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JP3035135B2 - Die bonding material - Google Patents

Die bonding material

Info

Publication number
JP3035135B2
JP3035135B2 JP5266190A JP26619093A JP3035135B2 JP 3035135 B2 JP3035135 B2 JP 3035135B2 JP 5266190 A JP5266190 A JP 5266190A JP 26619093 A JP26619093 A JP 26619093A JP 3035135 B2 JP3035135 B2 JP 3035135B2
Authority
JP
Japan
Prior art keywords
epoxy resin
bonding material
die bonding
equivalent
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP5266190A
Other languages
Japanese (ja)
Other versions
JPH07118365A (en
Inventor
有史 坂本
隆 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP5266190A priority Critical patent/JP3035135B2/en
Publication of JPH07118365A publication Critical patent/JPH07118365A/en
Application granted granted Critical
Publication of JP3035135B2 publication Critical patent/JP3035135B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H10W72/30

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Die Bonding (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、低応力性、接着性及び
低吸水性に優れたダイボンディング材に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a die bonding material excellent in low stress, adhesiveness and low water absorption.

【0002】[0002]

【従来の技術】近年半導体チップの大型化、パッケージ
の薄型化に伴い周辺材料である樹脂材料に対する信頼性
の要求は年々厳しいものとなってきている。その中でリ
ードフレームに半導体チップを接着するダイボンディン
グ材の特性がパッケージの信頼性を高める要因として重
要視されている。パッケージの信頼性で特に重要なもの
として、実装時の熱ストレスに対する耐半田クラック性
がある。この特性を向上させるためには半導体封止材料
と同様にダイボンディング材にも低応力性、低吸水性、
高接着性が要求される。しかしながら、これまでこれら
の特性を全て満足する材料は知られていなかった。例え
ば、ダイボンディング材としてはポリアミド樹脂に無機
フィラーを分散させたものがあり、接着性、低応力性に
関しては優れているが、低吸水性の点で劣り、又溶剤を
用いるため硬化物中にボイドが残り易く、硬化に高温を
必要とするといった欠点があった。一方、他の樹脂とし
てエポキシ樹脂に無機フィラーを分散させたものがある
が、接着性に優れているものの、低吸水性の点でやや劣
り、又硬化物が硬く脆いため低応力性に劣るという問題
があった。
2. Description of the Related Art In recent years, as semiconductor chips have become larger and packages have become thinner, the requirements for reliability of resin materials as peripheral materials have become stricter year by year. Among them, characteristics of a die bonding material for bonding a semiconductor chip to a lead frame are regarded as important factors for improving the reliability of a package. Particularly important in the reliability of the package is resistance to solder cracks against thermal stress during mounting. In order to improve this property, low stress, low water absorption,
High adhesion is required. However, a material satisfying all of these properties has not been known so far. For example, as a die bonding material, there is a material obtained by dispersing an inorganic filler in a polyamide resin, which is excellent in adhesiveness and low stress, but inferior in low water absorption, and in a cured product because a solvent is used. There are disadvantages that voids are easily left and high temperature is required for curing. On the other hand, there is a resin in which an inorganic filler is dispersed in an epoxy resin as another resin, but although it has excellent adhesiveness, it is slightly inferior in terms of low water absorption, and is also inferior in low stress property because the cured product is hard and brittle There was a problem.

【0003】[0003]

【発明が解決しようとする課題】本発明は、これらの問
題を解決するため鋭意検討した結果、低応力性、接着性
及び低吸水性に優れたダイボンディング材を提供するも
のである。
SUMMARY OF THE INVENTION The present invention, as a result of intensive studies to solve these problems, provides a die bonding material excellent in low stress, adhesion and low water absorption.

