JP5754297B2 - Thickness uniformity evaluation method - Google Patents
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Description
本発明は、金属板表面に形成された皮膜の膜厚均一性を評価する膜厚均一性評価方法に関するものである。 The present invention relates to a film thickness uniformity evaluation method for evaluating film thickness uniformity of a film formed on a metal plate surface.
従来より、耐食性などの特性を鋼板等の金属板に付与するために、冷延鋼板や亜鉛めっき鋼板などの様々な種類の鋼板等の金属板表面に種々の皮膜を塗布することが行われている。しかしながら、一般に皮膜は複雑な成分によって形成されているために、皮膜の塗布条件や乾燥条件によっては皮膜の膜厚が金属板表面の面内方向で不均一になることがある。皮膜の膜厚が不均一である場合、皮膜の外観や金属板の耐食性などに悪影響が生じる。このため、金属板表面に皮膜を塗布する際には、皮膜の膜厚均一性を評価する必要がある。このような背景から、近年、皮膜の膜厚均一性を評価する方法が提案されている。具体的には、特許文献１には、皮膜が形成された基材に光を照射し、光の透過量を測定することによって皮膜の膜厚均一性を評価する方法が開示されている。また、特許文献２には、皮膜の静電容量に基づいて皮膜の膜厚均一性を評価する方法が開示されている。 Conventionally, in order to impart characteristics such as corrosion resistance to metal plates such as steel plates, various coatings have been applied to the surface of metal plates such as various types of steel plates such as cold-rolled steel plates and galvanized steel plates. Yes. However, since the film is generally formed of complex components, the film thickness of the film may become uneven in the in-plane direction of the metal plate surface depending on the coating conditions and drying conditions of the film. When the film thickness is not uniform, the appearance of the film and the corrosion resistance of the metal plate are adversely affected. For this reason, when apply | coating a membrane | film | coat to the metal plate surface, it is necessary to evaluate the film thickness uniformity of a membrane | film | coat. Against this background, in recent years, methods for evaluating the film thickness uniformity of the coating have been proposed. Specifically, Patent Document 1 discloses a method for evaluating film thickness uniformity by irradiating a base material on which a film is formed and measuring the amount of transmitted light. Patent Document 2 discloses a method for evaluating the film thickness uniformity of a film based on the capacitance of the film.
しかしながら、特許文献１記載の評価方法は、光の透過量を用いて皮膜の膜厚均一性を評価するものであるために、皮膜および基材が光を透過しない場合には、皮膜の膜厚均一性を評価することができない。また、特許文献２記載の評価方法は、数ｍｍ以上の広がりを有する膜厚分布しか測定することができない。すなわち、特許文献１，２記載の評価方法では、光を透過しない皮膜および基材であって、膜厚分布の広がりが１００［μｍ］以下の目視できない範囲内にある皮膜の膜厚均一性を評価することができない。 However, since the evaluation method described in Patent Document 1 evaluates the film thickness uniformity of the film using the amount of transmitted light, the film thickness of the film is not used when the film and the substrate do not transmit light. Uniformity cannot be evaluated. Moreover, the evaluation method described in Patent Document 2 can measure only a film thickness distribution having a spread of several mm or more. That is, in the evaluation methods described in Patent Documents 1 and 2, the film thickness uniformity of the film and the base material that do not transmit light and the spread of the film thickness distribution is in an invisible range of 100 [μm] or less. Cannot be evaluated.
