JP6364860B2 - Hard coat film, and transparent conductive film and touch panel using the same - Google Patents

Description

  The present invention relates to a hard coat film, a transparent conductive film using the same, and a touch panel.

  In recent years, plastic products are good in terms of workability and weight reduction, and various glass products are being replaced with plastic products. Since the surface of a plastic product is easily damaged, a hard coat layer may be provided on the surface or a film provided with a hard coat layer may be bonded for the purpose of imparting surface hardness and scratch resistance.

  Further, even in conventional glass products, a plastic film is bonded to prevent scattering when the glass product is broken. In order to enhance the hardness of the plastic film surface, it is widely used to form a hard coat layer on the film surface. The hard coat layer is particularly the outermost surface of a display device such as an LCD, PDP, FED, or EL, or a touch panel. Etc. are provided.

  When a hard coating is applied to a thermoplastic film such as a PET film, the film may be wound into a roll and stored in the manufacturing process. When another layered body is layered on a resin base layer such as a PET film with a hard coat, the adhesive or chemical force is applied between the layers, and the layered body is used. In addition, a force for peeling off each layered body may be required, it may be difficult to peel off due to the strong adhesive force, or the layered body may be destroyed if it is forced to peel off.

  Therefore, for the purpose of suppressing sticking of the hard coat film, for example, a resin composition containing two kinds of resin components is applied on a substrate, and after application, one kind of resin component is precipitated by phase separation, A technique for forming fine irregularities on the surface (see, for example, Patent Document 1) has been proposed. However, the size of the irregularities varies depending on the heating temperature, which may impair transparency.

  On the other hand, a transparent conductive film is obtained by forming a multilayer film composed of a transparent thin film such as a metal oxide on a transparent substrate. As a method for forming this multilayer film, a dry coating method such as a chemical vapor deposition (CVD) method or a physical vapor deposition (PVD) method has been proposed.

  The transparent conductive film is required to have high durability at the same time. One of the required durability is improved adhesion of each layer. In particular, a decrease in adhesion in a durability test under a high temperature and high humidity environment is an important issue directly related to deterioration over time and mechanical durability when used as a touch panel. Sex is required.

  For the purpose of improving the adhesion to the vapor deposition surface and the like, for example, an active energy ray-curable resin composition containing, as a monomer component, a compound having two or more (meth) acryloyl groups in the molecule and silica, Further, a technique for containing an acid group-containing ethylenically unsaturated compound (for example, see Patent Document 2) has been proposed, but further improvement in adhesion by a durability test in a high temperature and high humidity environment is required. Yes.

  Examples of the touch panel system using the transparent conductive film include a resistance film type and a capacitance type. In particular, the capacitance type can be multi-touched and is widely used for mobile devices and the like.

  A capacitive touch panel uses a transparent conductive layer on which a pattern is formed. As a method for forming a pattern in the transparent conductive layer, for example, there is a photolithography method in which a pattern is formed using a resist as described in Patent Document 3, but the photolithography method requires many manufacturing steps. In particular, when a transparent conductive layer is provided on both surfaces of a substrate to form a pattern, the manufacturing process becomes complicated because steps such as resist coating, exposure, and development are performed on each side.

JP 2007-182519 A JP 2007-016145 A JP-A-1-197911

  The present invention has been made in view of the problems of the prior art, and its purpose is excellent in hard coat properties, transparency, anti-blocking properties, and adhesion to other layers, and when a transparent electrode layer is laminated. It is to provide a hard coat film having good patternability, a transparent conductive film using the same, and the transparent conductive film.

  The above problem can be solved by the following means.

The hard coat film according to the present invention has a hard coat layer on at least one surface of a film substrate containing an ultraviolet absorber. The hard coat layer is composed of 50 to 90 parts by weight of an acrylate-based monomer or oligomer (A), 0.1 to 1 part by weight of fine particles (B), 5 to 50 parts by weight of an organosilicon compound ( C), and photopolymerization. Initiator (D) 1 to 10 parts by weight (provided that monomer or oligomer (A) mainly composed of acrylate, fine particles (B), organosilicon compound ( C), and photopolymerization initiator (D) The total amount of the curable resin composition is at least 100 parts by weight, and the curable resin composition is applied and cured. The organosilicon compound (C) is represented by Si (OR) ₄ or R ′ _m Si (OR) _4-m (where R and R ′ are organic groups, and m is 1 or 2). It is an organosilicon compound.

