JPH04127004A - Ellipsometer and how to use it - Google Patents
Ellipsometer and how to use itInfo
- Publication number
- JPH04127004A JPH04127004A JP24929290A JP24929290A JPH04127004A JP H04127004 A JPH04127004 A JP H04127004A JP 24929290 A JP24929290 A JP 24929290A JP 24929290 A JP24929290 A JP 24929290A JP H04127004 A JPH04127004 A JP H04127004A
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- JP
- Japan
- Prior art keywords
- arms
- sample
- polarized light
- sets
- polarization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
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Abstract
Description
本発明は、試料面に偏光を照射し、その反射光の偏光状
態の変化を測定して、試料の表面に形成された膜の厚さ
や膜の屈折率、消衰係数などの光学定数を決定するエリ
プソメータ及びその使用方法に関する。The present invention irradiates the sample surface with polarized light and measures changes in the polarization state of the reflected light to determine optical constants such as the thickness of the film formed on the sample surface, the refractive index of the film, and the extinction coefficient. This invention relates to an ellipsometer and how to use it.
エリプソメータには種々の構成のものがあり、その１つ
の概略構成を第２図に示す。
試料台１０上に搭載された試料１２の表面上の測定位置
Ｐに対し、入射角及び反射角が等しく（φ）なる不図示
の連動回転機構を備えた偏光照射アーム１４及び偏光解
析アーム１６が配置されている。
この偏光照射アーム１４は、光源１４１、コリメータ１
４２、フィルタ１４３及び偏光子１４４を備えてあり、
光源１４１から射出された光は、コリメータ１４２を通
って平行化され、フィルタ１４３を通って単色光にされ
、次に偏光子１４４を通って所望の直線偏光にされる。
一方、偏光解析アーム１６は、１／４波長板１６１、検
光子１６２、テレスコープ１６３及び光検出器１６４を
備えており、測定位置Ｐで反射され偏光状態が変化した
光（一般には楕円偏光）を１／４波長板１６１に通して
直線偏光にし、検光子１６２で消光する。すなわち、検
光子１６２及びテレスコープ１６３を通って光検出器１
６４で検出される光の強度が０になるように、検光子１
６２を回転させる。
このときの偏光子１４４の透過軸方向と検光子１６２の
透過軸方向とから、試料１２上に形成された膜の厚み及
び上記光学定数を同時に、高精度、高感度かつ非破壊、
非接触で測定することができる。
他の種類のエリプソメータとしては、１／４波長板１６
１を用いずに検光子１６２を回転させて楕円偏光の楕円
形状を検出する構成のものがある。
また、１／４波長板１６１を用いずに、この１７４波長
板１６１の位置又は偏光子１４４の後段（試料１２側）
にＰＥＭ等の電気光学変調素子を配置して右円偏光及び
左円偏光を周期的に生成する構成のものがある。
いずれの種類のエリプソメータについても、試料１２の
厚みが変わった場合や、試料１２が平行平板でない場合
には、試料台１０に備えられた不図示の調整機構を用い
て、偏光照射アーム１４から射出された偏光ビームが試
料１２上の測定位置Ｐに入射し、かつ、その入射角φが
設定値になるように、高精度で調整する必要がある。
また、１回の測定で得られる膜圧及び上記光学定数は、
同期解となるので、これを一義的に決定するには、入射
角又は波長を変えて２回測定する必要がある。There are various configurations of ellipsometers, one of which is schematically shown in FIG. With respect to the measurement position P on the surface of the sample 12 mounted on the sample stage 10, a polarization irradiation arm 14 and a polarization analysis arm 16 equipped with an interlocking rotation mechanism (not shown) whose incident angle and reflection angle are equal (φ) are provided. It is located. This polarized light irradiation arm 14 includes a light source 141, a collimator 1
42, a filter 143 and a polarizer 144,
The light emitted from the light source 141 is collimated through a collimator 142, passed through a filter 143 to become monochromatic light, and then passed through a polarizer 144 to become a desired linearly polarized light. On the other hand, the polarization analysis arm 16 is equipped with a quarter-wave plate 161, an analyzer 162, a telescope 163, and a photodetector 164, and the polarization analysis arm 16 is equipped with a quarter-wave plate 161, an analyzer 162, a telescope 163, and a photodetector 164.The polarization analysis arm 16 is equipped with a quarter-wave plate 161, an analyzer 162, a telescope 163, and a photodetector 164. The light is passed through a quarter-wave plate 161 to become linearly polarized light, and is extinguished by an analyzer 162. That is, the photodetector 1 passes through the analyzer 162 and the telescope 163.
