JP6887260B2 - 加工装置 - Google Patents
加工装置 Download PDFInfo
- Publication number
- JP6887260B2 JP6887260B2 JP2017018387A JP2017018387A JP6887260B2 JP 6887260 B2 JP6887260 B2 JP 6887260B2 JP 2017018387 A JP2017018387 A JP 2017018387A JP 2017018387 A JP2017018387 A JP 2017018387A JP 6887260 B2 JP6887260 B2 JP 6887260B2
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- JP
- Japan
- Prior art keywords
- image
- processing
- workpiece
- chuck table
- cassette
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Dicing (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Machine Tool Sensing Apparatuses (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Engineering (AREA)
Description
13、14 カセットステージ(カセット載置台)
21 多関節ロボット(搬送手段)
25 位置決め機構(構成要素)
26 ポジションテーブル
27 可動ピン(加工手段)
31 チャックテーブル
41 切削機構(構成要素)
48 切削ブレード(加工手段)
55 チャックテーブル洗浄機構(構成要素)
56 洗浄ノズル(加工手段)
57 乾燥ノズル(加工手段)
58 2流体ノズル(加工手段)
61、64、67 搬送手段
71 裏面洗浄機構(構成要素)
72 表面洗浄機構(構成要素)
75 制御手段
77 イメージ画像記憶部
79 操作パネル
C1 搬入用カセット(カセット)
C2 搬出用カセット(カセット)
W 被加工物
Claims (1)
- 被加工物を保持するチャックテーブルと、該チャックテーブルに保持された被加工物を加工する加工手段と、被加工物を複数収容するカセットと、該カセットを載置するカセット載置台と、該カセット載置台に載置された該カセットと該チャックテーブルに被加工物を搬入・搬出する搬送手段と、各構成要素を制御する制御手段と、各構成要素の操作条件を入力設定する操作パネルと、を少なくとも備え、被加工物が一連の処理順に各構成要素においてフルオート動作で加工される加工装置であって、
該制御手段は、
各構成要素において設定できる複数の操作条件に対応した処理動作をそれぞれイメージ画像として記憶するイメージ画像記憶部と、
該操作パネルの画面を表示制御する表示制御部と、を備え、
該表示制御部は、該操作パネルに設定された該各構成要素の該操作条件に応じて該当する該イメージ画像をフルオート動作の一連の処理順に該操作パネルの画面上にプレビュー表示すること、を特徴とする加工装置。
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017018387A JP6887260B2 (ja) | 2017-02-03 | 2017-02-03 | 加工装置 |
| TW107100041A TWI730211B (zh) | 2017-02-03 | 2018-01-02 | 加工裝置 |
| KR1020180012883A KR102345188B1 (ko) | 2017-02-03 | 2018-02-01 | 가공 장치 |
| CN201810104640.5A CN108389794B (zh) | 2017-02-03 | 2018-02-02 | 加工装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017018387A JP6887260B2 (ja) | 2017-02-03 | 2017-02-03 | 加工装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2018122421A JP2018122421A (ja) | 2018-08-09 |
| JP6887260B2 true JP6887260B2 (ja) | 2021-06-16 |
Family
ID=63074989
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017018387A Active JP6887260B2 (ja) | 2017-02-03 | 2017-02-03 | 加工装置 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6887260B2 (ja) |
| KR (1) | KR102345188B1 (ja) |
| CN (1) | CN108389794B (ja) |
| TW (1) | TWI730211B (ja) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7278719B2 (ja) * | 2018-06-27 | 2023-05-22 | キヤノン株式会社 | 画像符号化装置、画像符号化方法及びプログラム、画像復号装置、画像復号方法及びプログラム |
| KR102493014B1 (ko) * | 2018-07-03 | 2023-01-31 | 주식회사 케이씨텍 | 기판 연마 시스템 |
| JP7301512B2 (ja) * | 2018-09-13 | 2023-07-03 | 株式会社岡本工作機械製作所 | 基板研削装置及び基板研削方法 |
| JP7162513B2 (ja) * | 2018-12-07 | 2022-10-28 | 株式会社ディスコ | 加工装置 |
| JP7347986B2 (ja) * | 2019-08-06 | 2023-09-20 | 株式会社ディスコ | エッジトリミング装置 |
| JP7469903B2 (ja) | 2020-02-21 | 2024-04-17 | 株式会社ディスコ | 加工装置 |
| JP7403379B2 (ja) | 2020-04-24 | 2023-12-22 | 株式会社ディスコ | 加工装置 |
| JP7582798B2 (ja) * | 2020-06-09 | 2024-11-13 | 株式会社東京精密 | 加工装置及び方法 |
| JP7713787B2 (ja) * | 2021-03-18 | 2025-07-28 | 株式会社ディスコ | 加工装置 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08107095A (ja) * | 1994-08-08 | 1996-04-23 | Tokyo Electron Ltd | 処理装置、洗浄処理装置およびそれらの画面処理方法 |
| DE19804542C5 (de) * | 1998-02-05 | 2009-04-30 | Wernicke & Co Gmbh | Verfahren und Vorrichtung zum Bearbeiten von Brillengläsern |
| JP2009194326A (ja) * | 2008-02-18 | 2009-08-27 | Disco Abrasive Syst Ltd | 加工装置 |
| JP2013045966A (ja) * | 2011-08-25 | 2013-03-04 | Disco Abrasive Syst Ltd | 加工装置 |
| JP2013197239A (ja) * | 2012-03-19 | 2013-09-30 | Disco Abrasive Syst Ltd | 加工装置 |
| JP2014192461A (ja) * | 2013-03-28 | 2014-10-06 | Mitsuboshi Diamond Industrial Co Ltd | 基板のパターニング方法およびパターニング加工装置 |
| JP6224350B2 (ja) * | 2013-05-17 | 2017-11-01 | 株式会社ディスコ | 加工装置 |
| JP2016168632A (ja) * | 2015-03-11 | 2016-09-23 | 株式会社ディスコ | 加工装置 |
| JP6456768B2 (ja) * | 2015-05-18 | 2019-01-23 | 株式会社ディスコ | 加工装置 |
| JP6566719B2 (ja) * | 2015-05-22 | 2019-08-28 | 株式会社ディスコ | 加工装置 |
-
2017
- 2017-02-03 JP JP2017018387A patent/JP6887260B2/ja active Active
-
2018
- 2018-01-02 TW TW107100041A patent/TWI730211B/zh active
- 2018-02-01 KR KR1020180012883A patent/KR102345188B1/ko active Active
- 2018-02-02 CN CN201810104640.5A patent/CN108389794B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN108389794B (zh) | 2023-04-07 |
| KR102345188B1 (ko) | 2021-12-30 |
| JP2018122421A (ja) | 2018-08-09 |
| TWI730211B (zh) | 2021-06-11 |
| KR20180090747A (ko) | 2018-08-13 |
| TW201830507A (zh) | 2018-08-16 |
| CN108389794A (zh) | 2018-08-10 |
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