JP7014359B2 - 装飾部材およびその製造方法 - Google Patents
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Description
PET基材上にAlをスパッタリング方式で蒸着して光反射層(Al、厚さ120nm)を形成した後、その上にスパッタリング方法によってSiからなる光吸収層を形成した。光吸収層の厚さは、10nmから100nmまで10nmの間隔で10種類の厚さを有するようにした。前記光吸収層上にガラスを配置した。この構造において、Siのn、k値を用い、Siの厚さ変化による色相変化のシミュレーション結果を図15に示した。図15により、実施例1の場合は、k値を有するSiの影響で10~100nmの範囲で多様な色相を示すことを確認することができる。図17は、シリコンの屈折率(n)および消滅係数(k)を示すグラフである。
光吸収層の厚さを120nmから20nmずつ増加して300nmまで増加させたことを除けば、実施例1と同様に実施した。この構造において、Siの厚さ変化による色相変化のシミュレーション結果を図15に示した。図15により、実施例2の場合は、k値を有するSiの影響で120~300nmの範囲で多様な色相を示すことを確認することができる。
Siのみで光吸収層を形成する代わりにシリコン酸化物からなる光吸収層を形成したことを除けば、実施例1および2と同様に実施した。この構造において、シリコン酸化物のn、k値を用い、シリコン酸化物の厚さ変化による色相変化のシミュレーション結果を図16に示した。図16により、比較例1、2の場合、k値を有しないシリコン酸化物(図16にはOxideで表現されている)の影響によって色相変化が屈折率に起因する現象だけなので、類似する色相の変化としてのみ現れることを確認することができる。図18は、シリコン酸化物の屈折率(n)および消滅係数(k)を示すグラフである。
Claims (12)
- 光反射層と、前記光反射層上に備えられかつSiのみからなる光吸収層とを含み、
前記光吸収層は、400nmにおける消滅係数が0超過4以下であり、
前記光吸収層と前記光反射層との間には、両層による界面が形成される、
装飾部材。 - 前記光反射層は、シリコン(Si)、アルミニウム(Al)、銅(Cu)、ニッケル(Ni)、バナジウム(V)、タングステン(W)、タンタル(Ta)、モリブデン(Mo)、ネオジム(Nd)、チタン(Ti)、鉄(Fe)、クロム(Cr)、コバルト(Co)、金(Au)および銀(Ag)の中から選択される1種または2種以上の材料を含む、
請求項1に記載の装飾部材。 - 前記光反射層の前記光吸収層に対向する面の反対面、前記光反射層と前記光吸収層との間、または前記光吸収層の前記光反射層に対向する面の反対面に備えられたカラーフィルムをさらに含む、請求項1又は2に記載の装飾部材。
- 前記光反射層の前記光吸収層に対向する面の反対面、または前記光吸収層の前記光反射層に対向する面の反対面に備えられた基材をさらに含む、請求項1から3のいずれか1項に記載の装飾部材。
- 前記光吸収層は、厚さが異なる2以上の地点を含むものである、請求項1から4のいずれか一項に記載の装飾部材。
- 前記光吸収層は、上面が傾斜角度0度超過90度以下の傾斜面を有する領域を1つ以上含み、前記光吸収層は、いずれか1つの傾斜面を有する領域における厚さと異なる厚さを有する領域を1つ以上含むものである、請求項1から5のいずれか一項に記載の装飾部材。
- 前記光吸収層は、△E*ab>1の二色性を有するものである、請求項1から6のいずれか一項に記載の装飾部材。
- 前記光吸収層の上面は、コーン(cone)形態の突出部または溝部を有するパターン、最高点が線形態の突出部または最低点が線形態の溝部を有するパターン、またはコーン形態の上面が切り取られた構造の突出部または溝部を有するパターンを含むものである、請求項1から7のいずれか一項に記載の装飾部材。
- 前記コーン形態の突出部または溝部を有するパターンは、前記コーン形態のパターンを上面から観察した時、コーンの頂点を基準として360度回転時、同一の形態が2個以下存在するものである、請求項8に記載の装飾部材。
- 前記最高点が線形態の突出部または最低点が線形態の溝部を有するパターンは、上面から観察した時、重心点を基準として360度回転時、同一の形態が1個しか存在しないものである、請求項8に記載の装飾部材。
- 前記光吸収層は、400nmにおける屈折率が0~8である、請求項1から10のいずれか一項に記載の装飾部材。
- 前記装飾部材は、デコフィルムまたはモバイル機器のケースである、請求項1から11のうちのいずれか1項に記載の装飾部材。
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