JP4978665B2 - 金属磁石及びそれを用いたモータ - Google Patents
金属磁石及びそれを用いたモータ Download PDFInfo
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- JP4978665B2 JP4978665B2 JP2009153723A JP2009153723A JP4978665B2 JP 4978665 B2 JP4978665 B2 JP 4978665B2 JP 2009153723 A JP2009153723 A JP 2009153723A JP 2009153723 A JP2009153723 A JP 2009153723A JP 4978665 B2 JP4978665 B2 JP 4978665B2
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- 229910052751 metal Inorganic materials 0.000 title claims description 72
- 239000002184 metal Substances 0.000 title claims description 72
- 239000011247 coating layer Substances 0.000 claims description 98
- 238000007747 plating Methods 0.000 claims description 68
- 238000011084 recovery Methods 0.000 claims description 24
- 241000428199 Mustelinae Species 0.000 claims description 19
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 claims description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 4
- 239000001103 potassium chloride Substances 0.000 claims description 2
- 235000011164 potassium chloride Nutrition 0.000 claims description 2
- 239000011780 sodium chloride Substances 0.000 claims description 2
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N coumarin Chemical compound C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 claims 2
- WINXNKPZLFISPD-UHFFFAOYSA-M Saccharin sodium Chemical compound [Na+].C1=CC=C2C(=O)[N-]S(=O)(=O)C2=C1 WINXNKPZLFISPD-UHFFFAOYSA-M 0.000 claims 1
- 229960000956 coumarin Drugs 0.000 claims 1
- 235000001671 coumarin Nutrition 0.000 claims 1
- NJPKYOIXTSGVAN-UHFFFAOYSA-K trisodium;naphthalene-1,3,6-trisulfonate Chemical compound [Na+].[Na+].[Na+].[O-]S(=O)(=O)C1=CC(S([O-])(=O)=O)=CC2=CC(S(=O)(=O)[O-])=CC=C21 NJPKYOIXTSGVAN-UHFFFAOYSA-K 0.000 claims 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 67
- 150000002910 rare earth metals Chemical class 0.000 description 58
- 238000011156 evaluation Methods 0.000 description 28
- 239000010410 layer Substances 0.000 description 22
- 238000000034 method Methods 0.000 description 20
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 19
- 239000000956 alloy Substances 0.000 description 18
- 229910045601 alloy Inorganic materials 0.000 description 18
- 239000002994 raw material Substances 0.000 description 14
- 239000000428 dust Substances 0.000 description 13
- 239000000203 mixture Substances 0.000 description 13
- 238000010298 pulverizing process Methods 0.000 description 13
- 239000002245 particle Substances 0.000 description 11
- 239000010949 copper Substances 0.000 description 10
- 230000007797 corrosion Effects 0.000 description 10
- 238000005260 corrosion Methods 0.000 description 10
- 238000007373 indentation Methods 0.000 description 10
- 239000011347 resin Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 230000032683 aging Effects 0.000 description 7
- 238000007772 electroless plating Methods 0.000 description 7
- 238000009713 electroplating Methods 0.000 description 7
- 239000000843 powder Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 230000005489 elastic deformation Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 239000002585 base Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000012808 vapor phase Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 230000001360 synchronised effect Effects 0.000 description 4
- 239000011651 chromium Substances 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 230000006378 damage Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 230000003252 repetitive effect Effects 0.000 description 3
- 229910052684 Cerium Inorganic materials 0.000 description 2