なお、このような問題点を解決するために、例えば機械研磨や収束イオンビーム法などを利用して断面観察用試料を作製し、光学顕微鏡や電子顕微鏡を利用して皮膜の膜厚均一性を評価する方法を用いることが考えられる。しかしながら、この方法では、試料の前処理に多くの労力および時間を要する上に、試料の部分領域における断面を観察して膜厚均一性を評価することになるために、評価結果が試料の全ての領域に適用できるとは限らない。一方、２次元で皮膜の膜厚分布を評価する方法として、電子プローブマイクロアナライザ（ＥＰＭＡ）や走査電子顕微鏡（ＳＥＭ）に付属している波長分散型Ｘ線分光器あるいはエネルギー分散型Ｘ線分光器を利用したＸ線分光法が知られている。このＸ線分光法を利用して皮膜の膜厚均一性を評価した場合、断面観察試料を作製する場合と比較して、試料の前処理に要する労力を大幅に削減することができる。しかしながら、Ｘ線分光法を利用して膜厚均一性を評価する場合には、１視野あたり数十分から数時間程度の測定時間が必要になるために、膜厚均一性の評価に多くの時間を要する。 In order to solve such problems, for example, a sample for cross-sectional observation is prepared using mechanical polishing or a focused ion beam method, and the film thickness uniformity is obtained using an optical microscope or an electron microscope. It is conceivable to use an evaluation method. However, this method requires a lot of labor and time for the sample pretreatment and also evaluates the film thickness uniformity by observing the cross section in the partial region of the sample. It is not always applicable to the area. On the other hand, as a method for evaluating the film thickness distribution in two dimensions, a wavelength dispersive X-ray spectrometer or an energy dispersive X-ray spectrometer attached to an electron probe microanalyzer (EPMA) or a scanning electron microscope (SEM) An X-ray spectroscopy method utilizing the above is known. When the film thickness uniformity of the film is evaluated using this X-ray spectroscopy, the labor required for the pretreatment of the sample can be greatly reduced as compared with the case of producing a cross-sectional observation sample. However, when evaluating film thickness uniformity using X-ray spectroscopy, a measurement time of several tens of minutes to several hours is required per field of view. It takes time.
本発明は、上記課題に鑑みてなされたものであって、その目的は、光を透過しない皮膜および基材であって、膜厚分布の広がりが１００［μｍ］以下の目視できない範囲内にある皮膜の膜厚均一性を簡便、且つ、迅速に評価可能な膜厚均一性評価方法を提供することにある。 The present invention has been made in view of the above-described problems, and the object thereof is a film and a substrate that do not transmit light, and the spread of the film thickness distribution is in an invisible range of 100 [μm] or less. It is an object of the present invention to provide a film thickness uniformity evaluation method that can easily and quickly evaluate the film thickness uniformity of a film.
上記課題を解決し、目的を達成するために、本発明に係る膜厚均一性評価方法は、金属板表面に形成された皮膜の膜厚均一性を評価する膜厚均一性評価方法であって、グロー放電発光分光法を利用して金属板の構成元素の深さ方向のプロファイルを測定する測定ステップと、前記測定ステップにおいて測定されたプロファイルの形状を近似する関数を算出する算出ステップと、前記算出ステップにおいて算出された関数を用いて前記皮膜の膜厚均一性を評価する評価ステップと、を含むことを特徴とする。 In order to solve the above problems and achieve the object, the film thickness uniformity evaluation method according to the present invention is a film thickness uniformity evaluation method for evaluating film thickness uniformity of a film formed on a metal plate surface. A measurement step of measuring the profile in the depth direction of the constituent elements of the metal plate using glow discharge emission spectroscopy, a calculation step of calculating a function approximating the shape of the profile measured in the measurement step, And an evaluation step of evaluating the film thickness uniformity of the film using the function calculated in the calculation step.
本発明に係る膜厚均一性評価方法は、上記の発明において、前記関数が、Ｈｉｌｌ関数であり、前記評価ステップが、前記算出ステップにおいて算出されたＨｉｌｌ関数のＨｉｌｌ係数を用いて前記皮膜の膜厚均一性を評価するステップを含むことを特徴とする。 In the film thickness uniformity evaluation method according to the present invention, in the above invention, the function is a Hill function, and the evaluation step uses the Hill coefficient of the Hill function calculated in the calculation step. The method includes a step of evaluating thickness uniformity.
本発明に係る膜厚均一性評価方法は、上記の発明において、前記評価ステップが、標準試料について算出された関数と評価対象の試料について算出された関数とを比較することによって、該評価対象の試料における前記皮膜の膜厚均一性を評価するステップを含むことを特徴とする。 In the film thickness uniformity evaluation method according to the present invention, in the above invention, the evaluation step compares the function calculated for the standard sample with the function calculated for the sample to be evaluated. The method includes a step of evaluating film thickness uniformity of the film in the sample.
本発明に係る膜厚均一性評価方法によれば、光を透過しない皮膜および基材であって、膜厚分布の広がりが１００［μｍ］以下の目視できない範囲内にある皮膜の膜厚均一性を簡便、且つ、迅速に評価することができる。 According to the method for evaluating film thickness uniformity according to the present invention, the film thickness uniformity of a film and a substrate that do not transmit light and whose film thickness distribution is in an invisible range of 100 [μm] or less. Can be evaluated easily and quickly.