  The average particle size of the fine particles (B) is preferably 0.1 μm or more and 10 μm or less.

  The film substrate is preferably made of polyethylene terephthalate.

  The film thickness of the hard coat layer is preferably 1 μm or more and 10 μm or less.

  The transparent conductive film according to the present invention is one in which at least a transparent electrode layer is laminated on the hard coat layer of the hard coat film.

  In the transparent conductive film according to the present invention, at least a transparent electrode layer may be laminated on each hard coat layer of the hard coat film in which the hard coat layer is provided on both surfaces of the film substrate.

  Moreover, the touchscreen which concerns on this invention is equipped with one of said transparent conductive films.

  According to the present invention, a hard coat film having excellent hard coat properties, transparency, anti-blocking properties and adhesion to other layers, and having good patternability when a transparent electrode layer is laminated, and the use thereof The transparent conductive film and touch panel which were included can be provided.

Schematic cross-sectional view showing a film substrate according to an embodiment Schematic sectional view of a hard coat film according to an embodiment Schematic cross-sectional view showing an embodiment of a transparent conductive film according to an embodiment Schematic sectional view showing an embodiment of a touch panel according to an embodiment

  Hereinafter, the hard coat film, transparent conductive film, and touch panel of the present invention will be described.

  FIG. 1 is a schematic cross-sectional view showing a film substrate according to an embodiment.

  The film substrate (1) is obtained by dispersing at least an ultraviolet absorber (12) in a resin film (11). As will be described later in FIGS. 3 and 4, the base film (1) is used as a base material for the touch panel (4), and a resist is applied to both sides of the base film (1). The transparent electrodes (3a, 3b) are formed by exposing the resists respectively. By using the resin film (11) containing the ultraviolet absorber (12) as the film substrate (1), it is possible that the ultraviolet rays that were not absorbed by the resist on one side reach the resist on the other side during resist exposure. Can be suppressed. Therefore, the transparent conductive layers (3a, 3b) having different patterns can be formed on the front and back surfaces of the base film (1) by exposing the resist using ultraviolet rays.

  The resin film (11) is not particularly limited, and can be appropriately selected from known plastic films. Specifically, polyethylene film, polypropylene film, polyester film, polyvinyl chloride film, cellophane, nylon film, polyvinyl alcohol film, polycarbonate film, polyvinylidene chloride film, polyacetate film, polystyrene film, acrylic film, heat resistance -Plastic films such as engineering plastic films, fluororesin films, and triacetyl cellulose films. The thickness of the resin film (11) is not particularly limited, but is preferably 25 μm or more and 500 μm or less, and more preferably 50 μm or more and 300 μm or less. The resin film (11) may contain various additives and stabilizers in addition to the ultraviolet absorber (12). Examples of the additives and stabilizers include antistatic agents, plasticizers, lubricants, and easy adhesives. For the film base (1), in order to improve the adhesion between the film base (1) and a layer (for example, a hard coat layer (2) described later) and the film base (1). As a pretreatment, a corona treatment, a low temperature plasma treatment, an ion bombardment treatment, a chemical treatment, or the like may be performed.

  Examples of the ultraviolet absorber (12) include benzophenone-based, benzotriazole-based, benzoate-based, salicylate-based, triazine-based, and cyanoacrylate-based ultraviolet absorbers. The ultraviolet absorber preferably has a polymerizable vinyl group. For example, 2- (2′-hydroxy-5′-methacryloxyethylphenyl) 2H-benzotriazole, 2-hydroxy-4- (methacrylic). Oxy) benzophenone, phenyl-5-methacryloxymethyl salicylate. The ultraviolet absorber may be one selected from the above group or two or more selected from the above group. It is preferable that content of a ultraviolet absorber (12) is 0.2 to 20 weight% with respect to the whole weight of a film base material (1). When the content of the ultraviolet absorber (12) is less than 0.2% by weight of the total weight of the film substrate (1), the ultraviolet rays are not sufficiently absorbed during exposure, and one side of the film substrate (1) The effect of suppressing the exposure of the resist on the other side during the exposure of the resist is not sufficient, and if it is more than 20% by weight, the color tone of the film is deteriorated and discolored to yellow, which is not preferable.