- 229910052691 Erbium Inorganic materials 0.000 description 2
- 229910052693 Europium Inorganic materials 0.000 description 2
- 229910052688 Gadolinium Inorganic materials 0.000 description 2
- 229910052689 Holmium Inorganic materials 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229910052779 Neodymium Inorganic materials 0.000 description 2
- 229910052772 Samarium Inorganic materials 0.000 description 2
- 229910052771 Terbium Inorganic materials 0.000 description 2
- 229910052775 Thulium Inorganic materials 0.000 description 2
- 229910052769 Ytterbium Inorganic materials 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- -1 ferroboron Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 150000002484 inorganic compounds Chemical class 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 229910052747 lanthanoid Inorganic materials 0.000 description 2
- 150000002602 lanthanoids Chemical class 0.000 description 2
- 229910052746 lanthanum Inorganic materials 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 238000010422 painting Methods 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910052727 yttrium Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910016347 CuSn Inorganic materials 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 229910052765 Lutetium Inorganic materials 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 1
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- OHSVLFRHMCKCQY-UHFFFAOYSA-N lutetium atom Chemical compound [Lu] OHSVLFRHMCKCQY-UHFFFAOYSA-N 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000004663 powder metallurgy Methods 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 1
- FRNOGLGSGLTDKL-UHFFFAOYSA-N thulium atom Chemical compound [Tm] FRNOGLGSGLTDKL-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K1/00—Details of the magnetic circuit
- H02K1/06—Details of the magnetic circuit characterised by the shape, form or construction
- H02K1/22—Rotating parts of the magnetic circuit
- H02K1/27—Rotor cores with permanent magnets
- H02K1/2786—Outer rotors
- H02K1/2787—Outer rotors the magnetisation axis of the magnets being perpendicular to the rotor axis
- H02K1/2789—Outer rotors the magnetisation axis of the magnets being perpendicular to the rotor axis the rotor consisting of two or more circumferentially positioned magnets
- H02K1/2791—Surface mounted magnets; Inset magnets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
- B32B15/013—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of a metal other than iron or aluminium
- B32B15/015—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of a metal other than iron or aluminium the said other metal being copper or nickel or an alloy thereof
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/002—Ferrous alloys, e.g. steel alloys containing In, Mg, or other elements not provided for in one single group C22C38/001 - C22C38/60
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/005—Ferrous alloys, e.g. steel alloys containing rare earths, i.e. Sc, Y, Lanthanides
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/001—Magnets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
- H01F41/0253—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets
- H01F41/026—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets protecting methods against environmental influences, e.g. oxygen, by surface treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F7/00—Magnets
- H01F7/02—Permanent magnets [PM]
- H01F7/0205—Magnetic circuits with PM in general
- H01F7/0221—Mounting means for PM, supporting, coating, encapsulating PM
