patent/JPH04139094A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/24Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates from liquids
    • H01F41/28Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates from liquids by liquid phase epitaxy

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To reduce film defects with Pt as nuclei by introducing an inert gas such as Ar, He, N2 or CO2 into a furnace for growing a Bi substd. garnet film. CONSTITUTION:An inert gas such as Ar, He, Ne or CO2 is allowed to flow in a growth furnace at a prescribed flow rate and a Pt crucible filled with a prescribed amt. of molten starting material is set in the furnace. A Bi substd. garnet film is grown on a substrate of Ga-Mg-Zr substd. Gd3Ga5O12, etc., by a liq. phase epitaxial growth method at a prescribed growth temp. and a magneto-optical garnet crystal having a low Pt content is obtd.

Description

【発明の詳細な説明】 [産業上の利用分野コ 本発明は、ファラデー効果を利用した光アイソレータ、
光サーキュレータ、光スィッチなどの磁気光学素子に用
いられるビスマス(Bi)置換磁性ガーネット結晶の製
造方法に関するものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an optical isolator using the Faraday effect;
The present invention relates to a method for manufacturing a bismuth (Bi) substituted magnetic garnet crystal used in magneto-optical elements such as optical circulators and optical switches.

[従来の技術] 半導体レーザ(LD)を光源とする光伝送回路において
、コネクタやスイッチなどの光学部品、受光素子等から
の反射戻り光がLDに入ると、レーザ発振が不安定とな
り伝送品質が劣化することが知られている。この対策と
してLDへの反射戻り光を遮断する光アイソレータが提
案され、現在実用化が進んでいる。
[Prior Art] In an optical transmission circuit that uses a semiconductor laser (LD) as a light source, if reflected return light from optical components such as connectors and switches, or light receiving elements enters the LD, laser oscillation becomes unstable and transmission quality deteriorates. known to deteriorate. As a countermeasure to this problem, an optical isolator that blocks reflected light returning to the LD has been proposed, and is currently being put into practical use.

光アイソレータは、磁気光学効果のうちで透過光の直線
偏光面回転現象であるファラデー効果のもつ非相反性を
うまく利用したものである。
Optical isolators make good use of the non-reciprocity of the Faraday effect, which is a magneto-optical effect that rotates the plane of linear polarization of transmitted light.

ファラデー効果を示し、波長1.3〜1゜55μmの近
赤外領域で用いられるファラデー回転子材料は、磁気光
学ガーネット結晶である。その中で、光アイソレータの
ファラデー回転子としてイツトリウム・鉄・ガーネット
(YIG)結晶が最初に使用された。
A Faraday rotator material that exhibits the Faraday effect and is used in the near-infrared region with a wavelength of 1.3 to 1.55 μm is a magneto-optic garnet crystal. Among these, yttrium-iron-garnet (YIG) crystals were first used as Faraday rotators in optical isolators.

近年、光アイソレータの小型化、ならびに低価格化が急
速に進展し、これに伴い素子の小型化、および製作コス
トの低減化が切望されている。
In recent years, the miniaturization and cost reduction of optical isolators have rapidly progressed, and along with this, there has been a strong desire for miniaturization of elements and reduction in manufacturing costs.

光アイソレータの小型化のためには、主要部品であるフ
ァラデー回転子の小型化が必須の条件である。
In order to downsize optical isolators, it is essential to downsize the Faraday rotator, which is the main component.

ところで、ファラデー回転子として用いる場合は、入射
偏光面を45度回転させるだけの長さが必要であるが、
この長さはファラデー回転係数の大・小に比例する。し
たがって、ファラデー回転子をより小型化するためには
、ファラデー回転係数の大きな材料を選択する必要があ
る。
By the way, when used as a Faraday rotator, it needs to be long enough to rotate the incident polarization plane by 45 degrees.
This length is proportional to the magnitude of the Faraday rotation coefficient. Therefore, in order to further downsize the Faraday rotator, it is necessary to select a material with a large Faraday rotation coefficient.

ファラデー回転係数の大きな材料として、Biを固溶し
たガーネットが一般に知られている。
Garnet containing Bi as a solid solution is generally known as a material with a large Faraday rotation coefficient.