  FIG. 2 is a schematic cross-sectional view of the hard coat film according to the embodiment.

  The hard coat film (2) shown in FIG. 2 is obtained by providing hard coat layers (2a, 2b) on both surfaces of the film substrate (1) shown in FIG.

  The hard coat layer (2a, 2b) contains at least an acrylate-based monomer or oligomer (A), fine particles (B), an organosilicon compound or a condensate thereof (C), and a photopolymerization initiator (D). It is formed by applying and curing a curable resin composition.

  The monomer or oligomer (A) is preferably a resin that can withstand the temperature during drying and maintain transparency. In addition to the mechanical properties and transparency after curing, chemical resistance and heat resistance, as well as various physical properties such as viscosity reduction during coating processing, the monomer or oligomer (A) is specifically 3 It is preferable to use a monomer or oligomer whose main component is a functional or higher acrylate. By using a monomer or oligomer having a tri- or higher functional acrylate as a main component, a three-dimensionally cross-linked resin can be obtained. Examples of tri- or higher functional acrylates include trimethylolpropane triacrylate, isocyanuric acid EO-modified triacrylate, pentaerythritol triacrylate, dipentaerythritol triacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, Ditrimethylolpropane tetraacrylate, pentaerythritol tetraacrylate, polyester acrylate and the like are preferable. Particularly preferred are isocyanuric acid EO-modified triacrylates and polyester acrylates. These may be used alone or in combination of two or more. In addition to these tri- or higher functional acrylates, so-called acrylic resins such as epoxy acrylate and urethane acrylate can be used in combination.

  When the total weight of the acrylate-based monomer or oligomer (A), the fine particles (B), the organosilicon compound or its condensate (C), and the photopolymerization initiator (D) is 100 parts by weight In addition, the addition amount of the monomer or oligomer (A) is 50 to 90 parts by weight. When the addition amount of the monomer or oligomer (A) exceeds this range, the adhesion between the hard coat layer (2a, 2b) and the transparent electrode layer (3a, 3b) decreases. Adhesiveness with a film base material (1) falls.

  As the fine particles (B), for example, inorganic fine particles or polymer fine particles can be used. Examples of inorganic fine particles include silicon dioxide, titanium dioxide, aluminum oxide, zirconium oxide, calcium carbonate, talc, clay, calcined kaolin, calcined calcium silicate, hydrated calcium silicate, aluminum silicate, magnesium silicate and calcium phosphate. Can be mentioned. Of these, silicon dioxide is preferred because it reduces turbidity. Examples of the polymer fine particles include silicone resin, fluororesin, and acrylic resin. Among these, a silicone resin with low turbidity is preferable.

  When the total weight of the acrylate-based monomer or oligomer (A), the fine particles (B), the organosilicon compound or its condensate (C), and the photopolymerization initiator (D) is 100 parts by weight In addition, the addition amount of the fine particles (B) is 0.1 to 1 part by weight. When the addition amount of the fine particles (B) exceeds this range, the hard coat property and transparency are lowered, and when it is less than this range, the anti-blocking property is lowered.

  The average particle size of the fine particles (B) is preferably 0.1 to 10 μm. When the average particle size of the fine particles (B) exceeds this range, the hard coat property and transparency are lowered, and when the average particle size is less than this range, the anti-blocking property is lowered.

  Examples of the organosilicon compound or its condensate (C) include vinyl silanes such as vinyltrichlorosilane, vinyltrimethoxysilane, vinyltriethoxysilane, 3-methacryloxypropylmethyldimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3 -Methacryloxysilane such as methacryloxypropylmethyldiethoxysilane and 3-methacryloxypropyltriethoxysilane, acryloxysilane such as 3-acryloxypropyltrimethoxysilane, and the like can be used. Of these, use of vinyltrimethoxysilane and 3-acryloxypropyltrimethoxysilane is effective.

  When the total weight of the acrylate-based monomer or oligomer (A), the fine particles (B), the organosilicon compound or its condensate (C), and the photopolymerization initiator (D) is 100 parts by weight In addition, the amount of the organosilicon compound or its condensate (C) added is 5 to 50 parts by weight. When the addition amount of the organosilicon compound or the condensate thereof (C) exceeds this range, the hard coat property decreases, and when it falls below this range, the adhesion with the transparent electrode layers (3a, 3b) decreases.