以下、図面を参照して、本発明に係る膜厚均一性評価方法について説明する。 Hereinafter, the method for evaluating film thickness uniformity according to the present invention will be described with reference to the drawings.
本発明の発明者らは、鋼板に形成された膜厚分布の度合いが異なる複数の皮膜についてグロー放電発光分光法（ＧＤＳ）を用いた深さ方向分析を行った結果、鋼板の構成元素であるＦｅの深さ方向ＧＤＳプロファイル（発光強度とスパッタ時間との関係）の皮膜／鋼板界面に対応する領域の広がりが皮膜間で異なることを知見した。そして、本発明の発明者らは、Ｆｅの深さ方向ＧＤＳプロファイルの皮膜／鋼板界面に対応する領域の広がりを皮膜の膜厚均一性の評価指標として用いることによって、光を透過しない皮膜および基材であって、膜厚分布の広がりが１００［μｍ］以下の目視できない範囲内にある皮膜の膜厚均一性を簡便、且つ、迅速に評価できることを見出した。 The inventors of the present invention are constituent elements of a steel sheet as a result of depth direction analysis using glow discharge emission spectroscopy (GDS) for a plurality of coatings having different thickness distributions formed on the steel sheet. It was found that the extent of the region corresponding to the coating / steel interface of the GDS profile in the depth direction of Fe (relation between emission intensity and sputtering time) differs between coatings. Then, the inventors of the present invention use the spread of the region corresponding to the film / steel interface of the GDS profile in the depth direction of Fe as an evaluation index for the film thickness uniformity of the film, so that the film and substrate that do not transmit light are used. It was found that the film thickness uniformity of the film in the invisible range of 100 [μm] or less can be evaluated easily and quickly.
具体的には、板厚１．２［ｍｍ］の鋼板（ＳＰＣＧ（ＪＩＳ Ｇ ３１４１（２００９））を幅１５０［ｍｍ］および長さ３００［ｍｍ］の大きさに切り出した鋼板試料表面に対してシリカと樹脂成分とから成る処理液をロールコーターで塗布し、熱風焼き付け炉によって焼き付け温度（到達鋼板温度）２５０［℃］で焼き付けた後、常温に放冷することによって、皮膜付着量０．５［ｇ／ｍ２］の皮膜を鋼板試料表面上に形成した。そして、このようにして作製した皮膜の膜厚分布をＥＰＭＡ装置で評価した。ＥＰＭＡ装置は日本電子（株）製ＪＸＡ−８１００を用い、測定条件は以下の通りとした。 Specifically, a steel plate sample surface having a thickness of 1.2 [mm] (SPCG (JIS G 3141 (2009)) cut into a width of 150 [mm] and a length of 300 [mm] is obtained. A treatment liquid composed of silica and a resin component is applied by a roll coater, baked in a hot air baking furnace at a baking temperature (attained steel plate temperature) of 250 [° C.], and then allowed to cool to room temperature, whereby a coating amount of 0.5 is applied. A film of [g / m 2 ] was formed on the surface of the steel sheet sample, and the film thickness distribution of the film thus prepared was evaluated with an EPMA apparatus, which was manufactured by JEOL Ltd. JXA-8100. The measurement conditions used were as follows.
〔測定条件〕
加速電圧：１０［ｋＶ］
入射電子電流：０．１［μＡ］
プローブ径：最小サイズ（１［μｍ］程度）
Ｄｗｅｌｌ時間：５０［ｍｓ］
測定間隔：０．５［μｍ］
測定点数：縦３００［個］×横３００［個］
〔Measurement condition〕
Acceleration voltage: 10 [kV]
Incident electron current: 0.1 [μA]
Probe diameter: Minimum size (about 1 [μm])
Dwell time: 50 [ms]
Measurement interval: 0.5 [μm]
Number of measurement points: 300 [pieces] x 300 [pieces]
ＥＰＭＡ装置で皮膜の膜厚分布を評価したところ、皮膜構成元素であるＳｉのマッピング結果はほとんどの試料において図１（ａ）に示すようになり、皮膜の均一な膜厚分布が確認された。しかしながら、一部の試料ではＳｉのマッピング結果は図１（ｂ）に示すようになり、皮膜の不均一な膜厚分布が確認された。そこで、各試料について試料の皮膜下にある鋼板素地の構成元素であるＦｅの深さ方向ＧＤＳプロファイルをＧＤＳ装置で評価した。その結果、図２に示すように、皮膜の膜厚分布が均一な試料から得られたＦｅの深さ方向ＧＤＳプロファイルＰ１の立ち上がりが、皮膜の膜厚分布が不均一な試料から得られたＦｅの深さ方向ＧＤＳプロファイルＰ２の立ち上がりよりも急峻であることが確認された。 When the film thickness distribution of the film was evaluated with an EPMA apparatus, the mapping result of Si, which is a film constituent element, was as shown in FIG. 1A in most samples, and a uniform film thickness distribution of the film was confirmed. However, in some samples, the Si mapping result was as shown in FIG. 1B, and a non-uniform film thickness distribution was confirmed. Therefore, for each sample, the GDS profile in the depth direction of Fe, which is a constituent element of the steel sheet substrate under the sample coating, was evaluated using a GDS apparatus. As a result, as shown in FIG. 2, the rise of the GDS profile P1 in the depth direction of Fe obtained from a sample with a uniform film thickness distribution is an Fe obtained from a sample with a non-uniform film thickness distribution. It was confirmed that it was steeper than the rise of the GDS profile P2 in the depth direction.
