JP2576018B2 - Resin tablet for semiconductor encapsulation - Google Patents
Resin tablet for semiconductor encapsulationInfo
- Publication number
- JP2576018B2 JP2576018B2 JP5168581A JP16858193A JP2576018B2 JP 2576018 B2 JP2576018 B2 JP 2576018B2 JP 5168581 A JP5168581 A JP 5168581A JP 16858193 A JP16858193 A JP 16858193A JP 2576018 B2 JP2576018 B2 JP 2576018B2
- Authority
- JP
- Japan
- Prior art keywords
- resin
- tablet
- pot
- semiconductor
- melt viscosity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Epoxy Resins (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
Description
【0001】[0001]
【産業上の利用分野】この発明は、トランスフア成形の
一種であるランナレス方式(マルチプランジヤ方式とも
いう)によつて半導体を樹脂封止するのに使用する半導
体封止用樹脂タブレツトに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resin tablet for encapsulating a semiconductor used for encapsulating a semiconductor by a runnerless method (also referred to as a multi-plunger method) which is a kind of transfer molding.
【0002】[0002]
【従来の技術】半導体を樹脂封止するための従来のトラ
ンスフア成形では、プランジヤを備えたポツトとこのポ
ツトから放射状に延散する多数個のランナと各ランナに
ゲ―トを介して連通する多数個のキヤビテイとを有する
成形金型を用いて、この金型の各キヤビテイ内に半導体
素子組立構体を1個づつ配置するとともに、上記ポツト
内に樹脂タブレツトを投入し、これを金型熱で溶融しな
がらプランジヤで加圧することにより、上記ランナおよ
びゲ―トを介して各キヤビテイ内に溶融圧入させる方式
をとつている。2. Description of the Related Art In a conventional transfer molding for sealing a semiconductor with a resin, a pot provided with a plunger, a large number of runners radiating from the pot, and each runner are communicated via a gate. Using a molding die having a large number of cavities, one semiconductor element assembly is placed in each cavity of the die, and a resin tablet is put into the above pot, and this is heated by the die heat. A method is employed in which the material is pressurized by a plunger while being melted, and is melt-pressed into each cavity via the runner and the gate.
【0003】しかるに、この成形方式では、ポツトに投
入された樹脂がこのポツトおよび各ゲ―トのほか長くて
かつ断面積の広いランナに残るため、成形後の樹脂ロス
が非常に大きくなるという欠点がある。However, in this molding method, since the resin put into the pot remains on the pot and each gate, as well as on a runner having a long and wide cross-sectional area, the resin loss after molding becomes extremely large. There is.
【0004】これに対して、近年では、ランナレス方式
のトランスフア成形として、プランジヤを備えたポツト
を複数個設けて、各ポツトに投入された封止用樹脂をラ
ンナを介さないで直接ゲ―トを介して各キヤビテイに溶
融圧入させる方式の成形金型を用いて、半導体の樹脂封
止を行う試みがなされている(図1参照)。この成形方
式は、前記従来の如きランナに起因した樹脂ロスがない
ため、材料費の大幅な低減を図れるという利点がある。On the other hand, in recent years, as a runnerless transfer molding, a plurality of pots having a plunger are provided, and the sealing resin put into each pot is directly gated without passing through a runner. An attempt has been made to perform resin sealing of a semiconductor by using a molding die of a method of melting and press-fitting into each cavity through a mold (see FIG. 1). This molding method has an advantage that the material cost can be significantly reduced because there is no resin loss caused by the above-mentioned conventional runner.
【0005】しかしながら、このようなランナレス方式
の成形法においては、封止樹脂の内部に気泡(以下、ボ
イドという)が生じやすく、これが半導体装置の耐湿信
頼性の低下をきたしたり、また機械的強度の低下を招く
原因となつている。However, in such a runnerless molding method, air bubbles (hereinafter, referred to as voids) are apt to be generated inside the sealing resin, which causes a decrease in the moisture resistance reliability of the semiconductor device and a decrease in mechanical strength. It is a cause of the decline.
【0006】[0006]
【発明が解決しようとする課題】この発明は、上記の如
く材料費の面ではるかに有利なランナレス方式のトラン
スフア成形における上述の問題点を解決して、封止樹脂
内部のボイドが低減された耐湿信頼性などにすぐれる半
導体装置を得ることを目的としている。SUMMARY OF THE INVENTION The present invention solves the above-mentioned problems in the runnerless transfer molding which is much more advantageous in terms of material cost as described above, and reduces voids inside the sealing resin. It is an object of the present invention to obtain a semiconductor device having excellent moisture resistance reliability.
【0007】[0007]
【課題を解決するための手段】この発明者らは、上記目
的に対し、鋭意検討した結果、ランナレス方式のトラン
スフア成形においては、これに用いる樹脂タブレツトの
溶融粘度が半導体素子組立構体におけるボンデイングワ
イヤの断線といつた不良品の発生とともに、封止樹脂内
部のボイドの発生にも大きく影響し、この溶融粘度を特
定範囲に設定するとともに、タブレツトの打錠密度を特
定範囲に設定したときには、ボイドが少なくてかつ上記
の如き不良品の発生がみられない高信頼性の半導体装置
が得られることを知り、この発明を完成するに至つた。Means for Solving the Problems The inventors of the present invention have conducted intensive studies on the above object, and as a result, in the runnerless transfer molding, the melt viscosity of the resin tablet used in the transfer molding has been reduced by the bonding wire in the semiconductor element assembly. When the melt viscosity is set to a specific range and the tableting density of the tablet is set to a specific range, the voids are significantly affected. The present inventors have found that a highly reliable semiconductor device having a small number of defects and no occurrence of defective products as described above can be obtained, and the present invention has been completed.
