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JP5695509B2 - Superconducting wire and method for manufacturing the same - Google Patents

Superconducting wire and method for manufacturing the same Download PDF

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JP5695509B2
JP5695509B2 JP2011137346A JP2011137346A JP5695509B2 JP 5695509 B2 JP5695509 B2 JP 5695509B2 JP 2011137346 A JP2011137346 A JP 2011137346A JP 2011137346 A JP2011137346 A JP 2011137346A JP 5695509 B2 JP5695509 B2 JP 5695509B2
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智 羽生
智 羽生
飯島 康裕
康裕 飯島
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Description

本発明は、超電導線材およびその製造方法に関する。   The present invention relates to a superconducting wire and a method for manufacturing the same.

近年になって発見されたRE−123系酸化物超電導体(REBaCu7−X:REは希土類元素)は、液体窒素温度以上で超電導性を示すことから実用上極めて有望な素材とされており、これを線材に加工して電力供給用の導体として用いることが強く要望されている。中でも、Y系酸化物超電導体(YBaCu7−X)やGd系酸化物超電導体(GdBaCu7−X)を用いた超電導線材は、外部磁界に対して強く、強磁界内でも高い電流密度を維持することができるため、超電導コイル用導体としての利用、あるいは電力供給用ケーブルとしての利用の他、超電導線材への通電時に発生するおそれのある故障電流の遮断を目的とした超電導限流器用の導体としての研究開発も進められている。 The RE-123 oxide superconductor (REBa 2 Cu 3 O 7-X : RE is a rare earth element) discovered in recent years exhibits superconductivity at a liquid nitrogen temperature or higher, and is therefore an extremely promising material for practical use. There is a strong demand for processing this into a wire and using it as a conductor for power supply. Among these, superconducting wires using a Y-based oxide superconductor (YBa 2 Cu 3 O 7-X ) or a Gd-based oxide superconductor (GdBa 2 Cu 3 O 7-X ) are strong against an external magnetic field and strong. High current density can be maintained even in a magnetic field, so that it can be used as a conductor for superconducting coils or as a power supply cable, or to cut off fault currents that may occur when energizing a superconducting wire. Research and development as a conductor for the superconducting fault current limiter is also underway.

この種のRE−123系酸化物超電導線材の一構造例として、図10に示す如くテープ状の金属基材101上に、IBAD(Ion-Beam-Assisted Deposition;イオンビームアシスト蒸着)法によって成膜された中間層102と、その上に成膜されたキャップ層103と、酸化物超電導層104とを積層形成した超電導線材100が知られている(例えば、特許文献1参照。)。
前記構造においてキャップ層103の結晶面内配向性が高い方が、更にその上に成膜される酸化物超電導層104も高い結晶配向性となり、この酸化物超電導層104の結晶面内配向性が高くなる程、臨界電流値等の超電導特性が優れた超電導線材100を得ることができる。
As an example of the structure of this type of RE-123 oxide superconducting wire, a film is formed on a tape-like metal substrate 101 by IBAD (Ion-Beam-Assisted Deposition) as shown in FIG. There is known a superconducting wire 100 in which an intermediate layer 102 formed thereon, a cap layer 103 formed thereon, and an oxide superconducting layer 104 are laminated (see, for example, Patent Document 1).
In the above structure, the higher the in-plane orientation of the cap layer 103, the higher the oxide superconducting layer 104 formed thereon, and the higher the in-plane orientation of the oxide superconducting layer 104. The higher the value, the higher the superconducting wire material 100 having excellent superconducting properties such as the critical current value.

IBAD法は、スパッタリング法によりターゲットから叩き出した構成粒子を基材上に堆積させる際に、イオンガンから発生された希ガスイオンと酸素イオンとの混合イオンを同時に斜め方向(例えば45度)から照射しながら堆積させるもので、この方法によれば、基材上に厚さ数〜数十nmという薄膜の中間層102を良好な結晶配向性で形成することができる。
図10に示す構造の超電導線材100において、中間層102及びキャップ層103は、酸化物超電導層104の結晶配向性を整え、成膜時の加熱処理に伴う元素の不要拡散を抑制するとともに、金属基材101と酸化物超電導層104の中間の膨張係数を有して熱ストレスを緩和するなどの複合的な効果を得るための層であって、これらの層を順序に積層することで始めて単結晶に近い結晶配向性であって、超電導特性の優れた酸化物超電導層104を得ることができる。
The IBAD method irradiates mixed ions of rare gas ions and oxygen ions generated from an ion gun simultaneously from an oblique direction (for example, 45 degrees) when depositing constituent particles knocked out of a target by a sputtering method on a substrate. According to this method, the thin intermediate layer 102 having a thickness of several to several tens of nm can be formed on the substrate with good crystal orientation.
In the superconducting wire 100 having the structure shown in FIG. 10, the intermediate layer 102 and the cap layer 103 adjust the crystal orientation of the oxide superconducting layer 104, suppress unnecessary diffusion of elements accompanying heat treatment during film formation, A layer having an intermediate expansion coefficient between the base material 101 and the oxide superconducting layer 104 to obtain a combined effect such as relieving thermal stress. The layer is formed by laminating these layers in order. An oxide superconducting layer 104 having crystal orientation close to crystals and excellent superconducting characteristics can be obtained.

特開2004−71359号公報JP 2004-71359 A

上述のように金属基材上に中間層やキャップ層を介して酸化物超電導層が積層された超電導線材は、線材の製造工程や超電導コイルへの加工工程などにおいて、線材に対して応力や衝撃が負荷された場合に、酸化物超電導層がその下のキャップ層から剥離したり、酸化物超電導層にクラックが生じる場合がある。酸化物超電導層に剥離やクラックが生じると、線材の幅方向全体に亘って剥離やクラックが伝搬しやすい傾向がある。   As described above, a superconducting wire in which an oxide superconducting layer is laminated on a metal substrate via an intermediate layer or a cap layer is used for stress or impact on the wire in the manufacturing process of the wire or the processing of the superconducting coil. When an oxide is loaded, the oxide superconducting layer may be peeled off from the cap layer below it, or a crack may be generated in the oxide superconducting layer. When peeling or cracking occurs in the oxide superconducting layer, peeling or cracking tends to propagate over the entire width direction of the wire.

本発明は、以上のような従来の実情に鑑みなされたものであり、超電導層に剥離やクラックが部分的に発生した場合であっても、剥離やクラックが超電導層全体に伝搬することを抑制できる超電導線材およびその製造方法を提供することを目的とする。   The present invention has been made in view of the conventional situation as described above, and suppresses the propagation of cracks and cracks throughout the superconducting layer even when the cracks and cracks are partially generated in the superconducting layer. An object of the present invention is to provide a superconducting wire that can be produced and a method for producing the same.

上記課題を解決するため、本発明の超電導線材は、基材の上方に中間層と酸化物超電導層と安定化層とがこの順に積層されて超電導積層体が構成され、前記基材側から少なくとも前記酸化物超電導層まで達するように該超電導積層体の幅方向および長さ方向に分散形成された複数の貫通部を備えることを特徴とする。
本発明の超電導線材は、基材側から酸化物超電導層まで達する貫通部を備える構成である。そのため、万が一酸化物超電導層で部分的に剥離やクラックが発生した場合に、剥離やクラックを貫通部に集中させて、酸化物超電導層の貫通部が形成された箇所以外の部分に剥離やクラックが伝搬することを抑制できる。
To solve the above problems, the superconducting wire of the present invention, the intermediate layer and the oxide superconducting layer and the stabilizing layer are laminated in this order is composed superconducting laminate over the substrate, before Kimoto material side It has a plurality of penetrating portions dispersedly formed in the width direction and the length direction of the superconducting laminate so as to reach at least the oxide superconducting layer.
The superconducting wire of the present invention has a structure including a penetrating portion reaching from the base material side to the oxide superconducting layer. Therefore, in the unlikely event that peeling or cracking occurs partially in the oxide superconducting layer, the peeling or cracking is concentrated on the penetrating part, and peeling or cracking occurs in parts other than where the penetrating part of the oxide superconducting layer is formed. Can be prevented from propagating.

本発明の超電導線材において、前記貫通部の内部が充填材により充填されていることが好ましい。
この場合、貫通溝に充填材が充填されて貫通部が構成されることにより、貫通部を介して酸化物超電導層に水分が浸入することを抑制でき、水分により酸化物超電導層が劣化し難いので、良好な特性の超電導線材となる。
In the superconducting wire of the present invention, it is preferable that the inside of the through portion is filled with a filler.
In this case, when the through groove is filled with the filler and the through portion is configured, it is possible to prevent moisture from entering the oxide superconducting layer through the through portion, and the oxide superconducting layer is hardly deteriorated by the water. Therefore, it becomes a superconducting wire having good characteristics.