これは、皮膜の膜厚分布が不均一である場合、皮膜の膜厚が薄い部分と皮膜の膜厚が厚い部分とでは鋼板が露出するまでの時間が異なるために、Ｆｅの発光強度のばらつきが大きくなり、結果として、Ｆｅの深さ方向ＧＤＳプロファイルの立ち上がりが皮膜の膜厚が均一である場合に比べて緩慢になるためであると考えられる。従って、鋼板素地の構成元素の深さ方向ＧＤＳプロファイルの立ち上がりの急峻さを指標とすることによって、皮膜の膜厚均一性を評価することができる。なお、ＧＤＳ装置としては、理学電機工業（株）製Ｓｙｓｔｅｍ３５８０を用い、直流モード，電極サイズφ４［ｍｍ］，Ａｒガス流量２５０［ｃｃ／ｍｉｎ］，電流２０［ｍＡ］で測定した。また、測定に要した時間は、ＥＰＭＡ装置で７５［分］程度であったのに対して、ＧＤＳ装置では６０［秒］となり、大幅に短縮することができる。 This is because when the film thickness distribution is non-uniform, the time until the steel sheet is exposed differs between the thin film thickness part and the thick film thickness part. As a result, the rise of the GDS profile in the depth direction of Fe is considered to be slower than when the film thickness is uniform. Therefore, the film thickness uniformity of the film can be evaluated by using the steepness of the rise of the depth direction GDS profile of the constituent elements of the steel sheet substrate as an index. As a GDS apparatus, a System 3580 manufactured by Rigaku Denki Kogyo Co., Ltd. was used, and measurement was performed in a DC mode, an electrode size φ4 [mm], an Ar gas flow rate 250 [cc / min], and a current 20 [mA]. The time required for the measurement is about 75 [minutes] with the EPMA apparatus, but is 60 [seconds] with the GDS apparatus, which can be greatly reduced.
次に、本発明の発明者らは、深さ方向ＧＤＳプロファイルの立ち上がりの急峻さを定量的に測定する方法について検討した。その結果、図３に示すように、深さ方向ＧＤＳプロファイルＰは、Ｈｉｌｌ関数Ｆで近似できることを知見した。Ｈｉｌｌ関数はタンパク質や酵素の反応の近似式としてよく用いられている関数であり、以下に示す数式（１）のように表すことができる。以下に示す数式（１）中のパラメータ“Ｈｉｌｌ係数”は、深さ方向ＧＤＳプロファイルＰの立ち上がりの急峻さを表す数値であり、その値が大きいほど、皮膜の膜厚分布が均一であるといえる。以上のことから、皮膜の膜厚均一性が高い標準試料から求められたＨｉｌｌ係数と評価対象の試料から求められたＨｉｌｌ係数とを比較することによって、評価対象の試料における皮膜の膜厚均一性を評価することができる。
なお、上述の評価では、Ｈｉｌｌ関数を用いて皮膜の膜厚均一性を評価したが、例えばシグモイド関数などのＨｉｌｌ関数以外の関数で深さ方向ＧＤＳプロファイルを近似し、Ｈｉｌｌ関数以外の関数で同様にして皮膜の膜厚均一性を評価してもよい。また、上述の評価では、関数の係数値を比較することによって皮膜の膜厚均一性を評価したが、算出された関数の積分値を用いて皮膜の膜厚均一性を評価してもよい。さらに、この場合、関数を算出しなくても深さ方向ＧＤＳプロファイルの強度の積算値を積分値の代わりとして求めるようにしてもよい。 In the above evaluation, the film thickness uniformity was evaluated using the Hill function. For example, the GDS profile in the depth direction is approximated by a function other than the Hill function such as a sigmoid function, and the function other than the Hill function is the same. Then, the film thickness uniformity of the film may be evaluated. In the above evaluation, the film thickness uniformity of the film was evaluated by comparing the coefficient values of the functions. However, the film thickness uniformity of the film may be evaluated using the calculated integral value of the function. Furthermore, in this case, the integrated value of the intensity of the depth direction GDS profile may be obtained instead of the integrated value without calculating the function.
