JP3022871B1 - Electrolytic reduction device - Google Patents
Electrolytic reduction deviceInfo
- Publication number
- JP3022871B1 JP3022871B1 JP11020892A JP2089299A JP3022871B1 JP 3022871 B1 JP3022871 B1 JP 3022871B1 JP 11020892 A JP11020892 A JP 11020892A JP 2089299 A JP2089299 A JP 2089299A JP 3022871 B1 JP3022871 B1 JP 3022871B1
- Authority
- JP
- Japan
- Prior art keywords
- electrolytic cell
- molten metal
- electrolytic
- molten
- ceramic tile
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052751 metal Inorganic materials 0.000 claims abstract description 76
- 239000002184 metal Substances 0.000 claims abstract description 76
- 150000003839 salts Chemical class 0.000 claims abstract description 47
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 44
- 239000000919 ceramic Substances 0.000 claims abstract description 43
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 22
- 238000005868 electrolysis reaction Methods 0.000 claims abstract description 19
- 239000003575 carbonaceous material Substances 0.000 claims abstract description 7
- 239000007770 graphite material Substances 0.000 claims abstract description 6
- 208000024891 symptom Diseases 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 abstract description 22
- 230000007797 corrosion Effects 0.000 abstract description 21
- 238000005260 corrosion Methods 0.000 abstract description 21
- 210000004027 cell Anatomy 0.000 description 47
- 229910052770 Uranium Inorganic materials 0.000 description 18
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 description 17
- 239000010439 graphite Substances 0.000 description 16
- 230000000052 comparative effect Effects 0.000 description 7
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 229910044991 metal oxide Inorganic materials 0.000 description 5
- 150000004706 metal oxides Chemical class 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- WZECUPJJEIXUKY-UHFFFAOYSA-N [O-2].[O-2].[O-2].[U+6] Chemical compound [O-2].[O-2].[O-2].[U+6] WZECUPJJEIXUKY-UHFFFAOYSA-N 0.000 description 4
- 239000008151 electrolyte solution Substances 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 4
- 229910000439 uranium oxide Inorganic materials 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 210000005056 cell body Anatomy 0.000 description 2
- 150000004673 fluoride salts Chemical class 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- 229910016036 BaF 2 Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000994 depressogenic effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- -1 uranium ions Chemical class 0.000 description 1
Landscapes
- Electrolytic Production Of Metals (AREA)
Abstract
【要約】
【課題】 溶融金属に接触する電解槽底部の腐食を抑制
して炭素濃度の少ない溶融金属を回収する。
【解決手段】 電解還元装置10は、溶融塩18を貯え
底部に陰極13を有する電解槽11と、電解槽11の溶
融塩18中に保持される陽極19とを備え、陰極13及
び陽極19に通電して溶融塩18を電解することにより
還元された溶融金属21が電解槽11の底部に貯留可能
に構成される。溶融金属21が貯留する電解槽11の底
部内面にセラミックタイル23が設けられる。溶融金属
21が接触する電解槽11内面に互いに交差する複数の
凸条が形成され、複数の凸条により区画されて形成され
た複数の凹部にセラミックタイル23が埋設される。黒
鉛又は炭素材から成る薄板をセラミックタイル23を覆
うように電解槽の底部に敷設することが好ましい。Abstract: PROBLEM TO BE SOLVED: To recover a molten metal having a low carbon concentration by suppressing corrosion of a bottom portion of an electrolytic cell in contact with the molten metal. SOLUTION: The electrolytic reduction apparatus 10 includes an electrolytic cell 11 which stores a molten salt 18 and has a cathode 13 at a bottom portion, and an anode 19 held in the molten salt 18 of the electrolytic cell 11. The molten metal 21 reduced by the electrolysis of the molten salt 18 by being energized can be stored in the bottom of the electrolytic cell 11. A ceramic tile 23 is provided on the inner surface of the bottom of the electrolytic cell 11 in which the molten metal 21 is stored. A plurality of intersecting ridges are formed on the inner surface of the electrolytic cell 11 with which the molten metal 21 contacts, and the ceramic tile 23 is embedded in a plurality of recesses defined by the plurality of ridges. It is preferable to lay a thin plate made of graphite or carbon material on the bottom of the electrolytic cell so as to cover the ceramic tile 23.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、溶融塩電解により
ウラン等の活性な金属を溶融状態で生成する電解還元装
置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrolytic reduction apparatus for producing an active metal such as uranium in a molten state by molten salt electrolysis.
【0002】[0002]
【従来の技術】溶融塩電解では金属酸化物や金属塩が還
元されて陰極に溶融金属として生成され、アルミニウム
等の金属を生産する方法としてフッ化物溶融塩を電解液
とした溶融塩電解法が知られている。この溶融塩電解法
では、電解槽の上方に陽極を設け、電解槽の底部を陰極
とした構造の電解還元装置が一般的に用いられている。
従来、このような装置として図5に示すようなものが知
られている。図5に示す電解還元装置は、溶融塩2を貯
え陰極に接続された電解槽1と、電解槽1の溶融塩2中
に保持される陽極3とを備える。この電解槽1は溶融塩
を貯留するものであるため、溶融塩2に対して耐食性を
有しかつ陰極を形成するための条件として導電性である
ことが必要であるため、黒鉛又は炭素材を加工すること
により作られる。この電解槽1では電解電流が溶融塩2
の中を流れる際に発生する熱を利用して加熱され、電解
槽の厳密な温度管理により電解槽1の側面部1aのフッ
化物塩部分2aを非溶融状態にして電解槽の側面部1a
を絶縁状態にすることにより、陰極面積を実質的に電解
槽1の底部のみに限定して電解を行うようになってい
る。この装置では、この陰極及び陽極に通電して溶融塩
を電解することにより還元された溶融金属は電解槽の底
部に貯留するように構成される。2. Description of the Related Art In molten salt electrolysis, a metal oxide or a metal salt is reduced and formed as a molten metal on a cathode. As a method for producing a metal such as aluminum, a molten salt electrolysis method using a fluoride molten salt as an electrolytic solution is known. Are known. In this molten salt electrolysis method, an electrolytic reduction apparatus having a structure in which an anode is provided above an electrolytic cell and the bottom of the electrolytic cell is used as a cathode is generally used.