本材料は、CVD法、スパッタ法、フラックス法および
液相エピタキシャル(LPE)法等によって製造可能で
ある。しかし、CVD法およびスパッタ法は主に結晶性
に問題があり、まだ実用化が難しい。
This material can be manufactured by a CVD method, a sputtering method, a flux method, a liquid phase epitaxial (LPE) method, or the like. However, the CVD method and the sputtering method mainly have problems with crystallinity, and it is still difficult to put them into practical use.

フラックス法は、ガーネット成分の酸化イツトリウム(
Y2O2)および酸化鉄(Fe203)と共に、フラッ
クス成分の酸化鉛(p b o)や酸化はう素(B20
3)を融解し、融液を液相温度以上に保持して均一にし
た後、融液を徐冷することによりガーネット結晶を自然
核発生により成長させる。水洗では、ガーネット成分の
偏析のため濃度バラツキが生じ易い、フラックスの固化
に伴い結晶にクラックが入り易い、等の欠点が見られた
が、改良されたフラックス法により改善された。
The flux method uses yttrium oxide (
Along with iron oxide (Fe203) and iron oxide (Y2O2), lead oxide (p b o) and boron oxide (B20
3) is melted, the melt is maintained at a temperature higher than the liquidus temperature to make it uniform, and then the melt is slowly cooled to grow garnet crystals by natural nucleation. Washing with water had some disadvantages, such as concentration variations due to the segregation of garnet components, and cracks in the crystals as the flux solidified, but these problems were resolved by the improved flux method.

しかし、自然核を成長させるため結晶育成に長時間を要
する、素子化には精密加工を要する、等量産性に乏しい
However, since natural nuclei are grown, crystal growth requires a long time, precision processing is required to form devices, and mass productivity is poor.

このような状況から、磁気バブル素子用ガーネット薄膜
の育成方法として開発されたLPE法が注目され、水洗
を用いてBi置換磁性ガーネット厚膜の開発が種々検討
されている。
Under these circumstances, the LPE method, which was developed as a method for growing garnet thin films for magnetic bubble devices, has attracted attention, and various studies have been made to develop Bi-substituted magnetic garnet thick films using water washing.

さて、Th1n 5olid Films、114(1
984)69に示されているように、ファラデー回転係
数はBi置換量に比例して増加する。しかし、ガーネッ
ト結晶に対するBiの固溶度が極めて小さいことから、
置換が非常に難しいことも知られている。
Well, Th1n 5olid Films, 114 (1
As shown in 984)69, the Faraday rotation coefficient increases in proportion to the amount of Bi substitution. However, since the solid solubility of Bi in garnet crystals is extremely small,
It is also known that replacement is very difficult.

Biを多量に置換するためには、(イ)最適成分系の探
索、(ロ)LPE条件の最適化、および(ハ)融液組成
の最適化、等が提案されているが、Jounal of
 Crystal Growth 71(1985)4
09およびPhys、5tat、Sol、 (a) 1
00 (1987)213、等に示されているように、
上記(ロ)および(ハ)の方法が特に効果的である。
In order to replace a large amount of Bi, (a) searching for an optimal component system, (b) optimizing the LPE conditions, and (c) optimizing the melt composition, etc. have been proposed;
Crystal Growth 71 (1985) 4
09 and Phys, 5tat, Sol, (a) 1
00 (1987) 213, etc.
The methods (b) and (c) above are particularly effective.

(ロ)では、主に過冷却度(ΔT:飽和温度−膜成長温
度)の増大および膜成長温度(TG)の低温化が知られ
ており、一方(ハ)の中では、融液中のBiイオンの濃
度を高めるためにBi、O,量を増加させることが重要
である。
In (b), it is mainly known that the degree of supercooling (ΔT: saturation temperature - film growth temperature) increases and the film growth temperature (TG) decreases, while in (c), the It is important to increase the amount of Bi and O in order to increase the concentration of Bi ions.

ところで、ガーネット膜育成用融液の出発原料は、全て
酸化物であること、またBi2O3およびPb0を多量
に充填すること、またこれらを混合した原料を1100
〜1300℃の高温に加熱すること、等の理由からLP
Eガーネット結晶育成用ルツボ材質は、耐酸化性ならび
に耐腐食性に優れた純白金(Pt)、あるいはPt主体
の合金が用いられている。
By the way, the starting materials for the melt for garnet film growth are all oxides, a large amount of Bi2O3 and Pb0 are filled, and the raw material mixed with these is 1100%
Due to reasons such as heating to a high temperature of ~1300℃, LP
The material of the crucible for growing E-garnet crystals is pure platinum (Pt), which has excellent oxidation resistance and corrosion resistance, or a Pt-based alloy.