【0008】すなわち、この発明は、ポツトとこのポツ
トに一端が直結しかつ他端が半導体素子組立構体を配置
してなるキヤビテイと直結したゲートとを有する、つま
りランナレス方式の成形金型の上記ポツト内に投入され
て上記ゲートを介して上記キヤビテイ内に溶融圧入され
る半導体封止用樹脂タブレツトにおいて、熱硬化性樹脂
としてのエポキシ樹脂と、その硬化剤としてのノボラツ
ク型フエノール樹脂と、さらに無機質充てん剤とを含む
組成物から構成されて、かつ上記溶融圧入のための金型
温度での溶融粘度が500〜1,000ポイズの範囲に
あるとともに、打錠密度が90%以上であることを特徴
とする半導体封止用樹脂タブレツトに係るものである。That is, the present invention provides a pot having a pot and one end directly connected to the pot and the other end directly connected to a cavity in which a semiconductor element assembly is arranged. A thermosetting resin in a semiconductor encapsulating resin tablet which is injected into the cavity and melt-pressed into the cavity via the gate.
Resin as a curing agent and Novolats as a curing agent
And a melt viscosity at a mold temperature for the above-mentioned melt injection in the range of 500 to 1,000 poise, and a tableting density. Is 90% or more.
【0009】なお、この明細書において、樹脂タブレツ
トの溶融粘度とは、タブレツトを構成する組成物2gを
断面直径10mm,高さ15mmの大きさ(タブレツト)に
成形し、この成形材料を用いて島津社製の高化式フロ―
テスタ(ノズル直径1mm,ノズル長さ10mm,荷重10
Kg/cm2 )により所定温度(金型温度)で測定される値
を意味するものとする。In this specification, the melt viscosity of the resin tablet is defined as the composition of 2 g of the tablet being molded into a size (tablet) having a cross-sectional diameter of 10 mm and a height of 15 mm, and using this molding material for Shimadzu. Koka type flow
Tester (nozzle diameter 1mm, nozzle length 10mm, load 10
Kg / cm 2 ) at a predetermined temperature (mold temperature).
【0010】また、上記の打錠密度とは、熱硬化性樹脂
と無機質充てん剤とを含む組成物から常温圧縮成形する
際の成形密度を意味し、〔タブレツト密度(g/cm3 )
/樹脂硬化物密度(g/cm3 )〕×100%として、表
されるものである。ここで、上記のタブレツト密度は、
タブレツトの重量(g)/タブレツトの容量(cm3 )に
て、また、上記の樹脂硬化物密度は、樹脂硬化物の重量
(g)/樹脂硬化物の容量(cm3 )にて、それぞれ求め
られる。The above-mentioned tableting density means a molding density at the time of compression molding at room temperature from a composition containing a thermosetting resin and an inorganic filler, and [tablet density (g / cm 3 )].
/ Density of cured resin (g / cm 3 )] × 100%. Here, the above tablet density is
The weight of the tablet (g) / the volume of the tablet (cm 3 ), and the above-mentioned cured resin density is obtained by the weight of the cured resin (g) / the volume of the cured resin (cm 3 ). Can be
【0011】[0011]
【発明の構成・作用】この発明に用いる樹脂タブレツト
成形用の組成物は、熱硬化性樹脂としてのエポキシ樹脂
と、その硬化剤としてのノボラツク型フエノール樹脂
と、さらに無機質充てん剤とを必須成分とし、これに必
要に応じて硬化促進剤、シランカツプリング剤、離型
剤、着色剤などの添加剤を加えて加熱下もしくは非加熱
下で混合してなるものである。DETAILED DESCRIPTION OF THE INVENTION The composition for resin tablet molding used in the present invention is an epoxy resin as a thermosetting resin.
And novolak-type phenolic resin as its curing agent
If further an essential component and an inorganic filler, 必 thereto
If necessary, additives such as a curing accelerator, a silane coupling agent, a release agent, and a coloring agent are added, and the mixture is mixed with or without heating.
【0012】この組成物を通常平均粒子径が0.1〜
0.5mm程度に粉砕し、常法にしたがつて常温圧縮成形
することにより、ランナレス方式のトランスフア成形に
適した一般に断面直径4.5〜25mm,高さ5〜30mm
程度の円柱状の樹脂タブレツトとするが、このタブレツ
トは上記円柱状のほか角柱状などの他の形態とされたも
のであつてもよい。The composition usually has an average particle diameter of 0.1 to
By pulverizing to about 0.5 mm and compression molding at room temperature according to a conventional method, it is generally suitable for a runnerless type transfer molding and has a cross-sectional diameter of 4.5 to 25 mm and a height of 5 to 30 mm.
The resin tablet has a columnar shape, but the tablet may have another shape such as a prismatic shape in addition to the cylindrical shape.
