JP3531995B2 - Manufacturing method of liquid crystal display device - Google Patents
Manufacturing method of liquid crystal display deviceInfo
- Publication number
- JP3531995B2 JP3531995B2 JP06835695A JP6835695A JP3531995B2 JP 3531995 B2 JP3531995 B2 JP 3531995B2 JP 06835695 A JP06835695 A JP 06835695A JP 6835695 A JP6835695 A JP 6835695A JP 3531995 B2 JP3531995 B2 JP 3531995B2
- Authority
- JP
- Japan
- Prior art keywords
- liquid crystal
- crystal display
- display device
- resist film
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133302—Rigid substrates, e.g. inorganic substrates
Landscapes
- Liquid Crystal (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、2枚のガラス基板間に
液晶を封止した液晶表示装置の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a liquid crystal display device in which liquid crystal is sealed between two glass substrates.
【0002】[0002]
【従来の技術】従来、この種の液晶表示装置としては、
たとえば図3に示すアクティブ型のカラー液晶表示セル
1が知られている。2. Description of the Related Art Conventionally, as a liquid crystal display device of this type,
For example, an active type color liquid crystal display cell 1 shown in FIG. 3 is known.
【0003】この図3に示すカラー液晶表示セル1は、
ガラス基板にて形成されるアクティブマトリクスアレイ
基板2に対して同様にガラス基板にて形成されるカラー
フィルタ基板3を対向させ、これらアクティブマトリク
スアレイ基板2およびカラーフィルタ基板3間に図示し
ないスペーサを介挿して所定間隔の液晶封入空間4を形
成している。そして、アクティブマトリクスアレイ基板
2およびカラーフィルタ基板3の周囲をシール剤5にて
シールして、この液晶封入空間4内に液晶を封止してい
る。The color liquid crystal display cell 1 shown in FIG.
A color filter substrate 3 similarly formed of a glass substrate is opposed to an active matrix array substrate 2 formed of a glass substrate, and a spacer (not shown) is interposed between the active matrix array substrate 2 and the color filter substrate 3. The liquid crystal-filled spaces 4 are inserted at predetermined intervals. Then, the periphery of the active matrix array substrate 2 and the color filter substrate 3 is sealed with a sealant 5 to seal the liquid crystal in the liquid crystal enclosed space 4.
【0004】また、アクティブマトリクスアレイ基板2
上には、図示しない透明の画素電極とこの画素電極を駆
動する薄膜トランジスタ部がマトリクス状に配置されて
おり、ゲート電極およびソース電極により、ドレイン電
極を通じて駆動させている。さらに、アクティブマトリ
クスアレイ基板2上には外部接続電極6が形成され、こ
の外部接続電極6にゲート電極およびドレイン電極が形
成され、この外部接続電極6には、カラー液晶表示セル
1の製造後に、図示しない駆動ICが接続される。Further, the active matrix array substrate 2
A transparent pixel electrode (not shown) and a thin film transistor portion that drives this pixel electrode are arranged in a matrix on the upper side, and are driven through the drain electrode by the gate electrode and the source electrode. Further, an external connection electrode 6 is formed on the active matrix array substrate 2, a gate electrode and a drain electrode are formed on the external connection electrode 6, and the external connection electrode 6 is provided with the external connection electrode 6 after the color liquid crystal display cell 1 is manufactured. A drive IC (not shown) is connected.
【0005】そして、現状のアクティブ型のカラー液晶
表示セル1では、アクティブマトリクスアレイ基板2お
よびカラーフィルタ基板3のいずれも、たとえば板厚
1.1mmのガラス基板を素材として用いており、素ガラ
スの状態から、各種パターンの形成工程、セル組み立て
工程を経て、カラー液晶表示セル1を形成している。In the current active type color liquid crystal display cell 1, both the active matrix array substrate 2 and the color filter substrate 3 are made of a glass substrate having a thickness of 1.1 mm, for example. From the state, the color liquid crystal display cell 1 is formed through various pattern forming steps and cell assembling steps.