analyzer 1 so that the intensity of light detected at 64 is 0.
Rotate 62. At this time, from the transmission axis direction of the polarizer 144 and the transmission axis direction of the analyzer 162, the thickness of the film formed on the sample 12 and the above-mentioned optical constants can be determined simultaneously with high accuracy, high sensitivity, and non-destructive.
Can be measured without contact. Other types of ellipsometers include quarter wave plates 16
There is a configuration in which the analyzer 162 is rotated to detect the elliptical shape of elliptically polarized light without using the analyzer 162. Also, without using the 1/4 wavelength plate 161, the position of this 174 wavelength plate 161 or the rear stage of the polarizer 144 (sample 12 side)
There is a configuration in which an electro-optic modulation element such as a PEM is arranged to periodically generate right-handed circularly polarized light and left-handed circularly polarized light. For any type of ellipsometer, if the thickness of the sample 12 changes or if the sample 12 is not a parallel flat plate, an adjustment mechanism (not shown) provided on the sample stage 10 is used to emit light from the polarized light irradiation arm 14. It is necessary to adjust with high precision so that the polarized beam is incident on the measurement position P on the sample 12 and the incident angle φ is the set value. In addition, the film thickness and the above optical constants obtained in one measurement are:
Since this is a synchronous solution, in order to uniquely determine this, it is necessary to measure twice with different incident angles or wavelengths.
しかし、上記調整は３次元的な調整であって、３つの調
整、例えば試料台１０の上下方向（Ｚ軸方向）の位置調
整及びＺ軸に直角な２つの軸の回りの角度調整の各々が
、互いに干渉するので、各調整を繰り返し行う必要があ
り、また、測定点Ｐの所望の設定位置が不明確であるの
で、操作が煩雑であるとともに、測定誤差が生ずる。こ
の問題は、試料台１０としてゴニオステージを使用すれ
ばある程度解決できるが、試料１２の厚みが変わった場
合には回転中心が試料１２の表面上から外れるので、完
全には解決することができない。
また、入射角を変えて２回測定する場合、試料１２のセ
ツティングが正確でないと、１回目の測定と２回目の測
定とで測定位置Ｐがずれたり入射角が設定値からずれた
りして、測定結果に誤差が生ずる。
さらに、１回目の測定と２回目の測定との間に時間的な
隔たりがあるので、表面状態が経時的変化する試料１２
に対しては測定することができない。
本発明の目的は、このような問題点に鑑み、試料の位置
決めを容易かつ正確に行うことができ、しかも、表面状
態が経時的変化する試料に対しても測定可能なエリプソ
メータ及びその使用方法を提供することにある。However, the above adjustment is a three-dimensional adjustment, and each of the three adjustments, for example, the vertical position adjustment (Z-axis direction) of the sample stage 10 and the angle adjustment around two axes perpendicular to the Z-axis, , interfere with each other, so it is necessary to perform each adjustment repeatedly, and since the desired setting position of the measurement point P is unclear, the operation is complicated and measurement errors occur. This problem can be solved to some extent by using a goniometer stage as the sample stage 10, but if the thickness of the sample 12 changes, the center of rotation will move away from the surface of the sample 12, so it cannot be completely solved. In addition, when measuring twice with different incident angles, if the setting of the sample 12 is not accurate, the measurement position P may deviate between the first and second measurements, or the incident angle may deviate from the set value. , errors will occur in the measurement results. Furthermore, since there is a time gap between the first measurement and the second measurement, the surface condition of the sample 12 changes over time.
cannot be measured against. In view of these problems, an object of the present invention is to provide an ellipsometer that can easily and accurately position a sample, and can also measure samples whose surface conditions change over time, and a method for using the same. It is about providing.