Conventionally, such an apparatus as shown in FIG. 5 is known. The electrolytic reduction device shown in FIG. 5 includes an electrolytic cell 1 that stores a molten salt 2 and is connected to a cathode, and an anode 3 that is held in the molten salt 2 of the electrolytic cell 1. Since the electrolytic cell 1 stores molten salt, it is necessary to have corrosion resistance to the molten salt 2 and to be electrically conductive as a condition for forming a cathode. It is made by processing. In this electrolytic cell 1, the electrolytic current is
Is heated by utilizing the heat generated when flowing through the inside of the electrolytic cell, and the strict temperature control of the electrolytic cell causes the fluoride salt portion 2a of the side surface 1a of the electrolytic cell 1 to be in a non-molten state so as to be in a non-molten state.
Is in an insulated state, so that the cathode area is substantially limited to only the bottom of the electrolytic cell 1 to perform electrolysis. In this apparatus, the molten metal reduced by electrolyzing the molten salt by energizing the cathode and the anode is stored at the bottom of the electrolytic cell.
【0003】[0003]
【発明が解決しようとする課題】しかし、黒鉛又は炭素
材は溶融塩に対する耐食性に優れるけれども、活性な溶
融金属に対する耐食性に劣る欠点がある。即ち、上述し
た電解還元装置では、電解により還元された活性な溶融
金属が電解槽の底部に貯留すると、その溶融金属に接触
する電解槽の底部がその溶融金属により腐食する不具合
がある。また、黒鉛又は炭素材から成る電解槽が溶融金
属により腐食すると、還元して生成した溶融金属の炭素
濃度が上昇し、溶融金属が炭素により汚染される不具合
もある。この点を解消するために、溶融金属に対する耐
食性が良好な酸化物等のセラミックにより電解槽を形成
することも考えられるが、セラミックは電解槽に当初貯
えられる溶融塩により著しく腐食する問題点がある。本
発明の目的は、溶融金属に接触する電解槽底部の腐食を
抑制して炭素濃度の少ない溶融金属を回収しうる電解還
元装置を提供することにある。However, although graphite or carbon materials are excellent in corrosion resistance to molten salts, they have the disadvantage that they are poor in corrosion resistance to active molten metals. That is, in the above-described electrolytic reduction apparatus, when the active molten metal reduced by electrolysis is stored in the bottom of the electrolytic cell, there is a problem that the bottom of the electrolytic cell in contact with the molten metal is corroded by the molten metal. Further, when the electrolytic cell made of graphite or carbon material is corroded by the molten metal, the carbon concentration of the molten metal generated by reduction increases, and the molten metal is contaminated with carbon. In order to solve this problem, it is conceivable to form the electrolytic cell with a ceramic such as an oxide having good corrosion resistance against molten metal, but there is a problem that the ceramic is significantly corroded by molten salt initially stored in the electrolytic cell. . It is an object of the present invention to provide an electrolytic reduction apparatus capable of suppressing corrosion of the bottom of an electrolytic cell in contact with a molten metal and recovering a molten metal having a low carbon concentration.
【0004】[0004]
【課題を解決するための手段】請求項1に係る発明は、
図1及び図2に示すように、溶融塩18を貯え有底筒部
13aが形成された陰極13を底部に有する電解槽11
と、電解槽11の溶融塩18中に保持される陽極19と
を備え、陰極13及び陽極19に通電して溶融塩18を
電解することにより還元された溶融金属21が有底筒部
13aに貯留可能に構成された電解還元装置の改良であ
る。その特徴ある構成は、溶融金属21が貯留する有底
筒部13aの内面に互いに交差する複数の凸条24が形
成され、複数の凸条24により区画されて形成された複
数の凹部26にセラミックタイル23が埋設されたとこ
ろにある。この請求項1に係る発明では、溶融金属に対
する耐食性が良好なセラミックから成るタイルを溶融金
属21が貯留する有底筒部13aの内面に設けることに
より、その貯留した溶融金属21により電解槽11が腐
食することを防止する。有底筒部13aの内面に絶縁性
のセラミックタイル23を設けても、電解槽11に貯留
する溶融金属21は凸条24の先端に接触して陰極を形
成する。溶融金属21が接触する凸条24は腐食する
が、凸条24が腐食減少してセラミックタイル23の間
に窪みが生じた後には、その窪みの溶融金属21はその
窪みの内部で滞留する。このため、その窪みで滞留する
溶融金属21の炭素濃度は上昇して所定量以上の凸条2
4の腐食は抑制され、窪み以外の溶融金属21の炭素濃
度が上昇することを防止する。 The invention according to claim 1 is
As shown in FIGS. 1 and 2, a bottomed cylindrical portion stored the molten salt 18
Electrolyzer 11 having cathode 13 on which bottom 13a is formed
And an anode 19 held in the molten salt 18 of the electrolytic cell 11, and the molten metal 21 reduced by energizing the cathode 13 and the anode 19 to electrolyze the molten salt 18 has a bottomed cylindrical portion.
This is an improvement of the electrolytic reduction device configured to be able to store in the storage device 13a . The characteristic configuration is a bottomed bottom where molten metal 21 is stored.
A plurality of ridges 24 crossing each other are formed on the inner surface of the cylindrical portion 13a.
Formed by a plurality of ridges 24
The ceramic tiles 23 are embedded in the concave portions 26 in the number . In the invention according to the first aspect, the tile made of ceramic having good corrosion resistance to the molten metal is provided on the inner surface of the bottomed cylindrical portion 13a in which the molten metal 21 is stored, so that the electrolytic bath 11 is formed by the stored molten metal 21. Prevents corrosion. Insulation on inner surface of bottomed cylindrical part 13a
Is stored in the electrolytic cell 11 even if the ceramic tile 23 is provided.
