JP5681035B2 - LED light source package - Google Patents
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Description
本発明は、LED光源パッケージに関するものである。 The present invention relates to an LED light source package.
LED発光素子(以下、「LEDチップ」という。)は、半導体のpn接合に順方向電流を流すと発光する素子であり、GaAs,GaN等のIII−V族半導体結晶を用いて製造される。近年、半導体のエピタキシャル成長技術と発光素子プロセス技術の進歩により、変換効率の優れるLEDチップが開発され、様々な分野において幅広く使用されている。 An LED light-emitting element (hereinafter referred to as “LED chip”) is an element that emits light when a forward current flows through a pn junction of a semiconductor, and is manufactured using a III-V group semiconductor crystal such as GaAs or GaN. In recent years, with the progress of semiconductor epitaxial growth technology and light emitting device process technology, LED chips with excellent conversion efficiency have been developed and widely used in various fields.
LEDチップは、成長基板上にIII−V族半導体結晶をエピタキシャル成長させたp型層とn型層及び両者に挟まれる光活性層から構成される。一般的には、単結晶サファイア等の成長基板上に、III−V族半導体結晶をエピタキシャル成長させた後、電極等を形成させてLEDチップにされる。 The LED chip is composed of a p-type layer and an n-type layer obtained by epitaxially growing a group III-V semiconductor crystal on a growth substrate, and a photoactive layer sandwiched therebetween. Generally, a group III-V semiconductor crystal is epitaxially grown on a growth substrate such as single crystal sapphire, and then an electrode or the like is formed to form an LED chip.
単結晶サファイアの熱伝導率が40W/mK程度であるので、III−V族半導体素子で発生する熱を十分に放熱することができない。とくに、大電流を流す高出力LEDでは素子の温度が上昇して、発光効率の低下や素子寿命の低下を起こした。これを解決するため、成長基板上にIII−V族半導体結晶をエピタキシャル成長させた後に、金属層を介してパッケージ基板(保持基板)を接合し、その後、成長基板を除去する方法が提案されているが(特許文献1)、十分に満足できるものではなかった。すなわち、金属系のパッケージ基板(保持基板)は導電性でもあるので実装に際しては非絶縁構造としなければならない。たとえば、回路基板等の実装基板に半田接合する際、接合部直下に樹脂等の熱伝導率の低い絶縁層を配置する必要があったが、この絶縁層が十分な放熱を阻害した。 Since the single crystal sapphire has a thermal conductivity of about 40 W / mK, the heat generated in the III-V group semiconductor element cannot be sufficiently dissipated. In particular, in a high-power LED through which a large current flows, the temperature of the element rises, causing a decrease in luminous efficiency and a decrease in element life. In order to solve this, a method has been proposed in which a III-V semiconductor crystal is epitaxially grown on a growth substrate, a package substrate (holding substrate) is bonded through a metal layer, and then the growth substrate is removed. (Patent Document 1) was not satisfactory. That is, since the metal package substrate (holding substrate) is also conductive, it must have a non-insulating structure for mounting. For example, when soldering to a mounting board such as a circuit board, it is necessary to dispose an insulating layer having a low thermal conductivity such as a resin directly under the joint, but this insulating layer hinders sufficient heat dissipation.
一方、LEDチップの発熱による障害を少しでも軽減させるべくLEDが2個以上結線された高出力LED発光装置(以下「LED光源モジュール」という。)では、放熱板、例えば銅(Cu)板を介して、LED光源モジュールを回路基板等に実装する方法が提案されている(特許文献2)。しかし、Cuの熱膨張係数が17×10−6/K程度であり、LED光源モジュールの5×10−6/K程度と大きく相違しているので、LED光源モジュールに熱負荷がかかった場合、LED光源モジュールと金属回路基板の熱膨張係数差により熱応力が生じ、金属回路基板に反りが生じるおそれがあった。また、熱応力により接合層にクラックが発生し、その結果放熱が不十分となってLEDチップを誤作動させたり、破損させたりするという課題があった。 On the other hand, in a high-power LED light emitting device (hereinafter referred to as “LED light source module”) in which two or more LEDs are connected in order to reduce the trouble caused by heat generation of the LED chip, a heat sink, for example, a copper (Cu) plate is used. A method of mounting an LED light source module on a circuit board or the like has been proposed (Patent Document 2). However, since the thermal expansion coefficient of Cu is about 17 × 10 −6 / K, which is largely different from about 5 × 10 −6 / K of the LED light source module, when a thermal load is applied to the LED light source module, Thermal stress is generated due to the difference in coefficient of thermal expansion between the LED light source module and the metal circuit board, which may cause warpage of the metal circuit board. In addition, there is a problem that cracks are generated in the bonding layer due to thermal stress, and as a result, heat radiation becomes insufficient, causing the LED chip to malfunction or break.