〔実施例〕
板厚１．２［ｍｍ］の鋼板（ＳＰＣＧ（ＪＩＳ Ｇ ３１４１（２００９））を幅１５０［ｍｍ］および長さ３００［ｍｍ］の大きさに切り出した鋼板試料表面に対してシリカと樹脂成分とから成る処理液をロールコーターで塗布し、熱風焼き付け炉によって焼き付け温度（到達鋼板温度）２５０［℃］で焼き付けた後、常温に放冷することによって、皮膜付着量０．５［ｇ／ｍ２］の皮膜を鋼板試料表面上に形成した。そして、このようにして作製した皮膜付き鋼板から３０ｍｍ角の小片を実施例の試料として切り出し、Ｆｅの深さ方向ＧＤＳプロファイルをＧＤＳ装置で評価した。ＧＤＳ装置は理学電機工業（株）製Ｓｙｓｔｅｍ３５８０を用い、測定条件は以下の通りとした。また、測定されたＦｅの深さ方向ＧＤＳプロファイルをＨｉｌｌ関数で近似し、近似されたＨｉｌｌ関数のＨｉｌｌ係数を皮膜の膜厚均一性の評価指標として算出した。
〔Example〕
A steel plate (SPCG (JIS G 3141 (2009)) with a thickness of 1.2 [mm] was cut into a size of 150 [mm] in width and 300 [mm] in length with silica and a resin component. The coating liquid was applied with a roll coater, baked in a hot air baking furnace at a baking temperature (attained steel plate temperature) of 250 [° C.], and then allowed to cool to room temperature, whereby a coating amount of 0.5 [g / m 2 A 30 mm square piece was cut out from the steel sheet with the coating thus prepared as an example sample, and the GDS profile in the depth direction of Fe was evaluated with a GDS apparatus. The GDS apparatus used was System 3580 manufactured by Rigaku Denki Kogyo Co., Ltd., and the measurement conditions were as follows, and the measured Fe depth direction GDS profile was Hi. The Hill coefficient of the approximated Hill function was calculated as an evaluation index of the film thickness uniformity.
〔測定条件〕
測定モード：直流モード
電極サイズ：φ４［ｍｍ］
Ａｒガス流量：２５０［ｃｃ／ｍｉｎ］
電流：２０［ｍＡ］
〔Measurement condition〕
Measurement mode: DC mode Electrode size: φ4 [mm]
Ar gas flow rate: 250 [cc / min]
Current: 20 [mA]
〔比較例〕
板厚１．２［ｍｍ］の鋼板（ＳＰＣＧ（ＪＩＳ Ｇ ３１４１（２００９））を幅１５０［ｍｍ］および長さ３００［ｍｍ］の大きさに切り出した鋼板試料表面に対してシリカと樹脂成分とから成る処理液をロールコーターで塗布し、熱風焼き付け炉によって焼き付け温度（到達鋼板温度）２５０［℃］で焼き付けた後、常温に放冷することによって、皮膜付着量０．５［ｇ／ｍ２］の皮膜を鋼板試料表面上に形成した。そして、このようにして作製した皮膜付き鋼板から１０ｍｍ角の小片を比較例の試料として切り出し、この比較例の試料の表面におけるＳｉ強度分布をＥＰＭＡ装置で評価した。ＥＰＭＡ装置は日本電子（株）製ＪＸＡ−８１００を用い、測定条件は以下の通りとした。また、測定されたＳｉ強度分布からＳｉ強度の標準偏差を皮膜の膜厚均一性の評価指標として算出した。
[Comparative Example]
A steel plate (SPCG (JIS G 3141 (2009)) with a thickness of 1.2 [mm] was cut into a size of 150 [mm] in width and 300 [mm] in length with silica and a resin component. The coating liquid was applied with a roll coater, baked in a hot air baking furnace at a baking temperature (attained steel plate temperature) of 250 [° C.], and then allowed to cool to room temperature, whereby a coating amount of 0.5 [g / m 2 Then, a 10 mm square piece was cut out from the steel sheet with the coating prepared in this way as a sample of the comparative example, and the Si intensity distribution on the surface of the sample of this comparative example was measured with an EPMA apparatus. The EPMA apparatus used was JXA-8100 manufactured by JEOL Ltd., and the measurement conditions were as follows: From the measured Si intensity distribution, the standard deviation of Si intensity was measured. The difference was calculated as an evaluation index for the film thickness uniformity of the film.