【0013】この発明においては、このような樹脂タブ
レツトの溶融粘度を、前述の如く、成形金型温度(通常
150〜200℃、好ましくは160〜190℃)下で
500〜1,000ポイズの範囲となるように設定する
ことを最も大きな特徴点とする。すなわち、かかる粘度
範囲に設定したときには、これをポツト内に投入しゲ―
トを介してキヤビテイ内に溶融圧入させる際の空気の巻
き込みが抑えられるため、上記キヤビテイ内に溶融圧入
されてここに配置された半導体素子組立構体を被覆する
如く硬化した封止樹脂の内部にはボイドの発生がほとん
ど認められなくなる。しかも、上記粘度範囲では、キヤ
ビテイ内に溶融圧入された際の半導体素子組立構体にか
かる流体抵抗が大きくなりすぎるおそれはなく、上記構
体に対して物理的損傷をきたす心配はとくにない。In the present invention, as described above, the melt viscosity of such a resin tablet is in the range of 500 to 1,000 poise at the temperature of a molding die (usually 150 to 200 ° C., preferably 160 to 190 ° C.). Is set as the largest feature point. In other words, when the viscosity is set in such a range, this is put into a pot and gated.
The air entrainment at the time of melt-pressing the cavity through the cavity is suppressed, so that the inside of the sealing resin that is melt-pressed into the cavity and cured so as to cover the semiconductor element assembly structure disposed therein is Almost no voids are observed. In addition, in the above viscosity range, there is no possibility that the fluid resistance applied to the semiconductor element assembly when melt-pressed into the cavity becomes excessively large, and there is no particular concern that the structure is physically damaged.
【0014】これに対して、従来の樹脂タブレツトは、
上記溶融粘度が溶融圧入性の観点から通常200ポイズ
以下の低い値にされていたため、ポツト投入時の空気の
巻き込みをどうしてもさけられず、これが封止樹脂にボ
イドを多発させる原因となつていたものと思われる。こ
の溶融粘度を高くするにしたがつて、上記問題は減少し
てくるが、500ポイズ未満ではなお満足するべき結果
は得られない。一方、この溶融粘度をあまり高くしすぎ
て、この発明の規定範囲外である1,000ポイズを超
える値とすると、流体抵抗が大きくなり、半導体素子組
立構体におけるボンデイングワイヤの断線やたわみが生
じてくるなど、短絡不良という致命的欠陥をさけられな
くなる。On the other hand, a conventional resin tablet is
Since the above melt viscosity was set to a low value of usually 200 poise or less from the viewpoint of melt indentation, entrainment of air at the time of pot injection was inevitable, which caused many voids in the sealing resin. I think that the. As the melt viscosity increases, the above problem decreases, but less than 500 poise still does not provide satisfactory results. On the other hand, if the melt viscosity is too high and exceeds 1,000 poise, which is out of the specified range of the present invention, the fluid resistance becomes large, and the breaking and bending of the bonding wire in the semiconductor element assembly occurs. And other critical defects such as short circuit failure.
【0015】この発明の樹脂タブレツトの溶融粘度を、
上述の特定範囲に設定するには、たとえば使用する熱硬
化性樹脂の溶融粘度と無機質充てん剤の使用量とを適当
に調節することによつて容易に行えるものである。熱硬
化性樹脂の最も代表的なものは、エポキシ樹脂であり、
このエポキシ樹脂の溶融粘度は、金型温度を考慮した1
50℃の温度下で一般に15〜30ポイズの範囲にある
のが好ましい。また、無機質充てん剤は、その量が多く
なるほどタブレツトの溶融粘度が高くなるものである
が、一般にはタブレツトつまりは組成物中72〜80重
量%を占める範囲にあるのが好ましい。なお、上記エポ
キシ樹脂の溶融粘度とは、オスワルド粘度計で測定され
る値を意味する。The melt viscosity of the resin tablet of the present invention is
The above-mentioned specific range can be easily set, for example, by appropriately adjusting the melt viscosity of the thermosetting resin to be used and the amount of the inorganic filler used. The most typical thermosetting resin is an epoxy resin,
The melt viscosity of this epoxy resin is 1 in consideration of the mold temperature.
It is generally preferred that the temperature be in the range of 15 to 30 poise at a temperature of 50 ° C. In addition, as the amount of the inorganic filler increases, the melt viscosity of the tablet increases, but it is generally preferable that the amount of the inorganic filler be in the range of 72 to 80% by weight of the tablet, that is, the composition. The melt viscosity of the epoxy resin means a value measured by an Oswald viscometer.
【0016】このようなエポキシ樹脂としては、エポキ
シ当量が175〜300のクレゾ―ルノボラツク型エポ
キシ樹脂やハロゲン化フエノ―ルノボラツク型エポキシ
樹脂などが好ましく使用できる。エポキシ樹脂の場合適
宜の硬化剤を必要とするが、この硬化剤の好ましい例と
しては、クレゾ―ルノボラツク樹脂、フエノ―ルノボラ
ツク樹脂の如きノボラツク型フエノ―ル樹脂が挙げられ
る。また、これら硬化剤とともに通常用いられる硬化促
進剤には、2−メチルイミダゾ―ル、三フツ化ホウ素、
トリフエニルホスフインなどがある。As such an epoxy resin, a cresol novolak type epoxy resin or a halogenated phenol novolak type epoxy resin having an epoxy equivalent of 175 to 300 can be preferably used. In the case of an epoxy resin, an appropriate curing agent is required. Preferred examples of the curing agent include novolac type phenol resins such as cresol novolak resin and phenol novolak resin. Curing accelerators commonly used with these curing agents include 2-methylimidazole, boron trifluoride,
And triphenylphosphine.