そこで、熱膨張係数を金属回路基板のそれに近づけた回路基板として、アルミニウム−炭化珪素質複合体が提案されている。この回路基板用のアルミニウム−炭化珪素質複合体の製法としては、炭化珪素の多孔体にアルミニウム合金の溶湯を加圧含浸する溶湯鍛造法、炭化珪素の多孔体にアルミニウム合金の溶湯を非加圧で浸透させる非加圧含浸法が実用化されている。一方、コスト面からは、アルミニウム粉末と炭化珪素粉末を混合して、加熱成形する粉末冶金法が有利であり、同製法によるアルミニウム−炭化珪素質複合体の検討も行われている。しかし、いずれの製法のアルミニウム−炭化珪素質複合体でもコスト面に問題があることから、低コスト化が要求される分野では安価な銅回路基板が使用される場合が多くなり、LEDチップと銅回路基板間の信頼性に課題があった。
Therefore, an aluminum-silicon carbide composite has been proposed as a circuit board having a thermal expansion coefficient close to that of a metal circuit board. The aluminum-silicon carbide composite for the circuit board is manufactured by a forging method in which a silicon carbide porous body is impregnated with a molten aluminum alloy, and a silicon carbide porous body is not pressurized with a molten aluminum alloy. A non-pressure impregnation method infiltrated with the use of is practically used. On the other hand, from the viewpoint of cost, a powder metallurgy method in which aluminum powder and silicon carbide powder are mixed and heat-molded is advantageous, and an aluminum-silicon carbide composite by the same production method has been studied. However, since aluminum-silicon carbide composites of any manufacturing method have a problem in cost, an inexpensive copper circuit board is often used in a field where cost reduction is required. There was a problem in the reliability between circuit boards.
金属回路基板に用いられる銅やアルミニウムなどの金属は熱膨張係数が17×10−6〜23×10−6/K程度と大きく、熱膨張係数が5×10−6/K程度のLED
チップとの熱膨張係数差が大きいため、熱応力が生じ、金属回路基板の反りおよび接合層にクラックが発生する。
A metal such as copper or aluminum used for a metal circuit board has a large thermal expansion coefficient of about 17 × 10 −6 to 23 × 10 −6 / K, and an LED having a thermal expansion coefficient of about 5 × 10 −6 / K.
Since the difference in thermal expansion coefficient from the chip is large, thermal stress is generated, and warpage of the metal circuit board and cracks occur in the bonding layer.
本発明は、上記の状況に鑑みてなされたものであり、その目的は、LED光源モジュールと金属回路基板との間の熱膨張係数を有する応力緩和板を搭載することによって、熱膨張係数差によって発生する応力を緩和し信頼性の向上が達成できるLED光源パッケージを提供することである。 This invention is made | formed in view of said situation, The objective is by mounting | wearing the stress relaxation board which has a thermal expansion coefficient between a LED light source module and a metal circuit board, and by thermal expansion coefficient difference. It is an object to provide an LED light source package that can relieve the generated stress and achieve improved reliability.
絶縁性のセラミックス基板表面にLEDチップが2個以上結線されたLED光源モジュールと金属回路基板との間に、ヤング率が70GPa以下、25℃〜150℃の熱膨張係数が5×10−6〜12×10−6/K、熱伝導率が150W/mK以上であり、厚みが0.5〜3.0mmである平板状のアルミニウム−黒鉛質複合体からなる応力緩和板が実装されていることを特徴とするLED光源パッケージである。 Between the LED light source module in which two or more LED chips are connected to the surface of the insulating ceramic substrate and the metal circuit board, the Young's modulus is 70 GPa or less, and the thermal expansion coefficient at 25 ° C. to 150 ° C. is 5 × 10 −6 to 12 × 10 −6 / K, a thermal conductivity of 150 W / mK or more, and a stress relaxation plate made of a flat aluminum-graphite composite having a thickness of 0.5 to 3.0 mm is mounted. It is the LED light source package characterized by these.
本発明のLED光源パッケージにあっては、(イ)応力緩和板が、黒鉛質多孔体又は黒鉛粉末成形体とアルミニウム又はアルミニウム合金を複合化した板状の金属含浸セラミックス基板であること、(ロ)アルミニウム−黒鉛質複合体に占める黒鉛の体積率が60〜85体積%であること、から選ばれた少なくとも1つの実施態様を有していることが好ましい。 In the LED light source package of the present invention, (a) the stress relaxation plate is a plate-shaped metal-impregnated ceramic substrate in which a graphite porous body or graphite powder compact and aluminum or an aluminum alloy are combined, It is preferable to have at least one embodiment selected from the fact that the volume fraction of graphite in the aluminum-graphite composite is 60 to 85% by volume.
また、本発明は(ハ)めっき層を形成したアルミニウム−黒鉛質複合体とLED光源モジュール及び金属回路基板間が半田付けされること、(ニ)LED光源モジュールとアルミニウム−黒鉛質複合体間及びアルミニウム−黒鉛質複合体と金属回路基板間がろう付けされていること、(二)に用いるろう材中に錫、銅、銀、亜鉛、ビスマスのうち少なくとも1種類以上含まれていること、から選ばれた少なくとも1つの実施態様を有していることが好ましい。 The present invention also includes: (c) soldering between the aluminum-graphite composite with the plated layer and the LED light source module and the metal circuit board; (d) between the LED light source module and the aluminum-graphite composite; The aluminum-graphite composite and the metal circuit board are brazed, and the brazing material used in (2) contains at least one of tin, copper, silver, zinc, and bismuth. It is preferred to have at least one selected embodiment.
本発明によれば、応力緩和板に用いる黒鉛の粒度、種類、含有量を適正化することにより、また、金属成分の適正化により、得られる応力緩和板をLED光源モジュールと金属回路基板の間の熱膨張係数に制御することができるため、LED光源モジュール側及び金属回路基板側の両方に対して良好なマッチングがとれ、信頼性を著しく向上したLED光源パッケージを提供できる。 According to the present invention, by optimizing the particle size, type and content of graphite used for the stress relaxation plate, and by optimizing the metal component, the obtained stress relaxation plate is placed between the LED light source module and the metal circuit board. Therefore, it is possible to provide an LED light source package that can achieve good matching with respect to both the LED light source module side and the metal circuit board side, and has significantly improved reliability.