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K1/00—Details of the magnetic circuit
- H02K1/06—Details of the magnetic circuit characterised by the shape, form or construction
- H02K1/22—Rotating parts of the magnetic circuit
- H02K1/27—Rotor cores with permanent magnets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
- H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
- H01F1/032—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of hard-magnetic materials
- H01F1/04—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of hard-magnetic materials metals or alloys
- H01F1/047—Alloys characterised by their composition
- H01F1/053—Alloys characterised by their composition containing rare earth metals
- H01F1/055—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5
- H01F1/057—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5 and IIIa elements, e.g. Nd2Fe14B
- H01F1/0571—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5 and IIIa elements, e.g. Nd2Fe14B in the form of particles, e.g. rapid quenched powders or ribbon flakes
- H01F1/0575—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5 and IIIa elements, e.g. Nd2Fe14B in the form of particles, e.g. rapid quenched powders or ribbon flakes pressed, sintered or bonded together
- H01F1/0577—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5 and IIIa elements, e.g. Nd2Fe14B in the form of particles, e.g. rapid quenched powders or ribbon flakes pressed, sintered or bonded together sintered
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/32—Composite [nonstructural laminate] of inorganic material having metal-compound-containing layer and having defined magnetic layer
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Electrochemistry (AREA)
- Environmental & Geological Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Hard Magnetic Materials (AREA)
- Permanent Field Magnets Of Synchronous Machinery (AREA)
- Manufacturing Cores, Coils, And Magnets (AREA)
Description
=Fmax/26.43h2
ここで、「26.43h2」は、ビッカース圧子形状の場合の押し込み深さh[mm]から求められる表面積[mm2]である。
<磁石素体の作製>
粉末冶金法によって調製したNd:27.4質量%、Dy:3.0質量%、B:1.0質量%、Fe:68.6質量%の組成を有するインゴットを、スタンプミル及びボールミルにより粉砕し、上記組成を有する合金粉末を得た。
(株)フィッシャー・インスツルメンツ製ナノインデンテーションシステム(商品名:フィッシャースコープHM2000)を用いて、希土類磁石の被覆層における、押し込み深さ−荷重関係を求め、マルテンス硬さ(HM[N/mm2])、弾性回復率(ηIT[%])、ヤング率(EIT[GPa])を計測した。また、市販の微小ビッカース硬度計を用いて、希土類磁石の被覆層のビッカース硬度(Hv)を計測した。これらの計測結果を表11に示す。なお、ヤング率(EIT[GPa])は、下記式により算出した。
=√π/2×Tc/4.950h×10−3[GPa]
ここで、Tcは図2の曲線C−Dの点Cにおける傾き[N/mm]を示し、Sは最大荷重時の圧子押し込み部分の投影接触面積[mm2]を示す。
「4.950h」は、ビッカース圧子形状の場合の押し込み深さh[mm]から求められる投影接触面積の平方根[mm]である。
Fmax=25mN、Fmin=0.1mN
t1=10秒間、t2=0.1秒間、t3=10秒間
上述の通り作製した希土類磁石を用いて、24極36スロットのアウターロータ型3相ブラシレス永久磁石直流モータ(以下「DDモータ」という。)を組み立てた。このDDモータを、降塵試験装置内に設置し、JIS(JISC60068−2−68)に準拠して砂塵(降塵)試験を行った(試験種類:試験Lb)。砂塵試験中に、DDモータを、3相インバータ正弦波駆動により回転数1400rpmで所定時間(1〜30日間)連続駆動させた。
上述の砂塵試験後のDDモータを分解して取り出した希土類磁石を、温度85℃、相対湿度85RH%に維持された恒温恒湿槽に500時間保持し、保持前後における外観変化を目視にて評価した。評価基準は、外観変化が認められなかったものを「A」、傷部から発錆びが認められたものを「B」とした。その結果を表12に示す。
表2の組成を有するめっき浴(pH:4.5、温度:40℃)を用い、被覆層として磁石素体の表面にCuめっき皮膜の代わりにNiめっき皮膜を形成したこと以外は、実施例1と同様にして希土類磁石を得た。そして、実施例1と同様にして希土類磁石の各評価を行った。各評価結果を表11及び表12に示す。
実施例1と同様にして磁石素体を調製し、実施例1と同様の前処理を施した。また、表3に示す組成を有する第1めっき浴を調製した。調製した第1めっき浴のpHは4.5、温度は50℃であった。
表4に示す組成を有するめっき浴(pH:4.0、温度:50℃)を用いて、磁石素体の表面に被覆層としてCuめっき皮膜の代わりにNiめっき皮膜を形成したこと以外は、実施例1と同様にして希土類磁石を得た。そして、実施例1と同様にして、この希土類磁石の各評価を行った。各評価結果を表11及び表12に示す。
表5に示す組成を有するめっき浴(pH:4.0、温度:50℃)を用い、被覆層としてCuめっき皮膜の代わりにNiめっき皮膜を形成したこと以外は、実施例1と同様にして希土類磁石を得た。そして、実施例1と同様にして、この希土類磁石の各評価を行った。各評価結果を表11及び表12に示す。
実施例3と同様にして、磁石素体の表面上にNiめっき皮膜からなる下地層が形成された希土類磁石1を得た。この希土類磁石1を水洗して、表6の組成を有する第2めっき浴(pH:7.0、温度:50℃)に浸漬し、ガルバニックスタート無電解めっき処理を、バレルめっき法により行った。