Molten metal 21 contacts the tip of the ridge 24 to form a cathode.
To achieve. The ridges 24 that the molten metal 21 contacts are corroded.
However, between the ceramic tiles 23, the ridges 24 are reduced in corrosion.
After the pit is formed, the molten metal 21 in the pit becomes
It stays inside the depression. Because of this, it stays in the depression
The carbon concentration of the molten metal 21 rises and the ridges
4 is suppressed, and the carbon concentration of the molten metal 21 other than the depressions is reduced.
Prevent the degree from rising.
【0005】請求項2に係る発明は、請求項1に係る発
明であって、黒鉛又は炭素材から成る薄板27がセラミ
ックタイル23を覆うように電解槽11の底部に敷設さ
れた電解還元装置である。この請求項2に係る発明で
は、溶融金属21が貯留する以前に溶融塩18は黒鉛か
ら成る薄板27の表面と接触し、薄板27はセラミック
タイル23が溶融塩18と接触することを防止してその
セラミックタイル23が溶融塩18により腐食すること
を防止する。溶融金属21が貯留した後に薄板27は腐
食消滅し、その後に出現するセラミックタイル23が黒
鉛等から成る電解槽11の腐食を抑制する。 The invention according to claim 2 is the invention according to claim 1, wherein the thin plate 27 made of graphite or carbon material is made of ceramic.
Laid on the bottom of the electrolytic cell 11 so as to cover the
The is an electrolytic reduction apparatus. In the invention according to claim 2,
Means that molten salt 18 is graphite before molten metal 21 is stored.
Contacting the surface of a thin plate 27 made of
The tile 23 is prevented from coming into contact with the molten salt 18 and
Corrosion of ceramic tile 23 by molten salt 18
To prevent After the molten metal 21 is stored, the thin plate 27 becomes rotten.
The ceramic tiles 23 that disappear and disappear afterwards are black
Corrosion of the electrolytic cell 11 made of lead or the like is suppressed.
【0006】請求項3に係る発明は、請求項1又は2に
係る発明であって、セラミックタイル(23)がY 2 O 3 から
なる電解還元装置である。この請求項3に係る発明で
は、Y 2 O 3 は溶融金属に対する耐食性が良好であるた
め、溶融金属21により電解槽11が腐食することを有
効に防止できる。 [0006] The invention according to claim 3 is the invention according to claim 1 or 2, ceramic tiles (23) from Y 2 O 3
It is composed of electrolytic reduction apparatus. In the invention according to claim 3, Y 2 O 3 has good corrosion resistance to molten metal.
Therefore, the electrolytic cell 11 may be corroded by the molten metal 21.
Can be effectively prevented.
【0007】[0007]
【発明の実施の形態】本発明の電解還元装置の実施の形
態を図面に基づいて説明する。この電解還元装置10は
活性な金属であるウランの酸化物(UO2,U3O8等)
を電解還元するのに適する。図1に示すように、この装
置10の電解槽11は、黒鉛製の槽本体12と黒鉛製の
導電部材13とにより構成される。槽本体12は有底円
筒体であって、その底部の中央に円形の開口部12aが
形成される。導電部材13は、開口部12aと所定の隙
間を有するようにこの開口部12aに設けられる。具体
的に、導電部材13は絶縁材14を介して開口部12a
の底部に設置され、槽本体12と導電部材13は適切な
距離で離間して絶縁され、この導電部材13には陰極が
接続される。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of an electrolytic reduction apparatus according to the present invention will be described with reference to the drawings. This electrolytic reduction apparatus 10 is an active metal uranium oxide (UO 2 , U 3 O 8, etc.)
Is suitable for electrolytic reduction. As shown in FIG. 1, an electrolytic cell 11 of this apparatus 10 is constituted by a cell body 12 made of graphite and a conductive member 13 made of graphite. The tank main body 12 is a bottomed cylindrical body, and has a circular opening 12a at the center of the bottom. The conductive member 13 is provided in the opening 12a so as to have a predetermined gap with the opening 12a. Specifically, the conductive member 13 is provided with the opening 12 a via the insulating material 14.
The tank body 12 and the conductive member 13 are spaced apart from each other at an appropriate distance and insulated, and a cathode is connected to the conductive member 13.
【0008】導電部材13の槽本体12の内部に臨む部
分は有底筒部13aに形成され、筒部13aの上縁は槽
本体12の内底面より低く形成される。槽本体12の開
口部12a周縁と有底筒部13aの先端周縁との間には
絶縁性部材である窒化ホウ素製の被覆部材16が設けら
れる。被覆部材16の上面は槽本体12の底部表面と同
一平面をなすように形成され、被覆部材16には下端が
有底筒部13aに所定の隙間を持って挿入可能な外形を
有する挿入筒部16aが形成される。槽本体12には導
電部材13との隙間に連通する不活性ガスの導入流路1
2bが形成され、槽本体12の外部には図示しないがこ
の導入流路12bに不活性ガスを圧送するガス供給手段
であるガスボンベが設けられる。なお、槽本体12の溶
融塩18中には陽極19が保持して設けられる。The portion of the conductive member 13 facing the inside of the tank body 12 is formed in a bottomed cylindrical portion 13 a, and the upper edge of the cylindrical portion 13 a is formed lower than the inner bottom surface of the tank body 12. A coating member 16 made of boron nitride, which is an insulating member, is provided between the periphery of the opening 12a of the tank body 12 and the periphery of the distal end of the bottomed cylindrical portion 13a. The upper surface of the covering member 16 is formed so as to be flush with the bottom surface of the tank body 12, and the lower end of the covering member 16 has an outer shape capable of being inserted into the bottomed cylindrical portion 13a with a predetermined gap. 16a are formed. Introducing passage 1 for the inert gas communicating with the gap between conductive member 13 and tank body 12
2b, a gas cylinder (not shown) is provided outside the tank body 12 as gas supply means for feeding an inert gas under pressure to the introduction flow path 12b. An anode 19 is provided in the molten salt 18 of the tank body 12 while being held.