更に、熱伝導率が150W/mK以上なのでLED光源モジュールからの熱を金属
回路基板に良好に伝えることができ、LED光源パッケージとして好適に使用できる。
Furthermore, since the thermal conductivity is 150 W / mK or more, the heat from the LED light source module can be transferred well to the metal circuit board, and can be suitably used as an LED light source package.
<LED光源モジュール>
本明細書におけるLED光源モジュールは、III−V族半導体結晶からなるLED発光素子と保持基板からなるLEDチップが2個以上が回路基板に搭載され、電気的接続部材で接続され、樹脂封止材で封止されていることを基本構造としている。
<LED light source module>
The LED light source module in the present specification includes two or more LED light emitting elements made of III-V group semiconductor crystal and LED chips made of a holding substrate mounted on a circuit board and connected by an electrical connection member, and a resin sealing material The basic structure is to be sealed with.
LED発光素子としては紫外〜青色の波長域の光を発するIII−V族半導体結晶が使用され、具体的にはInGaN、AlGaAs、AlGaInPなどである。保持基板とは、III−V族半導体結晶をエピキタル成長する際に用いた成長基板、又は成長基板上にIII−V族半導体結晶をエピタキシャル成長させた後に、金属層を介して高熱伝導性基板を接合し、その後、成長基板を除去された上記高熱伝導性基板のことである。それを例示すれば、サファイア、炭化珪素、シリコン、Cu/W、Cu/Moなどである。これらの中、0.5W以上の出力が要求されるLEDチップでは、熱伝導率の点から、上記の後者に属する保持基板が使用され、LEDチップは非絶縁構造となる。非絶縁構造LEDチップの利点は、狭い面積で高輝度が得られることである。 As the LED light emitting element, a III-V group semiconductor crystal emitting light in the ultraviolet to blue wavelength region is used, and specifically, InGaN, AlGaAs, AlGaInP, or the like. The holding substrate is a growth substrate used for epitaxially growing a group III-V semiconductor crystal, or after a group III-V semiconductor crystal is epitaxially grown on the growth substrate, a high thermal conductivity substrate is bonded via a metal layer. Then, the high thermal conductivity substrate from which the growth substrate has been removed. Examples thereof are sapphire, silicon carbide, silicon, Cu / W, Cu / Mo, and the like. Among these, in the LED chip that requires an output of 0.5 W or more, the holding substrate belonging to the latter is used from the viewpoint of thermal conductivity, and the LED chip has a non-insulating structure. The advantage of the non-insulating LED chip is that high brightness can be obtained in a small area.
本発明の、LED光源パッケージに用いる応力緩和板は、板厚が0.5〜3.0mm、好ましくは0.5〜2.0mmである。該応力緩和板の表面に金属層を形成した後、LED光源モジュールと金属回路基板との間にはんだ付け又はロウ付けしたLED光源パッケージであるので、LED光源モジュールからの熱を金属回路基板に良好に伝えることができ、かつ高信頼性を有するLED光源パッケージが実現できる。 The stress relaxation plate used for the LED light source package of the present invention has a plate thickness of 0.5 to 3.0 mm, preferably 0.5 to 2.0 mm. Since the LED light source package is formed by forming a metal layer on the surface of the stress relaxation plate and then soldering or brazing between the LED light source module and the metal circuit board, the heat from the LED light source module is good for the metal circuit board. Thus, an LED light source package having high reliability can be realized.
応力緩和板の板厚が0.5mm未満であると、応力緩和層が薄すぎて応力を緩和できずに信頼性が低下してしまう。一方、3.0mmを超えると応力緩和板の熱抵抗が大きくなる。 If the thickness of the stress relaxation plate is less than 0.5 mm, the stress relaxation layer is too thin to relieve stress and reliability is lowered. On the other hand, if it exceeds 3.0 mm, the thermal resistance of the stress relaxation plate increases.
応力緩和板のヤング率は70GPa以下好ましくは50GPa以下であることが望ましい。応力緩和板のヤング率が70GPa以上であるとLEDパッケージの熱膨張差により生じる応力を応力緩和板で緩和できずに信頼性が低下してしまう。また、ヤング率の下限は、特に限定されないが10GPa以上であることが好ましい。ヤング率は、応力緩和板に用いる黒鉛の粒度、種類、含有量を適正化することによりすることができる。例えば、黒鉛の含量を増大させるとヤング率は低下し、黒鉛の含有量を減少させるとヤング率は増加する。また、金属成分の適正化により制御することができる。 The Young's modulus of the stress relaxation plate is 70 GPa or less, preferably 50 GPa or less. If the Young's modulus of the stress relaxation plate is 70 GPa or more, the stress caused by the difference in thermal expansion of the LED package cannot be relaxed by the stress relaxation plate, and the reliability is lowered. The lower limit of Young's modulus is not particularly limited, but is preferably 10 GPa or more. The Young's modulus can be determined by optimizing the particle size, type, and content of graphite used for the stress relaxation plate. For example, increasing the graphite content decreases the Young's modulus, and decreasing the graphite content increases the Young's modulus. Moreover, it can control by optimization of a metal component.