上記課題を解決するため、本発明の超電導線材の製造方法は、基材の上方に中間層と酸化物超電導層と安定化層とがこの順に積層された超電導積層体に対し、前記基材側から少なくとも前記酸化物超電導層まで達するように複数の穴または溝を加工して、複数の貫通部を該超電導積層体の幅方向および長さ方向に分散形成することを特徴とする
発明の超電導線材の製造方法によれば、基材側から酸化物超電導層まで達する貫通部を備えた超電導線材を製造できる。本発明の超電導線材の製造方法により製造される超電導線材は、貫通部を備える構成であるため、万が一酸化物超電導層で部分的に剥離やクラックが発生した場合であって、酸化物超電導層の貫通部が形成された箇所以外の部分に剥離やクラックが伝搬することを抑制できる。
To solve the above problems, the method of manufacturing a superconducting wire of the present invention, with respect to the intermediate layer and the oxide superconducting layer and the stabilizing layer and the superconducting laminate are laminated in this order over the substrate, before Kimotozai A plurality of holes or grooves are processed so as to reach at least the oxide superconducting layer from the side, and a plurality of through portions are dispersedly formed in the width direction and the length direction of the superconducting laminate .
According to the method for producing a superconducting wire of the present invention, a superconducting wire having a penetrating portion extending from the base material side to the oxide superconducting layer can be produced. Since the superconducting wire manufactured by the method for manufacturing a superconducting wire of the present invention has a structure including a penetrating portion, in the unlikely event that partial peeling or cracking occurs in the oxide superconducting layer, the oxide superconducting layer It is possible to suppress peeling and cracks from propagating to a portion other than the portion where the penetrating portion is formed.

本発明の超電導線材の製造方法において、前記貫通部の内部を充填材により充填することもできる。
この場合、貫通溝を充填材で充填して貫通部を形成することにより、貫通部を介して酸化物超電導層に水分が浸入することを抑制でき、水分により酸化物超電導層が劣化し難いので、良好な特性の超電導線材を提供できる。
In the method of manufacturing a superconducting wire according to the present invention, the inside of the through portion can be filled with a filler.
In this case, by filling the through groove with a filler to form the through portion, it is possible to suppress moisture from entering the oxide superconducting layer through the through portion, and the oxide superconducting layer is unlikely to deteriorate due to moisture. A superconducting wire having good characteristics can be provided.

本発明によれば、仮に超電導層に剥離やクラックが部分的に発生した場合であっても、剥離やクラックが超電導層全体に伝搬することを貫通部の存在により抑制できる超電導線材およびその製造方法を提供できる。   According to the present invention, even if peeling or cracking partially occurs in the superconducting layer, the superconducting wire that can suppress the propagation of peeling or cracking to the entire superconducting layer due to the presence of the through portion and the manufacturing method thereof Can provide.

本発明に係る超電導線材の第1実施形態を示す概略斜視図である。1 is a schematic perspective view showing a first embodiment of a superconducting wire according to the present invention. 図1に示す超電導線材の部分拡大断面図である。It is a partial expanded sectional view of the superconducting wire shown in FIG. 本発明に係る超電導線材の第2実施形態を示す概略斜視図である。It is a schematic perspective view which shows 2nd Embodiment of the superconducting wire which concerns on this invention. 図1に示す超電導線材の製造方法の一実施形態を示す工程説明図である。It is process explanatory drawing which shows one Embodiment of the manufacturing method of the superconducting wire shown in FIG. 本発明に係る超電導線材の第3実施形態を示す部分拡大断面図である。It is a partial expanded sectional view which shows 3rd Embodiment of the superconducting wire which concerns on this invention. 本発明に係る超電導線材の第4実施形態を示す部分拡大断面図である。It is a partial expanded sectional view which shows 4th Embodiment of the superconducting wire which concerns on this invention. 本発明に係る超電導線材の第5実施形態を示す部分拡大断面図である。It is a partial expanded sectional view which shows 5th Embodiment of the superconducting wire which concerns on this invention. 本発明に係る超電導線材の第6実施形態を示す部分拡大断面図である。It is a partial expanded sectional view which shows 6th Embodiment of the superconducting wire which concerns on this invention. 本発明に係る超電導線材の第7実施形態を示す断面図である。It is sectional drawing which shows 7th Embodiment of the superconducting wire which concerns on this invention. 従来の超電導線材の一構造例を示す概略構成図である。It is a schematic block diagram which shows one structural example of the conventional superconducting wire.

以下、本発明に係る超電導線材およびその製造方法の実施形態について図面に基づいて説明する。なお、図1〜図9において、超電導線材の構成がわかりやすくなるように一部の構成要素を大きく示しており、各構成要素の寸法関係は実際の超電導線材の寸法関係とは異なっている。   Embodiments of a superconducting wire and a method for manufacturing the same according to the present invention will be described below with reference to the drawings. In FIG. 1 to FIG. 9, some components are shown large so that the configuration of the superconducting wire can be easily understood, and the dimensional relationship of each component is different from the actual dimensional relationship of the superconducting wire.

図1は本発明に係る超電導線材の第1実施形態の概略斜視図であり、図2は図1に示す超電導線材の部分拡大断面図である。
図1および図2に示す超電導線材10は、テープ状の基材11の一方の面上に中間層12と酸化物超電導層13と安定化層14が順次積層されて超電導積層体S1が構成され、この超電導積層体S1の安定化層14の表面14A側から酸化物超電導層13と中間層12との界面Aを貫通して中間層12の上部まで達する貫通部7を備えてなる。貫通部7は、線材の長手方向に沿って所定長さで形成された貫通溝5に充填材6が充填されて構成されており、超電導積層体S1の幅方向および長さ方向に複数個、ランダムに形成されている。
FIG. 1 is a schematic perspective view of a first embodiment of a superconducting wire according to the present invention, and FIG. 2 is a partially enlarged sectional view of the superconducting wire shown in FIG.
The superconducting wire 10 shown in FIGS. 1 and 2 includes a superconducting laminate S1 in which an intermediate layer 12, an oxide superconducting layer 13, and a stabilizing layer 14 are sequentially laminated on one surface of a tape-like substrate 11. The superconducting laminate S1 includes a through portion 7 that penetrates from the surface 14A side of the stabilization layer 14 to the upper portion of the intermediate layer 12 through the interface A between the oxide superconducting layer 13 and the intermediate layer 12. The penetrating portion 7 is configured by filling the through groove 5 formed with a predetermined length along the longitudinal direction of the wire with the filler 6, and a plurality of the penetrating portions 7 in the width direction and the length direction of the superconducting laminate S1. Randomly formed.

基材11は、通常の超電導線材の基材として使用し得るものであれば良く、長尺のプレート状、シート状又はテープ状であることが好ましく、耐熱性の金属からなるものが好ましい。耐熱性の金属の中でも、合金が好ましく、ニッケル合金又は銅合金がより好ましい。中でも、市販品であればハステロイ(商品名、米国ヘインズ社製)が好適であり、モリブデン、クロム、鉄、コバルト等の成分量が異なる、ハステロイB、C、G、N、W等のいずれの種類も使用できる。また、基材11としてニッケル合金などに集合組織を導入した配向Ni−W基板のような配向金属基板を用いてもよい。
基材11の厚さは、目的に応じて適宜調整すれば良く、通常は、10〜500μmの範囲とすることができる。
The base material 11 may be any material that can be used as a base material for ordinary superconducting wires, and is preferably in the form of a long plate, sheet, or tape, and is preferably made of a heat-resistant metal. Among heat resistant metals, an alloy is preferable, and a nickel alloy or a copper alloy is more preferable. Among them, if it is a commercially available product, Hastelloy (trade name, manufactured by US Haynes Co., Ltd.) is suitable, and any of Hastelloy B, C, G, N, W, etc. having different component amounts such as molybdenum, chromium, iron, cobalt, etc. Types can also be used. Alternatively, an oriented metal substrate such as an oriented Ni—W substrate in which a texture is introduced into a nickel alloy or the like may be used as the base material 11.
What is necessary is just to adjust the thickness of the base material 11 suitably according to the objective, and it can usually be set as the range of 10-500 micrometers.