【0009】また、槽本体12には下端が底部と所定の
間隔をあけて仕切壁12cが設けられ、この仕切壁12
cと槽本体12の側壁とにより、原料となるウラン酸化
物を溶融塩18中に供給するための供給口12dが形成
される。槽本体12の外部には加熱することにより塩を
溶融状態にして電解槽11の電解液とするヒータ17が
設けられる。一方、導電部材13には有底筒部13aに
連通して電解により生成された溶融金属21を排出可能
に構成されたクランク状の排出口13bが形成され、排
出口13bの中間に連通する縦孔12eが槽本体12の
側壁に形成される。この縦孔12eには先端にセラミッ
ク製の封止栓22aを有する遮断用ロッド22が挿入さ
れ、遮断用ロッド22は図の実線矢印で示すように上昇
すると、この排出口13bを開放し、破線矢印で示すよ
うに下降すると、この排出口13bを遮断するように構
成される。The tank body 12 is provided with a partition wall 12c with a lower end spaced from the bottom by a predetermined distance.
A supply port 12 d for supplying uranium oxide as a raw material into the molten salt 18 is formed by c and the side wall of the tank body 12. A heater 17 is provided outside the tank body 12 so that the salt is melted by heating to be used as an electrolytic solution of the electrolytic tank 11. On the other hand, the conductive member 13 is formed with a crank-shaped discharge port 13b which is connected to the bottomed cylindrical portion 13a so as to discharge the molten metal 21 generated by the electrolysis, and is vertically connected to the middle of the discharge port 13b. A hole 12 e is formed in the side wall of the tank body 12. A cut-off rod 22 having a ceramic sealing plug 22a at its tip is inserted into the vertical hole 12e. When the cut-off rod 22 rises as shown by a solid line arrow in the figure, the discharge port 13b is opened and a broken line is drawn. When descending as indicated by the arrow, the discharge port 13b is shut off.
【0010】この電解槽11では、開口部12aと導電
部材13との間に隙間を設けたことにより導電部材13
と槽本体12との間が電気的に絶縁され、陰極に電気的
に接続されることにより導電部材13は電解槽11の底
部で陰極として作用する。この電解槽11の槽本体12
内に支持塩を入れて溶融状態にし、これと同時に開口部
12aと導電部材13との間の隙間にガス供給手段であ
るガスボンベにより不活性ガスを導入流路12bを介し
て図の実線矢印で示すように圧送することにより溶融塩
18が隙間に侵入することを防止するようになってい
る。In the electrolytic cell 11, a gap is provided between the opening 12a and the conductive member 13 so that the conductive member 13
The electrically conductive member 13 acts as a cathode at the bottom of the electrolytic cell 11 by electrically insulating between the cell and the cell body 12 and electrically connecting to the cathode. The tank body 12 of the electrolytic cell 11
A supporting salt is put into the molten state, and at the same time, an inert gas is introduced into a gap between the opening 12a and the conductive member 13 by a gas cylinder as a gas supply means through an introduction flow path 12b as indicated by a solid line arrow in the drawing. As shown in the drawing, the molten salt 18 is prevented from entering the gap by pressure feeding.
【0011】この電解還元装置10ではヒータ17によ
り加熱して電解槽11に入れられた支持塩を溶融させた
後、陽極19及び陰極となる導電部材13に通電し、こ
の状態で原料のUO2,U3O8等の金属酸化物を槽本体
12に供給すると、この金属酸化物の電解還元が行わ
れ、電解液である溶融塩18中の金属陽イオンは陰極で
ある導電部材13の有底筒部13aの内面に溶融金属2
1となって析出する。なお、この生成した溶融金属21
はその比重差により有底筒部13a内に貯留し、有底筒
部13a内に貯留した金属21は、遮断用ロッド22を
上昇させることにより、導電部材13に設けられた排出
口13bを介して回収可能に構成される。[0011] After melting supporting salt which is placed in the electrolytic bath 11 is heated by the heater 17 in the electrolytic reduction apparatus 10, by energizing the conductive member 13 made of an anode 19 and a cathode, UO 2 of the raw material in this state When a metal oxide such as U 3 O 8 is supplied to the tank body 12, the metal oxide is electrolytically reduced, and the metal cations in the molten salt 18, which is an electrolytic solution, are contained in the conductive member 13 which is a cathode. Molten metal 2 is applied to the inner surface of
It becomes 1 and precipitates. The generated molten metal 21
Is stored in the bottomed cylindrical portion 13a due to the difference in specific gravity, and the metal 21 stored in the bottomed cylindrical portion 13a is raised via the discharge rod 13b provided in the conductive member 13 by raising the blocking rod 22. And can be collected.
【0012】本発明の特徴ある構成は、溶融金属21が
貯留する導電部材13の底部内面にセラミックタイル2
3が設けられたところにある。図2に示すように、この
実施形態では、溶融金属が接触する導電部材13の内面
に互いに交差する複数の凸条24が形成され、この複数
の凸条24により区画されて形成された複数の凹部26
にセラミックタイル23は埋設される。図2及び図3に
示すように、この実施の形態では凸条24により形成さ
れる凹部26の内部に更に穴26aが形成され、セラミ
ックタイル23は凹部26の深さに相当する厚さを有し
かつその凹部26にはめ込まれて電解槽の内面を形成す
る平板部23aと、凹部26の内に形成された穴26a
に挿入する凸部23bとが一体的に形成され、セラミッ
クタイル23は接着剤によりその凹部26に埋設され
る。The feature of the present invention is that the ceramic tile 2 is provided on the inner bottom surface of the conductive member 13 in which the molten metal 21 is stored.