応力緩和板の温度25℃の熱伝導率は150W/mK以上、好ましくは200W/mK以上であり、150W/mKより小さいと、LED光源モジュールからの熱を金属回路板に十分に伝えられずに、半導体が誤作動を起こしたり損傷したりする場合がある。 The thermal conductivity of the stress relaxation plate at a temperature of 25 ° C. is 150 W / mK or more, preferably 200 W / mK or more. If it is less than 150 W / mK, the heat from the LED light source module cannot be sufficiently transferred to the metal circuit board. The semiconductor may malfunction or be damaged.
また、応力緩和板の熱膨張係数がLED光源モジュールと金属回路基板の間の熱膨張係数であることが好ましい。
応力緩和板の熱膨張係数が上記の範囲外の場合、LEDチップ作動時の熱負荷により、接合層(はんだ層等)やLED光源モジュールの破壊が起こり、放熱特性が低下する場合がある。また、複合化する金属の含有率を増減させることで、応力緩和板の熱膨張係数を増減させることができる。
Moreover, it is preferable that the thermal expansion coefficient of a stress relaxation board is a thermal expansion coefficient between an LED light source module and a metal circuit board.
When the thermal expansion coefficient of the stress relaxation plate is outside the above range, the thermal load during operation of the LED chip may cause damage to the bonding layer (solder layer, etc.) and the LED light source module, resulting in deterioration of heat dissipation characteristics. Moreover, the thermal expansion coefficient of a stress relaxation board can be increased / decreased by increasing / decreasing the content rate of the metal to compound.
アルミニウム−黒鉛質複合体からなる応力緩和板は、黒鉛質の体積率が50〜90体積%、好ましくは60〜85体積%であり、残部がアルミニウム又はアルミニウム合金からなり、好ましくはアルミニウム80〜100質量%、珪素0〜20質量%であるアルミニウム又はアルミニウム合金を複合化したものである。
黒鉛とアルミニウム又はアルミニウム合金の複合化の方法としては、例えば特許3468358号の実施例等の方法によって含浸される、溶湯鍛造法により製造されたものであることが好ましい。
The stress relaxation plate made of an aluminum-graphite composite has a graphite volume fraction of 50 to 90% by volume, preferably 60 to 85% by volume, and the balance is made of aluminum or an aluminum alloy, preferably aluminum 80 to 100%. It is a composite of aluminum or aluminum alloy that is mass% and silicon is 0 to 20 mass%.
As a method of combining graphite and aluminum or an aluminum alloy, it is preferable that the graphite is manufactured by a molten forging method impregnated by a method such as the example of Japanese Patent No. 3468358.
また、上記溶湯鍛造法の代わりに、黒鉛粉末とアルミニウム又はアルミニウム合金粉末の混合粉末を離型処理した金型に充填し、アルミニウム又はアルミニウム合金の融点以上の温度に加熱後にプレスして複合化する方法によって製造されたものでも使用できる。 Also, instead of the above-mentioned molten metal forging method, a mixed powder of graphite powder and aluminum or aluminum alloy powder is filled into a mold subjected to a release treatment, and heated to a temperature equal to or higher than the melting point of aluminum or aluminum alloy, and then pressed to be combined. Even those produced by the method can be used.
黒鉛粉末とアルミニウム又はアルミニウム合金の複合化に必要な圧力は、30MPa以上が好ましい。加熱プレス成形時の圧力が、30MPa未満では、黒鉛粉末とアルミニウム又はアルミニウム合金の密着性が不足して、熱伝導率、強度等の特性が低下するため好ましくない。また、プレス圧の上限については、特性面からの制約はないが、金型の強度、装置の力量より、200MPa以下が適当である。アルミニウム−黒鉛質複合体は、融点以下の温度で減圧した後、室温まで冷却する。なお、複合化時の歪み除去の目的で、アルミニウム−黒鉛質複合体のアニール処理を行うこともある。 The pressure required for combining graphite powder with aluminum or an aluminum alloy is preferably 30 MPa or more. If the pressure at the time of hot press molding is less than 30 MPa, the adhesion between the graphite powder and aluminum or aluminum alloy is insufficient, and properties such as thermal conductivity and strength are not preferred. Further, the upper limit of the press pressure is not limited in terms of characteristics, but 200 MPa or less is appropriate from the strength of the mold and the strength of the apparatus. The aluminum-graphite composite is depressurized at a temperature below the melting point and then cooled to room temperature. In addition, annealing treatment of the aluminum-graphite composite may be performed for the purpose of removing strain at the time of compounding.
黒鉛の体積率は50〜90体積%、特に60〜85体積%であることが好ましい。
黒鉛の体積率が50体積%未満であると、アルミニウム−黒鉛質複合体の熱膨張係数が大きくなりすぎる。一方、90体積%を超えると、金属を十分に含浸させることができずに、熱伝導率が小さくなりすぎる恐れがある。また、黒鉛の充填状態は特に制限はなく、黒鉛質多孔体、又は黒鉛粉末成形体を用いることができる。黒鉛の体積率の調整は黒鉛成分の粒度調整、整形圧力、焼結条件などによって行うことができる。
The volume ratio of graphite is preferably 50 to 90% by volume, particularly 60 to 85% by volume.
When the volume fraction of graphite is less than 50% by volume, the thermal expansion coefficient of the aluminum-graphite composite becomes too large. On the other hand, if it exceeds 90% by volume, the metal cannot be sufficiently impregnated and the thermal conductivity may be too small. The graphite filling state is not particularly limited, and a graphite porous body or a graphite powder molded body can be used. The volume ratio of graphite can be adjusted by adjusting the particle size of the graphite component, shaping pressure, sintering conditions, and the like.