【0017】また、前記の無機質充てん剤としては、石
英ガラス粉末、二酸化けい素粉末などが好ましく用いら
れるが、その他従来公知のケイ酸カルシウム、窒化アル
ミニウム、酸化ジルコン、クレ―、炭酸カルシウム、酸
化アンチモン、アルミナ、炭化ケイ素、ガラス繊維など
の粉末の使用も可能である。この無機質充てん剤の平均
粒子径としては、一般に5〜20μm程度であるのが望
ましい。As the above-mentioned inorganic filler, quartz glass powder, silicon dioxide powder and the like are preferably used. Other conventionally known calcium silicate, aluminum nitride, zirconium oxide, clay, calcium carbonate, antimony oxide It is also possible to use powders of, for example, alumina, silicon carbide, and glass fibers. In general, the average particle diameter of the inorganic filler is preferably about 5 to 20 μm.
【0018】この発明の樹脂タブレツトは、前述の如く
特定範囲の溶融粘度を有することを特徴としているとと
もに、打錠密度、つまり組成物粉末から常温圧縮成形す
る際の成形密度が、90%以上、好ましくは93%以上
であることをも特徴としている。打錠密度が90%より
低くなると、ポツト投入時の含有空気が多くなつて、溶
融粘度を規定したことによるボイドの低減効果が損なわ
れる。The resin tablet of the present invention is characterized in that it has a melt viscosity in a specific range as described above, and has a tableting density, that is, a molding density at room temperature compression molding from a composition powder of 90% or more. Preferably, it is 93% or more. If the tableting density is lower than 90%, the air content at the time of pouring the pot is increased, and the effect of reducing the voids by defining the melt viscosity is impaired.
【0019】つぎに、この発明の上記構成の樹脂タブレ
ツトを用いて、ランナレス方式のトランスフア成形によ
り半導体を樹脂封止する方法について、図1〜図3を参
考にして、説明する。Next, a method of resin-sealing a semiconductor by a runnerless transfer molding using the resin tablet having the above-described structure according to the present invention will be described with reference to FIGS.
【0020】図1は、上型10と下型11とからなるラ
ンナレス方式のトランスフア成形金型の断面構造を示し
たもので、紙面垂直方向に所定間隔をおいて連設する複
数個のポツト1とこの各ポツト1に一端が直結しかつ他
端がキヤビテイ2(2a,2b)に直結したゲ―ト3
(3a,3b)を有する構成とされ、各ポツト1にはプ
ランジヤ4が配設されている。FIG. 1 shows a cross-sectional structure of a transfer molding die of a runnerless type comprising an upper die 10 and a lower die 11, wherein a plurality of pots are provided at predetermined intervals in the direction perpendicular to the paper. 1 and a gate 3 having one end directly connected to each of the pots 1 and the other end directly connected to the cavities 2 (2a, 2b).
(3a, 3b), and each pot 1 is provided with a plunger 4.
【0021】上記各構成要素の大きさは、樹脂封止する
べき半導体の大きさによつて異なるが、たとえばポツト
1は前記樹脂タブレツト7に対応する形状,大きさに設
計され、またゲ―ト3はその断面積が通常0.6〜1.
0mm2 、長さが一般に5〜15mmとなる如く設計され
る。なお、この大きさは、後記の図3の(A),(B)
に示す如き他の成形金型を用いる場合でも、ほぼ同様で
ある。The size of each of the above components differs depending on the size of the semiconductor to be resin-sealed. For example, the pot 1 is designed to have a shape and size corresponding to the resin tablet 7, and No. 3 usually has a cross-sectional area of 0.6 to 1.
It is designed to be 0 mm 2 and generally 5 to 15 mm long. In addition, this size is shown in FIGS.
This is substantially the same even when using other molding dies as shown in FIG.
【0022】このような成形金型の上記キヤビテイ2
a,2b内に、リ―ドフレ―ム5a,5bに紙面垂直方
向に所定間隔をおいて複数個配設された半導体素子とこ
れを取り巻く外部リ―ドやボンデイングワイヤなどから
なる半導体素子組立構体6a,6b(たとえば16 Pin
DIP、42 Pin DIP、パワ―トランジスタなど)が配置
される一方、各ポツト1に前記この発明の樹脂タブレツ
ト7が投入され、これを金型温度で加熱しながらプラン
ジヤ4によつて加圧する。このときの金型温度として
は、既述したように、通常150〜200℃、好ましく
は160〜190℃である。また、プランジヤ圧として
は、一般に50〜120Kg/cm2 、好ましくは70〜1
00Kg/cm2 とされる。The above cavity 2 of such a molding die
a, 2b, a plurality of semiconductor elements disposed at predetermined intervals in the direction perpendicular to the paper of the lead frames 5a, 5b, and a semiconductor element assembly structure including external leads and bonding wires surrounding the semiconductor elements. 6a, 6b (for example, 16 Pin
DIPs, 42-pin DIPs, power transistors, etc.) are arranged, and the resin tablet 7 of the present invention is put into each pot 1, and is pressed by the plunger 4 while being heated at the mold temperature. The mold temperature at this time is usually 150 to 200 ° C, preferably 160 to 190 ° C, as described above. The plunger pressure is generally 50 to 120 kg / cm 2 , preferably 70 to 1 kg / cm 2 .