中間層12は、酸化物超電導層13の結晶配向性を制御し、基材11中の金属元素の酸化物超電導層13への拡散を防止するものである。さらに、基材11と酸化物超電導層13との物理的特性(熱膨張率や格子定数等)の差を緩和するバッファー層として機能し、その材質は、物理的特性が基材11と酸化物超電導層13との中間的な値を示す金属酸化物が好ましい。中間層12の好ましい材質として具体的には、GdZr、MgO、ZrO−Y(YSZ)、SrTiO、CeO、Y、Al、Gd、Zr、Ho、Nd等の金属酸化物が例示できる。
中間層12は、単層でも良いし、複数層でも良い。例えば、前記金属酸化物からなる層(金属酸化物層)は、結晶配向性を有していることが好ましく、複数層である場合には、最外層(最も酸化物超電導層13に近い層)が少なくとも結晶配向性を有していることが好ましい。
The intermediate layer 12 controls the crystal orientation of the oxide superconducting layer 13 and prevents diffusion of the metal element in the base material 11 into the oxide superconducting layer 13. Furthermore, it functions as a buffer layer that alleviates the difference in physical properties (thermal expansion coefficient, lattice constant, etc.) between the base material 11 and the oxide superconducting layer 13, and the material has physical properties that are different from those of the base material 11 and oxide. A metal oxide showing an intermediate value with the superconducting layer 13 is preferable. Specifically, preferred materials for the intermediate layer 12 are Gd 2 Zr 2 O 7 , MgO, ZrO 2 —Y 2 O 3 (YSZ), SrTiO 3 , CeO 2 , Y 2 O 3 , Al 2 O 3 , Gd 2. Examples thereof include metal oxides such as O 3 , Zr 2 O 3 , Ho 2 O 3 , and Nd 2 O 3 .
The intermediate layer 12 may be a single layer or a plurality of layers. For example, the layer made of the metal oxide (metal oxide layer) preferably has crystal orientation, and when it is a plurality of layers, the outermost layer (the layer closest to the oxide superconducting layer 13). Preferably have at least crystal orientation.

中間層12は、基材11側にベッド層が介在された複数層構造でもよい。ベッド層は、耐熱性が高く、界面反応性を低減するためのものであり、その上に配される膜の配向性を得るために用いる。このようなベッド層は、必要に応じて配され、例えば、イットリア(Y)、窒化ケイ素(Si)、酸化アルミニウム(Al、「アルミナ」とも呼ぶ)等から構成される。このベッド層は、例えばスパッタリング法等の成膜法により形成され、その厚さは例えば10〜200nmである。 The intermediate layer 12 may have a multi-layer structure in which a bed layer is interposed on the substrate 11 side. The bed layer has high heat resistance and is used for reducing interfacial reactivity, and is used for obtaining the orientation of a film disposed thereon. Such a bed layer is arranged as necessary, and is made of, for example, yttria (Y 2 O 3 ), silicon nitride (Si 3 N 4 ), aluminum oxide (Al 2 O 3 , also referred to as “alumina”), or the like. Is done. The bed layer is formed by a film forming method such as a sputtering method, and has a thickness of 10 to 200 nm, for example.

さらに、本発明において、中間層12は、基材11側に拡散防止層とベッド層が積層された複数層構造でもよい。この場合、基材11とベッド層との間に拡散防止層が介在された構造となる。拡散防止層は、基材11の構成元素拡散を防止する目的で形成されたもので、窒化ケイ素(Si)、酸化アルミニウム(Al)、あるいは希土類金属酸化物等から構成され、その厚さは例えば10〜400nmである。なお、拡散防止層の結晶性は問われないので、通常のスパッタ法等の成膜法により形成すればよい。
このように基材11とベッド層との間に拡散防止層を介在させることにより、中間層12を構成する他の層や酸化物超電導層13等を形成する際に、必然的に加熱されたり、熱処理される結果として熱履歴を受ける場合に、基材11の構成元素の一部がベッド層を介して酸化物超電導層13側に拡散することを効果的に抑制することができる。基材11とベッド層との間に拡散防止層を介在させる場合の例としては、拡散防止層としてAl、ベッド層としてYを用いる組み合わせを例示することができる。
Further, in the present invention, the intermediate layer 12 may have a multi-layer structure in which a diffusion prevention layer and a bed layer are laminated on the base material 11 side. In this case, a diffusion preventing layer is interposed between the base material 11 and the bed layer. The diffusion preventing layer is formed for the purpose of preventing the diffusion of the constituent elements of the substrate 11, and is composed of silicon nitride (Si 3 N 4 ), aluminum oxide (Al 2 O 3 ), rare earth metal oxide, or the like. The thickness is, for example, 10 to 400 nm. Note that since the crystallinity of the diffusion preventing layer is not questioned, it may be formed by a film forming method such as a normal sputtering method.
In this way, by interposing the diffusion preventing layer between the base material 11 and the bed layer, when forming the other layer constituting the intermediate layer 12, the oxide superconducting layer 13 or the like, it is inevitably heated. When receiving a thermal history as a result of the heat treatment, it is possible to effectively suppress a part of the constituent elements of the base material 11 from being diffused to the oxide superconducting layer 13 side through the bed layer. As an example of the case where a diffusion preventing layer is interposed between the base material 11 and the bed layer, a combination using Al 2 O 3 as the diffusion preventing layer and Y 2 O 3 as the bed layer can be exemplified.

また中間層12は、前記金属酸化物層の上に、さらにキャップ層が積層された複数層構造でも良い。キャップ層は、酸化物超電導層13の配向性を制御する機能を有するとともに、酸化物超電導層13を構成する元素の中間層12への拡散や、酸化物超電導層13積層時に使用するガスと中間層12との反応を抑制する機能等を有するものである。   The intermediate layer 12 may have a multi-layer structure in which a cap layer is further laminated on the metal oxide layer. The cap layer has a function of controlling the orientation of the oxide superconducting layer 13, diffuses the elements constituting the oxide superconducting layer 13 into the intermediate layer 12, and uses a gas and an intermediate used when the oxide superconducting layer 13 is laminated. It has a function of suppressing the reaction with the layer 12 and the like.

キャップ層は、前記金属酸化物層の表面に対してエピタキシャル成長し、その後、横方向(面方向)に粒成長(オーバーグロース)して、結晶粒が面内方向に選択成長するという過程を経て形成されたものが好ましい。このようなキャップ層は、前記金属酸化物層よりも高い面内配向度が得られる。
キャップ層の材質は、上記機能を発現し得るものであれば特に限定されないが、好ましいものとして具体的には、CeO、Y、Al、Gd、Zr、Ho、Nd、HfO等が例示できる。キャップ層の材質がCeOである場合、キャップ層は、Ceの一部が他の金属原子又は金属イオンで置換されたCe−M−O系酸化物を含んでいても良い。
キャップ層は、PLD法(パルスレーザ蒸着法)、スパッタリング法等で成膜することができるが、大きな成膜速度を得られる点でPLD法を用いることが好ましい。
The cap layer is formed through a process of epitaxially growing on the surface of the metal oxide layer, and then growing the grains in the lateral direction (plane direction) (overgrowth) and selectively growing the crystal grains in the in-plane direction. The ones made are preferred. Such a cap layer has a higher degree of in-plane orientation than the metal oxide layer.
The material of the cap layer is not particularly limited as long as it can exhibit the above functions, but specifically, preferred examples include CeO 2 , Y 2 O 3 , Al 2 O 3 , Gd 2 O 3 , and Zr 2 O. 3 , Ho 2 O 3 , Nd 2 O 3 , HfO 2 and the like. When the material of the cap layer is CeO 2 , the cap layer may contain a Ce—M—O-based oxide in which part of Ce is substituted with another metal atom or metal ion.
The cap layer can be formed by a PLD method (pulse laser deposition method), a sputtering method, or the like, but it is preferable to use the PLD method from the viewpoint of obtaining a high film formation rate.

中間層12の厚さは、目的に応じて適宜調整すれば良いが、通常は、0.1〜5μmである。
中間層12が、前記金属酸化物層の上にキャップ層が積層された複数層構造である場合には、キャップ層の厚さは、通常は、0.1〜1.5μmである。
The thickness of the intermediate layer 12 may be appropriately adjusted according to the purpose, but is usually 0.1 to 5 μm.
When the intermediate layer 12 has a multi-layer structure in which a cap layer is laminated on the metal oxide layer, the thickness of the cap layer is usually 0.1 to 1.5 μm.

中間層12は、スパッタ法、真空蒸着法、レーザ蒸着法、電子ビーム蒸着法、イオンビームアシスト蒸着法(以下、IBAD法と略記する)等の物理的蒸着法;化学気相成長法(CVD法);塗布熱分解法(MOD法);溶射等、酸化物薄膜を形成する公知の方法で積層できる。特に、IBAD法で形成された前記金属酸化物層は、結晶配向性が高く、酸化物超電導層13やキャップ層の結晶配向性を制御する効果が高い点で好ましい。IBAD法とは、蒸着時に、結晶の蒸着面に対して所定の角度でイオンビームを照射することにより、結晶軸を配向させる方法である。通常は、イオンビームとして、アルゴン(Ar)イオンビームを使用する。例えば、GdZr、MgO又はZrO−Y(YSZ)からなる中間層12は、IBAD法における配向度を表す指標であるΔΦ(FWHM:半値全幅)の値を小さくできるため、特に好適である。 The intermediate layer 12 is formed by physical vapor deposition such as sputtering, vacuum vapor deposition, laser vapor deposition, electron beam vapor deposition, ion beam assisted vapor deposition (hereinafter abbreviated as IBAD); chemical vapor deposition (CVD). ); Coating pyrolysis method (MOD method); lamination can be performed by a known method for forming an oxide thin film such as thermal spraying. In particular, the metal oxide layer formed by the IBAD method is preferable in that the crystal orientation is high and the effect of controlling the crystal orientation of the oxide superconducting layer 13 and the cap layer is high. The IBAD method is a method of orienting crystal axes by irradiating an ion beam at a predetermined angle with respect to a crystal deposition surface during deposition. Usually, an argon (Ar) ion beam is used as the ion beam. For example, the intermediate layer 12 made of Gd 2 Zr 2 O 7 , MgO, or ZrO 2 —Y 2 O 3 (YSZ) can reduce the value of ΔΦ (FWHM: full width at half maximum) that is an index representing the degree of orientation in the IBAD method. Therefore, it is particularly suitable.