また、黒鉛と複合化する金属成分は、アルミニウム80〜100質量%、珪素0〜20質量%を含有するアルミニウム又はアルミニウム合金が好ましい。珪素成分が20質量%を超えると合金の融点が高くなり、未含浸部分が発生する場合がある。一方、珪素成分が20質量%を超えると、得られる合金の熱伝導率が低下し、その結果、得られるアルミニウム−黒鉛質複合体の熱伝導率が低下し好ましくない。珪素成分以外の成分としては特性に影響を与えない範囲であれば、特に制限はないが、マグネシウムは、得られる合金と黒鉛の濡れ性を向上させる効果があり、3質量%以内であれば、強度や熱伝導特性に悪影響を与える炭化アルミニウム(Al4C3)の生成を抑制できるため含有してもよい。 The metal component to be combined with graphite is preferably aluminum or aluminum alloy containing 80 to 100% by mass of aluminum and 0 to 20% by mass of silicon. If the silicon component exceeds 20% by mass, the melting point of the alloy increases, and an unimpregnated portion may occur. On the other hand, when the silicon component exceeds 20% by mass, the thermal conductivity of the obtained alloy is lowered, and as a result, the thermal conductivity of the obtained aluminum-graphite composite is lowered, which is not preferable. The component other than the silicon component is not particularly limited as long as it does not affect the properties, but magnesium has an effect of improving the wettability of the obtained alloy and graphite, and if it is within 3% by mass, the production of aluminum carbide adversely affecting the strength and thermal conductivity (Al 4 C 3) may contain can be suppressed.
黒鉛粉末成形体は、黒鉛成分の粉末のみを成形して製造することもできるし、例えば、シリカゾル、アルミナゾル等の無機バインダーと共に用いて製造することもできる。黒鉛粉末成形体には、特性に影響しない範囲であれば、炭化珪素、窒化珪素、窒化アルミニウム、窒化硼素と言った他のセラミックス粉末を添加してもよい。成形には、プレス成形、鋳込み成形等の一般的な黒鉛粉末の成形方法が採用される。また、黒鉛質多孔体は、例えば、上記黒鉛粉末成形体を焼結処理することによって製造することができる。黒鉛質多孔体と黒鉛粉末成形体の形状には制約はなく、平板状、円柱状などで用いられる。 The graphite powder molded body can be produced by molding only the powder of the graphite component, or can be produced using an inorganic binder such as silica sol or alumina sol. Other ceramic powders such as silicon carbide, silicon nitride, aluminum nitride, and boron nitride may be added to the graphite powder compact as long as the characteristics are not affected. For the molding, a general graphite powder molding method such as press molding or cast molding is employed. Moreover, a graphite porous body can be manufactured by carrying out the sintering process of the said graphite powder molded object, for example. There is no restriction | limiting in the shape of a graphite porous body and a graphite powder molding, It uses by flat form, a column shape, etc.
金属を含浸した黒鉛質多孔体又は黒鉛粉末成形体は、通常、切断加工と面加工が施した後にLEDパッケージに用いられる。金属を含浸した黒鉛質多孔体又は黒鉛粉末成形体の形状が直方体形状である場合、平面研削板によりダイヤモンド砥石を用いて所定寸法に外形加工した後、マルチワイヤソー、内周刃切断機等で最終形状より0.1〜0.5mm程度厚い板厚に切断加工するのがよい。切断方法には限定はないが、切断代が少なく量産性に適したマルチワイヤソーが好適である。マルチワイヤソーの切断では、遊離砥粒タイプ及びダイヤモンド等の研削材を付着したワイヤーが用いられる。面加工では、両面研削盤、ロータリー研削盤、平面研削盤、ラップ盤等の加工機を用い、板厚が0.3〜3mmに加工される。 The graphite porous body or graphite powder molded body impregnated with metal is usually used for an LED package after being subjected to cutting and surface processing. When the shape of the graphite porous body or graphite powder molded body impregnated with metal is a rectangular parallelepiped shape, the outer shape is processed to a predetermined size using a diamond grinding wheel with a surface grinding plate, and then the final shape is obtained with a multi-wire saw, an inner peripheral cutting machine It is preferable to cut to a thickness of about 0.1 to 0.5 mm thicker than the shape. There is no limitation on the cutting method, but a multi-wire saw having a small cutting margin and suitable for mass production is preferable. In the cutting of a multi-wire saw, a wire to which an abrasive such as a loose abrasive type and diamond is attached is used. In the surface processing, a plate thickness is processed to 0.3 to 3 mm using a processing machine such as a double-side grinding machine, a rotary grinding machine, a surface grinding machine, or a lapping machine.
金属を含浸した黒鉛質多孔体又は黒鉛粉末成形体の形状が板状である場合は、両面研削盤、ロータリー研削盤、平面研削盤、ラップ盤等の加工機を用い、板厚が0.3〜3mm、表面粗さ(Ra)が1.0μm以下に面加工をし、次いでウォータージェット加工機、放電加工機、レーザー加工機、ダイシングマシン、円筒研削盤等で所定形状に外周加工を行う。この場合、外周加工を先に行ってから面加工をしてもよい。 When the shape of the graphite porous body or graphite powder molded body impregnated with metal is plate-like, use a processing machine such as a double-sided grinder, rotary grinder, surface grinder, lapping machine, etc., and the plate thickness is 0.3. Surface processing is performed to ˜3 mm and the surface roughness (Ra) is 1.0 μm or less, and then outer periphery processing is performed into a predetermined shape with a water jet processing machine, an electric discharge processing machine, a laser processing machine, a dicing machine, a cylindrical grinding machine or the like. In this case, surface processing may be performed after the outer periphery processing is performed first.