【0006】[0006]
【発明が解決しようとする課題】しかしながら、上記図
3に示すカラー液晶表示セル1の場合、ガラス基板の板
厚がそれぞれ1.1mmであるため、全体としての厚さが
2.2mmを越えてしまい、光の透過率も低下し、重量が
重くなる。However, in the case of the color liquid crystal display cell 1 shown in FIG. 3, since the glass substrate has a thickness of 1.1 mm, the total thickness exceeds 2.2 mm. As a result, the light transmittance also decreases and the weight becomes heavy.
【0007】そして、このカラー液晶表示セル1を用い
て、個人用の情報端末機器用のディスプレイを構成する
と、重量および厚さの点で携帯性にマイナスであり、ま
た、光の透過率も低いため、バックライトの輝度を高め
る必要が発生し、バックライトが大きくなり、また電源
用バッテリも大きくなる。When a display for personal information terminal equipment is constructed by using the color liquid crystal display cell 1, portability is negative in terms of weight and thickness, and light transmittance is low. Therefore, it is necessary to increase the brightness of the backlight, the backlight becomes large, and the power supply battery also becomes large.
【0008】このため、従来の1.1mmの板厚より薄
い、板厚が0.7mm、0.5mmのより薄いガラス基板を
素材として用いたり、板厚が0.3mmのガラス基板を使
用することまで提案されている。Therefore, a thinner glass substrate having a thickness of 0.7 mm or 0.5 mm, which is thinner than the conventional thickness of 1.1 mm, or a glass substrate having a thickness of 0.3 mm is used as a material. Even that is suggested.
【0009】しかしながら、ガラス基板を薄くすると、
反り、撓み量が増大し、各工程での素材ハンドリングの
困難度が増加する。However, if the glass substrate is made thin,
The amount of warpage and bending increases, and the difficulty of material handling in each process increases.
【0010】また、温度に対するガラス基板の変形のし
やすさが増大し、各熱処理工程での均一性の確保が困難
になる。Further, the easiness of deformation of the glass substrate with respect to temperature increases, and it becomes difficult to secure uniformity in each heat treatment step.
【0011】さらに、アクティブマトリクスアレイ基板
の生産性を高めるために、素材となるガラス基板の寸法
を大型化することが望まれるが、反り、撓み量が増加し
て、ガラス基板が変形しやすいため、ガラス基板を大型
化することは難しい問題を有している。Further, in order to increase the productivity of the active matrix array substrate, it is desired to increase the size of the glass substrate as a raw material, but since the amount of warpage and bending increases, the glass substrate is easily deformed. However, enlarging the glass substrate has a difficult problem.
【0012】本発明は、上記問題点に鑑みなされたもの
で、ガラス基板に反り、撓みなどの変形を生ずることな
く、薄型化を図ることができる液晶表示装置の製造方法
を提供することを目的とする。The present invention has been made in view of the above problems, and an object of the present invention is to provide a method of manufacturing a liquid crystal display device which can be thinned without causing deformation such as warping or bending of a glass substrate. And
【0013】[0013]
【課題を解決するための手段】本発明は、所定の電極パ
ターンを形成した2枚のガラス基板間に液晶封入空間を
形成させて対向配置し、前記液晶封入空間内に液晶が封
止され、外部に接続する外部接続電極を備えた液晶表示
装置の製造方法において、前記外部接続電極を保護する
レジスト膜を形成する工程と、このレジスト膜を形成し
た工程の後に、ガラスエッチング処理を施して前記2枚
のガラス基板の板厚を均一に薄くする工程と、前記2枚
のガラス基板を所定の板厚にした後、前記レジスト膜を
除去し洗浄する工程とを具備し、前記レジスト膜を形成
する工程は、前記液晶表示装置を形成する工程の後にす
るものである。SUMMARY OF THE INVENTION The present invention is directed to a given electrode pattern.