It is set to 00 kg / cm 2 .
【0023】上記の加熱加圧によつて、樹脂タブレツト
7は溶融し、ゲ―ト3a,3bを介してキヤビテイ2
a,2bに圧入され、ここに配置される半導体素子組立
構体6a,6bを全面被覆した状態で硬化する。このと
き、樹脂タブレツト7の溶融粘度および打錠密度が前記
特定の範囲にあることにより、硬化樹脂中のボイドはほ
とんどみられず、また上記組立構体6a,6bに物理的
損傷をきたすおそれは全くない。The resin tablet 7 is melted by the above-mentioned heating and pressing, and the cavity 2 is formed via the gates 3a and 3b.
a and 2b, and is cured in a state where the semiconductor element assembly structures 6a and 6b disposed here are entirely covered. At this time, since the melt viscosity and the tableting density of the resin tablet 7 are within the above-mentioned specific ranges, almost no voids are found in the cured resin, and there is no possibility of causing physical damage to the assembly structures 6a and 6b. Absent.
【0024】図2は、上記の如くトランスフア成形を行
つたのち、上型10と下型11とからなる成形金型から
離型した状態を示したもので、20a,20bは、それ
ぞれリ―ドフレ―ム5a,5bに所定間隔をおいて配設
された半導体素子組立構体6a,6bを被覆する、硬化
した封止樹脂である。なお、30a,30bは各ゲ―ト
3a,3b内で硬化した樹脂、100は各ポツト1内で
硬化した樹脂である。これら30a,30b,100が
成形ロスとなる樹脂部分であるが、ランナを有しないた
め、このランナ部分での樹脂ロスが全くなく、それだけ
材料費の節減を図れるものである。FIG. 2 shows a state in which the transfer molding has been performed as described above, and the mold has been released from the molding die composed of the upper die 10 and the lower die 11. Reference numerals 20a and 20b denote the leads, respectively. It is a hardened sealing resin which covers the semiconductor element assembly structures 6a, 6b disposed at predetermined intervals on the doframes 5a, 5b. Here, 30a and 30b are resins cured in the respective gates 3a and 3b, and 100 is a resin cured in the respective pots 1. These resin parts 30a, 30b, and 100 cause molding loss. However, since there is no runner, there is no resin loss at the runner part, and the material cost can be reduced accordingly.
【0025】なお、上記図1の成形金型においては、1
個のポツト1に一端が直結するゲ―ト3a,3bの各他
端にそれぞれキヤビテイ2a 2bを直結させる構成を
とつているが、1個のポツト1にゲ―ト3を介して直結
させるキヤビテイ2の数は一般に1〜6個、好ましくは
2〜4個の範囲で自由に選択できる。たとえば、図3の
(A),(B)はこの例を示している。In the molding die shown in FIG.
In this configuration, the cavities 2a and 2b are directly connected to the other ends of the gates 3a and 3b, one ends of which are directly connected to the one pot 1. However, the cavities are directly connected to one pot 1 via the gate 3. In general, the number of 2 can be freely selected in the range of 1 to 6, preferably 2 to 4. For example, FIGS. 3A and 3B show this example.
【0026】すなわち、図3の(A)のように、1個の
ポツト1に対しゲ―ト3c,3d,3e,3fを介して
4個のキヤビテイ2c,2d,2e,2fを直結させる
構成をとつてもよく、また図3の(B)のように、1個
のポツト1に一端が直結するゲ―ト3g,3hをそれぞ
れ二股状としてその各両端部に2個のキヤビテイ2g,
2g´および2h,2h´を直結させるような構成をと
つてもよい。That is, as shown in FIG. 3A, four cavities 2c, 2d, 2e and 2f are directly connected to one pot 1 via gates 3c, 3d, 3e and 3f. Also, as shown in FIG. 3 (B), gates 3g and 3h, one end of which is directly connected to one pot 1, are each made into a bifurcated shape, and two cavities 2g are provided at both ends thereof.
A configuration in which 2g ′ and 2h, 2h ′ are directly connected may be adopted.
【0027】[0027]
【発明の効果】以上のように、この発明においては、ラ
ンナレス方式のトランスフア成形用の樹脂タブレツトと
して、その溶融粘度および打錠密度を特定範囲に設定し
たことにより、成形時に半導体素子組立構体に損傷をき
たすことなく、封止樹脂内部のボイドの低減を図れ、こ
れにより耐湿信頼性などにすぐれる樹脂封止型半導体装
置を得ることが可能となる。As described above, in the present invention, the melt viscosity and the tableting density of the resin tablet for runnerless transfer molding are set to specific ranges so that the semiconductor element assembly can be formed at the time of molding. Voids inside the sealing resin can be reduced without causing damage, thereby making it possible to obtain a resin-sealed semiconductor device having excellent moisture resistance reliability and the like.