しかしながら、上記Pt材を用いても酸化あるいは腐食
等が徐々に進行し、融液中にPtが溶は出すことが大き
な問題点であり、これがLPE法の一つの弱点でもある
However, even if the above-mentioned Pt material is used, oxidation or corrosion gradually progresses, and Pt is dissolved into the melt, which is a major problem, and this is one of the weaknesses of the LPE method.

[発明が解決しようとする問題点コ 融液中に溶は出したPtは、(イ)Pt2+あるいはP
t4+イオンとなり膜中に混入し、膜中の価数バランス
を崩す。価数バランスの゛°ズレ゛は、日本応用磁気学
会誌Vo1.10.No。
[Problems to be solved by the invention] The Pt dissolved in the melt is (a) Pt2+ or P
It becomes t4+ ion and mixes into the membrane, disrupting the valence balance in the membrane. The deviation in valence balance is described in the Journal of the Japanese Society of Applied Magnetics Vol. 1.10. No.

2 (1986) P2S5にも示されているように、
光吸収の増大につながることが知られている。
2 (1986) As also shown in P2S5,
It is known to lead to increased light absorption.

また、(ロ)膜中に取り込まれずに融液中に浮遊してい
るPtの一部は、J、Magn、Soc、Jpn、 V
ol、ll、5I(1987) P347から知れるよ
うに膜欠陥の一因となり、この欠陥部は、日本応用磁気
学会誌Vo1.10 No、2 (1986) P14
7に述べられているように光学特性が劣化する。
(b) Some of the Pt floating in the melt without being incorporated into the film is J, Magn, Soc, Jpn, V
As is known from ol, ll, 5I (1987) P347, this contributes to film defects, and this defective portion is
7, the optical characteristics deteriorate.

したがって、Ptルツボの溶融は極めて重大な問題であ
る。
Therefore, melting of Pt crucibles is a very serious problem.

[問題点を解決するための手段] 本発明は、上記問題点を解決するために、Bi置換ガー
ネット膜を液相エピタキシャル(LPE)法で育成する
際、育成炉内に不活性ガスのAr、He5N、およびC
O,ガス等を導入することを特徴とする磁気光学ガーネ
ット結晶の育成方法を提供するものである。
[Means for Solving the Problems] In order to solve the above problems, the present invention provides an inert gas of Ar, He5N, and C
The present invention provides a method for growing magneto-optic garnet crystals, which is characterized by introducing O, gas, etc.

即ち、本発明はビスマス置換ガーネット膜を液相エピタ
キシャル(LPE)法で育成する際、育成炉内に不活性
ガスを導入することを特徴とする磁気光学ガーネット結
晶の育成方法である。
That is, the present invention is a method for growing a magneto-optic garnet crystal, which is characterized by introducing an inert gas into a growth furnace when growing a bismuth-substituted garnet film by the liquid phase epitaxial (LPE) method.

本発明において不活性ガスは、特にAr。In the present invention, the inert gas is particularly Ar.

He、N、およびCO2ガス等が用いられる。He, N, CO2 gas, etc. are used.

本発明者は、ルツボ溶融の原因を鋭意研究した結果、融
液中の価数バランスに強く依存していることを突き止め
本発明に至ったものである。
As a result of intensive research into the cause of crucible melting, the present inventor found that it strongly depends on the valence balance in the melt, leading to the present invention.

Ptは、既述のようにPt2+イオンまたはPt4+イ
オン(あるいは両方)が存在することが知られている。
As mentioned above, it is known that Pt2+ ions or Pt4+ ions (or both) exist in Pt.

本発明者等は、まずPt2+およびPt4+のどちらが
膜中において支配的であるかを確認するために、2価元
素のCa2+、ならびに4価元素のSi4+を各々添加
し、その時の膜中のPt含有量の挙動を観察した。
In order to confirm which of Pt2+ and Pt4+ is predominant in the film, the present inventors first added Ca2+, a divalent element, and Si4+, a tetravalent element, and the Pt content in the film at that time. The behavior of the amount was observed.