酸化物超電導層13は通常知られている組成の酸化物超電導体からなるものを広く適用することができ、REBaCu(REはY、La、Nd、Sm、Er、Gd等の希土類元素を表す)なる材質のもの、具体的には、Y123(YBaCu)又はGd123(GdBaCu)を例示することができる。また、その他の酸化物超電導体、例えば、BiSrCan−1Cu4+2n+δなる組成等に代表される臨界温度の高い他の酸化物超電導体からなるものを用いても良いのは勿論である。
酸化物超電導層13は、スパッタ法、真空蒸着法、レーザ蒸着法、電子ビーム蒸着法等の物理的蒸着法;化学気相成長法(CVD法);塗布熱分解法(MOD法)等で積層でき、なかでもレーザ蒸着法が好ましい。
酸化物超電導層13の厚みは、0.5〜5μm程度であって、均一な厚みであることが好ましい。
The oxide superconducting layer 13 can be widely applied with an oxide superconductor having a generally known composition, such as REBa 2 Cu 3 O y (RE is Y, La, Nd, Sm, Er, Gd, etc. A material made of a material that represents a rare earth element, specifically, Y123 (YBa 2 Cu 3 O y ) or Gd123 (GdBa 2 Cu 3 O y ) can be exemplified. Further, other oxide superconductors, for example, Bi 2 Sr 2 Ca n- 1 Cu n for O 4 + 2n + δ becomes may be used in compositions such as those made of other oxide superconductors having high critical temperatures representative Of course.
The oxide superconducting layer 13 is laminated by physical vapor deposition such as sputtering, vacuum vapor deposition, laser vapor deposition, or electron beam vapor deposition; chemical vapor deposition (CVD); coating pyrolysis (MOD). Among them, the laser vapor deposition method is preferable.
The oxide superconducting layer 13 has a thickness of about 0.5 to 5 μm and preferably a uniform thickness.

酸化物超電導層13の上に積層される安定化層14は、酸化物超電導層13の一部領域が常電導状態に遷移しようとした場合に、電流のバイパス路として機能することで、酸化物超電導層13を安定化させて焼損に至らないようにする、主たる構成要素である。
安定化層14は、導電性が良好な金属からなるものが好ましく、具体的には、銀又は銀合金、銅などからなるものが例示できる。安定化層14は1層構造でも良いし、2層以上の積層構造であってもよい。
安定化層14は、公知の方法で積層できる。安定化層14が1層構造の場合は、銀層をメッキやスパッタ法で形成する方法が挙げられる。また、安定化層14が2層構造の場合は、銀層をメッキやスパッタ法で形成し、その上に銅テープなどを貼り合わせるなどの方法を採用できる。安定化層14の厚さは、3〜300μmの範囲とすることができる。
The stabilization layer 14 stacked on the oxide superconducting layer 13 functions as a current bypass when a partial region of the oxide superconducting layer 13 attempts to transition to a normal conducting state, thereby It is the main component that stabilizes the superconducting layer 13 and prevents burning.
The stabilizing layer 14 is preferably made of a metal having good conductivity, and specifically, can be exemplified by silver, a silver alloy, copper or the like. The stabilization layer 14 may have a single layer structure or a laminated structure of two or more layers.
The stabilization layer 14 can be laminated by a known method. When the stabilization layer 14 has a single layer structure, a method of forming a silver layer by plating or sputtering is used. Further, when the stabilization layer 14 has a two-layer structure, a method of forming a silver layer by plating or sputtering and bonding a copper tape or the like thereon can be employed. The thickness of the stabilization layer 14 can be in the range of 3 to 300 μm.

貫通部7は、図2に示すように安定化層14の表面14Aから酸化物超電導層13と中間層12との界面Aを貫通して中間層12の上部まで達しており、線材の長手方向に沿って所定長さで形成された貫通溝5に充填材6が充填され構成されている。貫通溝5に充填材6が充填されて貫通部7が構成されることにより、貫通部7を介して酸化物超電導層13に水分が浸入することを抑制でき、水分により酸化物超電導層13が劣化し難いので、良好な特性の超電導線材10となる。充填材6としては、貫通溝5を埋めることができるものであれば特に制限されず、導電性および非導電性のものを適用できる。充填材6として、具体的には、エポキシ樹脂、カーボンペースト、銀ペースト等が挙げられる。なお、充填材6を省略して貫通溝5をそのまま貫通部7としてもよい。   As shown in FIG. 2, the penetrating portion 7 penetrates from the surface 14A of the stabilizing layer 14 to the upper portion of the intermediate layer 12 through the interface A between the oxide superconducting layer 13 and the intermediate layer 12, and the longitudinal direction of the wire A filling material 6 is filled in a through groove 5 formed with a predetermined length along the length of the through groove 5. By filling the through groove 5 with the filler 6 and forming the through portion 7, it is possible to prevent moisture from entering the oxide superconducting layer 13 through the through portion 7. Since it does not easily deteriorate, the superconducting wire 10 has good characteristics. The filler 6 is not particularly limited as long as it can fill the through groove 5, and a conductive and non-conductive material can be applied. Specific examples of the filler 6 include epoxy resin, carbon paste, and silver paste. Note that the filler 6 may be omitted and the through groove 5 may be used as it is as the through portion 7.

貫通部7は、万が一酸化物超電導層13と中間層12との剥離や、酸化物超電導層13におけるクラックが発生した場合に、剥離やクラックの伝搬を防止するために形成されている。貫通部7は、貫通部7が形成されていない酸化物超電導層13の部分よりもクラックが発生しやすい。このように、クラックが発生しやすい部分を敢えて形成しておくことにより、万が一酸化物超電導層13で部分的に剥離やクラックが発生した場合に、クラックは貫通部7に集中するので、酸化物超電導層13の貫通部7が形成された箇所以外の部分に剥離やクラックが伝搬することを抑制できる。
通常、酸化物超電導層13の剥離は、超電導線材10の端部側から発生する場合が多い。そのため、貫通部7を超電導線材10の幅方向中央部よりも幅方向端部側に多く形成しておくことにより、超電導線材10の端部で発生した剥離やクラックを端部側に形成した貫通部7でせき止め、中央部側へと剥離やクラックが伝搬することを抑制でき、好ましい。
The penetrating portion 7 is formed to prevent peeling and propagation of cracks in the event that peeling between the oxide superconducting layer 13 and the intermediate layer 12 or a crack in the oxide superconducting layer 13 occurs. The through portion 7 is more susceptible to cracking than the portion of the oxide superconducting layer 13 where the through portion 7 is not formed. In this way, by deliberately forming a portion where cracks are likely to occur, in the unlikely event that peeling or cracking occurs partially in the oxide superconducting layer 13, the cracks concentrate on the penetrating portion 7. It is possible to suppress peeling and cracks from propagating to a portion other than the portion where the through portion 7 of the superconducting layer 13 is formed.
Usually, peeling of the oxide superconducting layer 13 often occurs from the end side of the superconducting wire 10. Therefore, by forming more through portions 7 on the width direction end portion side than the width direction center portion of the superconducting wire 10, penetration and cracks generated at the end portion of the superconducting wire 10 are formed on the end side. It is preferable because it is possible to prevent clogging at the portion 7 and to prevent peeling and cracks from propagating to the central portion side.