アルミニウム−黒鉛質複合体は、その表面に、Ni、Co、Pd、Cu、Ag、Au、Pt及びSnから選ばれた少なくとも1種の金属による、特に好ましくはNi又はAuによる、厚みが0.5〜20μmのめっき層を有していることが好ましい。特に好ましいめっき層の厚みは2〜10μmである。めっき層を形成することによって、LED光源モジュール、応力緩和板及び金属回路基板の接着状態が良好になる。金属層の厚みが0.5μm未満であると、接着状態が悪くなり、20μmをこえると、めっき層と応力緩和板との熱膨張差による剥離が生じる恐れがある。めっき層は、応力緩和板を洗浄後、上記金属種による無電解めっき又は電解めっきを施すことによって形成させることができる。 The aluminum-graphite composite has a thickness of 0. 1 on the surface of at least one metal selected from Ni, Co, Pd, Cu, Ag, Au, Pt and Sn, particularly preferably Ni or Au. It is preferable to have a plating layer of 5 to 20 μm. A particularly preferable plating layer thickness is 2 to 10 μm. By forming the plating layer, the adhesion state of the LED light source module, the stress relaxation plate, and the metal circuit board is improved. If the thickness of the metal layer is less than 0.5 μm, the adhesion state is deteriorated, and if it exceeds 20 μm, there is a risk of peeling due to the difference in thermal expansion between the plating layer and the stress relaxation plate. The plating layer can be formed by washing the stress relaxation plate and then performing electroless plating or electrolytic plating with the above metal species.
LED光源モジュール、応力緩和板及び金属回路基板との接合は、はんだ付けまたはろう付けを用いて行われる。はんだとしてはクリームはんだ、共晶はんだ、鉛フリーはんだなどを用いてもよい。ろう付けには錫、銅、銀、亜鉛、ビスマスのうち少なくとも1種類以上含まれているろう材を用いることが好ましい。 The LED light source module, the stress relaxation plate, and the metal circuit board are joined using soldering or brazing. As the solder, cream solder, eutectic solder, lead-free solder or the like may be used. For brazing, it is preferable to use a brazing material containing at least one of tin, copper, silver, zinc, and bismuth.
[実施例1]
黒鉛板(東海炭素株式会社製:G250、体積率:78%、寸法:185mm×135mm×5.0mm)を、黒鉛離型材の塗布されたステンレス板からなる離型板に挟んで両側に鉄板(厚み12mm)を配置し、ボルト8本で連結して一つの積層体とした。この積層体を電気炉で温度630℃に予備加熱した後、あらかじめ加熱しておいたプレス金型(内径400mm×高さ300mm)内に収め、シリコンを12質量%及びマグネシウムを1質量%含有するアルミニウム合金の溶湯(温度800℃)を注ぎ、100MPaの圧力で25分間加圧してアルミニウム合金を含浸させた。室温まで冷却した後、湿式バンドソーにて離型板の形状に沿って切断して離型板を剥がし、含浸時のひずみ除去の為に500℃で3時間アニール処理を行いアルミニウム合金−黒鉛質複合体を得た。
[Example 1]
A graphite plate (manufactured by Tokai Carbon Co., Ltd .: G250, volume ratio: 78%, dimensions: 185 mm × 135 mm × 5.0 mm) is sandwiched between release plates made of stainless steel plate coated with graphite release material, and iron plates ( (Thickness 12 mm) is arranged and connected with eight bolts to form a single laminate. The laminate is preheated to a temperature of 630 ° C. in an electric furnace, and then stored in a preheated press mold (inner diameter: 400 mm × height: 300 mm), and contains 12% by mass of silicon and 1% by mass of magnesium. A molten aluminum alloy (temperature: 800 ° C.) was poured, and the aluminum alloy was impregnated by applying pressure of 100 MPa for 25 minutes. After cooling to room temperature, cut with a wet band saw along the shape of the release plate, peel off the release plate, and anneal for 3 hours at 500 ° C. to remove strain during impregnation. Aluminum alloy-graphite composite Got the body.
上記で得られた評価用の複合体から、研削加工により熱膨張係数測定用試験体(直径4mm長さ20mm)、熱伝導率測定用試験体(25mm×25mm×1mm)、ヤング率測定用試験体(40mm×4mm×3mm)を切り出し、温度25℃〜150℃の熱膨張係数を熱膨張計(セイコー電子工業社製;TMA300)で、温度25℃での熱伝導率をレーザーフラッシュ法(アルバック社製;TC3000)で、ヤング率を曲げ強度試験機(今田製作所製;SV301)で測定した。 From the composite for evaluation obtained above, a thermal expansion coefficient measurement specimen (diameter 4 mm, length 20 mm), a thermal conductivity measurement specimen (25 mm × 25 mm × 1 mm), a Young's modulus measurement test by grinding. The body (40 mm × 4 mm × 3 mm) was cut out, the thermal expansion coefficient at a temperature of 25 ° C. to 150 ° C. was measured with a thermal dilatometer (Seiko Denshi Kogyo Co., Ltd .; TMA300), and the thermal conductivity at a temperature of 25 ° C. was measured by the laser flash method (ULVAC Young's modulus was measured with a bending strength tester (manufactured by Imada Seisakusho; SV301).