表1にその結果を示す。Table 1 shows the results.

表1 ptの膜中含有量と添加元素の関係 EPMA分析値(wt%) 無添加の場合の膜中のPt含有量は、 0.7 6(wt%)であるが、Ca2+を添加すると1.88
(wt%)まで増加する。一方、Si4+を添加した場
合は、  0.43(wt%)に減少することが分かっ
た。なおいずれも大気中にてLPEを実施し、育成膜厚
は4〜6μmであった。この結果から膜中におけるPt
の原子価は、Pt4+が支配的であることが示唆された
。膜中にPt4+が多く取り込まれることは、融液中に
おいてもPt4+が支配的であることが容易に推定でき
る。
Table 1 Relationship between Pt content in the film and added elements EPMA analysis value (wt%) The Pt content in the film without additives is 0.76 (wt%), but when Ca2+ is added, it increases to 1 .88
(wt%). On the other hand, it was found that when Si4+ was added, it decreased to 0.43 (wt%). In each case, LPE was performed in the air, and the grown film thickness was 4 to 6 μm. From this result, Pt in the film
It was suggested that the valence of Pt4+ is dominant. If a large amount of Pt4+ is incorporated into the film, it can be easily inferred that Pt4+ is dominant in the melt as well.

さて、融液の構成原料は、既述のフラックス法の原料と
同様に全て酸化物であるため、その原料の原子結合の種
類はイオン結合が多いとされている。したがって、Pt
4+イオンが融液中に溶は出すためには、Pt4+とイ
オン結合を形成するイオンが必要となるが、そのイオン
は02−が最も可能性が高くその結合状態はp t o
、と考えられる。
Now, since the raw materials constituting the melt are all oxides like the raw materials for the flux method described above, it is said that the type of atomic bonds in the raw materials are mostly ionic bonds. Therefore, Pt
In order for the 4+ ion to dissolve into the melt, an ion that forms an ionic bond with Pt4+ is required, but that ion is most likely to be 02-, and its bond state is p to
,it is conceivable that.

この02は融液中にも存在するが、融液中の0.はFe
2O3、あるいはBi、O,等の結合状態から分かるよ
うに全て種々のイオンとイオン結合しており、Ptと結
合する余分な02は存在しないと考えられる。したがっ
て。
This 02 also exists in the melt, but the 0. is Fe
As can be seen from the bonding states of 2O3, Bi, O, etc., all of them are ionically bonded to various ions, and it is thought that there is no extra 02 bonded to Pt. therefore.

上記02は融液外の大気中から供給される確率が高い。There is a high probability that the above 02 is supplied from the atmosphere outside the melt.

以上のことから、Pt4+イオンの溶は出しを防止する
ためには、融液外の02−イオンを除去すればよいこと
が分かる。
From the above, it can be seen that in order to prevent the dissolution of Pt4+ ions, it is sufficient to remove the 02- ions outside the melt.

本発明においては、0□−イオンを除去するために育成
炉内に不活性ガスのAr、He、N2、およびCO2ガ
ス等を導入することを特徴としている。
The present invention is characterized in that inert gases such as Ar, He, N2, and CO2 gases are introduced into the growth furnace to remove 0□-ions.

以下に、実施例を用いて本発明の詳細な説明する。The present invention will be explained in detail below using Examples.

[実施例] 〈実施例1〉 育成炉内にArガスを約300CC/分流入し、 Ca
−Mg−Zr置換Ga3Ga5012基板上に成長温度
745℃で約5μmのLPEガーネット膜を成長させ、
膜中のpt含有量をEPMAを用いて分析した結果、表
2の実施例1に示すように0.16(wt%)であった
[Example] <Example 1> Ar gas was flowed into the growth furnace at a rate of about 300 CC/min, and Ca
- Grow an LPE garnet film of about 5 μm on a Mg-Zr substituted Ga3Ga5012 substrate at a growth temperature of 745°C,
The pt content in the film was analyzed using EPMA, and as shown in Example 1 in Table 2, it was 0.16 (wt%).

なお、天気中で同様に育成した膜中のPt含有量は、表
2の比較例に示すように0.81(wt%)であった。
Note that the Pt content in the film grown in the same manner in the weather was 0.81 (wt%) as shown in the comparative example in Table 2.