A liquid crystal filled space is created between the two glass substrates with the turn formed.
The liquid crystal is sealed in the space filled with the liquid crystal.
LCD display with external connection electrodes that are stopped and connect to the outside
Protecting the external connection electrode in a device manufacturing method
The process of forming a resist film and the process of forming this resist film
After the above process, glass etching treatment is applied to
The step of uniformly thinning the thickness of the glass substrate in step 2,
After making the glass substrate of the specified thickness into a predetermined thickness, the resist film is removed.
Process comprising the step of forming the resist film is removed by washing is to after the step of forming the liquid crystal display device.
【0014】さらに、本発明は、ガラスエッチング処理
は、レジスト膜を形成した液晶表示装置をエッチング液
に浸漬させるものである。Further, in the present invention, the glass etching treatment is to immerse the liquid crystal display device having the resist film in an etching solution.
【0015】[0015]
【作用】本発明は、外部接続電極を保護するレジスト膜
を形成し、このレジスト膜を形成した工程の後に、ガラ
スエッチング処理を施して2枚のガラス基板の板厚を均
一に薄くし、2枚のガラス基板を所定の板厚にした後
に、レジスト膜を除去するため、素材としてのガラス基
板を薄くすることなく薄型化を図れるので、ガラス基板
に反り、撓みなどの変形を生ずることなく、薄型化を図
れる。According to the present invention, the resist film for protecting the external connection electrode is formed, and after the step of forming the resist film, the glass etching treatment is performed to uniformly reduce the plate thickness of the two glass substrates. After the glass substrate of a predetermined thickness, after removing the resist film, because it can be thinned without thinning the glass substrate as a material, warping the glass substrate, without causing deformation such as bending, It can be made thinner.
【0016】[0016]
【実施例】以下、本発明の液晶表示装置の製造方法の一
実施例をコンピュータのディスプレイ、ビデオモニタや
テレビに用いられるカラー液晶セルを用いて図面を参照
して説明する。なお、図3に示す従来例に対応する部分
には、同一符号を付して説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a method for manufacturing a liquid crystal display device of the present invention will be described below with reference to the drawings using a color liquid crystal cell used for a computer display, a video monitor and a television. The parts corresponding to those of the conventional example shown in FIG.
【0017】図2に示すように、液晶表示装置としての
カラー液晶表示セル1は、ガラス基板にて形成され所定
電極を有するアクティブマトリクスアレイ基板2に対し
て同様にガラス基板にて形成されるカラーフィルタ基板
3を対向させ、これらアクティブマトリクスアレイ基板
2およびカラーフィルタ基板3間に図示しないスペーサ
を介挿して所定間隔の液晶封入空間4を形成している。
そして、アクティブマトリクスアレイ基板2およびカラ
ーフィルタ基板3の周囲をシール剤5にてシールして、
この液晶封入空間4内に液晶を封止している。As shown in FIG. 2, a color liquid crystal display cell 1 as a liquid crystal display device has a color formed by a glass substrate similarly to an active matrix array substrate 2 formed by a glass substrate and having predetermined electrodes. The filter substrates 3 are opposed to each other, and a spacer (not shown) is interposed between the active matrix array substrate 2 and the color filter substrate 3 to form liquid crystal enclosed spaces 4 at predetermined intervals.
Then, the periphery of the active matrix array substrate 2 and the color filter substrate 3 is sealed with a sealant 5,
Liquid crystal is sealed in the liquid crystal enclosure space 4.