また、上記で得られたアルミニウム合金−黒鉛質複合体をダイヤモンドカッターで、縦40mm、横40mm、厚み1mmの板状体を切り出した後、無電解Ni−Pめっきを行い、めっき層(5μm厚)を形成した。さらに、この板状のアルミニウム合金−黒鉛質複合体にLED光源モジュール及びAl回路基板を鉛フリーはんだで接合した後、ワイヤーボンディングで外部導出用導電パターンと接合して、LED光源パッケージを製作した。 In addition, the aluminum alloy-graphite composite obtained above was cut with a diamond cutter into a plate having a length of 40 mm, a width of 40 mm, and a thickness of 1 mm, and then electroless Ni-P plating was performed to obtain a plating layer (5 μm thick). ) Was formed. Further, an LED light source module and an Al circuit board were joined to the plate-like aluminum alloy-graphite composite with lead-free solder, and then joined to an external lead-out conductive pattern by wire bonding to produce an LED light source package.
<LED光源パッケージの信頼性の評価>
LED光源パッケージを−40℃と125℃の恒温槽に30分間保持しヒートサイクル処理(500回)を行った後に、外観及び接合状態を超音波探傷により確認したところ、接合層の剥離等の問題箇所は確認されなかった。
<Evaluation of reliability of LED light source package>
After holding the LED light source package in a constant temperature bath at −40 ° C. and 125 ° C. for 30 minutes and performing a heat cycle treatment (500 times), the appearance and bonding state were confirmed by ultrasonic flaw detection. The location was not confirmed.
[実施例2]
実施例1で得られたアルミニウム合金−黒鉛質複合体をダイヤモンドカッターで、縦40mm、横40mm、厚み0.5mmの板状体を切り出したこと以外は、実施例1と同様にして、LED光源パッケージ化を行った。
[Example 2]
An LED light source was obtained in the same manner as in Example 1 except that the aluminum alloy-graphite composite obtained in Example 1 was cut out with a diamond cutter into a plate having a length of 40 mm, a width of 40 mm, and a thickness of 0.5 mm. Packaged.
[実施例3]
実施例1で得られたアルミニウム合金−黒鉛質複合体をダイヤモンドカッターで、縦40mm、横40mm、厚み3.0mmの板状体を切り出したこと以外は、実施例1と同様にして、LED光源パッケージ化を行った。
[Example 3]
An LED light source was obtained in the same manner as in Example 1 except that the aluminum alloy-graphite composite obtained in Example 1 was cut out with a diamond cutter into a plate having a length of 40 mm, a width of 40 mm, and a thickness of 3.0 mm. Packaged.
[実施例4]
黒鉛板を東洋炭素株式会社製(MIC25、体積率83%)としたこと以外は、実施例1と同様にしてアルミニウム合金-黒鉛質複合体を作製し、LED光源パッケージ化を行った。
[Example 4]
An aluminum alloy-graphite composite was produced in the same manner as in Example 1 except that the graphite plate was made by Toyo Tanso Co., Ltd. (MIC25, volume ratio 83%), and LED light source packaging was performed.
[実施例5]
黒鉛板を東洋炭素株式会社製(IE252G、体積率60%)としたこと以外は、実施例1と同様にしてアルミニウム合金-黒鉛質複合体を作製し、LED光源パッケージ化を行った。
[Example 5]
An aluminum alloy-graphite composite was produced in the same manner as in Example 1 except that the graphite plate was made by Toyo Tanso Co., Ltd. (IE252G, volume ratio 60%), and LED light source packaging was performed.
[実施例6]
人造黒鉛粉末(小林商事社製:DSC−A、固定炭素分:99.25%)1000gと、炭化珪素粉末(大平洋ランダム社製:NC2000、平均粒径:7μm)183g(10体積%)と混合し、その混合物を、円筒状(内径100mm、高さ150mm)の鉄製容器内に充填し、湯口用の穴があいた鉄板で上下を挟み込んだ状態で体積率が80体積%になるように、圧力80MPaでプレス成形することにより、円柱状(直径100mm、高さ90mm)成形体を得た。
[Example 6]
1000 g of artificial graphite powder (manufactured by Kobayashi Shoji Co., Ltd .: DSC-A, fixed carbon content: 99.25%) and 183 g (10 vol%) of silicon carbide powder (manufactured by Taiyo Random Co., Ltd .: NC2000, average particle size: 7 μm) After mixing, the mixture is filled in a cylindrical (inner diameter 100 mm, height 150 mm) iron container, and the volume ratio is 80% by volume in a state where the upper and lower sides are sandwiched between iron plates with holes for gates, By press molding at a pressure of 80 MPa, a cylindrical (diameter 100 mm, height 90 mm) shaped body was obtained.
なお、成形後に上記鉄製容器と、該容器の上下に配置していた鉄板とを溶接し密封した。得られた成形体を鉄製容器内に保持した状態で、電気炉で温度630℃に予備加熱した後、あらかじめ加熱しておいたプレス金型(内径400mm×高さ300mm)内に収め、シリコンを12質量%及びマグネシウムを1質量%含有するアルミニウム合金の溶湯(温度800℃)を注ぎ、100MPaの圧力で25分間加圧してアルミニウム合金を含浸させた。
得られた複合体を実施例1と同様にしてLED光源パッケージ化を行った。
In addition, the said iron container and the iron plate arrange | positioned at the upper and lower sides of this container were welded and sealed after shaping | molding. The obtained molded body was held in an iron container, preheated to a temperature of 630 ° C. in an electric furnace, and then stored in a preheated press mold (inner diameter 400 mm × height 300 mm). A molten aluminum alloy (temperature 800 ° C.) containing 12% by mass and 1% by mass of magnesium was poured, and the aluminum alloy was impregnated by applying pressure at 100 MPa for 25 minutes.