(以下余白) 表2 〈実施例2〉 育成炉内にHeガスを約500CC/分流入し、 Ca
−Mg−Zr置換G d3G a5012基板上に成長
温度746℃で約6μmのLPEガーネット膜を成長さ
せ、膜中のPt含有量をEPMAを用いて分析した結果
、表2の実施例2に示すように0.20(wt%)であ
った。
(Leaving space below) Table 2 <Example 2> Approximately 500 CC/min of He gas was flowed into the growth furnace, and Ca
An LPE garnet film of approximately 6 μm was grown on a -Mg-Zr substituted G d3G a5012 substrate at a growth temperature of 746°C, and the Pt content in the film was analyzed using EPMA, as shown in Example 2 in Table 2. It was 0.20 (wt%).

〈実施例3〉 育成炉内にN2ガスを約300CC/分流入し、Ca 
−M g −Z r置換Gd3Ga5O12基板上に成
長温度750℃で約4μmのLPEガーネット膜を成長
させ、膜中のPt含有量をEPMAを用いて分析した結
果、表2の実施例3に示すように0.41(wt%)で
あった。
<Example 3> Approximately 300 CC/min of N2 gas was flowed into the growth furnace, and Ca
An LPE garnet film of about 4 μm was grown on a -M g -Z r-substituted Gd3Ga5O12 substrate at a growth temperature of 750°C, and the Pt content in the film was analyzed using EPMA, as shown in Example 3 in Table 2. It was 0.41 (wt%).

〈実施例4〉 育成炉内にCO2ガスを約300CC,7分流入し、C
a −M g −Z r置換Gd3Ga5O12基板上
に成長温度747℃で約7μmのLPEガーネット膜を
成長させ、膜中のPt含有量をEPMAを用いて分析し
た結果、表2の実施例4に示すように0.31(wt%
)であった。
<Example 4> About 300 CC of CO2 gas was introduced into the growth furnace for 7 minutes, and the CO2 gas was
An LPE garnet film of about 7 μm was grown on a -M g -Z r-substituted Gd3Ga5O12 substrate at a growth temperature of 747°C, and the Pt content in the film was analyzed using EPMA. The results are shown in Example 4 in Table 2. 0.31 (wt%
)Met.

〈実施例5〉 融液中に浮遊しているPtの粒子を核として発生する膜
欠陥と、炉内の酸素濃度の相関を検討した結果、第1図
に示すように酸素濃度の増加に伴いほぼ対数的に膜欠陥
が増大した。
<Example 5> As a result of examining the correlation between film defects generated with Pt particles floating in the melt as nuclei and the oxygen concentration in the furnace, as shown in Figure 1, as the oxygen concentration increases, The membrane defects increased almost logarithmically.

〈実施例6〉 約300CC/分のArガスを流入した炉内に、約50
0gの融液を充填した100ccのPtルツボを設置し
、成長温度740℃で約30時間LPELだ後、LPE
前後のルツボの重量差を測定した結果、約0.9gの減
少であった。
<Example 6> Approximately 50 cc/min of Ar gas was introduced into the furnace.
A 100cc Pt crucible filled with 0g of melt was installed, and after LPEL at a growth temperature of 740°C for about 30 hours, LPE
As a result of measuring the weight difference between the front and rear crucibles, it was found that there was a decrease of about 0.9 g.

なお、大気中で同様な条件でLPEL、ルツボの重量差
を測定した結果、約3.1gの減少であった。
In addition, as a result of measuring the weight difference between the LPEL and the crucible under similar conditions in the atmosphere, it was found that the weight was reduced by about 3.1 g.

〈実施例7〉 約5000gの融液を充填したPtルツボを、約10K
g/cm2のArガスで密封した炉内に設置し成長温度
743℃で約50時間LPEした後、LPE前後のルツ
ボの重量差を測定した結果、約 0.5gの減少であっ
た。
<Example 7> A Pt crucible filled with about 5000 g of melt was heated to about 10K.
After LPE was performed for about 50 hours at a growth temperature of 743° C. in a furnace sealed with Ar gas of g/cm 2 , the weight difference of the crucible before and after LPE was measured, and the result was a decrease of about 0.5 g.