【課題を解決するための手段】本発明は、(A)式
(1)で示されるエポキシ樹脂(a)と分子中に2個の
フェノール性水酸基を含むフェノール類(b)とを当量
比[(b)の水酸基当量/(a)のエポキシ当量]で、
フェノール類(b)の過剰下で反応してなる生成物、 (B)エポキシ樹脂 (C)硬化剤 及び (D)無機フィラー を必須成分とするダイボンディング材である。
The present invention provides (A) an epoxy resin (a) represented by the formula (1) and a phenol (b) having two phenolic hydroxyl groups in the molecule in an equivalent ratio [ (B) hydroxyl equivalent / (a) epoxy equivalent]
It is a product obtained by reacting in excess of phenols (b), (B) an epoxy resin, (C) a curing agent, and (D) an inorganic filler.

【0004】[0004]

【化2】 Embedded image

【0005】本発明に用いる式(1)のエポキシ樹脂
は、低弾性率、低吸水性の特徴を有する。式中のR1
2は2価の炭素数1〜5の脂肪族基、又は炭素数6以
上の芳香族から2個の水素を除いた残基を示し、互いに
同じでも異なってもよい。R1、R2の2価の炭素数6以
上のものは工業化されていない。これらの中でR1,R2
としてはプロピレン基が好ましい。本発明に用いる式
(1)のエポキシ樹脂とフェノール類(b)の反応例と
しては、式(1)のエポキシ樹脂(a)とフェノール類
(b)とを当量比[(b)の水酸基当量/(a)のエポ
キシ当量]で、フェノール類(b)過剰下、エポキシ樹
脂とフェノール類(b)を混合し、必要により溶媒を加
え100℃以上の条件で反応させる。当量比としては1
〜5がより好ましい。当量比が5を越えるとシロキサン
含有量が少なくなり、ダイボンディング材としての低応
力性が発現しにくくなる。又、式(1)より長鎖長のシ
ロキサンユニットを含む式(2)のエポキシ樹脂も工業
化されている。
[0005] The epoxy resin of the formula (1) used in the present invention has characteristics of low elastic modulus and low water absorption. R 1 ,
R 2 represents a divalent aliphatic group having 1 to 5 carbon atoms or a residue obtained by removing two hydrogen atoms from an aromatic group having 6 or more carbon atoms, and may be the same or different. R 1 and R 2 having a divalent carbon number of 6 or more have not been industrialized. Among them, R 1 and R 2
Is preferably a propylene group. As an example of the reaction between the epoxy resin of the formula (1) and the phenol (b) used in the present invention, the epoxy resin (a) of the formula (1) and the phenol (b) have an equivalent ratio [hydroxy equivalent of (b)]. / Epoxy equivalent of (a)], an epoxy resin and a phenol (b) are mixed in excess of the phenol (b), a solvent is added if necessary, and the mixture is reacted at 100 ° C. or higher. The equivalent ratio is 1
To 5 are more preferable. When the equivalent ratio exceeds 5, the siloxane content decreases, and it becomes difficult to exhibit low stress properties as a die bonding material. Further, the epoxy resin of the formula (2) containing a siloxane unit having a long chain length from the formula (1) is also industrialized.

【0006】[0006]

【化3】 Embedded image

【0007】しかし、式(2)の長鎖長のエポキシ樹
脂、又は式(2)を用いた本発明の方法による反応生成
物は低応力性に優れているものの接着強度、特に熱時強
度が低下する。エポキシ樹脂(a)とフェノール類
(b)との反応を促進するために、必要により触媒を添
加してもよい。触媒の例としてはトリフェニルフォスフ
ィン、トリブチルフォスフィン等の有機フォスフィン
類、これらの有機ボレート塩、1,8−ジアザビシクロ
ウンデセン等のジアザ化合物等が挙げられる。
However, the epoxy resin having a long chain length of the formula (2) or the reaction product obtained by the method of the present invention using the formula (2) is excellent in low stress property, but has low adhesive strength, particularly hot strength. descend. In order to accelerate the reaction between the epoxy resin (a) and the phenols (b), a catalyst may be added as necessary. Examples of the catalyst include organic phosphines such as triphenylphosphine and tributylphosphine, organic borate salts thereof, and diaza compounds such as 1,8-diazabicycloundecene.