3 is provided. As shown in FIG. 2, in this embodiment, a plurality of ridges 24 that intersect each other are formed on the inner surface of the conductive member 13 with which the molten metal contacts, and a plurality of ridges 24 formed by being partitioned by the plurality of ridges 24 are formed. Recess 26
The ceramic tile 23 is embedded. As shown in FIGS. 2 and 3, in this embodiment, a hole 26 a is further formed inside the concave portion 26 formed by the ridge 24, and the ceramic tile 23 has a thickness corresponding to the depth of the concave portion 26. And a flat plate portion 23a fitted into the concave portion 26 to form the inner surface of the electrolytic cell, and a hole 26a formed in the concave portion 26.
The ceramic tile 23 is embedded in the concave portion 26 with an adhesive.
【0013】具体的に説明すると、凸部23bの両側部
には穴26aの内側面に対向する一対の溝23cがそれ
ぞれ形成され、溝23cの断面と同一の断面を有する角
棒25がこの溝23cを埋めるように挿入される。角棒
25は導電部材13と同一材料である黒鉛により作ら
れ、接着剤は炭素を含有し黒鉛等を強固に接着するもの
が使用される。接着剤は溝23cに挿入された角棒25
に塗布され、この状態で凸部23bをその角棒25とと
もに穴26aに挿入する。なお、接着剤は角棒25が対
面する穴26aの側壁(図2のハッチングで示す部分)
に塗布しても良い。これにより、図3の拡大図に示すよ
うに角棒25は穴26aの側壁に接着して凸部23bが
その穴26aから離脱することを禁止し、凸部23bが
一体的に形成された平板部23aは凹部26に埋没す
る。このようにして凹部26に埋設されたセラミックタ
イル23の表面は凸条24の先端面と面一になり電解槽
の内面を形成する。More specifically, a pair of grooves 23c facing the inner surface of the hole 26a are formed on both sides of the projection 23b, and a square bar 25 having the same cross section as the cross section of the groove 23c is formed. 23c is inserted so as to fill it. The square bar 25 is made of graphite, which is the same material as the conductive member 13, and an adhesive containing carbon and firmly bonding graphite or the like is used. The adhesive is a square bar 25 inserted into the groove 23c.
In this state, the projection 23b is inserted into the hole 26a together with the square bar 25. The adhesive is applied to the side wall of the hole 26a facing the square bar 25 (the portion shown by hatching in FIG. 2).
May be applied. As a result, as shown in the enlarged view of FIG. 3, the square bar 25 is adhered to the side wall of the hole 26a to prevent the protrusion 23b from coming off from the hole 26a, and the flat plate in which the protrusion 23b is integrally formed. The portion 23a is buried in the concave portion 26. Thus, the surface of the ceramic tile 23 buried in the concave portion 26 is flush with the tip surface of the ridge 24 to form the inner surface of the electrolytic cell.
【0014】図3に示すように、セラミックタイル23
が凹部26に埋設された電解槽である導電部材13の底
部には、黒鉛又は炭素材から成る薄板27がセラミック
タイル23を覆うように敷設される。薄板27の厚さは
溶融塩18の液深により定められ、0.1mm〜3mm
であることが好ましい。この実施の形態における薄板2
7は炭素を含有する接着剤によりセラミックタイル23
の表面及び凸条24の先端面に接着され、凸条24を介
して陰極に電気的に接続するように敷設される。このよ
うに構成された電解還元装置10では、ヒータ17によ
り加熱して電解槽11に入れられた支持塩を溶融させる
と、その溶融塩は黒鉛から成る電解槽11の及び黒鉛か
ら成る薄板27の表面と接触する。このため、薄板27
はセラミックタイル23が溶融塩18と接触することを
防止してそのセラミックタイル23が溶融塩18により
腐食することを防止する。As shown in FIG.
A thin plate 27 made of graphite or a carbon material is laid on the bottom of the conductive member 13 which is an electrolytic cell embedded in the concave portion 26 so as to cover the ceramic tile 23. The thickness of the thin plate 27 is determined by the liquid depth of the molten salt 18 and is 0.1 mm to 3 mm.
It is preferred that Thin plate 2 in this embodiment
7 is a ceramic tile 23 made of an adhesive containing carbon.
Is adhered to the surface of the ridge and the front end face of the ridge 24, and is laid so as to be electrically connected to the cathode through the ridge 24. In the electrolytic reduction apparatus 10 configured as described above, when the supporting salt placed in the electrolytic cell 11 is melted by heating by the heater 17, the molten salt is applied to the electrolytic cell 11 made of graphite and the thin plate 27 made of graphite. Contact with surface. For this reason, the thin plate 27
Prevents the ceramic tile 23 from coming into contact with the molten salt 18 and prevents the ceramic tile 23 from being corroded by the molten salt 18.
【0015】その後、陽極19及び陰極である導電部材
13に通電して金属酸化物を槽本体12に供給すると、
この金属酸化物の電解還元が行われ、陰極である導電部
材13の有底筒部13aに溶融金属21が析出する。こ
の析出した溶融金属21はその比重差により有底筒部1
3a内に貯留する。この溶融金属21はセラミックタイ
ル23を覆うように敷設された黒鉛から成る薄板27を
腐食させるが、この薄板27が腐食消滅した後に出現す
るセラミックタイル23は溶融金属21に対して耐食性
を有し腐食することはない。このため、セラミックタイ
ル23は黒鉛から成る導電部材13が溶融金属と接触す
ることを防止してその電解槽11が溶融金属21により
腐食することを抑制する。Thereafter, when the anode 19 and the conductive member 13 serving as the cathode are energized to supply the metal oxide to the tank body 12,
The electrolytic reduction of the metal oxide is performed, and the molten metal 21 is deposited on the bottomed cylindrical portion 13a of the conductive member 13 serving as the cathode. The deposited molten metal 21 is separated from the bottomed cylindrical portion 1 by the difference in specific gravity.