なお、大気中で同様な条件でLPEし、ルツボの重量差
を測定した結果、約10.3 gの減少であった。
In addition, as a result of performing LPE in the air under similar conditions and measuring the difference in weight of the crucible, it was found that the weight decreased by about 10.3 g.

[発明の効果] 本発明により、Ptルツボの溶融が顕著に抑制されるた
め、膜中へのPt混入が減少するため光吸収が低減する
。融液中の浮遊Ptが減少するためptを核とした膜欠
陥が低減する。またルツボ寿命が伸張する等磁気光学特
性の向上、素子歩留りの向上、更に原価低減に大きく寄
与することから実用的価値は極めて大きい。
[Effects of the Invention] According to the present invention, since the melting of the Pt crucible is significantly suppressed, the amount of Pt mixed into the film is reduced, and light absorption is reduced. Since floating Pt in the melt decreases, film defects centered on Pt are reduced. Furthermore, it has extremely great practical value because it greatly contributes to improving magneto-optical properties such as extending the life of the crucible, improving device yield, and further reducing cost.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、酸素濃度を変化させた場合の膜欠陥の変化を
示した図である。 ゛・−ノ
FIG. 1 is a diagram showing changes in film defects when the oxygen concentration is changed.゛・-ノ

Claims (5)

【特許請求の範囲】[Claims] (1)ビスマス置換ガーネット膜を育成炉内で液相エピ
タキシャル法によって育成する磁気光学ガーネット結晶
の育成方法において、前記育成炉内に不活性ガスを導入
することを特徴とする磁気光学ガーネット結晶の育成方
法。
(1) A method for growing a magneto-optic garnet crystal in which a bismuth-substituted garnet film is grown in a growth furnace by a liquid phase epitaxial method, characterized in that an inert gas is introduced into the growth furnace. Method.
(2)不活性ガスがArであることを特徴とする請求項
1に記載の磁気光学ガーネット結晶の育成方法。
(2) The method for growing a magneto-optic garnet crystal according to claim 1, wherein the inert gas is Ar.
(3)不活性ガスがHeであることを特徴とする請求項
1に記載の磁気光学ガーネット結晶の育成方法。
(3) The method for growing a magneto-optic garnet crystal according to claim 1, wherein the inert gas is He.
(4)不活性ガスがN_2であることを特徴とする請求
項1に記載の磁気光学ガーネット結晶の育成方法。
(4) The method for growing a magneto-optic garnet crystal according to claim 1, wherein the inert gas is N_2.
(5)不活性ガスがCO_2であることを特徴とする請
求項1に記載の磁気光学ガーネット結晶の育成方法。
(5) The method for growing a magneto-optic garnet crystal according to claim 1, wherein the inert gas is CO_2.
JP25970090A 1990-09-28 1990-09-28 Method for growing magneto-optical garnet crystal Pending JPH04139094A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25970090A JPH04139094A (en) 1990-09-28 1990-09-28 Method for growing magneto-optical garnet crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25970090A JPH04139094A (en) 1990-09-28 1990-09-28 Method for growing magneto-optical garnet crystal

Publications (1)

Publication Number Publication Date
JPH04139094A true JPH04139094A (en) 1992-05-13

Family

ID=17337716

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25970090A Pending JPH04139094A (en) 1990-09-28 1990-09-28 Method for growing magneto-optical garnet crystal

Country Status (1)

Country Link
JP (1) JPH04139094A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7133189B2 (en) * 2002-02-22 2006-11-07 Tdk Corporation Magnetic garnet material, faraday rotator, optical device, bismuth-substituted rare earth-iron-garnet single-crystal film and method for producing the same and crucible for producing the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7133189B2 (en) * 2002-02-22 2006-11-07 Tdk Corporation Magnetic garnet material, faraday rotator, optical device, bismuth-substituted rare earth-iron-garnet single-crystal film and method for producing the same and crucible for producing the same
US7333261B2 (en) 2002-02-22 2008-02-19 Tdk Corporation Magnetic garnet material, faraday rotator, optical device, bismuth-substituted rare earth-iron-garnet single-crystal film and method for producing the same crucible for producing the same
US7517406B2 (en) 2002-02-22 2009-04-14 Tdk Corporation Magnetic garnet material, faraday rotator, optical device, bismuth-substituted rare earth-iron-garnet single-crystal film and method for producing the same and crucible for producing the same

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