この目的を達成するために、本発明に係るエリプソメー
タでは、偏光ビームを試料面に照射する偏光照射アーム
と、該試料面で反射された光を受光してその偏光状態を
解析する偏光解析アームとを、測定点が一致するように
２組配置している。
このエリプソメータの使用方法は、次の通りである。
２組の偏光照射アームの試料面に対する入射角を互いに
異ならせ、又は、２組の偏光照射アームから射出される
偏光の波長を互いに異ならせる。
そして、２組の偏光照射アームから射出された偏光ビー
ムを試料面に照射して形成された両光スポットが一致し
、かつ、２組の偏光解析アームによる光強度の検出値が
最・大になるように、試料の位置を調整する。この調整
後に、面偏光解析アームで受光した偏光の状態を解析す
る。To achieve this objective, the ellipsometer according to the present invention includes a polarization irradiation arm that irradiates a sample surface with a polarized beam, and a polarization analysis arm that receives light reflected from the sample surface and analyzes its polarization state. are arranged in two sets so that the measurement points coincide. The method of using this ellipsometer is as follows. The angles of incidence of the two sets of polarized light irradiation arms with respect to the sample surface are made to be different from each other, or the wavelengths of the polarized light emitted from the two sets of polarized light irradiation arms are made to be different from each other. Then, the two light spots formed by irradiating the sample surface with the polarized beams emitted from the two sets of polarization irradiation arms coincide, and the detected value of the light intensity by the two sets of polarization analysis arms reaches the maximum. Adjust the position of the sample so that After this adjustment, the state of the polarized light received by the plane polarization analysis arm is analyzed.
２組の偏光照射アームから射出された偏光ビームを試料
面に照射して形成された両光スポットが一致し、かつ、
２組の偏光解析アームによる光強度の検出値が最大にな
るように、試料の位置を調整すればよいので、容易かつ
正確に調整を行うことができる。
また、試料に対する両偏光照射アームの入射角を互いに
異ならせ、又は、両偏光照射アームから射出される光の
波長を異ならせることにより、回の測定で、試料の表面
に形成された膜の厚み及び屈折率、消衰係数などの光学
定数を一義的に決定することができる。
これにより、測定時間が短縮され、さらに、試料の表面
に形成された膜が経時的変化する場合でも、前記測定が
可能となる。Both light spots formed by irradiating the sample surface with polarized beams emitted from two sets of polarized light irradiation arms coincide, and
Since the position of the sample can be adjusted so that the detected value of the light intensity by the two sets of polarization analysis arms is maximized, the adjustment can be easily and accurately performed. In addition, by making the incident angles of both polarized light irradiation arms different from each other with respect to the sample, or by changing the wavelengths of the light emitted from both polarized light irradiation arms, the thickness of the film formed on the surface of the sample can be And optical constants such as refractive index and extinction coefficient can be uniquely determined. This shortens the measurement time, and furthermore, the measurement becomes possible even when the film formed on the surface of the sample changes over time.