【0018】また、アクティブマトリクスアレイ基板2
上には、図示しない透明の画素電極とこの画素電極を駆
動する薄膜トランジスタ部がマトリクス状に配置されて
おり、ゲート電極およびソース電極により、ドレイン電
極を通じて駆動させている。さらに、アクティブマトリ
クスアレイ基板2上には外部接続電極6が形成され、こ
の外部接続電極6にゲート電極およびドレイン電極が形
成され、この外部接続電極6には、カラー液晶表示セル
1の製造後に、図示しない駆動ICが接続される。Further, the active matrix array substrate 2
A transparent pixel electrode (not shown) and a thin film transistor portion that drives this pixel electrode are arranged in a matrix on the upper side, and are driven through the drain electrode by the gate electrode and the source electrode. Further, an external connection electrode 6 is formed on the active matrix array substrate 2, a gate electrode and a drain electrode are formed on the external connection electrode 6, and the external connection electrode 6 is provided with the external connection electrode 6 after the color liquid crystal display cell 1 is manufactured. A drive IC (not shown) is connected.
【0019】そして、製造工程中では、外部接続電極6
を保護レジスト膜7で被膜している。During the manufacturing process, the external connection electrode 6
Is covered with a protective resist film 7.
【0020】次に、上記実施例の製造方法について、図
1を参照して説明する。Next, the manufacturing method of the above embodiment will be described with reference to FIG.
【0021】アクティブマトリクスアレイ基板2および
カラーフィルタ基板3を1.1mmの板厚のガラス基板を
素材としてカラー液晶表示セル1を形成する。A color liquid crystal display cell 1 is formed by using the active matrix array substrate 2 and the color filter substrate 3 as a glass substrate having a plate thickness of 1.1 mm.
【0022】そして、カラー液晶表示セル1の外部接続
電極6上に、保護レジスト膜7を形成する。なお、この
保護レジスト膜7の形成方法は、たとえばノズルスプレ
ーあるいははけ塗りなどの各種方法が可能で、外部接続
電極6のみ保護する所定の形状に形成する。Then, a protective resist film 7 is formed on the external connection electrodes 6 of the color liquid crystal display cell 1. The protective resist film 7 can be formed by various methods such as nozzle spraying or brush coating, and is formed in a predetermined shape that protects only the external connection electrodes 6.
【0023】次に、この保護レジスト膜7を形成したカ
ラー液晶表示セル1を、エッチング槽11内のガラスエッ
チング液12に浸漬する。また、このガラスエッチング液
12は、たとえばふっ酸の5%溶液を温調したものなどが
使用可能で、浸漬の方法としては、カセットバッチ式の
装置、あるいは、枚葉シャワー式の装置など、必要な生
産性その他により決定できる。なお、カラー液晶表示セ
ル1へのガラスエッチング作用は等法的に発生するが、
外部接続電極6は保護レジスト膜7に覆われているので
エッチングされず、カラー液晶表示セル1の厚み方向が
主になる。Next, the color liquid crystal display cell 1 having the protective resist film 7 formed thereon is dipped in the glass etching solution 12 in the etching tank 11. Also, this glass etching solution
12 can be prepared by adjusting the temperature of a 5% solution of hydrofluoric acid, and the dipping method depends on the required productivity such as cassette batch type device or single wafer shower type device. it can. Although the glass etching action on the color liquid crystal display cell 1 is generated isotropically,
Since the external connection electrode 6 is covered with the protective resist film 7, it is not etched, and the thickness direction of the color liquid crystal display cell 1 is mainly formed.
【0024】そして、所定の時間経過後に、カラー液晶
表示セル1をガラスエッチング液12の入っているエッチ
ング槽11から取り出して、カラー液晶表示セル1を洗浄
するとともに、保護レジスト膜7を除去する。なお、こ
の保護レジスト膜7の除去も、レジスト剥離液を用いる
など各種可能である。After a lapse of a predetermined time, the color liquid crystal display cell 1 is taken out of the etching tank 11 containing the glass etching solution 12, the color liquid crystal display cell 1 is washed, and the protective resist film 7 is removed. The protective resist film 7 can be removed in various ways such as by using a resist stripping solution.