〔測定条件〕
加速電圧：１０［ｋＶ］
入射電子電流：０．１［μＡ］
プローブ径：最小サイズ（１［μｍ］程度）
Ｄｗｅｌｌ時間：５０［ｍｓ］
測定間隔：０．５［μｍ］
測定点数：縦３００［個］×横３００［個］
〔Measurement condition〕
Acceleration voltage: 10 [kV]
Incident electron current: 0.1 [μA]
Probe diameter: Minimum size (about 1 [μm])
Dwell time: 50 [ms]
Measurement interval: 0.5 [μm]
Number of measurement points: 300 [pieces] x 300 [pieces]
〔評価〕
表１に、皮膜の付着量とＨｉｌｌ係数およびＳｉ強度の標準偏差との関係を示す。また、図４にＨｉｌｌ係数とＳｉ強度の標準偏差との関係を示す。図４から明らかなように、Ｈｉｌｌ係数とＳｉ強度の標準偏差とは相関関係にあり、Ｓｉ強度の標準偏差が小さい、すなわち皮膜の膜厚均一性が高いほど、Ｈｉｌｌ係数は大きくなる。一方、Ｓｉ強度の標準偏差が大きい、すなわち皮膜の膜厚均一性が低いほど、Ｈｉｌｌ係数が大きくなる。従って、Ｆｅの深さ方向ＧＤＳプロファイルをＨｉｌｌ関数で近似したときのＨｉｌｌ係数を用いることによって、皮膜の膜厚均一性を評価することができる。
[Evaluation]
Table 1 shows the relationship between the coating amount, the Hill coefficient, and the standard deviation of the Si intensity. FIG. 4 shows the relationship between the Hill coefficient and the standard deviation of Si intensity. As is clear from FIG. 4, the Hill coefficient and the standard deviation of the Si intensity have a correlation, and the smaller the standard deviation of the Si intensity, that is, the higher the film thickness uniformity, the larger the Hill coefficient. On the other hand, the larger the standard deviation of Si strength, that is, the lower the film thickness uniformity, the higher the Hill coefficient. Therefore, the film thickness uniformity of the film can be evaluated by using the Hill coefficient when the GDS profile in the depth direction of Fe is approximated by a Hill function.
Claims (2)
グロー放電発光分光法を利用して金属板の構成元素の深さ方向の発光強度とスパッタ時間との関係を示すＧＤＳプロファイルを測定する測定ステップと、
前記測定ステップにおいて測定されたＧＤＳプロファイルの形状を近似する関数を算出する算出ステップと、
前記算出ステップにおいて算出された関数を用いて前記皮膜の膜厚均一性を評価する評価ステップと、
を含み、
前記関数は、Ｈｉｌｌ関数であり、前記評価ステップは、前記算出ステップにおいて算出されたＨｉｌｌ関数のＨｉｌｌ係数を用いて前記皮膜の膜厚均一性を評価するステップを含むことを特徴とする膜厚均一性評価方法。 A film thickness uniformity evaluation method for evaluating film thickness uniformity of a film formed on a metal plate surface,
A measurement step of measuring a GDS profile indicating the relationship between the emission intensity in the depth direction of the constituent elements of the metal plate and the sputtering time using glow discharge emission spectroscopy;
A calculating step for calculating a function approximating the shape of the GDS profile measured in the measuring step;
An evaluation step of evaluating the film thickness uniformity of the film using the function calculated in the calculation step;
Including
The function is a Hill function, and the evaluation step includes a step of evaluating film thickness uniformity of the film using a Hill coefficient of the Hill function calculated in the calculation step. Sex assessment method.
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