以下、図面に基づいて本発明に係るエリプソメータ及び
その使用方法の一実施例を説明する。
第１図はエリプソメータの概略構成を示す。
試料台１０上に搭載された試料１２上の測定位置Ｐに対
し、第２図と同様に、入射角及び反射角が等しく （φ
）なる不図示の連動回転機構を備えた偏光照射アーム１
４及び偏光解析アーム１６が配置されている。試料台１
０は、不図示の調整機構により、互いに直交するＸ軸及
びＹ軸の各々の回りに回転可能となっており、かつ、Ｘ
軸及びＹ軸に直交するＺ軸方向へ平行移動可能となって
いる。偏光照射アーム１４及び偏光解析アーム１６の光
軸は、Ｙ−Ｚ平面内に在る。
一方、入射角及び反射角が等しく （θ）なる不図示の
連動回転機構を備えた、偏光照射アーム１４及び偏光解
析アーム１６と同一構成の偏光照射アーム１８及び偏光
解析アーム２０が、それらの光軸をＸ−Ｚ平面内に存在
させて配置されている。
図示の如く、Ｘ軸及びＹ軸に対応して、試料１２の表面
上に、互いに直交するＵ軸及びＹ軸を想定する。試料１
２が平行平板の場合には、Ｕ軸及びＹ軸はそれぞれＸ軸
及びＹ軸と平行になる。
ここで、平行平板の試料１２を、これと厚みが異なりか
つ平行平板でなくテーパの付いた試料１２と取り換えた
場合には、試料１２のＺ方向位置、並びに、Ｕ軸及びＹ
軸の回りの回転角を調整する必要がある。しかし、実際
にはＸ軸及びＹ軸の回りの回転角を調整しなければなら
ないので、例えばＸ軸の回りの回転角を調整すると、試
料１２のＺ軸方向位置も変化し、再度Ｚ軸方向位置を調
整する必要がある。また、測定位置Ｐの正確なｚ軸方向
位置が不明確である。Ｙ軸の回りの回転角調整について
も上記同様である。したがって、従来では試料１２の位
置調整が容易でなく、操作が煩雑であり、かつ、調整誤
差が生じた。
しかし、上記の如く構成されたエリプソメータを用いた
場合、偏光照射アーム１４及び１８から射出された偏光
ビームにより試料１２上に形成される両光スポットの位
置が一致するように、測定位置ＰのＺ軸方向位置を調整
し、偏光解析アーム１６及び２０で検出される光の強度
が最大となるように、Ｘ軸及びＹ軸の回りを調整すれば
よいので、従来同様に繰り返し調整をしなければならな
いものの（この問題は、試料台１０としてゴニオステー
ジを使用すればある程度解決できるが、試料１２の厚み
が変わった場合には回転中心が試料１２の表面上から外
れるので、完全には解決することができない。）、容易
かつ正確に調整を行うことができる。このような試料１
２の位置決めにより、偏光照射アーム１４と偏光解析ア
ーム１６とによる測定点と、偏光照射アーム１８と偏光
解析アーム２０とによる測定点とが必ず一致する。
また、試料１２に対する偏光照射アーム１４及び１８の
入射角φ及びθを互いに異ならせ、又は、偏光照射アー
ム１４及び１８から射出される光の波長を互いに異なら
せることにより、−回の測定で、試料１２の表面に形成
された膜の厚み及び膜の屈折率、消衰係数などの光学定
数を一義的多こ決定することができる。
これにより、測定時間が短縮され、さらに、試料１２の
表面に形成された膜が経時的変化する場合でも、前記測
定が可能となる。
なお、本発明に係るエリプソメータの偏光照射アーム及
び偏光解析アームの構成は、第２図に示すものに限定さ
れず、各種構成のものが含まれることは勿論である。DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of an ellipsometer and a method of using the same according to the present invention will be described below with reference to the drawings. FIG. 1 shows a schematic configuration of an ellipsometer. With respect to the measurement position P on the sample 12 mounted on the sample stage 10, the incident angle and the reflection angle are equal (φ
) Polarized light irradiation arm 1 equipped with an interlocking rotation mechanism (not shown)
4 and a polarization analysis arm 16 are arranged. Sample stand 1
0 is rotatable around each of the X-axis and Y-axis, which are perpendicular to each other, by an adjustment mechanism (not shown), and
It is possible to move in parallel in the Z-axis direction perpendicular to the axis and the Y-axis. The optical axes of the polarization irradiation arm 14 and the polarization analysis arm 16 lie within the YZ plane. On the other hand, a polarization irradiation arm 18 and a polarization analysis arm 20, which have the same configuration as the polarization irradiation arm 14 and polarization analysis arm 16, are equipped with an interlocking rotation mechanism (not shown) in which the incident angle and the reflection angle are equal (θ). It is arranged so that its axis lies within the X-Z plane. As shown in the figure, a U-axis and a Y-axis are assumed to be orthogonal to each other on the surface of the sample 12, corresponding to the X-axis and Y-axis. Sample 1