【0028】[0028]
【実施例】つぎに、この発明の実施例を記載して、より
具体的に説明する。なお、以下、部とあるのは重量部を
意味する。Next, an embodiment of the present invention will be described in more detail. Hereinafter, “parts” means “parts by weight”.
【0029】実施例1 150℃での溶融粘度が25ポイズのエポキシ当量19
5のクレゾ―ルノボラツク型エポキシ樹脂(以下、エポ
キシ樹脂Aという)20部、ノボラツク型フエノ―ル樹
脂10部、二酸化けい素粉末96部、2−メチルイミダ
ゾ―ル0.5部、カルナバワツクス0.5部、カ―ボン
ブラツク0.5部およびシランカツプリング剤0.5部
を混合し、90℃の加熱ロ―ルで5分間加熱混練したの
ち、冷却粉砕して、平均粒子径0.1〜0.5mmのエポ
キシ樹脂組成物粉末を得た。Example 1 Epoxy equivalent of 19 with a melt viscosity of 25 poise at 150 ° C.
20 parts of cresol novolak type epoxy resin (hereinafter referred to as epoxy resin A), 10 parts of novolak type phenolic resin, 96 parts of silicon dioxide powder, 0.5 part of 2-methylimidazole, and 0 parts of carnauba wax 0.5 part, 0.5 parts of carbon black and 0.5 parts of a silane coupling agent were mixed, heated and kneaded with a heating roll at 90 ° C. for 5 minutes, and then cooled and pulverized to obtain an average particle diameter of 0.1 part. An epoxy resin composition powder of about 0.5 mm was obtained.
【0030】この粉末を打錠機にて常温圧縮成形して、
断面直径9.8mm,高さ13mm,重さ1.77gの円柱
状の樹脂タブレツトを製造した。このタブレツトの17
5℃での溶融粘度は800ポイズ、打錠密度は95%で
あつた。このタブレツトを、この発明の半導体封止用樹
脂タブレツトとした。This powder is subjected to room temperature compression molding using a tableting machine.
A cylindrical resin tablet having a sectional diameter of 9.8 mm, a height of 13 mm, and a weight of 1.77 g was produced. 17 of this tablet
The melt viscosity at 5 ° C. was 800 poise and the tablet density was 95%. This tablet was used as the resin tablet for semiconductor encapsulation of the present invention.
【0031】実施例2 実施例1で調製したエポキシ樹脂組成物粉末を、打錠機
で常温圧縮成形して、断面直径9.8mm,高さ14.2
mm,重さ1.75gの円柱状の樹脂タブレツトを製造し
た。このタブレツトの175℃での溶融粘度は805ポ
イズで、打錠密度は90%であつた。このタブレツト
を、この発明の半導体封止用樹脂タブレツトとした。Example 2 The epoxy resin composition powder prepared in Example 1 was subjected to room temperature compression molding using a tableting machine to obtain a cross-sectional diameter of 9.8 mm and a height of 14.2.
A cylindrical resin tablet having a diameter of 1.75 g and a weight of 1.75 g was produced. The tablet had a melt viscosity at 175 ° C. of 805 poise and a tableting density of 90%. This tablet was used as the resin tablet for semiconductor encapsulation of the present invention.
【0032】実施例3 エポキシ樹脂Aの代わりに、150℃での溶融粘度が1
5ポイズのエポキシ当量195のクレゾ―ルノボラツク
型エポキシ樹脂を同量用いた以外は、実施例1と同様に
して、エポキシ樹脂組成物粉末を調製し、この粉末を打
錠機で常温圧縮成形して、断面直径9.8mm,高さ1
4.2mm,重さ1.75gの円柱状の樹脂タブレツトを
製造した。このタブレツトの175℃での溶融粘度は5
70ポイズで、打錠密度は90%であつた。このタブレ
ツトを、この発明の半導体封止用樹脂タブレツトとし
た。Example 3 In place of the epoxy resin A, the melt viscosity at 150 ° C. was 1
An epoxy resin composition powder was prepared in the same manner as in Example 1 except that the same amount of a 5-poise cresol novolak type epoxy resin having an epoxy equivalent of 195 was used, and this powder was subjected to room temperature compression molding using a tableting machine. , Cross section diameter 9.8mm, height 1
A cylindrical resin tablet having a size of 4.2 mm and a weight of 1.75 g was produced. The melt viscosity of the tablet at 175 ° C. is 5
At 70 poise, the tablet density was 90%. This tablet was used as the resin tablet for semiconductor encapsulation of the present invention.
【0033】比較例1 エポキシ樹脂Aの代わりに、150℃での溶融粘度が5
ポイズのエポキシ当量195のクレゾ―ルノボラツク型
エポキシ樹脂を同量使用し、かつ二酸化けい素粉末の使
用量を75部に変更した以外は、実施例1と同様にし
て、エポキシ樹脂組成物粉末を得た。この粉末を打錠機
にて常温圧縮成形して、断面直径9.8mm,高さ14.