【0008】本発明に用いるフェノール類としては、ハ
イドロキノン、レゾルシノール、ビスフェノールA、ビ
スフェノールF、ビスフェノールS、テトラメチルビス
フェノールA、テトラメチルビスフェノールF、テトラ
メチルビスフェノールS、ジヒドロキシジフェニルエー
テル、ジヒドロキシベンゾフェノン、o−ヒドロキシフ
ェノール、m−ヒドロキシフェノール、p−ヒドロキシ
フェノール、ビフェノール、テトラメチルビフェノー
ル、エチリデンビスフェノール、メチルエチリデンビス
(メチルフェノール)、α−メチルベンジリデンビスフ
ェノール、シクロヘキシリデンビスフェノール等が挙げ
られ、これらは単独でも混合して用いてもよい。
The phenols used in the present invention include hydroquinone, resorcinol, bisphenol A, bisphenol F, bisphenol S, tetramethyl bisphenol A, tetramethyl bisphenol F, tetramethyl bisphenol S, dihydroxydiphenyl ether, dihydroxybenzophenone, o-hydroxyphenol. , M-hydroxyphenol, p-hydroxyphenol, biphenol, tetramethylbiphenol, ethylidenebisphenol, methylethylidenebis (methylphenol), α-methylbenzylidenebisphenol, cyclohexylidenebisphenol, and the like. May be used.

【0009】本発明で用いるエポキシ樹脂の例として
は、特に限定されないが、例えばビスフェノールA、ビ
スフェノールF、フェノールノボラックとエピクロルヒ
ドリンとの反応で得られるジグリシジルエーテルで常温
で液状のもの、ビニルシクロヘキセンジオキシド、ジシ
クロペンタジエンオキシド、アリサイクリックジエポキ
シド−アジペイトのような脂環式エポキシ等が挙げられ
る。
Examples of the epoxy resin used in the present invention are not particularly limited. For example, bisphenol A, bisphenol F, diglycidyl ether obtained by the reaction of phenol novolak with epichlorohydrin, liquid at room temperature, vinylcyclohexene dioxide , Dicyclopentadiene oxide, alicyclic epoxy such as alicyclic diepoxide-adipate, and the like.

【0010】本発明の硬化剤としてはダイボンディング
材のシェルフライフを損なわないものであれば、特に限
定はされない。例えば、ヘキサヒドロフタール酸無水
物、メチルヒドロフタール酸無水物、ナジック酸無水物
等の酸無水物、ノボラック型フェノール樹脂等のポリフ
ェノール類、及びイミダゾール、ジシアンジアミド等の
アミン系化合物が挙げられる。反応生成物、エポキシ樹
脂、硬化剤の配合比は特に限定されないが、エポキシ基
当量/エポキシ基と反応する活性基当量の比が1〜10
であり、かつ3者の合計重量中の反応生成物は30重量
%以上であることが好ましい。当量比が10を越えた
り、又は反応生成物が30重量%未満だとダイボンディ
ング材としての低応力性が損なわれるからである。
[0010] The curing agent of the present invention is not particularly limited as long as it does not impair the shelf life of the die bonding material. Examples thereof include acid anhydrides such as hexahydrophthalic anhydride, methylhydrophthalic anhydride, and nadic anhydride, polyphenols such as novolak-type phenol resin, and amine compounds such as imidazole and dicyandiamide. The mixing ratio of the reaction product, epoxy resin and curing agent is not particularly limited, but the ratio of epoxy group equivalent / active group equivalent reacting with epoxy group is 1 to 10
And the reaction product in the total weight of the three is preferably at least 30% by weight. If the equivalent ratio exceeds 10 or the reaction product is less than 30% by weight, the low stress property as the die bonding material is impaired.