When 2 is a parallel plate, the U axis and the Y axis are parallel to the X axis and the Y axis, respectively. Here, if the parallel plate sample 12 is replaced with a sample 12 that has a different thickness and is not a parallel plate but has a taper, the position of the sample 12 in the Z direction, the U axis, and the Y
It is necessary to adjust the rotation angle around the axis. However, in reality, the rotation angles around the X-axis and Y-axis must be adjusted. For example, when the rotation angle around the X-axis is adjusted, the position of the sample 12 in the Z-axis direction also changes, and the The position needs to be adjusted. Furthermore, the exact position of the measurement position P in the z-axis direction is unclear. The same applies to the adjustment of the rotation angle around the Y axis. Therefore, in the past, it was not easy to adjust the position of the sample 12, the operation was complicated, and adjustment errors occurred. However, when using the ellipsometer configured as described above, the Z of the measurement position P is adjusted so that the positions of both light spots formed on the sample 12 by the polarized beams emitted from the polarized light irradiation arms 14 and 18 coincide. All you have to do is adjust the axial position and adjust around the X and Y axes so that the intensity of the light detected by the polarization analysis arms 16 and 20 is maximized. (This problem can be solved to some extent by using a goniometer stage as the sample stage 10, but if the thickness of the sample 12 changes, the center of rotation will move away from the surface of the sample 12, so it cannot be completely solved.) ), adjustments can be made easily and accurately. Such sample 1
2, the measurement point by the polarization irradiation arm 14 and polarization analysis arm 16 and the measurement point by the polarization irradiation arm 18 and polarization analysis arm 20 always match. In addition, by making the incident angles φ and θ of the polarized light irradiation arms 14 and 18 different from each other with respect to the sample 12, or by making the wavelengths of the light emitted from the polarized light irradiation arms 14 and 18 different from each other, -times of measurement, The thickness of the film formed on the surface of the sample 12 and the optical constants such as the refractive index and extinction coefficient of the film can be uniquely determined. Thereby, the measurement time is shortened, and furthermore, even if the film formed on the surface of the sample 12 changes over time, the measurement can be performed. Note that the configurations of the polarization irradiation arm and the polarization analysis arm of the ellipsometer according to the present invention are not limited to those shown in FIG. 2, and of course include various configurations.