2mm,重さ1.75gの円柱状の樹脂タブレツトを製造
した。このタブレツトの175℃での溶融粘度は120
ポイズで、打錠密度は90%であつた。このタブレツト
を、比較用の半導体封止用樹脂タブレツトとした。Comparative Example 1 In place of epoxy resin A, the melt viscosity at 150 ° C. was 5
An epoxy resin composition powder was obtained in the same manner as in Example 1 except that the same amount of cresol novolak type epoxy resin having an epoxy equivalent of 195 was used and the amount of silicon dioxide powder used was changed to 75 parts. Was. This powder was subjected to room temperature compression molding using a tableting machine, and had a cross-sectional diameter of 9.8 mm and a height of 14.
A cylindrical resin tablet having a size of 2 mm and a weight of 1.75 g was produced. The melt viscosity of the tablet at 175 ° C. was 120.
In poise, the tablet density was 90%. This tablet was used as a resin tablet for semiconductor encapsulation for comparison.
【0034】比較例2 二酸化けい素粉末の使用量を128部に変更した以外
は、実施例1と同様にして、エポキシ樹脂組成物粉末を
得た。この粉末を打錠機にて常温圧縮成形して、断面直
径9.8mm,高さ14.2mm,重さ1.75gの円柱状
の樹脂タブレツトを製造した。このタブレツトの175
℃での溶融粘度は1,500ポイズで、打錠密度は90
%であつた。このタブレツトを、比較用の半導体封止用
樹脂タブレツトとした。Comparative Example 2 An epoxy resin composition powder was obtained in the same manner as in Example 1 except that the amount of silicon dioxide powder used was changed to 128 parts. This powder was subjected to room temperature compression molding using a tableting machine to produce a cylindrical resin tablet having a cross-sectional diameter of 9.8 mm, a height of 14.2 mm, and a weight of 1.75 g. 175 of this tablet
Melt viscosity at 1500C is 1,500 poise and tableting density is 90
%. This tablet was used as a resin tablet for semiconductor encapsulation for comparison.
【0035】つぎに、上記の実施例および比較例に係る
各樹脂タブレツトを用いて、ランナレス方式のトランス
フア成形により半導体を樹脂封止し、その性能を調べ
た。成形金型は、図1に示す構造のものを用いた。ポツ
ト数は103個、したがつてキヤビテイ数は20個であ
り、各ゲ―トの大きさは断面積0.7mm2 ,長さ7mmで
あり、また各キヤビテイの容量は402mm3 である。Next, a semiconductor was resin-sealed by a runnerless transfer molding using each of the resin tablets according to the above Examples and Comparative Examples, and the performance was examined. The molding die having the structure shown in FIG. 1 was used. The number of pots is 103, and therefore the number of cavities is 20, the size of each gate is 0.7 mm 2 in cross section, 7 mm in length, and the capacity of each cavity is 402 mm 3 .
【0036】この成形金型に配置される二つのリ―ドフ
レ―ムには、所定間隔をおいてそれぞれ10個の半導体
素子組立構体が配置され、これら構体が各キヤビテイ内
に位置するように固定されてなる。なお、金型温度は1
80℃、プランジヤ圧力は90Kg/cm2 、プランジヤ速
度は1.85mm/秒とした。上記金型温度によつて、樹
脂タブレツトは通常175〜180℃の温度に加熱され
るものである。On the two lead frames arranged in this molding die, ten semiconductor element assembly assemblies are arranged at predetermined intervals, and these assemblies are fixed so as to be located in each cavity. Be done. The mold temperature is 1
At 80 ° C., the plunger pressure was 90 kg / cm 2 , and the plunger speed was 1.85 mm / sec. Depending on the temperature of the mold, the resin tablet is usually heated to a temperature of 175 to 180 ° C.
【0037】このようにして樹脂封止した半導体装置に
ついて、樹脂封止部のボイド数と半導体装置の損傷とを
調べた結果は、下記の表1に示されるとおりであつた。
なお、ボイド数は、軟X線装置で写真撮影し、ボイド径
が0.2mm以上のものの個数を調べたものである。ま
た、半導体装置の損傷は、半導体素子組立構体における
ボンデイングワイヤの断線やたわみなどの異常がみられ
るかどうかを、軟X線写真により調べたものである。With respect to the semiconductor device thus sealed with resin, the number of voids in the resin-sealed portion and the damage to the semiconductor device were examined. The results are shown in Table 1 below.
The number of voids was obtained by taking a photograph with a soft X-ray apparatus and examining the number of voids having a diameter of 0.2 mm or more. The damage of the semiconductor device was determined by examining whether an abnormality such as disconnection or bending of the bonding wire in the semiconductor element assembly was observed by soft X-ray photography.
【0038】[0038]
【表1】 [Table 1]
【0039】上記の表1の結果から明らかなように、こ
の発明の樹脂タブレツトによれば、ボイドが少なくてか
つ半導体の損傷がみられない高信頼性の樹脂封止型半導
体装置を製造することができる。As is evident from the results shown in Table 1, according to the resin tablet of the present invention, it is possible to manufacture a highly reliable resin-encapsulated semiconductor device having few voids and no semiconductor damage. Can be.
【図1】この発明の樹脂タブレツトを適用するべきラン
ナレス方式のトランスフア成形金型の一例を示す断面図
である。FIG. 1 is a cross-sectional view showing an example of a runnerless transfer molding die to which a resin tablet of the present invention is applied.
【図2】上記の成形金型を用いて半導体の樹脂封止を行
つたのち成形金型より離型した状態を示す平面図であ
る。FIG. 2 is a plan view showing a state in which the semiconductor is resin-sealed using the above-mentioned molding die and then released from the molding die.