Store in 3a. The molten metal 21 corrodes a thin plate 27 made of graphite laid so as to cover the ceramic tile 23. The ceramic tile 23 appearing after the thin plate 27 has been corroded and disappeared has corrosion resistance to the molten metal 21 and has a corrosion resistance. I will not do it. For this reason, the ceramic tile 23 prevents the conductive member 13 made of graphite from coming into contact with the molten metal and suppresses the electrolytic cell 11 from being corroded by the molten metal 21.
【0016】なお、図4に示すように、薄板27が腐食
消滅した後には凸条24に溶融金属21が接触してその
溶融金属21はこの凸条24を腐食させるが、凸条24
が腐食減少して窪んだ部分における溶融金属21はセラ
ミックタイル23の間に挟まれて滞留する。このため、
セラミックタイル23の間の窪みで滞留する溶融金属2
1の炭素濃度は上昇し、所定量以上の凸条24の腐食は
抑制される。また、炭素濃度の上昇した溶融金属21が
その窪みで滞留することにより、その窪み以外の有底筒
部13a内に貯留する溶融金属21の炭素濃度の上昇は
抑制され、導電部材13の排出口13bを介して回収さ
れる溶融金属21が炭素により汚染されることを防止す
る。As shown in FIG. 4, after the thin plate 27 has been corroded and disappeared, the molten metal 21 comes into contact with the ridge 24, and the molten metal 21 corrodes the ridge 24.
The molten metal 21 in the depressed portion due to the reduced corrosion is interposed between the ceramic tiles 23 and stays. For this reason,
Molten metal 2 stagnating in depressions between ceramic tiles 23
The carbon concentration of No. 1 increases, and the corrosion of the ridges 24 of a predetermined amount or more is suppressed. Further, since the molten metal 21 having an increased carbon concentration stays in the depression, the increase in the carbon concentration of the molten metal 21 stored in the bottomed cylindrical portion 13 a other than the depression is suppressed, and the discharge port of the conductive member 13 is reduced. Prevents the molten metal 21 recovered via 13b from being contaminated by carbon.
【0017】[0017]
【実施例】次に本発明の実施例を説明する。 <実施例1>図1に示す装置と、フッ化物溶融塩18を
生成するフッ化物を準備した。電解槽の底部内面に設け
られるセラミックタイル23はY2O3からなるものを使
用し、このセラミックタイル23は厚さ0.3mmの黒
鉛から成る薄板27により覆った。フッ化物は74重量
%のBaF2と、11重量%のLiFと、15重量%の
UF4とからなる混合物を準備した。このフッ化物混合
物を槽本体12に供給し、ヒータ17の誘導加熱コイル
に通電して電解槽11を加熱し、徐々にウランの融点以
上の1200℃まで昇温した。これと同時に開口部12
aと導電部材13との間の隙間にガス供給手段であるガ
スボンベから不活性ガスのアルゴンを導入流路12bを
介して圧送し、供給したフッ化物混合物が溶融塩18と
なったときにも、この溶融塩18が上記隙間に侵入する
ことを防止した。Next, embodiments of the present invention will be described. Example 1 An apparatus shown in FIG. 1 and a fluoride for producing a fluoride molten salt 18 were prepared. The ceramic tile 23 provided on the inner surface of the bottom of the electrolytic cell was made of Y 2 O 3 , and this ceramic tile 23 was covered with a thin plate 27 of 0.3 mm thick graphite. As the fluoride, a mixture consisting of 74% by weight of BaF 2 , 11% by weight of LiF, and 15% by weight of UF 4 was prepared. The fluoride mixture was supplied to the tank main body 12, and an electric current was supplied to the induction heating coil of the heater 17 to heat the electrolytic tank 11, and the temperature was gradually raised to 1200 ° C., which was equal to or higher than the melting point of uranium. At the same time, the opening 12
When the inert gas argon is pressure-fed from the gas cylinder as the gas supply means to the gap between the a and the conductive member 13 through the introduction flow path 12b, and the supplied fluoride mixture becomes the molten salt 18, The molten salt 18 was prevented from entering the gap.
【0018】次に、槽本体12の上方から陽極19をフ
ッ化物溶融塩18中に挿入し、導電部材13を陰極とし
て陰極電流密度が0.7〜1.6A/cm2の範囲で通
電した後、原料となるUO2を供給口12dから供給し
て溶融塩電解を行った。この溶融塩電解により、電解液
である溶融塩18中のウランイオン(U4+)が陰極であ
る導電部材13の有底筒部13aの内面に溶融した金属
ウラン21となって析出し、有底筒部13a内に貯留し
た。所定量の金属ウラン21が析出した時点で遮断用ロ
ッド22を上昇させて排出口13bを開放して溶融した
金属ウラン21を排出口13bを介して所定量排出させ
た。その後、遮断用ロッド22を再び下降させて排出口
13bを遮断し、溶融した金属ウラン21が排出した分
だけ供給口12dから原料のウラン酸化物を新たに供給
することにより連続的に電解還元を行った。Next, the anode 19 was inserted into the molten fluoride salt 18 from above the tank body 12, and the current was applied at a cathode current density of 0.7 to 1.6 A / cm 2 using the conductive member 13 as a cathode. Thereafter, UO 2 as a raw material was supplied from the supply port 12d to perform molten salt electrolysis. By this molten salt electrolysis, uranium ions (U 4+ ) in the molten salt 18 as the electrolytic solution are deposited as molten metal uranium 21 on the inner surface of the bottomed cylindrical portion 13a of the conductive member 13 as the cathode, and are deposited. It was stored in the bottom cylindrical portion 13a. When a predetermined amount of metal uranium 21 was deposited, the blocking rod 22 was raised to open the discharge port 13b, and the molten metal uranium 21 was discharged through the discharge port 13b by a predetermined amount. Thereafter, the shut-off rod 22 is lowered again to shut off the discharge port 13b, and the raw material uranium oxide is newly supplied from the supply port 12d by the amount discharged by the molten metal uranium 21, thereby continuously performing electrolytic reduction. went.