以上説明した如く、本発明に係るエリプソメータ及びそ
の使用方法では、２組の偏光照射アームから射出された
偏光ビームを試料面に照射して形成された両光スポット
が一致し、かつ、２組の偏光解析アームによる光強度の
検出値が最大になるように、試料の位置を調整すればよ
いので、容易かつ正確に調整を行うことができるという
優れた効果を奏する。
また、試料に対する両偏光照射アームの入射角を互いに
異ならせ、又は、両偏光照射アームから射出される光の
波長を異ならせることにより、回の測定で、試料の表面
に形成された膜の厚み及び屈折率、消衰係数などの光学
定数を一義的に決定することができ、これにより、測定
時間が短縮され、さらに、試料の表面に形成された膜が
経時的変化する場合でも、前記測定が可能となるという
優れた効果を奏する。As explained above, in the ellipsometer and the method of using the same according to the present invention, both the light spots formed by irradiating the sample surface with the polarized beams emitted from the two sets of polarized light irradiation arms coincide, and the two sets of polarized light beams are aligned. Since it is only necessary to adjust the position of the sample so that the detected value of the light intensity by the polarization analysis arm is maximized, an excellent effect is achieved in that adjustment can be performed easily and accurately. In addition, by making the incident angles of both polarized light irradiation arms different from each other with respect to the sample, or by changing the wavelengths of the light emitted from both polarized light irradiation arms, the thickness of the film formed on the surface of the sample can be It is possible to uniquely determine the optical constants such as refractive index and extinction coefficient, which shortens the measurement time, and furthermore, even if the film formed on the surface of the sample changes over time, the measurement This has the excellent effect of making it possible to
第１図は本発明に係るエリプソメータの概略構成を示す
斜視図、
第２図は従来のエリプソメータの概略構成図である。
図中、
１０は試料台
１２は試料
１４．１８は偏光照射アーム
１６．２０は偏光解析アーム
１４１は光源
１４２はコリメータ
１４３はフィルタ
１４４は偏光子
１６１は１／４波長板
１６２は検光子
代理人 弁理士 松 本 眞 吉FIG. 1 is a perspective view showing a schematic configuration of an ellipsometer according to the present invention, and FIG. 2 is a schematic configuration diagram of a conventional ellipsometer. In the figure, 10 is the sample stage 12, the sample 14, 18 is the polarization irradiation arm 16, 20 is the polarization analysis arm 141, the light source 142, the collimator 143, the filter 144, the polarizer 161, the 1/4 wavelength plate 162 is the analyzer agent. Patent Attorney Makichi Matsumoto
Claims (1)
１４、１８）と、 該試料面で反射された光を受光してその偏光状態を解析
する偏光解析アーム（１６、２０）とを、測定点が一致
するように２組配置したことを特徴とするエリプソメー
タ。 ２）、前記２組の偏光照射アーム（１４、１８）の前記
試料面に対する入射角を互いに異ならせ、 該２組の偏光照射アームから射出された偏光ビームを該
試料面に照射して形成された両光スポットが一致し、か
つ、前記２組の偏光解析アーム（１６、２０）による光
強度の検出値が最大になるように、該試料（１２）の位
置を調整し、該調整後に、両該偏光解析アームで受光し
た偏光の状態を解析することを特徴とする請求項１記載
のエリプソメータの使用方法。 ３）、前記２組の偏光照射アーム（１４、１８）から射
出される偏光の波長を互いに異ならせ、 該２組の偏光照射アームから射出された偏光ビームを前
記試料面に照射して形成された両光スポットが一致し、
かつ、前記２組の偏光解析アーム（１６、２０）による
光強度の検出値が最大になるように、該試料の位置を調
整し、 該調整後に、両該偏光解析アームで受光した偏光の状態
を解析することを特徴とする請求項１記載のエリプソメ
ータの使用方法。[Claims] 1) A polarized light irradiation arm that irradiates a sample surface with a polarized beam (
14, 18) and polarization analysis arms (16, 20) that receive the light reflected from the sample surface and analyze its polarization state, are arranged in two sets so that the measurement points coincide. Ellipsometer. 2), the incident angles of the two sets of polarized light irradiation arms (14, 18) with respect to the sample surface are made different from each other, and the polarized beams emitted from the two sets of polarized light irradiation arms are irradiated onto the sample surface. Adjust the position of the sample (12) so that the two light spots coincide and the detected value of light intensity by the two sets of polarization analysis arms (16, 20) is maximized, and after the adjustment, 2. The method of using an ellipsometer according to claim 1, wherein the state of polarized light received by both said polarization analysis arms is analyzed. 3), the wavelengths of the polarized light emitted from the two sets of polarized light irradiation arms (14, 18) are made different from each other, and the polarized light beams emitted from the two sets of polarized light irradiation arms are irradiated onto the sample surface to form the sample surface. The two light spots match,