【0025】上記実施例によれば、ガラスエッチング液
12の条件と、経過時間とを一定に保つことにより、ガラ
ス基板のエッチング量をほぼ一定にでき、カラー液晶表
示セル1を連続して生産することができる。According to the above embodiment, the glass etching liquid
By keeping the 12 conditions and the elapsed time constant, the etching amount of the glass substrate can be made substantially constant, and the color liquid crystal display cell 1 can be continuously manufactured.
【0026】また、従来の厚さ1.1mmのガラス基板を
素材としてカラー液晶表示セル1を製造した後に、板厚
のみ薄板化できるため、カラー液晶表示セル1の製造工
程にはなんら変更を必要とせず、ガラスエッチングの工
程を追加するだけで所定の厚みに薄くできる。Further, after manufacturing the color liquid crystal display cell 1 using a conventional glass substrate having a thickness of 1.1 mm as a raw material, only the plate thickness can be reduced, so that the manufacturing process of the color liquid crystal display cell 1 needs to be changed. Instead, it can be thinned to a predetermined thickness simply by adding a glass etching step.
【0027】[0027]
【発明の効果】本発明の液晶表示装置の製造方法によれ
ば、外部接続電極を保護するレジスト膜を形成し、この
レジスト膜を形成した工程の後に、ガラスエッチング処
理を施して2枚のガラス基板の板厚を均一に薄くするの
で、素材としてのガラス基板を薄くすることなく薄型化
を図れるので、ガラス基板に反り、撓みなどの変形を生
ずることなく、薄型化を図ることができる。According to the method of manufacturing a liquid crystal display device of the present invention, a resist film for protecting the external connection electrodes is formed, and after the step of forming the resist film, a glass etching process is performed to form two glass plates. Since the plate thickness of the substrate is uniformly thinned, the glass substrate as a material can be thinned without being thinned, so that the glass substrate can be thinned without being deformed such as warped or bent.
【図1】本発明の液晶表示装置の一実施例のカラー液晶
表示セルの製造方法を示す説明図である。FIG. 1 is an explanatory view showing a method of manufacturing a color liquid crystal display cell of an embodiment of the liquid crystal display device of the present invention.
【図2】同上カラー液晶表示セルを示す説明図である。FIG. 2 is an explanatory diagram showing a color liquid crystal display cell of the same as above.
【図3】従来例のカラー液晶表示セルを示す説明図であ
る。FIG. 3 is an explanatory diagram showing a conventional color liquid crystal display cell.
1 液晶表示装置としてのカラー液晶表示セル
2 ガラス基板からなるアクティブマトリクスアレイ
基板
3 ガラス基板からなるカラーフィルタ基板
4 液晶封入空間
6 外部接続電極
7 レジスト膜としての保護レジスト膜1 Color Liquid Crystal Display Cell as Liquid Crystal Display Device 2 Active Matrix Array Substrate Made of Glass Substrate 3 Color Filter Substrate Made of Glass Substrate 4 Liquid Crystal Enclosed Space 6 External Connection Electrode 7 Protective Resist Film as Resist Film
フロントページの続き (58)調査した分野(Int.Cl.7,DB名) G02F 1/1333 G02F 1/13 101 G02F 1/1345 Continuation of front page (58) Fields surveyed (Int.Cl. 7 , DB name) G02F 1/1333 G02F 1/13 101 G02F 1/1345
Claims (2)
ラス基板間に液晶封入空間を形成させて対向配置し、前
記液晶封入空間内に液晶が封止され、外部に接続する外
部接続電極を備えた液晶表示装置の製造方法において、 前記外部接続電極を保護するレジスト膜を形成する工程
と、 このレジスト膜を形成した工程の後に、ガラスエッチン
グ処理を施して前記2枚のガラス基板の板厚を均一に薄
くする工程と、 前記2枚のガラス基板を所定の板厚にした後、前記レジ
スト膜を除去し洗浄する工程とを具備し、 前記 レジスト膜を形成する工程は、前記液晶表示装置を
形成する工程の後にすることを特徴とした液晶表示装置
の製造方法。1. Two mowers each having a predetermined electrode pattern formed thereon.