【0011】本発明で用いる無機フィラーとしては、炭
酸カルシウム、シリカ、アルミナ等の絶縁フィラー、銀
粉、金粉、ニッケル粉、銅粉等の導電性フィラーが挙げ
られ、用途によりこれらを複数混合してもよい。更に、
ニードル詰りを防止するため、これらの粒径は50μm
以下のものが好ましい。
Examples of the inorganic filler used in the present invention include insulating fillers such as calcium carbonate, silica, and alumina, and conductive fillers such as silver powder, gold powder, nickel powder, and copper powder. Good. Furthermore,
These particles have a particle size of 50 μm to prevent needle clogging.
The following are preferred.

【0012】本発明によると、式(1)で示される低鎖
長シロキサンユニットを含むエポキシ樹脂をフェノール
類と予め反応させることにより、ダイボンディング材と
して適度な粘度の樹脂が得られ、硬化時に樹脂成分のブ
リード、アウトガスによるチップや、その周辺の汚染も
極めて少なくすることができる。又、式(1)のエポキ
シ樹脂は、低鎖長シロキサンユニットのため熱時におけ
る流動性がある程度抑制され、熱時接着強度の低下も少
なくなる。更に、単に式(1)のエポキシ樹脂を単独、
又は式(1)のエポキシ樹脂と他のエポキシ樹脂を混合
したダイボンディング材では、硬化時にアウトガスやブ
リードが発生し半導体周辺を汚染してしまうという欠点
がある。本発明の樹脂組成物は、反応生成物、エポキシ
樹脂、硬化剤及び無機フィラー、必要に応じて硬化促進
剤、顔料、染料、消泡剤、溶剤等の添加剤を予備混合
し、三本ロールを用いて混練し、ペーストを得て真空脱
泡することにより製造することができる。
According to the present invention, a resin having an appropriate viscosity is obtained as a die bonding material by pre-reacting an epoxy resin containing a low-chain-length siloxane unit represented by the formula (1) with a phenol. Chip bleeding and outgassing of components and contamination of the periphery thereof can be extremely reduced. Further, since the epoxy resin of the formula (1) is a low-chain-length siloxane unit, the fluidity at the time of heating is suppressed to some extent, and the decrease in adhesive strength at the time of heating is reduced. Furthermore, the epoxy resin of the formula (1) is used alone,
Alternatively, the die bonding material in which the epoxy resin of the formula (1) is mixed with another epoxy resin has a disadvantage that outgassing or bleeding occurs at the time of curing, thereby contaminating the periphery of the semiconductor. The resin composition of the present invention is pre-mixed with a reaction product, an epoxy resin, a curing agent and an inorganic filler, and if necessary, additives such as a curing accelerator, a pigment, a dye, an antifoaming agent, and a solvent. The mixture can be manufactured by kneading the mixture, obtaining a paste, and defoaming in vacuo.

【0013】反応生成物の製造例1 ビスフェノールF(水酸基当量100)100g、式
(3)のエポキシ樹脂(エポキシ当量181)90g
に、触媒としてトリフェニルフォスフィン0.5gを添
加し180℃、2hr反応させた。この生成物を反応生
成物(1)とする
Production Example 1 of Reaction Product 100 g of bisphenol F (hydroxy equivalent: 100) and 90 g of epoxy resin of formula (3) (epoxy equivalent: 181)
Was added with 0.5 g of triphenylphosphine as a catalyst, and the mixture was reacted at 180 ° C. for 2 hours. This product is referred to as reaction product (1).

【0014】[0014]

【化4】 Embedded image

【0015】反応生成物の製造例2 レゾルシノール(水酸基当量55)110g、式(3)
のエポキシ樹脂180gに、触媒としてトリフェニルフ
ォスフィン0.5gを添加し、180℃、2hr反応さ
せた。この生成物を反応生成物(2)とする。 反応生成物の製造例3 ビスフェノールF100g、式(4)のエポキシ樹脂
(エポキシ当量330)165gに、トリフェニルフォ
スフィン0.5gを添加し180℃、2hr反応させ
た。この生成物を反応生成物(3)とする。
Production Example 2 of reaction product 110 g of resorcinol (hydroxyl equivalent 55), formula (3)
To 180 g of the epoxy resin was added 0.5 g of triphenylphosphine as a catalyst and reacted at 180 ° C. for 2 hours. This product is referred to as reaction product (2). Production Example 3 of Reaction Product 0.5 g of triphenylphosphine was added to 100 g of bisphenol F and 165 g of an epoxy resin of formula (4) (epoxy equivalent 330), and reacted at 180 ° C. for 2 hours. This product is referred to as reaction product (3).