The obtained composite was packaged with an LED light source in the same manner as in Example 1.
[実施例7]
炭化珪素粉末の添加量を20体積%としたこと以外は、実施例5と同様にしてアルミニウム合金-黒鉛質複合体を作製し、LED光源パッケージ化を行った。
[Example 7]
An aluminum alloy-graphite composite was produced in the same manner as in Example 5 except that the amount of silicon carbide powder added was 20% by volume, and LED light source packaging was performed.
[比較例1]
実施例1で得られたアルミニウム合金−黒鉛質複合体をダイヤモンドカッターで、縦40mm、横40mm、厚み0.3mmの板状体を切り出したこと以外は、実施例1と同様にして、LED光源パッケージ化を行い、ヒートサイクル処理(500回)を行った後に、応力緩和板の割れが確認された。
[Comparative Example 1]
An LED light source was obtained in the same manner as in Example 1 except that the aluminum alloy-graphite composite obtained in Example 1 was cut with a diamond cutter into a plate having a length of 40 mm, a width of 40 mm, and a thickness of 0.3 mm. After packaging and heat cycle treatment (500 times), cracks in the stress relaxation plate were confirmed.
[比較例2]
実施例1で得られたアルミニウム合金−黒鉛質複合体をダイヤモンドカッターで、縦40mm、横40mm、厚み5.0mmの板状体を切り出したこと以外は、実施例1と同様にして、LED光源パッケージ化を行い、ヒートサイクル処理(500回)を行った後に、半田クラックが確認された。
[Comparative Example 2]
An LED light source was obtained in the same manner as in Example 1 except that the aluminum alloy-graphite composite obtained in Example 1 was cut with a diamond cutter into a plate having a length of 40 mm, a width of 40 mm, and a thickness of 5.0 mm. After packaging and heat cycle treatment (500 times), solder cracks were confirmed.
[比較例3]
黒鉛板を東海炭素株式会社製G458(体積率:85%)としたこと以外は、実施例1と同様にしてアルミニウム合金-黒鉛質複合体を作製し、LED光源パッケージ化を行い、ヒートサイクル処理(500回)を行った後に、外観及び接合状態を超音波探傷により確認したところ、接合層に半田クラックが確認された。
[Comparative Example 3]
An aluminum alloy-graphite composite was prepared in the same manner as in Example 1 except that the graphite plate was G458 (volume ratio: 85%) manufactured by Tokai Carbon Co., Ltd., packaged with an LED light source, and heat cycle treated After performing (500 times), when the external appearance and the bonding state were confirmed by ultrasonic flaw detection, solder cracks were confirmed in the bonding layer.
[比較例4]
黒鉛板を東海炭素株式会社製G535(体積率:84%)としたこと以外は、実施例1と同様に
してアルミニウム合金-黒鉛質複合体を作製し、LED光源パッケージ化を行い、ヒートサイクル処理(500回)を行った後に、外観及び接合状態を超音波探傷により確認したところ、接合層に半田クラックが確認された。
[Comparative Example 4]
An aluminum alloy-graphite composite was produced in the same manner as in Example 1 except that the graphite plate was G535 (volume ratio: 84%) manufactured by Tokai Carbon Co., Ltd., packaged with an LED light source, and heat cycle treated After performing (500 times), when the external appearance and the bonding state were confirmed by ultrasonic flaw detection, solder cracks were confirmed in the bonding layer.
[比較例5]
炭化珪素粉末の添加量を30体積%としたこと以外は、実施例5と同様にしてアルミニウム合金-黒鉛質複合体を作製し、LED光源パッケージ化を行い、ヒートサイクル処理(500回)を行った後に、外観及び接合状態を超音波探傷により確認したところ、接合層に半田クラックが確認された。
[Comparative Example 5]
An aluminum alloy-graphite composite was prepared in the same manner as in Example 5 except that the amount of silicon carbide powder added was 30% by volume, packaged with an LED light source, and heat cycled (500 times). After that, when the appearance and bonding state were confirmed by ultrasonic flaw detection, solder cracks were confirmed in the bonding layer.
[比較例6、7]
黒鉛板のかわりにセラミック多孔体として炭化珪素からなる体積率が65および80%である炭化珪素多孔体を用いたこと以外は実施例1と同様にして応力緩和板を作製し、LED光源パッケージ化を行い、ヒートサイクル処理(500回)を行った後に、外観及び接合状態を超音波探傷により確認したところ、接合層に半田クラックが確認された。
[Comparative Examples 6 and 7]
A stress relieving plate was produced in the same manner as in Example 1 except that a silicon carbide porous body made of silicon carbide having a volume ratio of 65 and 80% was used as the ceramic porous body instead of the graphite plate, and the LED light source packaged. After performing the heat cycle treatment (500 times) and confirming the appearance and bonding state by ultrasonic flaw detection, solder cracks were confirmed in the bonding layer.
実施例、比較例の主要条件と結果を表1に示す。 Table 1 shows main conditions and results of Examples and Comparative Examples.
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| JP2009252898A (en) * | 2008-04-03 | 2009-10-29 | Toyoda Gosei Co Ltd | Light source device |
| JP5361273B2 (en) * | 2008-07-30 | 2013-12-04 | 電気化学工業株式会社 | Aluminum-graphite composite, circuit board using the same, and method for producing the same |
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