【0019】<比較例1>Y2O3からなるセラミックタ
イル23と黒鉛から成る薄板27を設けないこと以外は
実施例1と同一構造の電解還元装置を用意し、実施例1
と同一組成のフッ化物をその電解槽に供給し、電気炉に
より1200℃まで昇温して溶融させた。その後、原料
のウラン酸化物を電解槽に入れ電解時間を除き実施例1
と同一の条件及び手順で電解を行った。Comparative Example 1 An electrolytic reduction apparatus having the same structure as in Example 1 was prepared except that the ceramic tile 23 made of Y 2 O 3 and the thin plate 27 made of graphite were not provided.
Was supplied to the electrolytic cell, and the temperature was raised to 1200 ° C. by an electric furnace to be melted. Then, uranium oxide as a raw material was put into an electrolytic cell, and Example 1 was omitted except for electrolysis time.
Electrolysis was carried out under the same conditions and procedure as described above.
【0020】<比較試験及び評価>実施例1において
は、電解開始後10時間経過後に排出口13bを介して
排出された金属ウラン、及び電解開始後50時間経過後
に排出された金属ウランのそれぞれの炭素濃度を測定し
た。その結果、10時間経過後に排出された金属ウラン
の炭素濃度は200ppmであったが、50時間経過後
に排出された金属ウランの炭素濃度は150ppmであ
った。10時間経過後に排出された金属ウランの炭素濃
度が200ppmであったのは黒鉛から成る薄板27が
腐食したことに起因するものと考えられ、50時間経過
後に排出された金属ウランの炭素濃度が150ppmと
減少したのはその薄板27が消滅したことによるものと
考えられる。<Comparative Test and Evaluation> In Example 1, each of the metal uranium discharged through the discharge port 13b after 10 hours from the start of electrolysis and the metal uranium discharged after 50 hours from the start of electrolysis, The carbon concentration was measured. As a result, the carbon concentration of metallic uranium discharged after 10 hours was 200 ppm, but the carbon concentration of metallic uranium discharged after 50 hours was 150 ppm. It is considered that the carbon concentration of the metallic uranium discharged after 10 hours was 200 ppm because the thin plate 27 made of graphite was corroded, and the carbon concentration of the metallic uranium discharged after 50 hours was 150 ppm. It is considered that the thin plate 27 disappeared.
【0021】比較例1においては、電解開始後10時間
経過後に排出口13bを介して排出された金属ウラン、
及び電解開始後20時間経過後に排出された金属ウラン
のそれぞれの炭素濃度を測定した。その結果、10時間
及び20時間経過後に排出されたそれぞれの金属ウラン
の炭素濃度はいずれも200ppmであった。10時間
以上経過後しても炭素濃度が200ppmであるのは、
比較例1では常に黒鉛から成る電解槽が溶融金属である
金属ウランにより腐食していることに起因するものと考
えられる。また、実施例1では電解開始後70時間経過
後に電解槽を解体し、比較例1では電解開始後20時間
経過後に電解槽を解体し、実施例1及び比較例1の金属
ウランが貯留した電解槽底部を目視により観察した。そ
の結果、実施例1の電解槽底面に敷設された薄板27は
おおむね消滅していたが、セラミックタイル23には損
傷した形跡が見られなかった。一方、比較例1の電解槽
底面の黒鉛には腐食の形跡が認められた。In Comparative Example 1, metal uranium discharged through the discharge port 13b 10 hours after the start of electrolysis,
The respective carbon concentrations of the metallic uranium discharged 20 hours after the start of electrolysis were measured. As a result, the carbon concentration of each metallic uranium discharged after the passage of 10 hours and 20 hours was 200 ppm. The carbon concentration is still 200 ppm even after 10 hours or more,
It is considered that in Comparative Example 1, the electrolytic cell made of graphite was always corroded by metallic uranium as a molten metal. Further, in Example 1, the electrolytic cell was disassembled 70 hours after the start of electrolysis, and in Comparative Example 1, the electrolytic cell was disassembled 20 hours after the start of electrolysis, and the electrolytic uranium of Example 1 and Comparative Example 1 was stored. The bottom of the tank was visually observed. As a result, although the thin plate 27 laid on the bottom surface of the electrolytic cell in Example 1 had almost disappeared, the ceramic tile 23 did not show any signs of damage. On the other hand, traces of corrosion were observed in the graphite on the bottom surface of the electrolytic cell of Comparative Example 1.
【0022】[0022]
【発明の効果】以上述べたように、本発明によれば、溶
融金属に対する耐食性が良好なセラミックタイルを溶融
金属が貯留する電解槽の底部内面に設けたので、その貯
留した溶融金属により電解槽が腐食することを抑制する
ことができる。特に、溶融金属が接触する電解槽内面に
互いに交差する複数の凸条を形成し、この複数の凸条に
より区画されて形成された複数の凹部にセラミックタイ
ルを埋設すれば、電解槽に貯留する溶融金属が凸条の先
端に接触して陰極を形成することができる。この場合、
溶融金属が接触する凸条は腐食するが、凸条が腐食減少
してセラミックタイルの間に窪みが生じた後には、その
窪みの溶融金属はその窪みの内部で滞留するため、その
窪みで滞留する溶融金属の炭素濃度は上昇して所定量以
上の凸条の腐食は抑制され、窪み以外の溶融金属の炭素
濃度が上昇することを防止することができる。また、セ
ラミックタイルを覆うように電解槽の底部に黒鉛又は炭
素材から成る薄板を敷設すれば、溶融金属が貯留する以
前の溶融塩がセラミックタイルに接触することを防止し
てそのセラミックタイルが溶融塩により腐食することを
防止することができる。この場合、薄板は溶融金属が貯
留した後に腐食消滅し、その後に出現するセラミックタ
イルが黒鉛等から成る電解槽の腐食を抑制する。As described above, according to the present invention, the ceramic tile having good corrosion resistance to the molten metal is provided on the inner surface at the bottom of the electrolytic cell in which the molten metal is stored. Can be suppressed from being corroded. In particular, if a plurality of intersecting ridges are formed on the inner surface of the electrolytic cell in contact with the molten metal, and the ceramic tiles are embedded in a plurality of concave portions formed by the plurality of ridges, the ridges are stored in the electrolytic cell. The molten metal that comes into contact with the tips of the ridges can form a cathode. in this case,
The ridges that the molten metal contacts are corroded, but after the ridges have been corroded and reduced, causing a depression between the ceramic tiles, the molten metal in that depression stays inside the depression, so it stays in the depression. As a result, the carbon concentration of the molten metal increases and the corrosion of the ridges of a predetermined amount or more is suppressed, and the carbon concentration of the molten metal other than the depressions can be prevented from increasing. In addition, if a thin plate made of graphite or carbon material is laid on the bottom of the electrolytic cell so as to cover the ceramic tile, the molten salt before the molten metal is stored is prevented from contacting the ceramic tile, and the ceramic tile is melted. Corrosion due to salt can be prevented. In this case, the thin plate is corroded and disappeared after the molten metal is stored, and the ceramic tile that appears thereafter suppresses the corrosion of the electrolytic cell made of graphite or the like.