【0016】[0016]

【化5】 Embedded image

【0017】以下本発明を実施例で具体的に説明する。 実施例1 エポキシ樹脂としてビスフェノールFエポキシ樹脂(エ
ポキシ当量170)(以下BPFEPという)70g、
希釈剤としてt−ブチルフェニルグリシジルエーテル
(以下TGAという)30g、硬化剤としてジシアンジ
アミド(以下DDAという)1g、2−フェニル−4−
メチルイミダゾール(2E4MIという)2g、反応生
成物(1)150g、平均粒径3μmのフレーク状銀粉
830gを配合し三本ロールで混練しダイボンディング
材を調製した。このダイボンディング材を用い銀めっき
付銅フレームに2×2mm角のシリコンチップを200
℃、60分で硬化接着させ、300℃における熱時接着
力をプッシュプルゲージで測定した。同様に15×6×
0.3mm(厚さ)のシリコンチップを厚さ50μmの
銀めっき付銅フレームに200℃、60分で硬化接着さ
せ、低応力性の尺度としてチップの長手方向を表面粗さ
計を用いて上下方向の変位の最大値を求めた。又、ダイ
ボンディング材硬化物(200℃、60分で硬化)の弾
性率及び85℃、85%RH下での飽和吸水率を測定し
た。更にブリード性を調べた。評価結果を表1に示す。
Hereinafter, the present invention will be described specifically with reference to Examples. Example 1 70 g of bisphenol F epoxy resin (epoxy equivalent 170) (hereinafter referred to as BPFEP) as an epoxy resin,
30 g of t-butylphenylglycidyl ether (hereinafter referred to as TGA) as a diluent, 1 g of dicyandiamide (hereinafter referred to as DDA) as a curing agent, 2-phenyl-4-
2 g of methylimidazole (referred to as 2E4MI), 150 g of the reaction product (1), and 830 g of flake silver powder having an average particle diameter of 3 μm were mixed and kneaded with a three-roll mill to prepare a die bonding material. Using this die bonding material, a 2 × 2 mm square silicon chip is placed on a silver-plated copper frame for 200 times.
The composition was cured and adhered at 60 ° C. for 60 minutes, and the adhesive force at 300 ° C. was measured with a push-pull gauge. Similarly, 15 × 6 ×
A silicon chip of 0.3 mm (thickness) is cured and adhered to a silver-plated copper frame having a thickness of 50 μm at 200 ° C. for 60 minutes, and the longitudinal direction of the chip is measured using a surface roughness meter as a measure of low stress. The maximum value of the displacement in the direction was determined. Further, the elastic modulus of the cured product of the die bonding material (cured at 200 ° C. for 60 minutes) and the saturated water absorption at 85 ° C. and 85% RH were measured. Further, the bleeding property was examined. Table 1 shows the evaluation results.

【0018】実施例2〜4 表1の配合に従い、実施例1と同様にしてダイボンディ
ング材を調整し、実施例1と同様の試験を行った。測定
結果を表1に示す。
Examples 2 to 4 According to the composition shown in Table 1, the die bonding material was adjusted in the same manner as in Example 1, and the same test as in Example 1 was performed. Table 1 shows the measurement results.

【0019】比較例1〜3 表1の配合に従い、実施例1と同様にしてダイボンディ
ング材を調整し、実施例1と同様の試験を行った。測定
結果を表1に示す。
Comparative Examples 1 to 3 According to the composition shown in Table 1, a die bonding material was prepared in the same manner as in Example 1, and the same test as in Example 1 was performed. Table 1 shows the measurement results.