【図3】(A),(B)は、それぞれ、図1の成形金型
の変形例として、ポツトとゲ―トとキヤビテイとの連結
状態が異なる例を示す構成図である。FIGS. 3 (A) and 3 (B) are configuration diagrams each showing a modified example of the molding die of FIG. 1 in which the connection state of the pot, the gate and the cavity is different.
1 ポツト 2(2a,2b,2c,2d,2e,2f,2g,2g
´,2h,2h´)キヤビテイ 3(3a,3b,3c,3d,3e,3f,3g,3
h) ゲ―ト 6a,6b 半導体素子組立構体 7 樹脂タブレツト 10,11 成形金型 20a,20b 封止樹脂1 pot 2 (2a, 2b, 2c, 2d, 2e, 2f, 2g, 2g
', 2h, 2h') Cavity 3 (3a, 3b, 3c, 3d, 3e, 3f, 3g, 3
h) Gate 6a, 6b Semiconductor element assembly structure 7 Resin tablet 10, 11 Mold 20a, 20b Sealing resin
Claims (3)
他端が半導体素子組立構体を配置してなるキヤビテイと
直結したゲートとを有する成形金型の上記ポツト内に投
入されて上記ゲートを介して上記キヤビテイ内に溶融圧
入される半導体封止用樹脂タブレツトにおいて、熱硬化
性樹脂としてのエポキシ樹脂と、その硬化剤としてのノ
ボラツク型フエノール樹脂と、さらに無機質充てん剤と
を含む組成物から構成されて、かつ上記溶融圧入のため
の金型温度での溶融粘度が500〜1,000ポイズの
範囲にあるとともに、打錠密度が90%以上であること
を特徴とする半導体封止用樹脂タブレツト。1. A molding die having a pot and a gate having one end directly connected to the pot and the other end directly connected to a cavity in which a semiconductor element assembly is arranged is inserted into the pot through the gate. In the resin tablet for semiconductor encapsulation melt-pressed into the cavity, an epoxy resin as a thermosetting resin and a resin as a curing agent thereof are used.
It is composed of a composition containing a volatile phenolic resin and an inorganic filler, and has a melt viscosity at a mold temperature for the above-mentioned melt injection in the range of 500 to 1,000 poise and a tableting density. Is 90% or more.
記載の半導体封止用樹脂タブレツト。2. The resin tablet for encapsulating a semiconductor according to claim 1, wherein the tablet density is 93% or more.
μm程度である請求項1または請求項2に記載の半導体
封止用樹脂タブレツト。3. The inorganic filler has an average particle size of 5 to 20.
The resin tablet for semiconductor encapsulation according to claim 1 or 2, wherein the thickness is about μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5168581A JP2576018B2 (en) | 1993-06-14 | 1993-06-14 | Resin tablet for semiconductor encapsulation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5168581A JP2576018B2 (en) | 1993-06-14 | 1993-06-14 | Resin tablet for semiconductor encapsulation |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59237219A Division JPS61115342A (en) | 1984-11-10 | 1984-11-10 | Resin tablet for sealing semiconductor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0669259A JPH0669259A (en) | 1994-03-11 |
| JP2576018B2 true JP2576018B2 (en) | 1997-01-29 |
Family
ID=15870714
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5168581A Expired - Lifetime JP2576018B2 (en) | 1993-06-14 | 1993-06-14 | Resin tablet for semiconductor encapsulation |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2576018B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100287128B1 (en) * | 1998-12-30 | 2001-04-16 | 석삼용 | Upper support structure of the dart injector in the converter |
| KR100287127B1 (en) * | 1998-12-30 | 2001-04-16 | 석삼용 | Dart Injector in Converter |
| TW511405B (en) | 2000-12-27 | 2002-11-21 | Matsushita Electric Industrial Co Ltd | Device built-in module and manufacturing method thereof |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5229851A (en) * | 1975-09-03 | 1977-03-07 | Hitachi Ltd | Epoxy resin composition for press molding and its preparation |
| JPS6011805B2 (en) * | 1980-03-12 | 1985-03-28 | 株式会社日立製作所 | Resin sealing method for semiconductor elements |
| JPS57184241A (en) * | 1981-05-08 | 1982-11-12 | Toshiba Corp | Resin sealing type semiconductor device |
| JPS5712025A (en) * | 1980-06-25 | 1982-01-21 | Hitachi Ltd | Production of molding resin |
| JPS58225120A (en) * | 1982-06-25 | 1983-12-27 | Mitsubishi Gas Chem Co Inc | Epoxy resin composition for semiconductor encapsulation |
| JPS597008A (en) * | 1982-07-03 | 1984-01-14 | Toshiba Corp | High-density tablet and method of sealing semiconductor with resin using said tablet |
| JPS597009A (en) * | 1982-07-03 | 1984-01-14 | Toshiba Corp | High-density tablet and method of sealing semiconductor with resin using said tablet |
| JPS59158530A (en) * | 1983-02-28 | 1984-09-08 | Toshiba Corp | Runnerless mold for resin sealing of semiconductor device |
-
1993
- 1993-06-14 JP JP5168581A patent/JP2576018B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0669259A (en) | 1994-03-11 |
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