  Examples of the photopolymerization initiator (D) include 2,2-ethoxyacetophenone, 1-hydroxycyclohexyl phenyl ketone, dibenzoyl, benzoin, benzoin methyl ether, benzoin ethyl ether, p-chlorobenzophenone, p-methoxybenzophenone, Michler ketone, Examples include acetophenone and 2-chlorothioxanthone. You may use these individually or in combination of 2 or more types.

  When the total weight of the acrylate-based monomer or oligomer (A), the fine particles (B), the organosilicon compound or its condensate (C), and the photopolymerization initiator (D) is 100 parts by weight In addition, the addition amount of the photopolymerization initiator (D) is 1 to 10 parts by weight. When the addition amount of the photopolymerization initiator (D) exceeds this range, the transparency is lowered, and when it is less than this range, the hard coat property is lowered.

As a method for curing the hard coat layers (2a, 2b), for example, ultraviolet irradiation, heating, or the like can be used. In the case of ultraviolet irradiation, a high pressure mercury lamp, a halogen lamp, a xenon lamp, a fusion lamp, or the like can be used. The amount of ultraviolet irradiation is usually about 100 to 800 mJ / cm ² .

  The film thickness of the hard coat layer (2a, 2b) is preferably in the range of 1 to 10 μm. When the film thickness of the hard coat layer (2a, 2b) exceeds this range, the anti-blocking property decreases, and when it falls below this range, the hard coat property decreases.

  Hard coat layer (2a, 2b) is wet coating method (dip coating method, spin coating method, flow coating method, spray coating method, roll coating method, gravure roll coating method, air doctor coating method, blade coating method, wire doctor Film substrate (1) by coating method, knife coating method, reverse coating method, transfer roll coating method, micro gravure coating method, kiss coating method, cast coating method, slot orifice coating method, calendar coating method, die coating method, etc. Of at least one side.

FIG. 3 is a schematic cross-sectional view showing an embodiment of a transparent conductive film according to the embodiment.
The transparent conductive film (3) shown in FIG. 3 is obtained by providing transparent electrode layers (3a, 3b) on both sides of the hard coat film (2) shown in FIG.

  As materials for the transparent electrode layers (3a, 3b), various materials can be used depending on the properties and applications required for the transparent conductive film (3). For example, as a material of the transparent electrode layer (3a, 3b), any one of indium oxide, zinc oxide, and tin oxide, or two or three kinds of mixed oxides thereof may be used. Further, additives may be added to the above materials.

  The transparent electrode layers (3a, 3b) are formed on at least one side of the hard coat film (2) by a known film formation method. For example, when the transparent electrode layers (3a, 3b) are formed of indium tin oxide (ITO), the transparent electrode layers (3a, 3b) may be formed by a physical vapor deposition method such as vacuum deposition or sputtering, or CVD. It is formed by a chemical vapor deposition method or the like.

  In addition, the transparent conductive film (3) may be provided with another layer between the hard coat layer (2a, 2b) and the transparent electrode layer (3a, 3b). Examples of the other layer include a layer for adjusting visible light transmission characteristics in the transparent conductive film (3).

  The transparent electrode layers (3a, 3b) are patterned into a predetermined shape. For example, the transparent electrode layer (3a) has a pattern in which a plurality of conductive regions extending in the X direction are arranged side by side in the Y direction perpendicular to the X direction. The transparent electrode layer (3b) facing the transparent electrode layer (3a) has a pattern in which a plurality of conductive regions extending in the Y direction are arranged in parallel in the X direction. For example, the conductive region is formed in a linear shape or a shape in which a plurality of rhombuses are connected in one direction. A region between adjacent conductive regions becomes a non-conductive region insulated from the conductive region. Each of the conductive regions is connected to a circuit that detects a change in capacitance formed in the conductive region by a change in current. When a human finger or the like approaches the conductive region, the capacitance changes. Based on the detection of the change in capacitance, the contact position of a human finger or the like is determined.

  The transparent electrode layers (3a, 3b) preferably have a light transmittance of 60% or more at a wavelength of 400 nm and a light transmittance of 20% or less at a wavelength of 365 nm. When the light transmittance is in the above range, when the resist is exposed to ultraviolet rays, the light that has not been absorbed by one resist can be accurately suppressed from reaching the other resist. In order to enhance such effects, it is more preferable that the light transmittance at a wavelength of 400 nm of the film substrate 1 is 80% or more and the light transmittance at a wavelength of 365 nm is 20% or less.