第2めっき浴として、表7に示すめっき浴(pH:9.0、温度:60℃)を用いたこと以外は、実施例3と同様にして、磁石素体側からNiからなる下地層及びCuSn合金からなる被覆層が順次積層された構造を有する希土類磁石を得た。実施例1と同様にして、この希土類磁石の各評価を行った。各評価結果を表11及び表12に示す。
表8の組成を有するめっき浴(pH:4.5、温度:50℃)を用い、被覆層として磁石素体の表面上にCuめっき皮膜の代わりにNiめっき皮膜を形成したこと以外は、実施例1と同様にして希土類磁石を得た。そして、実施例1と同様にして、この希土類磁石の各評価を行った。各評価結果を表11及び表12に示す。
めっき浴として、実施例3の第1めっき浴を用い、磁石素体の表面上に被覆層としてCuめっき層の代わりにNiめっき層を形成したこと以外は、実施例1と同様にして希土類磁石を得た。そして、実施例1と同様にして、この希土類磁石の各評価を行った。各評価結果を表11及び表12に示す。
第2めっき浴として表9に示すめっき浴(pH:4.0、温度:30℃)を用いたこと以外は、実施例3と同様にして、磁石素体側から下地層及び被覆層が順次積層された構造を有する希土類磁石を得た。実施例1と同様にして、この希土類磁石の各評価を行った。各評価結果を表11及び表12に示す。
第2めっき浴として、表10に示すめっき浴(pH:9.0、温度:40℃)を用いたこと以外は、実施例3と同様にして、磁石素体側から下地層及び被覆層が順次積層された構造を有する希土類磁石を得た。実施例1と同様にして、この希土類磁石の各評価を行った。各評価結果を表11及び表12に示す。
実施例1と同様にして磁石素体を調製し、実施例1と同様の前処理を施した。その後、磁石素体の表面に、フェノール樹脂の塗料をスプレーコートにより塗布し、150℃で20分間加熱した。このようにして厚さ10μmのフェノール樹脂皮膜を、磁石素体の表面上に被覆層として形成して、希土類磁石を得た。実施例1と同様にして、この希土類磁石の各評価を行った。各評価結果を表11及び表12に示す。
Claims (7)
- 磁石素体と、前記磁石素体の上に被覆層とを有し、
前記被覆層のマルテンス硬さが2000N/mm2以上であり、且つ前記被覆層の弾性回復率が25%以下である金属磁石。 - 前記被覆層のマルテンス硬さが6000N/mm 2 以下である請求項1に記載の金属磁石。
- 前記弾性回復率が5%以上である請求項1又は2に記載の金属磁石。
- 前記被覆層の厚みが1〜50μmである請求項1〜3のいずれか一項に記載の金属磁石。
- 前記被覆層は、サッカリンナトリウム、1,3,6−ナフタレントリスルホン酸ナトリウム、及びクマリンから選ばれる少なくとも一つを含有するめっき浴を用いて形成されためっき皮膜である、請求項1〜4のいずれか一項に記載の金属磁石。
- 前記被覆層は、塩化ナトリウム及び塩化カリウムの少なくとも一方を含有するめっき浴を用いて形成されためっき皮膜である、請求項1〜5のいずれか一項に記載の金属磁石。
- 請求項1〜6のいずれか一項に記載の金属磁石を備えるモータ。
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| CN2010102118777A CN101937752B (zh) | 2009-06-29 | 2010-06-23 | 金属磁铁以及使用该金属磁铁的马达 |
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| US9267217B2 (en) * | 2011-02-15 | 2016-02-23 | Hitachi Metals, Ltd. | Production method for R—Fe—B based sintered magnet having plating film on surface thereof |
| JP5693400B2 (ja) * | 2011-06-29 | 2015-04-01 | 鹿島建設株式会社 | 超高強度コンクリート用骨材の選定方法 |
| EP2550937B1 (en) * | 2011-07-25 | 2014-02-26 | Braun GmbH | Magnetic connection between a toothbrush handle and a brush head |
| DE102012202687A1 (de) * | 2012-02-22 | 2013-08-22 | Robert Bosch Gmbh | Korrosionsschutzüberzug für Nd2Fe14B-Magnete |
| US9859761B2 (en) * | 2013-02-12 | 2018-01-02 | Asmo Co., Ltd. | Rotor and motor |
| US9791470B2 (en) * | 2013-12-27 | 2017-10-17 | Intel Corporation | Magnet placement for integrated sensor packages |
| EP3319098A1 (en) * | 2016-11-02 | 2018-05-09 | Abiomed Europe GmbH | Intravascular blood pump comprising corrosion resistant permanent magnet |
| EP3611740B1 (en) * | 2017-04-11 | 2022-03-09 | LG Innotek Co., Ltd. | Permanent magnet and motor comprising same |
| CN110892491A (zh) * | 2017-07-10 | 2020-03-17 | 思力柯集团 | 包括含铝层的涂层的磁体 |
| CN109419391A (zh) * | 2017-08-31 | 2019-03-05 | 佛山市顺德区美的电热电器制造有限公司 | 磁盘安装组件及食物处理机 |
| FR3084300B1 (fr) * | 2018-07-24 | 2021-05-21 | Univ Le Havre Normandie | Roue motorisee |
| DE102018132924A1 (de) * | 2018-12-19 | 2020-06-25 | Vacuumschmelze Gmbh & Co. Kg | Verfahren zur Vorbehandlung von Seltenerdmagneten vor dem Löten mittels nanokristalliner Lötfolien und magnetisches Bauelement |
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| JPH05275220A (ja) * | 1992-03-24 | 1993-10-22 | Sumitomo Metal Mining Co Ltd | 希土類−鉄系ボンド磁石 |
| JP2908637B2 (ja) * | 1992-06-24 | 1999-06-21 | 住友特殊金属株式会社 | Fe−B−R系焼結磁石の表面処理法 |
| JP3234448B2 (ja) * | 1995-06-19 | 2001-12-04 | 信越化学工業株式会社 | 高耐蝕性永久磁石の製造方法 |
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| US20060141281A1 (en) * | 2004-12-24 | 2006-06-29 | Tdk Corporation | R-T-B system permanent magnet and plating film |
| JP4180049B2 (ja) * | 2004-12-24 | 2008-11-12 | Tdk株式会社 | R−t−b系永久磁石 |
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