貫通部7の寸法は、貫通部7の底部が酸化物超電導層13と中間層12との界面Aを貫通していれば特に限定されず、適宜調整可能であるが、貫通部7が大き過ぎると酸化物超電導層13の体積が減少して超電導特性が低下するため、貫通部7の幅は5〜800μm、長さは0.1〜50mmとすることが好ましい。貫通部7の幅が5μm未満の場合、レーザなどによる加工が難しくなる。また、貫通部7の長さが50mmを超えると、超電導線材10がフィラメント化してしまうおそれがある。
さらに、貫通部7は、隣接する貫通部7同士の距離が100μm以上離れていることが好ましい。このような寸法および密度で貫通部7を備えることにより、良好な超電導特性を保持しつつ、万が一酸化物超電導層13で部分的な剥離やクラックが生じた場合であっても、酸化物超電導層13全体への剥離やクラックの伝搬を抑制できる。
The dimension of the penetrating part 7 is not particularly limited as long as the bottom part of the penetrating part 7 penetrates the interface A between the oxide superconducting layer 13 and the intermediate layer 12, and can be adjusted as appropriate, but the penetrating part 7 is too large. In addition, since the volume of the oxide superconducting layer 13 is reduced and the superconducting characteristics are deteriorated, it is preferable that the width of the penetrating portion 7 is 5 to 800 μm and the length is 0.1 to 50 mm. When the width of the penetrating portion 7 is less than 5 μm, processing with a laser or the like becomes difficult. Moreover, when the length of the penetration part 7 exceeds 50 mm, there exists a possibility that the superconducting wire 10 may be filamentized.
Furthermore, it is preferable that the distance between the adjacent through parts 7 is 100 μm or more. By providing the through-holes 7 with such dimensions and density, the oxide superconducting layer is maintained even when partial peeling or cracking occurs in the oxide superconducting layer 13 while maintaining good superconducting characteristics. It is possible to suppress peeling and crack propagation to the entire 13.

なお、貫通部7の形状はスリット形状に限定されず、図3に示す第2実施形態の超電導線材10Bのように、丸孔形状あるいは丸孔に充填材が充填された形状の貫通部7Bであってもよい。この場合、貫通部7Bは、安定化層14の表面14Aから酸化物超電導層13と中間層12との界面を貫通して中間層12の上部まで達しており、その外径は5μm〜800μmの範囲とすることが好ましい。丸孔形状の貫通部7Bの外径が5μm未満場合は、レーザなどによる加工が難しくなる。また、丸孔形状の貫通部7Bの外径が800μmを越えると、酸化物超電導層13の体積が減少して超電導特性が低下する。
また、貫通部7Bが孔形状の場合、隣接する貫通部7B同士の距離が当該貫通部7Bの外径以上となるような密度で形成されていることが好ましい。このような寸法および密度で貫通部7Bを備えることにより、良好な超電導特性を保持しつつ、万が一酸化物超電導層13で部分的な剥離やクラックが発生した場合であっても、酸化物超電導層13全体への剥離やクラックの伝搬を抑制できる。
また、貫通部7の形状は超電導線材10の幅方向に沿うスリット形状であってもよいが、良好な超電導特性を保持する観点から、超電導線材10の長さ方向に沿うスリット形状または孔形状であることが好ましい。
Note that the shape of the penetrating portion 7 is not limited to the slit shape, and the penetrating portion 7B has a round hole shape or a shape in which a filler is filled in the round hole as in the superconducting wire 10B of the second embodiment shown in FIG. There may be. In this case, the penetrating portion 7B extends from the surface 14A of the stabilization layer 14 to the upper portion of the intermediate layer 12 through the interface between the oxide superconducting layer 13 and the intermediate layer 12, and has an outer diameter of 5 μm to 800 μm. It is preferable to be in the range. When the outer diameter of the through-hole 7B having a round hole shape is less than 5 μm, processing with a laser or the like becomes difficult. On the other hand, when the outer diameter of the round hole-shaped through-hole 7B exceeds 800 μm, the volume of the oxide superconducting layer 13 is reduced and the superconducting characteristics are deteriorated.
Moreover, when the penetration part 7B is hole shape, it is preferable that it is formed with the density that the distance of adjacent penetration part 7B becomes more than the outer diameter of the said penetration part 7B. By providing the through-holes 7B with such dimensions and density, the oxide superconducting layer can be used even if partial peeling or cracking occurs in the oxide superconducting layer 13 while maintaining good superconducting characteristics. It is possible to suppress peeling and crack propagation to the entire 13.
Moreover, although the slit shape along the width direction of the superconducting wire 10 may be sufficient as the shape of the penetration part 7, it is a slit shape or hole shape along the length direction of the superconducting wire 10 from a viewpoint of maintaining a favorable superconducting characteristic. Preferably there is.

次に、本発明に係る超電導線材10の製造方法の一実施形態について図面に基づいて説明する。
図4は、図1および図2に示す超電導線材10の製造方法の一実施形態を示す工程説明図である。
Next, an embodiment of a method for manufacturing the superconducting wire 10 according to the present invention will be described with reference to the drawings.
FIG. 4 is a process explanatory view showing an embodiment of a method for manufacturing the superconducting wire 10 shown in FIGS. 1 and 2.

まず、図4(a)に示す如く、前述した超電導積層体S1を準備する。一例として、基材11上にスパッタ法で拡散防止層とベッド層を形成した後、このベッド層の上にIBAD法によりMgO等の金属酸化物層を形成し、さらにPLD法でキャップ層を形成することにより基材11上に多層構造の中間層12を形成する。次いで、中間層12の上にPLD法により酸化物超電導層13を形成した後、酸化物超電導層13の上にスパッタ法によりAgの安定化層14を形成することにより超電導積層体S1を得ることができる。なお、安定化層14はスパッタ法によりAg層を形成した後に、Ag層上にCuの金属テープを半田を介して積層して形成してもよい。   First, as shown in FIG. 4A, the above-described superconducting laminate S1 is prepared. As an example, after a diffusion prevention layer and a bed layer are formed on the substrate 11 by sputtering, a metal oxide layer such as MgO is formed on the bed layer by IBAD, and a cap layer is further formed by PLD. By doing so, the intermediate layer 12 having a multilayer structure is formed on the substrate 11. Next, after forming the oxide superconducting layer 13 on the intermediate layer 12 by the PLD method, the Ag stabilizing layer 14 is formed on the oxide superconducting layer 13 by the sputtering method to obtain the superconducting laminate S1. Can do. The stabilization layer 14 may be formed by forming an Ag layer by sputtering and then laminating a Cu metal tape on the Ag layer via solder.

次に、図4(b)に示す如く、安定化層14の表面14Aから安定化層14と酸化物超電導層13を貫通して中間層12の上部まで達する複数の貫通溝5を形成する。貫通溝5は、従来公知の方法により形成すればよく、レーザ加工、間欠式スリット加工、突起付きロールを安定化層14側から押し付けることによる加工などにより形成することができる。なお、図3に示す超電導線材10Bを製造する場合は、貫通溝5と同様の方法で、安定化層14の表面14Aから安定化層14と酸化物超電導層13を貫通して中間層12の上部まで達する貫通孔を形成すればよい。本工程により形成する貫通溝5の寸法、密度は前述の通りである。   Next, as shown in FIG. 4B, a plurality of through grooves 5 are formed that extend from the surface 14 </ b> A of the stabilization layer 14 to the upper portion of the intermediate layer 12 through the stabilization layer 14 and the oxide superconducting layer 13. The through groove 5 may be formed by a conventionally known method, and can be formed by laser processing, intermittent slit processing, processing by pressing a roll with a protrusion from the stabilization layer 14 side, or the like. In the case of manufacturing the superconducting wire 10B shown in FIG. 3, the intermediate layer 12 is penetrated from the surface 14A of the stabilizing layer 14 through the stabilizing layer 14 and the oxide superconducting layer 13 by the same method as the through groove 5. A through hole reaching the top may be formed. The dimensions and density of the through grooves 5 formed by this process are as described above.

次いで、図4(c)に示す如く、形成した貫通溝5に充填材6を充填して貫通溝5を埋めることにより貫通部7を形成する。充填材6の材質は前述の通りである。なお、図4(c)に示す工程を省略し、図4(b)に示す如く貫通溝5を形成し、貫通溝5を充填材6で埋めずにそのまま貫通部7としてもよい。また、図4(a)に示す超電導積層体S1として、安定化層14がAg層の一層からなるものを使用した場合、図4(c)に示す如く貫通部7を形成した後に、Agの安定化層14および貫通部7の上に、Cuの金属テープを半田を介して積層してもよい。さらにまた、図4(b)に示す如く貫通溝5を形成した超電導積層体S1に対して、Agの安定化層14および貫通溝5の上に、Cuの金属テープを半田を介して積層してもよい。この場合、Cuの金属テープ積層の際に、貫通溝5の上方あるいは大半部分に半田が流れ込んで凝固した状態で、貫通部7が形成される。
以上の工程により、本発明に係る超電導線材10を製造できる。
Next, as shown in FIG. 4C, the penetrating portion 7 is formed by filling the penetrating groove 5 by filling the penetrating groove 5 with a filler 6. The material of the filler 6 is as described above. 4C may be omitted, the through groove 5 may be formed as shown in FIG. 4B, and the through groove 5 may be used as it is without being filled with the filler 6. Further, as the superconducting laminate S1 shown in FIG. 4A, in the case where the stabilizing layer 14 is composed of one layer of Ag layer, after forming the through portion 7 as shown in FIG. A Cu metal tape may be laminated on the stabilization layer 14 and the penetrating portion 7 via solder. Furthermore, as shown in FIG. 4B, a Cu metal tape is laminated on the Ag stabilizing layer 14 and the through groove 5 with solder on the superconducting laminate S1 in which the through groove 5 is formed. May be. In this case, when the Cu metal tape is laminated, the penetrating part 7 is formed in a state where the solder flows into the upper part or most part of the penetrating groove 5 and solidifies.
Through the above steps, the superconducting wire 10 according to the present invention can be manufactured.