  FIG. 4 is a schematic cross-sectional view showing the embodiment of the touch panel according to the embodiment.

  The touch panel (4) is configured by laminating a cover layer (41) made of glass or the like via an adhesive layer (42) on the transparent electrode layer (3a) on the surface side of the film substrate (1). The The surface of the cover layer (41) is a contact surface such as a human finger. Furthermore, a protective layer (43) is laminated on the transparent electrode layer (3b) on the back side of the substrate (1).

As explained above, the hard coat layer (2a, 2b) of the hard coat film (2), the transparent conductive film (3) and the touch panel (4) according to the present embodiment is
-Monomer or oligomer (A) based on acrylate: 50 to 90 parts by weight,
Fine particles (B): 0.1 to 1 part by weight
Organic silicon compound or condensate thereof (C): 5 to 50 parts by weight
Photopolymerization initiator (D): 1 to 10 parts by weight (provided that the monomer or oligomer (A) mainly composed of acrylate, fine particles (B), organosilicon compound or condensate (C) thereof, light (The total amount with the polymerization initiator (D) is 100 parts by weight)
Is applied and cured by applying a curable resin composition containing at least. By using this curable resin composition, a hard coat having excellent hard coat properties, transparency, anti-blocking properties, adhesion to the transparent electrode layers (3a, 3b), and patterning properties when laminating the transparent electrode layers A film (2), a transparent conductive film (3), and a touch panel (4) can be realized.

  The characteristic which the transparent conductive laminated body mentioned above has is demonstrated using the specific Example given below and a comparative example.

<Example 1>
(1) Production of Hard Coat Film A polyethylene terephthalate film (Teijin DuPont Films Inc .; Tetron HB3-75) was used as a film substrate containing a UV absorber. On this film base material, the coating liquid 1 for forming a hard coat layer having the following composition was applied by a bar coating method so that the film thickness after drying was 5 μm and dried. Then, the hard coat layer was formed by irradiating 600 mJ / cm ² of ultraviolet rays with a high pressure mercury lamp. The same procedure was repeated on the back surface to produce a hard coat film having the layer structure shown in FIG.
[Coating liquid 1 for forming hard coat layer]
Monomer or oligomer: 70 parts by weight of pentaerythritol triacrylate (Kyoeisha Chemical Co., Ltd .; Light Acrylate PE-3A) Fine particles: Silicone fine particles (GE Toshiba Silicone Co., Ltd .; Tospearl 120) 0.5 parts by weight Condensate: 3-acryloxypropyltrimethoxysilane (Shin-Etsu Chemical Co., Ltd .; KBM-5103) 25 parts by weight Photopolymerization initiator: 1-hydroxycyclohexyl phenyl ketone (BASF Japan Co., Ltd .; IRGACURE 184) 4.5 parts by weight・ 100 parts by weight of ethyl acetate

(2) Production of Transparent Conductive Film A transparent electrode layer was formed by forming a transparent electrode layer on the hard coat film produced by the above procedure by a direct current magnetron sputtering method. At this time, ITO containing 10% by weight of tin oxide was used as a sputtering target. Moreover, the thickness of the transparent electrode layer was 20 nm. The same procedure was repeated for the back surface to produce a transparent conductive film on both sides of the hard coat layer.

<Comparative Example 1>
A hard coat film and a transparent conductive film of Comparative Example 1 were prepared by the same procedure as Example 1 except that the hard coat layer forming coating solution 2 having the following composition was used.
[Coating liquid 2 for forming hard coat layer]
-Pentaerythritol triacrylate 70.5 parts by weight-Silicone fine particles 0 parts by weight-3-acryloxypropyltrimethoxysilane 25 parts by weight-1-hydroxycyclohexyl phenyl ketone 4.5 parts by weight-Ethyl acetate 100 parts by weight

<Comparative example 2>
A hard coat film and a transparent conductive film of Comparative Example 2 were produced by the same procedure as in Example 1 except that the coating liquid 3 for forming a hard coat layer having the following composition was used.
[Coating liquid 3 for forming hard coat layer]
Pentaerythritol triacrylate 68.5 parts by weight Silicone fine particles 2 parts by weight 3-acryloxypropyltrimethoxysilane 25 parts by weight 1-hydroxycyclohexyl phenyl ketone 4.5 parts by weight Ethyl acetate 100 parts by weight