and adjusting the position of the sample so that the detection value of the light intensity by the two sets of polarization analysis arms (16, 20) is maximized, and after the adjustment, the state of the polarization received by both polarization analysis arms. 2. The method of using an ellipsometer according to claim 1, wherein the method comprises analyzing the ellipsometer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24929290A JPH04127004A (en) | 1990-09-18 | 1990-09-18 | Ellipsometer and how to use it |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24929290A JPH04127004A (en) | 1990-09-18 | 1990-09-18 | Ellipsometer and how to use it |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04127004A true JPH04127004A (en) | 1992-04-28 |
Family
ID=17190802
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24929290A Pending JPH04127004A (en) | 1990-09-18 | 1990-09-18 | Ellipsometer and how to use it |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04127004A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995027893A1 (en) * | 1994-04-06 | 1995-10-19 | Nippon Paper Industries Co., Ltd. | Method of measuring fiber orientation on surface of paper |
| WO2003014710A1 (en) * | 2001-08-09 | 2003-02-20 | Therma-Wave, Inc. | Multiple beam ellipsometer |
| JP2005106820A (en) * | 2003-09-29 | 2005-04-21 | General Electric Co <Ge> | Coordinated polarization for glossy surface measurement |
| JP2007513342A (en) * | 2003-12-03 | 2007-05-24 | パルプ アンド ペーパー リサーチ インスチチュート オブ カナダ | Equipment for circular polarization and cell wall thickness and orientation of small fibers |
| DE19643474B4 (en) * | 1995-11-02 | 2011-02-24 | Abb Industrial Systems Inc., Columbus | Method and apparatus for the on-line determination of fiber orientation and anisotropy in a non-woven web material |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6228606A (en) * | 1985-07-30 | 1987-02-06 | Toshiba Corp | Film thickness measuring instrument |
-
1990
- 1990-09-18 JP JP24929290A patent/JPH04127004A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6228606A (en) * | 1985-07-30 | 1987-02-06 | Toshiba Corp | Film thickness measuring instrument |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995027893A1 (en) * | 1994-04-06 | 1995-10-19 | Nippon Paper Industries Co., Ltd. | Method of measuring fiber orientation on surface of paper |
| US5699163A (en) * | 1994-04-06 | 1997-12-16 | Nippon Paper Industries Co., Ltd. | Method of determining the orientation of fibers on the surface of paper |
| DE19643474B4 (en) * | 1995-11-02 | 2011-02-24 | Abb Industrial Systems Inc., Columbus | Method and apparatus for the on-line determination of fiber orientation and anisotropy in a non-woven web material |
| WO2003014710A1 (en) * | 2001-08-09 | 2003-02-20 | Therma-Wave, Inc. | Multiple beam ellipsometer |
| US6798512B2 (en) | 2001-08-09 | 2004-09-28 | Therma-Wave, Inc. | Multiple beam ellipsometer |
| US6985228B2 (en) | 2001-08-09 | 2006-01-10 | Tokyo Electron Limited | Multiple beam ellipsometer |
| US7136164B2 (en) | 2001-08-09 | 2006-11-14 | Tokyo Electron Limited | Multiple beam ellipsometer |
| US7321427B2 (en) | 2001-08-09 | 2008-01-22 | Tokyo Electron Limited | Multiple beam ellipsometer |
| JP2005106820A (en) * | 2003-09-29 | 2005-04-21 | General Electric Co <Ge> | Coordinated polarization for glossy surface measurement |
| JP2007513342A (en) * | 2003-12-03 | 2007-05-24 | パルプ アンド ペーパー リサーチ インスチチュート オブ カナダ | Equipment for circular polarization and cell wall thickness and orientation of small fibers |
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