本実施形態の超電導線材の製造方法によれば、安定化層14側から酸化物超電導層13と中間層12との界面を貫通して中間層12まで達する貫通部7を備えた超電導線材10を製造できる。本実施形態の超電導線材の製造方法により製造される超電導線材10は、貫通部7を備える構成であるため、万が一酸化物超電導層13で部分的に剥離やクラックが発生した場合であっても、酸化物超電導層13の貫通部7が形成された箇所以外の部分に剥離やクラックが伝搬することを抑制できる。
本実施形態の超電導線材の製造方法において、貫通溝5を充填材6で充填して貫通部7を形成することにより、貫通部7から酸化物超電導層13へと水分が浸入することを抑制できるので、良好な超電導特性の超電導線材10を提供できる。
According to the method of manufacturing a superconducting wire of this embodiment, the superconducting wire 10 having the penetrating portion 7 that penetrates from the stabilization layer 14 side to the intermediate layer 12 through the interface between the oxide superconducting layer 13 and the intermediate layer 12 is obtained. Can be manufactured. Since the superconducting wire 10 manufactured by the method of manufacturing a superconducting wire according to the present embodiment is configured to include the penetrating portion 7, even if partial peeling or cracking occurs in the oxide superconducting layer 13, It is possible to suppress peeling and cracks from propagating to a portion other than the portion where the penetrating portion 7 of the oxide superconducting layer 13 is formed.
In the manufacturing method of the superconducting wire of this embodiment, the penetration of moisture from the penetration part 7 to the oxide superconducting layer 13 can be suppressed by filling the penetration groove 5 with the filler 6 to form the penetration part 7. Therefore, the superconducting wire 10 having good superconducting characteristics can be provided.

本発明の超電導線材において、貫通部は上記した図1〜図3の構造に限定されず、中間層12と酸化物超電導層13の界面Aを貫通していれば、安定化層14側から形成されていてもよく、基材11側から形成されていてもよい。以下、本発明に係る超電導線材およびその製造方法の他の実施形態について図5〜図9に基づいて説明する。なお、図5〜図9において、上記第1実施形態の超電導線材10と同一の構成要素には同一の符号を付し、同一要素の説明は省略する。   In the superconducting wire of the present invention, the penetrating portion is not limited to the structure shown in FIGS. 1 to 3 and is formed from the stabilization layer 14 side as long as it penetrates the interface A between the intermediate layer 12 and the oxide superconducting layer 13. It may be formed and may be formed from the base material 11 side. Hereinafter, other embodiments of the superconducting wire and the method for manufacturing the same according to the present invention will be described with reference to FIGS. 5-9, the same code | symbol is attached | subjected to the component same as the superconducting wire 10 of the said 1st Embodiment, and description of the same element is abbreviate | omitted.

図5は本発明に係る超電導線材の第3実施形態を示す部分拡大断面図である。
図5に示す超電導線材10Cは、テープ状の基材11の一方の面上に中間層12と酸化物超電導層13と安定化層14とが順次積層され、安定化層14と酸化物超電導層13の界面Bから基材11側に向かって酸化物超電導層13を貫通し、中間層12の上部にまで達する複数の貫通部7Cを備えてなる。貫通部7Cは、その上の安定化層14と一体形成されており、超電導線材10Cの長手方向に沿って所定長さ伸びる貫通溝5Cの内部に、Agなどの安定化層14と同一の材質が充填材6Cとして充填されている。貫通部7Cの寸法および密度は、第1実施形態の超電導線材10の貫通溝7と同様とすることが好ましく、貫通溝7は図3に示す超電導線材10Bの如く孔形状であってもよい。
FIG. 5 is a partial enlarged cross-sectional view showing a third embodiment of the superconducting wire according to the present invention.
In the superconducting wire 10C shown in FIG. 5, an intermediate layer 12, an oxide superconducting layer 13 and a stabilizing layer 14 are sequentially laminated on one surface of a tape-shaped substrate 11, and the stabilizing layer 14 and the oxide superconducting layer are laminated. 13 is provided with a plurality of penetrating portions 7 </ b> C that penetrate the oxide superconducting layer 13 from the interface B toward the base material 11 and reach the upper part of the intermediate layer 12. The penetrating portion 7C is integrally formed with the stabilizing layer 14 thereabove, and the same material as the stabilizing layer 14 such as Ag is formed inside the penetrating groove 5C extending a predetermined length along the longitudinal direction of the superconducting wire 10C. Is filled as the filler 6C. The size and density of the through portion 7C are preferably the same as the through groove 7 of the superconducting wire 10 of the first embodiment, and the through groove 7 may have a hole shape as in the superconducting wire 10B shown in FIG.

本実施形態の超電導線材10Cを作製するには、まず、基材11上に中間層12と酸化物超電導層13が順次積層された超電導積層体S2を準備する。そして、この超電導積層体S2の酸化物超電導層13の表面13Aから酸化物超電導層13を貫通して中間層12の上部まで達する複数の貫通溝5Cをレーザ加工などにより形成する。次に、この貫通溝5Cが形成された超電導積層体S2に対して、酸化物超電導層13および貫通溝5Cの上にスパッタ法などの成膜法によりAgなどの安定化層14を形成する。安定化層14形成時、Agなどのスパッタ粒子は貫通溝5Cの内部にも堆積し、これにより、貫通孔5Cの内部にAgなどの安定化層14と同一の材質が充填材6Cとして充填されて貫通部7Cが形成される。
以上の工程により、本実施形態の超電導線材10Cを製造できる。
なお、図5に示す如く安定化層14を形成した後に、安定化層14の上にCuの金属テープを半田を介して積層してもよい。また、貫通溝5Cを形成した超電導積層体S2に対して、酸化物超電導層13および貫通溝5Cの上に、Cuの金属テープを半田を介して積層して安定化層14を形成してもよい。この場合、Cuの金属テープ積層の際に、貫通溝5Cの上方あるいは大半部分に半田が流れ込んで凝固した状態で、貫通部7Cが形成される。
In order to produce the superconducting wire 10C of this embodiment, first, a superconducting laminate S2 in which an intermediate layer 12 and an oxide superconducting layer 13 are sequentially laminated on a base material 11 is prepared. Then, a plurality of through grooves 5C that penetrate from the surface 13A of the oxide superconducting layer 13 of the superconducting laminate S2 to the upper part of the intermediate layer 12 through the oxide superconducting layer 13 are formed by laser processing or the like. Next, a stabilizing layer 14 such as Ag is formed on the oxide superconducting layer 13 and the through groove 5C by a film forming method such as a sputtering method on the superconducting laminate S2 in which the through groove 5C is formed. When the stabilization layer 14 is formed, sputtered particles such as Ag are also deposited inside the through-groove 5C, whereby the same material as the stabilization layer 14 such as Ag is filled in the through-hole 5C as the filler 6C. Thus, the penetrating portion 7C is formed.
The superconducting wire 10C of the present embodiment can be manufactured through the above steps.
In addition, after forming the stabilization layer 14 as shown in FIG. 5, a Cu metal tape may be laminated on the stabilization layer 14 via solder. Alternatively, the stabilization layer 14 may be formed by laminating a metal tape of Cu on the superconducting laminate S2 having the through groove 5C formed on the oxide superconducting layer 13 and the through groove 5C via solder. Good. In this case, when the Cu metal tape is laminated, the penetrating part 7C is formed in a state where the solder flows into the upper part or most part of the through groove 5C and is solidified.