A liquid crystal filled space is formed between the lath substrates and arranged opposite to each other.
The liquid crystal is enclosed in the liquid crystal enclosure and is connected to the outside.
Forming a resist film for protecting the external connection electrode in a method of manufacturing a liquid crystal display device having a partial connection electrode
If, after this resist film formed was step, glass etching down
The thickness of the two glass substrates is uniformly reduced by
And a step of making the two glass substrates into a predetermined plate thickness,
; And a step of removing the strike layer is washed, the step of forming the resist film, a method of manufacturing a liquid crystal display device characterized in that after the step of forming the liquid crystal display device.
形成した液晶表示装置をエッチング液に浸漬させること
を特徴とした請求項1記載の液晶表示装置の製造方法。2. A glass etching process, the manufacturing method according to claim 1 Symbol mounting the liquid crystal display device of a liquid crystal display device forming a resist film was characterized by immersing in an etching solution.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP06835695A JP3531995B2 (en) | 1995-03-27 | 1995-03-27 | Manufacturing method of liquid crystal display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP06835695A JP3531995B2 (en) | 1995-03-27 | 1995-03-27 | Manufacturing method of liquid crystal display device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08262419A JPH08262419A (en) | 1996-10-11 |
| JP3531995B2 true JP3531995B2 (en) | 2004-05-31 |
Family
ID=13371456
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP06835695A Expired - Fee Related JP3531995B2 (en) | 1995-03-27 | 1995-03-27 | Manufacturing method of liquid crystal display device |
Country Status (1)
| Country | Link |
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Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100462824B1 (en) * | 1996-11-27 | 2005-04-13 | 삼성전자주식회사 | Manufacturing method of liquid crystal display device for thin film transistor |
| JP3298451B2 (en) * | 1997-03-28 | 2002-07-02 | 三菱電機株式会社 | Liquid crystal panel manufacturing method |
| JP4323115B2 (en) * | 2001-07-06 | 2009-09-02 | シャープ株式会社 | Method for manufacturing functional panel |
| JP4145104B2 (en) * | 2002-09-09 | 2008-09-03 | 奇美電子股▲ふん▼有限公司 | Liquid crystal display manufacturing equipment |
| TWI238444B (en) | 2002-12-10 | 2005-08-21 | Seiko Epson Corp | Method for manufacturing optoelectronic device, optoelectronic device and electronic machine |
| KR100904757B1 (en) * | 2002-12-30 | 2009-06-29 | 엘지디스플레이 주식회사 | LCD and its manufacturing method |
| KR100920480B1 (en) * | 2002-12-31 | 2009-10-08 | 엘지디스플레이 주식회사 | Liquid crystal display device and manufacturing method of the same |
| US7497754B2 (en) * | 2004-04-30 | 2009-03-03 | Kabushiki Kaisha Toyota Jidoshokki | Method for thinning substrate of EL device |
| KR100843386B1 (en) * | 2007-04-12 | 2008-07-03 | 비오이 하이디스 테크놀로지 주식회사 | Manufacturing method of liquid crystal display device |
| WO2008139745A1 (en) * | 2007-05-15 | 2008-11-20 | Sharp Kabushiki Kaisha | Manufacturing method for display device and display device |
| TW201011392A (en) * | 2008-09-09 | 2010-03-16 | United Radiant Technology Corp | Liquid crystal lens with double layer structure and method of manufacturing the same |
| KR101481841B1 (en) * | 2008-12-24 | 2015-01-13 | 엘지디스플레이 주식회사 | Liquid crystal display device and manufacturing method thereof |
| WO2015161433A1 (en) * | 2014-04-22 | 2015-10-29 | 深圳市国华光电科技有限公司 | Display structure having paper effect and manufacturing method therefor |
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1995
- 1995-03-27 JP JP06835695A patent/JP3531995B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH08262419A (en) | 1996-10-11 |
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