<Comparative Example 3>
A hard coat film and a transparent conductive film of Comparative Example 3 were produced by the same procedure as in Example 1 except that the coating liquid 4 for forming a hard coat layer having the following composition was used.
[Coating liquid 4 for forming hard coat layer]
Pentaerythritol triacrylate 94 parts by weight Silicone fine particles 0.5 parts by weight 3-acryloxypropyltrimethoxysilane 1 part by weight 1-hydroxycyclohexyl phenyl ketone 4.5 parts by weight Ethyl acetate 100 parts by weight

<Comparative example 4>
A hard coat film and a transparent conductive film of Comparative Example 4 were produced by the same procedure as in Example 1 except that the coating liquid 5 for forming a hard coat layer having the following composition was used.
[Hardcoat layer forming coating solution 5]
Pentaerythritol triacrylate 35 parts by weight Silicone fine particles 0.5 parts by weight 3-acryloxypropyltrimethoxysilane 60 parts by weight 1-hydroxycyclohexyl phenyl ketone 4.5 parts by weight Ethyl acetate 100 parts by weight

<Comparative Example 5>
A hard coat film and a transparent conductive film of Comparative Example 5 were prepared by the same procedure as in Example 1 except that the hard coat layer forming coating solution 6 having the following composition was used.
[Coating liquid 6 for forming hard coat layer]
Pentaerythritol triacrylate 74 parts by weight Silicone fine particles 0.5 parts by weight 3-acryloxypropyltrimethoxysilane 25 parts by weight 1-hydroxycyclohexyl phenyl ketone 0.5 parts by weight Ethyl acetate 100 parts by weight

<Comparative Example 6>
A hard coat film and a transparent conductive film of Comparative Example 6 were produced by the same procedure as in Example 1 except that the hard coat layer forming coating solution 7 having the following composition was used.
[Coating liquid 7 for forming hard coat layer]
Pentaerythritol triacrylate 59.5 parts by weight Silicone fine particles 0.5 parts by weight 3-acryloxypropyltrimethoxysilane 25 parts by weight 1-hydroxycyclohexyl phenyl ketone 15 parts by weight Ethyl acetate 100 parts by weight

<Comparative Example 7>
The hard coat film of Comparative Example 7 is the same as Example 1 except that a polyethylene terephthalate film (Toray Industries, Inc .; Lumirror T60-75), which is a film containing no UV absorber, is used as the film substrate. And the transparent conductive film was produced.

<Evaluation method>
The performance was evaluated according to the following method for the transparent conductive film of Example 1 and the transparent conductive films of Comparative Examples 1 to 7. The evaluation results are shown in Table 1.

(A) Hard coat property In accordance with JIS-K-5400, scratches on the transparent conductive film were evaluated by a pencil scratch tester. The test was carried out using five pencils having a hardness of 2H, and the evaluation was based on the number of scratches that did not occur.
○: No scratch on all 5 △: No scratch on 3 to 4 ×: No scratch on 0 to 2

(B) Transparency The total light transmittance was measured using a image clarity measuring device (NDH-2000, manufactured by Nippon Denshoku Industries Co., Ltd.).
○: Total light transmittance of 90% or more ×: Total light transmittance of less than 90%

(C) Anti-blocking property A transparent conductive film is cut into a size of 10 cm × 10 cm, the films are overlapped with each other and sandwiched between glass plates, and a load of 250 g / cm ² is applied and 25 ° C./65% RH. The sample was left in an environmental test tank for 24 hours, and the presence or absence of blocking was evaluated.
○: No blocking ×: With blocking

(D) Adhesiveness after reliability test A reliability test was conducted in which the transparent conductive film was put into an environmental test tank of 85 ° C / 85% RH for 240 hours. After conducting the reliability test, the transparent electrode layer surface of the transparent conductive film was cut in a grid pattern so that 1 square is 10 squares × 10 squares = 100 squares, and then an adhesive tape (Nichiban Co., Ltd.) Each cell was subjected to a peel test using a company-made, industrial-use 24 mm wide cello tape (registered trademark), and evaluated by the remaining number of 100 cells (the number of cells where peeling did not occur).
○: All 100 cells remain Δ: 1 cell to 99 cells remain x: 0 cells remain