図6は本発明に係る超電導線材の第4実施形態を示す部分拡大断面図である。
図6に示す超電導線材10Dは、テープ状の基材11の一方の面上に中間層12と酸化物超電導層13と安定化層14とが順次積層された超電導積層体S1に、安定化層14の表面14A側から基材11側に向かって安定化層14と酸化物超電導層13と中間層12を貫通して基材11の上部まで達する複数の貫通部7Dを備えてなる。
貫通部7Dは、超電導線材10Dの長手方向に沿って所定長さ伸びる貫通溝5Dの内部に、充填材6Dが充填されて構成されている。本実施形態の超電導線材10Dにおいて、貫通溝5Dに充填される充填材6Dは特に制限されないが、樹脂、ガラスペーストなどの非導電性の材料が好ましい。なお、充填材6Dを省略して貫通溝5Dをそのまま貫通部7Dとしてもよい。
貫通部7Dの寸法および密度は、第1実施形態の超電導線材10の貫通溝7と同様とすることが好ましく、貫通溝7Dは図3に示す超電導線材10Bの如く孔形状であってもよい。
FIG. 6 is a partially enlarged sectional view showing a fourth embodiment of the superconducting wire according to the present invention.
A superconducting wire 10D shown in FIG. 6 includes a stabilizing layer on a superconducting laminate S1 in which an intermediate layer 12, an oxide superconducting layer 13 and a stabilizing layer 14 are sequentially laminated on one surface of a tape-like substrate 11. 14 includes a plurality of penetrating portions 7 </ b> D that penetrate the stabilizing layer 14, the oxide superconducting layer 13, and the intermediate layer 12 from the surface 14 </ b> A side toward the base material 11 side and reach the upper part of the base material 11.
The through portion 7D is configured by filling a filler 6D into a through groove 5D extending a predetermined length along the longitudinal direction of the superconducting wire 10D. In the superconducting wire 10D of the present embodiment, the filler 6D filled in the through groove 5D is not particularly limited, but is preferably a non-conductive material such as resin or glass paste. The filler 6D may be omitted and the through groove 5D may be used as the through portion 7D as it is.
The size and density of the through portion 7D are preferably the same as the through groove 7 of the superconducting wire 10 of the first embodiment, and the through groove 7D may have a hole shape like the superconducting wire 10B shown in FIG.

本実施形態の超電導線材10Dは、形成する貫通溝5Dの深さを変えること以外は、図4(a)〜(c)に示す超電導線材10の製造方法と同様の工程で製造することができる。なお、図6に示す如く貫通部7Dを形成した後に、安定化層14および貫通部7Dの上にCuの金属テープを半田を介して積層してもよい。また、超電導積層体S1に貫通溝5Dを形成した後、貫通溝5Dを充填材で充填せずに、安定化層14および貫通溝5Dの上にCuの金属テープを半田を介して積層してもよい。この場合、Cuの金属テープ積層の際に、貫通溝5Dの上方あるいは大半部分に半田が流れ込んで凝固した状態で、貫通部7Dが形成される。   The superconducting wire 10D of the present embodiment can be manufactured in the same process as the manufacturing method of the superconducting wire 10 shown in FIGS. 4A to 4C except that the depth of the through groove 5D to be formed is changed. . In addition, after forming penetration part 7D as shown in FIG. 6, you may laminate | stack the metal tape of Cu on the stabilization layer 14 and penetration part 7D via solder. In addition, after the through groove 5D is formed in the superconducting laminate S1, a Cu metal tape is laminated on the stabilization layer 14 and the through groove 5D via solder without filling the through groove 5D with a filler. Also good. In this case, when the Cu metal tape is laminated, the through portion 7D is formed in a state where the solder flows into the upper portion of the through groove 5D or the most part and solidifies.

図7は本発明に係る超電導線材の第5実施形態を示す部分拡大断面図である。
図7に示す超電導線材10Eは、テープ状の基材11の一方の面上に中間層12と酸化物超電導層13と安定化層14とが順次積層された超電導積層体S1に、安定化層14の表面14から基材11の裏面11Aまで貫通する複数の貫通部7Eが形成されて構成される。
貫通部7Eは、超電導線材10Eの長手方向に沿って所定長さ伸びる貫通溝5Dの内部に、充填材6Eが充填されて構成されている。本実施形態の超電導線材10Eにおいて、貫通溝5Eに充填される充填材6Eは特に制限されないが、上記した第5実施形態の超電導線材10Dで例示した非導電性の材料が好ましい。なお、充填材6Eを省略して貫通溝5Eをそのまま貫通部7Eとしてもよい。
貫通部7Eの寸法および密度は、第1実施形態の超電導線材10の貫通溝7と同様とすることが好ましく、貫通溝7Eは図3に示す超電導線材10Bの如く孔形状であってもよい。
FIG. 7 is a partially enlarged sectional view showing a fifth embodiment of the superconducting wire according to the present invention.
A superconducting wire 10E shown in FIG. 7 includes a stabilizing layer on a superconducting laminate S1 in which an intermediate layer 12, an oxide superconducting layer 13, and a stabilizing layer 14 are sequentially laminated on one surface of a tape-like substrate 11. A plurality of penetrating portions 7E penetrating from the front surface 14 to the back surface 11A of the base material 11 are formed.
The penetrating portion 7E is configured by filling a filler 6E into a through groove 5D extending a predetermined length along the longitudinal direction of the superconducting wire 10E. In the superconducting wire 10E of the present embodiment, the filler 6E filled in the through groove 5E is not particularly limited, but the nonconductive material exemplified in the superconducting wire 10D of the above-described fifth embodiment is preferable. The filler 6E may be omitted and the through groove 5E may be used as the through portion 7E as it is.
The size and density of the through portion 7E are preferably the same as those of the through groove 7 of the superconducting wire 10 of the first embodiment, and the through groove 7E may have a hole shape like the superconducting wire 10B shown in FIG.

本実施形態の超電導線材10Eは、図4(b)に示す貫通溝を形成する工程において、形成する貫通溝の深さを変えて、超電導積層体S1の安定化層14の表面14Aから基材11の裏面11Aまでを貫通する貫通溝5Eを形成すること以外は、図4(a)〜(c)に示す超電導線材10の製造方法と同様の工程で製造することができる。なお、図7に示す如く貫通部7Dを形成した後に、安定化層14および貫通部7Eの上にCuの金属テープを半田を介して積層してもよい。   The superconducting wire 10E of the present embodiment changes the depth of the through groove to be formed in the step of forming the through groove shown in FIG. 4B, and changes the depth from the surface 14A of the stabilization layer 14 of the superconducting laminate S1 to the base material. 11 can be manufactured in the same process as the method of manufacturing the superconducting wire 10 shown in FIGS. 4A to 4C except that the through groove 5E penetrating up to the back surface 11A of the 11 is formed. In addition, after forming penetration part 7D as shown in FIG. 7, you may laminate | stack the metal tape of Cu on the stabilization layer 14 and penetration part 7E via solder.

図8は本発明に係る超電導線材の第6実施形態を示す部分拡大断面図である。
図8に示す超電導線材10Fは、テープ状の基材11の一方の面上に中間層12と酸化物超電導層13と安定化層14とが順次積層された超電導積層体S1に、基材11の裏面11A側から安定化層14側に向かって基材11と中間層12と酸化物超電導層13を貫通して安定化層14の下部まで達する複数の貫通部7Fを備えてなる。
貫通部7Fは、超電導線材10Fの長手方向に沿って所定長さ伸びる貫通溝5Fの内部に、充填材6Fが充填されて構成されている。本実施形態の超電導線材10Fにおいて、貫通溝5Fに充填される充填材6Fは特に制限されないが、上記した第5実施形態の超電導線材10Dで例示した非導電性の材料が好ましい。なお、充填材6Fを省略して貫通溝5Fをそのまま貫通部7Fとしてもよい。
貫通部7Fの寸法および密度は、第1実施形態の超電導線材10の貫通溝7と同様とすることが好ましく、貫通溝7Fは図3に示す超電導線材10Bの如く孔形状であってもよい。
FIG. 8 is a partially enlarged sectional view showing a sixth embodiment of the superconducting wire according to the present invention.
A superconducting wire 10F shown in FIG. 8 is formed on a superconducting laminate S1 in which an intermediate layer 12, an oxide superconducting layer 13 and a stabilizing layer 14 are sequentially laminated on one surface of a tape-like base material 11. A plurality of penetrating portions 7F that pass through the base material 11, the intermediate layer 12, and the oxide superconducting layer 13 from the back surface 11A side toward the stabilizing layer 14 side and reach the lower portion of the stabilizing layer 14 are provided.
The penetrating part 7F is configured by filling a filler 6F in a through groove 5F extending a predetermined length along the longitudinal direction of the superconducting wire 10F. In the superconducting wire 10F of the present embodiment, the filler 6F filled in the through groove 5F is not particularly limited, but the non-conductive material exemplified in the superconducting wire 10D of the fifth embodiment described above is preferable. The filler 6F may be omitted and the through groove 5F may be used as the through portion 7F as it is.
The size and density of the through portion 7F are preferably the same as those of the through groove 7 of the superconducting wire 10 of the first embodiment, and the through groove 7F may have a hole shape like the superconducting wire 10B shown in FIG.

本実施形態の超電導線材10Fを作製するには、まず、図4(a)に示す構造の超電導積層体S1を準備する。
次に、基材11側が上になるように超電導積層体S1を配置し、レーザ加工などにより、基材11の裏面11Aから基材11と中間層12と酸化物超電導層13を貫通して安定化層14の下部まで達する貫通溝5Fを形成する。その後、形成した貫通溝5Fに充填材6Fを充填して貫通溝5Fを埋めることにより貫通部7Fを形成する。
以上の工程により、本実施形態の超電導線材10Fを製造できる。
In order to produce the superconducting wire 10F of the present embodiment, first, a superconducting laminate S1 having a structure shown in FIG.
Next, the superconducting laminate S1 is disposed so that the base material 11 side is on top, and is stably penetrated from the back surface 11A of the base material 11 through the base material 11, the intermediate layer 12, and the oxide superconducting layer 13 by laser processing or the like. A through groove 5 </ b> F reaching the lower portion of the formation layer 14 is formed. Thereafter, the through portion 7F is formed by filling the formed through groove 5F with the filler 6F and filling the through groove 5F.
The superconducting wire 10F of the present embodiment can be manufactured through the above steps.