【図1】本発明の電解還元装置の中央縦断面図。FIG. 1 is a central longitudinal sectional view of an electrolytic reduction device of the present invention.
【図2】その電解槽の凸条が形成された内底部とセラミ
ックタイルの関係を示す斜視図。FIG. 2 is a perspective view showing a relationship between an inner bottom portion of the electrolytic cell in which a ridge is formed and a ceramic tile.
【図3】図1のA部拡大断面図FIG. 3 is an enlarged sectional view of a portion A in FIG. 1;
【図4】薄板が腐食消滅した後の図3のB部拡大断面図FIG. 4 is an enlarged sectional view of a portion B in FIG. 3 after the thin plate has been corroded and disappeared.
【図5】従来の電解還元装置を示す図1に対応する断面
図。FIG. 5 is a cross-sectional view corresponding to FIG. 1, showing a conventional electrolytic reduction device.
10 電解還元装置 11 電解槽 13 導電部材(陰極) 18 溶融塩 19 陽極 21 溶融金属 23 セラミックタイル 24 凸条 26 凹部 27 薄板 Reference Signs List 10 electrolytic reduction device 11 electrolytic bath 13 conductive member (cathode) 18 molten salt 19 anode 21 molten metal 23 ceramic tile 24 ridge 26 concave portion 27 thin plate
フロントページの続き (72)発明者 星野 康史 茨城県那珂郡那珂町大字向山字六人頭 1002番地の14 三菱マテリアル株式会社 総合研究所 環境・エネルギー研究所 内 (56)参考文献 特開 平3−271389(JP,A) 特開 平11−80987(JP,A) 特公 昭40−28441(JP,B1) (58)調査した分野(Int.Cl.7,DB名) C25C 7/00,3/34 Continuing from the front page (72) Inventor Yasushi Hoshino 14-headed six-headed character, Mukaiyama, Naka-machi, Naka-gun, Naka-gun, Ibaraki Pref. 271389 (JP, A) JP-A-11-80987 (JP, A) JP 40-28441 (JP, B1) (58) Fields investigated (Int. Cl. 7 , DB name) C25C 7 / 00,3 / 34
Claims (3)
された陰極(13)を底部に有する電解槽(11)と、前記電解
槽(11)の溶融塩(18)中に保持される陽極(19)とを備え、
前記陰極(13)及び前記陽極(19)に通電して前記溶融塩(1
8)を電解することにより還元された溶融金属(21)が前記
有底筒部(13a)に貯留可能に構成された電解還元装置に
おいて、 前記溶融金属(21)が貯留する前記有底筒部(13a)の内面
に互いに交差する複数の凸条(24)が形成され、 前記複数の凸条(24)により区画されて形成された複数の
凹部(26)にセラミックタイル(23)が埋設されたことを特
徴とする 電解還元装置。1. A bottomed cylindrical portion (13a) for storing a molten salt (18).
An electrolytic cell (11) having a cathode (13) at the bottom, and an anode (19) held in a molten salt (18) of the electrolytic cell (11),
Energizing the cathode (13) and the anode (19), the molten salt (1
8) The molten metal (21) reduced by electrolysis is
In the electrolytic reduction device configured to be stored in the bottomed cylindrical portion (13a), an inner surface of the bottomed cylindrical portion (13a) in which the molten metal (21) is stored.
A plurality of ridges (24) crossing each other are formed, and a plurality of ridges formed by being partitioned by the plurality of ridges (24) are formed .
Note that the ceramic tile (23) was buried in the recess (26).
Electrolytic reduction apparatus according to symptoms.
ミックタイル(23)を覆うように電解槽(11)の底部に敷設
された請求項1記載の電解還元装置。2. A thin plate made of graphite or carbon material (27)
Laying at the bottom of the electrolytic cell (11) so as to cover the Mic tile (23)
The electrolytic reduction device according to claim 1 , wherein:
請求項1又は2記載の電解還元装置。3. A ceramic tile (23) is electrolytically reduced device <br/> claim 1 or 2, wherein consists Y 2 O 3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11020892A JP3022871B1 (en) | 1999-01-29 | 1999-01-29 | Electrolytic reduction device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11020892A JP3022871B1 (en) | 1999-01-29 | 1999-01-29 | Electrolytic reduction device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP3022871B1 true JP3022871B1 (en) | 2000-03-21 |
| JP2000219991A JP2000219991A (en) | 2000-08-08 |
Family
ID=12039884
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11020892A Expired - Lifetime JP3022871B1 (en) | 1999-01-29 | 1999-01-29 | Electrolytic reduction device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3022871B1 (en) |
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1999
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