(E) Patterning property A resist was applied to both surfaces of the transparent conductive film, resist exposure was performed from the front surface under the following exposure conditions, and the presence or absence of photosensitivity of the resist on the back surface side was evaluated.
○: No resist on the back side resist x: Photo resist on the back side [Exposure conditions]
・ Resist: Sunfort AK-4021 (Asahi Kasei E-Materials Corporation)
・ Light source: Ultra-high pressure mercury lamp (USHIO Inc.)
・ Exposure amount: 100 mJ / cm ²

  The transparent conductive film of Example 1 is a hard coat containing pentaerythritol triacrylate, silicone fine particles, 3-acryloxypropyltrimethoxysilane, and 1-hydroxycyclohexyl phenyl ketone on a polyethylene terephthalate film containing an ultraviolet absorber. By forming the layer, it was shown that the hard coat property, transparency, anti-blocking property, adhesion to the transparent electrode layer, and patterning property were good.

  In contrast, the transparent conductive film of Comparative Example 1 that did not contain silicone fine particles in the hard coat layer was insufficient in blocking prevention. The transparent conductive film of Comparative Example 2 in which the content of the silicone fine particles exceeded the above-described range was insufficient in transparency.

  The transparent conductive film of Comparative Example 3 in which the content of 3-acryloxypropyltrimethoxysilane was below the above-described range had insufficient adhesion after the reliability test. The transparent conductive film of Comparative Example 4 in which the content of 3-acryloxypropyltrimethoxysilane exceeds the above-described range has insufficient hard coat properties.

  In the transparent conductive film of Comparative Example 5 in which the content of 1-hydroxycyclohexyl phenyl ketone is lower than the above-described range, the hard coat property was insufficient, and the content of 1-hydroxycyclohexyl phenyl ketone exceeds the above-described range. The transparent conductive film of Comparative Example 6 had insufficient transparency.

  In Comparative Example 7 in which the polyethylene terephthalate film did not contain an ultraviolet absorber, the patterning property at the time of forming the transparent electrode layer was insufficient.

  The present invention can be used for a hard coat film for protecting the surface of a display device or the like, a transparent conductive film provided with a hard coat layer, a touch panel, and the like.

DESCRIPTION OF SYMBOLS 1 Film base material 11 Resin film 12 Ultraviolet absorber 2 Hard coat film 2a Hard coat layer 2b Hard coat layer 3 Transparent conductive film 3a Transparent electrode layer 3b Transparent electrode layer 4 Touch panel 41 Cover layer 42 Adhesive layer 43 Protective layer

Claims (7)

A hard coat film having a hard coat layer on at least one surface of a film substrate containing an ultraviolet absorber,
The hard coat layer is
50 to 90 parts by weight of an acrylate-based monomer or oligomer (A),
0.1 to 1 part by weight of fine particles (B),
5 to 50 parts by weight of an organosilicon compound ( C),
1 to 10 parts by weight of photopolymerization initiator (D) (However, monomer or oligomer (A) mainly composed of acrylate, fine particles (B), organosilicon compound ( C), and photopolymerization initiator (D ) And 100 parts by weight)
Was applied a curable resin composition containing at least state, and are not formed by curing,
The organosilicon compound (C) is represented by Si (OR) ₄ or R ′ _m Si (OR) _4-m (where R and R ′ are organic groups, and m is 1 or 2). organosilicon compound der Rukoto characterized, hard coat film that.   2. The hard coat film according to claim 1, wherein an average particle size of the fine particles (B) is 0.1 μm or more and 10 μm or less. The film substrate, characterized by comprising a polyethylene terephthalate, a hard coat film according to claim 1 or 2. The thickness of the hard coat layer, characterized in that at 1μm or more 10μm or less, a hard coat film according to any one of claims 1-3. Characterized in that said at least the transparent electrode layer is laminated on the hard coat layer, a transparent conductive film of a hard coat film according to any one of claims 1-4. At least a transparent electrode layer is laminated | stacked on each hard-coat layer of the hard-coat film in any one of Claims 1-4 with which the said hard-coat layer was provided in both surfaces of the said film base material, A transparent conductive film. A touch panel provided with the said transparent conductive film of Claim 5 or 6 .

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