図9は本発明に係る超電導線材の第7実施形態を示す部分拡大断面図である。
図9に示す超電導線材10Gは、テープ状の基材11の一方の面上に中間層12と酸化物超電導層13と安定化層14とが順次積層された超電導積層体S1に、基材11の裏面11A側から安定化層14側に向かって基材11と中間層12を貫通して、酸化物超電導層13の下部まで達する複数の貫通部7Gを備えてなる。
貫通部7Gは、超電導線材10Gの長手方向に沿って所定長さ伸びる貫通溝5Gの内部に、充填材6Gが充填されて構成されている。本実施形態の超電導線材10Fにおいて、貫通溝5Fに充填される充填材6Gは特に制限されず、導電性または非導電性の材料を使用できる。充填材6Gとして具体的には、上記第1実施形態の超電導線材10で使用可能な充填材と同じものが挙げられる。なお、充填材6Gを省略して貫通溝5Gをそのまま貫通部7Gとしてもよい。
貫通部7Gの寸法および密度は、第1実施形態の超電導線材10の貫通溝7と同様とすることが好ましく、貫通溝7Gは図3に示す超電導線材10Bの如く孔形状であってもよい。
FIG. 9 is a partially enlarged sectional view showing a seventh embodiment of the superconducting wire according to the present invention.
A superconducting wire 10G shown in FIG. 9 is formed on a superconducting laminate S1 in which an intermediate layer 12, an oxide superconducting layer 13 and a stabilizing layer 14 are sequentially laminated on one surface of a tape-like base material 11. A plurality of penetrating portions 7G that pass through the base material 11 and the intermediate layer 12 from the back surface 11A side to the stabilizing layer 14 side and reach the lower portion of the oxide superconducting layer 13 are provided.
The penetrating part 7G is configured by filling a filler 6G into a through groove 5G extending a predetermined length along the longitudinal direction of the superconducting wire 10G. In the superconducting wire 10F of the present embodiment, the filler 6G filled in the through groove 5F is not particularly limited, and a conductive or non-conductive material can be used. Specific examples of the filler 6G include the same fillers that can be used in the superconducting wire 10 of the first embodiment. The filler 6G may be omitted and the through groove 5G may be used as the through portion 7G as it is.
The size and density of the through portion 7G are preferably the same as those of the through groove 7 of the superconducting wire 10 of the first embodiment, and the through groove 7G may have a hole shape like the superconducting wire 10B shown in FIG.

本実施形態の超電導線材10Gを作製するには、まず、図4(a)に示す構造の超電導積層体S1を準備し、基材11側が上になるように超電導積層体S1を配置して、レーザ加工などにより、基材11の裏面11Aから基材11と中間層12を貫通して酸化物超電導層13の下部まで達する貫通溝5Gを形成する。その後、形成した貫通溝5Gに充填材6Gを充填して貫通溝5Gを埋めることにより貫通部7Gを形成する。
以上の工程により、本実施形態の超電導線材10Gを製造できる。
In order to produce the superconducting wire 10G of the present embodiment, first, a superconducting laminate S1 having the structure shown in FIG. 4A is prepared, and the superconducting laminate S1 is arranged so that the base material 11 side is on top. Through-grooves 5G reaching the lower part of the oxide superconducting layer 13 from the back surface 11A of the base material 11 through the base material 11 and the intermediate layer 12 are formed by laser processing or the like. Thereafter, the through portion 7G is formed by filling the formed through groove 5G with a filler 6G and filling the through groove 5G.
The superconducting wire 10G of the present embodiment can be manufactured through the above steps.

上記した第3〜第7実施形態の超電導線材10C、10D、10E、10F、10Gは、安定化層14側または基材11側から、酸化物超電導層13と中間層12の界面Aを貫通する貫通部7C、7D、7D、7E、7F、7Gを備える構成である。そのため、上記した第1実施形態の超電導線材10と同様に、万が一酸化物超電導層13で部分的に剥離やクラックが発生した場合であっても、クラックを貫通部7C、7D、7D、7E、7F、7Gに集中させて、酸化物超電導層13の貫通部7C、7D、7D、7E、7F、7Gが形成された箇所以外の部分に剥離やクラックが伝搬することを抑制できる。   The superconducting wires 10C, 10D, 10E, 10F, and 10G of the third to seventh embodiments described above penetrate the interface A between the oxide superconducting layer 13 and the intermediate layer 12 from the stabilization layer 14 side or the base material 11 side. It is the structure provided with penetration part 7C, 7D, 7D, 7E, 7F, 7G. Therefore, similarly to the superconducting wire 10 of the first embodiment described above, even if the oxide superconducting layer 13 is partially peeled off or cracked, the cracks penetrate the through portions 7C, 7D, 7D, 7E, It can concentrate on 7F and 7G, and can suppress that a peeling and a crack propagate to parts other than the part in which the penetration parts 7C, 7D, 7D, 7E, 7F, and 7G of the oxide superconducting layer 13 were formed.

以上、本発明の超電導線材およびその製造方法について説明したが、上記実施形態において、超電導線材の各部は一例であって、本発明の範囲を逸脱しない範囲で適宜変更することが可能である。   The superconducting wire and the manufacturing method thereof according to the present invention have been described above. However, in the above embodiment, each part of the superconducting wire is an example, and can be appropriately changed without departing from the scope of the present invention.

本発明は、例えば超電導モータ、限流器など、各種電力機器に用いられる酸化物超電導線材に利用することができる。   The present invention can be used for an oxide superconducting wire used in various electric power devices such as a superconducting motor and a current limiting device.

5…貫通溝、6、6C、6D、6E、6F、6G…充填材、7、7B、7C、7D、7E、7F、7G…貫通部、10、10B、10C、10D、10E、10F、10G…超電導線材、11…基材、12…中間層、13…酸化物超電導層、14…安定化層、100…超電導線材、101…金属基材、102…中間層、103…キャップ層、104…酸化物超電導層、A…酸化物超電導層と中間層との界面、S1、S2…超電導積層体。   5 ... Through groove, 6, 6C, 6D, 6E, 6F, 6G ... Filler, 7, 7B, 7C, 7D, 7E, 7F, 7G ... Through part, 10, 10B, 10C, 10D, 10E, 10F, 10G ... superconducting wire, 11 ... substrate, 12 ... intermediate layer, 13 ... oxide superconducting layer, 14 ... stabilization layer, 100 ... superconducting wire, 101 ... metal substrate, 102 ... intermediate layer, 103 ... cap layer, 104 ... Oxide superconducting layer, A ... interface between oxide superconducting layer and intermediate layer, S1, S2 ... superconducting laminate.

Claims (4)

基材の上方に中間層と酸化物超電導層と安定化層とがこの順に積層されて超電導積層体が構成され、前記基材側から少なくとも前記酸化物超電導層まで達するように該超電導積層体の幅方向および長さ方向に分散形成された複数の貫通部を備えることを特徴とする超電導線材。 Laminated with the intermediate layer and the oxide superconducting layer and the stabilizing layer in this order superconductor laminate above the substrate is formed, the superconducting laminate to reach from the front Kimoto material side until at least the oxide superconducting layer A superconducting wire comprising a plurality of penetrating portions dispersedly formed in the width direction and the length direction. 前記貫通部の内部が充填材により充填されていることを特徴とする請求項1に記載の超電導線材。   The superconducting wire according to claim 1, wherein the inside of the through portion is filled with a filler. 基材の上方に中間層と酸化物超電導層と安定化層とがこの順に積層された超電導積層体に対し、前記基材側から少なくとも前記酸化物超電導層まで達するように複数の穴または溝を加工して、複数の貫通部を該超電導積層体の幅方向および長さ方向に分散形成することを特徴とする超電導線材の製造方法。 A plurality of holes or grooves as above the substrate and the intermediate layer and the oxide superconducting layer and the stabilizing layer to superconducting laminates are laminated in this order, it is reached before Kimoto material side until at least the oxide superconducting layer A method of manufacturing a superconducting wire, wherein a plurality of through portions are dispersedly formed in the width direction and the length direction of the superconducting laminate. 前記貫通部の内部を充填材により充填することを特徴とする請求項3に記載の超電導線材の製造方法。   The method of manufacturing a superconducting wire according to claim 3, wherein the inside of the through portion is filled with a filler.
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