【0020】[0020]

【表1】 [Table 1]

【0021】[0021]

【発明の効果】本発明は、低応力性、接着性及び低吸水
性に優れ、かつ硬化時のブリードがなく工業的に有用な
ダイボンディング材である。
Industrial Applicability The present invention is an industrially useful die bonding material which is excellent in low stress, adhesiveness and low water absorption and has no bleed during curing.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI H01L 21/52 H01L 21/52 E (58)調査した分野(Int.Cl.7,DB名) C08L 63/00 - 63/10 C08G 59/20 - 59/30 C09J 163/00 - 163/10 H01L 21/52 ──────────────────────────────────────────────────の Continuation of the front page (51) Int.Cl. 7 identification code FI H01L 21/52 H01L 21/52 E (58) Field surveyed (Int.Cl. 7 , DB name) C08L 63/00-63 / 10 C08G 59/20-59/30 C09J 163/00-163/10 H01L 21/52

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 (A)式(1)で示されるエポキシ樹脂
(a)と分子中に2個のフェノール性水酸基を含むフェ
ノール類(b)とを当量比[(b)の水酸基当量/
(a)のエポキシ当量]で、フェノール類(b)の過剰
下で反応してなる生成物、 (B)エポキシ樹脂 (C)硬化剤 及び (D)無機フィラー を必須成分とすることを特徴とするダイボンディング
材。 【化1】
1. An equivalent ratio of (A) an epoxy resin (a) represented by the formula (1) to a phenol (b) containing two phenolic hydroxyl groups in a molecule [hydroxyl equivalent of (b) /
(A) epoxy equivalent], a product obtained by reacting in excess of phenol (b), (B) an epoxy resin, (C) a curing agent, and (D) an inorganic filler as essential components. Die bonding material. Embedded image
JP5266190A 1993-10-25 1993-10-25 Die bonding material Expired - Lifetime JP3035135B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5266190A JP3035135B2 (en) 1993-10-25 1993-10-25 Die bonding material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5266190A JP3035135B2 (en) 1993-10-25 1993-10-25 Die bonding material

Publications (2)

Publication Number Publication Date
JPH07118365A JPH07118365A (en) 1995-05-09
JP3035135B2 true JP3035135B2 (en) 2000-04-17

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JP5266190A Expired - Lifetime JP3035135B2 (en) 1993-10-25 1993-10-25 Die bonding material

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Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2726251B2 (en) * 1995-12-14 1998-03-11 住友ベークライト株式会社 Die bonding material
TWI345576B (en) 2003-11-07 2011-07-21 Dow Corning Toray Silicone Curable silicone composition and cured product thereof
US7863399B2 (en) 2003-12-26 2011-01-04 Dow Corning Toray Company, Ltd Curing silicone composition and cured product thereof
JP4664032B2 (en) 2004-10-13 2011-04-06 東レ・ダウコーニング株式会社 Method for producing silylalkoxymethyl halide
JP4931366B2 (en) 2005-04-27 2012-05-16 東レ・ダウコーニング株式会社 Curable silicone composition and electronic component
JP5004433B2 (en) 2005-04-27 2012-08-22 東レ・ダウコーニング株式会社 Curable silicone composition and cured product thereof
JP4983166B2 (en) * 2006-09-06 2012-07-25 住友ベークライト株式会社 Resin composition and semiconductor device produced using resin composition
JP5285846B2 (en) 2006-09-11 2013-09-11 東レ・ダウコーニング株式会社 Curable silicone composition and electronic component
JP4851573B2 (en) * 2009-09-24 2012-01-11 古河電気工業株式会社 Sheet adhesive and wafer processing tape
JP4851579B2 (en) * 2009-11-19 2012-01-11 古河電気工業株式会社 Sheet adhesive and wafer processing tape
CN120504939A (en) * 2025-07-18 2025-08-19 武汉市三选科技有限公司 Resin composition with low water absorption rate, chip adhesive film, preparation method thereof and stacked package structure

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